JP2008507067A5 - - Google Patents
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- Publication number
- JP2008507067A5 JP2008507067A5 JP2007519982A JP2007519982A JP2008507067A5 JP 2008507067 A5 JP2008507067 A5 JP 2008507067A5 JP 2007519982 A JP2007519982 A JP 2007519982A JP 2007519982 A JP2007519982 A JP 2007519982A JP 2008507067 A5 JP2008507067 A5 JP 2008507067A5
- Authority
- JP
- Japan
- Prior art keywords
- partially reflective
- relief
- plastic matrix
- consumable
- reflective film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000010410 layer Substances 0.000 claims description 190
- 238000000034 method Methods 0.000 claims description 86
- 230000003287 optical effect Effects 0.000 claims description 80
- 239000000758 substrate Substances 0.000 claims description 80
- 229920003023 plastic Polymers 0.000 claims description 76
- 239000004033 plastic Substances 0.000 claims description 75
- 238000004519 manufacturing process Methods 0.000 claims description 64
- 238000000576 coating method Methods 0.000 claims description 59
- 239000011159 matrix material Substances 0.000 claims description 57
- 239000011248 coating agent Substances 0.000 claims description 53
- 238000000151 deposition Methods 0.000 claims description 36
- 230000001070 adhesive effect Effects 0.000 claims description 28
- 239000000853 adhesive Substances 0.000 claims description 27
- 230000008021 deposition Effects 0.000 claims description 25
- 238000001746 injection moulding Methods 0.000 claims description 25
- 239000000126 substance Substances 0.000 claims description 25
- 239000004417 polycarbonate Substances 0.000 claims description 21
- 229920000515 polycarbonate Polymers 0.000 claims description 21
- 229910052710 silicon Inorganic materials 0.000 claims description 20
- 238000004544 sputter deposition Methods 0.000 claims description 19
- 239000000463 material Substances 0.000 claims description 18
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 claims description 16
- 230000008569 process Effects 0.000 claims description 16
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 14
- 230000004075 alteration Effects 0.000 claims description 12
- 239000004065 semiconductor Substances 0.000 claims description 11
- 238000002310 reflectometry Methods 0.000 claims description 10
- 239000003989 dielectric material Substances 0.000 claims description 9
- 239000011229 interlayer Substances 0.000 claims description 8
- 230000005855 radiation Effects 0.000 claims description 8
- 239000012071 phase Substances 0.000 claims description 7
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 6
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 6
- 238000004140 cleaning Methods 0.000 claims description 6
- 238000001914 filtration Methods 0.000 claims description 6
- 239000007789 gas Substances 0.000 claims description 6
- 239000002904 solvent Substances 0.000 claims description 6
- 230000015572 biosynthetic process Effects 0.000 claims description 5
- 239000007791 liquid phase Substances 0.000 claims description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 4
- 239000001301 oxygen Substances 0.000 claims description 4
- 229910052760 oxygen Inorganic materials 0.000 claims description 4
- 239000010703 silicon Substances 0.000 claims description 4
- 230000001629 suppression Effects 0.000 claims description 4
- 239000011358 absorbing material Substances 0.000 claims description 3
- 238000001035 drying Methods 0.000 claims description 3
- 238000004049 embossing Methods 0.000 claims description 3
- 238000000926 separation method Methods 0.000 claims description 3
- 230000005526 G1 to G0 transition Effects 0.000 claims description 2
- 230000003044 adaptive effect Effects 0.000 claims description 2
- 238000013500 data storage Methods 0.000 claims 9
- 238000011043 electrofiltration Methods 0.000 claims 1
- 238000005516 engineering process Methods 0.000 description 16
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 11
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 9
- -1 polyethylene terephthalate Polymers 0.000 description 8
- 239000002356 single layer Substances 0.000 description 7
- 238000003860 storage Methods 0.000 description 6
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 230000008859 change Effects 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- LIKFHECYJZWXFJ-UHFFFAOYSA-N dimethyldichlorosilane Chemical compound C[Si](C)(Cl)Cl LIKFHECYJZWXFJ-UHFFFAOYSA-N 0.000 description 4
- 239000000975 dye Substances 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 229910052759 nickel Inorganic materials 0.000 description 4
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 3
- 238000013461 design Methods 0.000 description 3
- 230000014759 maintenance of location Effects 0.000 description 3
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 3
- 239000011241 protective layer Substances 0.000 description 3
- 229910052718 tin Inorganic materials 0.000 description 3
- 229920002554 vinyl polymer Polymers 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- 239000004952 Polyamide Substances 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 2
- 239000012790 adhesive layer Substances 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 238000005234 chemical deposition Methods 0.000 description 2
- 239000011247 coating layer Substances 0.000 description 2
- 230000006835 compression Effects 0.000 description 2
- 238000007906 compression Methods 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000002355 dual-layer Substances 0.000 description 2
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 229920001084 poly(chloroprene) Polymers 0.000 description 2
- 229920002647 polyamide Polymers 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- 229920000921 polyethylene adipate Polymers 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 230000010076 replication Effects 0.000 description 2
- 239000011265 semifinished product Substances 0.000 description 2
- 238000006884 silylation reaction Methods 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000004071 soot Substances 0.000 description 2
- PFNQVRZLDWYSCW-UHFFFAOYSA-N (fluoren-9-ylideneamino) n-naphthalen-1-ylcarbamate Chemical compound C12=CC=CC=C2C2=CC=CC=C2C1=NOC(=O)NC1=CC=CC2=CC=CC=C12 PFNQVRZLDWYSCW-UHFFFAOYSA-N 0.000 description 1
- WUPHOULIZUERAE-UHFFFAOYSA-N 3-(oxolan-2-yl)propanoic acid Chemical compound OC(=O)CCC1CCCO1 WUPHOULIZUERAE-UHFFFAOYSA-N 0.000 description 1
- MARUHZGHZWCEQU-UHFFFAOYSA-N 5-phenyl-2h-tetrazole Chemical compound C1=CC=CC=C1C1=NNN=N1 MARUHZGHZWCEQU-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- 229930040373 Paraformaldehyde Natural products 0.000 description 1
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 1
- 229920001665 Poly-4-vinylphenol Polymers 0.000 description 1
- 239000005062 Polybutadiene Substances 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 229920002367 Polyisobutene Polymers 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 239000002313 adhesive film Substances 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 150000005215 alkyl ethers Chemical class 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- 150000008378 aryl ethers Chemical class 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- 229910000416 bismuth oxide Inorganic materials 0.000 description 1
- 229910052980 cadmium sulfide Inorganic materials 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- QABCGOSYZHCPGN-UHFFFAOYSA-N chloro(dimethyl)silicon Chemical compound C[Si](C)Cl QABCGOSYZHCPGN-UHFFFAOYSA-N 0.000 description 1
- 229940114081 cinnamate Drugs 0.000 description 1
- 230000001427 coherent effect Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 125000004386 diacrylate group Chemical group 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- TYIXMATWDRGMPF-UHFFFAOYSA-N dibismuth;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Bi+3].[Bi+3] TYIXMATWDRGMPF-UHFFFAOYSA-N 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- MHCLJIVVJQQNKQ-UHFFFAOYSA-N ethyl carbamate;2-methylprop-2-enoic acid Chemical class CCOC(N)=O.CC(=C)C(O)=O MHCLJIVVJQQNKQ-UHFFFAOYSA-N 0.000 description 1
- XUCNUKMRBVNAPB-UHFFFAOYSA-N fluoroethene Chemical group FC=C XUCNUKMRBVNAPB-UHFFFAOYSA-N 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 229910052745 lead Inorganic materials 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000013021 overheating Methods 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 229920002239 polyacrylonitrile Polymers 0.000 description 1
- 229920001230 polyarylate Polymers 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920001195 polyisoprene Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920006324 polyoxymethylene Polymers 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 229920002620 polyvinyl fluoride Polymers 0.000 description 1
- 229920000036 polyvinylpyrrolidone Polymers 0.000 description 1
- 239000001267 polyvinylpyrrolidone Substances 0.000 description 1
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 238000005478 sputtering type Methods 0.000 description 1
- WBYWAXJHAXSJNI-VOTSOKGWSA-M trans-cinnamate Chemical compound [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US58557404P | 2004-07-07 | 2004-07-07 | |
| US63122204P | 2004-11-29 | 2004-11-29 | |
| PCT/IL2005/000728 WO2006003666A2 (en) | 2004-07-07 | 2005-07-07 | Multilayer optical disc and method and apparatus for making same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2008507067A JP2008507067A (ja) | 2008-03-06 |
| JP2008507067A5 true JP2008507067A5 (https=) | 2008-09-04 |
Family
ID=35783239
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007519982A Pending JP2008507067A (ja) | 2004-07-07 | 2005-07-07 | 多層光ディスクとその製造方法および装置 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20080038455A1 (https=) |
| EP (1) | EP1774522A4 (https=) |
| JP (1) | JP2008507067A (https=) |
| CA (1) | CA2626232A1 (https=) |
| RU (1) | RU2007103842A (https=) |
| WO (1) | WO2006003666A2 (https=) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| ATE503445T1 (de) * | 2007-02-15 | 2011-04-15 | Dignitana Ab | Kopfkühler |
| EP2175449A4 (en) * | 2007-07-11 | 2012-01-18 | Sharp Kk | OPTICAL INFORMATION RECORDING MEDIUM AND OPTICAL INFORMATION RECORDING MEDIUM DRIVE APPARATUS |
| WO2009014190A1 (ja) * | 2007-07-25 | 2009-01-29 | Sharp Kabushiki Kaisha | 光情報記録媒体及び光情報記録媒体駆動装置 |
| JP5308059B2 (ja) * | 2008-04-25 | 2013-10-09 | 株式会社ミツトヨ | 光電式エンコーダ用スケール |
| JP5073632B2 (ja) * | 2008-10-10 | 2012-11-14 | シャープ株式会社 | 光情報記録媒体および光情報記録媒体駆動装置 |
| CN102054499B (zh) * | 2010-12-30 | 2012-06-20 | 东莞宏威数码机械有限公司 | 蓝光光盘母盘制造系统及方法 |
| KR102041936B1 (ko) | 2011-06-09 | 2019-11-07 | 케이스 웨스턴 리저브 유니버시티 | 광학적 정보 스토리지 매체 |
| US9921377B2 (en) | 2014-07-31 | 2018-03-20 | Hewlett Packard Enterprise Department LP | Interposer registration elements |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL7803069A (nl) * | 1978-03-22 | 1979-09-25 | Philips Nv | Meerlaags informatieschijf. |
| JPH01107338A (ja) * | 1987-10-21 | 1989-04-25 | Hitachi Ltd | 光デイスク用スタンパの作製方法 |
| JP3012547B2 (ja) * | 1997-02-25 | 2000-02-21 | 日本ビクター株式会社 | 光記録媒体及びその製造方法 |
| US5946286A (en) * | 1997-03-20 | 1999-08-31 | Imation Corp. | Customized graphics for dual layer optical discs |
| US6309496B1 (en) * | 1999-03-04 | 2001-10-30 | Wea Manfacturing Inc. | Method and apparatus for making dual layer DVD discs |
| JP2000268417A (ja) * | 1999-03-18 | 2000-09-29 | Pioneer Electronic Corp | 光ディスクの製造方法 |
| US6475589B1 (en) * | 2001-12-17 | 2002-11-05 | General Electric Company | Colored optical discs and methods for making the same |
| JP2003281791A (ja) * | 2002-03-22 | 2003-10-03 | Toshiba Corp | 片面２層光ディスク及びその製造方法及び装置 |
-
2005
- 2005-07-07 WO PCT/IL2005/000728 patent/WO2006003666A2/en not_active Ceased
- 2005-07-07 JP JP2007519982A patent/JP2008507067A/ja active Pending
- 2005-07-07 CA CA002626232A patent/CA2626232A1/en not_active Abandoned
- 2005-07-07 RU RU2007103842/28A patent/RU2007103842A/ru not_active Application Discontinuation
- 2005-07-07 EP EP05759804A patent/EP1774522A4/en not_active Withdrawn
- 2005-07-07 US US11/631,732 patent/US20080038455A1/en not_active Abandoned
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