JP2008019292A - Photocurable composition and pattern forming method using it - Google Patents

Photocurable composition and pattern forming method using it Download PDF

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Publication number
JP2008019292A
JP2008019292A JP2006189852A JP2006189852A JP2008019292A JP 2008019292 A JP2008019292 A JP 2008019292A JP 2006189852 A JP2006189852 A JP 2006189852A JP 2006189852 A JP2006189852 A JP 2006189852A JP 2008019292 A JP2008019292 A JP 2008019292A
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Japan
Prior art keywords
composition
acrylate
meth
photocurable composition
mold
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JP2006189852A
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Japanese (ja)
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JP5117002B2 (en
Inventor
Yasumasa Kawabe
Takashi Takayanagi
保雅 河邉
丘 高柳
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Fujifilm Corp
富士フイルム株式会社
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Priority to JP2006189852A priority Critical patent/JP5117002B2/en
Publication of JP2008019292A publication Critical patent/JP2008019292A/en
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Publication of JP5117002B2 publication Critical patent/JP5117002B2/en
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