JP2010046702A - レーザー加工装置 - Google Patents
レーザー加工装置 Download PDFInfo
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- JP2010046702A JP2010046702A JP2008214853A JP2008214853A JP2010046702A JP 2010046702 A JP2010046702 A JP 2010046702A JP 2008214853 A JP2008214853 A JP 2008214853A JP 2008214853 A JP2008214853 A JP 2008214853A JP 2010046702 A JP2010046702 A JP 2010046702A
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- laser processing
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- 238000003754 machining Methods 0.000 title abstract 6
- 230000009471 action Effects 0.000 claims description 2
- 230000007246 mechanism Effects 0.000 abstract description 18
- 238000006073 displacement reaction Methods 0.000 description 13
- 238000001514 detection method Methods 0.000 description 11
- 238000000034 method Methods 0.000 description 7
- 239000004065 semiconductor Substances 0.000 description 7
- 235000012431 wafers Nutrition 0.000 description 7
- 230000008859 change Effects 0.000 description 4
- 230000004044 response Effects 0.000 description 4
- 230000003068 static effect Effects 0.000 description 4
- 239000002390 adhesive tape Substances 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 238000003672 processing method Methods 0.000 description 2
- 229910052594 sapphire Inorganic materials 0.000 description 2
- 239000010980 sapphire Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 229910002601 GaN Inorganic materials 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- -1 gallium nitride compound Chemical class 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000006552 photochemical reaction Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/08—Devices involving relative movement between laser beam and workpiece
- B23K26/083—Devices involving movement of the workpiece in at least one axial direction
- B23K26/0853—Devices involving movement of the workpiece in at least in two axial directions, e.g. in a plane
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/04—Automatically aligning, aiming or focusing the laser beam, e.g. using the back-scattered light
- B23K26/046—Automatically focusing the laser beam
- B23K26/048—Automatically focusing the laser beam by controlling the distance between laser head and workpiece
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
- H01L21/268—Bombardment with radiation with high-energy radiation using electromagnetic radiation, e.g. laser radiation
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- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Laser Beam Processing (AREA)
Abstract
【解決手段】加工対象のワークを保持する保持手段2と、この保持手段2に保持されたワークにレーザービームを照射する加工手段3とを有するレーザー加工装置において、加工手段3に、少なくとも、加工用のレーザービームを発振する発振器と、発振器から発せられたレーザービームをワークに集光する集光レンズと、レーザービームの集光点位置を調整するための集光点位置調整機構30を設ける。そして、この集光点位置調整機構30を、永久磁石を備え集光レンズを支持する可動部と、この可動部をワークに対して垂直な方向に移動させるためのコイル部及び可動部を気体によって支持する気体軸受部を備える固定部と、磁気反発作用によって可動部を下方から支持する支持部材とで構成する。
【選択図】図1
Description
2 保持手段
3 加工手段
4 表面変位検出手段
5 制御手段
6 加工用レーザービーム
6a 集光点
7 電流調整手段
21 保持面
22 クランプ
30 集光点位置調整機構
31 集光レンズ
32 可動部
33 固定部
34 支持部材
51 台座
52a、52b、55a、55b 案内レール
53a、56a ボールねじ
53b、56b モータ
53c、56c 軸受けブロック
54、57 滑動ブロック
321 レンズ支持部材
322a、322b ロット部材
323a、323a、333a、333b 連結部材
331 コイル部
332a、332b 気体軸受部
341、342 永久磁石
Claims (4)
- 加工対象のワークを保持する保持手段と、該保持手段に保持されたワークにレーザービームを照射する加工手段と、を有するレーザー加工装置であって、
前記加工手段には、少なくとも、
前記レーザービームを発振する発振器と、
前記レーザービームを前記ワークに集光する集光レンズと、
前記集光レンズを支持し、前記ワークに対して垂直方向に移動する可動部と、
前記可動部を気体によって支持する気体軸受部を備え、前記可動部と共にボイスコイルモータを構成する固定部と、
磁気反発作用によって前記可動部を下方から支持する支持部材と、
が設けられているレーザー加工装置。 - 前記可動部は永久磁石を備えており、前記固定部には前記可動部を駆動するためのコイル部が設けられていることを特徴とする請求項1に記載のレーザー加工装置。
- 前記可動部は、環状の永久磁石からなり、内部に集光レンズが配置されるレンズ支持部材と、前記気体軸受部に支持される一対のロット部材と、前記レンズ支持部材と前記ロッド部材とを連結する連結部材と、を有し、
前記コイル部は、前記レンズ支持部材を囲繞するように配置されていることを特徴とする請求項2に記載のレーザー加工装置。 - 前記可動部の可動範囲が200μm以下であることを特徴とする請求項1乃至3のいずれか1項に記載のレーザー加工装置。
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008214853A JP5139922B2 (ja) | 2008-08-25 | 2008-08-25 | レーザー加工装置 |
TW098120987A TWI464026B (zh) | 2008-08-25 | 2009-06-23 | Laser processing device |
KR1020090066237A KR101470026B1 (ko) | 2008-08-25 | 2009-07-21 | 레이저 가공 장치 |
US12/534,705 US8319143B2 (en) | 2008-08-25 | 2009-08-03 | Laser processing apparatus |
CN200910163332.0A CN101658976B (zh) | 2008-08-25 | 2009-08-13 | 激光加工装置 |
DE102009038642.4A DE102009038642B4 (de) | 2008-08-25 | 2009-08-24 | Laserbearbeitungsvorrichtung |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008214853A JP5139922B2 (ja) | 2008-08-25 | 2008-08-25 | レーザー加工装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2010046702A true JP2010046702A (ja) | 2010-03-04 |
JP5139922B2 JP5139922B2 (ja) | 2013-02-06 |
Family
ID=41694029
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008214853A Active JP5139922B2 (ja) | 2008-08-25 | 2008-08-25 | レーザー加工装置 |
Country Status (6)
Country | Link |
---|---|
US (1) | US8319143B2 (ja) |
JP (1) | JP5139922B2 (ja) |
KR (1) | KR101470026B1 (ja) |
CN (1) | CN101658976B (ja) |
DE (1) | DE102009038642B4 (ja) |
TW (1) | TWI464026B (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103447691A (zh) * | 2012-05-30 | 2013-12-18 | 株式会社迪思科 | 激光加工装置 |
KR101567522B1 (ko) * | 2014-04-18 | 2015-11-11 | 한국기계연구원 | 레이저 가공 용 진동 장치 |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102041504A (zh) * | 2010-11-02 | 2011-05-04 | 中国石油大学(华东) | 一种激光修复工作台 |
CN102069298A (zh) * | 2010-12-20 | 2011-05-25 | 珠海市铭语自动化设备有限公司 | 一种板材激光切割系统及其切割加工方法 |
DE102011018648B3 (de) * | 2011-04-21 | 2012-07-12 | Messer Cutting Systems Gmbh | Vorrichtung für die thermische Bearbeitung eines Werkstücks |
JP5860228B2 (ja) * | 2011-06-13 | 2016-02-16 | 株式会社ディスコ | レーザー加工装置 |
JP5894384B2 (ja) * | 2011-07-08 | 2016-03-30 | 株式会社ディスコ | 加工装置 |
US9492990B2 (en) | 2011-11-08 | 2016-11-15 | Picosys Incorporated | Room temperature glass-to-glass, glass-to-plastic and glass-to-ceramic/semiconductor bonding |
JP5908705B2 (ja) * | 2011-11-30 | 2016-04-26 | 株式会社ディスコ | レーザー加工装置 |
CN103212817A (zh) * | 2012-01-19 | 2013-07-24 | 昆山思拓机器有限公司 | 应用于医用支架激光切割中的z轴随动系统 |
JP6487413B2 (ja) * | 2016-12-22 | 2019-03-20 | ファナック株式会社 | レーザ加工用ヘッドおよびそれを備えたレーザ加工システム |
CN108422091B (zh) * | 2018-03-01 | 2023-08-18 | 江山远扬迅驰机械科技有限公司 | 一种具有弧面同步对焦工作台的激光打标机及其打标方法 |
JP7017239B2 (ja) * | 2018-06-25 | 2022-02-08 | 株式会社ブイ・テクノロジー | 露光装置および高さ調整方法 |
CN109794688B (zh) * | 2019-02-20 | 2024-05-10 | 广东铭钰科技股份有限公司 | 一种可调节激光方向的激光打标装置 |
CN116060792B (zh) * | 2023-04-07 | 2023-06-09 | 广州市易鸿智能装备有限公司 | 双轴位移调整工装及双激光极耳切割装置 |
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JP2002066780A (ja) * | 2000-08-30 | 2002-03-05 | Canon Inc | レーザ加工装置 |
JP2003264207A (ja) * | 2002-03-11 | 2003-09-19 | Matsushita Electric Ind Co Ltd | ボイスコイルモータによる加重方法とそれによる部品実装装置、それらに用いるボイスコイルモータ |
JP2006255725A (ja) * | 2005-03-15 | 2006-09-28 | Nsk Ltd | 基板の穴あけ装置 |
JP2007152355A (ja) * | 2005-11-30 | 2007-06-21 | Disco Abrasive Syst Ltd | レーザー加工装置 |
JP2007203335A (ja) * | 2006-02-02 | 2007-08-16 | Sumitomo Heavy Ind Ltd | レーザ加工装置及び加工方法 |
JP2007326127A (ja) * | 2006-06-08 | 2007-12-20 | Seiko Epson Corp | レーザ照射装置、レーザスクライブ方法、電気光学装置の製造方法 |
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JP2008068308A (ja) * | 2006-09-15 | 2008-03-27 | Keyence Corp | レーザ加工装置 |
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-
2008
- 2008-08-25 JP JP2008214853A patent/JP5139922B2/ja active Active
-
2009
- 2009-06-23 TW TW098120987A patent/TWI464026B/zh active
- 2009-07-21 KR KR1020090066237A patent/KR101470026B1/ko active IP Right Grant
- 2009-08-03 US US12/534,705 patent/US8319143B2/en active Active
- 2009-08-13 CN CN200910163332.0A patent/CN101658976B/zh active Active
- 2009-08-24 DE DE102009038642.4A patent/DE102009038642B4/de active Active
Patent Citations (8)
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JP2002066780A (ja) * | 2000-08-30 | 2002-03-05 | Canon Inc | レーザ加工装置 |
JP2003264207A (ja) * | 2002-03-11 | 2003-09-19 | Matsushita Electric Ind Co Ltd | ボイスコイルモータによる加重方法とそれによる部品実装装置、それらに用いるボイスコイルモータ |
JP2006255725A (ja) * | 2005-03-15 | 2006-09-28 | Nsk Ltd | 基板の穴あけ装置 |
JP2007152355A (ja) * | 2005-11-30 | 2007-06-21 | Disco Abrasive Syst Ltd | レーザー加工装置 |
JP2007203335A (ja) * | 2006-02-02 | 2007-08-16 | Sumitomo Heavy Ind Ltd | レーザ加工装置及び加工方法 |
JP2007326127A (ja) * | 2006-06-08 | 2007-12-20 | Seiko Epson Corp | レーザ照射装置、レーザスクライブ方法、電気光学装置の製造方法 |
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JP2008068308A (ja) * | 2006-09-15 | 2008-03-27 | Keyence Corp | レーザ加工装置 |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103447691A (zh) * | 2012-05-30 | 2013-12-18 | 株式会社迪思科 | 激光加工装置 |
CN103447691B (zh) * | 2012-05-30 | 2016-07-13 | 株式会社迪思科 | 激光加工装置 |
KR101567522B1 (ko) * | 2014-04-18 | 2015-11-11 | 한국기계연구원 | 레이저 가공 용 진동 장치 |
Also Published As
Publication number | Publication date |
---|---|
CN101658976B (zh) | 2014-09-03 |
DE102009038642A1 (de) | 2010-03-25 |
US20100044355A1 (en) | 2010-02-25 |
TW201008687A (en) | 2010-03-01 |
CN101658976A (zh) | 2010-03-03 |
US8319143B2 (en) | 2012-11-27 |
KR101470026B1 (ko) | 2014-12-05 |
DE102009038642B4 (de) | 2023-11-16 |
KR20100024344A (ko) | 2010-03-05 |
TWI464026B (zh) | 2014-12-11 |
JP5139922B2 (ja) | 2013-02-06 |
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