JP2008091910A5 - - Google Patents
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- Publication number
- JP2008091910A5 JP2008091910A5 JP2007251152A JP2007251152A JP2008091910A5 JP 2008091910 A5 JP2008091910 A5 JP 2008091910A5 JP 2007251152 A JP2007251152 A JP 2007251152A JP 2007251152 A JP2007251152 A JP 2007251152A JP 2008091910 A5 JP2008091910 A5 JP 2008091910A5
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor laser
- absorption region
- semiconductor
- region
- absorption
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 claims 44
- 238000010521 absorption reaction Methods 0.000 claims 19
- 239000000463 material Substances 0.000 claims 6
- 150000004767 nitrides Chemical class 0.000 claims 4
- 229910052710 silicon Inorganic materials 0.000 claims 3
- 229910052719 titanium Inorganic materials 0.000 claims 3
- 229910052782 aluminium Inorganic materials 0.000 claims 2
- 229910052733 gallium Inorganic materials 0.000 claims 2
- 229910052735 hafnium Inorganic materials 0.000 claims 2
- 229910052738 indium Inorganic materials 0.000 claims 2
- 229910052758 niobium Inorganic materials 0.000 claims 2
- 229910052715 tantalum Inorganic materials 0.000 claims 2
- 229910052725 zinc Inorganic materials 0.000 claims 2
- 229910052726 zirconium Inorganic materials 0.000 claims 2
- 239000004642 Polyimide Substances 0.000 claims 1
- 230000002745 absorbent Effects 0.000 claims 1
- 239000002250 absorbent Substances 0.000 claims 1
- 239000011358 absorbing material Substances 0.000 claims 1
- 239000003989 dielectric material Substances 0.000 claims 1
- 230000005670 electromagnetic radiation Effects 0.000 claims 1
- 239000002184 metal Substances 0.000 claims 1
- 229910052751 metal Inorganic materials 0.000 claims 1
- 239000011368 organic material Substances 0.000 claims 1
- 239000002245 particle Substances 0.000 claims 1
- 229910052697 platinum Inorganic materials 0.000 claims 1
- 229920001721 polyimide Polymers 0.000 claims 1
- 239000000126 substance Substances 0.000 claims 1
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102006046297A DE102006046297A1 (de) | 2006-09-29 | 2006-09-29 | Halbleiterlaser |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2008091910A JP2008091910A (ja) | 2008-04-17 |
| JP2008091910A5 true JP2008091910A5 (https=) | 2011-06-16 |
Family
ID=38667082
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007251152A Pending JP2008091910A (ja) | 2006-09-29 | 2007-09-27 | 半導体レーザ |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US20080089374A1 (https=) |
| EP (1) | EP1906498A1 (https=) |
| JP (1) | JP2008091910A (https=) |
| DE (1) | DE102006046297A1 (https=) |
Families Citing this family (33)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102008025922B4 (de) | 2008-05-30 | 2020-02-06 | Osram Opto Semiconductors Gmbh | Kantenemittierender Halbleiterlaser mit Phasenstruktur |
| DE102008058436B4 (de) | 2008-11-21 | 2019-03-07 | Osram Opto Semiconductors Gmbh | Kantenemittierender Halbleiterlaserchip |
| DE102009015314B4 (de) * | 2009-03-27 | 2023-04-27 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Halbleiterlaservorrichtung |
| JP2011243939A (ja) * | 2010-01-20 | 2011-12-01 | Panasonic Corp | 窒化物半導体レーザ装置 |
| JP5697907B2 (ja) * | 2010-06-25 | 2015-04-08 | シャープ株式会社 | 窒化物半導体レーザ素子およびその製造方法 |
| DE102011123129B4 (de) * | 2011-05-02 | 2025-04-30 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Laserlichtquelle mit Modenfilterstruktur |
| DE102011100175B4 (de) | 2011-05-02 | 2021-12-23 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Laserlichtquelle mit einer Stegwellenleiterstruktur und einer Modenfilterstruktur |
| DE102011103952B4 (de) | 2011-06-10 | 2022-05-05 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Kantenemittierender Halbleiterlaser |
| DE102012103549B4 (de) * | 2012-04-23 | 2020-06-18 | Osram Opto Semiconductors Gmbh | Halbleiterlaserlichtquelle mit einem kantenemittierenden Halbleiterkörper und Licht streuenden Teilbereich |
| DE102012106687B4 (de) * | 2012-07-24 | 2019-01-24 | Osram Opto Semiconductors Gmbh | Steglaser |
| US9429693B2 (en) | 2012-09-25 | 2016-08-30 | Nec Corporation | High-order mode filter |
| DE102012109175B4 (de) | 2012-09-27 | 2019-02-28 | Osram Opto Semiconductors Gmbh | Halbleiterlaserdiode |
| DE102012110613A1 (de) * | 2012-11-06 | 2014-05-08 | Osram Opto Semiconductors Gmbh | Optoelektronisches Halbleiterbauelement |
| DE102012111512B4 (de) * | 2012-11-28 | 2021-11-04 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Halbleiterstreifenlaser |
| DE102013223499C5 (de) * | 2013-11-18 | 2020-03-12 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Breitstreifenlaser und Verfahren zum Herstellen eines Breitstreifenlasers |
| US10199800B2 (en) * | 2015-07-28 | 2019-02-05 | Sony Corporation | Light emitting element |
| DE102015119226A1 (de) | 2015-11-09 | 2017-05-11 | Osram Opto Semiconductors Gmbh | Halbleiterlaserdiode |
| DE102016103358A1 (de) * | 2016-02-25 | 2017-08-31 | Osram Opto Semiconductors Gmbh | Laserbarren mit gräben |
| DE102016106495A1 (de) | 2016-04-08 | 2017-10-12 | Osram Opto Semiconductors Gmbh | Halbleiterlaser |
| US10777968B2 (en) | 2016-10-28 | 2020-09-15 | Nlight, Inc. | Method, system and apparatus for higher order mode suppression |
| DE102018125496A1 (de) | 2018-10-15 | 2020-04-16 | Osram Opto Semiconductors Gmbh | Halbleiterlaser und Herstellungsverfahren für Halbleiterlaser |
| JP6940572B2 (ja) * | 2019-01-29 | 2021-09-29 | シャープ株式会社 | 窒化物半導体レーザ素子および半導体レーザ装置 |
| DE102019103909A1 (de) | 2019-02-15 | 2020-08-20 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Kantenemittierende Laserdiode und Verfahren für deren Herrstellung |
| DE102019106536B4 (de) * | 2019-03-14 | 2024-11-28 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Halbleiterlaserdiode und Verfahren zur Herstellung einer Halbleiterlaserdiode |
| US11828934B1 (en) | 2019-07-10 | 2023-11-28 | X Development Llc | High-dispersion optical components and methods for making the same |
| WO2021030639A1 (en) * | 2019-08-13 | 2021-02-18 | Nlight, Inc. | Method, system and apparatus for higher order mode suppression |
| US11011884B1 (en) * | 2019-08-29 | 2021-05-18 | X Development Llc | Systems and methods for designing optical devices having mode selective facets |
| US11455443B1 (en) | 2019-08-29 | 2022-09-27 | X Development Llc | Methods and systems for designing image processing devices |
| US11604957B1 (en) | 2019-09-20 | 2023-03-14 | X Development Llc | Methods for designing hybrid neural networks having physical and digital components |
| US11092746B1 (en) | 2019-12-18 | 2021-08-17 | X Development Llc | Post-fabrication photonic performance tuning |
| US12061851B1 (en) | 2019-12-18 | 2024-08-13 | X Development Llc | Systems and methods for designing photonic computational architectures |
| US11835715B1 (en) | 2019-12-19 | 2023-12-05 | X Development Llc | Multimodal photonic components |
| US11842129B1 (en) | 2020-05-28 | 2023-12-12 | X Development Llc | Finite floating-point numerical simulation and optimization |
Family Cites Families (28)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5219785A (en) * | 1989-01-27 | 1993-06-15 | Spectra Diode Laboratories, Inc. | Method of forming current barriers in semiconductor lasers |
| US5974069A (en) * | 1994-09-16 | 1999-10-26 | Rohm Co., Ltd | Semiconductor laser and manufacturing method thereof |
| JPH0936474A (ja) * | 1995-07-14 | 1997-02-07 | Mitsubishi Electric Corp | 半導体レーザ及びその製造方法 |
| US5963573A (en) * | 1997-08-25 | 1999-10-05 | 3M Innovative Properties Company | Light absorbing layer for II-VI semiconductor light emitting devices |
| JPH1187850A (ja) * | 1997-09-03 | 1999-03-30 | Sharp Corp | 窒化物系化合物半導体レーザ素子及びレーザ装置 |
| JPH11112075A (ja) * | 1997-09-30 | 1999-04-23 | Fujitsu Ltd | 半導体レーザ装置及びその製造方法 |
| US6141365A (en) * | 1997-12-31 | 2000-10-31 | Lasertron | Semiconductor laser with kink suppression layer |
| JP3653169B2 (ja) * | 1998-01-26 | 2005-05-25 | シャープ株式会社 | 窒化ガリウム系半導体レーザ素子 |
| JPH11251685A (ja) * | 1998-03-05 | 1999-09-17 | Toshiba Corp | 半導体レーザ |
| US6287946B1 (en) * | 1999-05-05 | 2001-09-11 | Hrl Laboratories, Llc | Fabrication of low resistance, non-alloyed, ohmic contacts to InP using non-stoichiometric InP layers |
| JP4646093B2 (ja) * | 1999-09-09 | 2011-03-09 | シャープ株式会社 | 窒化物半導体レーザ素子およびその製造方法 |
| JP2001148544A (ja) * | 1999-09-10 | 2001-05-29 | Sharp Corp | 半導体発光素子 |
| JP2002131713A (ja) * | 2000-10-19 | 2002-05-09 | Mitsubishi Electric Corp | 光半導体デバイス |
| DE10105722B4 (de) * | 2001-02-08 | 2006-12-14 | Osram Opto Semiconductors Gmbh | Halbleiter-Laser mit Vertikalresonator und modenselektiven Gebieten |
| JP2002270967A (ja) * | 2001-03-13 | 2002-09-20 | Nichia Chem Ind Ltd | 半導体レーザ素子 |
| JP2002299765A (ja) * | 2001-04-03 | 2002-10-11 | Sony Corp | 半導体レーザ素子及びその作製方法 |
| JP3849758B2 (ja) * | 2001-04-12 | 2006-11-22 | ソニー株式会社 | 半導体レーザ素子 |
| JP2003007621A (ja) * | 2001-06-21 | 2003-01-10 | Nikko Materials Co Ltd | GaN系化合物半導体結晶の製造方法 |
| US7167489B2 (en) * | 2001-09-21 | 2007-01-23 | Sharp Kabushiki Kaisha | GaN-based semiconductor laser device |
| JP2003163419A (ja) * | 2001-11-29 | 2003-06-06 | Sanyo Electric Co Ltd | 窒化物系半導体発光素子 |
| EP1320158A1 (en) * | 2001-12-13 | 2003-06-18 | Agilent Technologies, Inc. (a Delaware corporation) | Means of controlling dopant diffusion in a semiconductor heterostructure |
| WO2003075425A1 (fr) * | 2002-03-01 | 2003-09-12 | Sanyo Electric Co., Ltd. | Element laser a semi-conducteur a base de nitrure |
| US6862300B1 (en) * | 2002-09-17 | 2005-03-01 | Bookham Technology Plc | High power semiconductor laser diode and method for making such a diode |
| JP2004253776A (ja) * | 2003-01-31 | 2004-09-09 | Sharp Corp | 半導体レーザ素子及び光学式情報記録装置 |
| JP4830315B2 (ja) * | 2004-03-05 | 2011-12-07 | 日亜化学工業株式会社 | 半導体レーザ素子 |
| JP4551121B2 (ja) * | 2004-05-24 | 2010-09-22 | シャープ株式会社 | 半導体レーザ装置 |
| KR100657938B1 (ko) * | 2004-12-17 | 2006-12-14 | 삼성전기주식회사 | 반도체 레이저 다이오드 |
| JP4193867B2 (ja) * | 2006-05-02 | 2008-12-10 | ソニー株式会社 | GaN系半導体レーザの製造方法 |
-
2006
- 2006-09-29 DE DE102006046297A patent/DE102006046297A1/de not_active Withdrawn
-
2007
- 2007-09-05 EP EP07017398A patent/EP1906498A1/de not_active Withdrawn
- 2007-09-27 JP JP2007251152A patent/JP2008091910A/ja active Pending
- 2007-10-01 US US11/906,410 patent/US20080089374A1/en not_active Abandoned
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