JP2014021828A - 温度制御システムへの温調流体供給方法及び記憶媒体 - Google Patents
温度制御システムへの温調流体供給方法及び記憶媒体 Download PDFInfo
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Abstract
【解決手段】低温流体の流量を制御する可変バルブ79aが設けられた低温流路76と、高温流体の流量を制御する可変バルブ79cが設けられた高温流路77と、低温流体と高温流体とを合流させて調温部70へ供給する結合流路71と、調温部70へ供給された流体を回収する回収流路72と、可変バルブ79bが設けられ、回収流路72を流れる流体の一部を調温部70へ循環させるバイパス流路73と、回収流路72に設けられた循環ポンプ87とを備える温度制御システム1に対して、可変バルブ79a,79bを所定の弁開度で開いて低温流体を所定時間供給し(S101)、可変バルブ79b,79cを所定の弁開度で開いて高温流体を所定時間供給し(S103)、循環ポンプ87に流体が充填された状態で循環ポンプ87を起動させる(S106)。
【選択図】図4
Description
てもよい。
70 調温部
71 結合流路
73 バイパス流路
74 低温温調ユニット
75 高温温調ユニット
79a,79b,79c 可変バルブ
76 低温流路
77 高温流路
78 タンク
90 制御装置
92 温度制御部
100 半導体製造装置
PA 合流部
PB 分岐部
Claims (8)
- 第1の温度に調温された液体が第1の流体として供給され、前記第1の流体の流量を制御する第1の可変バルブが設けられた第1の流体流路と、前記第1の温度とは異なる第2の温度に調温された液体が第2の流体として供給され、前記第2の流体の流量を制御する第2の可変バルブが設けられた第2の流体流路と、前記第1の流体と前記第2の流体とを合流させ温調対象物へ供給する結合流路と、前記温調対象物へ供給された流体を回収する回収流路と、第3の可変バルブが設けられ、前記回収流路を流れる流体の一部を前記温調対象物へ循環させるバイパス流路と、前記回収流路に設けられた循環ポンプとを備え、前記温調対象物として半導体製造装置に装備された部材の温度を制御する温度制御システムへの温調流体供給方法であって、
前記第1の可変バルブと前記第3の可変バルブとを所定の弁開度で開き、前記第1の流体を所定時間供給する第1の流体供給ステップと、
前記第2の可変バルブと前記第3の可変バルブとを所定の弁開度で開き、前記第2の流体を所定時間供給する第2の流体供給ステップと、
第2の流体供給ステップの後、前記回収流路を流れる流体が前記循環ポンプに充填された状態で前記循環ポンプを起動させる起動ステップと、を有することを特徴とする温度制御システムへの温調流体供給方法。 - 前記起動ステップの後に実行される、
前記第1の可変バルブのみを開き、前記第1の流体を前記第1の流体流路へ所定時間供給する第3の流体供給ステップと、
前記第2の可変バルブのみを開き、前記第2の流体を前記第2の流体流路へ所定時間供給する第4の流体供給ステップと、を更に有することを特徴とする請求項1記載の温度制御システムへの温調流体供給方法。 - 前記第4の流体供給ステップの後に実行される、前記第3の可変バルブのみを開き、前記結合流路、前記回収流路及び前記バイパス流路に流体を循環させる循環ステップを更に有することを特徴とする請求項1又は2に記載の温度制御システムへの温調流体供給方法。
- 前記循環ステップの後に実行される、前記第1の可変バルブ、前記第2の可変バルブ及び前記第3の可変バルブの弁開度を調整して、前記第1の流体流路への前記第1の流体の供給量、前記第2の流体流路への前記第2の流体の供給量、前記バイパス流路に供給される流体の流量を制御することにより、前記温調対象物の温度を前記温調対象物の設定温度に制御する制御ステップを更に有することを特徴とする請求項1乃至3のいずれか1項に記載の温度制御システムへの温調流体供給方法。
- 前記温度制御システムは、前記回収流路において前記循環ポンプの上流側に設けられ、前記流体を貯蔵するタンクと、前記タンクに貯蔵された流体が一定量に到達したことを検出する前記液面センサとを備え、
前記起動ステップは、前記タンクにおいて前記流体が前記一定量に到達したことを前記液面センサが検出している状態で実行されることを特徴とする請求項1乃至4のいずれか1項に記載の温度制御システムへの温調流体供給方法。 - 前記温度制御システムは、前記回収流路において前記循環ポンプの上流側に設けられ、前記流体を貯蔵するタンクと、前記タンクに貯蔵された流体が一定量に到達したことを検出する前記液面センサとを備え、
前記第1の流体供給ステップは、前記タンクにおいて前記流体が前記一定量に到達したことを前記液面センサが検出した時点で終了とされることを特徴とする請求項1乃至4のいずれか1項に記載の温度制御システムへの温調流体供給方法。 - 前記タンクにおいて前記流体が前記一定量に到達したことを前記液面センサが検出したときには、前記タンクから前記循環ポンプへ前記流体が流出していることを特徴とする請求項5又は6に記載の温度制御システムへの温調流体供給方法。
- 第1の温度に調温された液体が第1の流体として供給され、前記第1の流体の流量を制御する第1の可変バルブが設けられた第1の流体流路と、前記第1の温度とは異なる第2の温度に調温された液体が第2の流体として供給され、前記第2の流体の流量を制御する第2の可変バルブが設けられた第2の流体流路と、前記第1の流体と前記第2の流体とを合流させ温調対象物へ供給する結合流路と、前記温調対象物へ供給された流体を回収する回収流路と、第3の可変バルブが設けられ、前記回収流路を流れる流体の一部を前記温調対象物へ循環させるバイパス流路と、前記回収流路に設けられた循環ポンプとを備え、前記温調対象物として半導体製造装置に装備された部材の温度を制御する温度制御システムへの温調流体供給方法をコンピュータに実行させるプログラムを格納するコンピュータで読み取り可能な記憶媒体であって、
前記温調流体供給方法は、
前記第1の可変バルブと前記第3の可変バルブとを所定の弁開度で開き、前記第1の流体を所定時間供給する第1の流体供給ステップと、
前記第2の可変バルブと前記第3の可変バルブとを所定の弁開度で開き、前記第2の流体を所定時間供給する第2の流体供給ステップと、
第2の流体供給ステップの後、前記回収流路を流れる流体が前記循環ポンプに充填された状態で前記循環ポンプを起動させる起動ステップと、を有することを特徴とするコンピュータで読み取り可能な記憶媒体。
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US14/409,794 US9664460B2 (en) | 2012-07-20 | 2013-07-18 | Method of supplying temperature control fluid to temperature control system and storage medium |
PCT/JP2013/070123 WO2014014127A1 (ja) | 2012-07-20 | 2013-07-18 | 温度制御システムへの温調流体供給方法及び記憶媒体 |
KR1020147035716A KR102053778B1 (ko) | 2012-07-20 | 2013-07-18 | 온도 제어 시스템으로의 온도 조절 유체 공급 방법 및 기억 매체 |
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KR20160001669A (ko) | 2014-06-27 | 2016-01-06 | 도쿄엘렉트론가부시키가이샤 | 온도 제어 가능한 스테이지를 포함하는 시스템, 반도체 제조 장치 및 스테이지의 온도 제어 방법 |
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KR102053778B1 (ko) | 2019-12-09 |
JP5951384B2 (ja) | 2016-07-13 |
US9664460B2 (en) | 2017-05-30 |
KR20150035715A (ko) | 2015-04-07 |
US20150176928A1 (en) | 2015-06-25 |
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