JP2010066681A - Optical element and optical system having the same - Google Patents

Optical element and optical system having the same Download PDF

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JP2010066681A
JP2010066681A JP2008234851A JP2008234851A JP2010066681A JP 2010066681 A JP2010066681 A JP 2010066681A JP 2008234851 A JP2008234851 A JP 2008234851A JP 2008234851 A JP2008234851 A JP 2008234851A JP 2010066681 A JP2010066681 A JP 2010066681A
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optical element
surface
nm
antireflection
substrate
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JP2010066681A5 (en
Inventor
Sayoko Amano
Takeharu Okuno
Daisuke Sano
大介 佐野
佐代子 天野
丈晴 奥野
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Canon Inc
キヤノン株式会社
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Abstract

PROBLEM TO BE SOLVED: To appropriately form an antireflection film on one surface of a substrate and a fine concavo-convex structure on the other surface without deteriorating the appearance quality, and having a low reflectivity over a wide wavelength range, and an optical system. When used, an optical element with little generation of harmful light such as flare and ghost is obtained.
An antireflection film composed of a plurality of thin films is provided on one surface of a light incident / exit surface of a substrate, and a fine concavo-convex structure having an average pitch of a used wavelength or less is provided on the other surface. An optical element having an antireflection function in a used wavelength region including a visible region, and an outermost layer of the plurality of thin films of the antireflection film is made of an inorganic oxide, and the refractive index of the material of the inorganic oxide is When n and thickness are d, 5 (nm) <n · d <50 (nm)
Satisfy the following conditions.
[Selection] Figure 1

Description

  The present invention relates to an optical element and an optical system having the optical element, and is suitable as an optical element used in an optical system of an optical apparatus such as a silver salt film camera, a digital still camera, a video camera, a TV camera, and an observation system. .

  Conventionally, the light incident / exit surface of an optical element used in an optical system such as a photographic camera, a TV camera, a video camera, and a video projector is provided with an antireflection film to reduce loss of transmitted light due to surface reflection. ing.

  For example, a dielectric multilayer film is known as an antireflection film for visible light (Patent Documents 1 and 2).

  This multilayer film is formed by forming a dielectric thin film such as a metal oxide on the surface of a light-transmitting substrate by, for example, vacuum deposition or sputtering.

  As an antireflection structure used for a lens, a fine concavo-convex structure having a pitch equal to or smaller than the wavelength of visible light is known (Patent Document 3).

In Patent Document 3, each of the following steps (a) Cleaning the glass substrate (b) Applying an Al 2 O 3 sol coating solution by dip coating and drying (c) Firing at 500 ° C. for 10 minutes (d) Heating at about 100 ° C. Immersion in water for about 0.5 to 2 hours (e) Drying at about 100 ° C for 10 minutes (f) By baking at 400 ° C for about 10 minutes, a petal-like transparent alumina film (fine concavo-convex structure) is deposited on the glass substrate Forming.

Patent Document 3 discloses a fine concavo-convex structure that is excellent in spectral transmittance and exhibits excellent reflection reduction.
Japanese Patent Laid-Open No. 10-268103 JP 2006-3562 A JP 09-202649 A

  In an antireflection film in which a dielectric thin film is laminated, the refractive index and film thickness of each film are controlled, and reflected light generated at the surface / interface is made to interfere, thereby reducing the reflectance.

  On the other hand, a method of forming a fine concavo-convex structure on a lens surface is often used for plastic lenses in which it is difficult to form an antireflection film. When a fine concavo-convex structure is used, it is easy to obtain antireflection characteristics with good incident angle characteristics in a relatively wide wavelength range.

  In Patent Document 3, a fine concavo-convex structure is immersed in hot water at about 100 ° C. for about 0.5 to 2 hours to form a petal-like alumina film on a substrate (glass substrate). In an optical element in which a fine concavo-convex structure is formed on a substrate, it is necessary to form antireflection structures on both sides of the substrate in order to increase the amount of transmitted light and avoid ghosts and flares due to unnecessary light.

  In that case, when forming a fine concavo-convex structure having an antireflection function on one surface and forming an antireflection film made of a dielectric thin film on the other surface, the formation procedure is a dielectric reflection with high film strength. A prevention film is first formed on the substrate.

  When a dielectric antireflection film is first formed on a substrate and a fine concavo-convex structure is formed later, the dielectric antireflection film previously formed in the hot water immersion process for forming a petal-like film with a fine concavo-convex shape is formed. Will also be immersed in warm water.

Order to best reduce reflection at generally the dielectric anti-reflection film to form a MgF 2 film having a low refractive index material in the outermost layer of the substrate.

However, the MgF 2 film has the property of being easily dissolved in water. The MgF 2 film is melted by the hot water immersion treatment, and the desired film thickness cannot be maintained and the antireflection characteristics are deteriorated. In addition, the film may be uneven and the appearance quality may be lowered.

  As described above, it is very difficult to manufacture an optical element in which an antireflection film is formed on one surface of a substrate and an antireflection fine uneven structure is formed on the other surface. It was.

  The present invention can appropriately form an antireflection film on one surface of a substrate and a fine concavo-convex structure on the other surface without deteriorating the appearance quality, and reduce the reflectance over a wide wavelength range. It is an object of the present invention to provide an optical element that can be used. It is another object of the present invention to provide an optical element that can reduce generation of harmful light such as flare and ghost when used in an optical system, and an optical system having the optical element.

In the optical element of the present invention, an antireflection film comprising a plurality of thin films is provided on one of the light incident / exit surfaces of the substrate, and a fine concavo-convex structure having an average pitch of a used wavelength or less is provided on the other surface. An optical element having an antireflection function in a used wavelength region including a visible region,
Out of the plurality of thin films of the antireflection film, the outermost layer is made of an inorganic oxide, and when the refractive index of the material of the inorganic oxide is n and the thickness is d, 5 (nm) <n · d <50 ( nm)
It is characterized by satisfying the following conditions.

In addition, the optical element of the present invention is provided with an antireflection film comprising a plurality of thin films on one surface of the light incident / exit surfaces of the substrate, and a fine concavo-convex structure having an average pitch of the use wavelength or less on the other surface. An optical element having an antireflection function in a used wavelength region including a visible region,

Of the plurality of thin films of the antireflection film, the outermost layer is an organic thin film, and the second layer from the outermost layer is an inorganic thin film made of a fluorinated compound.

  According to the present invention, it is possible to appropriately form an antireflection film on one surface of a substrate and a fine concavo-convex structure on the other surface without deteriorating the appearance quality, and the reflectance is low over a wide wavelength range. When used in an optical system, an optical element that generates less harmful light such as flare and ghost can be obtained.

  Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings.

  The optical element of the present invention includes antireflection structures on both surfaces of the light incident / exit surface of the substrate. One surface A of the substrate is a dielectric multilayer film (antireflection film) made of an inorganic thin film, and the other surface B is a fine concavo-convex structure body (antireflection film) having a pitch less than the wavelength used (wavelength 400 nm to wavelength 700 nm). Structure). The dielectric multilayer film composed of the inorganic thin film on the surface A was formed by a vacuum deposition method. The method for forming the dielectric multilayer film is not limited to this, and for example, a sputtering method may be used.

  As a method for forming the fine concavo-convex structure on the surface B, for example, the following method is used. First, the substrate glass is cleaned with pure water rinse and alcohol. Thereafter, an appropriate amount of a coating solution containing aluminum oxide was dropped on a rotary stage of a vacuum chuck type, rotated at about 3000 rpm for about 30 seconds, and baked in an oven at a temperature of 100 ° C. or higher for 30 minutes or more.

  Here, the spin coating condition is about 3000 seconds at 3000 rpm, but the present invention is not limited to this, and the coating condition may be changed in order to obtain a desired film thickness. The coating method is not limited to the spin coating method, and a dip coating method, a spray coating method, or the like may be used.

  Next, the aluminum oxide coated substrate 11 was immersed in warm water of 60 ° C. or more and 100 ° C. or less for 5 minutes to 24 hours using a warm water treatment tank, pulled up, and then dried. A petal-like transparent alumina film was formed on the completed substrate, and had excellent transmittance characteristics and excellent antireflection characteristics. Here, the hot water treatment temperature is 60 ° C. or more and 100 ° C. or less, and the hot water treatment time is 5 minutes to 24 hours, but is not limited thereto.

  Next, structural features of the optical element of the present invention will be described.

  The optical element of the present invention is provided with an antireflection film comprising a plurality of thin films on one surface A of the light incident / exit surfaces of the substrate, and a fine concavo-convex structure having an average pitch of the use wavelength or less on the other surface B (Antireflection structure) is provided.

  And it has an antireflection function in the use wavelength region (for example, wavelength 400nm -700nm) including a visible region.


Of the plurality of thin films of the antireflection film, the outermost layer is made of an inorganic oxide, and the refractive index of the material is n and the thickness is d. At this time, 5 (nm) <n · d <50 (nm)
Satisfy the following conditions. The second layer from the outermost layer is made of an inorganic thin film made of a fluorinated compound.

Here, the inorganic oxide contains any one of SiO 2 , Sio, Al 2 O 3 , and ZnO 2 .

The outermost inorganic compound has a refractive index n of 1.38 <n <2.0.
Satisfy the following conditions.

  In addition, in the optical element of the present invention, the outermost layer of the plurality of thin films of the antireflection film formed on one surface A is composed of an organic thin film made of a fluorine-containing organic compound. The second layer from the outermost layer is made of an inorganic thin film made of a fluorinated compound.

  FIG. 1 is a cross-sectional view of an essential part of an optical element according to Example 1 of the present invention.

  In FIG. 1, reference numeral 1 denotes an optical element.

  An antireflection film 201 is formed on one surface A on the substrate 11 constituting the optical element 1 shown in FIG. A fine concavo-convex structure 202 is formed on the other surface B.

  Here, the substrate 11 is an optical member such as a parallel plate lens, a prism, or a filter.

The antireflection film 201 is made of a dielectric antireflection film. 12 is an inorganic thin film which comprises a MgF 2 (fluorinated compound).

13 is made of inorganic oxide SiO 2 . The wavelength region of the antireflection film 201 having an antireflection function, that is, the used wavelength is a wavelength region (visible region) from a wavelength of 400 nm to a wavelength of 700 nm.

As the substrate 11, a glass substrate (transparent substrate) having a refractive index of 1.806 at d-line (wavelength 587.6 nm) was used. Glass substrate 11, after washing, and the optical thickness of 100nm deposited MgF 2 having a refractive index of 1.38 (inorganic oxides) of the d-line (wavelength 587.6 nm) by vacuum deposition.

Here, the optical film thickness t is when the thickness is d and the refractive index of the material is n. T = n · d
It is.

Subsequently, SiO 2 having a refractive index of 1.46 at d line (wavelength: 587.6 nm) was formed into an optical film having a thickness of 20 nm.

  FIG. 2 is a diagram of spectral reflectance obtained by measuring the antireflection film 201 thus formed with a spectral reflectometer.

  As shown in FIG. 2, the antireflection film 201 of this embodiment has a reflectance of 0.1% or less at a wavelength of 500 nm and a reflectance of 2% or less in a wavelength range of 400 nm to 700 nm (use wavelength region). Has reflectivity characteristics.

  An antireflection film 201 is formed on one surface A of the substrate 11. Thereafter, a fine concavo-convex structure having a plurality of fine concavo-convex shapes (concave portions) having a pitch equal to or less than a usable wavelength (including a cylinder, a prism, a conical polygonal pyramid shape, etc.) on the other surface B of the substrate 11 in the following process. A body 202 was formed.

  Here, the pitch corresponds to the interval (period) of the concavo-convex structure.

  After cleaning the substrate 11 on which the antireflection film 201 is formed on one surface A with pure water rinse and alcohol, the other surface B is placed on a vacuum chuck type rotary stage with an appropriate amount of coating solution containing aluminum oxide. It was dripped. Then, it was rotated at 3000 rpm for 30 seconds and baked in an oven at a temperature of 300 ° C. for 120 minutes.

  Next, the aluminum oxide coated substrate 11 was dipped in warm water at 80 ° C. for 30 minutes and then dried.

  The antireflection structure having the fine concavo-convex structure 202 formed on the other surface B had excellent antireflection characteristics.

  When the antireflection film 201 is formed on one surface A of the substrate 11 and the fine uneven structure 202 is formed on the other surface B, the antireflection film 201 on one surface A is evaluated and observed again. It was confirmed that there was no unevenness and the anti-reflection characteristics were the same as before hot water treatment.

  FIG. 3 is a cross-sectional view of the main part of the optical element according to the second embodiment of the present invention. In FIG. 3, reference numeral 2 denotes an optical element.

  An antireflection film 301 is formed on one surface A of the substrate 21 of the optical element 2 shown in FIG. On the other surface B, a fine concavo-convex structure 302 is formed.

The antireflection film 301 is composed of a dielectric antireflection film having a seven-layer structure (from the substrate 21 to the layers 22 to 28). Layers 22, 24, 26 is made from TiO 2. The layers 23 and 25 is made from SiO 2.

Layer 27 is MgF 2, a layer 28 is made from SiO. The use wavelength of the antireflection film 301 was set to a wavelength region from a wavelength of 400 nm to a wavelength of 700 nm. As the substrate 21, a glass substrate having a refractive index of 1.52 at d line (wavelength: 587.6 nm) was used.

After cleaning, the glass substrate 21 was formed by depositing TiO 2 having a refractive index of 2.32 with a d-line (wavelength: 587.6 nm) as the layer 22 with an optical film thickness of 33.6 nm by a vacuum evaporation method.

Subsequently, SiO 2 having a refractive index of 1.46 at the d-line (wavelength 587.6 nm) was formed as the layer 23 with an optical film thickness of 42.2 nm.

Subsequently, TiO 2 having a refractive index of 2.32 at the d-line (wavelength 587.6 nm) was formed as the layer 24 with an optical film thickness of 158.5 nm.

Subsequently, SiO 2 having a refractive index of 1.46 at the d-line (wavelength 587.6 nm) was formed as the layer 25 with an optical film thickness of 21.3 nm.

Subsequently, TiO 2 having a refractive index of 2.32 at the d line (wavelength: 587.6 nm) was formed as the layer 26 with an optical film thickness of 56.5 nm.

The MgF 2 having a refractive index of 1.38 at the d-line as the layer 27 (wavelength 587.6 nm) followed was formed by an optical film thickness 119.6Nm.

  Subsequently, SiO having a refractive index of 1.55 at the d-line (wavelength 587.6 nm) was formed as the layer 28 with an optical film thickness of 10.1 nm.

  FIG. 4 is a diagram of spectral reflectance obtained by measuring the antireflection film 301 thus formed with a spectral reflectance meter. As shown in FIG. 4, it has a low reflectance property of 0.6% or less in the wavelength range of 400 nm to 700 nm.

  After forming the antireflection film 301 on one surface A of the substrate 21, a fine concavo-convex structure having a pitch equal to or shorter than the working wavelength was formed on the other surface B by the same method as in Example 1.

  The antireflection structure having the fine concavo-convex structure in this example exhibited excellent antireflection characteristics. The antireflection film 301 on one surface A was evaluated and observed again with the antireflection film 301 formed on one surface A of the substrate 21 and the fine concavo-convex structure 302 formed on the other surface B. It was confirmed that the antireflective properties were good as before the hot water treatment.

  FIG. 5 is a cross-sectional view of an essential part of an optical element according to Example 3 of the present invention. In FIG. 5, reference numeral 3 denotes an optical element, which in the present embodiment is composed of a lens having refractive power.

  An antireflection film 401 is formed on the lens surface (one surface) A of the lens (substrate) 31 of the optical element 3 shown in FIG. A fine structure 402 is formed on the lens surface (the other surface) B of the lens 31.

  The antireflection film 401 is composed of a dielectric multilayer film having a four-layer structure. The wavelength used for the antireflection film 401 was in the wavelength range from 400 nm to 700 nm.

  For the lens 31 as the substrate, glass having a refractive index of 1.72 at d line (wavelength: 587.6 nm) was used.

Lens 31 is washed, and the optical film thickness 250.3nm deposited Al 2 O 3 having a refractive index of 1.63 at the d-line as the first layer by a vacuum deposition method (wavelength 587.6 nm).

Subsequently, Ta 2 O 5 having a refractive index of 2.10 at the d-line (wavelength 587.6 nm) was formed as the second layer with an optical film thickness of 252.3 nm.

Subsequently, MgF 2 having a refractive index of 1.38 at the d-line (wavelength 587.6 nm) was formed as the third layer with an optical film thickness of 96.2 nm.

Subsequently, ZrO 2 having a refractive index of 1.95 at the d-line (wavelength 587.6 nm) was deposited as an optical film thickness of 15.4 nm as the fourth layer.

  FIG. 6 is a diagram of spectral reflectance obtained by measuring the formed antireflection film 401 with a spectral reflectometer. As shown in FIG. 6, it has a low reflectance characteristic of 2.0% or less at a wavelength of 400 nm and 1.0% or less in a wavelength range of a wavelength from 410 to 700 nm. On the other surface B of the substrate lens 31 on which the antireflection film 401 was formed on one surface A of the lens 31, a fine concavo-convex structure having a pitch equal to or less than the working wavelength was formed by the same method as in Example 1.

  The antireflection structure having a fine relief structure in this example had excellent antireflection characteristics. The antireflection film 401 on one surface A was evaluated and observed again with the antireflection film formed on one surface A of the lens 31 and the fine concavo-convex structure formed on the other surface B. It was confirmed that the characteristics were good characteristics that were the same as before the hot water treatment.

  FIG. 7 is a sectional view of an essential part of an optical element according to Example 4 of the present invention. In FIG. 7, reference numeral 4 denotes an optical element.

  An antireflection film 501 is formed on one surface A of the substrate 41 of the optical element 4 shown in FIG. A fine concavo-convex structure 502 is formed on the other surface B.

The antireflection film 501 is composed of two layers. As the first layer, an MgF 2 film having a refractive index of 1.38 of d line and an optical system film thickness of 113 nm is formed as the fluorinated compound of the inorganic thin film 42.

  Then, a fluorine-containing organic compound having a d-line refractive index of 1.36 and an optical film thickness of 10 nm is formed on the inorganic thin film 42 as the second organic thin film 43. As a result, a multilayer antireflection film 501 having a two-layer structure was formed.

MgF 2 which is the inorganic thin film 42 was formed at a film forming temperature of 200 ° C. or higher in a vacuum vapor deposition method, and the fluorine-containing organic compound of the organic thin film 43 was formed at a low temperature condition of 100 ° C. or lower.

  FIG. 8 is a diagram of the spectral reflection characteristics of the antireflection film according to this example. A good antireflection function is obtained with a spectral reflectance of 2.0% or less in the wavelength range of 400 to 700 nm and 1.3% or less in the wavelength band of 500 nm.

  In the present embodiment, the wavelength band with the least reflection is set to a wavelength of about 500 nm. However, the wavelength range of the minimum reflectance can be changed by changing the optical film thickness as described above.

  Furthermore, the multilayer film 41 which is an antireflection film is not limited to a two-layer structure, and can be obtained by laminating two or more materials into two or more layers.

  The substrate 41 on which the antireflection film 501 is formed on one surface A of the substrate 41 is washed with pure water rinse and alcohol, and then placed on a rotary stage of a vacuum chuck type with the other surface B facing upward, and contains aluminum oxide. An appropriate amount of coating solution was dropped. Then, it was rotated at 3500 rpm for 60 seconds and baked in an oven at a temperature of 250 ° C. for 120 minutes.

  Next, the aluminum oxide coated substrate 41 was dipped in warm water at 85 ° C. for 45 minutes and then dried. The antireflection structure having the fine uneven structure 502 formed on the other surface B had excellent antireflection characteristics.

  The antireflection film 501 on one surface A was evaluated and observed again with the antireflection film formed on one surface A of the substrate 41 and the fine concavo-convex structure 502 formed on the other surface B. It was confirmed that the characteristics were good characteristics that were the same as before the hot water treatment.

  As described above, according to each example, the optical member (substrate) has a high-performance antireflection film with good appearance and no film unevenness on one surface, and the other surface has a wavelength equal to or lower than the operating wavelength. An optical element having an antireflection structure having a fine concavo-convex structure and having an excellent antireflection function can be obtained.

  If such an optical element is used in an optical system constituting an optical device such as a video camera, projector, or observation system, a high-quality image with a high amount of transmitted light and suppressed generation of harmful light such as flare and ghost can be obtained. .

[Comparative Example 1]
The optical element of Comparative Example 1 for the optical element of the present invention will be described below.

  FIG. 9 is a schematic configuration diagram of the optical element of Comparative Example 1 for comparison with the optical element of Example 1 of the present invention.

  In FIG. 9, 51 is a substrate, and 602 is an antireflection film made of an inorganic thin film formed on one surface A of the substrate 51.

  Reference numeral 601 denotes a fine concavo-convex structure formed on the other surface of the substrate 51.

As the substrate 51, a glass substrate having a refractive index of 1.806 at d line (wavelength: 587.6 nm) was used. After the glass substrate 51 is cleaned, MgF 2 having a refractive index of 1.38 with a d-line (wavelength: 587.6 nm) is deposited on one surface A with an optical film thickness of 125 nm by a vacuum vapor deposition method to prevent reflection of a single layer. A film 602 was formed.

  FIG. 10 is a diagram of spectral reflectance obtained by measuring the formed antireflection film 602 with a spectral reflectometer. As shown in FIG. 10, the reflectance at a wavelength of 500 nm is 0.1% or less, and it has a low reflectance characteristic of 2% or less in a wavelength range from a wavelength of 400 nm to a wavelength of 700 nm.

  After forming the antireflection film 602 on one surface A of the substrate 51, a fine concavo-convex structure was formed on the other surface B of the substrate 51 by the same method as in Example 1. The antireflection structure having the fine concavo-convex structure thus obtained had excellent antireflection characteristics.

  With the antireflection film 602 formed on one surface A of the substrate 51 and the fine concavo-convex structure 601 formed on the other surface B, the antireflection film 602 on one surface A was evaluated and observed again.

  As a result, the reflection characteristics changed greatly as indicated by the dotted line in FIG. 10, the antireflection performance was greatly deteriorated, and the film was uneven.

  FIG. 11 shows an example in which the optical element having antireflection properties of the present invention is applied to an optical system.

  FIG. 11 is a schematic diagram in which the optical element having antireflection properties of the present invention is used in an imaging optical system (photographing optical system) of a camera. In FIG. 11, reference numeral 706 denotes a taking lens unit, which has a diaphragm 708 and the above-described optical element 701 of the present invention.

  In FIG. 11, reference numeral 701 denotes an optical element according to the present invention. The image plane 707 is a film or a CCD. The optical element 701 suppresses the reflection of the lens surface and reduces the generation of flare light.

  In FIG. 11, the optical element 701 having antireflection properties is provided in the final lens of the photographing lens unit 706, but the present invention is not limited to this, and it may be used for other lenses or a plurality of lenses may be used. May be.

  In the present embodiment, the case of a taking lens of a camera is shown, but the present invention is not limited to this. For example, even if the optical element of the present invention is used for an imaging optical system used in a wide wavelength range such as a video camera photographing lens (imaging optical system), an office image scanner or a digital copying machine reader lens, The same antireflection effect as in the example can be obtained.

1 is a schematic configuration diagram of an optical element according to Embodiment 1 of the present invention. Spectral reflectance characteristics diagram of optical element of Example 1 Schematic configuration diagram of an optical element according to Embodiment 2 of the present invention. Spectral reflectance characteristics diagram of optical element of Example 2 Schematic configuration diagram of an optical element according to Example 3 of the present invention. Spectral reflectance characteristics diagram of optical element of Example 3 Schematic configuration diagram of an optical element according to Embodiment 4 of the present invention. Spectral reflectance characteristic diagram of the optical element of Example 4 The figure which shows schematic structure of the optical element of the comparative example 1. Spectral reflectance characteristics diagram of optical element of Comparative Example 1 Schematic view of essential parts of an optical system having the optical element of the present invention

Explanation of symbols

11, 21, 41, 51 Substrate 12 Inorganic thin film 13 Inorganic thin film 22, 23, 24, 25, 26, 27, 28, Inorganic thin film 31 Substrate lens 43 Organic thin film 52 Inorganic thin film 111, 112, 113, 114, 115 Air 201, 301, 401, 501 Antireflection film 202, 302, 402, 502, 601 Fine relief structure

Claims (9)

  1. An antireflection film consisting of a plurality of thin films is provided on one of the light incident / exit surfaces of the substrate, and a fine concavo-convex structure having an average pitch of a used wavelength or less is provided on the other surface. An optical element having an antireflection function in a used wavelength region including:
    Of the plurality of thin films of the antireflection film, the outermost layer is made of an inorganic oxide, where n is the refractive index of the inorganic oxide and d is the thickness. 5 (nm) <n · d <50 (nm)
    An optical element that satisfies the following conditions:
  2.   2. The optical element according to claim 1, wherein the second layer from the outermost layer is an inorganic thin film made of a fluorinated compound.
  3. The refractive index n of the inorganic oxide is 1.38 <n <2.0.
    The optical element according to claim 2, wherein the following condition is satisfied.
  4. The optical element according to claim 2 , wherein the inorganic oxide includes any one of SiO 2 , SiO, Al 2 O 3 , and ZnO 2 .
  5. An antireflection film consisting of a plurality of thin films is provided on one of the light incident / exit surfaces of the substrate, and a fine concavo-convex structure having an average pitch of a used wavelength or less is provided on the other surface. An optical element having an antireflection function in a used wavelength region including:
    Of the plurality of thin films of the antireflection film, the outermost layer is an organic thin film, and the second layer from the outermost layer is an inorganic thin film made of a fluorinated compound.
  6.   6. The optical element according to claim 5, wherein the organic thin film is made of a fluorine-containing organic compound.
  7.   An optical system comprising the optical element according to claim 1.
  8.   The optical system according to claim 7, wherein the optical system is an imaging optical system.
  9.   An optical apparatus comprising the optical system according to claim 7 or 8.
JP2008234851A 2008-09-12 2008-09-12 Optical element and optical system having the same Pending JP2010066681A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2015146016A1 (en) * 2014-03-24 2015-10-01 富士フイルム株式会社 Process for producing lens with antireflection function

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