JP2012505533A5 - - Google Patents

Download PDF

Info

Publication number
JP2012505533A5
JP2012505533A5 JP2011530409A JP2011530409A JP2012505533A5 JP 2012505533 A5 JP2012505533 A5 JP 2012505533A5 JP 2011530409 A JP2011530409 A JP 2011530409A JP 2011530409 A JP2011530409 A JP 2011530409A JP 2012505533 A5 JP2012505533 A5 JP 2012505533A5
Authority
JP
Japan
Prior art keywords
tilt
micromirror
control
actuators
assigned
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2011530409A
Other languages
English (en)
Japanese (ja)
Other versions
JP2012505533A (ja
JP5325301B2 (ja
Filing date
Publication date
Priority claimed from DE102008050446A external-priority patent/DE102008050446B4/de
Application filed filed Critical
Publication of JP2012505533A publication Critical patent/JP2012505533A/ja
Publication of JP2012505533A5 publication Critical patent/JP2012505533A5/ja
Application granted granted Critical
Publication of JP5325301B2 publication Critical patent/JP5325301B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2011530409A 2008-10-08 2009-10-06 マイクロミラーを駆動する方法及びデバイス Active JP5325301B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US10369108P 2008-10-08 2008-10-08
DE102008050446.7 2008-10-08
US61/103,691 2008-10-08
DE102008050446A DE102008050446B4 (de) 2008-10-08 2008-10-08 Verfahren und Vorrichtungen zur Ansteuerung von Mikrospiegeln
PCT/EP2009/007175 WO2010040506A1 (en) 2008-10-08 2009-10-06 Methods and devices for driving micromirrors

Publications (3)

Publication Number Publication Date
JP2012505533A JP2012505533A (ja) 2012-03-01
JP2012505533A5 true JP2012505533A5 (https=) 2012-04-12
JP5325301B2 JP5325301B2 (ja) 2013-10-23

Family

ID=41821122

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011530409A Active JP5325301B2 (ja) 2008-10-08 2009-10-06 マイクロミラーを駆動する方法及びデバイス

Country Status (8)

Country Link
US (2) US8345224B2 (https=)
EP (2) EP3193203B1 (https=)
JP (1) JP5325301B2 (https=)
KR (1) KR101233900B1 (https=)
CN (2) CN102177460A (https=)
DE (1) DE102008050446B4 (https=)
TW (1) TWI502282B (https=)
WO (1) WO2010040506A1 (https=)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102008050446B4 (de) 2008-10-08 2011-07-28 Carl Zeiss SMT GmbH, 73447 Verfahren und Vorrichtungen zur Ansteuerung von Mikrospiegeln
JP5587917B2 (ja) 2009-03-13 2014-09-10 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光装置
DE102010062720B4 (de) 2010-12-09 2012-07-12 Carl Zeiss Smt Gmbh EUV-Lithographiesystem
US9599905B2 (en) 2011-06-07 2017-03-21 Nikon Corporation Illumination optical system, exposure apparatus, device production method, and light polarization unit
TWI557432B (zh) 2011-06-13 2016-11-11 尼康股份有限公司 照明方法、曝光方法、元件製造方法、照明光學系統、以及曝光裝置
CN107390477B (zh) 2011-10-24 2020-02-14 株式会社尼康 照明系统、曝光装置及制造、图像形成、照明与曝光方法
US9732934B2 (en) 2011-10-28 2017-08-15 Nikon Corporation Illumination device for optimizing polarization in an illumination pupil
WO2013071940A1 (en) 2011-11-15 2013-05-23 Carl Zeiss Smt Gmbh Light modulator and illumination system of a microlithographic projection exposure apparatus
DE102013201506A1 (de) 2012-02-17 2013-08-22 Carl Zeiss Smt Gmbh Optisches Bauelement
DE102013201509A1 (de) 2012-02-17 2013-08-22 Carl Zeiss Smt Gmbh Optisches Bauelement
KR102170864B1 (ko) 2012-05-02 2020-10-28 가부시키가이샤 니콘 동공 휘도 분포의 평가 방법 및 개선 방법, 조명 광학계 및 그 조정 방법, 노광 장치, 노광 방법, 및 디바이스 제조 방법
DE102012011202A1 (de) * 2012-06-06 2013-09-12 Carl Zeiss Smt Gmbh Projektor und Verfahren zum Erzeugen eines Bildes
WO2014187599A1 (en) * 2013-05-22 2014-11-27 Carl Zeiss Smt Gmbh Optical component comprising an optical device and means for reducing radiation-induced influences on said optical device
DE102013212613B4 (de) * 2013-06-28 2015-07-23 Carl Zeiss Sms Gmbh Beleuchtungsoptik für ein Metrologiesystem sowie Metrologiesystem mit einer derartigen Beleuchtungsoptik
JP6273109B2 (ja) * 2013-08-28 2018-01-31 株式会社ミツトヨ 光干渉測定装置
DE102014203188A1 (de) 2014-02-21 2015-08-27 Carl Zeiss Smt Gmbh Verfahren zur Beleuchtung eines Objektfeldes einer Projektionsbelichtungsanlage
CN104111592B (zh) * 2014-08-06 2016-06-08 中国科学院光电技术研究所 一种基于微反射镜阵列实现可变自由照明光瞳的方法
CN105573061B (zh) * 2014-10-16 2018-03-06 中芯国际集成电路制造(上海)有限公司 Euv光源和曝光装置
DE102017217164B4 (de) 2017-09-27 2020-10-15 Continental Automotive Gmbh Projektionsvorrichtung zum Erzeugen eines pixelbasierten Beleuchtungsmusters
DE102018202421B3 (de) 2018-02-16 2019-07-11 Carl Zeiss Microscopy Gmbh Vielstrahl-Teilchenstrahlsystem
DE102018216344A1 (de) * 2018-09-25 2020-03-26 Carl Zeiss Smt Gmbh Abstützung eines optischen elements
CN110347082B (zh) * 2019-07-12 2021-07-27 中国科学院上海微系统与信息技术研究所 一种驱动电路、驱动方法及微反射镜阵列
CN110954142B (zh) * 2019-12-10 2021-12-28 京东方科技集团股份有限公司 一种光学微电机传感器、基板及电子设备
CN114660880A (zh) * 2022-04-11 2022-06-24 长沙沃默科技有限公司 一种反射式投影成像装置及其设计方法
CN116698367A (zh) * 2023-05-23 2023-09-05 上海镭望光学科技有限公司 微反射镜阵列反射光光斑位置标定方法、装置及标定设备
DE102023207368A1 (de) * 2023-08-01 2025-02-06 Carl Zeiss Smt Gmbh Ansteuervorrichtung, optisches system und lithographieanlage

Family Cites Families (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6312134B1 (en) * 1996-07-25 2001-11-06 Anvik Corporation Seamless, maskless lithography system using spatial light modulator
JP2863502B2 (ja) * 1996-10-23 1999-03-03 防衛庁技術研究本部長 マルチディザー方式補償光学装置
US7006595B2 (en) * 1998-05-05 2006-02-28 Carl Zeiss Semiconductor Manufacturing Technologies Ag Illumination system particularly for microlithography
KR100716946B1 (ko) 2000-07-20 2007-05-10 삼성전자주식회사 마이크로미러 액추에이터를 이용한 광결합 구조체
KR100332888B1 (ko) 2000-08-25 2002-04-15 이형도 마이크로 미러를 이용한 광 픽업 액츄에이터
US6300665B1 (en) * 2000-09-28 2001-10-09 Xerox Corporation Structure for an optical switch on a silicon on insulator substrate
JP2002189176A (ja) * 2000-12-20 2002-07-05 Mitsubishi Electric Corp ミラー駆動装置
KR100389865B1 (ko) * 2001-03-02 2003-07-04 삼성전자주식회사 마이크로미러 디바이스 및 이를 채용한 프로젝터
US6735004B1 (en) * 2001-03-15 2004-05-11 Nanogear, Inc. Rotatable counterbalanced actuator
JP3724432B2 (ja) * 2001-04-19 2005-12-07 株式会社ニコン 薄膜弾性構造体及びその製造方法並びにこれを用いたミラーデバイス及び光スイッチ
JP3908503B2 (ja) * 2001-10-30 2007-04-25 富士通株式会社 光スイッチ
US6643053B2 (en) * 2002-02-20 2003-11-04 The Regents Of The University Of California Piecewise linear spatial phase modulator using dual-mode micromirror arrays for temporal and diffractive fourier optics
US6717325B2 (en) * 2002-03-06 2004-04-06 Glimmerglass Networks, Inc. Method and apparatus for actuation of a two-axis MEMS device using three actuation elements
US6707534B2 (en) * 2002-05-10 2004-03-16 Anvik Corporation Maskless conformable lithography
EP1367446A1 (en) * 2002-05-31 2003-12-03 ASML Netherlands B.V. Lithographic apparatus
KR100464320B1 (ko) * 2002-11-19 2004-12-31 삼성전자주식회사 마이크로미러 액츄에이터 및 그 제조방법
US6906848B2 (en) * 2003-02-24 2005-06-14 Exajoule, Llc Micromirror systems with concealed multi-piece hinge structures
JP4244156B2 (ja) * 2003-05-07 2009-03-25 富士フイルム株式会社 投影露光装置
JP4357317B2 (ja) * 2003-05-13 2009-11-04 富士通株式会社 ティルトミラーの制御装置及び制御方法
DE10343333A1 (de) * 2003-09-12 2005-04-14 Carl Zeiss Smt Ag Beleuchtungssystem für eine Mikrolithographie-Projektionsbelichtungsanlage
JP4717813B2 (ja) * 2003-09-12 2011-07-06 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光設備のための照明系
US7304783B2 (en) * 2003-11-01 2007-12-04 Fusao Ishii Control of micromirrors with intermediate states
US7646528B2 (en) * 2006-12-26 2010-01-12 Silicon Quest Kabushiki-Kaisha Deformable mirror device with oscillating states
CN100528735C (zh) * 2004-03-08 2009-08-19 松下电器产业株式会社 微致动器以及具有微致动器的装置
US7855825B2 (en) * 2005-04-15 2010-12-21 Panasonic Corporation Micromachine structure system and method for manufacturing same
JP2007264305A (ja) * 2006-03-28 2007-10-11 Fujitsu Ltd 光スイッチシステム
DE102006020734A1 (de) * 2006-05-04 2007-11-15 Carl Zeiss Smt Ag Beleuchtungssystem für die EUV-Lithographie sowie erstes und zweites optisches Element zum Einsatz in einem derartigen Beleuchtungssystem
US9250536B2 (en) * 2007-03-30 2016-02-02 Asml Netherlands B.V. Lithographic apparatus and method
WO2009026947A1 (en) * 2007-08-30 2009-03-05 Carl Zeiss Smt Ag Illumination system for illuminating a mask in a microlithographic projection exposure apparatus
WO2009080310A1 (en) * 2007-12-21 2009-07-02 Carl Zeiss Smt Ag Illumination system for a microlithographic projection exposure apparatus
DE102008050446B4 (de) 2008-10-08 2011-07-28 Carl Zeiss SMT GmbH, 73447 Verfahren und Vorrichtungen zur Ansteuerung von Mikrospiegeln

Similar Documents

Publication Publication Date Title
JP2012505533A5 (https=)
JP5325301B2 (ja) マイクロミラーを駆動する方法及びデバイス
JP6946654B2 (ja) 制御装置、制御方法、および、制御プログラム
JP2005310109A (ja) 自己較正センサー指向システム
JP2018128838A (ja) 制御装置、制御方法、および、制御プログラム
JP6848710B2 (ja) プラント制御調整装置及び方法
US12053332B2 (en) Method for operating a surgical microscopy system, and surgical microscopy system
JP2009237916A (ja) サーボ制御装置
WO2008053772A1 (en) Motor control device, and its control method
JP6519458B2 (ja) 制御装置
JP2019053594A (ja) 制御装置及び機械学習装置
US7003379B2 (en) Limit cycle autotuning method and heat/cool control apparatus
CN101943889A (zh) 使电气传动系统调节器自动启动和/或运行的方法及装置
JP2009157691A (ja) オートチューニング方法、温度調節器および熱処理装置
CN109814095B (zh) 一种多目标红外仿真系统的动态空间位置模拟方法
JP4485896B2 (ja) Ｐｉｄ制御装置
CN108290287A (zh) 具有对位置和/或姿势的离散化手动输入的控制的机器人
JP2007227207A (ja) 焦点調整方法及び焦点調整装置
JP5168544B2 (ja) プラント運転支援装置
KR100222763B1 (ko) 로봇의 위치제어용 선형출력 제어장치 및 방법
JP7152118B2 (ja) 空調システムの最適起動制御装置
JP6592359B2 (ja) レンズ装置及びそれを有する撮像装置
JP3873853B2 (ja) 温度調節器および熱処理装置
Soleimani-Mohseni Modelling and intelligent climate control of buildings.
TW200540586A (en) Leveling apparatus