JP2008169406A - Method for producing molding subjected to ornamental treatment, and molding - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a method for producing a molding where there is no need of restricting the selection of resin materials and molding conditions in accordance with rugged working such as surface texturing. <P>SOLUTION: This production method comprises: a stage where a rugged film 7a whose surface is provided with a rugged shape is formed on a resin molding 7 whose surface is flat and has a prescribed profile; and a stage where an ornamental film 5 is formed on the rugged film 7a along the rugged shape thereof. In the production method, since there is no need of directly subjecting the surface of the resin molding 7 to rugged working, the resin molding 7 can be easily molded with dies 101, 102 or the like each having a flat surface, and there is no need of restricting resin selection and molding conditions in accordance with rugged working. The ornamental film 6 may have a constitution including at least either a metal film or a dielectric film with a different index of refraction different from that of the material in the resin molding. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

  The present invention relates to a method for manufacturing a resin molded product, and more particularly, to a method for manufacturing a resin molded product that has been subjected to a decoration process such as crease processing.

  In a molded product such as a resin, applying unevenness or graining on the surface creates an attractive appearance for a plastic product, which contributes to an improvement in the market value of the product. For example, the manufacturing method of coating a metal film by painting or vapor deposition on the surface of an extension, reflector, etc., which is a resin molded product of an automotive lamp body, and coating and vapor deposition creates a unique matte feeling on the molded product. In recent years, needs have increased. Hereinafter, uneven processing such as grain processing and satin processing is collectively referred to as grain processing.

  As a conventional manufacturing method for performing uneven processing on a molded product, for example, as described in Patent Document 1, by performing sandblasting or etching treatment on the surface of a mold in advance, a desired uneven shape such as grain processing is obtained. Form a corresponding shape. By performing molding using this mold, a molded product having a concavo-convex shape transferred to the surface is manufactured.

  A general method for producing a resin molded product with a textured process will be briefly described. First, as shown in FIG. 4A, the molds 1 and 2 having the inner surface engraved with the warp 3 are prepared, and the resin 1 is injected into the molds 1 and 2 so that the surface 3 is transferred. A molded product 4 is obtained (FIG. 4B). A metal film 5 is formed on the graining 3 of the molded product 4 (FIG. 4C). Thereby, the molded article 6 provided with the grain processing 3 and the metal film 5 having a mat effect can be obtained.

JP 2003-334819 A

  In the prior art, since it is necessary to previously form a concave / convex process for forming the surface of the mold, the mold processing cost increases. In addition, a metal mold formed with irregularities is complicated to maintain and increases the maintenance cost. For this reason, the cost increase at the time of manufacture is caused.

  In addition, it is necessary to faithfully transfer the concavo-convex shape for crease processing on the mold surface to the resin molded product by an injection molding method or the like. However, depending on the resin material, there is a resin material with poor transferability such as high viscosity, and selection of the resin material may be limited due to the graining process. Also, the molding conditions may need to be limited according to the properties of the selected resin material.

  The objective of this invention is providing the manufacturing method of the molded article which does not need to restrict | limit the selection of resin material and a molding condition according to uneven | corrugated processes, such as a graining process.

  In order to achieve the above object, according to a first aspect of the present invention, there is provided a method for producing a molded article provided with a decorative film whose surface is processed to be uneven. That is, a step of forming a concavo-convex film having a concavo-convex shape on the surface on a resin molded product having a flat surface and a predetermined outer shape, and a decorative film is formed on the concavo-convex film along the concavo-convex shape The manufacturing method which has a process to do. In this manufacturing method, since it is not necessary to directly process the surface of the resin molded product, the resin molded product can be easily molded with a mold having a flat surface, and the resin selection and molding conditions are limited according to the uneven processing. There is no need.

  The decorative film can be configured to include at least one of a metal film and a dielectric film having a refractive index different from that of the material of the resin molded product. As a result, the resin molded product can be decorated with a metallic gloss or a glossy decorative film made of a dielectric material, and its light reflection characteristics are controlled by the uneven shape on the surface of the decorative film, so that it is textured and frosted. Desired decorations such as effects can be expressed.

  In the step of forming the concavo-convex film, it is desirable to form the concavo-convex film so that the decorative film has a surface roughness such that the ten-point average roughness Rz is 0.1 to 1.0 μm. For example, in the step of forming the concavo-convex film, the concavo-convex film made of elements of Si, C, H, and O can be formed by a vapor phase growth method using plasma using an organic silicon monomer as a source gas. In addition, for example, the step of forming the concavo-convex film includes the step of forming a concavo-convex film made of a metal oxide by ion plating or sputtering using a metal that becomes an ion-binding oxide or an ion-bonding metal oxide as a raw material. A film can be formed.

  In the step of forming the concavo-convex film, the concavo-convex film can be formed at a position corresponding to the opening by performing film formation in a state where a mask having an opening having a predetermined shape is disposed on the resin molded product. Is possible.

  According to the 2nd aspect of this invention, the following decoration processes are given and a molded article is provided. That is, a resin molded product having a flat surface and a predetermined outer shape, a concavo-convex film provided with a concavo-convex shape on the surface, and a concavo-convex shape disposed on the concavo-convex film along the concavo-convex shape. A molded product having a decorative film of a different shape.

  The decorative film can be configured to include at least one of a metal film and a dielectric film having a refractive index different from that of the material of the resin molded product. It is desirable that the decorative film has a ten-point average roughness Rz with a surface roughness of 0.1 to 1.0 μm.

As the concavo-convex film, a film made of an element of Si, C, H, or O, or a metal oxide film can be used. For example, the metal oxide film can be a ZnO film, an ITO film (indium tin oxide film), or a SnO ₂ film. The concavo-convex film can be disposed only on a predetermined part of the resin molded product.

  A molded article subjected to a decoration process according to an embodiment of the present invention and a manufacturing method thereof will be described with reference to the drawings.

  First, the structure of the molded product 6 manufactured in the present embodiment will be described with reference to FIG. As shown in FIG. 1 (d), the molded product 6 has a resin molded product 7 that does not have unevenness on the surface, an uneven film 7a formed on the surface, and a shape that follows the uneven shape of the uneven film 7a. And a metal film 5. The concavo-convex shape of the concavo-convex film 7 a is a shape designed in advance to express a desired decorative effect such as a moistening effect or a matte finish with a concavo-convex shape on the surface of the metal film 5. Due to the concavo-convex shape of the metal film 5, the molded product 6 is decorated with a moistening effect or the like having a mat effect.

  In FIG. 1D, for the sake of illustration, the resin molded product 7 is represented as a plate-like member, and the concavo-convex shapes of the concavo-convex film 7a and the metal film 5 are enlarged, but actually the resin molded product. 7 has the shape of a desired product (for example, an extension or reflector of an automobile lamp). Further, the uneven shape of the uneven film 7a and the metal film 5 has an uneven depth of about 0.1 μm to several μm order, which is finer than the thickness of the molded product 6 (generally 100 μm to several mm). It is a rough shape.

  Next, a method for manufacturing the molded product 6 in FIG. 1D will be described with reference to FIGS.

  First, as shown in FIG. 1A, molds 101 and 102 having an internal shape corresponding to the external shape of the molded product 6 are prepared. The inner surfaces of the molds 101 and 102 do not need to be subjected to uneven processing for graining or the like, and the surfaces may remain flat.

  Next, a resin molded product 7 having a desired outer shape and a flat surface as shown in FIG. 1B is obtained by injecting resin into the molds 101 and 102 of FIG. 1A. . As a resin injection molding method, a desired method such as an injection molding method can be used. Further, since the flat molds 101 and 102 are not subjected to graining or the like, it is not necessary to limit the material of the resin in order to transfer the graining or the like, and a desired resin material can be used. For example, ABS (acrylonitrile / butadiene styrene resin), AAS (acrylonitrile / acrylic rubber / styrene copolymer), ASA (acrylonitrile / styrene / acrylate rubber copolymer resin), PBT (polybutylene terephthalate), which are thermoplastic resins, Use of thermosetting resin using PET (polyethylene terephthalate), PC (polycarbonate), PMMA (polymethyl methacrylate), PPS (polyphenylene sulfide), PEI (polyetherimide), and unsaturated polyester resin it can.

  Next, as shown in FIG. 1C, an uneven film 7 a is formed on the flat resin molded product 7. The concavo-convex film 7 a has a predetermined concavo-convex shape in order to form a concavo-convex shape having a predetermined pattern and roughness on the surface of the metal film 5. For example, it is desirable to design the unevenness roughness of the uneven film 7 a in consideration of the thickness of the metal film 5 so that unevenness of 0.1 to 1.0 μm appears on the surface of the metal film 5. The film thickness of the concavo-convex film 7a may be any thickness as long as the designed concavo-convex roughness can be formed, and can be, for example, about 0.3 to 2.0 μm.

  The concavo-convex film 7a can be formed by a desired method as long as it is a method that does not damage the molded product 7 by heat, but plasma chemical vapor deposition (CVD) using high-density plasma, ion plating. It is desirable to form a film without heating the molded article 7 by a method or a sputtering method.

As a material of the uneven film 7a, an organic silicon compound or a metal oxide can be used. When the material of the concavo-convex film 7a is an organic silicon compound, the concentration ratio of the number of atoms of Si, C, and O is O / Si = 1.55, C / Si = 0.6 to O / Si = 1.77. C / Si = 0.86 is preferable. For example, the composition ratio can be Si: C: O = 1: 1: 1.46. When the material of the concavo-convex film 7a is a metal oxide, it is desirable that it is an ion-binding oxide. For example, ZnO, ITO (indium tin oxide), SnO ₂ can be used.

  The high density plasma refers to a low voltage with a discharge voltage of 150 V or less and a large current plasma with a discharge current of 10 A to 30 A, and can be generated by, for example, arc discharge. By using such high density plasma, there is little damage given to the resin base material which comprises the molded article 7 during film-forming of the uneven | corrugated film 7a.

When the material of the concavo-convex film 7a is an organic silicon compound, it can be formed by plasma CVD using an organic silicon compound monomer gas (for example, hexamethyldisiloxane: HMDSO) as a source gas. The material of the uneven film, a metal oxide, e.g., ZnO, ITO, in the case of SnO ₂ as the evaporation source or the target, ZnO, ITO, and SnO ₂ used, respectively, deposited by ion plating method or a sputtering method be able to.

  For the formation of the concavo-convex film 7a, a film forming apparatus including the high-density plasma source shown in FIG. 2 is used. This apparatus includes a film forming vacuum container 15 that forms a film forming space, and a plasma gun 8 connected to a plasma inlet 15 a of the film forming vacuum container 15. The plasma gun 8 includes a composite cathode 9 disposed in a plasma generation chamber (not shown), an intermediate electrode 10 having an orifice, and an anode 20 disposed between the intermediate electrode 10 and the film forming vacuum vessel 15. And an anode (evaporation source) 24 disposed in the film forming vacuum vessel 15 and an electromagnetic coil 13 for converging plasma and passing the intermediate electrode 10. The anode 20 is used when forming the uneven film 7a made of an organic silicon compound. The anode (evaporation source) 24 is used at the time of forming the concavo-convex film 7 a made of a metal oxide and at the time of forming a metal film 5 described later.

  A plasma generation power source 14 is connected between the composite cathode 9 and the anode 20 and between the composite cathode 9 and the anode (evaporation source) 24 via switches 21 and 25, respectively. The composite cathode 9 and the intermediate electrode 10 are insulated by an insulating insulator 11. A discharge gas 12 is supplied into the plasma gun 8.

  The structure of the composite cathode 9 uses a known composite cathode structure capable of generating a high-density plasma by shifting from glow discharge to arc discharge. For example, an auxiliary cathode that generates glow discharge and is heated by collision of countercurrent ions and a main cathode that is heated by radiant heat of the auxiliary cathode and generates arc discharge can be used.

  Further, a substrate holder 16 that holds the molded product 7 and a source gas introduction pipe 19 that supplies a source gas (material gas) 18 are disposed in the film forming vacuum vessel 15. An organic silicon compound monomer gas (for example, hexamethyldisiloxane: HMDSO) is used as the source gas 19. The film formation vacuum vessel 15 is connected to a vacuum pump by an exhaust pipe 17.

When forming the concavo-convex film 7a made of an organic silicon compound using the film forming apparatus having such a structure, the film forming vacuum vessel 15 is evacuated and then Ar, He is applied to the composite cathode 9 of the plasma gun 8. , Kr, Xe, H ₂ or other discharge gas 12 is introduced. The switch 21 is closed, the switch 25 is opened, and a negative DC voltage is applied between the composite cathode 9 and the anode 20 by the power source 14 to discharge. Although it is glow discharge immediately after ignition, when the back-flowing ions of the ionized discharge gas collide with the composite cathode 1 and the composite cathode is heated, thermal electrons are emitted, thereby increasing the degree of ionization of the glow discharge. As a result, a transition to arc discharge is performed, and a large current discharge having a current amount of about 10 to 100 A is obtained. The high-density plasma 22 generated by this discharge is converged in a beam shape by the magnetic field of the electromagnetic coil 13, passes through the central hole (orifice) of the intermediate electrode 10, and is drawn out to the vicinity of the substrate holder 16 of the film-forming vacuum vessel 15. After that, it returns to the anode 20. The plasma drawn out to the vacuum vessel 15 is mixed with the source gas 18 to become a reaction plasma 23. An organic silicon compound monomer gas (for example, hexamethyldisiloxane: HMDSO) is introduced as the source gas 18. Decomposition / polymerization or chemical reaction of the source gas 18 occurs in the reaction plasma 23, and an uneven film 7 a is formed on the molded product 7 of the substrate holder 16.

  At this time, by appropriately setting the film forming conditions such as the film forming pressure and the partial pressure ratio between the discharge gas and the organosilicon compound monomer gas, it is possible to form an uneven film having unevenness on the surface.

  When the uneven film 7a made of metal oxide is formed by the ion plating method using the apparatus of FIG. 2, the anode 24 is filled with a predetermined evaporation source. The switch 21 is opened, the switch 25 is closed, and the plasma 22 is generated. The plasma 22 flows into the anode 24, heats and evaporates the material, and the uneven film 7a is formed.

  At this time, by appropriately setting the film forming conditions such as the film forming pressure and the discharge gas pressure, it is possible to form an uneven film having unevenness on the surface.

  Next, a method for forming the metal film 5 will be described. As a material of the metal film 5, a desired metal material such as an alloy such as aluminum, chromium, silver, and stainless steel can be used. As a film forming method, an ion plating method, a vapor deposition method, a sputtering method, or the like can be used. In the present embodiment, since the uneven film 7a is formed using the apparatus of FIG. 2, the metal film 5 is also formed by the ion plating method using the apparatus of FIG. Continuous film formation is possible without opening the container 15.

  When the metal film 5 is formed by the ion plating method using the apparatus of FIG. 2, the anode 24 is filled with a desired material in advance. The switch 21 is opened, the switch 25 is closed, and the plasma 22 is generated. The plasma 22 flows into the anode 24, heats and evaporates the material, and the metal film 5 is formed on the molded product 16 on which the uneven film 7a is formed so as to follow the uneven shape.

  The film forming method of the metal film 5 is not limited to the film forming method using the apparatus shown in FIG. 2, but can be formed by a resistance heating method, an electron gun heating method, a sputtering method, etc. using a separate apparatus. is there.

  Since the molded product 6 manufactured according to the present embodiment does not need to be formed with minute uneven shapes for sag processing on the inner surfaces of the molds 101 and 102, the mold can be easily manufactured. Mold production costs can be reduced. Moreover, since the molds 101 and 102 do not have a minute uneven shape, the mold maintenance cost can be reduced.

  In the case of performing a graining process with a mold as in the past, it is necessary to prepare molds for the number of types of processing, but according to the manufacturing method of the present embodiment, the shape of the unevenness can be changed under film formation conditions. Since it can be controlled, it is possible to manufacture a plurality of molded products 6 having different graining processes using a single mold. For this reason, the number of molds can be reduced. Moreover, since the uneven | corrugated shape for a wrinkle process is unnecessary for a metal mold | die, the width | variety of a metal mold | die design and decorating property can be expanded.

  In addition, since the molds 101 and 102 do not have irregularities for dent processing, it is not necessary to control the resin viscosity and molding conditions in order to accurately transfer the irregularities when the molded product 7 is molded. The width is widened and the setting range of molding conditions can be expanded.

  By continuously forming the uneven film 7a and the metal film 5 using the apparatus of FIG. 2 as described above, the mass productivity can be improved.

  According to the present invention, it is possible to manufacture molded products that have been subjected to various decorative processes. For example, it is possible to suitably manufacture a reflector or an extension in an automobile lamp body that is provided with graining or surface irregularities.

  In the method for forming the uneven film 7a described above, the uneven shape can be controlled by changing the film forming conditions. For example, when the film formation time is changed, the surface roughness tends to increase as the film formation time increases. Thereby, it is possible to control the shape of the graining process according to the film forming conditions.

  Further, when forming the uneven film 7a and the metal film 5, it is also possible to arrange a mask having an opening of a desired shape on the film formation surface. Thereby, the part in which the uneven | corrugated film 7a and the metal film 5 are arrange | positioned, and the part in which it is not arrange | positioned can be mixed, and the width | variety of a design can be expanded.

A transparent or translucent material (dielectric material) film can be formed instead of or laminated on the metal film 5. For example, TiO ₂ can be used as the dielectric material. In this case, the light can be reflected by designing the refractive index of the transparent material film to be a predetermined refractive index with respect to the concavo-convex film 7 a and the molded product 7. Thereby, a glossy film can be formed, and a decorative film having a metallic luster similar to that of the metal film can be formed of a dielectric material.

  The molded product 6 provided with the metal film 5 having a desired uneven shape can be manufactured through the above steps. Since the metal film 5 can exhibit a matte effect or the like due to the concavo-convex shape, a molded product 6 decorated with a metallic gloss film having a desired decorative effect can be manufactured.

Examples of the present invention will be described below.
(Example)
In this example, a molded product 6 having the configuration shown in FIG. The material of the molded product 7 is polycarbonate. In this example, the step of FIG. 1A was omitted, and a product previously formed into a plate shape as shown in FIG. 1B was prepared. The uneven film 7a is formed on the molded article 7 by the plasma CVD method using the film forming apparatus shown in FIG. 2 (FIG. 1C), and the metal film 6 is continuously formed by the ion plating method. (FIG. 1 (d)).

In the step of FIG. 1C, an organic silicon film (composition Si: C: O = 1: 1: 1.46) was formed as the uneven film 7a using the film forming apparatus of FIG. The film forming procedure of the uneven film 7a using the film forming apparatus of FIG. 2 is as described in the above embodiment. Table 1 shows the conditions for forming the uneven film 7a. As shown in Table 1, hexamethyldisiloxane (HMDSO) was introduced as the source gas 18. Ar was used as the discharge gas. As shown in Table 1, the discharge current, the discharge voltage, the film forming pressure, and the partial pressure ratio between the discharge gas Ar and HMDSO were set. By forming the film under these conditions, an organic silicon film (uneven film 7a) having an uneven surface could be formed.

  The film formation time was changed in the range of 2 to 10 minutes as shown in FIG. 3, and the surface roughness Rz (ten-point average roughness: JIS B0601-1994) of the sample of the obtained uneven film 7a was measured. The result is shown in FIG. As is apparent from FIG. 3, the surface roughness increases as the film formation time increases. Thus, it was confirmed that the shape of the uneven film 7a can be controlled by changing the film formation time. The thickness of the uneven film 7a of the sample shown in FIG. 3 was in the range of 0.3 to 2.0 μm. In addition, the surface roughness shown in FIG. 3 was measured with an atomic force microscope (SII Nanotechnology Inc. SPA-300).

An Al film was continuously formed as the metal film 6 without opening the film forming apparatus of FIG. The deposition procedure of the metal film 5 using the deposition apparatus of FIG. 2 is as described in the above embodiment. The anode 24 was filled with Al as an evaporation source. Ar was used as the discharge gas. As shown in Table 2, the discharge current, discharge voltage, and film formation pressure were set. By forming the film under these conditions, the metal film 5 having a shape following the uneven shape of the uneven film 7a could be formed. The thickness of the metal film 5 was about 1000 to 3000 angstroms.

  According to this example, it was possible to manufacture a molded product 6 decorated with a metal film having a concavo-convex shape on the surface without using a mold for crease processing. Further, the roughness of the concavo-convex shape could be controlled by the film formation time of the concavo-convex film 7a.

(A)-(d) Explanatory drawing which shows the manufacturing method of the molded article to which the decoration process of this Embodiment was given. 3 is a block diagram illustrating a structure of a film formation apparatus using high-density plasma, which is used in the film formation process of the uneven film and the metal film in this embodiment mode. FIG. The graph which shows the change of the surface roughness by the film-forming time of the sample of an uneven | corrugated film in a present Example. Explanatory drawing which shows the manufacturing method of the molded article in which the conventional decoration process was given.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1, 2 ... Mold, 3 ... Grazing processing, 4 ... Resin molded product, 5 ... Metal film, 6 ... Molded product, 7 ... Resin molded product, 7a ... Uneven film, 101, 102 ... Mold, 8 ... Plasma generation Source: 9 ... Cathode, 10 ... Intermediate electrode, 11 ... Insulating insulator, 12 ... Discharge gas, 13 ... Electromagnetic coil, 14 ... Power source, 15 ... Deposition vacuum vessel, 16 ... Substrate holder, 17 ... Vacuum exhaust pipe, 19 ... Source gas introduction pipe, 20 ... anode, 21 ... switch, 22 ... high density plasma, 23 ... reaction plasma, 24 ... anode (evaporation source), 25 ... switch.

Claims (12)

A method for producing a molded article having a decorative film whose surface is uneven.
A step of forming a concavo-convex film having a concavo-convex shape on the surface on a resin molded product having a flat surface and a predetermined outer shape,
And a step of forming the decorative film on the concave-convex film along the concave-convex shape.   The method of manufacturing a molded article provided with the decorative film according to claim 1, wherein the decorative film includes at least one of a metal film and a dielectric film having a refractive index different from that of a material of the resin molded article. A method for producing a molded article having a decorative film.   3. The method for producing a molded article having a decorative film according to claim 1, wherein the step of forming the concavo-convex film has a surface roughness of the decorative film of a 10-point average roughness Rz of 0.1 μm or more 1 A method for producing a molded article having a decorative film, wherein the uneven film is formed with a surface roughness of 0.0 μm or less.   4. The method for producing a molded article provided with the decorative film according to claim 1, wherein the step of forming the concavo-convex film includes vapor phase growth using plasma using an organic silicon monomer as a source gas. A method for producing a molded article having a decorative film, characterized in that the concavo-convex film comprising Si, C, H, and O elements is formed by a method.   5. The method of manufacturing a molded article provided with the decorative film according to claim 1, wherein the step of forming the uneven film includes a metal that becomes an ion-binding oxide, or an ion-binding metal. A method for producing a molded article having a decorative film, characterized in that the concavo-convex film made of a metal oxide is formed by using an oxide as a raw material by an ion plating method or a sputtering method.   6. The method of manufacturing a molded article provided with the decorative film according to claim 1, wherein the step of forming the uneven film includes a mask having an opening having a predetermined shape on the resin molded article. And forming the concave-convex film at a position corresponding to the opening.   A resin molded product having a flat surface and a predetermined outer shape, a concavo-convex film provided with a concavo-convex shape on the surface, disposed on the resin molded product, and disposed on the concavo-convex film, along the concavo-convex shape A molded article having a decorative treatment characterized by having a decorative film of a different shape.   The molded article subjected to the decoration treatment according to claim 7, wherein the decoration film includes at least one of a metal film and a dielectric film having a refractive index different from that of a material of the resin molded article. Molded product that has been decorated.   The molded article subjected to the decoration treatment according to claim 7 or 8, wherein the decoration film has a ten-point average roughness Rz having a surface roughness of 0.1 µm or more and 1.0 µm or less. Molded product that has been processed.   10. The molded product subjected to the decoration treatment according to claim 7, wherein the uneven film is a film made of an element of Si, C, H, or O, or a metal oxide film. Molded product with decorative treatment characterized by The molded article subjected to the decoration treatment according to claim 10, wherein the metal oxide film is a ZnO film, an ITO film, or a SnO ₂ film.   12. The molded article subjected to the decoration process according to claim 7, wherein the uneven film is disposed only on a predetermined part of the resin molded article. Molded product with

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