JP2012132086A - Deposition material for forming thin film, thin-film sheet having the thin film, and laminated sheet - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide: a deposition material suitable for forming a thin film excellent in transparency and gas barrier property; a thin-film sheet having the thin film; and a laminated sheet.SOLUTION: In the deposition material manufactured by mixing first oxide powder and second oxide powder, the first oxide powder is TiOpowder, the first oxide purity of the first oxide powder is not lower than 98%, the second oxide powder is one kind of powder or two or more kinds of mixed powder which are selected from a group composed of ZnO, MgO and CaO, the second oxide purity of the second oxide powder is not lower than 98%, the deposition material is composed of a pellet containing a first oxide particle and a second oxide particle, a mol ratio between a first oxide and a second oxide in deposition is 5 to 85:95 to 15, and the basicity of the pellet is not lower than 0.1.

Description

  The present invention relates to a vapor deposition material suitable for forming a thin film excellent in various properties such as transparency and gas barrier properties, a thin film sheet including the thin film, and a laminated sheet. More particularly, the present invention relates to a vapor deposition material used for forming a thin film suitable as a gas barrier material for a liquid crystal display, an organic EL display or a solar cell module, a thin film sheet including the thin film, and a laminated sheet. .

  Devices such as liquid crystal displays, organic EL displays, or solar cells are generally vulnerable to moisture, and their characteristics are rapidly degraded by moisture absorption. Therefore, they have high moisture resistance, that is, gas barrier properties that prevent permeation or penetration of oxygen, water vapor, and the like. It is essential to equip the parts.

  For example, in the example of a solar cell, the back sheet is provided on the back surface opposite to the light receiving surface of the solar cell module. This back sheet is typically composed of a gas barrier material having high moisture resistance and a member for protecting them as a base material.

  As a back sheet constituting such a solar cell module, for example, a solar cell module in which a moisture-proof metal foil is sandwiched by a high-strength heat-resistant weather-resistant resin and a glassy vapor-deposited film is provided on one of the moisture-proof metal foils. A sheet material for protecting the back surface is disclosed (for example, see Patent Document 1). In this sheet material, a metal foil such as an aluminum foil, a galvanized iron foil, or a tin-plated iron foil is used as a gas barrier material. Moreover, the solar cell which used the solar cell cover material formed by laminating | stacking and integrating a high moisture-proof film and a high weather resistance film for the back surface side protection member is disclosed (for example, refer patent document 2). The high moisture-proof film in this solar cell cover material is a coating film of inorganic oxides such as silica and alumina by a base film such as a PET film, a gas barrier material by CVD (chemical vapor deposition), PVD (reactive vapor deposition), etc. What formed the moisture-proof film | membrane which consists of is used. Moreover, the photovoltaic module provided with the barrier layer which consists of a plastic film or a plastic composite material which exhibits an inorganic oxide layer is disclosed (for example, refer patent document 3). In this inorganic oxide layer, aluminum oxide or silicon oxide is used as a coating material.

Japanese Utility Model Publication 2-44995 (Utility Model Registration Request and Columns 41-44) JP 2000-174296 A (Claim 1, claim 7 and paragraph [0019]) JP-T-2002-520820 (Claim 1 and paragraph [0019])

  However, since the sheet material for back surface protection shown in Patent Document 1 uses a metal foil such as an aluminum foil as a gas barrier material, when this sheet material is applied to a back sheet of a solar cell module, a withstand voltage is obtained. May decrease and current may leak. Further, in the sheet material using the metal foil, when the thickness of the metal foil is 20 μm or less, pinholes generated between the heat resistant weather resistant resin and the metal foil are increased, and the gas barrier property is remarkably lowered. On the other hand, if the thickness of the metal foil is increased, there arises a problem that the manufacturing cost increases. In addition, in the case of inorganic oxides such as silica and alumina used in Patent Documents 2 and 3, the film thickness must be 100 nm or more in order to obtain high gas barrier properties, and the gas barrier properties are still sufficient. I can't say that.

  The objective of this invention is providing the vapor deposition material suitable for forming the thin film excellent in transparency and gas barrier property.

  Another object of the present invention is to provide a thin film sheet and a laminated sheet provided with a thin film excellent in transparency and gas barrier properties.

According to a first aspect of the present invention, in the vapor deposition material produced by mixing the first oxide powder and the second oxide powder, the first oxide powder is a TiO ₂ powder, and the first oxidation The first oxide purity of the product powder is 98% or more, and the second oxide powder is one kind of powder selected from the group consisting of ZnO, MgO and CaO or two or more kinds of mixed powder, The second oxide purity of the second oxide powder is 98% or more, the vapor deposition material is composed of pellets containing the first oxide particles and the second oxide particles, and the first oxide and the second oxide in the vapor deposition material. The molar ratio with the oxide is 5 to 85:95 to 15, and the basicity of the pellet is 0.1 or more.

  A second aspect of the present invention is an invention based on the first aspect, wherein the average particle diameter of the first oxide particles is 0.1 to 10 μm, and the average particle diameter of the second oxide particles is It is 0.1-10 micrometers, It is characterized by the above-mentioned.

  According to a third aspect of the present invention, the metal element A and the first element contained in the first oxide are formed on the first base film by a vacuum film formation method using the vapor deposition material based on the first or second aspect as a target material. An oxide thin film containing a metal element B contained in two oxides is formed.

  As shown in FIG. 1, the fourth aspect of the present invention is the first oxide on the first base film 11 by a vacuum film forming method using the vapor deposition material based on the first or second aspect as a target material. The oxide thin film 12 containing the metal element A contained in the metal oxide B and the metal element B contained in the second oxide is formed, and the molar ratio of the metal element A to the metal element B in the thin film 12 is 5 to 85:95. It is the thin film sheet 10 which is ~ 15.

  A fifth aspect of the present invention is an invention based on the fourth aspect, wherein the vacuum film forming method is an electron beam vapor deposition method, an ion plating method, a reactive plasma vapor deposition method, a resistance heating method or an induction heating method. It is either.

A sixth aspect of the present invention is an invention based on the fourth or fifth aspect, and further has a water vapor permeability S of 0.3 g when left for 1 hour under the conditions of a temperature of 20 ° C. and a relative humidity of 50% RH. / M ² · day or less.

  The seventh aspect of the present invention is the invention based on the sixth aspect, and further, after standing for 1 hour under conditions of a temperature of 20 ° C. and a relative humidity of 50% RH, a condition of a temperature of 85 ° C. and a relative humidity of 90% RH. Further, when the water vapor permeability when left for 100 hours is T, the rate of change of the water vapor permeability T with respect to the water vapor permeability S (T / S × 100) is 200% or less.

  As shown in FIG. 1, the eighth aspect of the present invention is that a second base film 14 is laminated via an adhesive layer 13 on the thin film 12 forming side of the thin film sheet 10 based on the fourth to seventh aspects. It is the laminated sheet 20 which becomes.

In the vapor deposition material according to the first aspect of the present invention, the first oxide powder is a TiO ₂ powder, and the first oxide purity of the first oxide powder is 98% or more. Is a powder selected from the group consisting of ZnO, MgO and CaO, or a mixed powder of two or more kinds, and the second oxide purity of the second oxide powder is 98% or more, and the deposition material is It consists of pellets containing the first oxide particles and the second oxide particles, the molar ratio of the first oxide to the second oxide in the vapor deposition material is 5 to 85:95 to 15, and the pellets When the basicity is 0.1 or more, it is possible to form a thin film whose gas barrier properties are significantly improved as compared with conventional gas barrier materials.

  In the vapor deposition material according to the second aspect of the present invention, the average particle diameter of the first oxide particles is 0.1 to 10 μm, and the average particle diameter of the second oxide particles is 0.1 to 10 μm. Since it can be formed into a dense vapor-deposited film with good vapor deposition efficiency, high gas barrier properties can be maintained and stabilized.

  In the thin film sheet according to the fourth aspect of the present invention, the molar ratio of the metal element A and the metal element B in the thin film containing the metal element A contained in the first oxide and the metal element B contained in the second oxide is By providing the thin film which is 5-85: 95-15, it has the outstanding transparency and gas-barrier property.

In the thin film sheet of the sixth aspect of the present invention, the water vapor permeability S when left for 1 hour at a temperature of 20 ° C. and a relative humidity of 50% RH is as high as 0.3 g / m ² · day or less, and It has gas barrier properties with little deterioration over time.

  In the thin film sheet of the seventh aspect of the present invention, the water vapor when left for 1 hour under the conditions of a temperature of 20 ° C. and a relative humidity of 50% RH and then for 100 hours under the conditions of a temperature of 85 ° C. and a relative humidity of 90% RH. When the permeability is T, the rate of change of the water vapor transmission rate T with respect to the water vapor transmission rate S (T / S × 100) is 200% or less, and the gas barrier property has very little deterioration over time.

  The laminated sheet according to the eighth aspect of the present invention has a structure in which the second base film is further laminated on the thin film forming side of the thin film sheet according to the fourth to seventh aspects via an adhesive layer. Thereby, since a 2nd base film can protect a thin film, high gas barrier property can be maintained and stabilized.

It is sectional drawing which represented typically the laminated structure of the thin film sheet and laminated sheet of this invention embodiment. It is the figure which represented typically the cross-sectional structure of the conventional thin film sheet. It is the figure which represented typically the cross-sectional structure of the thin film sheet of this invention embodiment.

  Next, an embodiment for carrying out the present invention will be described with reference to the drawings. The vapor deposition material of this invention can be used suitably for formation of a thin film. The thin film formed using this vapor deposition material functions as a gas barrier material that prevents permeation or penetration of oxygen, water vapor, or the like.

This vapor deposition material is made by mixing the first oxide powder and the second oxide powder. The first oxide powder used for producing the vapor deposition material is TiO ₂ powder, and the purity of the first oxide of the first oxide powder is 98% or higher, preferably 98.4% or higher. The powder is one kind of powder selected from the group consisting of ZnO, MgO and CaO or a mixed powder of two or more kinds, and the second oxide purity of the second oxide powder is 98% or more, preferably 99. 5% or more. Here, the reason why the purity of the first oxide in the first oxide powder is limited to 98% or more is that if it is less than 98%, the crystallinity is deteriorated by impurities, and as a result, the barrier characteristics are lowered. The reason why the second oxide purity of the second oxide powder is limited to 98% or more is that if it is less than 98%, the crystallinity deteriorates due to the impurities, and as a result, the barrier characteristics are lowered. In addition, the purity of the powder in this specification is measured by a spectroscopic analysis method (inductively coupled plasma emission analyzer: ICAP-88 manufactured by Nippon Jarrell Ash). Moreover, this vapor deposition material consists of the polycrystalline pellet containing a 1st oxide particle and a 2nd oxide particle, and the relative density is 90% or more, Preferably it is preferable that it is 95% or more. The reason why the relative density is 90% or more is that if it is less than 90%, the splash during film formation increases. In this embodiment, the pellet structure is polycrystalline, but it may be a single crystal.

  The average particle diameter of the first oxide particles contained in the vapor deposition material is 0.1 to 10 μm, and the average particle diameter of the second oxide particles is 0.1 to 10 μm. The molar ratio of the first oxide to the second oxide is 5 to 85:95 to 15. Furthermore, the basicity of the pellet is 0.1 or more. By containing the first oxide particles and the second oxide particles thus refined in a predetermined ratio, a high gas barrier property can be expressed in the film formed using the vapor deposition material.

  The technical reasons are usually (1) a vapor deposition material containing only the first oxide particles and no second oxide particles, and (2) a vapor deposition material containing only the second oxide particles and no first oxide particles. (3) Vapor deposition material containing both the first oxide particles and the second oxide particles but having a small content ratio of the first oxide particles, or (4) Both the first oxide particles and the second oxide particles In the case where a vapor deposition material containing a small amount of the second oxide particles is used, the oxide thin film 32 formed on the first base film 11 has a columnar crystal gas as shown in FIG. It becomes a structure gathered in parallel to the penetration direction. Since gas molecules such as water vapor travel along the interface of grain boundaries gathered in parallel, the thin film 32 having a structure in which the columnar crystals gather in parallel has low barrier properties. On the other hand, when a vapor deposition material containing the refined first oxide particles or second oxide particles in a predetermined ratio is used, as shown in FIG. 3, the first oxide particles are formed on the first base film 11. In the oxide thin film 12, a part of the columnar crystal formed when a vapor deposition material having a single composition is broken, and a fine microstructure close to an amorphous state is obtained. In a dense microstructure close to the amorphous state, gas molecules such as water vapor need to move through the labyrinth for a long distance. Therefore, the barrier property is improved in the thin film 12 having a dense microstructure close to the amorphous state. Become. As described above, it is presumed that the gas barrier property is improved by forming the film in a structure suitable for preventing permeation or intrusion of moisture or the like instead of the columnar crystal. Further, if both the first oxide particles and the second oxide particles contained are miniaturized, the film can be formed with a slight amount of electron beam or plasma when growing the film by vapor deposition. It is considered that a gas barrier property can be improved. Here, the vapor deposition material, that is, the average particle size of both the first oxide particles and the second oxide particles contained in the pellets is limited to the above range. In the production process, powder aggregation becomes remarkable and uniform mixing is hindered. When the average particle size of each exceeds the upper limit, the effect of forming a pseudo-solid body that contributes to improvement of gas barrier properties is sufficiently obtained. It is because it cannot be obtained. Among these, the average particle diameter of the first oxide particles is particularly preferably in the range of 0.1 to 10 μm, and the average particle diameter of the second oxide particles is particularly preferably in the range of 0.1 to 10 μm. In the present specification, the average particle diameter is measured once by using Nikkiso Co., Ltd. (FRA type) according to the laser diffraction / scattering method (microtrack method) and using sodium hexametaphosphate as a dispersion medium. Values obtained by averaging three times with a time of 30 seconds are averaged.

  The reason why the molar ratio of the first oxide and the second oxide contained in the vapor deposition material is limited to the above range is that the molar ratio of the first oxide is less than 5 or the molar ratio of the second oxide is less than 5. Then, since the content ratio of the first oxide particles or the second oxide particles becomes too small and approaches a single composition, it is easy to take a structure in which columnar crystals are gathered in parallel to the gas permeation direction. Therefore, a thin film having a dense microstructure cannot be formed.

  Furthermore, the reason why the basicity of the pellet is defined to be 0.1 or more is that if it is less than 0.1, it is difficult for the thin film to have a dense microstructure close to an amorphous state in which part of the columnar crystals is broken. This `` basicity '' was proposed by Kenji Morinaga et al., For example, his book `` K. Morinaga, H. Yoshida And H. Takebe: J. Am Cerm. Soc., 77, 3113 (1994) ''. The basicity of the glass powder is defined using the following formula. This excerpt is shown below.

"Coupling force between M _i -O oxide M _i O cation - given by the following equation as an oxygen ion attraction between A _i.

A _i = Z _i · Z ₀₂₋ / (r _i + r ₀₂₋ ) ² = Z _i · 2 / (r _i +1.40) ²
Z _i : valence of cation, oxygen ion is 2
R _i : cation radius (Å), oxygen ion is 1.40Å
The A _i of the inverse B _i a (1 / A _i) a single-component oxide M _i O oxygen donating ability.

B _i ≡1 / A _i
When the _{B i B CaO = 1, B} SiO2 = to 0 and the normalized, B _i of each single component oxides - index is given. When the _Bi -index of each component is expanded to a multi-component system by the cation fraction, the B-index (= basicity) of a glass oxide melt having an arbitrary composition can be calculated. B = Σn _i・ B _i
n _i : Cation fraction The basicity defined in this way represents the oxygen donating ability as described above, and the larger the value, the easier it is to donate oxygen and the easier transfer of oxygen with other metal oxides. . "
In the present invention, the basicity index of the glass powder is interpreted by replacing glass with an oxide, so that the basicity of the oxide mixture is arranged as an index of the ease of becoming a fine microstructure close to the amorphous state in the thin film. It is a thing. In the case of glass, the concept is melting, but the present invention is based on the fact that a glass formation mechanism occurs during film formation. The element sublimated from the vapor deposition material becomes an ionic state, and the element is deposited in a non-equilibrium state on the substrate. At this time, if the basicity of the pellet obtained by the above formula is 0.1 or more, the film grows in a glassy state (amorphous), and the elements are arranged in an orderly manner in a very dense state.

  Since the thin film formed using the vapor deposition material of the present invention has a high gas barrier property, in addition to the use of a gas barrier material such as a moisture-proof film constituting a back sheet of a solar cell, a liquid crystal display, an organic EL display, or an illumination It can also be suitably used as a gas barrier material for organic EL displays. In addition, since this thin film has a transparency of about 85 to 95%, a member that requires a high gas barrier property and requires light transmission, for example, a light receiving surface side of a solar cell, It is also suitable as a gas barrier material used on the image viewing side of the display.

  Next, the manufacturing method of the vapor deposition material of the present invention will be described as a representative case where it is produced by a sintering method. First, a high-purity powder having a purity of 98% or more as the first oxide powder, a high-purity powder having a purity of 98% or more as the second oxide powder, a binder, and an organic solvent are mixed, and the concentration is 30 to 30%. A 75% by weight slurry is prepared. Preferably, a slurry of 40 to 65% by mass is prepared. In addition, 1st oxide powder and 2nd oxide powder adjust and mix so that the molar ratio of the 1st oxide in a vapor deposition material after manufacture may satisfy | fill the said range. The reason why the concentration of the slurry is limited to 30 to 75% by mass is that when the content exceeds 75% by mass, the slurry is non-aqueous, so there is a problem that stable mixed granulation is difficult. This is because a dense sintered body having the above cannot be obtained. Moreover, the average particle diameter of the 1st oxide powder to be used and the average particle diameter of the 2nd oxide powder are the average particle diameter of the 1st oxide powder contained in the vapor deposition material after manufacture, and the average of 2nd oxide particle. For the reason of adjusting the particle size to the above-described range, it is preferable that the first oxide powder is in the range of 0.1 to 10 μm and the second oxide powder is in the range of 0.1 to 10 μm.

  It is preferable to use polyethylene glycol or polyvinyl butyral as the binder, and ethanol or propanol as the organic solvent. The binder is preferably added in an amount of 0.2 to 5.0% by mass.

The wet mixing of the high purity powder, the binder, and the organic solvent, particularly the wet mixing of the high purity powder and the organic solvent that is the dispersion medium is performed by a wet ball mill or a stirring mill. In the wet ball mill, when ZrO ₂ balls are used, wet mixing is performed for 8 to 24 hours, preferably 20 to 24 hours, using a large number of ZrO ₂ balls having a diameter of 5 to 10 mm. The reason why the diameter of the ZrO ₂ balls is limited to 5 to 10 mm is that mixing is insufficient when the diameter is less than 5 mm, and there is a problem that impurities increase when the diameter exceeds 10 mm. The reason why the mixing time is as long as 24 hours is that the generation of impurities is small even if the mixing is continued for a long time.

In the stirring mill, wet mixing is performed for 0.5 to 1 hour using a ZrO ₂ ball having a diameter of 1 to 3 mm. The reason why the diameter of the ZrO ₂ balls is limited to 1 to 3 mm is that the mixing is insufficient when the diameter is less than 1 mm, and the impurity increases when the diameter exceeds 3 mm. Also, the mixing time is as short as 1 hour at maximum, because if the time exceeds 1 hour, not only the mixing of the raw materials but also the balls themselves are worn out, which causes the generation of impurities and can be sufficiently mixed in 1 hour. .

Next, the slurry is spray-dried to obtain a mixed granulated powder having an average particle size of 50 to 250 μm, preferably 50 to 200 μm. This granulated powder is put into a predetermined mold and molded at a predetermined pressure. The spray drying is preferably performed using a spray dryer, and the predetermined mold is a uniaxial press apparatus or a cold isostatic press (CIP) molding apparatus. In uniaxial pressing apparatus, granulated powder 750~2000kg / cm ² (73.55~196.1MPa), preferably uniaxial pressing at a pressure of 1000~1500kg / cm ² (98.1~147.1MPa) In the CIP molding apparatus, the granulated powder is CIP molded at a pressure of 1000 to 3000 kg / cm ² (98.1 to 294.2 MPa), preferably 1500 to 2000 kg / cm ² (147.1 to 196.1 MPa). The reason why the pressure is limited to the above range is to increase the density of the molded body, prevent deformation after sintering, and eliminate the need for post-processing.

  Further, the compact is sintered at a predetermined temperature. Sintering is carried out at a temperature of 1000 ° C. or higher, preferably 1200 to 1400 ° C. for 1 to 10 hours, preferably 2 to 5 hours in the atmosphere, inert gas, vacuum or reducing gas atmosphere. Thereby, a pellet having a relative density of 90% or more is obtained. The above sintering is performed at atmospheric pressure, but when performing pressure sintering such as hot press (HP) sintering or hot isostatic press (HIP) sintering, an inert gas, It is preferable to carry out at a temperature of 1000 ° C. or higher for 1 to 5 hours in a vacuum or a reducing gas atmosphere.

  Subsequently, the thin film sheet and the laminated sheet of the present invention will be described together with the manufacturing method thereof. As shown in FIG. 1, a thin film sheet 10 of the present invention includes a first base film 11 and a thin film 12 of the present invention that is preferably formed using the above-described vapor deposition material. And the lamination sheet 20 of this invention has the 2nd base film 14 adhere | attached through the contact bonding layer 13 on the thin film formation side of this thin film sheet 10 of the said invention.

  It is preferable that the first base film 11 and the second base film 14 have mechanical strength, weather resistance, and the like that can withstand a long-term high temperature and high humidity environment test. For example, resin films such as polyethylene terephthalate (PET), polycarbonate, polymethyl methacrylate, polyacrylate, polyethylene naphthalate (PEN), polyarylate, polyether sulfone, triacetyl cellulose (TAC), and cyclic olefin (co) polymer Is mentioned. These resin films may contain a flame retardant, an antioxidant, an ultraviolet absorber, an antistatic agent, and the like as necessary. The thickness of the 1st base film 11 and the 2nd base film 14 becomes like this. Preferably it is 5-300 micrometers, More preferably, it is 10-150 micrometers.

  A thin film 12 as a gas barrier material is formed on the first base film 11, preferably using the above-described vapor deposition material of the present invention. When the metal element contained in the first oxide in the vapor deposition material is A and the metal element contained in the second oxide is B, the molar ratio of the metal element A to the metal element B in the thin film 12 is 5 to 85: 95-15. When the content ratio of the metal elements A and B in the thin film 12 is out of the above range, the crystal state of each oxide is prioritized, resulting in a problem that an amorphous, dense and fine structure cannot be obtained. The thickness of the thin film 12 is preferably in the range of 10 to 200 nm. If it is less than the lower limit, it is difficult to obtain sufficient gas barrier properties as a gas barrier material, and the durability of the film tends to be lowered. On the other hand, if the upper limit is exceeded, the material is wasted, and cracks due to external forces such as bending tend to occur due to the thickness effect. Among these, the thickness of the thin film 12 is particularly preferably in the range of 20 to 100 nm. As a method of forming the thin film 12 using a vapor deposition material, an electron beam evaporation method (hereinafter referred to as an EB method), an ion plating method, a reactive plasma deposition method (hereinafter referred to as an RPD method). A vacuum film forming method such as a resistance heating method or an induction heating method is preferable.

  In addition, although not shown in FIG. 1, in order to improve the adhesive strength with the thin film 12 on the 1st base film 11, the primer coating layer which consists of an acrylic polyol, isocyanate, and a silane coupling agent is needed as needed. Alternatively, surface treatment using plasma or the like may be performed before the vapor deposition step.

  On the other hand, when the surface of the formed thin film 12 is exposed, if the surface of the film is scratched or rubbed when the sheet is handled, the gas barrier property is greatly affected. Therefore, it is preferable to provide a gas barrier film or the like that protects the surface of the thin film 12 (not shown) on the thin film 12. The gas barrier film is formed by, for example, applying a solution obtained by mixing a silicon compound having an alkoxyl group, a titanium compound, a zirconia compound, a tin compound or a hydrolyzate thereof and a water-soluble polymer having a hydroxyl group to the surface of the thin film 12. It can be formed by heating and drying. This gas barrier film not only functions as a protective layer for the thin film 12, but also has an effect of improving the gas barrier property.

The thin film sheet 10 of the present invention thus formed is, for example, left for 1 hour under the conditions of a temperature of 20 ° C. and a relative humidity of 50% RH, and then measured for water vapor transmission measured under the conditions of a temperature of 40 ° C. and a relative humidity of 90% RH. Degree S is 0.3 g / m ² · day or less. Further, after being left for 1 hour under the conditions of a temperature of 20 ° C. and a relative humidity of 50% RH, it was further left for 100 hours under the conditions of a temperature of 85 ° C. and a relative humidity of 90% RH. When T, the rate of change of the water vapor transmission rate T with respect to the water vapor transmission rate S (T / S × 100) is 200% or less. That is, the thin film sheet 10 has a gas barrier property that is very high and has little deterioration over time.

  Furthermore, in the laminated sheet 20 of the present invention, an adhesive layer 13 is formed on the thin film forming side of the thin film sheet 10 of the present invention, that is, on the thin film 12 or on the gas barrier film. It functions as an adhesive for bonding the formed first base film 11 and second base film 14 together. Therefore, it is necessary that the adhesive strength does not deteriorate over a long period of time, does not cause delamination, and does not yellow, such as polyurethane, polyester, polyester-polyurethane, polycarbonate, Examples thereof include an epoxy-amine-based adhesive and a hot-melt adhesive. The adhesive layer 13 can be laminated by a known method such as a dry lamination method.

  The laminated sheet 20 is completed by bonding and bonding the second base film 14 on the adhesive layer 13. As shown in FIG. 1, the thin film 12 and the adhesive layer 13 do not need to be limited to those laminated one by one, but the thin film 12 and the adhesive layer 13 are alternately arranged, or the thin film 12 and the gas barrier coating. It is good also as a 2-10 layer multilayer which laminated | stacked other members, such as these, and the contact bonding layer 13 alternately or at random. Thereby, gas barrier property and a weather resistance can be improved further.

  This laminated sheet 20 can be suitably used as a back sheet of a solar cell module, a liquid crystal display, an organic EL display, an organic EL display for illumination, or the like.

  Next, examples of the present invention will be described in detail together with comparative examples.

<Example 1>
First, a first oxide powder, a second oxide powder, a binder and an organic solvent were mixed at a predetermined ratio by wet mixing with a ball mill to prepare a slurry having a concentration of 40% by mass. At this time, a high-purity TiO ₂ powder having an average particle diameter of 1.3 μm and a purity of 99.8% as the first oxide powder, and an average particle diameter of 0.8 μm and a purity of 99.8 as the second oxide powder. % High-purity ZnO powder, polyvinyl butyral as a binder, and ethanol as an organic solvent. Moreover, the mixing amount of the TiO ₂ powder and the ZnO powder was adjusted so that TiO ₂ contained in the deposited material after formation was 5 mol% and ZnO was 95 mol%.

Next, the prepared slurry was spray-dried using a spray dryer to obtain a mixed granulated powder having an average particle size of 200 μm, and the granulated powder was put into a predetermined mold and press-molded by a uniaxial press machine. The obtained molded body was sintered in an air atmosphere at a temperature of 1300 ° C. for 5 hours to obtain a vapor deposition material. Table 1 below shows the average particle diameters of TiO ₂ particles and ZnO particles contained in the obtained vapor deposition material, the contents of TiO ₂ and ZnO contained in the vapor deposition material, and the basicity of the pellets.

<Example 2>
The vapor deposition material was the same as in Example 1 except that the mixing amount of the TiO ₂ powder and the ZnO powder was adjusted so that TiO ₂ contained in the vapor deposition material after formation was 10 mol% and ZnO was 90 mol%. Got. Table 1 below shows the average particle diameters of TiO ₂ particles and ZnO particles contained in the obtained vapor deposition material, the contents of TiO ₂ and ZnO contained in the vapor deposition material, and the basicity of the pellets.

<Example 3>
The vapor deposition material was the same as in Example 1 except that the mixing amount of the TiO ₂ powder and the ZnO powder was adjusted so that TiO ₂ contained in the vapor deposition material after formation was 20 mol% and ZnO was 80 mol%. Got. Table 1 below shows the average particle diameters of TiO ₂ particles and ZnO particles contained in the obtained vapor deposition material, the contents of TiO ₂ and ZnO contained in the vapor deposition material, and the basicity of the pellets.

<Example 4>
The vapor deposition material was the same as in Example 1 except that the mixing amount of the TiO ₂ powder and the ZnO powder was adjusted so that TiO ₂ contained in the vapor deposition material after formation was 30 mol% and ZnO was 70 mol%. Got. Table 1 below shows the average particle diameters of TiO ₂ particles and ZnO particles contained in the obtained vapor deposition material, the contents of TiO ₂ and ZnO contained in the vapor deposition material, and the basicity of the pellets.

<Example 5>
The vapor deposition material was the same as in Example 1 except that the mixing amount of the TiO ₂ powder and the ZnO powder was adjusted so that TiO ₂ contained in the vapor deposition material after formation was 40 mol% and ZnO was 60 mol%. Got. Table 1 below shows the average particle diameters of TiO ₂ particles and ZnO particles contained in the obtained vapor deposition material, the contents of TiO ₂ and ZnO contained in the vapor deposition material, and the basicity of the pellets.

<Example 6>
The vapor deposition material was the same as in Example 1 except that the mixing amount of the TiO ₂ powder and the ZnO powder was adjusted so that TiO ₂ contained in the vapor deposition material after formation was 50 mol% and ZnO was 50 mol%. Got. Table 1 below shows the average particle diameters of TiO ₂ particles and ZnO particles contained in the obtained vapor deposition material, the contents of TiO ₂ and ZnO contained in the vapor deposition material, and the basicity of the pellets.

<Example 7>
The vapor deposition material was the same as in Example 1 except that the mixing amount of the TiO ₂ powder and the ZnO powder was adjusted so that TiO ₂ contained in the vapor deposition material after formation was 60 mol% and ZnO was 40 mol%. Got. Table 1 below shows the average particle diameters of TiO ₂ particles and ZnO particles contained in the obtained vapor deposition material, the contents of TiO ₂ and ZnO contained in the vapor deposition material, and the basicity of the pellets.

<Example 8>
The vapor deposition material was the same as in Example 1 except that the mixing amount of the TiO ₂ powder and the ZnO powder was adjusted so that TiO ₂ contained in the vapor deposition material after formation was 70 mol% and ZnO was 30 mol%. Got. Table 1 below shows the average particle diameters of TiO ₂ particles and ZnO particles contained in the obtained vapor deposition material, the contents of TiO ₂ and ZnO contained in the vapor deposition material, and the basicity of the pellets.

<Example 9>
The vapor deposition material was the same as in Example 1 except that the mixing amount of the TiO ₂ powder and the ZnO powder was adjusted so that TiO ₂ contained in the vapor deposition material after formation was 80 mol% and ZnO was 20 mol%. Got. Table 1 below shows the average particle diameters of TiO ₂ particles and ZnO particles contained in the obtained vapor deposition material, the contents of TiO ₂ and ZnO contained in the vapor deposition material, and the basicity of the pellets.

<Example 10>
The vapor deposition material was the same as in Example 1 except that the mixing amount of the TiO ₂ powder and the ZnO powder was adjusted so that TiO ₂ contained in the vapor deposition material after formation was 85 mol% and ZnO was 15 mol%. Got. Table 1 below shows the average particle diameters of TiO ₂ particles and ZnO particles contained in the obtained vapor deposition material, the contents of TiO ₂ and ZnO contained in the vapor deposition material, and the basicity of the pellets.

<Example 11>
A vapor deposition material was obtained in the same manner as in Example 1 except that a high-purity MgO powder having an average particle size of 0.9 μm and a purity of 99.7% was used as the second oxide powder. Table 1 below shows the average particle diameters of TiO ₂ particles and MgO particles contained in the obtained vapor deposition material, the contents of TiO ₂ and MgO contained in the vapor deposition material, and the basicity of the pellets.

<Example 12>
The vapor deposition material was the same as in Example 11 except that the mixing amount of the TiO ₂ powder and the MgO powder was adjusted so that TiO ₂ contained in the vapor deposition material after formation was 30 mol% and MgO was 70 mol%. Got. Table 1 below shows the average particle diameters of TiO ₂ particles and MgO particles contained in the obtained vapor deposition material, the contents of TiO ₂ and MgO contained in the vapor deposition material, and the basicity of the pellets.

<Example 13>
The vapor deposition material was the same as in Example 11 except that the mixing amount of the TiO ₂ powder and the MgO powder was adjusted so that TiO ₂ contained in the vapor deposition material after formation was 50 mol% and MgO was 50 mol%. Got. Table 1 below shows the average particle diameters of TiO ₂ particles and MgO particles contained in the obtained vapor deposition material, the contents of TiO ₂ and MgO contained in the vapor deposition material, and the basicity of the pellets.

<Example 14>
The vapor deposition material was the same as in Example 11 except that the mixing amount of the TiO ₂ powder and the MgO powder was adjusted so that TiO ₂ contained in the vapor deposition material after formation was 80 mol% and MgO was 20 mol%. Got. Table 1 below shows the average particle diameters of TiO ₂ particles and MgO particles contained in the obtained vapor deposition material, the contents of TiO ₂ and MgO contained in the vapor deposition material, and the basicity of the pellets.

<Example 15>
The vapor deposition material was the same as in Example 11 except that the mixing amount of the TiO ₂ powder and the MgO powder was adjusted so that TiO ₂ contained in the vapor deposition material after formation was 85 mol% and MgO was 15 mol%. Got. Table 1 below shows the average particle diameters of TiO ₂ particles and MgO particles contained in the obtained vapor deposition material, the contents of TiO ₂ and MgO contained in the vapor deposition material, and the basicity of the pellets.

<Example 16>
A vapor deposition material was obtained in the same manner as in Example 1 except that a high-purity CaO powder having an average particle size of 0.6 μm and a purity of 99.8% was used as the second oxide powder. Table 1 below shows the average particle diameters of the TiO ₂ particles and CaO particles contained in the obtained vapor deposition material, the contents of TiO ₂ and CaO contained in the vapor deposition material, and the basicity of the pellets.

<Example 17>
The vapor deposition material was the same as in Example 16 except that the mixing amount of the TiO ₂ powder and CaO powder was adjusted so that TiO ₂ contained in the vapor deposition material after formation was 30 mol% and CaO was 70 mol%. Got. Table 1 below shows the average particle diameters of the TiO ₂ particles and CaO particles contained in the obtained vapor deposition material, the contents of TiO ₂ and CaO contained in the vapor deposition material, and the basicity of the pellets.

<Example 18>
The vapor deposition material was the same as in Example 16 except that the mixing amount of the TiO ₂ powder and the CaO powder was adjusted so that TiO ₂ contained in the vapor deposition material after formation was 50 mol% and CaO was 50 mol%. Got. Table 1 below shows the average particle diameters of the TiO ₂ particles and CaO particles contained in the obtained vapor deposition material, the contents of TiO ₂ and CaO contained in the vapor deposition material, and the basicity of the pellets.

<Example 19>
The vapor deposition material was the same as in Example 16 except that the mixing amount of the TiO ₂ powder and the CaO powder was adjusted so that TiO ₂ contained in the vapor deposition material after formation was 80 mol% and CaO was 20 mol%. Got. Table 1 below shows the average particle diameters of the TiO ₂ particles and CaO particles contained in the obtained vapor deposition material, the contents of TiO ₂ and CaO contained in the vapor deposition material, and the basicity of the pellets.

<Example 20>
The vapor deposition material was the same as in Example 16 except that the mixing amount of the TiO ₂ powder and the CaO powder was adjusted so that TiO ₂ contained in the vapor deposition material after formation was 85 mol% and CaO was 15 mol%. Got. Table 1 below shows the average particle diameters of the TiO ₂ particles and CaO particles contained in the obtained vapor deposition material, the contents of TiO ₂ and CaO contained in the vapor deposition material, and the basicity of the pellets.

<Example 21>
A mixed powder of a high purity ZnO powder having an average particle size of 0.8 μm and a purity of 99.8% and a high purity MgO powder having an average particle size of 0.9 μm and a purity of 99.7% as the second oxide powder The TiO ₂ powder used and the mixing amount of the mixed powder were adjusted so that TiO ₂ contained in the deposited material after formation was 5 mol%, and ZnO and MgO were 90 mol% and 5 mol%, respectively. Except for this, a vapor deposition material was obtained in the same manner as in Example 1. Table 2 below shows the average particle diameters of TiO ₂ particles, ZnO particles, and MgO particles contained in the obtained vapor deposition material, the contents of TiO ₂ , ZnO, and MgO contained in the vapor deposition material, and the basicity of the pellets. .

<Example 22>
A mixed powder of a high purity ZnO powder having an average particle size of 0.8 μm and a purity of 99.8% and a high purity CaO powder having an average particle size of 0.6 μm and a purity of 99.8% as the second oxide powder The TiO ₂ powder used and the amount of the mixed powder were adjusted so that TiO ₂ contained in the deposited material was 5 mol%, and ZnO and CaO were 90 mol% and 5 mol%, respectively. Except for this, a vapor deposition material was obtained in the same manner as in Example 1. Table 2 below shows the average particle diameters of TiO ₂ particles, ZnO particles, and CaO particles contained in the obtained vapor deposition material, the contents of TiO ₂ , ZnO, and CaO contained in the vapor deposition material, and the basicity of the pellets. .

<Example 23>
As the second oxide powder, a high-purity ZnO powder having an average particle size of 0.8 μm and a purity of 99.8%, a high-purity MgO powder having an average particle size of 0.9 μm and a purity of 99.7%, and an average particle size of The mixed powder of 0.6 μm and high purity CaO powder with a purity of 99.8% was used, and the mixed amount of the TiO ₂ powder and the mixed powder was 5 mol of TiO ₂ contained in the deposited material after formation. %, ZnO, MgO and CaO were obtained in the same manner as in Example 1 except that the amounts were adjusted to 75 mol%, 10 mol% and 10 mol%, respectively. The average particle diameter of TiO ₂ particles, ZnO particles, MgO particles and CaO particles contained in the obtained vapor deposition material, the content of TiO ₂ , ZnO, MgO, CaO contained in the vapor deposition material, and the basicity of the pellet are as follows: It shows in Table 2.

<Example 24>
As the second oxide powder, a high-purity ZnO powder having an average particle size of 0.8 μm and a purity of 99.8%, a high-purity MgO powder having an average particle size of 0.9 μm and a purity of 99.7%, and an average particle size of The mixed powder of 0.6 μm and high purity CaO powder with a purity of 99.8% was used, and the mixed amount of the TiO ₂ powder and the mixed powder was 5 mol of TiO ₂ contained in the deposited material after formation. %, ZnO, MgO and CaO were obtained in the same manner as in Example 1 except that they were adjusted to 55 mol%, 20 mol% and 20 mol%, respectively. The average particle diameter of TiO ₂ particles, ZnO particles, MgO particles and CaO particles contained in the obtained vapor deposition material, the content of TiO ₂ , ZnO, MgO, CaO contained in the vapor deposition material, and the basicity of the pellet are as follows: It shows in Table 2.

<Example 25>
As the second oxide powder, a high-purity ZnO powder having an average particle size of 0.8 μm and a purity of 99.8%, a high-purity MgO powder having an average particle size of 0.9 μm and a purity of 99.7%, and an average particle size of The mixed powder of 0.6 μm and high purity CaO powder with a purity of 99.8% was used, and the mixed amount of the TiO ₂ powder and the mixed powder was 5 mol of TiO ₂ contained in the deposited material after formation. %, ZnO, MgO, and CaO were obtained in the same manner as in Example 1 except that the contents were adjusted to be 30 mol%, 35 mol%, and 30 mol%, respectively. The average particle diameter of TiO ₂ particles, ZnO particles, MgO particles and CaO particles contained in the obtained vapor deposition material, the content of TiO ₂ , ZnO, MgO, CaO contained in the vapor deposition material, and the basicity of the pellet are as follows: It shows in Table 2.

<Example 26>
As the second oxide powder, a high-purity ZnO powder having an average particle size of 0.8 μm and a purity of 99.8%, a high-purity MgO powder having an average particle size of 0.9 μm and a purity of 99.7%, and an average particle size of The mixed powder of 0.6 μm and high purity CaO powder with a purity of 99.8% was used, and the mixed amount of the TiO ₂ powder and the mixed powder was 5 mol of TiO ₂ contained in the deposited material after formation. %, ZnO, MgO and CaO were obtained in the same manner as in Example 1 except that they were adjusted to 10 mol%, 35 mol% and 50 mol%, respectively. The average particle diameter of TiO ₂ particles, ZnO particles, MgO particles and CaO particles contained in the obtained vapor deposition material, the content of TiO ₂ , ZnO, MgO, CaO contained in the vapor deposition material, and the basicity of the pellet are as follows: It shows in Table 2.

<Example 27>
A mixed powder of a high purity MgO powder having an average particle size of 0.9 μm and a purity of 99.7% and a high purity CaO powder having an average particle size of 0.6 μm and a purity of 99.8% as the second oxide powder The TiO ₂ powder used and the amount of the mixed powder were adjusted so that TiO ₂ contained in the deposited material after formation was 5 mol%, and MgO and CaO were 35 mol% and 60 mol%, respectively. Except for this, a vapor deposition material was obtained in the same manner as in Example 1. Table 2 below shows the average particle diameters of TiO ₂ particles, MgO particles and CaO particles contained in the obtained vapor deposition material, the contents of TiO ₂ , MgO and CaO contained in the vapor deposition material, and the basicity of the pellets. .

<Example 28>
A mixed powder of a high purity ZnO powder having an average particle size of 0.8 μm and a purity of 99.8% and a high purity MgO powder having an average particle size of 0.9 μm and a purity of 99.7% as the second oxide powder The TiO ₂ powder used and the amount of the mixed powder were adjusted so that TiO ₂ contained in the deposited material after formation was 30 mol%, and ZnO and MgO were 60 mol% and 10 mol%, respectively. Except for this, a vapor deposition material was obtained in the same manner as in Example 1. Table 2 below shows the average particle diameters of TiO ₂ particles, ZnO particles, and MgO particles contained in the obtained vapor deposition material, the contents of TiO ₂ , ZnO, and MgO contained in the vapor deposition material, and the basicity of the pellets. .

<Example 29>
A mixed powder of a high purity ZnO powder having an average particle size of 0.8 μm and a purity of 99.8% and a high purity CaO powder having an average particle size of 0.6 μm and a purity of 99.8% as the second oxide powder The TiO ₂ powder used and the mixing amount of the mixed powder were adjusted so that TiO ₂ contained in the deposited material after formation was 30 mol%, and ZnO and CaO were 60 mol% and 10 mol%, respectively. Except for this, a vapor deposition material was obtained in the same manner as in Example 1. Table 2 below shows the average particle diameters of TiO ₂ particles, ZnO particles, and CaO particles contained in the obtained vapor deposition material, the contents of TiO ₂ , ZnO, and CaO contained in the vapor deposition material, and the basicity of the pellets. .

<Example 30>
As the second oxide powder, a high-purity ZnO powder having an average particle size of 0.8 μm and a purity of 99.8%, a high-purity MgO powder having an average particle size of 0.9 μm and a purity of 99.7%, and an average particle size of The mixed powder of 0.6 μm and high purity CaO powder having a purity of 99.8% was used, and the mixed amount of the TiO ₂ powder and the mixed powder was 30 mol of TiO ₂ contained in the deposited material after formation. %, ZnO, MgO, and CaO were obtained in the same manner as in Example 1 except that the contents were adjusted to 30 mol%, 25 mol%, and 15 mol%, respectively. The average particle diameter of TiO ₂ particles, ZnO particles, MgO particles and CaO particles contained in the obtained vapor deposition material, the content of TiO ₂ , ZnO, MgO, CaO contained in the vapor deposition material, and the basicity of the pellet are as follows: It shows in Table 2.

<Example 31>
A mixed powder of a high purity MgO powder having an average particle size of 0.9 μm and a purity of 99.7% and a high purity CaO powder having an average particle size of 0.6 μm and a purity of 99.8% as the second oxide powder The TiO ₂ powder used and the mixed amount of the mixed powder were adjusted so that TiO ₂ contained in the deposited material after formation was 30 mol%, and MgO and CaO were 25 mol% and 45 mol%, respectively. Except for this, a vapor deposition material was obtained in the same manner as in Example 1. Table 2 below shows the average particle diameters of TiO ₂ particles, MgO particles and CaO particles contained in the obtained vapor deposition material, the contents of TiO ₂ , MgO and CaO contained in the vapor deposition material, and the basicity of the pellets. .

<Example 32>
A mixed powder of a high purity ZnO powder having an average particle size of 0.8 μm and a purity of 99.8% and a high purity MgO powder having an average particle size of 0.9 μm and a purity of 99.7% as the second oxide powder The TiO ₂ powder used and the amount of the mixed powder were adjusted so that TiO ₂ contained in the deposited material after formation was 85 mol%, and ZnO and MgO were 10 mol% and 5 mol%, respectively. Except for this, a vapor deposition material was obtained in the same manner as in Example 1. Table 2 below shows the average particle diameters of TiO ₂ particles, ZnO particles, and MgO particles contained in the obtained vapor deposition material, the contents of TiO ₂ , ZnO, and MgO contained in the vapor deposition material, and the basicity of the pellets. .

<Example 33>
A mixed powder of a high purity ZnO powder having an average particle size of 0.8 μm and a purity of 99.8% and a high purity CaO powder having an average particle size of 0.6 μm and a purity of 99.8% as the second oxide powder The TiO ₂ powder used and the mixing amount of the mixed powder were adjusted so that TiO ₂ contained in the deposited material after formation was 85 mol%, and ZnO and CaO were 10 mol% and 5 mol%, respectively. Except for this, a vapor deposition material was obtained in the same manner as in Example 1. Table 2 below shows the average particle diameters of TiO ₂ particles, ZnO particles, and CaO particles contained in the obtained vapor deposition material, the contents of TiO ₂ , ZnO, and CaO contained in the vapor deposition material, and the basicity of the pellets. .

<Example 34>
As the second oxide powder, a high-purity ZnO powder having an average particle size of 0.8 μm and a purity of 99.8%, a high-purity MgO powder having an average particle size of 0.9 μm and a purity of 99.7%, and an average particle size of The mixed powder of 0.6 μm and high purity CaO powder having a purity of 99.8% was used, and the mixed amount of the TiO ₂ powder and the mixed powder was 85 mol of TiO ₂ contained in the deposited material after formation. %, ZnO, MgO and CaO were obtained in the same manner as in Example 1 except that they were adjusted to 5 mol%, 5 mol% and 5 mol%, respectively. The average particle diameter of TiO ₂ particles, ZnO particles, MgO particles and CaO particles contained in the obtained vapor deposition material, the content of TiO ₂ , ZnO, MgO, CaO contained in the vapor deposition material, and the basicity of the pellet are as follows: It shows in Table 2.

<Example 35>
A mixed powder of a high purity MgO powder having an average particle size of 0.9 μm and a purity of 99.7% and a high purity CaO powder having an average particle size of 0.6 μm and a purity of 99.8% as the second oxide powder The TiO ₂ powder used and the mixing amount of the mixed powder were adjusted so that TiO ₂ contained in the deposited material after formation was 85 mol%, and MgO and CaO were 5 mol% and 10 mol%, respectively. Except for this, a vapor deposition material was obtained in the same manner as in Example 1. Table 2 below shows the average particle diameters of TiO ₂ particles, MgO particles and CaO particles contained in the obtained vapor deposition material, the contents of TiO ₂ , MgO and CaO contained in the vapor deposition material, and the basicity of the pellets. .

<Example 36>
A vapor deposition material was obtained under the same conditions as in Example 25. The average particle diameter of TiO ₂ particles, ZnO particles, MgO particles and CaO particles contained in the obtained vapor deposition material, the content of TiO ₂ , ZnO, MgO, CaO contained in the vapor deposition material, and the basicity of the pellet are as follows: Table 3 shows.

<Example 37>
A vapor deposition material was obtained under the same conditions as in Example 30. The average particle diameter of TiO ₂ particles, ZnO particles, MgO particles and CaO particles contained in the obtained vapor deposition material, the content of TiO ₂ , ZnO, MgO, CaO contained in the vapor deposition material, and the basicity of the pellet are as follows: Table 3 shows.

<Example 38>
A vapor deposition material was obtained under the same conditions as in Example 34. The average particle diameter of TiO ₂ particles, ZnO particles, MgO particles and CaO particles contained in the obtained vapor deposition material, the content of TiO ₂ , ZnO, MgO, CaO contained in the vapor deposition material, and the basicity of the pellet are as follows: Table 3 shows.

<Example 39>
A vapor deposition material was obtained under the same conditions as in Example 25. The average particle diameter of TiO ₂ particles, ZnO particles, MgO particles and CaO particles contained in the obtained vapor deposition material, the content of TiO ₂ , ZnO, MgO, CaO contained in the vapor deposition material, and the basicity of the pellet are as follows: Table 3 shows.

<Example 40>
A vapor deposition material was obtained under the same conditions as in Example 30. The average particle diameter of TiO ₂ particles, ZnO particles, MgO particles and CaO particles contained in the obtained vapor deposition material, the content of TiO ₂ , ZnO, MgO, CaO contained in the vapor deposition material, and the basicity of the pellet are as follows: Table 3 shows.

<Example 41>
A vapor deposition material was obtained under the same conditions as in Example 34. The average particle diameter of TiO ₂ particles, ZnO particles, MgO particles and CaO particles contained in the obtained vapor deposition material, the content of TiO ₂ , ZnO, MgO, CaO contained in the vapor deposition material, and the basicity of the pellet are as follows: Table 3 shows.

<Comparative Example 1>
A vapor deposition material was obtained in the same manner as in Example 1 except that the first oxide particles were adjusted without mixing. Table 4 below shows the average particle diameter of the ZnO particles and the basicity of the pellets contained in the obtained vapor deposition material.

<Comparative example 2>
The vapor deposition material was the same as in Example 1 except that the mixing amount of the TiO ₂ powder and the ZnO powder was adjusted so that TiO ₂ contained in the vapor deposition material after formation was 3 mol% and ZnO was 97 mol%. Got. Table 4 below shows the average particle diameters of TiO ₂ particles and ZnO particles contained in the obtained vapor deposition material, the contents of TiO ₂ and ZnO contained in the vapor deposition material, and the basicity of the pellets.

<Comparative Example 3>
The vapor deposition material was the same as in Example 1 except that the mixing amount of the TiO ₂ powder and the ZnO powder was adjusted so that TiO ₂ contained in the vapor deposition material after formation was 90 mol% and ZnO was 10 mol%. Got. Table 4 below shows the average particle diameters of TiO ₂ particles and ZnO particles contained in the obtained vapor deposition material, the contents of TiO ₂ and ZnO contained in the vapor deposition material, and the basicity of the pellets.

<Comparative example 4>
The vapor deposition material was obtained like Example 1 except having adjusted without mixing the 2nd oxide particle. Table 4 below shows the average particle diameter of the TiO ₂ particles contained in the obtained vapor deposition material and the basicity of the pellets.

<Comparative Example 5>
A vapor deposition material was obtained in the same manner as in Example 11 except that the first oxide particles were adjusted without mixing. Table 4 below shows the average particle diameter of MgO particles and the basicity of the pellets contained in the obtained vapor deposition material.

<Comparative Example 6>
The vapor deposition material was the same as in Example 11 except that the mixing amount of the TiO ₂ powder and the MgO powder was adjusted so that TiO ₂ contained in the vapor deposition material after formation was 3 mol% and MgO was 97 mol%. Got. Table 4 below shows the average particle diameters of TiO ₂ particles and MgO particles contained in the obtained vapor deposition material, the contents of TiO ₂ and MgO contained in the vapor deposition material, and the basicity of the pellets.

<Comparative Example 7>
The vapor deposition material was the same as in Example 11 except that the mixing amount of the TiO ₂ powder and the MgO powder was adjusted so that TiO ₂ contained in the deposited vapor deposition material was 90 mol% and MgO was 10 mol%. Got. Table 4 below shows the average particle diameters of TiO ₂ particles and MgO particles contained in the obtained vapor deposition material, the contents of TiO ₂ and MgO contained in the vapor deposition material, and the basicity of the pellets.

<Comparative Example 8>
The vapor deposition material was obtained like Example 1 except having adjusted without mixing the 2nd oxide particle. Table 4 below shows the average particle diameter of the TiO ₂ particles contained in the obtained vapor deposition material and the basicity of the pellets.

<Comparative Example 9>
A vapor deposition material was obtained in the same manner as in Example 16 except that the first oxide particles were adjusted without mixing. Table 4 below shows the average particle diameter of CaO particles contained in the obtained vapor deposition material and the basicity of the pellets.

<Comparative Example 10>
The vapor deposition material was the same as in Example 16 except that the mixing amount of the TiO ₂ powder and the CaO powder was adjusted so that TiO ₂ contained in the vapor deposition material after formation was 3 mol% and CaO was 97 mol%. Got. Table 4 below shows the average particle diameters of TiO ₂ particles and CaO particles contained in the obtained vapor deposition material, the contents of TiO ₂ and CaO contained in the vapor deposition material, and the basicity of the pellets.

<Comparative Example 11>
The vapor deposition material was the same as in Example 16 except that the mixing amount of the TiO ₂ powder and the CaO powder was adjusted so that TiO ₂ contained in the vapor deposition material after formation was 90 mol% and CaO was 10 mol%. Got. Table 4 below shows the average particle diameters of TiO ₂ particles and CaO particles contained in the obtained vapor deposition material, the contents of TiO ₂ and CaO contained in the vapor deposition material, and the basicity of the pellets.

<Comparative Example 12>
The vapor deposition material was obtained like Example 1 except having adjusted without mixing the 2nd oxide particle. Table 4 below shows the average particle diameter of the TiO ₂ particles contained in the obtained vapor deposition material and the basicity of the pellets.

<Comparative Example 13>
A vapor deposition material was obtained under the same conditions as in Comparative Example 1. Table 4 below shows the average particle diameter of ZnO particles contained in the obtained vapor deposition material, the content of ZnO contained in the vapor deposition material, and the basicity of the pellets.

<Comparative example 14>
A vapor deposition material was obtained under the same conditions as in Comparative Example 5. Table 4 below shows the average particle diameter of MgO particles contained in the obtained vapor deposition material, the content of MgO contained in the vapor deposition material, and the basicity of the pellets.

<Comparative Example 15>
A vapor deposition material was obtained under the same conditions as in Comparative Example 9. Table 4 below shows the average particle diameter of CaO particles contained in the obtained vapor deposition material, the content of CaO contained in the vapor deposition material, and the basicity of the pellets.

<Comparative Example 16>
A vapor deposition material was obtained under the same conditions as in Comparative Example 4. Table 4 below shows the average particle diameter of the TiO ₂ particles contained in the obtained vapor deposition material, the content of TiO ₂ contained in the vapor deposition material, and the basicity of the pellets.

<Comparative Example 17>
A vapor deposition material was obtained under the same conditions as in Comparative Example 1. Table 4 below shows the average particle diameter of ZnO particles contained in the obtained vapor deposition material, the content of ZnO contained in the vapor deposition material, and the basicity of the pellets.

<Comparative Example 18>
A vapor deposition material was obtained under the same conditions as in Comparative Example 5. Table 4 below shows the average particle diameter of MgO particles contained in the obtained vapor deposition material, the content of MgO contained in the vapor deposition material, and the basicity of the pellets.

<Comparative Example 19>
A vapor deposition material was obtained under the same conditions as in Comparative Example 9. Table 4 below shows the average particle diameter of CaO particles contained in the obtained vapor deposition material, the content of CaO contained in the vapor deposition material, and the basicity of the pellets.

<Comparative Example 20>
A vapor deposition material was obtained under the same conditions as in Comparative Example 4. Table 4 below shows the average particle diameter of the TiO ₂ particles contained in the obtained vapor deposition material, the content of TiO ₂ contained in the vapor deposition material, and the basicity of the pellets.

＜比較試験及び評価１＞
実施例１〜４１及び比較例１〜２０で得られた蒸着材を用いて、厚さ７５μｍのＰＥＴフィルム上に、以下の表５〜表７に示す方法により蒸着を行って薄膜を成膜し、薄膜シートを形成した。これらの薄膜シートについて、水蒸気透過度を測定し、ガスバリア性を評価した。また、上記ガスバリア性評価における条件よりも高温、高湿度条件下で長時間放置した後の水蒸気透過度及びその変化率から耐久性を評価した。更に、これらの薄膜シートについて、光透過率を測定し、透明性を評価した。これらの結果を以下の表５〜表７に示す。

<Comparison test and evaluation 1>
Using the vapor deposition materials obtained in Examples 1-41 and Comparative Examples 1-20, a thin film was formed on a 75 μm thick PET film by vapor deposition according to the methods shown in Tables 5 to 7 below. A thin film sheet was formed. About these thin film sheets, water vapor permeability was measured and gas barrier property was evaluated. Moreover, durability was evaluated from the water vapor permeability and the rate of change after standing for a long time under high temperature and high humidity conditions than the conditions in the gas barrier property evaluation. Further, for these thin film sheets, the light transmittance was measured and the transparency was evaluated. These results are shown in Tables 5 to 7 below.

  (1) Gas barrier property: After the thin film sheet is left in a clean room set at a temperature of 20 ° C. and a relative humidity of 50% RH for 1 hour, a water vapor transmission rate measuring device manufactured by MOCON (model name: PERMATRAN-W type 3 / 33), the water vapor transmission rate S was measured under the conditions of a temperature of 40 ° C. and a relative humidity of 90% RH.

  (2) Durability: In order to prevent deterioration of the PET film due to water vapor in the thin film sheet after being left in a clean room set at a temperature of 20 ° C. and a relative humidity of 50% RH for 1 hour, the thin film of the thin film sheet should be on the outside. Two pieces of the same thin film sheet were superposed on each other, and the four sides were joined with a heat sealer. This was placed in a constant temperature and humidity device set at a temperature of 85 ° C. and a relative humidity of 90% RH, and left for 100 hours. Thereafter, similarly to the gas barrier property evaluation, the water vapor transmission rate T was measured under the conditions of a temperature of 40 ° C. and a relative humidity of 90% RH using a water vapor transmission rate measuring device. Moreover, the rate of change (T / S × 100) of the measured water vapor transmission rate T with respect to the water vapor transmission rate S was calculated.

  (3) Light transmittance: The light transmittance at a wavelength of 380 to 780 nm was measured for the thin film sheet using a spectrophotometer (model name: U-4000) manufactured by Hitachi, Ltd.

表５〜表７から明らかなように、第１酸化物及び第２酸化物がＴｉＯ₂とＺｎＯの組合せとなる実施例１〜１０及び比較例１〜４を比較すると、実施例１〜１０では、室温で１時間放置した後の水蒸気透過度Ｓは、０．２１ｇ／ｍ²・ｄａｙ以下であり、このうち、実施例４〜８では、０．１ｇ／ｍ²・ｄａｙ以下であった。また、温度８５℃、相対湿度９０％ＲＨの条件下で更に１００時間放置した後の水蒸気透過度Ｔの、水蒸気透過度Ｓに対する変化率も２００％以下に抑えられ、高温、高湿度環境下で長時間放置した場合の耐久性にも優れていることが判る。

As apparent from Tables 5 to 7, when Examples 1 to 10 and Comparative Examples 1 to 4 in which the first oxide and the second oxide are a combination of TiO ₂ and ZnO are compared, in Examples 1 to 10 The water vapor permeability S after standing at room temperature for 1 hour was 0.21 g / m ² · day or less, and in Examples 4 to 8, it was 0.1 g / m ² · day or less. In addition, the rate of change of the water vapor transmission rate T with respect to the water vapor transmission rate S after being further left for 100 hours under the conditions of a temperature of 85 ° C. and a relative humidity of 90% RH is suppressed to 200% or less. It can be seen that it is excellent in durability when left for a long time.

On the other hand, in the thin film sheet of Comparative Example 1 formed using a vapor deposition material having a single composition of ZnO and Comparative Example 2 formed using a vapor deposition material having a content of TiO ₂ as the first oxide of less than 5%. Although the water vapor transmission rate S was relatively good, the rate of change of the water vapor transmission rate T with respect to the water vapor transmission rate S was very large, resulting in poor durability. In the thin film sheet of Comparative Example 3 formed using a vapor deposition material having a single composition of TiO ₂ or Comparative Example 3 formed using a vapor deposition material having a ZnO content of less than 15% as the second oxide. Although the rate of change in water vapor transmission rate was small, the water vapor transmission rate S was very high.

In addition, when Examples 11 to 15 and Comparative Examples 5 to 8 in which the first oxide and the second oxide are a combination of TiO ₂ and MgO are compared, in Examples 11 to 15, the sample is allowed to stand at room temperature for 1 hour. The water vapor transmission rate S was 0.22 g / m ² · day or less, and among these, in Example 13, it was 0.1 g / m ² · day or less. In addition, the rate of change of the water vapor transmission rate T with respect to the water vapor transmission rate S after being further left for 100 hours under the conditions of a temperature of 85 ° C. and a relative humidity of 90% RH is suppressed to 200% or less. It can be seen that it is excellent in durability when left for a long time.

On the other hand, in the thin film sheet of Comparative Example 5 formed using a vapor deposition material having a single composition of MgO and Comparative Example 6 formed using a vapor deposition material having a content of TiO ₂ as the first oxide of less than 5%. In addition, the water vapor permeability S is larger than those of Examples 11 to 15, and the comparative example 7 formed by using a vapor deposition material having a content of MgO as the second oxide of less than 15% or a single TiO _{2 layer} . In the thin film sheet of Comparative Example 8 formed using the vapor deposition material having the composition, the water vapor permeability S was further increased.

In addition, when Examples 16 to 20 and Comparative Examples 9 to 12 in which the first oxide and the second oxide are a combination of TiO ₂ and CaO are compared, in Examples 16 to 20, the sample was allowed to stand at room temperature for 1 hour. The water vapor permeability S was 0.21 g / m ² · day or less, and of these, in Examples 17 and 18, it was 0.1 g / m ² · day or less. In addition, the rate of change of the water vapor transmission rate T with respect to the water vapor transmission rate S after being further left for 100 hours under the conditions of a temperature of 85 ° C. and a relative humidity of 90% RH is suppressed to 200% or less. It can be seen that it is excellent in durability when left for a long time.

On the other hand, Comparative Example 9 formed using a vapor deposition material having a single composition of CaO, Comparative Example 10 formed using a vapor deposition material having a content of TiO ₂ as the first oxide of less than 5%, or Second Example In the thin film sheet of Comparative Example 11 using a vapor deposition material having a single composition of TiO ₂ and Comparative Example 11 formed using a vapor deposition material having a CaO content of less than 15%, the water vapor permeability S is It was a very big result.

In Examples 21 to 35 in which the second oxide was two or more of ZnO, MgO, and CaO, the water vapor permeability S after being allowed to stand at room temperature for 1 hour was 0.25 g / m ² · day or less. Among these, in Examples 24-31, it was 0.1 g / m < ² > * day or less. In addition, the rate of change of the water vapor transmission rate T with respect to the water vapor transmission rate S after being further left for 100 hours under the conditions of a temperature of 85 ° C. and a relative humidity of 90% RH is suppressed to 200% or less, in addition to high gas barrier properties. Further, it can be seen that it is excellent in durability when left for a long time in a high temperature and high humidity environment.

  Regarding the light transmittance, Examples 1 to 35 were inferior to Comparative Examples 1 to 12.

  Furthermore, Examples 25, 36 and 39, Examples 30, 37 and 40, Examples 34, 38 and 41, and Comparative Example 1 were formed by using different vapor deposition materials obtained under the same conditions. , 13, 17, Comparative Examples 5, 14, 18, Comparative Examples 9, 15, 19, and Comparative Examples 4, 16, and 20 tend to be slightly inferior to thin films formed by the RPD method depending on the evaluation items. As can be seen, the thin films of Examples 36, 37, and 38 formed by the EB method and Examples 39, 40, and 41 formed by the resistance heating method also have sufficient gas barrier properties, durability, and transparency. I understand.

  From these results, it was confirmed that the thin film formed using the vapor deposition material of the present invention has excellent gas barrier properties and transparency.

DESCRIPTION OF SYMBOLS 10 Thin film sheet 11 1st base film 12 Thin film 13 Adhesive layer 14 2nd base film 20 Laminated sheet

<Example 33>
A mixed powder of a high purity ZnO powder having an average particle size of 0.8 μm and a purity of 99.8% and a high purity CaO powder having an average particle size of 0.6 μm and a purity of 99.8% as the second oxide powder The TiO ₂ powder used and the mixing amount of the mixed powder were adjusted so that TiO ₂ contained in the deposited material after formation was 85 mol%, and ZnO and CaO were 10 mol% and 5 mol%, respectively. Except for this, a vapor deposition material was obtained in the same manner as in Example 1. Table 3 below shows the average particle diameter of TiO ₂ particles, ZnO particles and CaO particles contained in the obtained vapor deposition material, the contents of TiO ₂ , ZnO and CaO contained in the vapor deposition material, and the basicity of the pellets. .

<Example 34>
As the second oxide powder, a high-purity ZnO powder having an average particle size of 0.8 μm and a purity of 99.8%, a high-purity MgO powder having an average particle size of 0.9 μm and a purity of 99.7%, and an average particle size of The mixed powder of 0.6 μm and high purity CaO powder having a purity of 99.8% was used, and the mixed amount of the TiO ₂ powder and the mixed powder was 85 mol of TiO ₂ contained in the deposited material after formation. %, ZnO, MgO and CaO were obtained in the same manner as in Example 1 except that they were adjusted to 5 mol%, 5 mol% and 5 mol%, respectively. The average particle diameter of TiO ₂ particles, ZnO particles, MgO particles and CaO particles contained in the obtained vapor deposition material, the content of TiO ₂ , ZnO, MgO, CaO contained in the vapor deposition material, and the basicity of the pellet are as follows: Table 3 shows.

<Example 35>
A mixed powder of a high purity MgO powder having an average particle size of 0.9 μm and a purity of 99.7% and a high purity CaO powder having an average particle size of 0.6 μm and a purity of 99.8% as the second oxide powder The TiO ₂ powder used and the mixing amount of the mixed powder were adjusted so that TiO ₂ contained in the deposited material after formation was 85 mol%, and MgO and CaO were 5 mol% and 10 mol%, respectively. Except for this, a vapor deposition material was obtained in the same manner as in Example 1. Table 3 below shows the average particle diameters of TiO ₂ particles, MgO particles, and CaO particles contained in the obtained vapor deposition material, the contents of TiO ₂ , MgO, and CaO contained in the vapor deposition material, and the basicity of the pellets. .

Claims (8)

In the vapor deposition material made by mixing the first oxide powder and the second oxide powder,
The first oxide powder is TiO ₂ powder, and the purity of the first oxide powder is 98% or more;
The second oxide powder is one powder selected from the group consisting of ZnO, MgO and CaO, or a mixed powder of two or more kinds, and the second oxide purity of the second oxide powder is 98% or more. And
The vapor deposition material comprises pellets containing the first oxide particles and the second oxide particles,
The molar ratio of the first oxide and the second oxide in the vapor deposition material is 5 to 85:95 to 15, and the basicity of the pellet is 0.1 or more. .   The vapor deposition material according to claim 1, wherein the average particle diameter of the first oxide particles is 0.1 to 10 μm, and the average particle diameter of the second oxide particles is 0.1 to 10 μm.   The metal element A contained in the first oxide and the metal element B contained in the second oxide on the first base film by a vacuum film forming method using the vapor deposition material according to claim 1 or 2 as a target material. A method for producing a film comprising forming an oxide thin film containing The metal element A contained in the first oxide and the metal element B contained in the second oxide on the first base film by a vacuum film forming method using the vapor deposition material according to claim 1 or 2 as a target material. Forming an oxide thin film containing
The thin film sheet whose molar ratio of the said metallic element A and the said metallic element B in the said thin film is 5-85: 95-15.   The thin film sheet according to claim 4, wherein the vacuum film formation method is any one of an electron beam evaporation method, an ion plating method, a reactive plasma evaporation method, a resistance heating method, and an induction heating method. The thin film sheet according to claim 4 or 5, wherein the water vapor permeability S when it is allowed to stand for 1 hour at a temperature of 20 ° C and a relative humidity of 50% RH is 0.3 g / m ² · day or less.   The water vapor transmission rate is T, where T is the water vapor transmission rate when left standing for 1 hour under the conditions of a temperature of 20 ° C. and a relative humidity of 50% RH and then for 100 hours under the conditions of a temperature of 85 ° C. and a relative humidity of 90% RH. The thin film sheet according to claim 6, wherein a rate of change of T with respect to the water vapor permeability S (T / S × 100) is 200% or less.   The lamination sheet formed by laminating | stacking a 2nd base film through the contact bonding layer on the thin film formation side of the thin film sheet of any one of Claim 4 thru | or 7.

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