JP2013536140A - 人造大理石及びその製造方法 - Google Patents
人造大理石及びその製造方法 Download PDFInfo
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- JP2013536140A JP2013536140A JP2013513093A JP2013513093A JP2013536140A JP 2013536140 A JP2013536140 A JP 2013536140A JP 2013513093 A JP2013513093 A JP 2013513093A JP 2013513093 A JP2013513093 A JP 2013513093A JP 2013536140 A JP2013536140 A JP 2013536140A
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- Prior art keywords
- resin
- artificial marble
- marble
- block
- meth
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Classifications
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- B29C67/00—Shaping techniques not covered by groups B29C39/00 - B29C65/00, B29C70/00 or B29C73/00
- B29C67/24—Shaping techniques not covered by groups B29C39/00 - B29C65/00, B29C70/00 or B29C73/00 characterised by the choice of material
- B29C67/242—Moulding mineral aggregates bonded with resin, e.g. resin concrete
- B29C67/243—Moulding mineral aggregates bonded with resin, e.g. resin concrete for making articles of definite length
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C67/00—Shaping techniques not covered by groups B29C39/00 - B29C65/00, B29C70/00 or B29C73/00
- B29C67/24—Shaping techniques not covered by groups B29C39/00 - B29C65/00, B29C70/00 or B29C73/00 characterised by the choice of material
- B29C67/242—Moulding mineral aggregates bonded with resin, e.g. resin concrete
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B44F—SPECIAL DESIGNS OR PICTURES
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- C—CHEMISTRY; METALLURGY
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- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B26/00—Compositions of mortars, concrete or artificial stone, containing only organic binders, e.g. polymer or resin concrete
- C04B26/02—Macromolecular compounds
- C04B26/04—Macromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds
- C04B26/06—Acrylates
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- C—CHEMISTRY; METALLURGY
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- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B26/00—Compositions of mortars, concrete or artificial stone, containing only organic binders, e.g. polymer or resin concrete
- C04B26/02—Macromolecular compounds
- C04B26/10—Macromolecular compounds obtained otherwise than by reactions only involving carbon-to-carbon unsaturated bonds
- C04B26/14—Polyepoxides
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- C—CHEMISTRY; METALLURGY
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- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B26/00—Compositions of mortars, concrete or artificial stone, containing only organic binders, e.g. polymer or resin concrete
- C04B26/02—Macromolecular compounds
- C04B26/10—Macromolecular compounds obtained otherwise than by reactions only involving carbon-to-carbon unsaturated bonds
- C04B26/18—Polyesters; Polycarbonates
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- C—CHEMISTRY; METALLURGY
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- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2111/00—Mortars, concrete or artificial stone or mixtures to prepare them, characterised by specific function, property or use
- C04B2111/00241—Physical properties of the materials not provided for elsewhere in C04B2111/00
- C04B2111/00413—Materials having an inhomogeneous concentration of ingredients or irregular properties in different layers
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- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2111/00—Mortars, concrete or artificial stone or mixtures to prepare them, characterised by specific function, property or use
- C04B2111/54—Substitutes for natural stone, artistic materials or the like
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- Organic Chemistry (AREA)
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- Compositions Of Macromolecular Compounds (AREA)
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Abstract
【選択図】図1
Description
また、本発明の製造方法では、上述したプレス成形工程に続いて、製造された硬化物を脱型した後で冷却する工程、前記硬化物を目的とする大きさに裁断する工程及び/又は人造大理石の表面を適宜サンディングする後工程をさらに行うこともできる。
以下、本発明に係る実施例を通して本発明をより詳細に説明するが、本発明の範囲が下記に提示した実施例によって制限されることはない。
未硬化状態の樹脂シートの製造
ポリメチルメタクリレート30重量%及びメチルメタクリレート70重量%を含むアクリル樹脂シロップ100重量部に、水酸化アルミニウム400重量部、t―ブチルペルオキシネオデカノエート0.2重量部、t―アミルペルオキシ2―エチルヘキサノエート0.3重量部、エチレングリコールジメタクリレート3重量部、ノルマルドデシルメルカプタン0.2重量部、消泡剤(BYK 555、BYK―Chemie社、ドイツ)0.2重量部、カップリング剤(BYK 900、BYK―Chemie社、ドイツ)0.75重量部及び紫外線安定剤(Hisorp―P、LG化学社、韓国)0.2重量部を混合することによって原料スラリーを製造した。続いて、前記原料スラリーに発色手段として顔料0.3重量部を混合することによって樹脂組成物を製造した。
前記の製造された二種の樹脂シートを別途のニーダーに投入し、約10秒間混練し、二つのパターンが混じっているマーブルパターンを具現した後、マーブルパターンが具現されたバルク状態の組成物を取り出し、未硬化状態のマーブル樹脂シートを製造した。
前記の製造されたマーブル樹脂シートを約120℃に予熱された金型にチャージし、約15kg/cm2の圧力でプレス成形した後、脱型、冷却及びサンディング工程を経て人造大理石を製造した。添付の図2は、このような方法で製造された人造大理石を示す。
実施例1の人造大理石とは異なる外観パターンを示すように発色手段を適宜変更したことを除いては、前記実施例1と同一の方法で人造大理石を製造した。このように製造された人造大理石は添付の図3に示している。
Claims (15)
- ベース樹脂及び発色手段を含む第1の領域と;ベース樹脂及び前記第1の領域の発色手段とは区別される外観を具現できる発色手段を含む第2の領域と;を含む、未硬化状態のマーブル樹脂シート又は樹脂ブロックのプレス成形物を含有する人造大理石。
- 前記ベース樹脂は、アクリル樹脂、不飽和ポリエステル樹脂又はエポキシ樹脂であることを特徴とする、請求項1に記載の人造大理石。
- 前記発色手段は顔料、染料又はチップであることを特徴とする、請求項1に記載の人造大理石。
- 前記チップは樹脂チップ又は天然素材チップであることを特徴とする、請求項3に記載の人造大理石。
- 前記発色手段は、前記ベース樹脂100重量部に対して0.1重量部〜500重量部の量で含まれることを特徴とする、請求項1に記載の人造大理石。
- 前記第1又は第2の領域は、前記ベース樹脂100重量部に対して200重量部〜500重量部の無機充填剤をさらに含むことを特徴とする、請求項1に記載の人造大理石。
- 前記無機充填剤は、水酸化アルミニウム、水酸化マグネシウム、炭酸カルシウム、シリカ、アルミナ及びアルミン酸カルシウムからなる群より選ばれた一つ以上であることを特徴とする、請求項6に記載の人造大理石。
- 前記第1又は第2の領域は、前記ベース樹脂100重量部に対して0.2重量部〜5重量部の架橋剤をさらに含むことを特徴とする、請求項1に記載の人造大理石。
- 前記架橋剤は、エチレングリコールジ(メタ)アクリレート、ジエチレングリコールジ(メタ)アクリレート、トリエチレングリコールジ(メタ)アクリレート、テトラエチレングリコールジ(メタ)アクリレート、トリメチロールプロパントリ(メタ)アクリレート、1,6―ヘキサンジオールジ(メタ)アクリレート、ポリブチレングリコールジ(メタ)アクリレート及びネオペンチルグリコールジ(メタ)アクリレートからなる群より選ばれた一つ以上であることを特徴とする、請求項8に記載の人造大理石。
- 架橋促進剤、ラジカル運搬体、カップリング剤、紫外線吸収剤、難燃剤、離型剤、重合抑制剤及び酸化防止剤からなる群より選ばれた一つ以上をさらに含むことを特徴とする、請求項1に記載の人造大理石。
- 互いに異なる外観効果を具現できる、二種以上の樹脂組成物を使用して未硬化状態の樹脂シート又はブロックをそれぞれ製造する第1の段階;前記第1の段階で製造された樹脂シート又はブロックを混練し、その混練物を使用して未硬化状態のマーブル樹脂シート又は樹脂ブロックを製造する第2の段階;及び前記第2の段階で製造されたマーブル樹脂シート又は樹脂ブロックをプレス成形する第3の段階を含む人造大理石の製造方法。
- 前記第1の段階は、(1)樹脂シロップ及び無機充填剤を混練することによって原料組成物を製造すること;及び(2)カレンダリング工法、押出工法、プレス工法又はキャスティング工法を使用して前記原料組成物を未硬化状態の樹脂シート又はブロックに製造することを含むことを特徴とする、請求項11に記載の方法。
- 前記原料組成物の粘度は5,000Ps〜100,000Psであることを特徴とする、請求項12に記載の方法。
- 前記第2の段階のマーブル樹脂シート又はブロックは、カレンダリング工法、押出工法、プレス工法又はキャスティング工法で製造されることを特徴とする、請求項11に記載の方法。
- (a)前記第2の段階で製造されたマーブル樹脂シート又はブロックを金型にチャージすること;及び
(b)前記のチャージされた樹脂シート又はブロックを30℃〜150℃の温度及び5kg/cm2〜50kg/cm2の圧力でプレス成形することを含むことを特徴とする、請求項11に記載の方法。
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EP2944443B1 (en) * | 2013-01-11 | 2020-07-08 | Cosentino Research and Development, S.L | Process for obtaining a stratified agglomerated artificial stone tile and/or slab |
US8999873B2 (en) * | 2013-04-20 | 2015-04-07 | King Abdulaziz City for Science and Technology (KACST) | Artificial marble and method for manufacturing the same |
USD735479S1 (en) * | 2013-07-02 | 2015-08-04 | Lg Hausys, Ltd. | Film |
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USD746065S1 (en) * | 2014-01-26 | 2015-12-29 | Awi Licensing Company | Floor panel with faux stone pattern |
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KR102171641B1 (ko) * | 2017-04-18 | 2020-10-29 | (주)엘지하우시스 | 인조 대리석용 조성물 및 인조 대리석 |
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CN111015903A (zh) * | 2019-11-18 | 2020-04-17 | 广东意新家居有限责任公司 | 一种复合石板的制备方法及复合石板 |
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USD919979S1 (en) * | 2020-01-02 | 2021-05-25 | Cambria Company Llc | Slab comprising particulate mineral mixture |
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USD919980S1 (en) * | 2020-01-02 | 2021-05-25 | Cambria Company Llc | Slab comprising particulate mineral mixture |
USD918597S1 (en) * | 2020-01-02 | 2021-05-11 | Cambria Company Llc | Slab comprising particulate mineral mixture |
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USD920683S1 (en) * | 2020-01-14 | 2021-06-01 | Cambria Company Llc | Slab comprising particulate mineral mixture |
USD921372S1 (en) * | 2020-01-14 | 2021-06-08 | Cambria Company Llc | Slab comprising particulate mineral mixture |
USD944538S1 (en) * | 2020-06-01 | 2022-03-01 | Cambria Company Llc | Slab comprising particulate mineral mixture |
USD944539S1 (en) * | 2020-06-01 | 2022-03-01 | Cambria Company Llc | Slab comprising particulate mineral mixture |
CN112375458B (zh) * | 2020-11-18 | 2022-03-22 | 福州居家逸涂料科技有限公司 | 仿大理石艺术地坪漆及仿大理石艺术地坪的施工方法 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0639852A (ja) * | 1992-01-20 | 1994-02-15 | Yamaha Corp | 人工大理石の製法 |
JPH1067025A (ja) * | 1996-08-29 | 1998-03-10 | Okura Ind Co Ltd | 流れ模様を有する人工大理石板の製造方法 |
JP2000191794A (ja) * | 1998-12-25 | 2000-07-11 | Tokyo Printing Ink Mfg Co Ltd | 大理石模様熱可塑性樹脂成形用着色剤及びその成形品 |
JP2007528337A (ja) * | 2005-03-25 | 2007-10-11 | エルジー・ケム・リミテッド | 多色チップを活用した人造大理石及びその製造方法 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3856425B2 (ja) * | 2001-05-02 | 2006-12-13 | 住友ベークライト株式会社 | 半導体封止用エポキシ樹脂組成物の製造方法、半導体封止用エポキシ樹脂組成物及び半導体装置 |
KR100525561B1 (ko) * | 2003-08-21 | 2005-10-31 | 주식회사 엘지화학 | 자개의 외관을 갖는 인조대리석 및 그 제조방법 |
KR100708983B1 (ko) * | 2005-01-17 | 2007-04-18 | 주식회사 엘지화학 | 크랙무늬를 갖는 인조대리석 및 이의 제조방법 |
KR100562634B1 (ko) * | 2005-03-25 | 2006-03-20 | 주식회사 엘지화학 | 줄무늬 칩을 이용한 인조대리석 및 이의 제조방법 |
KR100739304B1 (ko) * | 2005-05-02 | 2007-07-12 | 주식회사 엘지화학 | 프레스 공법을 활용한 비연속적 원형무늬의 아크릴계인조대리석 및 이의 제조방법 |
JP4029357B2 (ja) * | 2005-06-21 | 2008-01-09 | 大日本インキ化学工業株式会社 | 燃料電池用セパレ−タ、その製造方法及びそれを用いた燃料電池 |
KR100786003B1 (ko) * | 2005-08-24 | 2007-12-14 | 주식회사 엘지화학 | 공압출 공법을 활용한 투명칩을 포함하는 인조대리석 및 이의 제조방법 |
KR100747790B1 (ko) * | 2005-12-30 | 2007-08-08 | 제일모직주식회사 | 줄 무늬를 갖는 인조대리석 마블칩 및 이를 이용한인조대리석, 및 그 제조 방법 |
KR100688025B1 (ko) * | 2005-12-30 | 2007-02-27 | 제일모직주식회사 | 침강현상이 없는 인조대리석 마블칩의 제조방법 |
KR100751576B1 (ko) * | 2006-03-06 | 2007-08-22 | 제일모직주식회사 | 칩 패턴 인조대리석의 연속 제조방법 및 이를 제조하기 위한 연속제조장치 |
KR100975380B1 (ko) * | 2007-01-09 | 2010-08-11 | (주)엘지하우시스 | 인조대리석 및 그의 제조 방법 |
KR100938515B1 (ko) * | 2008-02-14 | 2010-01-25 | 한화엘앤씨 주식회사 | 다중색 흐름무늬를 갖는 수지계 강화 천연석 및 그제조방법 |
-
2010
- 2010-06-01 EP EP10852557.7A patent/EP2578552B1/en active Active
- 2010-06-01 CN CN201080040510.1A patent/CN102510844B/zh not_active Expired - Fee Related
- 2010-06-01 JP JP2013513093A patent/JP2013536140A/ja active Pending
- 2010-06-01 WO PCT/KR2010/003538 patent/WO2011152578A1/ko active Application Filing
- 2010-06-01 US US13/497,174 patent/US20120178850A1/en not_active Abandoned
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0639852A (ja) * | 1992-01-20 | 1994-02-15 | Yamaha Corp | 人工大理石の製法 |
JPH1067025A (ja) * | 1996-08-29 | 1998-03-10 | Okura Ind Co Ltd | 流れ模様を有する人工大理石板の製造方法 |
JP2000191794A (ja) * | 1998-12-25 | 2000-07-11 | Tokyo Printing Ink Mfg Co Ltd | 大理石模様熱可塑性樹脂成形用着色剤及びその成形品 |
JP2007528337A (ja) * | 2005-03-25 | 2007-10-11 | エルジー・ケム・リミテッド | 多色チップを活用した人造大理石及びその製造方法 |
Also Published As
Publication number | Publication date |
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EP2578552B1 (en) | 2020-12-09 |
CN102510844B (zh) | 2016-06-22 |
US20120178850A1 (en) | 2012-07-12 |
WO2011152578A1 (ko) | 2011-12-08 |
EP2578552A1 (en) | 2013-04-10 |
CN102510844A (zh) | 2012-06-20 |
EP2578552A4 (en) | 2017-11-15 |
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