JP2010244034A5 - - Google Patents

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Publication number
JP2010244034A5
JP2010244034A5 JP2010056798A JP2010056798A JP2010244034A5 JP 2010244034 A5 JP2010244034 A5 JP 2010244034A5 JP 2010056798 A JP2010056798 A JP 2010056798A JP 2010056798 A JP2010056798 A JP 2010056798A JP 2010244034 A5 JP2010244034 A5 JP 2010244034A5
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JP
Japan
Prior art keywords
atom
group
integer
carbon atoms
fluorine
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JP2010056798A
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English (en)
Japanese (ja)
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JP5491913B2 (ja
JP2010244034A (ja
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Priority to JP2010056798A priority Critical patent/JP5491913B2/ja
Priority claimed from JP2010056798A external-priority patent/JP5491913B2/ja
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Publication of JP2010244034A5 publication Critical patent/JP2010244034A5/ja
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JP2010056798A 2009-03-18 2010-03-12 化学増幅型ポジ型フォトレジスト組成物及びレジストパターンの製造方法 Active JP5491913B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2010056798A JP5491913B2 (ja) 2009-03-18 2010-03-12 化学増幅型ポジ型フォトレジスト組成物及びレジストパターンの製造方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2009066247 2009-03-18
JP2009066247 2009-03-18
JP2010056798A JP5491913B2 (ja) 2009-03-18 2010-03-12 化学増幅型ポジ型フォトレジスト組成物及びレジストパターンの製造方法

Publications (3)

Publication Number Publication Date
JP2010244034A JP2010244034A (ja) 2010-10-28
JP2010244034A5 true JP2010244034A5 (https=) 2014-03-13
JP5491913B2 JP5491913B2 (ja) 2014-05-14

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ID=43097054

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010056798A Active JP5491913B2 (ja) 2009-03-18 2010-03-12 化学増幅型ポジ型フォトレジスト組成物及びレジストパターンの製造方法

Country Status (1)

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JP (1) JP5491913B2 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011063796A (ja) * 2009-08-20 2011-03-31 San Apro Kk 光酸発生剤，光硬化性組成物及びポジ型フォトレジスト組成物
JP7790991B2 (ja) * 2021-02-12 2025-12-23 住友化学株式会社 塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61100557A (ja) * 1984-10-22 1986-05-19 ゼネラル・エレクトリツク・カンパニイ トリアリールスルホニウム塩およびその製法
JPH10287643A (ja) * 1997-04-10 1998-10-27 Nippon Kayaku Co Ltd 新規オニウム塩、光重合開始剤、これを含有するエネルギー線硬化性組成物及びその硬化物
EP1902019B1 (en) * 2005-07-01 2010-07-07 Basf Se Sulphonium salt initiators
WO2007032109A1 (ja) * 2005-09-15 2007-03-22 Konica Minolta Medical & Graphic, Inc. 光硬化性組成物、光硬化性インク組成物及びそれを用いる印刷方法とレジスト用組成物
JP2008120700A (ja) * 2006-11-08 2008-05-29 San Apro Kk スルホニウム塩

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