JP2013500778A5 - アブレーション装置および該装置を用いたアブレーション方法 - Google Patents

アブレーション装置および該装置を用いたアブレーション方法 Download PDF

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JP2013500778A5
JP2013500778A5 JP2012523002A JP2012523002A JP2013500778A5 JP 2013500778 A5 JP2013500778 A5 JP 2013500778A5 JP 2012523002 A JP2012523002 A JP 2012523002A JP 2012523002 A JP2012523002 A JP 2012523002A JP 2013500778 A5 JP2013500778 A5 JP 2013500778A5
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ablation device
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energy
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Claims (12)

  1. エネルギーを放射するように構成されたアンテナを備えたアブレーション装置であって、
    温度を低下させた領域を備え、これにより、組織領域に接触したとき、上記組織領域が上記領域に付着することによって、上記アブレーション装置が上記組織領域に取り付けられることを特徴とするアブレーション装置。
  2. 上記エネルギーは、マイクロ波エネルギーまたは無線周波エネルギーであることを特徴とする請求項1に記載のアブレーション装置。
  3. 上記アンテナは、同軸性伝達線を備えていることを特徴とする請求項1または2に記載のアブレーション装置。
  4. 上記アンテナは、三軸性伝達線を備えていることを特徴とする請求項1から3までのいずれか一項に記載のアブレーション装置。
  5. 温度を低下させた上記領域は、アンテナと組織との間のインターフェースを凍結させる循環剤を備えていることを特徴とする請求項1から4までのいずれか一項に記載のアブレーション装置。
  6. 上記循環剤は、CO ガスであることを特徴とする請求項5に記載のアブレーション装置。
  7. 上記循環剤は、上記装置の遠位部位に対して曝されることが防止されていることを特徴とする請求項5または6に記載のアブレーション装置。
  8. 上記循環剤は、気密封止されることによって、上記装置の遠位部位に対して曝されることが防止されていることを特徴とする請求項7に記載のアブレーション装置。
  9. 上記封止は、レーザ溶接または半田付けであることを特徴とする請求項8に記載のアブレーション装置。
  10. 請求項1から9までのいずれか一項に記載のアブレーション装置と、電源装置と、上記電源装置から上記アブレーション装置に対するエネルギー供給を調節および制御するプロセッサとを備えることを特徴とするシステム。
  11. 請求項1から9までのいずれか一項に記載のアブレーション装置を用いて組織をアブレーションする方法であって、
    上記アブレーション装置を、組織領域の近傍において位置決めし、循環剤を用いて温度を低下させることにより上記アンテナを上記組織に付着させて、上記組織にある量のエネルギーを供給することを特徴とする方法。
  12. 上記組織領域に含まれる腫瘍を、供給した上記エネルギーによってアブレーションすることを特徴とする請求項11に記載の方法。
JP2012523002A 2009-07-28 2010-07-28 アブレーション装置 Active JP5914332B2 (ja)

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US22917809P 2009-07-28 2009-07-28
US61/229,178 2009-07-28
PCT/US2010/043558 WO2011017168A2 (en) 2009-07-28 2010-07-28 Energy delivery systems and uses thereof

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JP2013500778A5 true JP2013500778A5 (ja) 2013-08-29
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EP (4) EP2859862B1 (ja)
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HK (1) HK1232095A1 (ja)
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