JP2013019690A - Radiation detector - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a radiation detector in which microphonic noise can be conveniently suppressed.SOLUTION: In a flat-panel detector 10, an X-ray detector main unit 11 comprises a scintillator layer 13 and an active matrix substrate 14. The scintillator layer 13 includes a reflective layer 15 formed on the upper surface thereof. The active matrix substrate 14 includes a required number of pixels 16 arranged two-dimensionally on the front surface side thereof, and the active matrix substrate 14 also includes a first conductive layer 17 with ventilation, e.g., an opening pattern, formed in close contact to the back surface side thereof. The active matrix substrate 14 is supported on a base 18 of a housing 12 via the first conductive layer 17. The X-ray detector main unit 11 is therefore accommodated between the base 18 and a protective cover body 19 in a sealed state, and the protective cover body 19 is bonded at edge parts of the base 18 through adhesive layers 20.

Description

  Each embodiment of the present invention relates to a radiation detector that detects radiation such as X-rays.

  As a new generation X-ray diagnostic image detector, a flat panel detector (FPD: Flat Panel Detector) using a solid-state imaging device made of, for example, an active matrix, a CCD, a CMOS or the like has been attracting attention. By irradiating the flat detector with, for example, X-rays transmitted through the subject, an X-ray image or a real-time X-ray image is output as a digital signal. Since such a radiation detector is a solid state detector, it is highly expected in terms of image quality performance and stability, and many universities and companies are engaged in research and development.

  X-ray flat panel detectors are roughly classified into two methods, a direct method and an indirect method. The direct method is a method in which X-rays are directly converted into signal charges by a photoconductive film such as amorphous selenium (a-Se) and led to a charge storage capacitor. In this direct method, photoconductive charges generated by X-rays are directly guided to a charge storage capacitor by a high electric field, so that a resolution characteristic substantially defined by the pixel electrode pitch of the active matrix can be obtained. On the other hand, in the indirect method, X-rays are converted into fluorescence (scintillation light) by a scintillator layer, and the scintillation light is converted into signal charges by a light receiving element such as an amorphous silicon (a-Si) photodiode and led to a charge storage capacitor. It is a method. Many of the X-ray flat panel detectors currently in practical use are indirect systems using an active matrix.

  In general, in the X-ray flat panel detector as described above, for example, a microphon phenomenon is likely to occur in an imaging apparatus of a medical diagnostic apparatus or an industrial nondestructive inspection apparatus. This microphonic phenomenon generates a fluctuation of a dark image signal that is a spatial or temporal fluctuation of an X-ray image, that is, microphonic noise. Such microphonic noise is generally seen in a radiation detector including a solid-state imaging device that detects radiation by finally converting it into signal charges. The generation of microphonic noise will be described below with reference to FIGS. 13 and 14 by taking the indirect X-ray flat panel detector as an example.

  FIG. 13 is an explanatory sectional view schematically showing an example of an X-ray flat panel detector in the prior art. FIG. 14 is an equivalent circuit diagram of a partial pixel portion of the active matrix in the X-ray flat panel detector. The X-ray flat panel detector has a structure in which an X-ray detector main body is accommodated in a housing. This housing protects the X-ray detector main body from external force or moisture or moisture of the outside air.

  In the X-ray flat panel detector 100, the X-ray detector main body 101 is accommodated in a housing 102 in a sealed state, for example. The X-ray detector main body 101 includes, as its basic configuration, a scintillator layer 103 that converts incident X-rays R into scintillation light S, and an active matrix substrate 104 that converts the scintillation light S into signal charges of an X-ray image. Here, the scintillator layer 103 is made of a columnar crystal structure of a high-luminance fluorescent material such as cesium iodide (CsI). A reflection layer 105 that reflects the scintillation light S and collects it on the active matrix substrate 104 side is formed on the upper surface of the scintillator layer 103. On the active matrix substrate 104, for example, a required number of pixels 106 are two-dimensionally arranged on a glass plate. The scintillator layer 103 and the active matrix substrate 104 are overlapped and bonded.

  The housing 102 includes a base 107 on which the X-ray detector main body 101 is placed, and a protective cover body 108 that accommodates the X-ray detector main body 101 between the base 107. Here, the base 107 is made of an insulator such as a rectangular plate or a disk. The protective cover body 108 is made of resin, Al, graphite (C) or the like, and transmits X-rays. The protective cover body 108 is adhered to the edge portion of the base 107 through an adhesive layer 109 made of resin, for example.

  The pixels 106 are two-dimensionally arranged on the active matrix substrate 104 as shown in the equivalent circuit diagram of FIG. These pixels 106 include, for example, an a-Si pn junction diode, a photoelectric conversion element 110 that is a light receiving element including a pin junction diode, and a charge storage capacitor 111 to which charges generated by the photoelectric conversion element 110 are guided. A switching element 113 made of, for example, a thin film transistor (TFT) for reading the signal charge of the charge storage capacitor 111 to the read line (signal line) 112 is provided. Here, readout control of the signal charge of each pixel 106 is performed by a control line (scanning line) 114. The signal lines 112 and the scanning lines 114 are arranged in a matrix in the column direction and the row direction of the active matrix substrate 104, respectively.

  In the solid-state imaging device of the active matrix substrate 104, a semiconductor layer, a conductor layer, and an insulator layer are appropriately stacked, and the photoelectric conversion element 110, the charge storage capacitor 111, the TFT of the switching element 113, electrodes, wirings, and the like. It is formed. Therefore, in the pixel 106, as shown in FIG. 14, for example, the invariant parasitic capacitor 116 and the variable parasitic capacitor 117 are inevitably connected to the node 115 of the charge storage capacitor 111 as a stray capacitance.

  Here, the invariant parasitic capacitor 116 and the variable parasitic capacitor 117 are shown to be connected in series. The invariant parasitic capacitor 116 is determined by the structure of the active matrix substrate 104 and exhibits a substantially fixed stray capacitance value. On the other hand, the variable parasitic capacitor 117 includes, for example, a parasitic capacitor between the X-ray detector main body 101 and the housing 102 and is connected to the ground potential, and the floating capacitance value that varies due to the vibration of the X-ray flat panel detector 100. Indicates.

  For example, when the X-ray flat panel detector 100 shown in FIG. 13 receives vibration due to an external factor, the gap between the X-ray detector main body 101 and the housing 102 changes accordingly. The capacitance value of the variable parasitic capacitor 117 fluctuates according to the gap change that is a microphonic phenomenon. This capacitance value fluctuation disturbs the signal charge at the node 115 of the charge storage capacitor 111. That is, the distribution of signal charges with the charge storage capacitor 111 is varied. Alternatively, when the glass plate and the surface of the base 107 are brought into sliding contact with each other on the back surface side of the active matrix substrate 104 due to the vibration of the external factor, electrostatic charge is generated in the variable parasitic capacitor 117. The signal charge at the node 115 of the charge storage capacitor 111 is disturbed by the electrostatic induction of the charged static electricity.

  When the signal charge of the charge storage capacitor 111 is read out to the signal line 112, fluctuation of the read signal charge amount, that is, microphonic noise occurs due to the capacitance value fluctuation or electrostatic induction of the variable parasitic capacitor 117. Here, a change in the gap between the X-ray detector main body 101 and the housing 102 generally differs depending on the position of each pixel 106 of the X-ray detector main body 101 or a region of a plurality of pixels. Therefore, the microphonic noise becomes temporal fluctuation of the dark image signal due to the vibration of the external factor, and also differs in a planar position, that is, spatially, in the X-ray detector main body 101. Such a spatial fluctuation of the dark image signal becomes conspicuous as the X-ray detector main body 101 becomes larger.

  Microphonic noise is also caused by fluctuations in the stray capacitance between the housing 102 and the wiring formed on the active matrix substrate 104 or the electrode other than the electrode of the node 115 of the charge storage capacitor 111 described above. Arise. Among them, the fluctuation of the stray capacitance with the signal line 112 from which the signal charge of the charge storage capacitor 111 is read becomes relatively large microphonic noise. However, the amount is small compared with the case between the electrodes of the node 115 described above.

Japanese Patent No. 2006-58124 Japanese Patent No. 2008-107134 Japanese Patent Publication No. 2010-1112744

  Microphonic noise, as an imaging device of a medical diagnostic device or an industrial nondestructive inspection device, becomes a luminance unevenness of an X-ray image when it causes a spatial fluctuation of a dark image signal in the above-described X-ray flat panel detector. Is displayed. In addition, when temporal fluctuations occur due to vibrations caused by external factors, the time change of the X-ray image or digital signal recorded in real time becomes unreliable. For example, there is a risk of causing serious danger in medical diagnosis. In particular, in the case of an in-vehicle, mobile, or large-sized X-ray flat panel detector, microphonic noise becomes prominent, and countermeasures are urgently needed.

  2. Description of the Related Art Conventionally, various types of damping means for reducing transmission of external vibration to a radiation detector have been presented in radiation imaging apparatuses. However, these vibration control means are usually complicated and large. And the method which can suppress the above microphonic noise simply is not found.

  The problem to be solved by the present invention is to provide a radiation detector capable of easily suppressing microphonic noise.

  In order to solve the above problems, a radiation detector according to an embodiment is a radiation detector that generates an image of the subject from radiation transmitted through the subject, and a plurality of pixels for generating the image are provided on an upper surface. An insulating substrate arranged; and a first conductive layer formed in close contact with the lower surface of the insulating substrate so as to suppress microphonic noise generated by vibration of the radiation detector. This conductive layer has a plurality of opening patterns.

Explanatory sectional drawing which shows typically an example of the radiation detector concerning 1st Embodiment. The partial enlarged plan view which shows an example of the electroconductive layer formed in the back surface side of the active matrix board | substrate in a radiation detector same as the above. The partial expanded sectional view which shows an example of the specific structure of the radiation detector concerning 1st Embodiment. The equivalent circuit diagram of the partial pixel part of the active matrix board | substrate in a radiation detector same as the above. Explanatory sectional drawing which shows typically an example of the radiation detector concerning 2nd Embodiment. The equivalent circuit diagram of the partial pixel part of the active matrix board | substrate in a radiation detector same as the above. Explanatory sectional drawing which shows typically an example of the radiation detector concerning 3rd Embodiment. The equivalent circuit diagram of the partial pixel part of the active matrix board | substrate in a radiation detector same as the above. Explanatory sectional drawing which shows typically the other example of the radiation detector concerning 4th Embodiment. The equivalent circuit diagram of the partial pixel part of the active matrix board | substrate in a radiation detector same as the above. The photograph of the dark image which shows the microphonic noise of the radiation detector in an Example. The photograph of the dark image which shows the microphonic noise of the comparative example in an Example. Explanatory sectional drawing which shows typically an example of the radiation detector in a prior art. The equivalent circuit diagram of the partial pixel part of the active matrix board | substrate in a radiation detector same as the above.

Several embodiments will be described below with reference to the drawings. In the following, the drawings are schematic, and the ratio of each dimension is different from the actual one. Also, in the drawings, reference numerals are given to the main parts thereof, common parts are attached to the same or similar parts, and a part of the overlapping description is omitted.
(First embodiment)
The radiation detector according to the first embodiment will be described with reference to FIGS.

  The X-ray flat panel detector 10 which is a radiation detector has a structure in which an X-ray detector main body 11 is housed in a sealed state in a housing 12. The X-ray detector main body 11 includes a scintillator layer 13 and an active matrix substrate 14 which are superposed and bonded to each other as in the conventional technique, as a basic configuration. Here, a reflective layer 15 is formed on the upper surface of the scintillator layer 13. A required number of pixels 16 are two-dimensionally arranged on the surface side of the active matrix substrate 14. A first conductive layer 17 is formed on the back side of the active matrix substrate 14 so as to be in close contact therewith.

  The active matrix substrate 14 is supported so that the first conductive layer 17 on the back side is placed on or fixed to the base 18 of the housing 12. In this way, the X-ray detector main body 11 is accommodated between the base 18 and the protective cover body 19. The protective cover body 19 is bonded to the edge of the base 18 via a resin adhesive layer 20, for example.

  In the X-ray detector main body 11, the scintillator layer 13 and the active matrix substrate 14 are the same as those in the prior art, for example, and an example of a specific structure will be described later with reference to FIG.

In the first conductive layer 17, the charges induced in these stray capacitances follow the vibration of external factors so that the stray capacitance fluctuations between the casing 12 and each pixel 16 are the same. It only needs to be able to move. Alternatively, the static electricity that is non-uniformly charged due to the sliding contact caused by vibration as described in the prior art may be distributed uniformly in the first conductive layer 17. For this purpose, the sheet resistance of the first conductive layer 17 is preferably 10 ¹² Ω / □ or less. With such a sheet resistance, the charge in the first conductive layer 17 can follow the frequency of vibrations that normally occur in medical diagnostic equipment and industrial nondestructive testing equipment. Further, it is preferably 10 ⁶ Ω / □ or less, and most preferably 1 Ω / □ or less.

  Here, the first conductive layer 17 preferably does not reflect or scatter the scintillation light S transmitted through the active matrix substrate 14. This is because the scintillation light S that has been scattered or reflected and bounced back to the active matrix substrate 14 is received by the pixels 16 and leads to a decrease in resolution characteristics of the X image.

  The first conductive layer 17 preferably exhibits high reliability in contact with the back side of the active matrix substrate 14, that is, the insulating substrate 21 described later. As a conductive material that has excellent long-term reliability of adhesion of the first conductive layer 17 and can be easily thickened, a material obtained by kneading a powdered conductive material such as metal and an organic film such as a resin, organic There are conductor materials. These are used as a conductive sheet, for example. Here, the conductive sheet is adhered and pasted very simply by applying a conductive paint to the lower surface of the insulating substrate 21, screen printing, roll laminating, or the like. Examples of such a conductive sheet include a conductive paste obtained by kneading Ag-based metal powder in a black epoxy resin that absorbs the scintillation light S. Alternatively, when the insulating substrate 21 is, for example, a silicon oxide glass plate, a Si-containing polyimide resin is suitable.

  The resin may be either a thermosetting resin or a thermoplastic resin. The resin kneaded with the metal powder is stuck with an adhesive having excellent adhesiveness to the insulating substrate 21 when the adhesiveness to the insulating substrate 21 is not good.

  The thickness of the first conductive layer 17 including an organic material such as the resin can be easily reduced to, for example, about 10 μm. The scintillation light S transmitted through the active matrix substrate 14 is almost completely absorbed by the first conductive layer 17 and does not bounce to the pixels 16.

  Here, when forming the gas-impermeable organic first conductive layer 17 such as the conductive sheet on the lower surface of the insulating substrate 21, the first conductive layer 17 and the insulating substrate 21 are formed. It is easy to form a portion where atmospheric gas such as air remains in the interface region on the lower surface. The formation of the first conductive layer 17 is very simple in the case of the above-described application, screen printing, (vacuum) roll laminating, adhesion, etc., but it is easy to take in the atmospheric gas.

  Therefore, for example, as shown in FIG. 2, the first conductive layer 17 has an opening pattern that appropriately becomes an opening portion of a gas at a predetermined position so that the atmospheric gas is removed to the outside. 34 is formed. Here, the example of FIG. 2A is the first conductive layer 17 having an opening pattern 34 having a square planar shape. FIG. 2B and FIG. 2C are cases where the strip-shaped and slit-shaped opening patterns 34 are provided, respectively. In the case of FIG. 2C, the opening pattern 34 may extend to the edge of the first conductive layer 17, or these opening patterns 34 may be connected to each other. And the 1st electroconductive layer 17 may be comprised by the aggregate | assembly of many electroconductive pieces. In addition, the planar shape of the opening pattern 34 can be various shapes such as a circular shape, an elliptical shape, a triangular shape, a polygonal shape, a cloth shape in the form of a thread, and air permeability.

  When the first conductive layer 17 is formed on the lower surface of the insulating substrate 21, atmospheric gas such as air is easily removed to the outside through a gas opening portion such as the opening pattern 34. It does not remain in the interface region. For this reason, the 1st electroconductive layer 17 exhibits the high reliability in close_contact | adherence with the insulated substrate 21, and the long-term reliability of the close_contact | adherence becomes excellent. Furthermore, a sheet provided with a large number of through holes, a porous sheet, a sheet in which a mesh-like sheet is impregnated with a conductive material, or the like can be applied as the above-described air-permeable layer.

  The first conductive layer 17 can be formed of, for example, an inorganic conductive material in addition to an organic conductive sheet. For example, amorphous carbon (a-C), a-Si, or the like that absorbs the scintillation light S and has a low reflectance can be suitably used. These films are formed so as to be in close contact with the lower surface of the insulating substrate 21 by, for example, a plasma enhanced chemical vapor deposition (PECVD) method.

  In addition, for the scintillation light S emitted from the applied scintillator layer 13, an inorganic conductor material having a low reflectance and a large absorption coefficient can be used as appropriate. As such a conductor material, there is a metal oxide whose amount of oxygen is referred to as a lower metal oxide which is smaller than the stoichiometric value, and examples thereof include lower metal oxides such as Ti, Ta, Cr, and Nb. Further, it may be a lower metal oxynitride containing nitrogen. These metal oxides or metal oxynitrides can be easily formed to be in close contact with the lower surface of the insulating substrate 21 by, for example, reactive sputtering.

  In addition, it is also possible to use a metal material that does not reflect the specific wavelength of the scintillation light S used. For example, it is selected from Al, Cu, Ni and the like. In this case, the first conductive layer 17 is formed by a film forming method such as metal sputtering.

  Usually, the scintillator layer 13 and the active matrix substrate 14 have a large thermal expansion coefficient difference of about one digit. When the X-ray flat panel detector 10 is used, a large thermal stress is generated between them due to a temperature change that may occur during storage. For example, a tensile stress is generated on the lower surface of the insulating substrate 21 made of a glass plate. At the same time, a tensile stress is applied to the first conductive layer 17 and the partial peeling or cracking is likely to occur.

  Therefore, when the first conductive layer 17 is formed of an inorganic conductive material, an opening pattern is appropriately formed at a predetermined portion of the first conductive layer 17 as described with reference to FIG. 34 is formed. In this case, the opening pattern 34 has a function of partially releasing and relaxing the stress strain of the first conductive layer 17 caused by the tensile stress on the lower surface of the insulating substrate 21. That is, it becomes an opening portion of stress strain from the insulating substrate 21. Then, the above-described peeling or cracking of the first conductive layer 17 from the lower surface of the insulating substrate 21 is prevented. In this way, the first conductive layer 17 exhibits high reliability in close contact with the insulating substrate 21, and is excellent in long-term reliability of the close contact.

  In the housing 12, the base 18 has, for example, a rectangular plate shape or a disk shape, and is made of an insulator such as ceramic. The protective cover body 19 is made of resin, Al, graphite (C) or the like, and transmits X-rays.

  The reflection layer 15 is made of a metal thin film that is radiation transmissive and reflects light having a predetermined wavelength. For example, it is made of a metal material selected from the group consisting of Al, Cu, Ni, Ti, Cr, Mg, Rh, Ag, Au, Pt and the like. As described in the prior art, the reflective layer 15 reflects the scintillation light S and condenses it on the active matrix substrate 14 side. Thereby, the utilization efficiency of the scintillation light S generated in the scintillator layer 13 is improved.

  Next, an example of a specific structure of the X-ray detector main body 11 in the radiation detector of the present embodiment will be described with reference to FIG. The X-ray detector main body 11 having a two-dimensional planar structure is formed in a state where the scintillator layer 13 and the active matrix substrate 14 described above are bonded. The active matrix substrate 14 has a known structure, and the outline thereof will be described below. A TFT switching element 22 and a charge storage capacitor 23 are formed on the upper surface of the insulating substrate 21. Then, a photoelectric conversion element 25 made of a photodiode that converts the scintillation light S into charges of electrons or holes is formed on the upper layer of these via an interlayer insulating layer 24. For example, the photodiode is an a-Si pn junction diode or pin junction diode.

  The first conductive layer 17 is attached to the lower surface of the insulating substrate 21. The insulating substrate 21 and the first conductive layer 17 are preferably made of a material that does not reflect the scintillation light S. The insulating substrate 21 is preferably a light transmissive glass plate or a resin plate (plastic plate), for example. Alternatively, a glass plate or a plastic plate that can absorb the scintillation light S without reflecting it may be used. The first conductive layer 17 is made of the material described above.

  The switching element 22 includes a gate electrode 22a, a gate insulating film 22b composed of two insulating layers, a source electrode 22c, and a drain electrode 22d. The gate electrode 22a and the source electrode 22c are arranged in the matrix direction of the matrix as a scanning line and a signal line, respectively.

  The drain electrode 22d of the TFT is electrically connected to a pixel electrode (collecting electrode) 25a that collects charges generated by the photoelectric conversion element 25. Here, the current collecting electrode 25a is one electrode of a photodiode, and a light transmissive electrode 25b having light transmissivity, such as ITO, is formed thereon. Further, the drain electrode 22 d is connected to one electrode 23 a of the charge storage capacitor 23. The charge storage capacitor 23 includes a counter electrode 23b formed so as to sandwich one of the two insulating layers constituting the gate insulating film 22b as a capacitor insulating film. The counter electrode 23b is disposed on the insulating substrate 21 as a ground wiring.

  The scintillator layer 13 is bonded to the active matrix substrate 14 by a light-transmitting resin bonding layer 26 such as a hot melt resin. The bonding layer 26 may be formed by, for example, pressing a resin film on the active matrix substrate 14 by, for example, a thermal laminating method or thermocompression bonding. Then, the scintillator layer 13 and the active matrix substrate 14 covered with the first protective layer 27 and the second protective layer 28 on both sides are bonded and bonded via the bonding layer 26. Here, the first protective layer 27 adheres to the bonding layer 26. The reflective layer 15 described above is attached on the second protective layer 28. A passivation film made of an inorganic material may be interposed between the bonding layer 26, the interlayer insulating layer 24, and the photoelectric conversion element 25.

  The scintillator layer 13 may be formed, for example, on a rectangular or disk-shaped support substrate (not shown). Such a support substrate is made of Al, Al alloy, graphite (C), SiC, Be, a-C, glass, fiber optical plate, etc., and a plate-like substrate that transmits radiation and Become. Note that it is preferable that the supporting substrate has a mirror-polished one main surface so as to have the function of the reflective layer 15 that reflects the scintillation light S.

The scintillator layer 13 is made of a halogen compound such as CsI, which is a high-intensity fluorescent material. In particular, CsI: Na and CsI: Tl having a strip-like columnar crystal structure are suitable. Examples of other halogen compounds include LiI, NaI, and KI having various activators. Alternatively, GOS (Gd ₂ O ₂ S), GSO (Gd ₂ SiO ₅ ), ZnS, ZnSe, Ca ₂ MgSi ₂ O ₇ , Ca _(1-X) Mg _X SiO ₃ , CaF ₂ , BaF ₂ , BGO (Bi) ₄ Ge ₃ O ₁₂ , Bi ₁₂ GeO ₂₀ ), YAP (YAlO ₃ ), YAG (Y ₃ Al ₅ O ₁₂ ), YSO (Y ₂ SiO ₅ ), LuAP (LuAlO ₃ ), LSO (Lu ₂ SiO ₅ ), LSP (Lu ₂ Si ₂ O ₇ ), LuYAP {Lu _(1-X) Y _X AlO ₃ }, LGSO {Lu _(1-X) Gd _X SiO ₅ }, LaCl ₃ , CeCl ₃ , RbGd ₂ Br ₇ , K A phosphor material containing at least one of ₂ LaCl ₅ and LiBaF ₃ may be used.

  For the first protective layer 27 and the second protective layer 28, for example, a polyparaxylylene film having high moisture permeability and having moisture resistance and moisture resistance is suitable. In addition, xylylene-based organic films such as polyfluoroparaxylylene, polychloroparaxylylene, polydimethylparaxylylene, and polydiethylparaxylylene are used. Here, the first protective layer 27 and the second protective layer 28 may be formed as a single-layer organic film or a multilayer organic film selected from the group consisting of the xylylene-based organic films.

  Lead wires (not shown) are drawn out from the active matrix substrate 14 of the X-ray detector main body 11 accommodated in the housing 12 to the outside of the housing 12, for example, the edge of the active matrix substrate 14 and the base 18. This is done through wire bonding or the like between electrode pads (not shown) provided on the surface. Note that a lead wiring (not shown) provided on the surface of the base 18 is taken out to the outside through a through hole provided at a predetermined location of the base 18, for example.

  In the X-ray flat detector 10 of the present embodiment, as shown in the equivalent circuit diagram of FIG. 4, the scanning lines 29 and the signal lines 30 are arranged in a matrix, and a required number of pixels are two-dimensionally arranged. Each pixel includes a switching element 22, a charge storage capacitor 23, and a photoelectric conversion element 25. Here, the scanning line 29 becomes the gate electrode 22 a of the switching element 22, and the signal line 30 becomes the source electrode 22 c of the switching element 22. The charge storage capacitor 23 and the photoelectric conversion element 25 are connected to the drain electrode 22 d of the switching element 22 at the node 31.

  Further, at the node 31, the first invariant parasitic capacitor 32, which is a stray capacitance corresponding to the invariant parasitic capacitor described in the case of the prior art of FIG. 14, is one common to each pixel 16 in this embodiment. The first common variable capacitor 33 is connected in series. The first common variable capacitor 33 is connected to the ground potential including, for example, a variable parasitic capacitor generated between the X-ray detector main body 11 and the base 18 of the housing 12 and fluctuates due to vibration of the X-ray flat detector 10. Indicates the stray capacitance value.

  The first invariant parasitic capacitor 32 is a counter electrode composed of the drain electrode 22d, the one electrode 23a, the current collecting electrode 25a and the first conductive layer 17 in each pixel 16 in the specific structure shown in FIG. The stray capacitance value is almost fixed. Here, even if the opening pattern 34 described in FIG. 2 is formed in the first conductive layer 17, the electric flux generated between the counter electrodes of the first invariant parasitic capacitor 32 is a fringe effect generated at the edge of the opening pattern 34. It can be made not to change much. The stray capacitance value of the first invariant parasitic capacitor 32 is approximately the same as that without the opening pattern 34. Therefore, for example, the pattern width of the opening pattern 34 may be about 1/40 or less of the plate thickness of the insulating substrate 21. Specifically, for example, when the thickness of the insulating substrate 21 is 0.6 mm, the pattern width of the opening pattern 34 may be set to 15 μm or less.

  In the X-ray flat detector 10, the incident X-ray R becomes the scintillation light S in the scintillator layer 13, and the input image composed of the X-ray is converted into an optical image composed of the scintillation light S. This optical image is picked up by the above-described active matrix substrate 14 and is used as a digital image that is excellent in image quality performance and stability and is output in real time.

  In the X-ray flat panel detector 10 of the present embodiment, the microphonic noise that passes through the first common variable capacitor 33 is common to each pixel 16 when receiving the vibration of the external factor in the above-described operation of the X-ray flat panel detector 10. It comes to occur. For example, even if the gap between the X-ray detector main body 11 and the base 18 changes and the capacitance value of the first common variable capacitor 33, which is a microphonic phenomenon, changes, the capacitance value fluctuation is caused by the charge accumulation of each pixel 16. Similarly, the signal charge at the node 31 of the capacitor 23 is disturbed. Alternatively, for example, even if the first conductive layer 17 and the surface of the base 18 are brought into sliding contact with each other due to the vibration of the external factor and as a result, the first common variable capacitor 33 is electrostatically charged, The signal charge at the node 31 of the capacitor 23 is similarly disturbed.

  In addition, microphonic noise generated due to fluctuations in stray capacitance between the wiring and electrodes such as the signal lines 30 formed on the active matrix substrate 14 and the housing 12 is also generated in each pixel 16 in common. . As described above, the first conductive layer 17 has a function of equalizing the microphonic noise generated in different plane positions, that is, spatially, in the X-ray detector main body 11 between the pixels 16. This effect is particularly noticeable in an X-ray flat panel detector having a structure in which the X-ray detector main body 11 is fixed and supported in the housing 12 by pressurizing an elastic body such as a cushion member.

  The effect of equalizing the microphonic noise in the X-ray detector main body 11 of the first conductive layer 17 is achieved to the same extent if the opening pattern 34 has the pattern width as described above. Even if the pattern width of the opening pattern 34 is increased, the equalization effect of the first conductive layer 17 is generated as long as it is formed in close contact with the insulating substrate 21.

  The first conductive layer 17 is formed on the lower surface of the insulating substrate 21 so as to cover a region corresponding to a predetermined location where the pixels 16 are two-dimensionally arranged. Here, as described above, a region that is 1 mm or more inside from the edge of the active matrix substrate 14 on which the electrode pads are provided may be covered.

  In the present embodiment, in a medical diagnostic apparatus using an X-ray flat panel detector 10 or an imaging apparatus for an industrial nondestructive inspection apparatus, luminance unevenness of an X-ray image that has occurred in the prior art seems to be suppressed very simply. become. In order to suppress the spatial fluctuation of the dark image in the X-ray flat panel detector 10, the first conductive layer 17 is formed in the active matrix substrate 14 in close contact with the lower surface of the insulating substrate 21 with high reliability. This makes it extremely stable. In addition, the first conductive layer 17 can be easily formed even when the X-ray flat panel detector is enlarged, and can be applied without lowering the productivity of the X-ray flat panel detector 10, which is an extremely effective means.

  When the first conductive layer 17 has a partial residual gas in an interface region with the insulating substrate 21 or a partial peeling or crack from the insulating substrate 21, the X-ray flat panel detector 10 is in that place. Local vibration is generated along with vibration caused by external factors. On the contrary, the first conductive layer 17 causes microphonic noise of the X-ray flat panel detector 10 due to the local vibration. Therefore, as described above, for example, an opening portion of gas such as the opening pattern 34 or an opening portion that relieves stress strain is formed in the first conductive layer 17 so that the highly reliable adhesion can be easily performed. These problems are solved.

(Second Embodiment)
Next, the radiation detector by 2nd Embodiment is demonstrated with reference to FIG. 5 and FIG. In this embodiment, in the X-ray detector main body 11, a conductive layer is attached to the upper surface side of the scintillator layer 13 together with the back surface side of the active matrix substrate 14.

  The X-ray flat panel detector 40 that is a radiation detector has a structure in which the X-ray detector main body 11 is housed in the housing 12 in the same manner as in the first embodiment. In the X-ray detector main body 11, in the basic configuration, the scintillator layer 13 is deposited and formed on the active matrix substrate 14 by, for example, vacuum evaporation. Here, the scintillator layer 13 is formed of a high-intensity fluorescent material such as CsI in a columnar crystal structure. Then, a reflective layer 15 is formed on the surface of the scintillator layer 13 that has an uneven shape. A required number of pixels 16 are two-dimensionally arranged on the surface side of the active matrix substrate 14.

  On the back side of the active matrix substrate 14, a first conductive layer 17 similar to that described in the first embodiment is formed in close contact. A second conductive layer 41 is provided in close contact with the reflective layer 15 on the surface side of the scintillator layer 13.

  The X-ray detector main body 11 having the scintillator layer 13 and the active matrix substrate 14 is accommodated between the base 18 and the protective cover body 19. The protective cover body 19 is bonded to the edge of the base 18 via a resin adhesive layer 20, for example.

The first conductive layer 17 may be formed of a material that absorbs the scintillation light S and has a low reflectance, as described in the first embodiment. On the other hand, the second conductive layer 41 is preferably transparent to radiation. The second conductive layer 41 is made of a material that may absorb or reflect the scintillation light S. For example, it may be formed of a metal material selected from the group consisting of Al, Cu, Ni, Ti, Cr, Mg, Rh, Ag, Au, Pt and the like. Here, the sheet resistance of the first conductive layer 17 and the second conductive layer 41 is preferably 10 ¹² Ω / □ or less as described in the first embodiment, and is preferably 10 ⁶ Ω / □. □ or less is more preferable, and 1Ω / □ or less is most preferable.

  Further, the opening pattern 34 may be appropriately formed in the second conductive layer 41 as in the case of the first conductive layer 17. Here, when the opening pattern 34 is formed, if the pattern width of the opening pattern 34 is about 1/40 or less of the thickness of the scintillator layer 13, the influence of the opening pattern 34 on the second invariant parasitic capacitor 42. Is almost gone. Specifically, for example, when the thickness of the scintillator layer 13 is 200 μm, the pattern width of the opening pattern 34 may be 5 μm or less.

  Unlike the first embodiment, the reflective layer 15 is formed of a non-conductive film other than a metal thin film. For example, a material in which the light-reflecting material particles are bound to the organic film having a moisture-proof property by covering the uneven surface of the scintillator layer 13 with a binder can be suitably used. Here, the organic film is preferably a moisture-proof organic material such as paraxylylene.

  In the X-ray flat panel detector 40, an equivalent circuit of the two-dimensionally arranged pixels is as shown in FIG. In this case, the node 31 is different from the case of FIG. 3 in that the second invariant parasitic capacitor 42 is connected in series to one second common variable capacitor 43 common to the pixels 16. The second common variable capacitor 43 includes a variable parasitic capacitor generated between the X-ray detector main body 11 and the protective cover body 19 of the housing 12 and is connected to the ground potential, and fluctuates due to vibration of the X-ray flat panel detector 40. The stray capacitance value is shown. In the specific structure shown in FIG. 3, the second invariant parasitic capacitor 42 is, for example, substantially fixed between the drain electrode 22d, the one electrode 23a and the current collecting electrode 25a and the second conductive layer 41 in each pixel 16. Stray capacitance value is shown.

  In the X-ray flat panel detector 40 of the present embodiment, microphonic noise that has passed through one first common variable capacitor 33 is generated in common to each pixel 16 when receiving an external factor vibration in its operation. For example, even if the gap between the X-ray detector main body 11 and the base 18 changes and the capacitance value of the first common variable capacitor 33, which is a microphonic phenomenon, changes, the capacitance value fluctuations are caused by the charge of each pixel 16. The signal charge at the node 31 of the storage capacitor 13 is similarly disturbed. Alternatively, even if, for example, sliding contact between the first conductive layer 17 and the surface of the base 18 occurs due to the vibration of the external factor, and the electrostatic charge is generated in the first common variable capacitor 33 as a result, the charge accumulation of each pixel 16 The signal charge at the node 31 of the capacitor 13 is similarly disturbed.

  Further, when the vibration of an external factor is received in the operation of the X-ray flat panel detector 40, microphonic noise that passes through one second common variable capacitor 43 is commonly generated in each pixel 16. For example, even if the gap between the X-ray detector main body 11 and the protective cover body 19 changes and the capacitance value of the second common variable capacitor 43, which is a microphonic phenomenon, changes, the capacitance value fluctuations of each pixel 16 The signal charge at the node 31 of the charge storage capacitor 13 is similarly disturbed.

  In addition, microphonic noise generated due to fluctuations in stray capacitance between the wiring and electrodes such as the signal lines 30 formed on the active matrix substrate 14 and the housing 12 is also generated in each pixel 16 in common. . As described above, the first conductive layer 17 and the second conductive layer 41 have a function of equalizing the microphonic noise generated in different plane positions, that is, spatially, in the X-ray detector main body 11 between the pixels 16. Have.

  In the present embodiment, in the medical diagnostic apparatus using the X-ray flat panel detector 10 and the imaging apparatus of the industrial nondestructive inspection apparatus, the luminance unevenness of the X-ray image that has occurred in the prior art is extremely easily and stably suppressed. Will come to be. This effect is greater than in the case of the first embodiment. In particular, it appears prominently when the reflective layer 15 is formed of a non-conductive film on the uneven surface of the scintillator layer 13.

(Third embodiment)
Next, the radiation detector by 3rd Embodiment is demonstrated with reference to FIG. 7 and FIG. In the third embodiment, for example, the conductive layer as described in the second embodiment is fixed at a constant potential.

  In the X-ray flat detector 50 shown in FIG. 7, the first conductive layer 17 and the second conductive layer 41 attached to the X-ray detector main body 11 as described in the second embodiment include the X-ray detector 50. The first wiring 51 and the second wiring 52 are connected to the protective cover body 19 of the housing 12 housing the line detector main body 11. Also in this case, the protective cover body 19 includes a conductor, and is grounded, for example. In this way, the first conductive layer 17 and the second conductive layer 41 are fixed to the ground potential. Note that the second conductive layer 41 can reflect the scintillation light S and may also be used as the reflective layer 15.

  In the X-ray flat panel detector 50, an equivalent circuit of the two-dimensionally arranged pixels is as shown in FIG. In this equivalent circuit, both the electrode terminals of the first common variable capacitor 33 and the second common variable capacitor 43 are fixed to the ground potential. This point is greatly different from the case of the second embodiment, and other circuit configurations are the same as those described in FIG.

  In the housing 12, the protective cover body 19 may be fixed to a constant potential other than the ground potential. Here, the first wiring 51 and the second wiring 52 are, for example, disposed as lead wirings on the surface of the base 18 of the housing 12 and connected to the protective cover body 19. Alternatively, as described in the first embodiment, it is drawn out of the housing 12 through a through hole provided in the base 18 and connected to a constant potential.

  In the X-ray flat panel detector 50 of the present embodiment, the microphonic noise that has passed through the first common variable capacitor 33 and the second common variable capacitor 43 disappears almost completely when subjected to the vibration of an external factor in its operation.

  For example, even if the gap between the X-ray detector main body 11 and the base 18 changes and the capacitance value of the first common variable capacitor 33, which is a microphonic phenomenon, changes, the capacitance value fluctuation is caused by the charge accumulation of each pixel 16. The signal charge at the node 31 of the capacitor 13 is not disturbed. Alternatively, even if, for example, the first conductive layer 17 and the surface of the base 18 are in sliding contact with each other due to the vibration of the external factor, the first common variable capacitor 33 is not charged electrostatically. Similarly, even if the protective cover body 19 of the housing 12 vibrates and the capacitance value of the second common variable capacitor 43, which is a microphonic phenomenon, changes, the capacitance value change is caused by the charge storage capacitor 13 of each pixel 16. The signal charge at the node 31 is not disturbed.

  In addition, microphonic noise caused by fluctuations in stray capacitance between wirings and electrodes such as the signal lines 30 formed on the active matrix substrate 14 and the housing 12 is eliminated.

  The effect of suppressing the microphonic noise of the first conductive layer 17 or the second conductive layer 41 is about the same as the case where there is no opening pattern 34 if the opening pattern 34 has a pattern width as described in FIG. To be played. Even if the pattern width of the opening pattern 34 is increased, the effect of these conductive layers is generated as long as it is formed so as to be in close contact with the lower surface of the insulating substrate 21 or the upper surface side of the scintillator layer 13. .

  As described above, the first conductive layer 17 and the second conductive layer 41 are used in medical imaging apparatuses using the X-ray flat panel detector 50 and in imaging apparatuses such as industrial nondestructive inspection apparatuses. It suppresses temporal dark image fluctuations as well as spatial dark image fluctuations. In addition, luminance unevenness is easily suppressed, and an X-ray image or digital signal recorded in real time has extremely high reliability.

  In the operation of the X-ray flat panel detector in the imaging apparatus, a method is generally employed in which the signal charge is measured in advance in a dark state before imaging and is subtracted at the time of radiation measurement (bright state). By suppressing the microphonic noise that changes with time as in the present embodiment, the subtraction amount is not affected by vibration. Also by this, the X-ray image or digital signal recorded in real time described above has extremely high reliability.

  In the third embodiment, the case where the first conductive layer 17 and the second conductive layer 41 as described in the second embodiment are fixed at a constant potential has been described. Either the conductive layer 17 or the second conductive layer 41 may be fixed at a constant potential. Further, in the X-ray flat panel detector 10 as described in the first embodiment, the first conductive layer 17 may be structured to be fixed at a constant potential. Thus, by setting the first conductive layer 17 or the second conductive layer 41 to a constant potential, the spatial and temporal fluctuation of the dark image is reduced.

(Fourth embodiment)
Next, the radiation detector by 4th Embodiment is demonstrated with reference to FIG. 9 and FIG. In the fourth embodiment, for example, a noise cancellation signal that acts to reduce microphonic noise is added to the conductive layer as described in the third embodiment.

  For example, in the X-ray flat detector 60 shown in FIG. 9, the first conductive layer 17 attached to the X-ray detector main body 11 as described in FIG. The first voltage signal generator 62 is connected to the first voltage signal generator 62 through the first wiring 71 taken out. Similarly, the second conductive layer 41 is connected to the second voltage signal generator 64 through the second wiring 63. Note that the second conductive layer 41 can reflect the scintillation light S and may also be used as the reflective layer 15.

  An equivalent circuit diagram of the X-ray flat panel detector 60 of FIG. 9 is as shown in FIG. As shown in this equivalent circuit, the first voltage signal generator 62 is connected to the first common variable capacitor 33, and the second voltage signal generator 64 is connected to the second common variable capacitor 43. The first voltage signal generator 62 generates a voltage signal that reduces microphonic noise generated by the microphonic phenomenon between the X-ray detector main body 11 and the base 18 of the housing 12, that is, a noise cancellation signal. 1 is added to the common variable capacitor 33. Similarly, the second voltage signal generator 64 is a voltage signal that reduces microphonic noise generated by the microphonic phenomenon between the X-ray detector main body 11 and the protective cover body 19 of the housing 12, that is, a noise cancellation signal. Is added to the second common variable capacitor 43.

  Here, the voltage signals in the first voltage signal generator 62 and the second voltage signal generator 64 are usually different from each other. However, these voltage signals may be the same. In this case, one of the first voltage signal generator 62 and the second voltage signal generator 64 is shared. The noise cancellation voltage signal may be applied to either the first conductive layer 17 or the second conductive layer 41.

  The voltage signal for reducing the microphonic noise is, for example, an anti-vibration generating means (speaker) when the vibration of the external factor becomes, for example, a substantially periodic vibration, as in a vehicle-mounted or mobile X-ray flat panel detector. It can be easily generated from the inverse noise of the microphonic noise measured in advance. In addition, a reference signal generated based on detection of vibration of the vibration source may be used to feedback control the reverse vibration generating means to generate real-time reverse noise.

  In the present embodiment, the same effects as those described in the third embodiment are achieved in the medical diagnostic apparatus using the X-ray flat panel detector 60 and the imaging apparatus of the industrial nondestructive inspection apparatus. Furthermore, many vibrations due to external factors include a lot of high frequency components. In the X-ray detector main body 11, for example, the first invariant parasitic capacitor 32 or the second invariant parasitic capacitor 42 also causes stray capacitance fluctuations, resulting in microphonic noise. Even in this case, the X-ray flat panel detector as in the present embodiment can cope.

  Next, although an effect is concretely demonstrated by an Example, this invention is not limited to the following Example.

(Examples and comparative examples)
The X-ray flat panel detectors used in the examples and comparative examples have cross-sectional structures as shown in FIGS. 1 and 13, respectively. Here, the difference between the example and the comparative example is the presence or absence of a conductive layer. The planar shape of these X-ray flat detectors is a square of the same size, and is about 17 inches square size. The outline of the main configuration of the other X-ray flat panel detector is as follows.

Conductive layer: Resin conductive sheet having an opening pattern 34 of 10 μm size shown in FIG. 2A and pressure-bonded to the glass plate surface with an adhesive X-ray detector main body: as described in FIG. Similar structure Housing: Base is made of ceramic, protective cover body is made of Al

  A test for resistance to microphonic noise was performed on the X-ray flat panel detectors of Examples and Comparative Examples prepared above. The test condition was that a 170 g weight was dropped from a height of 4 cm onto an X-ray flat detector without applying X-rays, and vibration was applied. And the dark image which is a display image at that time was image | photographed.

  In the X-ray flat detector of the example, as shown in FIG. 11, no large microphonic noise was observed in the dark image. In contrast, in the X-ray flat panel detector of the comparative example, remarkable microphonic noise was observed in the dark image as shown in FIG. In particular, luminance unevenness occurred in the dark image in the area where the weight fell. From this result, it was confirmed that the X-ray flat panel detector of this embodiment can improve the resistance to microphonic noise with a simple method. Note that the reflective layer 15 shown in FIG. 1 has conductivity, and has the same effect as the second conductive layer 41 described in FIG.

  For convenience, the description has been made using the terms “upper surface” and “lower surface”. The “upper surface” and the “lower surface” mean that they are in a relationship of front and back, and do not mean spatial top and bottom.

(Other embodiments)
Although several embodiments of the present invention have been described, these embodiments are presented by way of example and are not intended to limit the scope of the invention. These novel embodiments can be implemented in various other forms, and various omissions, replacements, and changes can be made without departing from the scope of the invention. These embodiments and modifications thereof are included in the scope and gist of the invention, and are included in the invention described in the claims and the equivalents thereof.

  For example, instead of the indirect X-ray flat panel detector described in the above embodiment, a direct X-ray flat panel detector that directly converts X-rays into a charge signal using a photoconductive film such as a-Se is used. Alternatively, the conductive layer may be attached.

  There are various structures of X-ray flat panel detectors. In the above embodiment, an X-ray flat panel detector having a structure that easily explains microphonic noise is shown. In addition, the X-ray flat panel detector may have a structure in which the X-ray detector main body is not accommodated in the housing.

  Further, the X-ray flat panel detector may have a structure in which the X-ray detector main body is fixed and supported on the base without being housed in the housing. The base may be made of a conductor or a semiconductor other than the insulator.

  Further, the X-ray flat panel detector has a structure in which a protective cover body that covers the scintillator layer of the X-ray detector main body so as to prevent moisture is attached without the X-ray detector main body being housed in the housing. Also good.

  In the X-ray flat panel detector, the active matrix substrate has a structure in which the first conductive layer 17 is not formed on the lower surface of the insulating substrate and the second conductive layer is formed on the upper surface side of the scintillator layer. It may be.

  Further, the radiation detector in the present embodiment may have a structure like a so-called one-dimensional image sensor in addition to a two-dimensional image sensor such as an FPD. In this case, a CCD, CMOS, or the like may be used as the solid-state image sensor of the image sensor. The radiation detector may be for detecting and identifying a subject in addition to image formation.

  In addition to the electromagnetic waves (radiated X-rays) radiated from the acceleration motion of the charged substance, the radiation incident on the radiation detector is electromagnetic waves generated from changes in the atomic state, such as characteristic X-rays, or electromagnetic waves such as ultraviolet rays. It may be.

  For example, the scintillator layer 13 is provided in a separate scintillator panel, and it can be similarly applied to a radiation detector having a structure in which the scintillator panel and a substrate having a solid-state imaging device are arranged apart from each other.

10, 40, 50, 60 ... X-ray flat detector, 11 ... X-ray detector body, 12 ... Housing, 13 ... Scintillator layer, 14 ... Active matrix substrate, 15 ... Reflective layer, 16 ... Pixel, 17 ... First DESCRIPTION OF SYMBOLS 1 Conductive layer, 18 ... Base, 19 ... Protective cover body, 20 ... Adhesive layer, 21 ... Insulating substrate, 22 ... Switching element, 22a ... Gate electrode, 22b ... Gate insulating film, 22c ... Source electrode, 22d ... Drain electrode, 23 ... Charge storage capacitor, 23a ... One electrode, 23b ... Counter electrode, 24 ... Interlayer insulating layer, 25 ... Photoelectric conversion element, 25a ... Pixel electrode (collecting electrode), 25b ... Translucent electrode, 26 ... Junction layer, 27 ... first protective layer, 28 ... second protective layer, 29 ... control line (scan line), 30 ... read line (signal line), 31 ... node, 32 ... first invariant parasitic capacitor, 33 ... First common variable capacity 34 ... opening pattern 41 ... second conductive layer 42 ... second invariant parasitic capacitor 43 ... second common variable capacitor 51,71 ... first wiring 52,63 ... second wiring, 62 ... 1st voltage signal generation part, 64 ... 2nd voltage signal generation part

Claims (12)

A radiation detector for generating an image of the subject from radiation transmitted through the subject,
An insulating substrate having a plurality of pixels arranged on the upper surface for generating the image;
A first conductive layer formed in close contact with the lower surface of the insulating substrate and formed to suppress microphonic noise generated by vibration of the radiation detector;
The radiation detector, wherein the first conductive layer has air permeability.   The first conductive layer is made of a conductive sheet of an organic material, has a plurality of opening patterns, and is attached to the lower surface of the insulating substrate through the opening patterns. The radiation detector according to claim 1, wherein the introduced gas is removed from an interface between the insulating substrate and the first conductive layer.   The radiation detection is characterized in that the first conductive layer is made of an inorganic material, and stress strain applied from the insulating substrate to the first conductive layer is relaxed through the opening pattern. vessel. The insulating substrate is supported by a base from its lower surface,
The radiation detector according to any one of claims 1 to 3, wherein the first conductive layer suppresses microphonic noise generated by vibration of the base.   The scintillator layer for converting the radiation into light is formed on the upper surface side of the insulating substrate, and the light receiving element for converting the light into an electric signal is provided in the pixel. A radiation detector according to claim 1.   The radiation detector according to claim 5, wherein a protective cover body that covers the scintillator layer and prevents moisture is formed.   The radiation detector according to claim 5, wherein a housing having the base and a protective cover body bonded at an edge of the base contains the insulating substrate and the scintillator layer. .   The radiation detector according to claim 5, wherein the first conductive layer absorbs light generated by the scintillator layer and transmitted through the insulating substrate.   The second conductive layer for suppressing microphonic noise generated by vibration of the radiation detector is formed on the upper surface side of the scintillator layer. Radiation detector.   The radiation detector according to any one of claims 1 to 4, wherein a photoconductive film for converting the radiation into an electric signal is formed on an upper surface side of the insulating substrate.   The radiation detector according to claim 1, wherein the first conductive layer or the second conductive layer is fixed at a constant potential.   The radiation detection according to claim 1, wherein a voltage signal that reduces the microphonic noise is applied to the first conductive layer or the second conductive layer. vessel.