JP2008091910A5 - - Google Patents

Download PDF

Info

Publication number
JP2008091910A5
JP2008091910A5 JP2007251152A JP2007251152A JP2008091910A5 JP 2008091910 A5 JP2008091910 A5 JP 2008091910A5 JP 2007251152 A JP2007251152 A JP 2007251152A JP 2007251152 A JP2007251152 A JP 2007251152A JP 2008091910 A5 JP2008091910 A5 JP 2008091910A5
Authority
JP
Japan
Prior art keywords
semiconductor laser
absorption region
semiconductor
region
absorption
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2007251152A
Other languages
English (en)
Japanese (ja)
Other versions
JP2008091910A (ja
Filing date
Publication date
Priority claimed from DE102006046297A external-priority patent/DE102006046297A1/de
Application filed filed Critical
Publication of JP2008091910A publication Critical patent/JP2008091910A/ja
Publication of JP2008091910A5 publication Critical patent/JP2008091910A5/ja
Pending legal-status Critical Current

Links

JP2007251152A 2006-09-29 2007-09-27 半導体レーザ Pending JP2008091910A (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102006046297A DE102006046297A1 (de) 2006-09-29 2006-09-29 Halbleiterlaser

Publications (2)

Publication Number Publication Date
JP2008091910A JP2008091910A (ja) 2008-04-17
JP2008091910A5 true JP2008091910A5 (https=) 2011-06-16

Family

ID=38667082

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007251152A Pending JP2008091910A (ja) 2006-09-29 2007-09-27 半導体レーザ

Country Status (4)

Country Link
US (1) US20080089374A1 (https=)
EP (1) EP1906498A1 (https=)
JP (1) JP2008091910A (https=)
DE (1) DE102006046297A1 (https=)

Families Citing this family (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102008025922B4 (de) 2008-05-30 2020-02-06 Osram Opto Semiconductors Gmbh Kantenemittierender Halbleiterlaser mit Phasenstruktur
DE102008058436B4 (de) 2008-11-21 2019-03-07 Osram Opto Semiconductors Gmbh Kantenemittierender Halbleiterlaserchip
DE102009015314B4 (de) * 2009-03-27 2023-04-27 OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung Halbleiterlaservorrichtung
JP2011243939A (ja) * 2010-01-20 2011-12-01 Panasonic Corp 窒化物半導体レーザ装置
JP5697907B2 (ja) * 2010-06-25 2015-04-08 シャープ株式会社 窒化物半導体レーザ素子およびその製造方法
DE102011123129B4 (de) * 2011-05-02 2025-04-30 OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung Laserlichtquelle mit Modenfilterstruktur
DE102011100175B4 (de) 2011-05-02 2021-12-23 OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung Laserlichtquelle mit einer Stegwellenleiterstruktur und einer Modenfilterstruktur
DE102011103952B4 (de) 2011-06-10 2022-05-05 OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung Kantenemittierender Halbleiterlaser
DE102012103549B4 (de) * 2012-04-23 2020-06-18 Osram Opto Semiconductors Gmbh Halbleiterlaserlichtquelle mit einem kantenemittierenden Halbleiterkörper und Licht streuenden Teilbereich
DE102012106687B4 (de) * 2012-07-24 2019-01-24 Osram Opto Semiconductors Gmbh Steglaser
US9429693B2 (en) 2012-09-25 2016-08-30 Nec Corporation High-order mode filter
DE102012109175B4 (de) 2012-09-27 2019-02-28 Osram Opto Semiconductors Gmbh Halbleiterlaserdiode
DE102012110613A1 (de) * 2012-11-06 2014-05-08 Osram Opto Semiconductors Gmbh Optoelektronisches Halbleiterbauelement
DE102012111512B4 (de) * 2012-11-28 2021-11-04 OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung Halbleiterstreifenlaser
DE102013223499C5 (de) * 2013-11-18 2020-03-12 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Breitstreifenlaser und Verfahren zum Herstellen eines Breitstreifenlasers
US10199800B2 (en) * 2015-07-28 2019-02-05 Sony Corporation Light emitting element
DE102015119226A1 (de) 2015-11-09 2017-05-11 Osram Opto Semiconductors Gmbh Halbleiterlaserdiode
DE102016103358A1 (de) * 2016-02-25 2017-08-31 Osram Opto Semiconductors Gmbh Laserbarren mit gräben
DE102016106495A1 (de) 2016-04-08 2017-10-12 Osram Opto Semiconductors Gmbh Halbleiterlaser
US10777968B2 (en) 2016-10-28 2020-09-15 Nlight, Inc. Method, system and apparatus for higher order mode suppression
DE102018125496A1 (de) 2018-10-15 2020-04-16 Osram Opto Semiconductors Gmbh Halbleiterlaser und Herstellungsverfahren für Halbleiterlaser
JP6940572B2 (ja) * 2019-01-29 2021-09-29 シャープ株式会社 窒化物半導体レーザ素子および半導体レーザ装置
DE102019103909A1 (de) 2019-02-15 2020-08-20 OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung Kantenemittierende Laserdiode und Verfahren für deren Herrstellung
DE102019106536B4 (de) * 2019-03-14 2024-11-28 OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung Halbleiterlaserdiode und Verfahren zur Herstellung einer Halbleiterlaserdiode
US11828934B1 (en) 2019-07-10 2023-11-28 X Development Llc High-dispersion optical components and methods for making the same
WO2021030639A1 (en) * 2019-08-13 2021-02-18 Nlight, Inc. Method, system and apparatus for higher order mode suppression
US11011884B1 (en) * 2019-08-29 2021-05-18 X Development Llc Systems and methods for designing optical devices having mode selective facets
US11455443B1 (en) 2019-08-29 2022-09-27 X Development Llc Methods and systems for designing image processing devices
US11604957B1 (en) 2019-09-20 2023-03-14 X Development Llc Methods for designing hybrid neural networks having physical and digital components
US11092746B1 (en) 2019-12-18 2021-08-17 X Development Llc Post-fabrication photonic performance tuning
US12061851B1 (en) 2019-12-18 2024-08-13 X Development Llc Systems and methods for designing photonic computational architectures
US11835715B1 (en) 2019-12-19 2023-12-05 X Development Llc Multimodal photonic components
US11842129B1 (en) 2020-05-28 2023-12-12 X Development Llc Finite floating-point numerical simulation and optimization

Family Cites Families (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5219785A (en) * 1989-01-27 1993-06-15 Spectra Diode Laboratories, Inc. Method of forming current barriers in semiconductor lasers
US5974069A (en) * 1994-09-16 1999-10-26 Rohm Co., Ltd Semiconductor laser and manufacturing method thereof
JPH0936474A (ja) * 1995-07-14 1997-02-07 Mitsubishi Electric Corp 半導体レーザ及びその製造方法
US5963573A (en) * 1997-08-25 1999-10-05 3M Innovative Properties Company Light absorbing layer for II-VI semiconductor light emitting devices
JPH1187850A (ja) * 1997-09-03 1999-03-30 Sharp Corp 窒化物系化合物半導体レーザ素子及びレーザ装置
JPH11112075A (ja) * 1997-09-30 1999-04-23 Fujitsu Ltd 半導体レーザ装置及びその製造方法
US6141365A (en) * 1997-12-31 2000-10-31 Lasertron Semiconductor laser with kink suppression layer
JP3653169B2 (ja) * 1998-01-26 2005-05-25 シャープ株式会社 窒化ガリウム系半導体レーザ素子
JPH11251685A (ja) * 1998-03-05 1999-09-17 Toshiba Corp 半導体レーザ
US6287946B1 (en) * 1999-05-05 2001-09-11 Hrl Laboratories, Llc Fabrication of low resistance, non-alloyed, ohmic contacts to InP using non-stoichiometric InP layers
JP4646093B2 (ja) * 1999-09-09 2011-03-09 シャープ株式会社 窒化物半導体レーザ素子およびその製造方法
JP2001148544A (ja) * 1999-09-10 2001-05-29 Sharp Corp 半導体発光素子
JP2002131713A (ja) * 2000-10-19 2002-05-09 Mitsubishi Electric Corp 光半導体デバイス
DE10105722B4 (de) * 2001-02-08 2006-12-14 Osram Opto Semiconductors Gmbh Halbleiter-Laser mit Vertikalresonator und modenselektiven Gebieten
JP2002270967A (ja) * 2001-03-13 2002-09-20 Nichia Chem Ind Ltd 半導体レーザ素子
JP2002299765A (ja) * 2001-04-03 2002-10-11 Sony Corp 半導体レーザ素子及びその作製方法
JP3849758B2 (ja) * 2001-04-12 2006-11-22 ソニー株式会社 半導体レーザ素子
JP2003007621A (ja) * 2001-06-21 2003-01-10 Nikko Materials Co Ltd GaN系化合物半導体結晶の製造方法
US7167489B2 (en) * 2001-09-21 2007-01-23 Sharp Kabushiki Kaisha GaN-based semiconductor laser device
JP2003163419A (ja) * 2001-11-29 2003-06-06 Sanyo Electric Co Ltd 窒化物系半導体発光素子
EP1320158A1 (en) * 2001-12-13 2003-06-18 Agilent Technologies, Inc. (a Delaware corporation) Means of controlling dopant diffusion in a semiconductor heterostructure
WO2003075425A1 (fr) * 2002-03-01 2003-09-12 Sanyo Electric Co., Ltd. Element laser a semi-conducteur a base de nitrure
US6862300B1 (en) * 2002-09-17 2005-03-01 Bookham Technology Plc High power semiconductor laser diode and method for making such a diode
JP2004253776A (ja) * 2003-01-31 2004-09-09 Sharp Corp 半導体レーザ素子及び光学式情報記録装置
JP4830315B2 (ja) * 2004-03-05 2011-12-07 日亜化学工業株式会社 半導体レーザ素子
JP4551121B2 (ja) * 2004-05-24 2010-09-22 シャープ株式会社 半導体レーザ装置
KR100657938B1 (ko) * 2004-12-17 2006-12-14 삼성전기주식회사 반도체 레이저 다이오드
JP4193867B2 (ja) * 2006-05-02 2008-12-10 ソニー株式会社 GaN系半導体レーザの製造方法

Similar Documents

Publication Publication Date Title
JP2008091910A5 (https=)
Li et al. Multiple fields manipulation on nitride material structures in ultraviolet light-emitting diodes
JP7352226B2 (ja) 結晶性半導体膜および半導体装置
Sheng et al. Amorphous IGZO TFT with high mobility of∼ 70 cm2/(V s) via vertical dimension control using PEALD
Zywietz et al. The adsorption of oxygen at GaN surfaces
JP5214861B2 (ja) 窒化物系白色光発光素子及びその製造方法
JP6916426B2 (ja) 積層構造体およびその製造方法、半導体装置ならびに結晶膜
JP2006165529A5 (https=)
JP7357883B2 (ja) 酸化物積層体及びその製造方法
WO2015056797A1 (ja) 窒化物半導体装置およびその製造方法、ならびにダイオードおよび電界効果トランジスタ
TW200849605A (en) Amorphous oxide semiconductor, semiconductor device, and thin film transistor
JP2007049159A (ja) 窒化物系発光素子及びその製造方法
TW201244084A (en) Oxide semiconductor layer and semiconductor device
JP6909191B2 (ja) 積層体、半導体装置及び積層体の製造方法
JP2010199307A (ja) トップゲート型の電界効果型トランジスタ及びその製造方法並びにそれを備えた表示装置
JP5232968B2 (ja) 発光素子及びその製造方法、並びにランプ
KR20120079310A (ko) 나노로드형 반도체 발광소자 및 그 제조방법
JPWO2019098295A1 (ja) p型酸化物半導体膜及びその形成方法
Shkurmanov et al. Low-temperature PLD-growth of ultrathin ZnO nanowires by using Zn x Al1− x O and Zn x Ga1− x O seed layers
JP6126354B2 (ja) 半導体装置及びその製造方法
WO2020204006A1 (ja) 結晶、結晶性酸化物半導体、結晶性酸化物半導体を含む半導体膜、結晶および/または半導体膜を含む半導体装置および半導体装置を含むシステム
CN112424946A (zh) 半导体装置及包含半导体装置的半导体系统
CN112385048A (zh) 半导体装置及包含半导体装置的半导体系统
TWI488303B (zh) 增強型氮化鎵電晶體元件
JP2007081231A (ja) 酸化物半導体素子