JP2010177007A - Organic el display - Google Patents

Organic el display Download PDF

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JP2010177007A
JP2010177007A JP2009017605A JP2009017605A JP2010177007A JP 2010177007 A JP2010177007 A JP 2010177007A JP 2009017605 A JP2009017605 A JP 2009017605A JP 2009017605 A JP2009017605 A JP 2009017605A JP 2010177007 A JP2010177007 A JP 2010177007A
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pixel
light emitting
light
organic el
reflected
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JP5173871B2 (en
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Yutaka Hisayoshi
豊 久芳
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Kyocera Corp
京セラ株式会社
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Abstract

An organic EL display excellent in visibility in which a black display is clearly projected is provided.
A pixel 3 having a light emitting region R1 and a non-light emitting region R2 provided adjacent to the light emitting region R1, and the light emitting wavelength of the pixel 3 in a state where the light emitting region R1 of the pixel 3 is not emitting light. An organic EL display characterized in that there is a maximum value of a spectrum of a reflected wave reflected by external light incident on the non-light emitting region R2 in the region.
[Selection] Figure 3

Description

  The present invention relates to an organic EL display.

  An organic EL display has features such as thinness, wide viewing angle, low power consumption, and excellent moving image display characteristics, and a plurality of pixels arranged in a matrix is conventionally known.

  In order to display an image, such an organic EL display requires, for example, a pixel that emits red light, a pixel that emits green light, a pixel that emits blue light, and the like. Note that a material constituting the pixel is selected in accordance with the color of emitted light.

  Unlike the liquid crystal display, the organic EL display can display black because the pixels do not emit light by themselves. Therefore, the organic EL display has a very excellent contrast as compared with the liquid crystal display.

  Further, the organic EL display increases the contrast by adjusting the emission of light emitted from the pixels to the outside. However, the organic EL display has a problem that external light such as sunlight that is incident on the pixels is reflected and the contrast is lowered. Thus, a technique for improving the contrast of an organic EL display by suppressing reflection of external light incident on the pixel is disclosed (see Patent Document 1 below).

JP 2002-373776 A

  However, in the technique described in Patent Document 1, when black display is performed, for example, a reflected wave that is reflected when external light is incident on a red pixel and a reflected wave that is reflected when external light is incident on a green pixel are reflected. Etc., and colors such as red may be mixed with black and reflected in the human eye.

  This invention is made | formed in view of the subject mentioned above, Comprising: It aims at providing the organic EL display excellent in the visibility by which a black display is projected clearly.

  The organic EL display according to the present invention includes a pixel having a light emitting region and a non-light emitting region provided adjacent to the light emitting region, and the light emitting region of the pixel is in a light emitting wavelength region when the light emitting region is not emitting light. There is a maximum value of a spectrum of a reflected wave reflected by incident external light in the non-light emitting region.

  The organic EL display of the present invention is characterized in that a minimum value of a spectrum of a reflected wave reflected by external light incident on the light emission wavelength region is present in the light emission wavelength region.

  The organic EL display of the present invention includes a picture element having a plurality of the pixels, and the picture element includes a first pixel that emits a first color, a second pixel that emits a second color, and a third color. The first pixel, the second pixel, and the third pixel have a reflected wave reflected by external light incident on each pixel within the light emission wavelength region of each pixel. It is characterized by the presence of a local maximum of the spectrum.

  In addition, the organic EL display of the present invention includes a display unit in which a plurality of the pixels are arranged, and the reflected wave reflected by the external light incident on the light emitting region and the external light incident on and reflected by the non-light emitting region. The reflected wave is combined, and the color coordinates of the combined spectrum extracted from the display unit are CIEx <0.4 and CIEy <0.4.

  Moreover, the organic EL display of the present invention is characterized in that the non-light-emitting region is provided so as to surround the light-emitting region.

  The organic EL display according to the present invention is characterized in that a plurality of the picture elements are provided in a matrix, and the plurality of pixels in the picture elements are arranged in a regular order.

  In the organic EL display of the present invention, the non-light-emitting areas of the pixels in the picture element have different thicknesses.

  According to the present invention, it is possible to provide an organic EL display excellent in visibility in which a black display is clearly projected.

It is a top view of the organic electroluminescent display which concerns on one Embodiment of this invention. It is an enlarged plan view of pixels and picture elements arranged in a matrix on the display unit. It is an expanded sectional view of one pixel. It is sectional drawing for demonstrating each layer which comprises an organic EL element. It is a top view which shows the state in which the external light which injected into the pixel is reflected. FIG. 6A is a diagram illustrating a spectrum of reflected waves in a light emitting region and a spectrum of reflected waves in a non-light emitting region when the pixel emits red light when the pixel is not emitting light. FIG. 6B is a drawing showing a combined spectrum of the spectrum of the reflected wave in the light emitting region and the spectrum of the reflected wave in the non-light emitting region. FIG. 7A is a diagram illustrating a spectrum of reflected waves in a light emitting region and a spectrum of reflected waves in a non-light emitting region when the pixel emits green light when the pixel is not emitting light. FIG. 7B is a drawing showing a combined spectrum of the spectrum of the reflected wave in the light emitting region and the spectrum of the reflected wave in the non-light emitting region. FIG. 8A is a diagram illustrating a spectrum of reflected waves in a light emitting region and a spectrum of reflected waves in a non-light emitting region when the pixel emits blue light when the pixel is not emitting light. FIG. 8B is a diagram showing a combined spectrum of the spectrum of the reflected wave in the light emitting region and the spectrum of the reflected wave in the non-light emitting region. FIG. 9A and FIG. 9B are cross-sectional views of one pixel for explaining a manufacturing process of the organic EL display. FIGS. 10A and 10B are cross-sectional views of one pixel for explaining a manufacturing process of an organic EL display. FIG. 11A and FIG. 11B are cross-sectional views of one pixel for explaining a manufacturing process of an organic EL display. 12A and 12B are cross-sectional views of one pixel for explaining a manufacturing process of an organic EL display. In the modification of the organic electroluminescent display which concerns on one Embodiment of this invention, it is a top view which shows the state in which the external light which injected into the pixel is reflected.

  In the present invention, the maximum value of the spectrum of the reflected wave reflected in the non-light emitting region is set to the minimum value of the spectrum of the reflected wave reflected in the light emitting region. Then, a spectrum wavelength is obtained from the combination of both reflected waves, and the color represented by the spectrum is made achromatic. As a result, it is possible to provide an organic EL display excellent in visibility in which a black display is clearly projected. The combined spectrum of the reflected waves can be represented by, for example, the color coordinates of the CIE color system, and the achromatic color is represented by the CIE color coordinates and in the vicinity of CIEx = 0.3 and CIEy = 0.3.

  The present invention will be described below with reference to the drawings. FIG. 1 is a plan view of an organic EL display according to an embodiment of the present invention. FIG. 2 is a plan view of pixels and picture elements of the organic EL display according to the embodiment of the present invention. FIG. 3 is an enlarged cross-sectional view of a pixel of the organic EL display according to the embodiment of the present invention. FIG. 4 is a cross-sectional view of an organic EL element provided in the pixel.

  As shown in FIG. 1, the organic EL display 1 is used for home appliances such as a television, electronic equipment such as a mobile phone or a computer device, and includes an element substrate 2 and a plurality of pixels formed on the element substrate 2. 3 and a driving IC 4 that controls the light emission of the pixel 3.

  The element substrate 2 is made of, for example, glass or plastic, and a plurality of pixels 3 are formed in the display unit D1 located in the center of the element substrate 2. A driving IC 4 is mounted on the mounting portion D2 located at the end of the element substrate 2.

  The pixel 3 can emit any one of red, green, and blue colors. This can determine the color of light emission by selecting the material which comprises the organic EL element 5 so that it may mention later. In this embodiment, the pixels emit light of red, green, or blue. However, for example, white or orange light may be emitted.

  Here, in the present embodiment, the pixel 3R as the first pixel that emits red light as the first color, the pixel 3G as the second pixel that emits green light as the second color, and the third color A pixel composed of a pixel 3B as a third pixel that emits blue light as a pixel 3P. A plurality of picture elements 3P are provided in a matrix on the display unit D1, and the pixels 3 in the picture element 3P are arranged in a regular order. That is, in the display portion D1, the pixels 3R, the pixels 3G, and the pixels 3B are sequentially arranged from one end to the other end. That is, a plurality of picture elements 3P are provided in a matrix, and a plurality of pixels 3 in the picture element 3P are arranged in a regular order.

  As shown in FIG. 3, the pixel 3 includes a light emitting region R1 and a non-light emitting region R2 provided adjacent to the light emitting region R1, and an organic EL element 5 capable of emitting light is provided in the light emitting region R1. ing. Further, the non-light emitting region R2 is provided so as to surround the periphery of the light emitting region R1.

  Each pixel 3 is provided with a support portion 6. The support part 6 has a shape in which the cross section is wider at the lower part than at the upper part, and is formed on an insulator 7 to be described later. As will be described later, a vapor deposition mask can be placed on the support portion 6 in order to coat the layers constituting the organic EL element 5 by vapor deposition. The support portion 6 is made of, for example, an inorganic insulating material such as silicon oxide, silicon nitride, or silicon oxynitride, or an organic insulating material such as phenol resin, novolac resin, acrylic resin, or polyimide resin. In addition, the support part 6 should just support a vapor deposition mask. Therefore, the ratio (occupied area) that the support portion 6 occupies in the non-light emitting region R2 in a plan view is set to 20% or less. Moreover, the thickness of the support part 6 is set to 1 μm or more.

  In addition, a sealing substrate 8 is formed on the element substrate 2 so as to face the element substrate 2. The sealing substrate 8 is made of a transparent substrate, and for example, glass or plastic can be used. In this embodiment, since the top emission type organic EL display emits light from the element substrate 2 side toward the sealing substrate 8 side, a transparent member is used for the sealing substrate 8.

  A protective film 9 is formed on the display portion D1 of the element substrate 2 so as to cover the pixels 3. The protective film 9 can reduce the ingress of oxygen or moisture into each pixel 3 and suppress the deterioration of each pixel 3. The protective film 9 is made of an inorganic insulating material such as silicon nitride, silicon oxide, or silicon oxynitride. Further, the sealing substrate 8 is bonded onto the protective film 9 via the sealing material 10. The protective film 9 is set to have a thickness of 1 μm or more in order to suppress deterioration of each pixel 3.

  The sealing material 10 has a function as an adhesive and can fix the element substrate 2 and the sealing substrate 8 by being cured. As the sealing material 10, for example, a photocurable resin such as an acrylic resin, an epoxy resin, a urethane resin, or a silicon resin, or a thermosetting resin can be used. In this embodiment, a photocurable epoxy resin that is cured by irradiation with ultraviolet rays is used. The sealing material 10 is made of an organic resin material, and the thickness is set to 1 μm or more in order to firmly bond the element substrate 2 and the sealing substrate 8.

  Next, as shown in FIG. 3, various layers formed between the element substrate 2 and the sealing substrate 8 will be described. On the element substrate 2, a circuit layer 11 made of TFT, electric wiring, or the like is formed. Furthermore, an insulating layer 12 made of, for example, silicon nitride, silicon oxide, silicon oxynitride, or the like is formed on the circuit layer 11 so as not to cause an electrical short except for a predetermined region of the circuit layer 11.

  Further, a planarizing film 13 is formed on the insulating layer 12 in order to reduce surface irregularities caused by the circuit layer 11 and the insulating layer 12. Since the circuit layer 11 has a plurality of patterned electrical wirings, irregularities are formed on the surface thereof. When the organic EL element 5 is formed on an uneven surface, the electrode layers constituting the organic EL element 5 may be short-circuited and the organic EL element 5 may not emit light. Therefore, a planarizing film 13 is formed on the insulating layer 12.

  The planarizing film 13 can be made of an insulating organic material such as a novolac resin, an acrylic resin, an epoxy resin, or a silicon resin. The thickness of the planarizing film 13 is set to 2 μm or more and 5 μm or less, for example.

  Further, a contact hole S that penetrates the planarizing film 13 is formed in the planarizing film 13. The contact hole S is formed so that the lower part is narrower than the upper part. The contact hole S is formed in each pixel 3, and a part of the circuit layer 11 is exposed at the bottom of the contact hole S.

  FIG. 4 is a cross-sectional view for explaining the configuration of the organic EL element 5. An organic EL element 5 is formed on the planarization film 13 located in the light emitting region R1. As shown in FIGS. 3 and 4, the organic EL element 5 includes a first electrode layer 14, an organic light emitting layer 15 formed on the first electrode layer 14, and a second electrode formed on the organic light emitting layer 15. And an electrode layer 16. Here, the light emitting region R1 refers to a region that emits light when the first electrode layer 14 and the organic light emitting layer 15 are in direct contact with each other and a current flows between the first electrode layer 14 and the second electrode layer 16. .

  The first electrode layer 14 is formed on the planarization film 13. The first electrode layer 14 is made of a material having a high light reflectivity such as a metal such as aluminum, silver, copper, gold, rhodium or neodymium, or an alloy thereof. In this way, by configuring the first electrode layer 14 from a material having a high light reflectance, the light extraction efficiency can be improved in the top emission type organic EL element 5. The thickness of the first electrode layer 14 is set to, for example, 50 nm or more and 500 nm or less.

  A part of the first electrode layer 14 is formed from the planarizing film 13 to the inner peripheral surface of the contact hole S. A part of the first electrode layer 14 formed on the inner peripheral surface of the contact hole S is connected to a part of the circuit layer 11 exposed from the bottom of the contact hole S.

  An insulator 7 is formed so as to surround the light emitting region R1. Specifically, the insulator 7 is formed on the first electrode layer 14 so as to expose a part of the first electrode layer 14 corresponding to the light emitting region R1. Then, the organic light emitting layer 15 is formed on the exposed first electrode layer 14, and the second electrode layer 16 is formed thereon. The insulator 7 is made of an inorganic insulating material such as silicon nitride, silicon oxide, or silicon oxynitride. Since the insulator 7 is made of an inorganic insulating material, the thickness can be set to 500 nm or less.

  The organic light emitting layer 15 is formed on the first electrode layer 14 surrounded by the insulator 7 and is composed of a plurality of layers. In the present embodiment, the organic light emitting layer 15 has a configuration in which a hole injection layer 17, a hole transport layer 18, a light emitting layer 19, an electron transport layer 20, and an electron injection layer 21 are sequentially stacked. In addition, as a material constituting each layer of the organic light emitting layer 15, an appropriate material is selected according to the color of the emitted light.

  A second electrode layer 16 is formed on the organic light emitting layer 15. The second electrode layer 16 extends from the organic light emitting layer 15 to the insulator 7. The pixel 3 is formed so as to cover it, and the second electrode layer 16 is continuously formed between adjacent pixels 3. The second electrode layer 16 is formed using a light-transmitting conductive material such as indium tin oxide (ITO) or tin oxide in order to extract light from the upper surface side of the organic light emitting layer 15. Moreover, when the 2nd electrode 16 consists of materials, such as magnesium, silver, aluminum, or calcium, for example, it can be set as a light transmissive electrode by making the thickness into 100 nm or less. Thus, the light emitted from the organic light emitting layer 15 is transmitted through the second electrode layer 16. Then, the transmitted light is emitted to the outside of the organic EL display 1.

  The organic light emitting layer 15 is excited and emits light when a current flows between the first electrode layer 15 and the second electrode layer 16 and holes and electrons are combined. Then, the light emitted from the organic light emitting layer 15 resonates as a standing wave between the first electrode layer 15 and the second electrode layer 16, and the thickness of the organic light emitting layer 15 is adjusted in order to increase the emitted light. Has been. The standing wave means that light emitted from the organic light emitting layer 15 resonates between the first electrode layer 14 and the second electrode layer 16, and the waveform of the resonated light stops and vibrates without proceeding. It looks like a wave.

  Here, in order to make the light emitted from the organic light emitting layer 15 a standing wave, the following (1) is established regarding the film thickness between the first electrode layer 14 and the second electrode layer 16.

  L in the above formula (1) is the film thickness of each layer between the electrodes. n is the refractive index of each layer between the electrodes. Λ is the emission peak wavelength. PN is a positive integer (1, 2, 3,...). The emission peak wavelength means a wavelength at which the light intensity becomes maximum when the intensity (spectrum) for each wavelength of light emitted to the outside is plotted.

  Hereinafter, when there is one standing wave between the electrodes, each layer in the case of a so-called zero-order resonator (PN = 1) will be described. A resonator means a structure set so that light resonates.

  The case where the organic light emitting layer 15 is an organic light emitting layer 15R that emits red light will be described. Here, the emission peak wavelength of the organic light emitting layer 15R is 620 nm. If the organic refractive index at this time is 1.85, the film thickness between the electrodes of the organic light emitting layer 15R is 168 nm.

  The hole injection layer 17R of the organic light emitting layer 15R is made of, for example, α-NPD, TPD, nickel oxide, titanium oxide, fluorocarbon, or CuPc. The thickness of the hole injection layer 17R is set to, for example, 5 nm or more and 40 nm or less.

  Further, the hole transport layer 18R of the organic light emitting layer 15R is formed of, for example, N, N′-bis (3-methylphenyl)-(1,1′-biphenyl) -4,4′-diamine (TPD), 4,4. Aromatic diamine compounds such as' -bis [N- (naphthyl) -N-phenyl-amino] biphenyl (α-NPD), oxazole, oxadiazole, triazole, imidazole, imidazolone, stilbene derivative, pyrazoline derivative, tetrahydroimidazole, Starburst aromatic or aromatic amine compounds such as polyarylalkanes, butadiene, and 4,4 ′, 4 ″ -tris (N- (3-methylphenyl) N-phenylamino) triphenylamine (m-MTDATA) In addition, the hole transport layer 18R is composed of 1,4,5,8,9,12-hexaazatri. Eniren or it can be used a heterocyclic compound such as derivatives such as cyano groups attached. The thickness of the hole transport layer 18R is set to, for example, 10nm or 50nm or less.

The light emitting layer 19R of the organic light emitting layer 15R is, for example CBP, Alq 3 or a host material such SDPVBi or DCJTB these host materials, coumarin, quinacridone, perinone derivatives having phenanthrene group, oligothiophene derivatives or perylene derivatives A material containing the dopant material can be used. The thickness of the light emitting layer 19R is set to, for example, 20 nm or more and 40 nm or less.

The electron transport layer 20R of the organic light emitting layer 15R is, for example, tris (8-quinolinolato) aluminum (Alq 3 ), N, N′-bis (3-methylphenyl)-(1,1′-biphenyl) -4, for example. , 4′-diamine (TPD), or 4,4′-bis [N- (naphthyl) -N-phenyl-amino] biphenyl (α-NPD) and the like, oxazole, oxadiazole, triazole, Imidazole, imidazolone, stilbene derivative, pyrazoline derivative, tetrahydroimidazole, polyarylalkane, butadiene, or 4,4 ′, 4 ″ -tris (N- (3-methylphenyl) N-phenylamino) triphenylamine (m-MTDATA A starburst aromatic compound or an amine compound such as) The thickness of the electron transport layer 20R can be used. For example, it is set to 20 nm or more and 60 nm or less.

  Further, for example, lithium fluoride, cesium fluoride, carbon fluoride, or the like can be used for the electron injection layer 21R of the organic light emitting layer 15R. The thickness of the electron injection layer 21R is set to, for example, not less than 0.5 nm and not more than 2 nm.

  Next, the case where the organic light emitting layer 15 is an organic light emitting layer 15G that emits green will be described. Here, the emission peak wavelength of the organic light emitting layer 15G is 520 nm. If the organic refractive index at this time is 1.85, the film thickness between the electrodes of the organic light emitting layer 15G is 140 nm.

  The hole injection layer 17G of the organic light emitting layer 15G is made of, for example, α-NPD, TPD, nickel oxide, titanium oxide, fluorocarbon, or CuPc. The thickness of the hole injection layer 17G is set to, for example, 5 nm or more and 40 nm or less.

  Further, the hole transport layer 18G of the organic light emitting layer 15G is formed of, for example, N, N′-bis (3-methylphenyl)-(1,1′-biphenyl) -4,4′-diamine (TPD), 4,4. Aromatic diamine compounds such as' -bis [N- (naphthyl) -N-phenyl-amino] biphenyl (α-NPD), oxazole, oxadiazole, triazole, imidazole, imidazolone, stilbene derivative, pyrazoline derivative, tetrahydroimidazole, Starburst aromatic or aromatic amine compounds such as polyarylalkanes, butadiene, and 4,4 ′, 4 ″ -tris (N- (3-methylphenyl) N-phenylamino) triphenylamine (m-MTDATA) In addition, the hole transport layer 18G is composed of 1,4,5,8,9,12-hexaazatri. Eniren or it can be used a heterocyclic compound such as derivatives such as cyano groups attached. The thickness of the hole transport layer 18G is set, for example, 10nm or 50nm or less.

The light emitting layer 19G of the organic light emitting layer 15G, for example CBP, Alq 3 or a host material such SDPVBi or styrylamine these host materials, Perurin, silole derivatives having a benzene ring, perinone derivatives having phenanthrene group, oligo A material containing a dopant material such as a thiophene derivative, a perylene derivative, or an azomethine zinc complex can be used. The thickness of the light emitting layer 18G is set to, for example, 20 nm or more and 40 nm or less.

In addition, the electron transport layer 20G of the organic light emitting layer 15G includes, for example, tris (8-quinolinolato) aluminum (Alq 3 ), N, N′-bis (3-methylphenyl)-(1,1′-biphenyl) -4, Aromatic diamine compounds such as 4′-diamine (TPD) or 4,4′-bis [N- (naphthyl) -N-phenyl-amino] biphenyl (α-NPD), oxazole, oxadiazole, triazole, imidazole , Imidazolone, stilbene derivative, pyrazoline derivative, tetrahydroimidazole, polyarylalkane, butadiene, or 4,4 ′, 4 ″ -tris (N- (3-methylphenyl) N-phenylamino) triphenylamine (m-MTDATA) A starburst aromatic or amine compound such as, for example, can be used. For example, it is set to 20 nm or more and 60 nm or less.

  Further, for example, lithium fluoride, cesium fluoride, carbon fluoride, or the like can be used for the electron injection layer 21G of the organic light emitting layer 15G. The thickness of the electron injection layer 21G is set to, for example, not less than 0.5 nm and not more than 2 nm.

  Next, the case where the organic light emitting layer 15 is an organic light emitting layer 15B that emits blue light will be described. Here, the emission peak wavelength of the organic light emitting layer 15B is 460 nm. If the organic refractive index at this time is 1.85, the film thickness between the electrodes of the organic light emitting layer 15B is 125 nm. The organic refractive index means an average refractive index obtained by averaging the refractive indexes of the respective layers between the electrodes.

  The hole injection layer 17B of the organic light emitting layer 15B is made of, for example, α-NPD, TPD, nickel oxide, titanium oxide, carbon fluoride, CuPc, or the like. The thickness of the hole injection layer 17B is set to, for example, 5 nm or more and 40 nm or less.

  Further, the hole transport layer 18B of the organic light emitting layer 15B is formed of, for example, N, N′-bis (3-methylphenyl)-(1,1′-biphenyl) -4,4′-diamine (TPD), 4,4. Aromatic diamine compounds such as' -bis [N- (naphthyl) -N-phenyl-amino] biphenyl (α-NPD), oxazole, oxadiazole, triazole, imidazole, imidazolone, stilbene derivative, pyrazoline derivative, tetrahydroimidazole, Starburst aromatic or aromatic amine compounds such as polyarylalkanes, butadiene, and 4,4 ′, 4 ″ -tris (N- (3-methylphenyl) N-phenylamino) triphenylamine (m-MTDATA) In addition, the hole transport layer 18B is composed of 1,4,5,8,9,12-hexaazatri. Eniren or it can be used a heterocyclic compound such as derivatives such as cyano groups attached. The thickness of the hole transport layer 18B is set, for example, 10nm or 50nm or less.

  The light emitting layer 19B of the organic light emitting layer 15B has a host material such as CBP or SDPVBi, or a styrylamine, perlin, cyclopentadiene derivative, tetraphenylbutadiene, triphenylamine structure, and a vinyl group bonded to these host materials. And a compound containing a dopant material such as an oxadiazole derivative, a pyrazoloquinoline derivative, a distyrylarylene derivative, or a silole derivative having a benzene ring can be used. The thickness of the light emitting layer 18B is set to 20 nm or more and 40 nm or less, for example.

In addition, the electron transport layer 20B of the organic light emitting layer 15B includes, for example, tris (8-quinolinolato) aluminum (Alq 3 ), N, N′-bis (3-methylphenyl)-(1,1′-biphenyl) -4, Aromatic diamine compounds such as 4′-diamine (TPD) or 4,4′-bis [N- (naphthyl) -N-phenyl-amino] biphenyl (α-NPD), oxazole, oxadiazole, triazole, imidazole , Imidazolone, stilbene derivative, pyrazoline derivative, tetrahydroimidazole, polyarylalkane, butadiene, or 4,4 ′, 4 ″ -tris (N- (3-methylphenyl) N-phenylamino) triphenylamine (m-MTDATA) A starburst aromatic compound or an amine compound such as an electron transport layer 20B can be used. For example, it is set to 20 nm or more and 60 nm or less.

Further, for example, lithium fluoride, cesium fluoride, or carbon fluoride can be used for the electron injection layer 21B of the organic light emitting layer 15B. The thickness of the electron injection layer 21B is set to, for example, not less than 0.5 nm and not more than 2 nm.
As described above, depending on the color emitted by the organic light emitting layer 15, the film thickness of each layer constituting it varies. That is, the light emitting region of each pixel in the picture element contains a different light emitting material. In this way, by adjusting the film thickness between the electrodes, the light emitted from the organic light emitting layer 15 can be set to be a standing wave.

  Thus, in order to increase the light emitted from the organic light emitting layer 15, the thickness of the organic light emitting layer 15 may be adjusted. This is because the wavelength range of visible light is about 380 nm to 780 nm. That is, the resonator can be set by adjusting the thickness of the layer within a range not exceeding the wavelength range of visible light. In a layer exceeding the wavelength range of visible light, for example, a layer having a thickness of 1 μm or more, such as the protective film 9 or the sealing material 10, the wavelength to be strengthened and the wavelength to be weakened appear alternately, and finally the averaged wavelength and Become. Therefore, in a layer having a thickness exceeding the wavelength range of visible light, the resonator cannot be set by adjusting the thickness. Therefore, in order to set the resonator, a layer having a thickness within the wavelength range of visible light is adjusted.

  Next, a state where the organic light emitting layer 15 is not emitting light, that is, a case where a black image is displayed will be described. When the organic light emitting layer 15 is not emitting light, no light is emitted from the pixel in which the organic light emitting layer 15 is present, so that it is recognized as black by human eyes. However, external light such as sunlight is incident on the display unit D 1, reflected at the interface between the first electrode layer 14 and the organic light emitting layer 15, and emitted from the organic EL display 1. When external light is reflected, even if the organic light emitting layer 15 is in a non-light emitting state, due to the influence of the wavelength contained in the reflected light, a color other than black, such as reddish, is mixed with human eyes. May be reflected. Note that “non-light emission” refers to a time when a black display is displayed on a pixel.

  In this embodiment, the thickness of the insulator 7 is adjusted so that a black image is displayed to the human eye when the pixel is in a non-light emitting state.

  In order to make the thickness of the insulator 7 within the wavelength range of visible light, an inorganic insulating material that can be made 1 μm or less in thickness using a CVD method is used. If an organic insulating material is used for the insulator 7, it is difficult to adjust the thickness, and it is difficult to control the wavelength of reflected light. Therefore, the thickness of the insulator 7 is set so that the light of the complementary color is reflected by the non-light emitting region R2 with respect to the light incident on the light emitting region R1 and reflected. That is, the reflected waves reflected by the light emitting region R1 are canceled by the reflected waves reflected by the non-light emitting region R2, and black is projected on the human eye when no light is emitted.

  Here, a method for setting the thickness of the insulator 7 will be described.

  The thickness of the insulator 7 is such that when the pixel 3 is in a non-light-emitting state, the external light is incident on the non-light-emitting region with respect to the minimum value of the spectrum of the reflected wave reflected by the external light incident on the light-emitting flow region R1. The maximum value of the spectrum of the reflected wave reflected is set to be large.

  FIG. 5 is a plan view showing reflected waves reflected by the pixels 3R, 3G, and 3B located in the light emitting region R1 and reflected waves reflected by the insulator 7 located in the non-light emitting region R2. Note that a reflected wave reflected by the pixel 3R is a reflected wave 3RW, a reflected wave reflected by the pixel 3G is a reflected wave 3GW, and a reflected wave reflected by the pixel 3B is a reflected wave 3BW. The thickness of the insulator 7 is set to be different between the pixel 3R, the pixel 3G, and the pixel 3B. The insulator of the pixel 3R is the insulator 7R, the insulator of the pixel 3G is the insulator 7G, and the insulator of the pixel 3B is the insulator 7B. Note that a reflected wave reflected by the insulator 7R is a reflected wave 7RW, a reflected wave reflected by the insulator 7G is a reflected wave 7GW, and a reflected wave reflected by the insulator 7B is a reflected wave 7BW.

  FIG. 6A is a diagram illustrating the spectrum of the reflected wave in the light emitting region and the spectrum of the reflected wave in the non-light emitting region when no light is emitted in the pixel 3R. FIG. 7A is a diagram illustrating the spectrum of the reflected wave in the light emitting region and the spectrum of the reflected wave in the non-light emitting region when no light is emitted in the pixel 3G. FIG. 8A is a diagram showing the spectrum of the reflected wave in the light emitting region and the spectrum of the reflected wave in the non-light emitting region when no light is emitted in the pixel 3B. The solid line in FIG. 6A, FIG. 7A, or FIG. 8A indicates the reflectance of the reflected wave in the light emitting region, and the dotted line indicates the reflectance of the reflected wave in the non-light emitting region.

  FIG. 6B shows a combined spectrum in which the reflected wave reflected by the light emitting region of the pixel 3R and the reflected wave reflected by the non-light emitting region are combined. FIG. 7B is a diagram showing a combined spectrum in which the reflected wave reflected by the light emitting region of the pixel 3G and the reflected wave reflected by the non-light emitting region are combined. FIG. 8B is a drawing showing a combined spectrum in which the reflected wave reflected by the light emitting region of the pixel 3B and the reflected wave reflected by the non-light emitting region are combined.

  6 to 7, the light emitting region and the non-light emitting region have the same area. Here, the reflectance will be described. When one external light is incident, if the reflected light is 0.5, the reflectance is 0.5.

  When the pixel 3R is in the non-light emitting state, the minimum value of the spectrum of the reflected wave 3RW reflected by the external light incident on the pixel 3R is measured. As shown in FIG. 6A, the light having a red wavelength has a light emission wavelength range of 600 nm or more and 700 nm or less, and thus the minimum value of the spectrum of the reflected wave 3RW becomes a reflectance of 0.2 or less in this range. It can be confirmed that The reflected wave 3RW depends on the material and film thickness of the light emitting region R1. Since a predetermined material and film thickness of the light emitting region R1 are selected, it is difficult to change the spectrum of the reflected wave 3RW. Therefore, after determining the spectrum of the reflected wave 3RW, the spectrum of the reflected wave 7RW is determined.

  Next, the thickness of the insulator 7R is set so that the spectrum of the reflected wave 7RW reflected on the insulator 7R located in the non-light emitting region becomes a reflectance of 0.2 or more when the emission wavelength region is in the range of 600 nm to 700 nm. Adjust. By setting the thickness of the insulator 7R in the pixel 3R to 350 nm or more and 410 nm or less, as shown in FIG. 6A, the reflectance of the spectrum of the reflected wave 7RW is set to 0.8 or more in the emission wavelength region. Can do. Then, in the state where the light emitting region R1 of the pixel 3R is not emitting light, the maximum value of the spectrum of the reflected wave 7RW reflected by the external light entering the non-emitting region R2 within the light emitting wavelength region of the pixel 3R may exist. it can.

  As a result, the spectrum of the combined wave of the reflected wave 3RW and the reflected wave 7RW can be increased within the emission wavelength region, and as shown in FIG. A wave spectrum can be obtained. Then, the color coordinates in the emission wavelength region can be extracted from the combined spectrum.

  Therefore, the thickness of the insulator 7R is adjusted so that the color coordinate indicated by the combined spectrum matches the coordinate point indicating the desired achromatic color. By adjusting the thickness of the insulator 7R in this way, the combined wave of the reflected wave 3RW and the reflected wave 7RW can be made into a spectrum having an achromatic color.

  Similarly, when the pixel 3G is in a non-light emitting state, the minimum value of the spectrum of the reflected wave 3GW reflected by the external light incident on the pixel 3G is measured. As shown in FIG. 7A, since the light of the green wavelength has a light emission wavelength range of 480 nm or more and 550 nm or less, the minimum value of the spectrum of the reflected wave 3 GW becomes a reflectance of 0.2 or less in this range. It can be confirmed that

  Next, in the wavelength range of 480 nm or more and 550 nm or less, the spectrum of the reflected wave 7GW reflected on the insulator 7G located in the non-light emitting region is such that the reflectance is 0.2 or more. Adjust the thickness of 7G. By setting the thickness of the insulator 7G in the pixel 3G to be 270 nm or more and 310 nm or less, the reflectance of the spectrum of the reflected wave 7 GW can be 0.8 or more as shown in FIG. Then, in the state where the light emitting region R1 of the pixel 3G is not emitting light, the maximum value of the spectrum of the reflected wave 7GW reflected by the external light incident on the non-emitting region R2 within the light emitting wavelength region of the pixel 3G may exist. it can.

  Then, as shown in FIG. 7B, in the emission wavelength region, a combined spectrum indicating the combination of both can be obtained. Then, the color coordinates in the emission wavelength region can be extracted from the combined spectrum.

  Therefore, the thickness of the insulator 7G is adjusted so that the color coordinate indicated by the combined spectrum matches the coordinate point indicating the desired achromatic color. In this way, by adjusting the thickness of the insulator 7G, the combined wave of the reflected wave 3GW and the reflected wave 7GW can be made into a spectrum having an achromatic color.

  Further, similarly, when the pixel 3B is in the non-light emitting state, the minimum value of the spectrum of the reflected wave 3BW reflected by the external light incident on the pixel 3B is measured. As shown in FIG. 8 (A), the light having a blue wavelength has an emission wavelength region in the range of 400 nm to 480 nm, and therefore the minimum value of the spectrum of the reflected wave 3BW is less than the reflectance of 0.2 in that range. It can be confirmed that

  Next, in the wavelength range of 400 nm or more and 480 nm or less, the thickness of the insulator 7B is set so that the spectrum of the reflected wave 7BW reflected on the insulator 7B located in the non-light emitting region has a reflectance of 0.2 or more. adjust. By setting the thickness of the insulator 7B in the pixel 3B to 230 nm or more and 260 nm or less, the reflectance of the spectrum of the reflected wave 7BW can be 0.6 or more as shown in FIG. Then, in the state where the light emitting region R1 of the pixel 3B is not emitting light, the maximum value of the spectrum of the reflected wave 7BW reflected by the external light entering the non-emitting region R2 within the light emitting wavelength region of the pixel 3B may exist. it can.

  And as shown to FIG. 8 (B), the spectrum which shows both multiplexing in the light emission wavelength area | region can be obtained. Then, the color coordinates in the emission wavelength region can be extracted from the combined spectrum.

  Therefore, the thickness of the insulator 7B is adjusted so that the color coordinate indicated by the combined spectrum matches the coordinate point indicating the desired achromatic color. In this way, by adjusting the thickness of the insulator 7B, the combined wave of the reflected wave 3BW and the reflected wave 7BW can be made into an achromatic spectrum.

  As described above, the thickness of each insulator 7 is set in each of the pixel 3R, the pixel 3G, and the pixel 3B. Then, the color coordinates represented by the combined spectrum of the reflected waves reflected by each pixel are made achromatic. As a result, in each pixel, the reflected wave reflected by the light emitting region R1 is canceled by the reflected wave reflected by the non-light emitting region R2, and black is projected on the human eye when no light is emitted. Can do.

  According to this embodiment, if the thickness of the insulator 7 is adjusted for any one of the pixel 3R, the pixel 3G, or the pixel 3B, an effect of making the combined spectrum of the pixel an achromatic color can be obtained. Furthermore, by adjusting the thickness of the insulator 7 for any of the pixels 3R, 3G, and 3B, the reflection of external light when no light is emitted can be effectively achromatic.

  According to the present invention, the influence of external light reflection can be suppressed during black display by controlling the external light reflection in the non-light emitting region using the optical setting. Then, it is possible to correct the deviation of the pixel from the achromatic color due to the influence of external light reflection.

  Below, the manufacturing method of the organic electroluminescent display 1 which concerns on embodiment of this invention is demonstrated in detail using FIGS. 9-12.

  First, a substrate formed by patterning the circuit layer 11 and the insulating layer 12 on the element substrate 2 is prepared. The circuit layer 11 and the insulating layer 12 are formed in a predetermined pattern by using a conventionally known thin film forming technique such as a vapor deposition method, a CVD method or a sputtering method, or a thin film processing technique such as a photolithography method or an etching method.

  Then, as shown in FIG. 9A, an organic resin film 13x is formed by using a conventionally known spin coating method so as to cover the circuit layer 11 and the insulating layer 12, for example. Further, the organic resin film 13x is exposed on the organic resin film 13x using an exposure mask, and further developed and baked to expose a part of the circuit layer 11 as shown in FIG. 9B. A planarizing film 13 having a contact hole S whose lower part is narrower than the upper part is formed. The organic resin film 13x becomes the planarizing film 13 after curing.

  Next, as shown in FIG. 10A, a first electrode layer 14 made of, for example, an alloy of aluminum and neodymium is formed on the planarizing film 13. Specifically, a metal film is formed on the planarizing film 13 and the through hole S using a sputtering method. Then, the first electrode layer 14 can be formed by patterning the metal film by an etching method or the like.

  Next, an inorganic insulating material layer made of, for example, silicon nitride is formed on the first electrode layer 14 by using, for example, a CVD method. Then, as shown in FIG. 10B, the insulator 7 is formed by patterning the inorganic insulating material layer using a thin film processing technique. Specifically, the thickness of the insulators of the pixels 3R, 3G, and 3B is assumed in advance so that the reflected wave reflected by each light emitting region is complementary to each light emitting region. Then, an insulator thickness suitable for the light emitting region of each pixel 3 is selected, and a thin film processing technique such as a photolithography method or an etching method is used a plurality of times to form an insulator 7 having a predetermined thickness on each pixel. can do.

  Further, as shown in FIG. 11A, a support portion 6 having a lower width than the upper portion is formed on the insulator 7 using a conventionally known thin film forming technique and thin film processing technique. And as shown in FIG.11 (B), the organic light emitting layer 15 is formed on the 1st electrode layer 14 using a vapor deposition method, for example. Specifically, when the organic light emitting layer 15 is formed, a vapor deposition mask is placed on the support portion 6. Then, each pixel 3 can be separately coated with an organic material corresponding to a color that emits red, green, or blue.

  Then, as shown in FIG. 12A, the second electrode layer 16 is formed over the organic light emitting layer 15 and the insulator 7. When the second electrode layer 16 is configured, the second electrode layer 16 can be formed on the organic light emitting layer 15 and the insulator 7 without using a vapor deposition mask. In this way, the organic EL element 5 can be formed in each pixel 3.

  Further, as shown in FIG. 12B, a protective film 9 is formed on the display portion D1 so as not to deteriorate the organic EL element 5 by using, for example, a sputtering method. And as shown in FIG. 3, the sealing substrate 8 is opposingly arranged with respect to the element substrate 2 in which the organic EL element 5 was formed, and both are adhere | attached through the sealing material 10. As shown in FIG. Specifically, the sealing material 10 is previously applied to the sealing substrate 8 by using, for example, a spin coating method. Then, the sealing substrate 8 is fixed to the element substrate 2 via the sealing material 10. The operation of fixing the sealing substrate 8 to the element substrate 2 with the sealing material 10 is performed in, for example, an inert gas such as nitrogen gas or argon gas or in a high vacuum, whereby the element substrate 2 and the sealing substrate are fixed. It is possible to suppress oxygen and moisture from being contained between the two.

  And the organic EL display 1 is producible by mounting drive IC4 in the mounting part D2.

  As described above, according to the present embodiment, when individually changing the constituent material or film thickness setting of any pixel included in the picture element, only the reflection design of the pixel corresponding to the color to be changed is optimal. It is possible to As a result, the film thickness can be independently controlled for each pixel, and an effect of increasing the degree of design freedom can be expected.

  As described above, according to the embodiment of the present invention, by adjusting the thickness of the insulator 7 and the thickness of the organic light emitting layer 15, it is possible to provide an organic EL display excellent in visibility in which a black display is clearly projected. Can do.

  Here, a method of measuring the spectrum of light that is reflected when external light enters the display unit when the organic EL display is in a non-light emitting state will be described.

  First, in order to measure the reflected light of a part of a pixel, a portion to which reference light as external light is irradiated is specified using a microscope. And the reference light is irradiated to the specified location using, for example, a white light source such as a solar simulator or an incandescent lamp. Next, for example, a spectroscope is used to detect a reflected wave reflected by the reference light at a specific location. The spectrum of the reflected wave can be measured by analyzing the luminance distribution of the reflected wave.

  Further, both the light emitting region and the non-light emitting region are irradiated with the reference light, and the combined spectrum of the reflected waves of both is detected. Then, the combined spectrum can be converted into color coordinates. For example, numerical values such as CIEx = 0.42 and CIEy = 0.42 are obtained. The color coordinates of CIEx = 0.42 and CIEy = 0.42 are slightly different from black (white) to green to yellow, compared with CIEx = 0.3 and CIEy = 0.3. Therefore, the panel that should be seen as black when not lit by human eyes appears to be a color look with green added.

  At this time, by setting the film thickness of the non-light-emitting region to an appropriate film thickness, both CIEx and CIEy can be set to less than 0.4, and black is projected to the human eye when no light is emitted. be able to. In addition, as a method of measuring the reflected light of the whole display part, the spectral wavelength of a display part can be measured, for example using a spectroscopic luminance meter.

  In addition, this invention is not limited to the above-mentioned form, A various change, improvement, etc. are possible in the range which does not deviate from the summary of this invention.

<Modification>
In the above-described embodiment, the thickness of the insulator 7 is set to a different thickness for each pixel, but is not limited thereto. For example, the thickness of the insulator 7 may be set constant in all pixels.

  Hereinafter, a specific example in which the thickness of the insulator 7 is set to be constant in all pixels, that is, a modification according to an embodiment of the present invention will be described.

  Here, the organic EL display according to the modification is substantially the same as that of the organic EL display 1 shown in FIG. However, in the organic EL display according to the modification, the thickness of the insulator 7 is adjusted in all pixels. Accordingly, in the following description, in the organic EL display according to the modification, the same parts as those of the organic EL display according to the embodiment are denoted by the same reference numerals, description thereof is omitted, and different parts are described.

  FIG. 13 is a plan view showing a picture element of an organic EL display according to a modification. The thickness of the insulator 7 is set to be the same in the pixels 3R, 3G, and 3B.

  The spectrum of the reflected wave reflected in the light emitting region of each pixel is assumed in advance. Then, the waveform of the combined spectrum of the reflected waves reflected by each pixel is calculated. Then, the thickness of the insulator 7 is set so that the spectrum of the reflected wave reflected in the non-light emitting region has a complementary color relationship with the combined spectrum of the light emitting region.

  As described above, by setting the thickness of the insulator 7 to a common range for the pixel 3R, the pixel 3G, and the pixel 3B, it is possible to form the insulator 7 having a common thickness for each pixel. As a result, without adjusting the thickness of the insulator 7 in each pixel, the reflected waves reflected by the light emitting region R1 cancel each other with the reflected waves reflected by the non-light emitting region R2, so that the human eye can see when no light is emitted. Black color can be projected.

  According to this embodiment, the design of the non-light emitting region can be made common to each pixel. Further, the film thickness setting of the non-light emitting region can be optimized according to the area ratio of the light emitting region and the non-light emitting region of each pixel and the film thickness setting of the light emitting region, and the manufacturing process for forming the insulator 7 is simplified. can do.

1 Organic EL Display 2 Element Substrate 3 Pixel 4 Drive IC
DESCRIPTION OF SYMBOLS 5 Organic EL element 6 Support part 7 Insulator 8 Sealing substrate 9 Protective film 10 Sealing material 11 Circuit layer 12 Insulating layer 13 Planarizing film 14 First electrode layer 15 Organic light emitting layer 16 Second electrode layer 17 Hole injection layer 18 Hole transport layer 19 Light emitting layer 20 Electron transport layer 21 Electron injection layer D1 Display part D2 Mounting part R1 Light emitting area R2 Non-light emitting area S Contact hole

Claims (7)

  1. Comprising a pixel having a light emitting region and a non-light emitting region attached to the light emitting region;
    A maximum value of a spectrum of a reflected wave reflected by external light incident on the non-light-emitting region is present in the light-emitting wavelength region of the pixel when the light-emitting region of the pixel is not emitting light. Organic EL display.
  2. The organic EL display according to claim 1,
    An organic EL display characterized in that a minimum value of a spectrum of a reflected wave reflected by external light incident on the light emission wavelength region is present in the light emission wavelength region.
  3. The organic EL display according to claim 1,
    Comprising a picture element having a plurality of the pixels;
    The picture element includes a first pixel that emits a first color, a second pixel that emits a second color, and a third pixel that emits a third color;
    The first pixel, the second pixel, and the third pixel each have a local maximum value of a spectrum of a reflected wave that is reflected when external light is incident on each pixel in a light emission wavelength region of each pixel. Organic EL display.
  4. The organic EL display according to claim 1,
    A display unit in which a plurality of the pixels are arranged;
    The reflected wave reflected by the external light incident on the light emitting area and the reflected wave reflected by the external light incident on the non-light emitting area are combined, and the color coordinate of the combined spectrum extracted from the display unit is CIE x <0. .4, CIEy <0.4.
  5. The organic EL display according to claim 1,
    The non-light-emitting area is provided so as to surround the periphery of the light-emitting area.
  6. The organic EL display according to claim 3.
    An organic EL display, wherein a plurality of picture elements are provided in a matrix, and the plurality of pixels in the picture elements are arranged in a regular order.
  7. The organic EL display according to claim 3.
    The organic EL display, wherein the non-light-emitting areas of the pixels in the picture element have different thicknesses.
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