JP2008085392A - High-frequency power amplifier circuit - Google Patents

High-frequency power amplifier circuit Download PDF

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JP2008085392A
JP2008085392A JP2006259679A JP2006259679A JP2008085392A JP 2008085392 A JP2008085392 A JP 2008085392A JP 2006259679 A JP2006259679 A JP 2006259679A JP 2006259679 A JP2006259679 A JP 2006259679A JP 2008085392 A JP2008085392 A JP 2008085392A
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frequency power
circuit
gate
power amplifier
fet
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JP5183051B2 (en
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Susumu Kawaguchi
進 川口
Masaki Tanji
正貴 丹治
Kazuhiro Hamaya
和宏 濱谷
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Toshiba Teli Corp
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a high-frequency power amplifier circuit which has an economically advantageous constitution. <P>SOLUTION: When a high-frequency power MOS-FET 11 enters a fault mode of a gate-drain short circuit and a high voltage that exceeds a set voltage is applied to a voltage-limiting varistor 13, the voltage-limiting varistor 13 discharges an applied excessive voltage. With the discharge current thereof, an overcurrent protecting fuse 14 disconnects the current path between a gate electrode (G) and a gate pulse input terminal (Tgb). <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

本発明は、高周波用パワーMOS−FETを用いた高周波電力増幅回路に関する。   The present invention relates to a high-frequency power amplifier circuit using a high-frequency power MOS-FET.

高周波用のパワーMOS・FETを用いた高周波電力増幅回路においては、出力パルス幅を拡げてゆくと、パワーMOS・FETの特性(過渡熱抵抗)により、ドレインを流れるアイドル電流(ΔID)が増加し、自己発熱が増大して、ドレイン電流(ID)が上昇の一途を辿り、やがてSOA領域(Safe Operating Area)を超えて、パワーMOS・FETの破壊を招く。このため従来では、数キロワット乃至数十キロワット程度の高周波電力増幅出力を得る大電力用の高周波電力増幅回路を構成する場合、要求される出力電力値に応じて選定した、例えば数十個程度の多数個の高周波用パワーMOS・FETを並列回路接続し、これら各パワーMOS・FETを、それぞれSOA領域内で動作させている。   In a high frequency power amplifier circuit using a high frequency power MOS • FET, when the output pulse width is increased, the idle current (ΔID) flowing through the drain increases due to the characteristics (transient thermal resistance) of the power MOS • FET. As the self-heating increases, the drain current (ID) continues to rise and eventually exceeds the SOA region (Safe Operating Area), leading to destruction of the power MOS FET. For this reason, conventionally, when configuring a high-frequency high-frequency power amplifier circuit for obtaining a high-frequency power amplification output of several kilowatts to several tens of kilowatts, it is selected according to the required output power value, for example, about several tens of kilowatts. A large number of high-frequency power MOS • FETs are connected in parallel, and each of these power MOS • FETs is operated in the SOA region.

この種回路に使用されていた高周波用パワーMOS−FETは、絶縁部がセラミックにより構成され、ダイ部分に樹脂等の絶縁物が介在しないことから、故障モードがゲート−ドレイン間オープンであった。当該絶縁部にセラミックを用いた高周波用パワーMOS−FETは、絶縁部にモールド樹脂を用いた低周波用のパワーMOS−FETに比べて製品コストが非常に高価であり、高周波用パワーMOS−FETを数十個使用する大電力形の高周波電力増幅回路を必要とする装置においては経済的な負担が大きいという問題があった。   The high-frequency power MOS-FET used in this type of circuit has an insulating portion made of ceramic, and an insulating material such as resin is not interposed in the die portion, so the failure mode is open between the gate and the drain. The high-frequency power MOS-FET using ceramic for the insulating part has a very high product cost compared to the low-frequency power MOS-FET using a mold resin for the insulating part. In an apparatus that requires a high-power type high-frequency power amplifier circuit using several tens of devices, there is a problem that the economic burden is large.

近年、絶縁部にセラミックを用いた高周波用パワーMOS−FETに代わり、絶縁部にモールド樹脂を用いた、モールド樹脂成型による高周波用のパワーMOS−FETが安価に提供されるようになってきた。   In recent years, instead of high-frequency power MOS-FETs using ceramics for insulating parts, high-frequency power MOS-FETs using molded resin for insulating parts have been provided at low cost.

しかしながら、この種、モールド樹脂成型による高周波用パワーMOS−FETは、故障モードにゲート−ドレイン間ショートを含み、ゲート−ドレイン間ショートとなった場合は、ドレイン電極に印加された百数十乃至数百ボルトの動作用電源電圧(=ドレイン電圧;以下VDDと称す)がゲート電極に回り込み、この回り込みによるリターン電流が数ボルト程度の微少電流を扱うゲートバイアス回路に流れて、ゲートバイアス回路を含む周辺回路を破壊してしまう。   However, this type of high-frequency power MOS-FET using a mold resin molding includes a gate-drain short circuit in the failure mode, and when the gate-drain short circuit occurs, the hundreds to several tens applied to the drain electrode are applied. A power supply voltage for operation of 100 volts (= drain voltage; hereinafter referred to as VDD) spills into the gate electrode, and the return current due to this sneak flows into the gate bias circuit that handles a minute current of about several volts, and includes the gate bias circuit. It will destroy the circuit.

この種の過電流保護に関しては、所定電流路の電流値が閾値を越えたとき、その電流路をヒューズにより遮断する過電流保護回路が知られている。
特開2001−145339号公報 特開平6−245502号公報
With regard to this type of overcurrent protection, an overcurrent protection circuit is known in which when a current value of a predetermined current path exceeds a threshold value, the current path is interrupted by a fuse.
JP 2001-145339 A JP-A-6-245502

上述したように、高周波用のパワーMOS・FETを用いた高周波電力増幅回路においては、パワーMOS・FETの種類によって、ドレイン電極に印加された高電圧のVDDがゲート電極に回り込み、この回り込みによるリターン電流が低電圧・低電流を扱うゲートバイアス回路に流れて、ゲートバイアス回路を含む周辺回路を破壊してしまうという問題があった。   As described above, in a high frequency power amplifier circuit using a high frequency power MOS • FET, depending on the type of the power MOS • FET, the high voltage VDD applied to the drain electrode wraps around the gate electrode, and the return due to this wraparound There is a problem that current flows to a gate bias circuit that handles low voltage and low current, and peripheral circuits including the gate bias circuit are destroyed.

本発明は上記問題点を解決したもので、経済的に有利な構成の高周波電力増幅回路を提供することを目的とする。   The present invention solves the above-described problems, and an object thereof is to provide a high-frequency power amplifier circuit having an economically advantageous configuration.

本発明は、パワーMOS・FETを用いた高周波電力増幅回路において、前記パワーMOS・FETのゲートバイアス回路に、ドレインからゲートバイアス回路へ流れるリターン電流を抑止するゲートバイアス保護回路を設けたことを特徴とする。   The present invention is a high frequency power amplifier circuit using a power MOS • FET, wherein a gate bias protection circuit for suppressing a return current flowing from the drain to the gate bias circuit is provided in the gate bias circuit of the power MOS • FET. And

さらに本発明は、前記パワーMOS・FETのドレイン電極に百数十乃至数百ボルトの動作用電源電圧(VDD)を供給するVDD供給回路に、過電流保護回路を設けたことを特徴とする。   Furthermore, the present invention is characterized in that an overcurrent protection circuit is provided in a VDD supply circuit that supplies an operating power supply voltage (VDD) of hundreds to hundreds of volts to the drain electrode of the power MOS FET.

上記した回路を組み込むことで、使用するパワーMOS・FETの種類によって、ゲート−ドレイン間ショートとなった場合においても、ゲートバイアス回路を含む周辺回路を保護することができる。これにより、パワーMOS・FETの各種故障モードに対して他回路へ壊を最小限にとどめることができるとともに、安価なパワーMOS・FETを用いた経済的に有利な構成の大電力形高周波電力増幅回路を実現することができる。   By incorporating the above-described circuit, peripheral circuits including a gate bias circuit can be protected even when a short circuit occurs between the gate and drain depending on the type of power MOS FET used. This makes it possible to minimize the damage to other circuits against various failure modes of the power MOS • FET, and at the same time economically advantageous high-frequency high-frequency power amplification using inexpensive power MOS • FETs A circuit can be realized.

さらに本発明は、上記保護回路に加えて、上記パワーMOS・FETのゲート電極に、電位が漸減する波形形状のゲートパルスを供給するゲートバイアス回路を設けたことを特徴とする。   Furthermore, the present invention is characterized in that, in addition to the protection circuit, a gate bias circuit for supplying a gate pulse having a waveform with a potential gradually decreasing to the gate electrode of the power MOS • FET is provided.

これにより、パルス動作により間歇的に高周波電力増幅を行う、複数のパワーMOS・FETを用いた大電力形の高周波電力増幅回路において、パルス幅を拡げた効率のよい電力増幅を可能にし、実装するパワーMOS・FETの数を削減して、より経済性の高い大電力形高周波電力増幅回路を実現できるとともに、パワーMOS・FETの各種故障モードに対して他回路へ壊を最小限にとどめることができる。   This enables and implements efficient power amplification with a wide pulse width in a high-power high-frequency power amplifier circuit using a plurality of power MOS-FETs that intermittently perform high-frequency power amplification by pulse operation. By reducing the number of power MOS / FETs, it is possible to realize a high-power, high-frequency, high-frequency power amplifier circuit that is more economical, while minimizing damage to other circuits against various failure modes of the power MOS / FET. it can.

本発明によれば、経済的に有利な構成の大電力形高周波電力増幅回路を容易に実現できる。   According to the present invention, a high power type high frequency power amplifier circuit having an economically advantageous configuration can be easily realized.

以下図面を参照して本発明の実施形態を説明する。   Embodiments of the present invention will be described below with reference to the drawings.

本発明の実施形態に係る高周波電力増幅回路の構成を図1に示す。   A configuration of a high-frequency power amplifier circuit according to an embodiment of the present invention is shown in FIG.

本発明の実施形態に係る高周波電力増幅回路は、複数の高周波用パワーMOS・FET11,11,…と、この各高周波用パワーMOS・FET11,11,…に対応して設けられた、過電流保護ヒューズ12,14と、電圧制限用バリスタ13と、電圧・電流制限抵抗15と、フォトカプラー16とを具備して構成される。   The high frequency power amplifier circuit according to the embodiment of the present invention includes a plurality of high frequency power MOSFETs 11, 11,... And overcurrent protection provided corresponding to each of the high frequency power MOSFETs 11, 11,. The fuses 12 and 14, a voltage limiting varistor 13, a voltage / current limiting resistor 15, and a photocoupler 16 are provided.

上記各構成要素のうち、電圧制限用バリスタ13と、過電流保護ヒューズ14と、電圧・電流制限抵抗15は、高周波用パワーMOS・FET11のゲートバイアス保護回路を構成する。過電流保護ヒューズ12は高周波用パワーMOS・FET11のドレイン電流(ID)に対する過電流保護回路(以下ID過電流保護回路と称す)を構成する。フォトカプラー16は高周波用パワーMOS・FET11のドレイン電流(ID)に対する過電流検知回路を構成する。   Among the above components, the voltage limiting varistor 13, the overcurrent protection fuse 14, and the voltage / current limiting resistor 15 constitute a gate bias protection circuit for the high frequency power MOS • FET 11. The overcurrent protection fuse 12 constitutes an overcurrent protection circuit (hereinafter referred to as an ID overcurrent protection circuit) against the drain current (ID) of the high-frequency power MOS • FET 11. The photocoupler 16 constitutes an overcurrent detection circuit for the drain current (ID) of the high-frequency power MOS • FET 11.

高周波用パワーMOS・FET11は、高周波電力増幅部の主構成要素であり、ゲートパルス入力端(Tgb)に入力されたゲートパルス(GP)がゲートバイアス出力バッファ20を介しゲート端子(G)にバイアス信号として供給され、動作用電源電圧となるVDDがドレイン電極(D)に供給されることによって、ゲート端子(G)に入力された高周波信号(例えば図2に示す、間歇的にパルス幅変調した正弦波状の高周波信号RF(in))を、例えばA級電力増幅して、ドレイン電極(D)から出力する。   The high-frequency power MOS • FET 11 is a main component of the high-frequency power amplifier, and the gate pulse (GP) input to the gate pulse input terminal (Tgb) is biased to the gate terminal (G) via the gate bias output buffer 20. A high-frequency signal (for example, as shown in FIG. 2, intermittently pulse-width modulated) is supplied to the gate terminal (G) by supplying VDD as an operation power supply voltage to the drain electrode (D). A sinusoidal high-frequency signal RF (in)) is amplified, for example, by class A power and output from the drain electrode (D).

この際、高周波用パワーMOS・FET11が正常動作状態にあるとき、ドレイン電極(D)に印加されたVDDに伴うドレイン電流(ID)がソース電極(S)に流れる。   At this time, when the high-frequency power MOS FET 11 is in a normal operation state, a drain current (ID) accompanying VDD applied to the drain electrode (D) flows to the source electrode (S).

高周波用パワーMOS・FET11がゲート−ドレイン間ショートの故障モードに陥ると、ドレイン電極(D)に印加されたVDDがゲート電極(G)を介してゲートパルス(GP)を生成しているゲートバイアス回路に回り込み、ゲートバイアス回路と、その周辺回路を破壊する。本発明の実施形態では、ゲート電極(G)とゲートパルス入力端(Tgb)との間に、電圧制限用バリスタ13と、過電流保護ヒューズ14と、電圧・電流制限抵抗15とを具備したゲートバイアス保護回路が介在されている。このゲートバイアス保護回路により上記した回路破壊が回避される。電圧制限用バリスタ13に設定電圧(数ボルト程度)を超える高電圧が印加されたとき、電圧制限用バリスタ13は印加された過剰電圧分を接地(グランド)に放電し、この放電電流により過電流保護ヒューズ14がゲート電極(G)−ゲートパルス入力端(Tgb)間の電流路を遮断する。これにより、ゲートパルス入力端(Tgb)にゲートパルス(GP)を供給するゲートバイアス回路が高周波用パワーMOS・FET11のゲート−ドレイン間ショートの故障モードに対して確実に保護される。さらに、高周波用パワーMOS・FET11がゲート−ドレイン間ショートの故障モードに陥ると、ドレイン電流(D)が過電流となり、過電流保護ヒューズ12がVDDの供給端とドレイン電極(D)との間のVDD供給路を遮断して、ドレイン電極(D)へのVDDの供給を断つ。さらに、これに伴って、過電流検知回路を構成するフォトカプラー16の出力号がLowレベルからHighレベルに変化し、過電流の発生した旨が外部に通知される。   When the high-frequency power MOS FET 11 is in a failure mode in which a gate-drain short circuit occurs, VDD applied to the drain electrode (D) generates a gate pulse (GP) via the gate electrode (G). Go around the circuit and destroy the gate bias circuit and its peripheral circuits. In the embodiment of the present invention, a gate having a voltage limiting varistor 13, an overcurrent protection fuse 14, and a voltage / current limiting resistor 15 between the gate electrode (G) and the gate pulse input terminal (Tgb). A bias protection circuit is interposed. This gate bias protection circuit avoids the above circuit breakdown. When a high voltage exceeding a set voltage (several volts) is applied to the voltage limiting varistor 13, the voltage limiting varistor 13 discharges the applied excess voltage to the ground (ground), and this discharge current causes an overcurrent. The protective fuse 14 interrupts the current path between the gate electrode (G) and the gate pulse input terminal (Tgb). As a result, the gate bias circuit that supplies the gate pulse (GP) to the gate pulse input terminal (Tgb) is reliably protected against the failure mode of the short circuit between the gate and the drain of the high-frequency power MOS • FET 11. Further, when the high-frequency power MOS • FET 11 falls into a failure mode of a short circuit between the gate and the drain, the drain current (D) becomes an overcurrent, and the overcurrent protection fuse 12 is connected between the VDD supply terminal and the drain electrode (D). The VDD supply path is cut off, and the supply of VDD to the drain electrode (D) is cut off. Further, along with this, the output number of the photocoupler 16 constituting the overcurrent detection circuit changes from the Low level to the High level, and the fact that the overcurrent has occurred is notified to the outside.

上記したようなゲートバイアス保護回路とID過電流検知回路とを高周波電力増幅部に組み込むことで、使用するパワーMOS・FETの種類によって、ゲート−ドレイン間ショートとなった場合においても、ゲートバイアス回路を含む周辺回路を保護することができる。これにより、パワーMOS・FETの各種故障モードに対する他回路への波及を最小限にとどめることができるとともに、安価なパワーMOS・FETを用いた経済的に有利な構成の大電力形高周波電力増幅回路を実現できる。   By incorporating the gate bias protection circuit and the ID overcurrent detection circuit as described above in the high frequency power amplifier, the gate bias circuit can be used even when a short circuit occurs between the gate and the drain depending on the type of power MOS FET used. It is possible to protect peripheral circuits including As a result, it is possible to minimize the spread of other power MOS / FET failure modes to other circuits, and a high-power high-frequency power amplifier circuit with an economically advantageous configuration using inexpensive power MOS / FETs. Can be realized.

図2は本発明の実施形態に係る高周波電力増幅部の多の構成例を示したもので、上記図1に示す構成では高周波電力増幅部をA級シングル電力増幅回路で実現しているのに対して、図2に示す構成では高周波電力増幅部をAB級プッシュプル電力増幅回路で実現している。   FIG. 2 shows various configuration examples of the high-frequency power amplifier according to the embodiment of the present invention. In the configuration shown in FIG. 1, the high-frequency power amplifier is realized by a class A single power amplifier circuit. On the other hand, in the configuration shown in FIG. 2, the high frequency power amplifier is realized by a class AB push-pull power amplifier circuit.

図2に示す構成に於いて、高周波電力増幅部10は、高周波信号入力端Tinと、AB級プッシュプル増幅回路を構成する一対の高周波電力増幅用のパワーMOS・FET11a,11bと、高周波信号出力端Toutと、高周波信号入力端Tinに入力された高周波信号RF(in)をパワーMOS・FET11a,11bのゲート電極(G)に供給する回路と、ゲートパルス入力端(Tgb)に入力されたゲートパルス過電流保護ヒューズ14およびチョークコイル17を介してパワーMOS・FET11a,11bのゲート電極(G)に供給する回路と、パワーMOS・FET11a,11bのドレイン電極(D)に高電圧(例えば130〜150V程度)の電力増幅用動作電源(VDD)を供給する回路と、パワーMOS・FET11a,11bで電力増幅された高周波信号RF(out)を高周波信号出力端Toutに出力する回路とを具備して構成される。上記構成に於いて、高周波信号入力端Tinに入力された高周波信号RF(in)は、AB級でプッシュプル動作するパワーMOS・FET11a,11bにより電力増幅され、高周波信号出力端Toutから高周波信号RF(out)として出力される。   In the configuration shown in FIG. 2, the high-frequency power amplifier 10 includes a high-frequency signal input terminal Tin, a pair of high-frequency power amplification power MOS FETs 11a and 11b constituting a class AB push-pull amplifier circuit, and a high-frequency signal output. A terminal Tout, a circuit for supplying a high-frequency signal RF (in) input to the high-frequency signal input terminal Tin to the gate electrodes (G) of the power MOS FETs 11a and 11b, and a gate input to the gate pulse input terminal (Tgb) A circuit for supplying power to the gate electrodes (G) of the power MOS FETs 11a and 11b via the pulse overcurrent protection fuse 14 and the choke coil 17 and a high voltage (for example, 130˜) to the drain electrodes (D) of the power MOS FETs 11a and 11b. A circuit for supplying an operating power supply (VDD) for power amplification of about 150 V) and a power MOS FET 1 a, 11b configured to and a circuit for outputting the power amplified radio frequency signal RF (out) to the high-frequency signal output terminal Tout in. In the above configuration, the high-frequency signal RF (in) input to the high-frequency signal input terminal Tin is amplified by the power MOS FETs 11a and 11b that perform push-pull operation at class AB, and the high-frequency signal RF is output from the high-frequency signal output terminal Tout. (Out) is output.

図3はゲートパルス入力端(Tgb)にゲートパルス(GP)を供給するゲートバイアス回路に設けられた波形成形回路の構成例を示したもので、ここでは、上記図2に示す高周波信号RF(in)に同期した所定幅のゲートパルスGP(in)を入力し、波形成形して、過電流保護ヒューズ14を介し高周波電力増幅部10にゲートバイアスとして供給する。   FIG. 3 shows a configuration example of a waveform shaping circuit provided in a gate bias circuit that supplies a gate pulse (GP) to a gate pulse input terminal (Tgb). Here, the high-frequency signal RF ( In), a gate pulse GP (in) having a predetermined width synchronized with in) is input, waveform-shaped, and supplied to the high-frequency power amplifier 10 via the overcurrent protection fuse 14 as a gate bias.

図3に於いて、ゲートバイアス回路に設けられたゲートパルス波形成形回路30は、ゲートパルス入力端31に入力されたゲートパルスを波形成形して上記図2に示す増幅回路10に供給する。ゲートパルス入力端31には、高周波信号RF(in)に同期した所定幅のゲートパルスGP(in)が供給される。   In FIG. 3, a gate pulse waveform shaping circuit 30 provided in the gate bias circuit shapes the gate pulse input to the gate pulse input terminal 31 and supplies it to the amplifier circuit 10 shown in FIG. The gate pulse input terminal 31 is supplied with a gate pulse GP (in) having a predetermined width synchronized with the high frequency signal RF (in).

ゲートパルス波形成形回路30は、ゲートパルス入力端31に入力されたゲートパルスGP(in)の積分波形を生成するCR時定数回路32と、ゲートパルス入力端31に入力されたゲートパルスGP(in)に同期して、CR時定数回路32で生成した積分波形の出力を有効にするスイッチング回路33と、CR時定数回路32の出力を反転増幅するオペアンプ34と、出力するゲートパルスGP(out)の幅を、高周波信号RF(in)の信号幅を超えない範囲で調整する演算回路素子35とを具備して構成される。ゲートパルス波形成形回路30の出力端(演算回路素子35の出力端)36に出力された波形成形後のゲートパルスGP(out)は、ゲートバイアス調整用の可変抵抗器(VR)を介してパワーMOS・FET11a,11bのゲート電極(G)にゲートバイアス信号として供給される。   The gate pulse waveform shaping circuit 30 includes a CR time constant circuit 32 that generates an integrated waveform of the gate pulse GP (in) input to the gate pulse input terminal 31 and a gate pulse GP (in) input to the gate pulse input terminal 31. The switching circuit 33 that validates the output of the integrated waveform generated by the CR time constant circuit 32, the operational amplifier 34 that inverts and amplifies the output of the CR time constant circuit 32, and the output gate pulse GP (out) And an arithmetic circuit element 35 that adjusts the width of the high frequency signal RF (in) within a range not exceeding the signal width. The gate pulse GP (out) after waveform shaping output to the output terminal (output terminal of the arithmetic circuit element 35) 36 of the gate pulse waveform shaping circuit 30 is powered through a variable resistor (VR) for gate bias adjustment. A gate bias signal is supplied to the gate electrodes (G) of the MOS • FETs 11a and 11b.

上記したゲートパルス波形成形回路30から出力されるゲートパルスGP(out)の波形を図4(a)に示し、この波形成形されたゲートパルスGP(out)に伴うパワーMOS・FET11a,11bこのドレイン電流(ID)波形を図4(b)に示している。   The waveform of the gate pulse GP (out) output from the gate pulse waveform shaping circuit 30 is shown in FIG. 4A, and the power MOS FETs 11a and 11b and the drains associated with the waveform shaped gate pulse GP (out) are shown. The current (ID) waveform is shown in FIG.

図4(a)に示すように、ゲートパルス波形成形回路30から出力されるゲートパルスGP(out)は、高周波信号入力端Tinに入力された高周波信号RF(in)の信号幅(パルス幅変調された高周波信号の幅)を超えない範囲で拡げられた、電位が漸減する(徐々に下降する)パルス波形である。図4(b)に、破線で示す、ΔIDは、パワーMOS・FET11a,11bのドレイン電流(ID)に含まれるアイドル電流であり、上昇する変化部分がアイドル電流(ΔID)の増大分(漸増分)である。図4(a)に示すゲートパルスGP(out)は、同図(b)に示すドレイン電流(ID)から、波線で示すアイドル電流(ΔID)の増大分(漸増分)が打ち消されるように(すなわち、ドレイン電流(ID)に含まれるアイドル電流(ΔID)からアイドル電流(ΔID)の増大分が見掛け上取り除かれるように)電位が漸減されるパルスであり、かつ幅が拡張されたパルスである。   As shown in FIG. 4A, the gate pulse GP (out) output from the gate pulse waveform shaping circuit 30 is a signal width (pulse width modulation) of the high-frequency signal RF (in) input to the high-frequency signal input terminal Tin. This is a pulse waveform in which the potential gradually decreases (gradually decreases) that is expanded within a range not exceeding the width of the generated high-frequency signal. In FIG. 4B, ΔID indicated by a broken line is an idle current included in the drain currents (ID) of the power MOS FETs 11a and 11b, and a rising change portion is an increase (gradual increment) of the idle current (ΔID). ). The gate pulse GP (out) shown in FIG. 4A cancels the increase (gradual increase) of the idle current (ΔID) shown by the broken line from the drain current (ID) shown in FIG. In other words, the pulse is a pulse whose potential is gradually decreased (so that the increase in the idle current (ΔID) is apparently removed from the idle current (ΔID) included in the drain current (ID)) and whose width is expanded. .

上記構成に於いて、増幅回路10の高周波信号入力端Tinに高周波信号RF(in)が供給され、波形成形回路30のゲートパルス入力端31に、ゲートパルスGP(in)が供給されることによって、増幅回路10が波形成形回路30のゲートバイアスを受けて、高周波信号入力端Tinに供給された高周波信号RF(in)を高周波電力増幅する。   In the above configuration, the high frequency signal RF (in) is supplied to the high frequency signal input terminal Tin of the amplifier circuit 10, and the gate pulse GP (in) is supplied to the gate pulse input terminal 31 of the waveform shaping circuit 30. The amplifier circuit 10 receives the gate bias of the waveform shaping circuit 30 and amplifies the high frequency signal RF (in) supplied to the high frequency signal input terminal Tin by high frequency power.

この際、波形成形回路30は、ゲートパルス入力端31に入力されたゲートパルスGP(in)を、図4(a)に示すように、高周波信号RF(in)の信号幅を超えない範囲で幅を拡げ、かつ電位が漸減するゲートパルスGP(out)を出力する。   At this time, the waveform shaping circuit 30 applies the gate pulse GP (in) input to the gate pulse input end 31 within a range not exceeding the signal width of the high-frequency signal RF (in) as shown in FIG. A gate pulse GP (out) whose width is increased and whose potential gradually decreases is output.

波形成形回路30に於いて、ゲートパルス入力端31に入力されたゲートパルスGP(in)は、CR時定数回路32により積分され、その積分波形が、スイッチング回路33のスイッチオフ期間に亘り、オペアンプ34の負側(−)入力端に入力されて反転増幅され、さらに演算回路素子35によりパルス幅が拡幅調整されて、出力端36より波形成形後のゲートパルスGP(out)として出力される。   In the waveform shaping circuit 30, the gate pulse GP (in) input to the gate pulse input terminal 31 is integrated by the CR time constant circuit 32, and the integrated waveform is applied to the operational amplifier over the switch-off period of the switching circuit 33. 34 is input to the negative (−) input terminal of 34 and inverted and amplified, and further, the pulse width is adjusted by the arithmetic circuit element 35 and output from the output terminal 36 as a gate pulse GP (out) after waveform shaping.

上記波形成形回路30で図2(a)に示すように波形成形されたゲートパルスGP(in)は、ゲートバイアス調整用の可変抵抗器(VR)、ゲートパルス入力端(Tgb)、過電流保護ヒューズ14等を介して、上記図2に示す高周波電力増幅部10に設けられたパワーMOS・FET11a,11bのゲート電極(G)に供給される。   The gate pulse GP (in) waveform-shaped by the waveform shaping circuit 30 as shown in FIG. 2A includes a variable resistor (VR) for gate bias adjustment, a gate pulse input terminal (Tgb), and overcurrent protection. The power is supplied to the gate electrodes (G) of the power MOSFETs 11a and 11b provided in the high-frequency power amplifier 10 shown in FIG.

増幅回路10に於いて、高周波信号入力端Tinに入力された高周波信号RF(in)は、パワーMOS・FET11a,11bにより電力増幅され、高周波信号出力端15から高周波信号RF(out)として出力される。この際、パワーMOS・FET11a,11bは、波形成形回路30から、ゲートバイアス調整用の可変抵抗器(VR)を介して入力された、図4(a)に示す、電位が漸減するパルス波形のゲートパルスGP(out)をゲート電極(G)に受け、このパルス信号をゲートバイアスとして、高周波信号入力端Tinに入力された高周波信号RF(in)をAB級プッシュプル増幅する。   In the amplifier circuit 10, the high frequency signal RF (in) input to the high frequency signal input terminal Tin is amplified by the power MOS • FETs 11 a and 11 b and output from the high frequency signal output terminal 15 as the high frequency signal RF (out). The At this time, the power MOSFETs 11a and 11b have a pulse waveform with a gradually decreasing potential shown in FIG. 4A, which is input from the waveform shaping circuit 30 via the variable resistor (VR) for gate bias adjustment. The gate pulse GP (out) is received by the gate electrode (G), and the pulse signal is used as a gate bias to amplify the high frequency signal RF (in) input to the high frequency signal input terminal Tin by class AB push-pull amplification.

このように、パワーMOS・FET11a,11bのゲートバイアスに、アイドル電流(ΔID)の漸増分を見掛け上打ち消す補償回路を設けて、パワーMOS・FET11a,11bのゲートに、パワーMOS・FET11a,11bの過渡熱抵抗によるドレイン電流(ID)の増大分を抑制するような逆特性のゲートパルスを入力したことにより、上記補償回路なしの場合に比べてパルス幅を拡げることができ、効率の良い電力増幅が行える。とくに上述したような大電力用の高周波電力増幅回路を構成する場合に、パワーMOS・FETの実装個数を減らして効率の良い経済的に有利な構成の高周波電力増幅回路を提供することができる。さらに高周波電力増幅部10に上記したゲートバイアス保護回路およびID過電流保護回路を設けて、波形成形回路30を含むゲートバイアス回路を、ゲート−ドレイン間ショートの故障モードから保護することで、上記故障の波及による壊滅的な回路機能破壊を回避して、上記故障モードによる被害を最小限にとどめることができる。   Thus, a compensation circuit that apparently cancels the gradual increase of the idle current (ΔID) is provided in the gate bias of the power MOS • FETs 11a and 11b, and the gates of the power MOS • FETs 11a and 11b By inputting a gate pulse with reverse characteristics that suppresses the increase in drain current (ID) due to transient thermal resistance, the pulse width can be expanded compared to the case without the compensation circuit, and efficient power amplification Can be done. In particular, when configuring a high-frequency high-frequency power amplifier circuit as described above, it is possible to provide an efficient and economically advantageous high-frequency power amplifier circuit by reducing the number of power MOS-FETs mounted. Furthermore, the above-described gate bias protection circuit and ID overcurrent protection circuit are provided in the high-frequency power amplifier 10 to protect the gate bias circuit including the waveform shaping circuit 30 from the failure mode of the short circuit between the gate and the drain. It is possible to avoid the catastrophic circuit function destruction due to the spread of the above and minimize the damage caused by the failure mode.

本発明の実施形態に係る高周波電力増幅回路の構成を示す図。The figure which shows the structure of the high frequency power amplifier circuit which concerns on embodiment of this invention. 上記実施形態における高周波電力増幅部の他の構成例を示す図。The figure which shows the other structural example of the high frequency power amplification part in the said embodiment. 上記実施形態における波形成形回路の構成を示す図。The figure which shows the structure of the waveform shaping circuit in the said embodiment. 上記実施形態におけるゲートパルスおよびドレイン電流の信号波形を示す図。The figure which shows the signal waveform of the gate pulse and drain current in the said embodiment.

符号の説明Explanation of symbols

10…高周波電力増幅部、11,11a,11b…高周波用パワーMOS・FET、12…ID過電流保護回路の過電流保護ヒューズ、13…電圧制限用バリスタ、14…ゲートバイアス保護回路の過電流保護ヒューズ、15…電圧・電流制限抵抗、16…フォトカプラー、17…チョークコイル、20…ゲートバイアス出力バッファ、30…波形成形回路、31…ゲートパルス入力端、32…CR時定数回路、33…スイッチング回路、34…オペアンプ、35…演算回路素子。   DESCRIPTION OF SYMBOLS 10 ... High frequency power amplifier part 11, 11a, 11b ... High frequency power MOS * FET, 12 ... Overcurrent protection fuse of ID overcurrent protection circuit, 13 ... Voltage limiter varistor, 14 ... Overcurrent protection of gate bias protection circuit Fuse, 15 ... Voltage / current limiting resistor, 16 ... Photocoupler, 17 ... Choke coil, 20 ... Gate bias output buffer, 30 ... Waveform shaping circuit, 31 ... Gate pulse input terminal, 32 ... CR time constant circuit, 33 ... Switching Circuit, 34 ... operational amplifier, 35 ... arithmetic circuit element.

Claims (8)

パワーMOS・FETを用いた高周波電力増幅回路において、
前記パワーMOS・FETのゲートバイアス回路に、ドレインからゲートバイアス回路へ流れるリターン電流を抑止するゲートバイアス保護回路を設けたことを特徴とする高周波電力増幅回路。
In a high frequency power amplifier circuit using power MOS / FET,
A high-frequency power amplifier circuit comprising a gate bias protection circuit for suppressing a return current flowing from the drain to the gate bias circuit in the gate bias circuit of the power MOS • FET.
前記パワーMOS・FETのドレイン電圧供給回路に、過電流保護回路を設けたことを特徴とする請求項1記載の高周波電力増幅回路。   2. The high frequency power amplifier circuit according to claim 1, wherein an overcurrent protection circuit is provided in a drain voltage supply circuit of the power MOS • FET. 前記ゲートバイアス保護回路は、過電流保護ヒューズと、電圧制限用バリスタとを具備して構成される請求項1記載の高周波電力増幅回路。   2. The high frequency power amplifier circuit according to claim 1, wherein the gate bias protection circuit includes an overcurrent protection fuse and a voltage limiting varistor. 前記パワーMOS・FETのドレイン電圧供給回路に、ドレイン電流の過電流状態を検知する過電流検知回路をさらに具備したことを特徴とする請求項2記載の高周波電力増幅回路。   3. The high frequency power amplifier circuit according to claim 2, further comprising an overcurrent detection circuit for detecting an overcurrent state of a drain current in the drain voltage supply circuit of the power MOS FET. 前記パワーMOS・FETのゲート電極には、前記パワーMOS・FETを間歇的に高周波電力増幅させるためのゲートパルスが供給される請求項1記載の高周波電力増幅回路。   2. The high frequency power amplifier circuit according to claim 1, wherein a gate pulse for intermittently amplifying the high frequency power of the power MOS • FET is supplied to the gate electrode of the power MOS • FET. 前記ゲートパルスは、前記パワーMOS・FETのドレイン電流からアイドル電流の増分を打ち消すように電位が漸減する波形形状のパルスである請求項5記載の高周波電力増幅回路。   6. The high frequency power amplifier circuit according to claim 5, wherein the gate pulse is a pulse having a waveform shape in which the potential gradually decreases so as to cancel the increment of the idle current from the drain current of the power MOS FET. 前記パワーMOS・FETを用いた電力増幅部を複数組具備し、前記各電力増幅部のパワーMOS・FETが前記ゲートパルスを共通に受けてゲートバイアス制御される請求項6記載の高周波電力増幅回路。   7. A high frequency power amplifier circuit according to claim 6, comprising a plurality of sets of power amplifying units using the power MOS-FETs, wherein the power MOS-FETs of the respective power amplifying units receive the gate pulse in common and control the gate bias. . 前記電力増幅部は、AB級プッシュプル動作により電力増幅を行う一対のパワーMOS・FETにより構成されることを特徴とする請求項7記載の高周波電力増幅回路。   The high-frequency power amplifier circuit according to claim 7, wherein the power amplifier section includes a pair of power MOS FETs that perform power amplification by a class AB push-pull operation.
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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04294619A (en) * 1991-03-23 1992-10-19 Nec Corp Bias power suppply circuit for transistor power amplifier
JPH0529843A (en) * 1991-07-23 1993-02-05 Kokusai Electric Co Ltd Overinput protecting circuit in high frequency amplifier
US5477188A (en) * 1994-07-14 1995-12-19 Eni Linear RF power amplifier
JPH0970136A (en) * 1995-08-29 1997-03-11 Matsushita Electric Works Ltd Overcurrent protective circuit
JPH11308055A (en) * 1998-04-17 1999-11-05 Asahi Kasei Micro Syst Co Ltd Push-pull amplifier circuit
JP2001023503A (en) * 1999-07-05 2001-01-26 Nittan Co Ltd Monitor system
JP2005006374A (en) * 2003-06-10 2005-01-06 Nec Saitama Ltd Power supply control circuit and portable telephone
JP2005151442A (en) * 2003-11-19 2005-06-09 Toshiba Corp Pulse power amplifier

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04294619A (en) * 1991-03-23 1992-10-19 Nec Corp Bias power suppply circuit for transistor power amplifier
JPH0529843A (en) * 1991-07-23 1993-02-05 Kokusai Electric Co Ltd Overinput protecting circuit in high frequency amplifier
US5477188A (en) * 1994-07-14 1995-12-19 Eni Linear RF power amplifier
JPH0970136A (en) * 1995-08-29 1997-03-11 Matsushita Electric Works Ltd Overcurrent protective circuit
JPH11308055A (en) * 1998-04-17 1999-11-05 Asahi Kasei Micro Syst Co Ltd Push-pull amplifier circuit
JP2001023503A (en) * 1999-07-05 2001-01-26 Nittan Co Ltd Monitor system
JP2005006374A (en) * 2003-06-10 2005-01-06 Nec Saitama Ltd Power supply control circuit and portable telephone
JP2005151442A (en) * 2003-11-19 2005-06-09 Toshiba Corp Pulse power amplifier

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