JP2008034819A - Semiconductor device, and its manufacturing method - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a semiconductor device capable of communicating by wireless communications, facilitating the attachment of an individual identifier, and having high reliability. <P>SOLUTION: The semiconductor device has: a channel forming region; island-like semiconductor films 131 to 134 having a source region or a drain region; a gate insulating film; thin-film transistors 118 to 121 having gate electrodes 103 to 106; an interlayer insulating film; a first contact hole that is formed in the interlayer insulating film and including a plurality of contact holes 142 reaching either the source region or the drain region; and a second contact hole 141 reaching the other of the source region or the drain region. The diameter of the second contact hole 141 is larger than the respective diameters of a plurality of the contact holes 142 included in the first contact hole. The total bottom area of the first contact hole 142 is equal to the bottom area of the second contact hole 141. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

  The present invention relates to a semiconductor device capable of communicating by non-contact means such as wireless communication and a method for manufacturing the same. In particular, the present invention relates to a semiconductor device formed on an insulating substrate such as glass or plastic and a method for manufacturing the same.

  With the development of computer technology and the improvement of image recognition technology, information recognition methods using media such as barcodes have become widespread and are used for product data recognition and the like. In the future, it is expected that a larger amount of information recognition will be required. On the other hand, in the case of information recognition by bar code, there are drawbacks that the bar code reader requires contact with the bar code and that the amount of information that can be recorded on the bar code is small. Capacity increase is desired.

  In response to such demands, semiconductor devices (also referred to as ID chips, IC chips, IC tags, ID tags, wireless chips, and RFID) capable of wireless communication using ICs have been developed in recent years. In such a semiconductor device, information stored in a memory circuit in the IC is read using non-contact means, generally wireless means. The practical use of such a semiconductor device makes it possible to simplify product distribution, reduce costs, and ensure high security.

  An outline of an individual authentication system using a semiconductor device capable of wireless communication using the IC will be described with reference to FIGS. 2, 3, and 4A to 4B. FIG. 2 is a diagram showing an overview of an individual authentication system for the purpose of recognizing bag individual information without contact.

  A semiconductor device 221 that stores specific individual information is attached to or embedded in a bag 224. A signal is transmitted to the semiconductor device 221 from an antenna unit 222 electrically connected to an interrogator (also referred to as a reader / writer) 223. When the signal is received, the semiconductor device 221 transmits individual information held by the semiconductor device to the antenna unit 222. The antenna unit 222 sends the transmitted individual information to the interrogator 223, and the interrogator 223 determines the individual information. In this way, the interrogator 223 can recognize the individual information of the bag 224. Further, by using this system, it is possible to carry out logistics management, aggregation, removal of counterfeit products, and the like.

  As such a semiconductor device, for example, there is one having a configuration shown in FIG. Such a semiconductor device 200 includes an antenna circuit 201, a rectifier circuit 202, a stable power supply circuit 203, an amplifier 208, a demodulation circuit 213, a logic circuit 209, a memory control circuit 212, a memory circuit 211, a logic circuit 207, an amplifier 206, and a modulation circuit 205. have.

  For example, the antenna circuit 201 includes an antenna coil 241 and a capacitor 242 (see FIG. 4A). For example, the rectifier circuit 202 includes diodes 243 and 244 and a capacitor 245 (see FIG. 4B).

  The operation of the semiconductor device 200 capable of wireless communication using such an IC will be described below. The radio signal received by the antenna circuit 201 is half-wave rectified by the diodes 243 and 244 and smoothed by the capacitor 245. Since the smoothed voltage includes a plurality of ripples, the voltage is stabilized by the stable power supply circuit 203, and the stabilized voltage is converted into the demodulation circuit 213, the modulation circuit 205, the amplifier 206, the logic circuit 207, the amplifier 208, The data is supplied to the logic circuit 209, the memory circuit 211, and the memory control circuit 212.

  On the other hand, a signal received by the antenna circuit 201 is input to the logic circuit 209 through the amplifier 208 as a clock signal. The signal input from the antenna coil 241 is demodulated by the demodulation circuit 213 and input to the logic circuit 209 as data.

  In the logic circuit 209, the input data is decoded. Since the interrogator 223 encodes and transmits the data, the logic circuit 209 decodes the data. The decoded data is sent to the memory control circuit 212, and information stored in the memory circuit 211 is read out accordingly.

  The memory circuit 211 needs to be a nonvolatile memory circuit that can be held even when the power is turned off, and a ROM (Read Only Memory) or the like is used (see Patent Document 1).

Signals transmitted and received include 125 kHz, 13.56 MHz, 915 MHz, 2.45 GHz, and the like, and standards are set by ISO and the like. Standards are also set for the modulation / demodulation methods in transmission and reception.
Japanese Patent No. 3578057

  In order to manufacture a semiconductor device capable of wireless communication using the IC as described above, it was necessary to form a nonvolatile memory circuit, for example, a mask ROM as described above.

  However, since a mask ROM (hereinafter also simply referred to as “ROM”) cannot perform data writing except during manufacture of the semiconductor device, data is also created at the same time as the mask ROM is produced during manufacture of the semiconductor device.

  Unique data such as an ID number of each semiconductor device is stored in the ROM. Unique data such as an ID number is different for each semiconductor device. However, since a ROM is generally manufactured using photolithography, a photomask must be made each time in order to make unique data such as an ID number different in each semiconductor device. Therefore, if unique data such as different ID numbers are created, both the production cost and the creation work are burdened.

  Therefore, when manufacturing such a semiconductor device, instead of photolithography, a laser direct drawing device (also called a laser exposure direct drawing device) or an electron beam direct drawing device (an electron exposure direct drawing device or an electron beam exposure device) is used. There is a method of creating data in the ROM using the above. When a semiconductor device is manufactured using such a direct drawing device or the like, it becomes easy to vary unique data such as an ID number written to each semiconductor device.

  However, a method for manufacturing a semiconductor device using a laser direct drawing apparatus, an electron beam direct drawing apparatus, or the like has lower accuracy than photolithography. In addition, if a laser direct drawing device, an electron beam direct drawing device, or the like is used, there is a risk that the design rules will not match.

  Accordingly, the present invention provides a semiconductor device capable of wireless communication using an IC, in which a ROM having unique data such as different ID numbers is formed, and a method for manufacturing such a semiconductor device.

  In order to solve the above problems, in the present invention, a photolithography and direct drawing apparatus (laser direct drawing apparatus, electron beam direct drawing apparatus, etc.) is used to manufacture a ROM in a semiconductor device capable of communicating by wireless communication. In this method, different data is written to each semiconductor device.

  In the present invention, the data different from the above semiconductor device is unique data such as an ID number corresponding to each semiconductor device.

  In a semiconductor device (also referred to as an ID chip, an IC chip, an IC tag, an ID tag, a wireless chip, and an RFID) that can communicate by wireless communication according to the present invention, a ROM and a logic circuit are formed, and a thin film transistor (Thin Film Transistor ( TFT)). The present invention is characterized in that the area of the source or drain region of the TFT forming the memory cell in the ROM is larger than the area of the source or drain region of the TFT in the logic circuit portion. The TFT forming the memory cell of the ROM of the present invention is characterized in that contact holes having different diameters are formed in the source region and the drain region.

  In order to form a ROM with a TFT having such a structure, exposure using a photomask, for example, stepper exposure, and laser exposure can be combined.

  Further, the TFT forming the memory cell in the ROM of the present invention is characterized in that the number of contact holes in the source region and the drain region is different.

  The TFT forming the memory cell in the ROM of the present invention is characterized in that the total bottom area of the contact holes in the source region and the total bottom area of the contact holes in the drain region are the same. Since the total bottom area of the contact holes in the source region and the total bottom area of the contact holes in the drain region are the same, the current density of the current flowing in the source region and the current density of the current flowing in the drain region are the same. can do.

  It should be noted that “same” and “equal” as used in this specification are interpreted not only to be completely the same and equal, but also to include substantially (generally) the same and equal. This is because the diameter of the contact hole in the design (layout) is slightly different from the diameter of the contact hole actually formed.

  Further, in the TFT forming the memory cell in the ROM of the present invention, the contact hole in the source region and the contact hole in the drain region have different exposure apparatuses, that is, a stepper apparatus and a direct drawing apparatus (laser direct drawing apparatus or electron beam exposure apparatus). It can be easily built using a device etc.).

  By the way, contact hole opening position data for determining unique data such as an ID number is determined by combining random number data generated by an external random number generating program with layout data including coordinate data and shape data. The determined opening position data is converted by the conversion editor and stored as drawing data in the laser direct drawing apparatus. A contact hole is formed by laser exposure or the like based on the drawing data (see FIG. 11).

  However, because it is necessary to create random number data with a random number creation program outside the laser direct drawing device and to combine layout data and random number data, it is possible to manufacture a semiconductor device capable of wireless communication using an IC. The process was time consuming and expensive.

  Therefore, in the present invention, layout data including coordinate data and shape data created to determine the shape and position of a semiconductor film, an electrode or wiring, an insulating film, etc., and a random number creation program stored in the laser direct drawing apparatus By combining ID data for determining unique data such as an ID number of each semiconductor device manufactured through the method, a semiconductor device capable of wireless communication using an IC can be manufactured quickly and easily.

  The present invention provides a substrate, a channel formation region, an island-shaped semiconductor film having a source region or a drain region, a gate insulating film on the island-shaped semiconductor film, and the gate insulating film on the island-shaped semiconductor film. A first electrode including a plurality of contact holes formed in the interlayer insulating film and reaching the one of the source region and the drain region. A hole and a second contact hole formed in the interlayer insulating film and reaching the other of the source region or the drain region. The diameter of the second contact hole is included in the first contact hole. Larger than the diameter of each of the plurality of contact holes, the total bottom area of the first contact holes, and the second contour Bottom area of Tohoru relates to a semiconductor device, characterized in that equal.

  In the present invention, an island-shaped semiconductor film is formed on a substrate, a gate insulating film is formed on the island-shaped semiconductor film, a gate electrode is formed on the gate insulating film, and the island-shaped semiconductor film is formed. An impurity imparting one conductivity is added to form a channel formation region, a source region, or a drain region in the island-shaped semiconductor film, and the island-shaped semiconductor film, the gate insulating film, and the gate electrode are formed. Covering, forming an interlayer insulating film, forming a first contact hole having a plurality of contact holes reaching one of the source region or the drain region in the interlayer insulating film, and in the interlayer insulating film, A second contact hole reaching the other of the source region or the drain region is formed, and the diameter of the second contact hole is a plurality of contact holes included in the first contact hole. Greater than the respective diameters, the sum of the bottom surface area of the first contact hole, the bottom area of the second contact hole that relates to a method for manufacturing a semiconductor device according to claim equal.

  In the present invention, the thin film transistor is used in a nonvolatile memory circuit.

  In the present invention, the plurality of contact holes included in the first contact hole are formed using a stepper device or the like, and the second contact hole is formed using a laser direct drawing device or an electron beam direct drawing device. .

  Furthermore, the present invention provides a first channel formation region on a substrate, a first island-shaped semiconductor film having a first source region or a drain region, and a gate insulating film on the first island-shaped semiconductor film. , A first thin film transistor having a first gate electrode on the first island-shaped semiconductor film with the gate insulating film interposed therebetween, a second channel formation region on the substrate, and a second source A second island-shaped semiconductor film having a region or a drain region; the gate insulating film on the second island-shaped semiconductor film; and the second island-shaped semiconductor film on the second island-shaped semiconductor film with the gate insulating film interposed therebetween. A second thin film transistor having two gate electrodes, an interlayer insulating film on the first and second thin film transistors, and formed in the interlayer insulating film, in one of the first source region and the drain region Reach multiple contacts A first contact hole including a contact hole, a second contact hole formed in the interlayer insulating film and including a plurality of contact holes reaching one of the second source region or the drain region, and the interlayer insulating film A third contact hole formed therein and reaching the other of the first source region or the drain region or the other of the second source region or the drain region, and the third contact hole Is larger than the diameter of each of the plurality of contact holes included in the first contact hole and the plurality of contact holes included in the second contact hole, and the total area of the bottom areas of the first contact holes is The total bottom area of the second contact hole is equal to the bottom area of the third contact hole. To a semiconductor device according to symptoms.

  According to the present invention, a first island-shaped semiconductor film and a second island-shaped semiconductor film are formed on a substrate, a gate insulating film is formed on the first and second island-shaped semiconductor films, A first gate electrode is formed on one island-shaped semiconductor film and the gate insulating film, a second gate electrode is formed on the second island-shaped semiconductor film and the gate insulating film, and the island-shaped semiconductor film is formed. An impurity imparting one conductivity is added to the semiconductor film, and a first channel formation region, a first source region, or a drain region is added to the second island in the first island-shaped semiconductor film. Forming a second channel formation region, a second source region or a drain region in the planar semiconductor film, the first and second island-shaped semiconductor films, the gate insulating film, and the first and second gates; An interlayer insulating film is formed to cover the electrode, and the first source region is formed in the interlayer insulating film. Forms a first contact hole having a plurality of contact holes reaching one of the drain regions, and has a plurality of contact holes reaching one of the second source region or the drain region in the interlayer insulating film A third contact that forms a second contact hole and reaches the other of the first source region or the drain region or the other of the second source region or the drain region in the interlayer insulating film; Forming a hole, wherein the diameter of the third contact hole is larger than the diameter of each of the plurality of contact holes included in the first contact hole and the plurality of contact holes included in the second contact hole, The total bottom area of the first contact hole and the total bottom area of the second contact hole , The bottom area of the third contact hole that relates to a method for manufacturing a semiconductor device according to claim equal.

  In the present invention, the first and second thin film transistors are used in a nonvolatile memory circuit.

  In the present invention, the plurality of contact holes included in the first contact hole and the plurality of contact holes included in the second contact hole are formed by a stepper device or the like, and the third contact hole is It is formed by a laser direct drawing device or an electron beam direct drawing device.

  Furthermore, the present invention provides a first channel formation region, a first island-shaped semiconductor film having a first source region or a drain region on a substrate, and a first gate on the first island-shaped semiconductor film. A first thin film transistor having an insulating film, a first gate electrode on the first island-shaped semiconductor film, and a second channel formed on the substrate; A second island-like semiconductor film having a region, a second source region or a drain region, a second gate insulating film over the second island-like semiconductor film, and a second island-like semiconductor film over the second island-like semiconductor film A second thin film transistor having a second gate electrode through the second gate insulating film, an interlayer insulating film on the first and second thin film transistors, and formed in the interlayer insulating film, Reach one of the first source region or drain region A first contact hole formed in the interlayer insulating film, a second contact hole reaching the other of the first source region or the drain region, and formed in the interlayer insulating film. A third contact hole including a plurality of contact holes reaching one of the source region and the drain region, and a fourth contact hole formed in the interlayer insulating film and reaching the other of the second source region or the drain region; The bottom area of the first contact hole is equal to the bottom area of the second contact hole, and the diameter of the fourth contact hole is a plurality of contact holes included in the third contact hole. The total bottom area of the third contact hole and the bottom area of the fourth contact hole are Respectively, the bottom area of the first contact hole, and it relates to a semiconductor device, wherein greater than the bottom area of the second contact hole.

  According to the present invention, a first island-like semiconductor film and a second island-like semiconductor film are formed on a substrate, a gate insulating film is formed on the first and second island-like semiconductor films, and the first A first gate electrode is formed on the island-shaped semiconductor film and the gate insulating film, a second gate electrode is formed on the second island-shaped semiconductor film and the gate insulating film, and the first gate electrode is formed. A first impurity imparting one conductivity is added to the island-shaped semiconductor film to form a first channel formation region, a first source region, or a drain region in the first island-shaped semiconductor film. Then, a second impurity imparting one conductivity is added to the second island-shaped semiconductor film, so that a second channel formation region and a second source are added to the second island-shaped semiconductor film. Forming a region or a drain region, the first and second island-shaped semiconductor films, the gate insulating film, the first and second An interlayer insulating film is formed, a first contact hole reaching one of the first source region or the drain region is formed in the interlayer insulating film, and in the interlayer insulating film, A second contact hole reaching the other of the first source region or the drain region is formed, and a second contact hole reaching the one of the second source region or the drain region is formed in the interlayer insulating film. A fourth contact hole reaching the other of the second source region or the drain region in the interlayer insulating film, and a bottom area of the first contact hole; The bottom area of the second contact hole is equal, and the diameter of the fourth contact hole is equal to the plurality of contact holes included in the third contact hole. The total bottom area of the third contact hole and the bottom area of the fourth contact hole are respectively the bottom area of the first contact hole and the second contact hole. The present invention relates to a method for manufacturing a semiconductor device, which is larger than a bottom area.

  In the present invention, the second thin film transistor is used in a nonvolatile memory circuit, and the first thin film transistor is used in a logic circuit that controls the nonvolatile memory circuit.

  In the present invention, the plurality of contact holes included in the first contact hole, the second contact hole, and the third contact hole are each formed by a stepper device or the like, and the fourth contact hole is a laser. It is formed by a direct drawing device or an electron beam direct drawing device.

  In addition, in this specification, the contact hole is not limited to a stepper device, a laser direct drawing device, and an electron beam direct drawing device, but is an etching device, a resist forming device, a peeling device, a film forming device, or the like. It goes without saying that it is used.

  Note that in this specification, a semiconductor device refers to all devices that can function by utilizing semiconductor characteristics, and an electro-optical device, a semiconductor circuit, and an electronic device are all semiconductor devices.

  According to the present invention, it is possible to easily attach unique data such as a different ID number to each semiconductor device capable of wireless communication using an IC.

  Further, in the TFT forming the memory cell in the ROM, the current density at the contact portion of the source region can be made equal to the current density at the contact portion of the drain region.

  Thereby, it is possible to prevent only one of the source region and the drain region from generating heat, and to prevent adverse effects on the TFT.

  From the above, it is apparent that a TFT for forming a memory cell in a ROM with improved reliability can be manufactured by the present invention.

  Hereinafter, embodiments of the present invention will be described with reference to the drawings. However, the present invention can be implemented in many different modes, and those skilled in the art can easily understand that the modes and details can be variously changed without departing from the spirit and scope of the present invention. Is done. Therefore, the present invention is not construed as being limited to the description of this embodiment mode. Note that in the drawings described below, the same portions or portions having similar functions are denoted by the same reference numerals, and repetitive description thereof is omitted.

[Embodiment 1]
This embodiment is described in FIGS. 1, 5, 7, 8A and 8B, 9, 10, 12A to 12D, and 13A. Description will be made with reference to FIG. 13C, FIG. 14A to FIG. 14C, and FIG.

  FIG. 1 is a top view of a memory cell array in the mask ROM, and FIG. 7 is a cross-sectional view taken along the line A-A 'in FIG.

  The mask ROM shown in FIGS. 1 and 7 represents a memory state depending on whether or not a contact hole reaching a source region or a drain region of a TFT forming a memory cell formed in the mask ROM is opened.

  Although FIG. 1 and FIG. 7 show a 4-bit memory cell array for simplification of explanation, the nonvolatile memory circuit of the present invention is of course not limited to 4 bits.

  1 and 7, TFTs 118 to 121 are n-channel TFTs. As shown in FIG. 1, the TFT 118 includes an island-shaped semiconductor film 131 and a gate electrode 103 which are active layers. The TFT 119 includes an island-shaped semiconductor film 132 and a gate electrode 104 which are active layers. The TFT 120 includes an island-shaped semiconductor film 133 and a gate electrode 105 which are active layers. The TFT 121 has an island-shaped semiconductor film 134 and a gate electrode 106 which are active layers. The gate electrodes 103 and 104 are electrically connected to the word line 107, and the gate electrodes 105 and 106 are electrically connected to the word line 108.

  In each of the island-shaped semiconductor films 131 to 134, a plurality of contact holes 142 having a small diameter are formed above one of the source region and the drain region by using photolithography, for example, an exposure method using a stepper apparatus or the like. Further, only one contact hole 141 having a large diameter is formed above the other of the source region or the drain region by an exposure method using a laser direct drawing apparatus, an electron beam direct drawing apparatus, or the like as necessary. In the present specification, the “diameter” of the contact hole refers to the “diameter” of the contact hole.

  The total area of the bottom areas of a plurality of contact holes with a small diameter reaching one of the source region or the drain area is the same as the bottom area of one contact hole with a large diameter reaching the other of the source area or the drain region. A contact hole is formed. Thereby, the current density of the current flowing through one of the source region or the drain region and the current density of the current flowing through the other of the source region or the drain region can be made the same.

  Of course, the sum of the bottom areas of a plurality of contact holes with a small diameter and the bottom area of one contact hole with a large diameter are preferably the same in practice. However, during the manufacturing process, when a contact hole having a large diameter is formed by laser exposure using a laser direct drawing apparatus or an electron beam direct drawing apparatus, for example, a laser direct drawing apparatus, the position of the beam spot caused by the vibration of the laser beam There is a possibility of being affected by the deviation. Further, when a contact hole having a small diameter is formed using, for example, a stepper device, there is a possibility that it is affected by the development state after exposure and the etching state after development.

  Therefore, in this specification, the sum of the bottom areas of a plurality of contact holes and the bottom area of one contact hole are the same (equal), or the bottom areas of two contact holes are the same. When the total of the bottom area and the total of the bottom areas of other contact holes are the same (equal), the areas that need to be equal are designed to be equal at least at the design (layout) stage. . Furthermore, if the functions required in the completed semiconductor device are satisfied, for example, if the current densities are the same, the areas are also considered to be the same (equal).

  One of the source region and the drain region of the TFT 118 and one of the source region and the drain region of the TFT 120 are electrically connected to the bit line 109 through the contact hole 142. One of the source region and the drain region of the TFT 119 and one of the source region and the drain region of the TFT 121 are electrically connected to the bit line 110 through the contact hole 142.

  The other of the source region or the drain region of each of the TFTs 118 to 121 is connected to the power supply line 113 through the contact hole 141 as necessary. Whether or not the contact hole 141 is formed determines the storage state of the mask ROM.

  As shown in FIG. 7, the TFT 118 is formed on the base film 153 formed on the substrate 151. The TFT 118 includes an island-shaped semiconductor film 131, a gate insulating film 154, a gate electrode 103 including a lower gate electrode 103a and an upper gate electrode 103b, and sidewalls 171a and 171b. The island-shaped semiconductor film 131 includes a region 163 that is one of a source region and a drain region, a region 164 that is the other of the source region and the drain region, low-concentration impurity regions 162a and 162b, and a channel formation region 161.

  The TFT 119 is formed on the base film 153 formed on the substrate 151. The TFT 119 includes an island-shaped semiconductor film 132, a gate insulating film 154, a gate electrode 104 including a lower gate electrode 104a and an upper gate electrode 104b, and sidewalls 191a and 191b. The island-shaped semiconductor film 132 includes a region 184 that is one of a source region and a drain region, a region 183 that is the other of the source region and the drain region, low-concentration impurity regions 182a and 182b, and a channel formation region 181.

  A first interlayer insulating film 155 is formed on the TFTs 118 and 119, and a second interlayer insulating film 156 is further formed. Contact holes 141 and 142 are formed in the gate insulating film 154, the first interlayer insulating film 155, and the second interlayer insulating film 156.

  Note that the TFTs 120 and 121 have the same cross-sectional structure as either the TFT 118 or the TFT 119. The contact hole 141 is formed as necessary.

  The contact hole 142 is formed using a stepper device or the like, and has a diameter smaller than that of the contact hole 141. Since the contact hole 141 is formed by a laser direct drawing device, an electron beam direct drawing device, or the like, the contact hole 141 has a diameter larger than that of the contact hole 142 and is formed by only one. In accordance with the size of the contact hole 141, the island-shaped semiconductor films 131 to 134 are formed so as to have a larger area than an island-shaped semiconductor film included in a TFT of a logic circuit described later. A plurality of contact holes 142 are formed so that the total bottom area is the same as that of the contact holes 141.

  Bit lines 109 and 110 and a power supply line 113 are formed on the second interlayer insulating film 156.

  In the present embodiment, the diameter of the contact hole 142 is designed to be 1 μm, for example, and the diameter of the contact hole 141 is designed to be 3 μm, for example.

  8A is a top view of a TFT of a logic circuit (also referred to as a logic circuit) for controlling the mask ROM, FIG. 8B is a circuit diagram thereof, and FIG. 9 is a cross-sectional view taken along line BB ′ in FIG. 8A. The figure is shown. The basic configuration of the logic circuit is a CMOS circuit in which an n-channel TFT and a p-channel TFT are complementarily connected. A column decoder and a row decoder described later are formed using such a CMOS circuit. 8A to 8B and FIG. 9 show inverters using CMOS circuits.

  In the n-channel TFT 411 of the logic circuit, a gate wiring 401 is formed over an island-shaped semiconductor film 412 that is an active layer with a gate insulating film 454 interposed therebetween. The island-shaped semiconductor film 412 has a source region or a drain region, and a contact hole 415 is formed over the source region or the drain region. One of a source region or a drain region of the TFT 411 is connected to a wiring 404 which is a power supply line through a contact hole 415, and the other of the source region or the drain region is connected to a wiring 407 through a contact hole 415. Yes.

  In the p-channel TFT 421 of the logic circuit, a gate wiring 401 is formed over an island-shaped semiconductor film 422 that is an active layer with a gate insulating film 454 interposed therebetween. The island-shaped semiconductor film 422 has a source region or a drain region, and a contact hole 425 is formed over the source region or the drain region. One of a source region and a drain region of the TFT 421 is connected to a wiring 405 that is a power supply line through a contact hole 425, and the other of the source region and the drain region is connected to a wiring 407 through a contact hole 425. Yes.

  The wiring 407 electrically connects the other of the source region or the drain region of the n-channel TFT 411 and the other of the source region or the drain region of the p-channel TFT 421. Further, the wiring 407 is connected to the wiring 403 through the wiring 402, and the wiring 403 is an output terminal of the inverter.

  The gate wiring 401 is connected to the wiring 406, and the wiring 406 serves as an input terminal of the inverter.

  Note that in this embodiment mode, the p-channel TFT 421 does not have a low-concentration impurity region, but a low-concentration impurity region may be formed if necessary.

  8A to 8B and 9, the gate wiring 401 and the wiring 402 are formed using the same material and the same process. The wiring 403, the wiring 404, the wiring 405, and the wiring 406 are formed using the same material and the same process. However, it goes without saying that different processes and different materials may be used as required.

  As shown in FIG. 9, the n-channel TFT 411 is formed on a base film 453 formed on the substrate 451. The TFT 411 includes an island-shaped semiconductor film 412, a gate insulating film 454, a gate electrode 443 including a lower gate electrode 443a and an upper gate electrode 443b, and sidewalls 471a and 471b.

  In the island-shaped semiconductor film 412, a channel formation region 461, low-concentration impurity regions 462a and 462b, a region 463 that is one of a source region and a drain region, and a region 464 that is the other of the source region and the drain region are formed.

  The p-channel TFT 421 is formed on the base film 453 formed on the substrate 451. The TFT 421 includes an island-shaped semiconductor film 422, a gate insulating film 454, a gate electrode 444 including a lower gate electrode 444a and an upper gate electrode 444b, and sidewalls 491a and 491b.

  In the island-shaped semiconductor film 422, a channel formation region 481, a region 484 that is one of a source region and a drain region, and a region 483 that is the other of the source region and the drain region are formed.

  A first interlayer insulating film 455 and a second interlayer insulating film 456 are formed on the TFTs 411 and 421. Contact holes 415 and 425 are formed in the gate insulating film 454, the first interlayer insulating film 455, and the second interlayer insulating film 456. Both of the contact holes 415 and 425 are formed by a stepper device or the like, and the total of the bottom areas of each is the same. In FIG. 8A and FIG. 9, each of the contact holes 415 and 425 is composed of a plurality of contact holes, but may be a single contact hole instead of a plurality if necessary.

  A wiring 404 that is a power supply line, a wiring 405 that is a power supply line, a wiring 406, and a wiring 407 are formed over the second interlayer insulating film 456. The wiring 404 that is a power supply line is electrically connected to the region 463 through the contact hole 415. Connected to. A wiring 405 that is a power supply line is electrically connected to the region 484 through the contact hole 425. The wiring 407 is electrically connected to the region 464 through the contact hole 415 and the region 483 through the contact hole 425.

  The contact holes 415 and 425 are formed by a stepper device or the like. In the stepper device, a contact hole having a smaller diameter than that of a laser direct drawing device or an electron beam direct drawing device can be formed. The total bottom area of the contact holes 415 and the total bottom area of the contact holes 425 are smaller than the total bottom area of the contact holes 142 and the bottom area of the contact holes 141, respectively. Therefore, the source region or drain region included in the island-shaped semiconductor films 412 and 422 can have a smaller area than the source region or drain region included in the island-shaped semiconductor films 131 and 132 in the TFT of the mask ROM.

  In this embodiment, the TFT top gate TFT of the mask ROM is formed, but a bottom gate TFT may be formed.

  The operation of the mask ROM having the present invention produced by the above steps will be described with reference to FIG. Note that the circuit configuration and operation are not limited to those described below as long as unique data such as an ID number stored or written in a memory cell can be read. In FIG. 5, for the sake of simplicity, the operation of the memory cell for 2 bits will be described using a 4-bit mask ROM as an example. However, the number of bits and the operation of the mask ROM are limited to this description. It is not effective, but is effective even when the number of bits is larger, and the data of the memory cells of all bits are read.

  As shown in FIG. 5, the mask ROM having the present invention includes a column decoder 15, a row decoder 16, a memory cell array 11 including n-channel TFTs 18 to 21, bit lines (data lines) 24 and 25, word lines W1 and W2. , High voltage power supply (VDD) 22, low voltage power supply (VSS or GND) 23, column switches SW 1 to SW 4, address lines S 1 and S 2 controlled by the column decoder 15, output line 14 and control line 17. .

  First, when reading unique data such as an ID number stored or written in a 1-bit memory cell, an operation of precharging the potential of the low voltage power supply (VSS or GND) using 1/4 of the read time. Will be described.

  SW3 and SW4 are selected in the control line 17 for 1/4 of the readout time, and the bit lines (data lines) 24 and 25 are electrically connected to the low voltage power supply (VSS or GND) 23. Send. By doing so, the bit lines (data lines) 24 and 25 become low voltage power supplies (VSS or GND).

  At this time, the n-channel TFTs 18 to 21 are not selected in the word lines W1 and W2. Here, the selected state is that the source terminals and drain terminals of the n-channel TFTs 18 to 21 are electrically connected.

  Also, the address lines S1 and S2 controlled by the column decoder 15 do not have the column switches SW1 and SW2 selected. Here, the selected state is that the bit lines (data lines) 24 and 25 and the output line 14 are electrically connected.

  Note that the voltage to be precharged is precharged to a high voltage power supply (VDD) when precharged to a low voltage power supply (VSS or GND) as in the present invention due to differences in circuit configuration, method, logic, etc. There are various cases and cases where the precharge is performed to other generation voltages, and is not limited. In some cases, an optimum voltage may be selected.

  Next, an operation of reading unique data such as an ID number from the mask ROM having the present invention using the remaining 3/4 of the reading time will be described. Here, when the same voltage as the high voltage power supply (VDD) is output as the unique data such as the read ID number, the high is output when the same voltage as the low voltage power supply (VSS or GND) is output. And Note that whether the unique data such as the read ID number is high or low differs depending on the circuit configuration, method, logic, etc., and is not limited to this description.

  When the word line W1 is selected by the row decoder 16 and the address line S1 is selected by the column decoder 15, the n-channel TFT 18 is selected. The source terminal and drain terminal of the n-channel TFT 18 are electrically connected. That is, the bit line (data line) 24 and the high voltage power supply (VDD) 22 corresponding to the source terminal and the drain terminal of the n-channel TFT 18 are electrically connected. The bit line is charged to a voltage lower than the high voltage power supply (VDD) 22 by the threshold value of the n-channel TFT 18. Further, since the address line S1 is selected by the column decoder 15, the bit line (data line) 24 and the output line 14 are electrically connected. Here, since the bit line is charged to a voltage lower than the high voltage power supply (VDD) 22 by the threshold value of the n-channel TFT 18, the output line 14 is also at the same potential. That is, a voltage lower than the high voltage power supply (VDD) 22 by the threshold value of the n-channel TFT 18 is output to the output line 14.

  Although not shown, a voltage lower than the high voltage power supply (VDD) 22 by the threshold value of the n-channel TFT 18 is passed through the amplifier to output the same potential as the high voltage power supply (VDD). Here, the amplifier is a circuit capable of increasing voltage or current, and may have a configuration in which two stages of inverters are connected, or a configuration using a comparator or the like.

  In this way, high that is unique data such as an ID number stored or written in the n-channel TFT 18 is output to the output line 14.

  Similarly, when the word line W1 is selected by the row decoder 16 and the address line S2 is selected by the column decoder 15, the n-channel TFT 19 is selected. One terminal of the n-channel TFT 19 is not connected anywhere, but the bit line (data line) 25 as the other terminal is brought to the potential of the low voltage power supply (VSS or GND) 23 by the precharge operation. It has become. That is, one terminal and the other terminal of the n-channel TFT 19 are at substantially the same potential as the low voltage power supply (VSS or GND) 23. Further, since the address line S2 is selected by the column decoder 15, the bit line (data line) 25 and the output line 14 are electrically connected. That is, almost the same potential as that of the low voltage power supply (VSS or GND) 23 is output to the output line 14.

  In this way, low, which is unique data such as an ID number stored or written in the n-channel TFT 19, is output to the output line 14.

  As described above, unique data such as an ID number stored or written in the mask ROM having the present invention can be read.

  In the following steps for manufacturing the TFT of the memory cell array and the TFT of the logic circuit on the same substrate, FIG. 10, FIG. 12 (A) to FIG. 12 (D), FIG. 13 (A) to FIG. A) to FIG. 14 (C) and FIG. 15 will be described.

  First, as shown in FIG. 12A, a base film 602 is formed over a substrate 601. As the substrate 601, for example, a glass substrate such as barium borosilicate glass or alumino borosilicate glass, a quartz substrate, a stainless steel substrate, a so-called SOI (Silicon on Insulator) substrate in which a single crystal semiconductor layer is formed on an insulating surface, or the like is used. be able to. In addition, a substrate made of a plastic such as PET (poly (ethylene terephthalate)), PES (poly (ether sulfone)), or PEN (poly (ethyl naphthaphthalate)) or a flexible synthetic resin such as acrylic is used. It is also possible. Hereinafter, a case where a glass substrate is used as the substrate 601 will be described.

  The base film 602 is provided to prevent alkali metal such as Na or alkaline earth metal contained in the substrate 601 from diffusing into the semiconductor film and adversely affecting the characteristics of the semiconductor element. Therefore, an insulating film such as silicon nitride or silicon oxide containing nitrogen that can suppress diffusion of alkali metal or alkaline earth metal into the semiconductor film is used. In this embodiment mode, a silicon oxide film is formed with a plasma CVD method to have a thickness of 10 to 100 nm (preferably 20 to 70 nm, more preferably 50 nm), and a silicon oxide film containing nitrogen is 10 to 400 nm (preferably 50 to 300 nm). And more preferably 100 nm).

  Note that even though the base film 602 is an insulating film single layer such as silicon nitride, silicon oxide containing nitrogen, or silicon nitride containing oxygen, insulation such as silicon oxide, silicon nitride, silicon oxide containing nitrogen, or silicon nitride containing oxygen is used. A plurality of laminated films may be used. In addition, when using a substrate that contains alkali metal or alkaline earth metal, such as a glass substrate, stainless steel substrate, or plastic substrate, it is effective to provide a base film from the viewpoint of preventing impurity diffusion. However, when diffusion of impurities does not cause any problem, such as a quartz substrate, it is not necessarily provided.

  Next, a semiconductor film 604 is formed over the base film 602. The thickness of the semiconductor film 604 is 25 nm to 100 nm (preferably 30 nm to 80 nm). Note that the semiconductor film 604 may be an amorphous semiconductor or a polycrystalline semiconductor. As the semiconductor, not only silicon (Si) but also silicon germanium (SiGe) can be used. When silicon germanium is used, the concentration of germanium is preferably about 0.01 to 4.5 atomic%. In this embodiment, an amorphous silicon film is formed as the semiconductor film 604 with a thickness of 66 nm.

  Next, as shown in FIG. 12B, the semiconductor film 604 is irradiated with a linear beam 603 from a laser irradiation apparatus to be crystallized.

  In the case of performing laser crystallization, heat treatment for one hour at 500 ° C. may be applied to the semiconductor film 604 in order to increase the resistance of the semiconductor film 604 to the laser before laser crystallization.

  For laser crystallization, a pulsed laser having an oscillation frequency of 10 MHz or more, preferably 80 MHz or more can be used as a continuous wave laser or a pseudo CW laser.

Specifically, as a continuous wave laser, Ar laser, Kr laser, CO ₂ laser, YAG laser, YVO ₄ laser, forsterite (Mg ₂ SiO ₄ ) laser, YLF laser, YAlO ₃ laser, GdVO ₄ laser, Y ₂ O ₃ laser, alexandrite laser, Ti: sapphire laser, helium cadmium laser, polycrystalline (ceramic) YAG, Y ₂ O ₃ , YVO ₄ , YAlO ₃ , GdVO ₄ as dopants Nd, Yb, Cr, Ti, Ho , Er, Tm, Ta, or the like, or a laser having a medium added with one or more of them.

As a pseudo CW laser, an Ar laser, a Kr laser, an excimer laser, a CO ₂ laser, a YAG laser, a Y ₂ O ₃ laser, a YVO can be used as long as it can oscillate a pulse having an oscillation frequency of 10 MHz or more, preferably 80 MHz or more. ₄ laser, forsterite (Mg ₂ SiO ₄ ) laser, YLF laser, YAlO ₃ laser, GdVO ₄ laser, alexandrite laser, Ti: sapphire laser, copper vapor laser or gold vapor laser, polycrystalline (ceramic) YAG, Y ₂ A pulse like a laser in which one or more of Nd, Yb, Cr, Ti, Ho, Er, Tm, and Ta are added as dopants to O ₃ , YVO ₄ , YAlO ₃ , and GdVO ₄ as a medium. An oscillation laser can be used.

  Such a pulsed laser has an effect equivalent to that of a continuous wave laser as the oscillation frequency is increased.

For example, when a solid-state laser capable of continuous oscillation is used, a crystal having a large grain size can be obtained by irradiating laser light of second to fourth harmonics. Typically, it is desirable to use the second harmonic (532 nm) or the third harmonic (355 nm) of a YAG laser (fundamental wave 1064 nm). For example, laser light emitted from a continuous wave YAG laser is converted into a harmonic by a non-linear optical element, and irradiated to the semiconductor film 604. Energy density may be about 0.01 to 100 MW / cm ² (preferably 0.1~10MW / cm ^2). Irradiation is performed at a scanning speed of about 10 to 2000 cm / sec.

Note that single crystal YAG, YVO ₄ , forsterite (Mg ₂ SiO ₄ ), YAlO ₃ , GdVO ₄ , or polycrystalline (ceramic) YAG, Y ₂ O ₃ , YVO ₄ , YAlO ₃ , GdVO ₄ , dopants Nd, Yb, Cr, Ti, Ho, Er, Tm, and Ta, a laser that uses one or a plurality of types added as a medium, Ar laser, Kr laser, or Ti: sapphire laser It is also possible to cause pulse oscillation by performing Q switch operation, mode synchronization, and the like. When the laser beam is oscillated at an oscillation frequency of 10 MHz or more, the semiconductor film is irradiated with the next pulse during the period from when the semiconductor film is melted by the laser to solidification. Therefore, unlike the case of using a pulse laser having a low oscillation frequency, the solid-liquid interface can be continuously moved in the semiconductor film, so that crystal grains continuously grown in the scanning direction can be obtained.

  When ceramic (polycrystal) is used as the medium, it is possible to form the medium in a free shape in a short time and at low cost. When a single crystal is used, a cylindrical medium having a diameter of several millimeters and a length of several tens of millimeters is usually used. However, when ceramic is used, a larger one can be made.

  Since the concentration of dopants such as Nd and Yb in the medium that directly contributes to light emission cannot be changed greatly regardless of whether it is a single crystal or a polycrystal, there is a certain limit to improving the laser output by increasing the concentration. However, in the case of ceramic, since the size of the medium can be remarkably increased as compared with the single crystal, the output is greatly improved.

  Further, in the case of ceramic, a medium having a parallelepiped shape or a rectangular parallelepiped shape can be easily formed. When a medium having such a shape is used to cause oscillation light to travel in a zigzag manner inside the medium, the oscillation optical path can be made longer. As a result, amplification is increased and oscillation can be performed with high output. Further, since the laser beam emitted from the medium having such a shape has a quadrangular cross-sectional shape at the time of emission, it is advantageous for shaping into a linear beam as compared with a round beam. By shaping the emitted laser beam using an optical system, it is possible to easily obtain a linear beam having a short side length of 1 mm or less and a long side length of several mm to several m. Become. In addition, by irradiating the medium with the excitation light uniformly, the linear beam has a uniform energy distribution in the long side direction.

  By irradiating the semiconductor film with this linear beam, the entire surface of the semiconductor film can be annealed more uniformly. When uniform annealing is required up to both ends of the linear beam, it is necessary to arrange a slit at both ends to shield the energy attenuating portion.

  By irradiation of the semiconductor film 604 with laser light, the crystalline semiconductor film 605 with higher crystallinity is formed.

  Next, as illustrated in FIG. 12C, island-shaped semiconductor films 611 to 614 are formed using the crystalline semiconductor film 605. These island-like semiconductor films 611 to 614 serve as active layers of TFTs formed in the subsequent steps.

  Note that this embodiment mode describes the case where a glass substrate is used as the substrate 601, but when an SOI substrate is used as the substrate 601, a single crystal semiconductor layer is formed into an island shape and an active layer of a TFT And it is sufficient.

Next, impurities for threshold control are introduced into the island-shaped semiconductor films 611 to 614. In this embodiment mode, boron (B) is introduced into the island-shaped semiconductor films 611 to 614 by doping with diborane (B ₂ H ₆ ).

  Next, a gate insulating film 615 is formed over the island-shaped semiconductor films 611 to 614. For the gate insulating film 615, silicon oxide, silicon nitride, silicon oxide containing nitrogen, or the like with a thickness of 10 to 110 nm can be used, for example. As a film formation method, a plasma CVD method, a sputtering method, or the like can be used. In this embodiment, the gate insulating film 615 is formed using a silicon oxide film containing nitrogen which is formed to a thickness of 20 nm by a plasma CVD method.

  Next, after a conductive film is formed over the gate insulating film 615, gate electrodes 621 to 624 are formed using the conductive film.

  The gate electrodes 621 to 624 are formed using a structure in which a single conductive film or two or more conductive films are stacked. In the case where two or more conductive films are stacked, an element selected from tantalum (Ta), tungsten (W), titanium (Ti), molybdenum (Mo), and aluminum (Al), or the element as a main component The gate electrodes 621 to 624 may be formed by stacking alloy materials or compound materials to be stacked. Alternatively, the gate electrode may be formed using a semiconductor film typified by a polycrystalline silicon film doped with an impurity element such as phosphorus (P). In this embodiment, a tantalum nitride film having a thickness of 10 to 50 nm, for example, 30 nm is formed as the lower gate electrodes 621a to 624a, and a tungsten (W) film is formed to 200 to 400 nm as the upper gate electrodes 621b to 624b. For example, the gate electrodes 621 to 624 are formed using a stacked film formed with a thickness of 370 nm.

  The gate electrodes 621 to 624 may be formed as part of the gate wiring, or a gate wiring may be formed separately and the gate electrodes 621 to 624 may be connected to the gate wiring.

  Next, an impurity imparting one conductivity is added to the island-shaped semiconductor films 611 to 613. Note that in this addition step, the island-shaped semiconductor film 614 and the gate electrode 624, that is, a region to be the p-channel TFT 694 is covered with the resist 618, and an impurity imparting one conductivity is in the island-shaped semiconductor film 614. Is not added.

  As an impurity imparting one conductivity, phosphorus (P) or arsenic (As) may be used as long as it is an impurity imparting n-type conductivity. Further, boron (B) may be used as long as it is an impurity imparting p-type.

In this embodiment, first, as a first addition step, an impurity imparting n-type conductivity is added to the island-shaped semiconductor films 611 to 613 (see FIG. 12D). Specifically, phosphorous (P) is applied using phosphine (PH ₃ ), the applied voltage is 40 to 120 keV, the dose is 1 × 10 ¹³ to 1 × 10 ¹⁵ cm ⁻² , and the island-shaped semiconductor films 611 to 613 are used. Introduce into. In this embodiment mode, phosphorus is added into the island-shaped semiconductor films 611 to 613 using phosphine at an applied voltage of 60 keV and a dose of 2.6 × 10 ⁻¹³ cm ⁻² . When this impurity is introduced, regions to be channel formation regions 631, 641, and 651 are determined.

  Thereafter, as shown in FIG. 13A, insulating films, so-called sidewalls 626 to 629 are formed so as to cover the side surfaces of the gate electrodes 621 to 624. That is, the sidewall 626 (626a and 626b) is formed on the side surface of the gate electrode 621, the sidewall 627 (627a and 627b) is formed on the side surface of the gate electrode 622, the sidewall 628 (628a and 628b) is formed on the side surface of the gate electrode 623, and the gate electrode 624. Side walls 629 (629a and 629b) are formed on the side surfaces.

  The sidewalls 626 to 629 can be formed using an insulating film containing silicon by a plasma CVD method or a low pressure CVD (LPCVD) method. In this embodiment mode, a silicon oxide film is formed with a thickness of 50 to 200 nm, preferably 100 nm by a plasma CVD method, and then the silicon oxide film is etched, whereby tapered sidewalls 626 to 629 are formed. The sidewalls 626 to 629 may be formed using a silicon oxide film containing nitrogen.

  Further, the end portions of the sidewalls 626 to 629 do not have to have a tapered shape, and may have a rectangular shape.

  Next, as illustrated in FIG. 13B, a resist 616 is formed so as to cover the island-shaped semiconductor film 614, the gate electrode 624, the sidewall 629, that is, a region to be a p-channel TFT 694 later.

Next, as a second addition step, phosphine (PH ₃ ) is used in the island-shaped semiconductor films 611 to 613 to apply an applied voltage of 10 to 50 keV, for example, 20 keV, and a dose amount of 5.0 × 10 ^{14 to} 2.5 × 10. Phosphorus (P) is introduced at ¹⁶ cm ⁻² , for example, 3.0 × 10 ¹⁵ cm ⁻² .

  In this second addition step, phosphorus is introduced into the island-shaped semiconductor film 611 using the gate electrode 621 and the sidewall 626 as a mask, and one of the source region or the drain region 633 in the island-shaped semiconductor film 611, the source region Alternatively, the other region 634 of the drain region, and the low-concentration impurity regions 632a and 632b are formed. Similarly, phosphorus is introduced into the island-shaped semiconductor film 612 using the gate electrode 622 and the sidewall 627 as a mask, and one of the source region and the drain region 643 and the other of the source region and the drain region are inserted into the island-shaped semiconductor film 612. Region 644, and low-concentration impurity regions 642a and 642b. Further, phosphorus is introduced into the island-shaped semiconductor film 613 using the gate electrode 623 and the sidewall 628 as a mask, and one region 653 of the source region or the drain region and the other region of the source region or the drain region are inserted into the island-shaped semiconductor film 613. 654, and low concentration impurity regions 652a and 652b are formed.

In this embodiment mode, regions 633 and 634 which are a source region and a drain region of an n-channel TFT 691, regions 643 and 644 which are a source region and a drain region of an n-channel TFT 692, and a source region of the n-channel TFT 693 In addition, each of the region 653 and the region 654 which are drain regions contains phosphorus (P) at a concentration of 1 × 10 ^{19 to} 5 × 10 ²¹ cm ⁻³ .

Further, low concentration impurity regions 632a and 632b of the n-channel TFT 691, low-concentration impurity regions 642a and 642b of the n-channel TFT 692, and low-concentration impurity regions 652a and 652b of the n-channel TFT 693 are each 1 × 10 ^{18 to} 5 Phosphorus (P) is contained at a concentration of × 10 ¹⁹ cm ⁻³ .

  Next, the resist 616 is further removed, and a resist 617 is formed to cover the island-shaped semiconductor films 611 to 613, the gate electrodes 621 to 623, and the sidewalls 626 to 628, that is, the regions to be the n-channel TFTs 691 to 693.

In order to manufacture the p-channel TFT 694, an impurity imparting a conductivity type opposite to the impurity imparting one conductivity type, that is, an impurity imparting p-type conductivity is added to the island-shaped semiconductor film 614. Specifically, using diborane (B ₂ H ₆ ), an applied voltage of 60 to 100 keV, for example, 80 keV, a dose amount of 1 × 10 ^{13 to} 5 × 10 ¹⁵ cm ⁻² , for example, 3 × 10 ¹⁵ cm ⁻² . Boron (B) is introduced into the island-shaped semiconductor film 614. Thus, a region 663 and a region 664 which are a source region and a drain region of the p-channel TFT, and a channel formation region 661 are formed when this impurity is introduced (see FIG. 13C).

  Note that in the p-channel TFT 694, since an applied voltage is high when boron is introduced, sufficient boron to form the region 663 and the region 664 is formed in the island-shaped semiconductor film 614 through the sidewall 629 and the gate insulating film 615. Added in.

The regions 663 and 664 which are the source region and the drain region of the p-channel TFT 694 contain boron (B) at a concentration of 1 × 10 ^{19 to} 5 × 10 ²¹ cm ⁻³ .

  Next, the resist 617 is removed, and a first interlayer insulating film 671 is formed to cover the island-shaped semiconductor films 611 to 614, the gate insulating film 615, the gate electrodes 621 to 624, and the sidewalls 626 to 629.

  As the first interlayer insulating film 671, an insulating film containing silicon, for example, a silicon oxide film, a silicon nitride film, a silicon oxide film containing nitrogen, or a stacked film thereof is formed using a plasma CVD method or a sputtering method. Needless to say, the first interlayer insulating film 671 is not limited to a silicon oxide film or a silicon nitride film containing nitrogen, or a laminated film thereof, and another insulating film containing silicon may be used as a single layer or a laminated structure. .

  In this embodiment mode, a silicon oxide film containing nitrogen is formed to a thickness of 50 nm by a plasma CVD method, and impurities are activated by a laser irradiation method. Alternatively, after forming a silicon oxide film containing nitrogen, the impurity may be activated by heating at 550 ° C. for 4 hours in a nitrogen atmosphere.

  Next, a silicon nitride film is formed to 100 nm by a plasma CVD method, and a silicon oxide film is further formed to 600 nm. The laminated film of the silicon oxide film containing nitrogen, the silicon nitride film, and the silicon oxide film is the first interlayer insulating film 671.

  Next, the whole is heated at 410 ° C. for 1 hour, and hydrogen is released by releasing hydrogen from the silicon nitride film.

  Next, a second interlayer insulating film 672 is formed so as to cover the first interlayer insulating film 671 (see FIG. 14A).

  As the second interlayer insulating film 672, an inorganic material such as silicon oxide or silicon nitride can be used by a CVD method, a sputtering method, a SOG (Spin On Glass) method, or the like. In this embodiment, a silicon oxide film is formed as the second interlayer insulating film 672.

  Further, as the second interlayer insulating film 672, an insulating film using siloxane may be formed. Siloxane has a skeletal structure composed of a bond of silicon (Si) and oxygen (O), and an organic group containing at least hydrogen as a substituent (for example, an alkyl group, an aromatic hydrocarbon (aryl group)) ) Is used. A fluoro group may be used as a substituent. Alternatively, an organic group containing at least hydrogen and a fluoro group may be used as a substituent.

  Note that a third interlayer insulating film may be formed over the second interlayer insulating film 672. As the third interlayer insulating film, a film that hardly transmits moisture, oxygen, or the like as compared with other insulating films is used. Typically, a silicon nitride film, a silicon oxide film, a silicon nitride film containing oxygen or a silicon oxide film containing nitrogen obtained by a sputtering method or a CVD method, a thin film mainly containing carbon (for example, a diamond-like carbon film (DLC) Film), carbon nitride film (CN film)) and the like can be used.

  Next, using a stepper device or the like, contact holes for electrical connection with the island-like semiconductor films 611, 612, 613, and 614 are formed in the interlayer insulating films 671 and 672, respectively.

  A contact hole 673 reaching the region 633 of the island-shaped semiconductor film 611, a contact hole 674 reaching the region 644 of the island-shaped semiconductor film 612, and a contact reaching the region 653 of the island-shaped semiconductor film 613 are formed in the interlayer insulating films 671 and 672. A contact hole 677 reaching the region 654 of the island-shaped semiconductor film 613, a contact hole 678 reaching the region 663 of the island-shaped semiconductor film 614, and a contact hole 679 reaching the region 664 of the island-shaped semiconductor film 614 are formed. (See FIG. 14B). Note that the contact hole 673 may be formed to reach the region 634, and the contact hole 674 may be formed to reach the region 643.

  In the TFTs 691 and 692 of the memory cells, contact holes are formed in only one of the source region and the drain region using a stepper device or the like. In the TFTs 693 and 694 of the logic circuit, contact holes are formed in both the source region and the drain region using a stepper device or the like.

  The contact hole 673 includes a plurality of contact holes 673a, 673b, and 673c. Similarly, the contact hole 674 is a plurality of contact holes 674a, 674b, 674c, the contact hole 676 is a plurality of contact holes 676a and 676b, the contact hole 677 is a plurality of contact holes 677a and 677b, and the contact hole 678 is a contact hole 678. The contact hole 679 is composed of a plurality of contact holes 678a and 678b, and the contact hole 679 is composed of the plurality of contact holes 679a and 679b. Note that the contact holes 676 to 679 may be one contact hole instead of a plurality of contact holes.

  The contact holes 673a, 673b, 673c, 674a, 674b, 674c, 676a, 676b, 677a, 677b, 678a, 678b, 679a and 679b have the same size.

  Further, each of contact holes 673 and 674 may be formed to have a larger bottom area than each of contact holes 676 to 679.

  Next, a contact hole 680 reaching the region 634 of the island-shaped semiconductor film 611 is formed in the interlayer insulating films 671 and 672 by using a laser direct drawing apparatus or an electron beam direct drawing apparatus (see FIG. 14C). A contact hole that reaches the region 643 of the island-shaped semiconductor film 612 may be formed as necessary.

  At this time, the contact hole 680 is formed so that the bottom area of the contact hole 680 is equal to the total bottom area of the contact hole 674.

  FIG. 10 shows a laser exposure process by the laser direct drawing apparatus. The laser direct drawing apparatus according to the present embodiment has a random number generation program inside, and is characterized in that random number generation is performed not inside but outside the apparatus. Thereby, the laser exposure process for forming the contact hole 680 can be shortened.

  When layout data including coordinate data and shape data is sent to the laser direct drawing apparatus, it is combined with random number data created by the laser direct drawing apparatus to form coordinate data.

  Based on this coordinate data, it is determined in which memory cell TFT the contact hole 680 is to be formed. For example, a contact hole 680 is formed in the TFT 691, but no contact hole is formed in the TFT 692.

  Next, a conductive film is formed over the second interlayer insulating film 672, and source or drain electrodes 681, 682, 683, 684, 685, 686 are formed using the conductive film (see FIG. 15).

  An electrode 681 which is one of a source electrode and a drain electrode of the TFT 691 is electrically connected to the region 633, and an electrode 682 which is the other of the source electrode and the drain electrode is electrically connected to the region 634. An electrode 683 that is one of a source electrode and a drain electrode of the TFT 692 is electrically connected to the region 644. The electrode 683 may be electrically connected to the region 643 instead of the region 644.

  An electrode 684 that is one of a source electrode and a drain electrode of the TFT 693 is electrically connected to the region 653. An electrode 685 which is the other of the source electrode and the drain electrode of the TFT 693 and one of the source electrode and the drain electrode of the TFT 694 is electrically connected to the region 654 and the region 663. An electrode 686 which is the other of the source electrode and the drain electrode of the TFT 694 is electrically connected to the region 664. Thereby, the TFTs 693 and 694 constitute a CMOS circuit 695.

  In this embodiment mode, the electrodes 681 to 686 are formed of aluminum (Al), tungsten (W), titanium (Ti), tantalum (Ta), molybdenum (Mo), nickel (Ni), CVD, sputtering, or the like. From cobalt (Co), iron (Fe), platinum (Pt), copper (Cu), gold (Au), silver (Ag), manganese (Mn), neodymium (Nd), carbon (C), silicon (Si) The selected element or an alloy material or compound material containing these elements as a main component is formed in a single layer or a stacked layer. The alloy material containing aluminum as a main component corresponds to, for example, a material containing aluminum as a main component and containing nickel, or an alloy material containing aluminum as a main component and containing nickel and one or both of carbon and silicon. The electrodes 681 to 686 adopt, for example, a laminated structure of a barrier film, an aluminum silicon (Al—Si) film, and a barrier film, or a laminated structure of a barrier film, an aluminum silicon (Al—Si) film, a titanium nitride film, and a barrier film. Good. Note that the barrier film corresponds to a thin film formed of titanium, titanium nitride, molybdenum, or molybdenum nitride. Aluminum and aluminum silicon are suitable as materials for forming the electrodes 681 to 686 because they have low resistance and are inexpensive. Further, the aluminum alloy film can prevent mutual diffusion of silicon and aluminum even when it comes into contact with silicon. In addition, when an upper layer and a lower barrier layer are provided, generation of hillocks of aluminum or aluminum silicon can be prevented.

  In this embodiment mode, the electrodes 681 to 686 are formed by using a titanium film (Ti), a titanium nitride film, an aluminum film (Al), and a titanium film (Ti) laminated to 60 nm, 50 nm, 500 nm, and 100 nm, respectively. To do.

  The electrodes 681 to 686 may be formed of the same material and electrode in the same process, or may be formed separately and connected to each other.

  The TFT 691 in FIG. 15 and the TFT 118 in FIG. 7, the TFT 692 in FIG. 15 and the TFT 119 in FIG. 7, the TFT 693 in FIG. 15 and the TFT 411 in FIG. 9, and the TFT 694 in FIG. When the TFTs 118 and 119 of the memory cell array shown in FIG. 7 and the TFTs 411 and 421 of the logic circuit shown in FIG. 9 are formed on the same substrate, FIG. 10, FIG. 12A to FIG. Each TFT may be formed by the manufacturing steps shown in A) to FIG. 13C, FIG. 14A to FIG. 14C, and FIG. Alternatively, the TFT of the memory cell array and the TFT of the logic circuit may be manufactured over different substrates and electrically connected using wiring. 7, 9, 12 </ b> A to 12 </ b> D, 13 </ b> A to 13 </ b> C, 14 </ b> A to 14 </ b> C, and 15, Although it is a single layer, it may be a stack of a plurality of layers of two or more layers. What is necessary is just to determine the number of layers of a base film as needed.

  According to the present embodiment, unique data such as an ID number is determined depending on whether or not a laser exposure or the like is performed by a laser direct drawing apparatus to form a contact hole. Therefore, unique data such as an ID number can be easily formed in a semiconductor device capable of wireless communication using individual ICs.

  Furthermore, since there is a random number creation program inside the laser direct drawing device and random number data can be created in the laser direct drawing device, it is possible to shorten the manufacturing process of a semiconductor device capable of wireless communication using an IC. Become.

[Embodiment 2]
In this embodiment, a semiconductor device capable of wireless communication using an IC, which includes a mask ROM having a structure different from that in Embodiment 1, will be described with reference to FIGS. Note that Embodiment 1 is used for a detailed manufacturing process of this embodiment.

  FIG. 16 shows a top view of the present embodiment, and FIG. 17 shows a cross-sectional view taken along line C-C ′ and a cross-sectional view taken along line D-D ′ in FIG. 16.

  In the first embodiment, unique data such as an ID number is determined based on the presence / absence of contact holes 141 and 680 formed by a laser direct drawing apparatus or the like. However, in this embodiment, contact holes formed by a laser direct drawing device or the like are formed in all TFTs of the memory cell array. A semiconductor device including the memory cell array depends on which of the two power supply lines is electrically connected to one of the source region or the drain region of the TFT through a contact hole formed by a laser direct drawing device or the like. The unique data such as the ID number is formed.

  In the semiconductor device capable of wireless communication using the IC shown in FIGS. 16 and 17, a base film 732 is formed over a substrate 731 and further TFTs 781 and 782 are formed. The TFT 781 includes a channel formation region 741, low-concentration impurity regions 742a and 742b, a region 743 that is one of a source region and a drain region, and an island-shaped semiconductor film 701 that has a region 744 that is the other of a source region and a drain region. A gate electrode 761 including a film 733, a lower gate electrode 761a, and an upper gate electrode 761b is included. The TFT 782 includes a channel formation region 751, low-concentration impurity regions 752a and 752b, a region 753 that is one of a source region and a drain region, a region 754 that is the other of a source region and a drain region, a gate insulating film 702 The gate electrode 762 includes a film 733, a lower gate electrode 762a, and an upper gate electrode 762b. Note that the gate electrodes 761 and 762 are electrically connected to the same word line. The gate electrode and the word line may be formed using the same material and the same process, or may be formed using different materials and processes and electrically connected.

  Side walls 771a and 771b are formed on the side surface of the gate electrode 761, and side walls 772a and 772b are formed on the side surface of the gate electrode 762.

  A first interlayer insulating film 734 and a second interlayer insulating film 735 are formed on the TFTs 781 and 782.

  In the first interlayer insulating film 734 and the second interlayer insulating film 735, a contact hole 721 having a plurality of contact holes 721 a, 721 b, and the like over the region 743 of the TFT 781 and a plurality of contact holes over the region 753 of the TFT 782. Contact holes 723 having 723a, 723b, and the like are formed. The contact holes 721 and 723 are formed by a stepper device or the like.

  The bit line 718 is electrically connected to the region 743 of the TFT 781 through the contact hole 721. The bit line 719 is electrically connected to the region 753 of the TFT 782 through the contact hole 723.

  Contact holes 722 and 724 are formed in the first interlayer insulating film 734 and the second interlayer insulating film 735 by a laser direct drawing apparatus or the like. In the TFT 781, the power supply line 717 is electrically connected to the region 744 through the contact hole 722. Although the power supply line 716 is also formed on the second interlayer insulating film 734, a contact hole is not opened in the region where the power supply line 716 is formed in the first interlayer insulating film 734 and the second interlayer insulating film 735. It is not connected to area 744.

  In the TFT 782, a contact hole 724 is formed in the first interlayer insulating film 734 and the second interlayer insulating film 735 so that the power line 716 is connected to the region 754. In the first interlayer insulating film 734 and the second interlayer insulating film 735, no contact hole is formed in a region where the power supply line 717 is formed, and thus the power supply line 717 is not connected to the region 754.

  The total bottom area of the contact hole 721 and the bottom area of the contact hole 722 are the same. Further, the total bottom area of the contact hole 723 and the bottom area of the contact hole 724 are the same. Thereby, the current density of the current flowing through the source region and the current density of the current flowing through the drain region of each TFT can be made the same.

  Different voltages are applied to the power supply lines 716 and 717, respectively. Depending on which TFT is connected to the power supply line 716 or 717, unique data such as an ID number of the semiconductor device is formed.

  16 also shows a TFT having an island-shaped semiconductor film 703 and a gate electrode 713, and a TFT having an island-shaped semiconductor film 704 and a gate electrode 714. These TFTs have the same structure as the TFTs 781 and 782. have.

  The contact hole 725 (725a, 725b, etc.) and the contact hole 727 (727a, 727b, etc.) are formed in the interlayer insulating films 734 and 735 using a stepper device or the like. The contact holes 726 and 728 are formed in the interlayer insulating films 734 and 735 by performing laser exposure or the like with a laser direct drawing apparatus or the like.

  Further, the total bottom area of the contact hole 725 and the bottom area of the contact hole 726 are the same. Further, the total bottom area of the contact hole 727 and the bottom area of the contact hole 728 are the same.

  In this embodiment mode, a top gate TFT is used as a TFT, but a bottom gate TFT may be formed.

  Note that this embodiment mode can be combined with any description in other embodiment modes and embodiments if necessary.

[Embodiment 3]
In this embodiment, a method for manufacturing a semiconductor device capable of wireless communication using an IC which is different from those in Embodiments 1 and 2 will be described with reference to FIGS. 18A to 18B and FIG. This will be described with reference to FIG. 19B and FIG. In the present embodiment, the same reference numerals are used for the same components as those in the first embodiment.

  First, the semiconductor device illustrated in FIG. 15 is manufactured based on the description in Embodiment 1 (FIG. 18A). Note that a peeling layer 802, a first base film 803, and a second base film 804 are formed instead of the base film 602. Note that in FIG. 18A, a top gate TFT is formed as a TFT, but a bottom gate TFT may be formed.

  The separation layer 802 is formed using an amorphous semiconductor film, a polycrystalline semiconductor film, or a semi-amorphous semiconductor film. For example, a layer containing silicon as its main component such as amorphous silicon, polycrystalline silicon, single crystal silicon, or semi-amorphous silicon can be used. The separation layer 802 can be formed by a sputtering method, a plasma CVD method, or the like. In this embodiment, amorphous silicon with a thickness of about 500 nm is formed by a sputtering method and used as the separation layer 802.

Note that a semi-amorphous semiconductor film (hereinafter also referred to as a SAS film) is a film including a semiconductor having an intermediate structure between an amorphous semiconductor film and a semiconductor (including single crystal and polycrystal) film having a crystal structure. This semi-amorphous semiconductor film is a semiconductor film having a third state that is stable in terms of free energy, and is a crystalline film having short-range order and lattice distortion, and has a grain size of 0.5 to 20 nm. And can be dispersed in the non-single-crystal semiconductor film. The semi-amorphous semiconductor film has its Raman spectrum peak shifted to a lower wavenumber side than 520 cm ^−1, and the diffraction peaks of (111) and (220) which are considered to be derived from the Si crystal lattice in X-ray diffraction. Observed. Further, in order to terminate dangling bonds (dangling bonds), at least 1 atomic% or more of hydrogen or halogen is contained. In this specification, for convenience, such a semiconductor film is referred to as a semi-amorphous semiconductor (SAS) film. Further, by adding a rare gas element such as helium, argon, krypton, or neon to further promote lattice distortion, stability is improved and a good semi-amorphous semiconductor film can be obtained. Note that a microcrystalline semiconductor film is also included in the semi-amorphous semiconductor film.

The SAS film can be obtained by glow discharge decomposition of a gas containing silicon. A typical gas containing silicon is SiH ₄ , and Si ₂ H ₆ , SiH ₂ Cl ₂ , SiHCl ₃ , SiCl ₄ , SiF _{4, and the} like can also be used. In addition, it is easy to form a SAS film by diluting the gas containing silicon with hydrogen or a gas obtained by adding one or more kinds of rare gas elements selected from helium, argon, krypton, and neon to hydrogen. Can be. It is preferable to dilute the gas containing silicon in a range of a dilution rate of 2 to 1000 times. Furthermore, a gas containing silicon, a carbide gas such as CH ₄ or C ₂ H ₆ , a germanium gas such as GeH ₄ or GeF ₄ , F _2, or the like is mixed, so that the energy bandwidth is 1.5-2. It may be adjusted to .4 eV, or 0.9 to 1.1 eV.

  The base films 803 and 804 are formed using an insulating film such as a silicon oxide film, a silicon nitride film, a silicon nitride film containing oxygen, or a silicon oxide film containing nitrogen. In this embodiment, a silicon nitride film containing oxygen is stacked as the first base film 803 in a thickness of 10 to 200 nm, and a silicon oxide film containing nitrogen is stacked as the second base film 804 in order of 50 to 200 nm.

  After forming the electrodes 681 to 686 based on the description in Embodiment Mode 1, a third interlayer insulating film 806 is formed over the second interlayer insulating film 672, and electrodes 811 to 816 functioning as antennas are formed. The electrodes 811 to 816 functioning as an antenna are formed using a conductive material by a CVD method, a sputtering method, a printing method such as screen printing or gravure printing, a droplet discharge method, a dispenser method, or a plating method. Conductive materials are aluminum (Al), titanium (Ti), silver (Ag), copper (Cu), gold (Au), platinum (Pt) nickel (Ni), palladium (Pd), tantalum (Ta), molybdenum An element selected from (Mo) or an alloy material or a compound material containing these elements as a main component is formed in a single layer structure or a laminated structure.

  A protective layer 807 is formed over the third interlayer insulating film 806 so as to cover the electrodes 811 to 816 functioning as an antenna. The protective layer 807 is formed using a material that can protect the electrodes 811 to 816 functioning as an antenna when the peeling layer 802 is removed by etching later. For example, the protective layer 807 can be formed by applying an epoxy resin, an acrylate resin, or a silicon resin soluble in water or alcohols over the entire surface (see FIG. 18B).

  Next, a groove 808 for separating the separation layer 802 is formed (see FIG. 19A). The groove 808 may be of a size that exposes the release layer 802. The groove 808 can be formed by etching, dicing, scribing, laser irradiation, or the like.

Next, the peeling layer 802 is removed by etching (see FIG. 19B). In this embodiment mode, halogen fluoride is used as an etching gas, and the gas is introduced from the groove 808. In this embodiment, for example, ClF ₃ (chlorine trifluoride) is used, and the temperature is 350 ° C., the flow rate is 300 sccm, the atmospheric pressure is 800 Pa, and the time is 3 hours. Further, a gas in which nitrogen is mixed with ClF ₃ gas may be used. By using halogen fluoride such as ClF ₃ , the peeling layer 802 can be selectively etched and the substrate 601 can be peeled off. The halogen fluoride may be either a gas or a liquid.

  Next, the memory cell array including the peeled TFTs 691 and 692 and the logic circuit including the TFTs 693 and 694 are attached to the support 821 using an adhesive 822 (see FIG. 20). As the adhesive 822, a material capable of bonding the support 821 and the base film 803 is used. As the adhesive 822, for example, various curable adhesives such as a reactive curable adhesive, a thermosetting adhesive, a photocurable adhesive such as an ultraviolet curable adhesive, and an anaerobic adhesive can be used.

  As the support 821, an organic material such as flexible paper or plastic can be used. Alternatively, a flexible inorganic material may be used as the support 821. The support 821 preferably has a high thermal conductivity of about 2 to 30 W / mK in order to diffuse the heat generated in the integrated circuit.

  Note that a method for peeling the integrated circuit of the memory cell array and the logic circuit from the substrate 601 is not limited to the method using etching of a layer containing silicon as a main component as shown in this embodiment mode, and other various methods can be used. Can be used. For example, a metal oxide film can be provided between a substrate having high heat resistance and an integrated circuit, and the integrated circuit can be peeled by weakening the metal oxide film by crystallization. Further, for example, the integrated layer can be peeled from the substrate by breaking the peeling layer by laser light irradiation. Further, for example, the integrated circuit can be peeled from the substrate by mechanically removing the substrate on which the integrated circuit is formed or removing the substrate by etching with a solution or gas.

  In addition, the surface of the object has a curved surface, and the support of the semiconductor device having the memory cell array and the logic circuit bonded to the curved surface has a curved surface drawn by the movement of the bus such as a cone surface or a column surface. In the case of bending so as to have, it is desirable to align the direction of the bus and the direction in which the TFT carrier moves. With the above configuration, even if the support is bent, it can be suppressed that the characteristics of the TFT are affected thereby. In addition, by setting the ratio of the area occupied by the island-shaped semiconductor film in the integrated circuit to 1 to 30%, even if the support is bent, the influence on the characteristics of the TFT can be further suppressed.

  Through the above manufacturing process, a semiconductor device capable of wireless communication using the IC of the present invention is manufactured.

  Note that in this embodiment mode, an antenna is formed over the same substrate as the substrate over which the semiconductor device is formed. However, after the semiconductor device is formed, the antenna is formed over the substrate over which the semiconductor device is formed by a printing method. It may be formed. Alternatively, the antenna may be formed separately from the substrate over which the semiconductor device is formed, the substrate over which the semiconductor device is formed, and the substrate over which the antenna is formed are bonded to electrically connect the semiconductor device and the antenna.

  An example in which the antenna is formed separately from the substrate on which the semiconductor device is formed, the substrate on which the semiconductor device is formed and the substrate on which the antenna is formed is bonded, and the semiconductor device and the antenna are electrically connected to each other. 21 will be described.

  A terminal portion 1605 including a terminal electrode and the like is provided over a substrate 1601 provided with a semiconductor device 1602 including a memory cell array and a logic circuit.

  Then, an antenna 1612 provided over a substrate 1611 different from the substrate 1601 is electrically connected to the terminal portion 1605. A substrate 1601 and a substrate 1611 provided with an antenna 1612 are attached to each other so as to be connected to the terminal portion 1605. Conductive particles 1603 and a resin 1604 are provided between the substrate 1601 and the substrate 1611. The antenna 1612 and the terminal portion 1605 are electrically connected by the conductive particles 1603. Note that the antenna 1612 illustrated in FIG. 23 is equivalent to the antenna 917 illustrated in FIG. 21, and the antenna 1612 and the antenna 917 are electrically connected to a ground potential (GND) and a circuit such as the power supply circuit 915 and the high-frequency circuit 914. It is connected to the.

  This embodiment can be used in combination with the above embodiment and other examples.

  In this embodiment, the structure and operation of a semiconductor device capable of wireless communication using an IC created using the present invention will be described with reference to FIGS.

  First, the configuration will be described. As shown in FIG. 21, a semiconductor device (also referred to as an ID chip, an IC chip, an IC tag, an ID tag, a wireless chip, or an RFID) 931 manufactured using the present invention includes an antenna 917, a high-frequency circuit 914, and a power supply circuit 915. , A reset circuit 911, a rectifier circuit 906, a demodulation circuit 907, an analog amplifier 908, a clock generation circuit 903, a modulation circuit 909, a signal output control circuit 901, a CRC circuit 902, and a mask ROM 900. The power supply circuit 915 includes circuit blocks including a rectifier circuit 913 and a storage capacitor 912. Further, as shown in FIG. 6, the mask ROM 900 includes a memory cell array 920, a column decoder 921, and a row decoder 922.

  Here, as the antenna 917, any of a dipole antenna, a patch antenna, a loop antenna, and a Yagi antenna can be used.

  In addition, a method for transmitting and receiving a radio signal in the antenna 917 may be any of an electromagnetic coupling method, an electromagnetic induction method, and a radio wave method.

  Note that the semiconductor device 931 manufactured using the present invention is applied to the semiconductor device 221 of FIG.

  Next, the operation of the semiconductor device 931 created using the present invention will be described. A radio signal is transmitted from an antenna unit 222 electrically connected to an interrogator (also referred to as a reader / writer) 223. The wireless signal includes a command from the interrogator (also referred to as a reader / writer) 223 to the semiconductor device 931.

  A radio signal received by the antenna 917 is sent to each circuit block via the high frequency circuit 914. A signal sent to the power supply circuit 915 through the high frequency circuit 914 is input to the rectifier circuit 913.

  Here, the rectifier circuit 913 has a function of adjusting the polarity of the radio signal. The signal is rectified and further smoothed by the storage capacitor 912. Then, a high power supply potential (VDD) is generated.

  The radio signal received by the antenna 917 is also sent to the rectifier circuit 906 via the high frequency circuit 914. The signal is rectified and demodulated by a demodulation circuit 907. The demodulated signal is amplified by an analog amplifier 908.

  Further, the radio signal received by the antenna 917 is also sent to the clock generation circuit 903 via the high frequency circuit 914. The signal sent to the clock generation circuit 903 is divided to become a basic clock signal. Here, the basic clock signal is sent to each circuit block and used for signal latching, signal selection, and the like.

  The signal amplified by the analog amplifier 908 and the basic clock signal are sent to the code extraction circuit 904. The code extraction circuit 904 extracts a command sent from the interrogator (also referred to as a reader / writer) 223 to the semiconductor device 931 from the signal amplified by the analog amplifier 908. A signal for controlling the code determination circuit 905 is also created.

  The instruction extracted by the code extraction circuit 904 is sent to the code determination circuit 905. The code determination circuit 905 determines what instruction is sent from the interrogator (also referred to as a reader / writer) 223. It also has a role of controlling the CRC circuit 902, the mask ROM 900, and the signal output control circuit 901.

  Thus, it is determined what command is sent from the interrogator (also referred to as reader / writer) 223, and the CRC circuit 902, the mask ROM 900, and the signal output control circuit 901 are operated according to the determined command. Then, a signal including unique data such as an ID number stored or written in the mask ROM 900 is output.

  Here, the mask ROM 900 has a memory cell array 920, a column decoder 921, and a row decoder 922.

  The signal output control circuit 901 also has a role of changing a signal including unique data such as an ID number stored or written in the mask ROM 900 into a signal encoded by an encoding method conforming to a standard such as ISO. .

  Finally, the signal sent to the antenna 917 is modulated by the modulation circuit 909 according to the encoded signal.

  The modulated signal is received by an antenna unit 222 that is electrically connected to an interrogator (also referred to as a reader / writer) 223. The received signal is analyzed by an interrogator (also referred to as a reader / writer) 223, and unique data such as the ID number of the semiconductor device 931 created using the present invention can be recognized.

  In a wireless communication system using a semiconductor device 931 capable of wireless communication using an IC created using the present invention, a semiconductor device 931, an interrogator (also referred to as a reader / writer) having a known configuration, and an interrogator (reader) An antenna that is electrically connected to an interrogator (also referred to as a reader / writer) and a control terminal that controls an interrogator (also referred to as a reader / writer) can be used. A communication method between the semiconductor device 931 and an antenna electrically connected to an interrogator (also referred to as a reader / writer) is unidirectional communication or bidirectional communication, and includes a space division multiplexing method and a polarization plane division multiplexing method. Any of frequency division multiplexing, time division multiplexing, code division multiplexing, and orthogonal frequency division multiplexing can be used.

  The wireless signal is a signal obtained by modulating a carrier wave. The modulation of the carrier wave is analog modulation or digital modulation, and may be any of amplitude modulation, phase modulation, frequency modulation, and spread spectrum.

  The frequency of the carrier wave is 300 GHz to 3 THz which is a submillimeter wave, 30 GHz to 300 GHz which is a millimeter wave, 3 GHz to 30 GHz which is a microwave, 300 MHz to 3 GHz which is an ultrashort wave, 30 MHz to 300 MHz which is an ultrashort wave, and 3 MHz which is a short wave. Any frequency of ˜30 MHz, medium wave of 300 KHz to 3 MHz, long wave of 30 KHz to 300 KHz, and super long wave of 3 KHz to 30 KHz can be used.

  Note that this embodiment can be used in combination with any description in Embodiment Mode and other embodiments if necessary.

  In this embodiment, an example in which an external antenna is attached to a semiconductor device formed using the present invention will be described with reference to FIGS.

  In FIG. 22A, the periphery of the semiconductor device is covered with one antenna. An antenna 1001 is formed over a substrate 1000, and a semiconductor device 1002 formed using the present invention is electrically connected. In FIG. 22A, the periphery of the semiconductor device 1002 is covered with the antenna 1001. However, the entire surface of the substrate is covered with the antenna 1001, and the semiconductor device 1002 including electrodes is attached thereon. Also good.

  FIG. 22B illustrates an example of a coil antenna in which an antenna is arranged around a semiconductor device. An antenna 1004 is formed over a substrate 1003 and a semiconductor device 1005 formed using the present invention is electrically connected. The arrangement of the antennas is an example and is not limited to this.

  FIG. 22C illustrates an antenna for high frequency. An antenna 1007 is formed over a substrate 1006, and a semiconductor device 1008 formed using the present invention is electrically connected.

  FIG. 22D illustrates an antenna that is 180 degrees omnidirectional (same reception is possible from any direction). An antenna 1010 is formed over a substrate 1009 and a semiconductor device 1011 formed using the present invention is electrically connected.

  FIG. 22E shows an antenna elongated in a rod shape. An antenna 1013 is formed over a substrate 1012, and a semiconductor device 1014 formed using the present invention is electrically connected.

  FIG. 24A shows another example of a coil antenna. An antenna 1016 is formed over a substrate 1015, and a semiconductor device 1017 formed using the present invention is electrically connected. Note that one end of the antenna 1016 is connected to the semiconductor device 1017, and the other end of the antenna 1016 is connected to a wiring 1018 formed in a different process from the antenna 1016. The semiconductor device 1017 is electrically connected. Note that although the wiring 1018 is formed above the antenna 1016 in FIG. 24A, it may be formed below.

  FIG. 24B illustrates another example of a coil antenna. An antenna 1026 is formed over a substrate 1025, and a semiconductor device 1027 formed using the present invention is electrically connected. Note that one end of the antenna 1026 is connected to the semiconductor device 1027, and the other end of the antenna 1026 is connected to a wiring 1028 formed in a different process from the antenna 1026, The semiconductor device 1027 is electrically connected. Note that although the wiring 1028 is formed above the antenna 1026 in FIG. 24B, it may be formed below the antenna 1026.

  The semiconductor device formed by using the present invention and connection to these antennas can be performed by a known method. For example, the antenna and the semiconductor device may be connected using wire bonding connection or bump connection, or a method may be adopted in which one surface of the circuit formed as a chip is attached to the antenna as an electrode. In this method, it can be attached using an ACF (anisotropy conductive film).

  The length required for the antenna differs depending on the frequency used for reception. For example, when the frequency is 2.45 GHz, it may be about 60 mm (1/2 wavelength) if a half-wave dipole antenna is provided, and about 30 mm (¼ wavelength) if a monopole antenna is provided.

  Note that the example shown in this embodiment is just an example, and does not limit the shape of the antenna. The present invention can be implemented with any shape of antenna. The present embodiment can be realized by using a configuration including any combination of the embodiment mode and other embodiments.

  According to the present invention, a semiconductor device that can easily form unique data such as an ID number and can communicate using wireless communication can be manufactured.

  Further, in the ROM TFT in the semiconductor device, since the current density at the contact portion of the source region and the current density at the contact portion of the drain region can be made equal, only one of the source region and the drain region generates heat. Can be prevented. Thus, a semiconductor device having ROM TFTs with improved reliability and capable of communication using wireless communication can be manufactured.

1 is a top view of a memory cell array of the present invention. The figure which shows the outline | summary of an individual authentication system. The block diagram which shows the structure of the conventional semiconductor device. The block diagram which shows the structure of the conventional semiconductor device. The circuit diagram of the non-volatile memory circuit of this invention. 1 is a block diagram illustrating a configuration of a semiconductor device of the present invention. Sectional drawing of the semiconductor device of this invention. 1 is a top view of a semiconductor device of the present invention. Sectional drawing of the semiconductor device of this invention. The figure which shows the process of the laser exposure by the laser direct drawing apparatus in this invention. The figure which shows the process of the conventional laser exposure. 9 is a cross-sectional view illustrating a manufacturing process of a semiconductor device of the present invention. 9 is a cross-sectional view illustrating a manufacturing process of a semiconductor device of the present invention. 9 is a cross-sectional view illustrating a manufacturing process of a semiconductor device of the present invention. Sectional drawing of the semiconductor device of this invention. 1 is a top view of a semiconductor device of the present invention. Sectional drawing of the semiconductor device of this invention. 9 is a cross-sectional view illustrating a manufacturing process of a semiconductor device of the present invention. 9 is a cross-sectional view illustrating a manufacturing process of a semiconductor device of the present invention. Sectional drawing of the semiconductor device of this invention. 1 is a block diagram illustrating a configuration of a semiconductor device of the present invention. 1 is a top view of a semiconductor device of the present invention. Sectional drawing of the semiconductor device of this invention. 1 is a top view of a semiconductor device of the present invention.

Explanation of symbols

11 memory cell array 14 output line 15 column decoder 16 row decoder 16 row decoder 17 control line 18 n-channel TFT
19 n-channel TFT
20 n-channel TFT
21 n-channel TFT
22 High voltage power supply (VDD)
23 Low voltage power supply (VSS or GND)
24 bit line (data line)
25 bit line (data line)
103 Gate electrode 103a Lower gate electrode 103b Upper gate electrode 104 Gate electrode 104a Lower gate electrode 104b Upper gate electrode 105 Gate electrode 106 Gate electrode 107 Word line 108 Word line 109 Bit line 110 Bit line 113 Power line 118 TFT
119 TFT
120 TFT
121 TFT
131 island-like semiconductor film 132 island-like semiconductor film 133 island-like semiconductor film 134 island-like semiconductor film 141 contact hole 142 contact hole 151 substrate 153 base film 154 gate insulating film 155 interlayer insulating film 156 interlayer insulating film 161 channel formation region 162a low concentration Impurity region 163 region 164 region 171a sidewall 171b sidewall 181 channel formation region 182a low concentration impurity region 183 region 184 region 191a sidewall 191b sidewall 200 semiconductor device 201 antenna circuit 202 rectifier circuit 203 stable power supply circuit 205 modulation circuit 206 amplifier 207 Logic circuit 208 Amplifier 209 Logic circuit 209 Logic circuit 211 Memory circuit 212 Memory control circuit 213 Demodulation circuit 221 Semiconductor device 222 Unit 223 interrogator 224 bag 241 antenna coil 242 capacity 243 diode 245 capacitor 401 gate lines 402 lines 403 lines 404 lines 405 lines 406 lines 407 lines 411 TFT
412 Island-like semiconductor film 412 Island-like semiconductor film 415 Contact hole 415 Contact hole 421 TFT
422 Island-like semiconductor film 425 Contact hole 443 Gate electrode 443a Lower gate electrode 443b Upper gate electrode 444 Gate electrode 444a Lower gate electrode 444b Upper gate electrode 451 Substrate 452 Base film 453 Base film 454 Gate insulating film 455 Interlayer insulating film 456 Interlayer insulating film 461 Channel formation region 462a Low-concentration impurity region 462b Low-concentration impurity region 463 region 464 region 471a Side wall 471b Side wall 481 Channel formation region 483 Region 484 Region 491a Side wall 491b Side wall 601 Substrate 602 Base film 603 Linear beam 604 Semiconductor film 605 crystalline semiconductor film 611 island-like semiconductor film 612 island-like semiconductor film 613 island-like semiconductor film 614 island-like semiconductor film 615 gate insulating film 616 resist 6 17 resist 618 resist 621 gate electrode 621a lower gate electrode 621b upper gate electrode 622 gate electrode 622a lower gate electrode 622b upper gate electrode 623 gate electrode 623a lower gate electrode 623b upper gate electrode 624 gate electrode 624a lower gate electrode 624b upper gate electrode 626 side Wall 626a Side wall 626b Side wall 627 Side wall 627a Side wall 627b Side wall 628 Side wall 628a Side wall 628b Side wall 629 Side wall 629a Side wall 629b Side wall 631 Channel formation region 632a Low concentration impurity region 632b Low concentration impurity region 633 region 634 region 641 channel formation region 642a low Impurity region 642b low concentration impurity region 643 region 644 region 651 channel formation region 652a low concentration impurity region 652b low concentration impurity region 653 region 654 region 661 channel formation region 663 region 664 region 671 interlayer insulation film 672 interlayer insulation film 673 contact hole 673a Contact hole 674 Contact hole 674a Contact hole 676 Contact hole 676a Contact hole 677 Contact hole 677a Contact hole 678 Contact hole 678a Contact hole 679 Contact hole 679a Contact hole 680 Contact hole 681 Electrode 682 Electrode 683 Electrode 684 Electrode 685 Electrode 686 Electrode 691 TFT
692 TFT
693 TFT
694 TFT
695 CMOS circuit 701 Island-like semiconductor film 702 Island-like semiconductor film 703 Island-like semiconductor film 704 Island-like semiconductor film 713 Gate electrode 714 Gate electrode 716 Power line 717 Power line 718 Bit line 719 Bit line 721 Contact hole 721a Contact hole 721b Contact hole 722 Contact hole 723 Contact hole 723a Contact hole 723b Contact hole 724 Contact hole 725 Contact hole 725a Contact hole 725b Contact hole 726 Contact hole 726a Contact hole 726b Contact hole 727 Contact hole 728 Contact hole 731 Substrate 732 Gate insulating film 734 Interlayer Insulating film 735 Interlayer insulating film 741 Channel formation region 742a Low-concentration impurity region 742b Low-concentration impurity region 743 Region 744 Region 751 Channel formation region 752a Low-concentration impurity region 753 Region 754 Region 761 Gate electrode 761a Lower gate electrode 761b Upper gate electrode 762 Gate electrode 762a Lower gate electrode 762b Upper gate electrode 771a Side Wall 771b Side wall 772a Side wall 772b Side wall 781 TFT
782 TFT
802 Peeling layer 803 Base film 804 Base film 806 Interlayer insulating film 807 Protective layer 808 Groove 811 Electrode 812 Electrode 813 Electrode 814 Electrode 815 Electrode 816 Electrode 821 Support 822 Adhesive 900 Mask ROM
901 Signal output control circuit 902 CRC circuit 903 Clock generation circuit 904 Code extraction circuit 905 Code determination circuit 906 Rectification circuit 907 Demodulation circuit 908 Analog amplifier 909 Modulation circuit 911 Reset circuit 912 Retention capacity 913 Rectification circuit 914 High frequency circuit 915 Power supply circuit 917 Antenna 920 Memory cell array 921 Column decoder 922 Row decoder 931 Semiconductor device 1000 Substrate 1001 Antenna 1002 Semiconductor device 1003 Substrate 1004 Antenna 1005 Semiconductor device 1006 Substrate 1007 Antenna 1008 Semiconductor device 1009 Substrate 1010 Antenna 1011 Semiconductor device 1012 Substrate 1013 Antenna 1014 Semiconductor device 1015 Substrate 1016 Antenna 1017 Semiconductor device 1018 Wiring 1025 Substrate 1026 Antenna 1 027 Semiconductor device 1028 Wiring 1601 Substrate 1602 Semiconductor device 1603 Conductive particles 1604 Resin 1605 Terminal portion 1611 Substrate 1612 Antenna

Claims (15)

On the board
An island-shaped semiconductor film having a channel formation region and a source region or a drain region;
A gate insulating film on the island-shaped semiconductor film;
On the island-shaped semiconductor film, a gate electrode through the gate insulating film,
A thin film transistor having
An interlayer insulating film on the thin film transistor;
A first contact hole formed in the interlayer insulating film and including a plurality of contact holes reaching one of the source region or the drain region;
A second contact hole formed in the interlayer insulating film and reaching the other of the source region or the drain region;
Have
A diameter of the second contact hole is larger than a diameter of each of the plurality of contact holes included in the first contact hole;
A semiconductor device, wherein the total bottom area of the first contact holes is equal to the bottom area of the second contact holes. On the board
A first channel formation region; a first island-shaped semiconductor film having a first source region or drain region;
A gate insulating film on the first island-shaped semiconductor film;
A first gate electrode on the first island-shaped semiconductor film with the gate insulating film interposed therebetween;
A first thin film transistor having:
A second island-shaped semiconductor film having a second channel formation region and a second source region or drain region on the substrate;
The gate insulating film on the second island-shaped semiconductor film;
A second gate electrode on the second island-shaped semiconductor film via the gate insulating film;
A second thin film transistor having:
An interlayer insulating film on the first and second thin film transistors;
A first contact hole formed in the interlayer insulating film and including a plurality of contact holes reaching one of the first source region or the drain region;
A second contact hole formed in the interlayer insulating film and including a plurality of contact holes reaching one of the second source region or drain region;
A third contact hole formed in the interlayer insulating film and reaching the other of the first source region or the drain region or the other of the second source region or the drain region;
Have
The diameter of the third contact hole is larger than the diameters of the plurality of contact holes included in the first contact hole and the plurality of contact holes included in the second contact hole,
The semiconductor device, wherein the total bottom area of the first contact hole, the total bottom area of the second contact hole, and the bottom area of the third contact hole are equal. On the board
A first channel formation region; a first island-shaped semiconductor film having a first source region or drain region;
A first gate insulating film on the first island-shaped semiconductor film;
A first gate electrode on the first island-shaped semiconductor film with the first gate insulating film interposed therebetween;
A first thin film transistor having:
A second island-shaped semiconductor film having a second channel formation region and a second source region or drain region on the substrate;
A second gate insulating film on the second island-shaped semiconductor film;
A second gate electrode on the second island-shaped semiconductor film via the second gate insulating film;
A second thin film transistor having:
An interlayer insulating film on the first and second thin film transistors;
A first contact hole formed in the interlayer insulating film and reaching one of the first source region or the drain region;
A second contact hole formed in the interlayer insulating film and reaching the other of the first source region or the drain region;
A third contact hole formed in the interlayer insulating film and including a plurality of contact holes reaching one of the second source region or the drain region;
A fourth contact hole formed in the interlayer insulating film and reaching the other of the second source region or the drain region;
Have
The bottom area of the first contact hole and the bottom area of the second contact hole are equal,
A diameter of the fourth contact hole is larger than a diameter of each of the plurality of contact holes included in the third contact hole;
The total bottom area of the third contact hole and the bottom area of the fourth contact hole are larger than the bottom area of the first contact hole and the bottom area of the second contact hole, respectively. A semiconductor device characterized by the above. In claim 1,
The thin film transistor is used in a nonvolatile memory circuit. In claim 2,
The semiconductor device, wherein the first and second thin film transistors are used in a nonvolatile memory circuit. In claim 3,
The semiconductor device, wherein the second thin film transistor is used in a nonvolatile memory circuit, and the first thin film transistor is used in a logic circuit that controls the nonvolatile memory circuit. An island-shaped semiconductor film is formed on the substrate,
Forming a gate insulating film on the island-shaped semiconductor film;
Forming a gate electrode on the gate insulating film;
In the island-like semiconductor film, an impurity imparting one conductivity is added to form a channel formation region, a source region or a drain region in the island-like semiconductor film,
Covering the island-shaped semiconductor film, the gate insulating film, and the gate electrode, an interlayer insulating film is formed,
Forming a first contact hole having a plurality of contact holes reaching one of the source region or the drain region in the interlayer insulating film;
Forming a second contact hole reaching the other of the source region or the drain region in the interlayer insulating film;
A diameter of the second contact hole is larger than a diameter of each of the plurality of contact holes included in the first contact hole;
A method for manufacturing a semiconductor device, wherein the total bottom area of the first contact holes is equal to the bottom area of the second contact holes. Forming a first island-shaped semiconductor film and a second island-shaped semiconductor film on a substrate;
Forming a gate insulating film on the first and second island-shaped semiconductor films;
Forming a first gate electrode on the first island-shaped semiconductor film and the gate insulating film;
Forming a second gate electrode on the second island-shaped semiconductor film and the gate insulating film;
An impurity imparting one conductivity is added to the island-shaped semiconductor film, and a first channel formation region, a first source region, or a drain region is added to the first island-shaped semiconductor film. Forming a second channel formation region, a second source region or a drain region in the two island-shaped semiconductor films;
Covering the first and second island-shaped semiconductor films, the gate insulating film, and the first and second gate electrodes, an interlayer insulating film is formed,
Forming a first contact hole having a plurality of contact holes reaching one of the first source region or the drain region in the interlayer insulating film;
Forming a second contact hole having a plurality of contact holes reaching one of the second source region or the drain region in the interlayer insulating film;
Forming a third contact hole reaching the other of the first source region or drain region or the other of the second source region or drain region in the interlayer insulating film;
The diameter of the third contact hole is larger than the diameters of the plurality of contact holes included in the first contact hole and the plurality of contact holes included in the second contact hole,
A method for manufacturing a semiconductor device, wherein the total bottom area of the first contact holes, the total bottom area of the second contact holes, and the bottom area of the third contact holes are equal. Forming a first island-like semiconductor film and a second island-like semiconductor film on the substrate;
Forming a gate insulating film on the first and second island-shaped semiconductor films;
Forming a first gate electrode on the first island-shaped semiconductor film and the gate insulating film;
Forming a second gate electrode on the second island-shaped semiconductor film and the gate insulating film;
A first impurity imparting one conductivity is added to the first island-shaped semiconductor film, and a first channel formation region, a first source region, or a first impurity region is added to the first island-shaped semiconductor film. Forming a drain region,
A second impurity imparting one conductivity is added to the second island-shaped semiconductor film, and a second channel formation region, a second source region, or a second impurity region is added to the second island-shaped semiconductor film. Forming a drain region,
Covering the first and second island-shaped semiconductor films, the gate insulating film, and the first and second gate electrodes, an interlayer insulating film is formed,
Forming a first contact hole reaching one of the first source region and the drain region in the interlayer insulating film;
Forming a second contact hole reaching the other of the first source region or the drain region in the interlayer insulating film;
Forming a third contact hole having a plurality of contact holes reaching one of the second source region or the drain region in the interlayer insulating film;
Forming a fourth contact hole reaching the other of the second source region or the drain region in the interlayer insulating film;
The bottom area of the first contact hole and the bottom area of the second contact hole are equal,
A diameter of the fourth contact hole is larger than a diameter of each of the plurality of contact holes included in the third contact hole;
The total bottom area of the third contact hole and the bottom area of the fourth contact hole are larger than the bottom area of the first contact hole and the bottom area of the second contact hole, respectively. A method for manufacturing a semiconductor device. In claim 7,
The method for manufacturing a semiconductor device, wherein the thin film transistor is used in a nonvolatile memory circuit. In claim 8,
The method for manufacturing a semiconductor device, wherein the first and second thin film transistors are used in a nonvolatile memory circuit. In claim 9,
The method for manufacturing a semiconductor device, wherein the second thin film transistor is used for a nonvolatile memory circuit, and the first thin film transistor is used for a logic circuit for controlling the nonvolatile memory circuit. In claim 7,
The plurality of contact holes included in the first contact hole are formed by using a stepper device, and the second contact hole is formed by a laser direct drawing device or an electron beam direct drawing device. Device fabrication method. In claim 8,
The plurality of contact holes included in the first contact hole and the plurality of contact holes included in the second contact hole are formed by a stepper device,
The third contact hole is formed by a laser direct drawing apparatus or an electron beam direct drawing apparatus. In claim 9,
A plurality of contact holes included in the first contact hole, the second contact hole, and the third contact hole are each formed by a stepper device,
The method of manufacturing a semiconductor device, wherein the fourth contact hole is formed by a laser direct drawing apparatus or an electron beam direct drawing apparatus.

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