JP2009004728A - 基板処理装置 - Google Patents

基板処理装置 Download PDF

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Publication number
JP2009004728A
JP2009004728A JP2007301785A JP2007301785A JP2009004728A JP 2009004728 A JP2009004728 A JP 2009004728A JP 2007301785 A JP2007301785 A JP 2007301785A JP 2007301785 A JP2007301785 A JP 2007301785A JP 2009004728 A JP2009004728 A JP 2009004728A
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JP
Japan
Prior art keywords
substrate
processing
liquid
tank
processing apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2007301785A
Other languages
English (en)
Japanese (ja)
Inventor
Yukio Tomifuji
幸雄 富藤
Kazuto Ozaki
一人 尾▲崎▼
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dainippon Screen Manufacturing Co Ltd
Original Assignee
Dainippon Screen Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dainippon Screen Manufacturing Co Ltd filed Critical Dainippon Screen Manufacturing Co Ltd
Priority to JP2007301785A priority Critical patent/JP2009004728A/ja
Priority to TW97110235A priority patent/TW200903599A/zh
Priority to KR1020080037650A priority patent/KR100933126B1/ko
Publication of JP2009004728A publication Critical patent/JP2009004728A/ja
Pending legal-status Critical Current

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  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning By Liquid Or Steam (AREA)
JP2007301785A 2007-05-24 2007-11-21 基板処理装置 Pending JP2009004728A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2007301785A JP2009004728A (ja) 2007-05-24 2007-11-21 基板処理装置
TW97110235A TW200903599A (en) 2007-05-24 2008-03-21 Base plate treating device
KR1020080037650A KR100933126B1 (ko) 2007-05-24 2008-04-23 기판 처리 장치

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007137995 2007-05-24
JP2007301785A JP2009004728A (ja) 2007-05-24 2007-11-21 基板処理装置

Publications (1)

Publication Number Publication Date
JP2009004728A true JP2009004728A (ja) 2009-01-08

Family

ID=40100683

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007301785A Pending JP2009004728A (ja) 2007-05-24 2007-11-21 基板処理装置

Country Status (3)

Country Link
JP (1) JP2009004728A (zh)
CN (1) CN101312119A (zh)
TW (1) TW200903599A (zh)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011066352A (ja) * 2009-09-18 2011-03-31 Toshiba Corp 基板の製造装置及び製造方法
JP2011200819A (ja) * 2010-03-26 2011-10-13 Sumitomo Precision Prod Co Ltd 搬送式基板処理装置における節水型洗浄システム
CN104001685A (zh) * 2014-06-13 2014-08-27 肇庆宏旺金属实业有限公司 一种用于刷洗机的清洗液自动循环装置
JP2014184434A (ja) * 2014-04-21 2014-10-02 Sumitomo Precision Prod Co Ltd 搬送式基板処理装置における節水型洗浄システム
CN104617018A (zh) * 2015-01-23 2015-05-13 深圳市华星光电技术有限公司 一种基板处理装置及基板处理方法
KR101898095B1 (ko) 2017-02-22 2018-09-12 주식회사 싸이노스 측정장치

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013191779A (ja) * 2012-03-14 2013-09-26 Toshiba Corp 処理装置および処理方法
CN104624568B (zh) 2014-12-18 2016-07-27 深圳市华星光电技术有限公司 一种清洗设备
CN107159637A (zh) * 2017-07-03 2017-09-15 杭州博野精密工具有限公司 一种全自动锯片清洗干燥刷油一体机
CN107552522A (zh) * 2017-09-05 2018-01-09 深圳市华星光电技术有限公司 一种湿法剥离机的水洗装置及水洗方法
CN108971174A (zh) * 2018-08-30 2018-12-11 山东淄博汉能薄膜太阳能有限公司 清洗装置及方法

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011066352A (ja) * 2009-09-18 2011-03-31 Toshiba Corp 基板の製造装置及び製造方法
JP2011200819A (ja) * 2010-03-26 2011-10-13 Sumitomo Precision Prod Co Ltd 搬送式基板処理装置における節水型洗浄システム
JP2014184434A (ja) * 2014-04-21 2014-10-02 Sumitomo Precision Prod Co Ltd 搬送式基板処理装置における節水型洗浄システム
CN104001685A (zh) * 2014-06-13 2014-08-27 肇庆宏旺金属实业有限公司 一种用于刷洗机的清洗液自动循环装置
CN104617018A (zh) * 2015-01-23 2015-05-13 深圳市华星光电技术有限公司 一种基板处理装置及基板处理方法
KR101898095B1 (ko) 2017-02-22 2018-09-12 주식회사 싸이노스 측정장치

Also Published As

Publication number Publication date
TW200903599A (en) 2009-01-16
CN101312119A (zh) 2008-11-26

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