JP2007281388A - レーザ装置 - Google Patents
レーザ装置 Download PDFInfo
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- JP2007281388A JP2007281388A JP2006109379A JP2006109379A JP2007281388A JP 2007281388 A JP2007281388 A JP 2007281388A JP 2006109379 A JP2006109379 A JP 2006109379A JP 2006109379 A JP2006109379 A JP 2006109379A JP 2007281388 A JP2007281388 A JP 2007281388A
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- H—ELECTRICITY
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- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/091—Processes or apparatus for excitation, e.g. pumping using optical pumping
- H01S3/094—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light
- H01S3/0941—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light of a laser diode
- H01S3/09415—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light of a laser diode the pumping beam being parallel to the lasing mode of the pumped medium, e.g. end-pumping
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- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/106—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity
- H01S3/1062—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity using a controlled passive interferometer, e.g. a Fabry-Perot etalon
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- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/11—Mode locking; Q-switching; Other giant-pulse techniques, e.g. cavity dumping
- H01S3/1106—Mode locking
- H01S3/1112—Passive mode locking
- H01S3/1115—Passive mode locking using intracavity saturable absorbers
- H01S3/1118—Semiconductor saturable absorbers, e.g. semiconductor saturable absorber mirrors [SESAMs]; Solid-state saturable absorbers, e.g. carbon nanotube [CNT] based
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- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
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- H—ELECTRICITY
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- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/06—Construction or shape of active medium
- H01S3/0602—Crystal lasers or glass lasers
- H01S3/0604—Crystal lasers or glass lasers in the form of a plate or disc
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/06—Construction or shape of active medium
- H01S3/0602—Crystal lasers or glass lasers
- H01S3/0606—Crystal lasers or glass lasers with polygonal cross-section, e.g. slab, prism
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/081—Construction or shape of optical resonators or components thereof comprising three or more reflectors
- H01S3/0813—Configuration of resonator
- H01S3/0816—Configuration of resonator having 4 reflectors, e.g. Z-shaped resonators
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- H—ELECTRICITY
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- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/16—Solid materials
- H01S3/1601—Solid materials characterised by an active (lasing) ion
- H01S3/1603—Solid materials characterised by an active (lasing) ion rare earth
- H01S3/1618—Solid materials characterised by an active (lasing) ion rare earth ytterbium
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/16—Solid materials
- H01S3/163—Solid materials characterised by a crystal matrix
- H01S3/1675—Solid materials characterised by a crystal matrix titanate, germanate, molybdate, tungstate
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- Electromagnetism (AREA)
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- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Nanotechnology (AREA)
- Lasers (AREA)
Abstract
【解決手段】共振器5と、該共振器5内に配置された光学異方性を有する固体レーザ媒質6と、該固体レーザ媒質6に励起光を入射させる励起手段10とを備えたレーザ装置1において、共振器5内に、発振光Loを、固体レーザ媒質6の第1の結晶軸に略平行な方向に偏光した直線偏光光とし、励起手段10を、励起光Leを直線偏光光とし、その偏光方向を第1の結晶軸と交差する方向として固体レーザ媒質6に入射させるものとし、固体レーザ媒質6における、励起光の偏光方向についての励起光の吸収係数が、第1の結晶軸についての励起光の吸収係数よりも大きくなるように構成する。
【選択図】図2
Description
ここで、Kは定数、このKの値はパルス波形によって異なり、ガウス型では0.44、sech2型では0.315である。
オプティクス レターズ(OPTICS LETTERS)、2001年発行、第26巻、1723頁(Vol.26,1723(2001))
発振光を、前記固体レーザ媒質の第1の結晶軸に略平行な方向に偏光した直線偏光光とし、
前記励起手段が、前記励起光を直線偏光光とし、その偏光方向を前記第1の結晶軸と交差する方向として前記固体レーザ媒質に入射させるものであり、
前記固体レーザ媒質における、前記励起光の偏光方向についての前記励起光の吸収係数が、前記第1の結晶軸についての前記励起光の吸収係数よりも大きいことを特徴とするものである。
3 波長可変レーザ装置
5 共振器
6 固体レーザ媒質
10 励起手段
11 半導体レーザ
12 非球面レンズ
13、14 シリンドリカルレンズ
15 アクロマティックレンズ
17 出力ミラー
18 ブリュースタ板
19 共振器ミラー
20 SESAM
A 固体レーザ媒質の結晶軸
Le 励起光
Lo 発振光
Pe 励起光の偏光方向
Po 発振光の偏光方向
Claims (9)
- 共振器と、該共振器内に配置された光学異方性を有する固体レーザ媒質と、該固体レーザ媒質に励起光を入射させる励起手段とを備えたレーザ装置において、
発振光を、前記固体レーザ媒質の第1の結晶軸に略平行な方向に偏光した直線偏光光とし、
前記励起手段が、前記励起光を直線偏光光とし、その偏光方向を前記第1の結晶軸と交差する方向として前記固体レーザ媒質に入射させるものであり、
前記固体レーザ媒質における、前記励起光の偏光方向についての前記励起光の吸収係数が、前記第1の結晶軸についての前記励起光の吸収係数よりも大きいことを特徴とするレーザ装置。 - 前記励起光の偏光方向が、前記固体レーザ媒質の第2の結晶軸に略平行な方向であり、
前記固体レーザ媒質における、前記第2の結晶軸についての前記励起光の吸収係数が、各結晶軸についての前記励起光の吸収係数のうち最大値を示すものであることを特徴とする請求項1記載のレーザ装置。 - 前記固体レーザ媒質における、前記第1の結晶軸についての所定の発振波長帯域における発光スペクトル強度の平坦性が、前記励起光の偏光方向についての前記平坦性よりも高いことを特徴とする請求項1または2記載のレーザ装置。
- 前記固体レーザ媒質における、前記第1の結晶軸についての所定の発振波長帯域における発光スペクトル波長分布特性の積分値が、前記励起光の偏光方向についての前記積分値よりも高いことを特徴とする請求項1または2記載のレーザ装置。
- 前記共振器内に、前記発振光を前記直線偏光光とする偏光制御手段を備えたことを特徴とする請求項1から4いずれか1項記載のレーザ装置。
- 前記固体レーザ媒質にイッテルビウムが添加されていることを特徴とする請求項1から5いずれか1項記載のレーザ装置。
- 前記固体レーザ媒質が、KY(WO4)2媒質またはKGd(WO4)2媒質であり、
前記第1の結晶軸がb軸、前記第2の結晶軸がa軸であることを特徴とする請求項1から6いずれか1項記載のレーザ装置。 - 前記共振器内にモード同期素子を備え、モード同期発振を行うものであることを特徴とする請求項1から7いずれか1項記載のレーザ装置。
- 前記共振器内に波長制御素子を備え、波長可変レーザとして用いられるものであることを特徴とする請求項1から7いずれか1項記載のレーザ装置。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006109379A JP2007281388A (ja) | 2006-04-12 | 2006-04-12 | レーザ装置 |
EP07007456A EP1845595A1 (en) | 2006-04-12 | 2007-04-11 | Optically anisotropic solid state laser pumped with perpendicularly polarized pump light |
US11/783,808 US20070242710A1 (en) | 2006-04-12 | 2007-04-12 | Laser apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006109379A JP2007281388A (ja) | 2006-04-12 | 2006-04-12 | レーザ装置 |
Publications (1)
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JP2007281388A true JP2007281388A (ja) | 2007-10-25 |
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2006109379A Abandoned JP2007281388A (ja) | 2006-04-12 | 2006-04-12 | レーザ装置 |
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US (1) | US20070242710A1 (ja) |
EP (1) | EP1845595A1 (ja) |
JP (1) | JP2007281388A (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009231483A (ja) * | 2008-03-21 | 2009-10-08 | Fujifilm Corp | レーザ装置及び顕微鏡 |
JP2012528480A (ja) * | 2009-05-28 | 2012-11-12 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | 改善されたポンプ光の吸収を備えたダイオードでポンピングされた固体−状態のレーザー |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102136670A (zh) * | 2011-01-27 | 2011-07-27 | 山西大学 | 基于偏振耦合的双端端面泵浦固体激光器 |
CN103986055B (zh) * | 2014-06-05 | 2016-10-19 | 西安电子科技大学 | 一种基于Yb:GSO 激光晶体的亚百飞秒锁模激光器 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0437775A (ja) * | 1990-06-01 | 1992-02-07 | Canon Inc | 接触帯電装置及びそれを使用した画像形成装置 |
JPH04137775A (ja) * | 1990-09-28 | 1992-05-12 | Nec Corp | 半導体レーザ励起固体レーザ |
US5517516A (en) * | 1994-01-21 | 1996-05-14 | The Regents Of The University Of California | Optically pumped cerium-doped LiSrAlF6 and LiCaAlF6 |
JPH09321367A (ja) * | 1996-06-03 | 1997-12-12 | Mitsubishi Electric Corp | 固体レーザ装置 |
US20040042522A1 (en) * | 2002-08-30 | 2004-03-04 | Dirk Sutter | Method and apparatus for polarization and wavelength insensitive pumping of solid state lasers |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5761227A (en) * | 1994-08-23 | 1998-06-02 | Laser Power Corporation | Efficient frequency-converted laser |
US7590156B1 (en) * | 2004-05-17 | 2009-09-15 | University Of Central Florida Research Foundation, Inc. | High intensity MHz mode-locked laser |
JP2008028379A (ja) * | 2006-06-22 | 2008-02-07 | Fujifilm Corp | モードロックレーザ装置 |
-
2006
- 2006-04-12 JP JP2006109379A patent/JP2007281388A/ja not_active Abandoned
-
2007
- 2007-04-11 EP EP07007456A patent/EP1845595A1/en not_active Withdrawn
- 2007-04-12 US US11/783,808 patent/US20070242710A1/en not_active Abandoned
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0437775A (ja) * | 1990-06-01 | 1992-02-07 | Canon Inc | 接触帯電装置及びそれを使用した画像形成装置 |
JPH04137775A (ja) * | 1990-09-28 | 1992-05-12 | Nec Corp | 半導体レーザ励起固体レーザ |
US5517516A (en) * | 1994-01-21 | 1996-05-14 | The Regents Of The University Of California | Optically pumped cerium-doped LiSrAlF6 and LiCaAlF6 |
JPH09321367A (ja) * | 1996-06-03 | 1997-12-12 | Mitsubishi Electric Corp | 固体レーザ装置 |
US20040042522A1 (en) * | 2002-08-30 | 2004-03-04 | Dirk Sutter | Method and apparatus for polarization and wavelength insensitive pumping of solid state lasers |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009231483A (ja) * | 2008-03-21 | 2009-10-08 | Fujifilm Corp | レーザ装置及び顕微鏡 |
US7777881B2 (en) | 2008-03-21 | 2010-08-17 | Fujifilm Corporation | Laser device and microscope |
JP2012528480A (ja) * | 2009-05-28 | 2012-11-12 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | 改善されたポンプ光の吸収を備えたダイオードでポンピングされた固体−状態のレーザー |
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Publication number | Publication date |
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EP1845595A1 (en) | 2007-10-17 |
US20070242710A1 (en) | 2007-10-18 |
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