JP2013153044A - 単結晶酸化すずワイヤを用いたデバイス - Google Patents
単結晶酸化すずワイヤを用いたデバイス Download PDFInfo
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- JP2013153044A JP2013153044A JP2012012886A JP2012012886A JP2013153044A JP 2013153044 A JP2013153044 A JP 2013153044A JP 2012012886 A JP2012012886 A JP 2012012886A JP 2012012886 A JP2012012886 A JP 2012012886A JP 2013153044 A JP2013153044 A JP 2013153044A
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- tin oxide
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- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 title claims abstract description 54
- 229910001887 tin oxide Inorganic materials 0.000 title claims abstract description 54
- 239000013078 crystal Substances 0.000 title claims abstract description 52
- 239000000654 additive Substances 0.000 claims description 4
- 230000000996 additive effect Effects 0.000 claims description 4
- 230000007547 defect Effects 0.000 abstract description 4
- 238000010586 diagram Methods 0.000 description 15
- 238000005452 bending Methods 0.000 description 13
- 239000000758 substrate Substances 0.000 description 7
- 230000000694 effects Effects 0.000 description 4
- 239000000463 material Substances 0.000 description 3
- 230000003446 memory effect Effects 0.000 description 3
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N titanium dioxide Inorganic materials O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000002041 carbon nanotube Substances 0.000 description 1
- 229910021393 carbon nanotube Inorganic materials 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 238000001000 micrograph Methods 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000036962 time dependent Effects 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
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- Semiconductor Memories (AREA)
Abstract
【解決手段】単結晶酸化すずワイヤ2を用いたデバイスは、電気的な伝導状態において単結晶酸化すずワイヤ2に一定値の応力を加えると、高抵抗状態となり、応力の印加を解除してもその高抵抗状態を維持することを特徴とする。高抵抗状態になる応力は加えた電圧に依存する。応力の印加を解除した高抵抗状態において電圧を印加すると元の伝導状態に復帰する。低抵抗状態から高抵抗状態への変化には電圧を印加して無くても実現され、その応力印加の履歴を欠陥生成として記録できる。
【選択図】図1
Description
2 ワイヤ(単結晶酸化すず)
3 電極
Claims (7)
- 単結晶酸化すずワイヤを用いたデバイスであって、電気的な伝導状態において前記単結晶酸化すずワイヤに一定値の応力を加えると、高抵抗状態となり、応力の印加を解除してもその高抵抗状態を維持することを特徴とする単結晶酸化すずワイヤを用いたデバイス。
- 前記高抵抗状態において応力を解除した後、両端に一定の電圧を印加することにより元の電気的な伝導状態に復帰することを特徴とする請求項1に記載の単結晶酸化すずワイヤを用いたデバイス。
- 加えた電圧値によって高抵抗状態になる歪みの値が異なることを特徴とする請求項1又は2に記載の単結晶酸化すずワイヤを用いたデバイス。
- 加えた応力によって抵抗値が異なり、その抵抗値が安定に存在するため、多値記録が可能であることを特徴とする請求項1から3のいずれか一項に記載の単結晶酸化すずワイヤを用いたデバイス。
- 電圧印加なしで応力を加えることにより、低抵抗状態から高抵抗状態へ変化し、その履歴が内部に記憶できることを特徴とする請求項1から4のいずれか一項に記載の単結晶酸化すずワイヤを用いたデバイス。
- ワイヤに応力を加えるためのピエゾ素子を備えることを特徴とする請求項1から5のいずれか一項に記載の単結晶酸化すずワイヤを用いたデバイス。
- 添加物がドープされ、初期状態の伝導性が制御されていることを特徴とする請求項1から6のいずれか一項に記載の単結晶酸化すずワイヤを用いたデバイス。
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012012886A JP5900883B2 (ja) | 2012-01-25 | 2012-01-25 | 単結晶酸化すずワイヤを用いたデバイス |
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| Application Number | Priority Date | Filing Date | Title |
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| JP2012012886A JP5900883B2 (ja) | 2012-01-25 | 2012-01-25 | 単結晶酸化すずワイヤを用いたデバイス |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2013153044A true JP2013153044A (ja) | 2013-08-08 |
| JP5900883B2 JP5900883B2 (ja) | 2016-04-06 |
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| JP2012012886A Expired - Fee Related JP5900883B2 (ja) | 2012-01-25 | 2012-01-25 | 単結晶酸化すずワイヤを用いたデバイス |
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Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62249304A (ja) * | 1986-04-02 | 1987-10-30 | 三ツ星ベルト株式会社 | 感圧導電性ゴム材 |
| JP2004512515A (ja) * | 1999-04-29 | 2004-04-22 | ザ・ボード・オブ・ガバナーズ・フォー・ハイヤー・エデュケイション、ステイト・オブ・ロード・アイランド・アンド・プロビデンス・プランテーションズ | 高温で使用するための自己補償型セラミック歪みゲージ |
| WO2010036210A1 (en) * | 2008-09-23 | 2010-04-01 | National University Of Singapore | Graphene memory cell and fabrication methods thereof |
| JP2011103323A (ja) * | 2009-11-10 | 2011-05-26 | Hitachi Ltd | 半導体記憶装置 |
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2012
- 2012-01-25 JP JP2012012886A patent/JP5900883B2/ja not_active Expired - Fee Related
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62249304A (ja) * | 1986-04-02 | 1987-10-30 | 三ツ星ベルト株式会社 | 感圧導電性ゴム材 |
| JP2004512515A (ja) * | 1999-04-29 | 2004-04-22 | ザ・ボード・オブ・ガバナーズ・フォー・ハイヤー・エデュケイション、ステイト・オブ・ロード・アイランド・アンド・プロビデンス・プランテーションズ | 高温で使用するための自己補償型セラミック歪みゲージ |
| WO2010036210A1 (en) * | 2008-09-23 | 2010-04-01 | National University Of Singapore | Graphene memory cell and fabrication methods thereof |
| JP2011103323A (ja) * | 2009-11-10 | 2011-05-26 | Hitachi Ltd | 半導体記憶装置 |
Non-Patent Citations (1)
| Title |
|---|
| JPN6015039776; WU Wenzhuo: 'Piezotronic Nanowire-Based Resistive Switches As Programmable Electromechanical Memories' Nano Lett Vol.11, No.7, 201107, p.2779-2785 * |
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| JP5900883B2 (ja) | 2016-04-06 |
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