JP2007280866A - Thin membrane device, organic el device and liquid crystal display device, electronic unit, manufacturing method of thin membrane device, manufacturing method of organic el device and manufacturing method of liquid crystal display device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a thin membrane device in which a functional thin membrane having a stable membrane thickness of a flat cross section is laminated in a device forming area divided by barrier rib part, an organic EL device and a liquid crystal display device provided with the above thin membrane device, an electronic unit, a manufacturing method of the thin membrane device, a manufacturing method of the organic EL device and a manufacturing method of the liquid crystal display device. <P>SOLUTION: The organic EL device 20 is provided with a light emitting element part 22 composed of a multi-layered bank 13 to divide a device forming area A and an organic EL functional layer 21 of a multi-layered thin membrane formed by applying a plural kinds of functional liquids on the device forming area A and drying. On a wall face of a side of the device forming area A of the multi-layered bank 13, a first bank 14, a second bank 15 and a third bank 16 are laminated to provide two stepped parts 14a, 15a. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

  The present invention relates to a thin film device formed by discharging a functional liquid containing a functional material onto a substrate and drying the organic EL device, a liquid crystal display device, an electronic apparatus, a method for manufacturing the thin film device, and an organic EL device. The present invention relates to a method for manufacturing the same and a method for manufacturing a liquid crystal display device.

  A partition wall (bank) is provided on a substrate, and a functional material formed by discharging a functional liquid containing a functional material into a partition region partitioned by the bank and evaporating a solvent contained in the functional liquid. Thin film devices are known.

  In such a thin-film device, the thin film formed in the partition region as an important factor that influences the device characteristics is uniformly formed, and has a constant film thickness in the cross-sectional shape. Is desired.

  As a functional thin film device with thin film layers stacked with a uniform thickness, the bank has an affinity for the thin film material liquid, which is the liquid phase material of the thin film layer, and non-affinity for the thin film material liquid A structure in which non-affinity bank layers exhibiting properties are alternately stacked is known (Patent Document 1). In this case, the thin film layer is formed by adjusting the thickness so that the plane including the boundary between the affinity bank layer and the non-affinity bank layer laminated thereon becomes the interface. More specifically, a light emitting layer exhibiting a light emitting action and a colored layer for imparting color are disclosed as a thin film layer.

Japanese Patent Laid-Open No. 11-329741

  In the conventional functional thin film device, the bank has an affinity bank layer and a non-affinity bank layer stacked, and the inner wall surface forms a uniform plane. Therefore, when the functional liquid (thin film material liquid) is applied to the partition area partitioned by the bank and the applied functional liquid is dried, the edge portion of the functional liquid ( A so-called contact line) gradually recedes the inner wall surface toward the substrate side. When the evaporation of the solvent is finished, the functional liquid is fixed as a thin film, but the contact line does not necessarily stop (pinning) at the boundary surface between the laminated affinity bank layer and the non-affinity bank layer. Not exclusively. In general, in the case of a solution containing a low-concentration solute, the solvent evaporation rate is faster the closer to the contact line as it is called the coffee stain phenomenon, and the solvent moves to compensate for it. It is easy to collect more solutes in the vicinity. That is, also in this case, there is a problem that the film thickness unevenness of the thin film is likely to occur along the inner wall of the bank.

  Also, when thin film devices are formed by laminating thin films made of different materials in the partition areas partitioned by banks, the contact line stop position (pinning position) is unstable for each functional liquid. The cross-sectional shape of the thin film device is difficult to flatten.

  The present invention has been made in consideration of the above problems, and in a device formation region partitioned by a partition wall, a thin film device in which a functional thin film having a flat cross-sectional shape and a stable film thickness is laminated, An object of the present invention is to provide an organic EL device and a liquid crystal display device having a thin film device, an electronic apparatus, a method for manufacturing a thin film device, a method for manufacturing an organic EL device, and a method for manufacturing a liquid crystal display device.

  The thin film device of the present invention is formed on a substrate having a plurality of device formation regions, and has a function different for each of the plurality of device formation regions and a multi-layer bank as a partition wall provided so as to partition the plurality of device formation regions A multi-layered thin film layer provided with a plurality of functional liquids containing a functional material, the multi-layer bank is composed of at least three layers, and the bank layer protrudes on the side of the device formation region on the wall surface of the multi-layer bank At least two or more step portions are provided.

  According to this configuration, the bank layer has at least two stepped portions projecting toward the device forming region on the wall surface of the multilayer bank composed of at least three or more layers partitioning the device forming region. Therefore, when a functional liquid containing a functional material is applied to the device formation region and dried, the edge portion of the functional liquid recedes to the substrate side along the wall of the multilayer bank as the solvent in the functional liquid evaporates. It is easy to stop (pinning) at the boundary of the bank layer of the stepped portion provided on the wall surface. Therefore, the edge portion of the applied functional liquid can be pinned at a stable position. Therefore, by stabilizing the pinning position, it is possible to provide a thin film device including at least two or more multilayer thin film layers having a flat cross-sectional shape and a stable film thickness in the device formation region. The step portion refers to a substantially stepped portion formed on the wall surface on the device forming region side of the multilayer bank by stacking bank layers.

  In the multi-layer bank, n is a natural number of 1 or more, and the n-th bank layer is lyophilic with respect to the functional liquid for forming the n-th layer of the multi-layer thin film layer, and the n + 1-th layer The bank layer preferably exhibits liquid repellency as compared with the nth bank layer.

  According to this configuration, the applied functional liquid for forming the nth layer is easily wetted with respect to the nth bank layer and is repelled by the n + 1th bank layer. The edge portion of the functional liquid is pinned more stably at the boundary between the n-th bank layer and the (n + 1) -th bank layer of the step portion provided in the step. Therefore, it is possible to provide a thin film device including at least two or more multilayer thin film layers having a flat cross-sectional shape and a stable film thickness.

  In the multilayer bank, n is a natural number of 1 or more, and the thickness of the nth bank layer is preferably substantially equal to the thickness of the nth layer of the multilayer thin film layer. According to this, since the step portion provided in the multilayer bank is configured by stacking each bank layer, each thin film layer having a thickness substantially equal to the step portion has a flat cross-sectional shape in the device formation region. It is possible to laminate in such a state. That is, it is possible to provide a thin film device including a multilayer thin film layer having a uniform thickness.

  The plurality of device formation regions include an anode made of a transparent conductive film, and a multilayer thin film layer is an organic EL functional layer having a light emitting function laminated on the anode. According to this, since the multilayer thin film layer having a flat cross-sectional shape and a stable film thickness is an organic EL functional layer, if a driving current is applied between the anode and the cathode covering the organic EL functional layer, the organic EL It is possible to provide an organic EL light-emitting element as a thin-film device in which stable light emission can be obtained with less unevenness in light emission and unevenness in luminance due to unevenness in the thickness of the functional layer.

  The multilayer thin film layer may be a color filter including an optically transparent functional layer and a colored layer laminated on the functional layer. According to this, since the multilayer thin film layer having a flat cross-sectional shape and a stable film thickness is a color filter including an optically transparent functional layer and a colored layer laminated on the functional layer, It is possible to provide a color filter as a thin film device with little color unevenness caused by film thickness unevenness. Further, since the colored layer is laminated on the optically transparent functional layer, the difference between the height (thickness) of the multilayer bank and the thickness of the colored layer can be compensated by the functional layer. As a result, it is possible to provide a color filter that is less prone to unevenness between the colored layer and the colored layer and has a flat cross-sectional shape.

  An organic EL device according to the present invention includes the thin film device according to the present invention. According to this, since the organic EL light emitting element as the thin film device of the invention is provided, an organic EL device can be provided in which stable light emission is obtained with less uneven light emission and uneven brightness.

  A liquid crystal display device of the present invention is characterized by including the thin film device of the present invention. According to this, since the color filter as the thin film device of the invention is provided, a liquid crystal display device with little color unevenness can be provided.

  An electronic apparatus according to the present invention includes the organic EL device or the liquid crystal display device according to the present invention. According to this, the organic EL device having the light emission unevenness and the luminance unevenness of the invention described above and capable of obtaining stable light emission, or the liquid crystal display device having the color unevenness of the invention of the invention provided with an electronic device having high display quality. Can be provided.

  A method for manufacturing a thin film device of the present invention is a method for manufacturing a thin film device having a multilayer thin film layer formed on a substrate having a plurality of device formation regions and laminated on each of the plurality of device formation regions. A plurality of functional liquids containing different functional materials are applied to each of a plurality of device forming regions partitioned by the bank forming step and a plurality of device forming regions partitioned by the multilayer bank. A thin film forming step of forming a multilayer thin film layer by drying, and in the bank forming step, at least three or more bank layers are stacked, and the bank layer protrudes toward the device formation region on the wall surface of the multilayer bank At least two or more step portions are formed.

  According to this method, in the bank formation step, at least three or more bank layers are stacked, and at least two or more step portions in which the bank layers protrude toward the device formation region are formed on the wall surface of the multilayer bank. In the thin film formation step, a plurality of types of functional liquids containing different functional materials are applied to each of a plurality of device formation regions partitioned by the multilayer bank and dried to form a multilayer thin film layer. Therefore, the applied functional liquid retreats to the substrate side while the edge portion of the functional liquid propagates along the wall surface of the multilayer bank as the solvent in the functional liquid evaporates, and the stepped portion of the bank layer formed on the wall surface Stop (pinning) at the boundary. Therefore, the edge portion of the applied functional liquid can be pinned at a stable position. Therefore, by stabilizing the pinning position, a thin film device composed of at least two or more multilayer thin film layers having a flat cross-sectional shape and a stable film thickness can be manufactured in the device formation region.

  In the bank forming step, n is a natural number equal to or greater than 1, and the nth bank layer is lyophilic with respect to the functional liquid for forming the nth layer of the multilayer thin film layer. It is preferable to form a multi-layer bank so that the bank layer exhibits liquid repellency compared to the nth bank layer. According to this method, the applied functional liquid for forming the n-th layer easily wets the n-th bank layer and is repelled by the n + 1-th bank layer. The edge portion of the functional liquid can be pinned more stably at the boundary between the n-th bank layer and the (n + 1) -th bank layer of the step portion provided in the step. Therefore, a thin film device composed of at least two or more multilayer thin film layers having a flatter cross-sectional shape and a stable film thickness can be manufactured.

  In the thin film forming step, n is a natural number of 1 or more, and the functional liquid is applied and dried so as to have a thickness substantially equal to the thickness of the n-th bank layer of the multilayer bank. It is preferable to form the nth layer of the thin film layer. According to this method, a plurality of types of functional liquids are respectively applied and dried so as to have a thickness substantially equal to the thickness of each bank layer constituting the stepped portion on the wall surface of the multi-layer bank. Form. Therefore, in the device formation region, a thin film layer having a thickness substantially equal to the thickness of each bank layer can be stacked with a flatter cross-sectional shape. That is, it is difficult to produce unevenness between the step portion and the thin film layer, and a thin film device including a multilayer thin film layer having a uniform thickness can be manufactured.

  Further, before the bank forming step, an anode forming step for forming an anode made of a transparent conductive film is provided in each of a plurality of device forming regions on the substrate, and the thin film forming step includes at least an organic EL light emitting material. An organic EL functional layer as a thin film device is formed by applying and drying a plurality of types of functional liquids on the anode in the device formation region.

  According to this method, in the thin film formation step, an organic EL functional layer as a thin film device is formed by applying and drying a plurality of types of functional liquids including at least an organic EL light emitting material on the anode in the device formation region. . Therefore, a thin film device including an organic EL functional layer as a multilayer thin film layer having a flat cross-sectional shape and a stable film thickness can be manufactured in the device formation region.

  Further, in the thin film forming step, a functional layer containing a transparent functional material is applied to the device forming region and dried to form a functional layer, and a plurality of types including different colored layer forming materials on the functional layer. A color filter as a thin film device may be formed by laminating a plurality of colored layers by applying a functional liquid and drying.

  According to this method, a color filter as a thin film device including a transparent functional layer as a multilayer thin film layer having a flat cross-sectional shape and a stable film thickness and a plurality of colored layers is manufactured in the device formation region. be able to.

  The organic EL device manufacturing method of the present invention includes at least one substrate having a plurality of device formation regions, an anode made of a transparent conductive film formed for each of the plurality of device formation regions, and an organic EL laminated on the anode. A method for manufacturing an organic EL device including an organic EL functional layer including a light emitting layer, wherein the organic EL functional layer is formed using the method for manufacturing a thin film device according to the invention.

  According to this method, since the method of manufacturing a thin film device capable of forming an organic EL functional layer as a multilayer thin film layer having a flat cross-sectional shape and a stable film thickness is used, the organic EL functional layer An organic EL device with less light emission unevenness and luminance unevenness due to film thickness unevenness can be manufactured.

  A method of manufacturing a liquid crystal display device according to the present invention includes a pair of substrates each having a plurality of device formation regions, a color filter including a plurality of colored layers formed in the plurality of device formation regions, and a pair of substrates. A method of manufacturing a liquid crystal display device including a liquid crystal sandwiched between layers, wherein a color filter is formed using the method of manufacturing a thin film device according to the invention.

  According to this method, a manufacturing method of a thin film device capable of forming a color filter including a functional layer as a multilayer thin film layer having a flat and stable film thickness and a colored layer of a plurality of colors according to the present invention. Therefore, it is possible to manufacture a liquid crystal display device with less color unevenness due to uneven thickness of the colored layer.

(Embodiment 1)
In the present embodiment, an organic EL device including an organic EL light emitting element as a thin film device and a manufacturing method thereof will be described as an example.

<Organic EL device>
FIG. 1 is a schematic cross-sectional view showing the main structure of the organic EL device. FIG. 4A is a schematic cross-sectional view, and FIG. 4B is an enlarged view of the circle in FIG. Note that the drawings are appropriately scaled for explanation.

  As shown in FIG. 1A, the organic EL device 20 of the present embodiment is sealed with a substrate 1 having a light emitting element portion 22 composed of a plurality of organic EL light emitting elements, and the substrate 1 separated from a space 24. And a sealing substrate 23. The substrate 1 includes a circuit element unit 3 on the element substrate 2, and the light emitting element unit 22 is formed so as to overlap the circuit element unit 3 and is driven by the circuit element unit 3. In the light emitting element portion 22, an organic EL functional layer 21 including light emitting layers 18 R, 18 G, and 18 B of three colors is formed in the device formation region A for each color and has a stripe shape. The substrate 1 has three device formation regions A corresponding to the three color light emitting layers 18R, 18G, and 18B as a set of picture elements, and the picture elements are arranged in a matrix on the circuit element portion 3 of the element substrate 2. It is a thing. The organic EL device 20 of the present embodiment emits light emitted from the light emitting element unit 22 toward the element substrate 2 side.

  The sealing substrate 23 is made of glass or metal, and is bonded to the substrate 1 via a sealing resin. A getter agent 23a is attached to the sealed inner surface. The getter agent 23a absorbs water or oxygen that has entered the space 24 between the substrate 1 and the sealing substrate 23 and prevents the light emitting element portion 22 from being deteriorated by the water or oxygen that has entered. The getter agent 23a may be omitted.

  The substrate 1 has a plurality of device formation regions A on the circuit element portion 3 of the element substrate 2, and divides the plurality of device formation regions A and has a multi-layer bank as a partition portion having a step portion on the wall surface. 13 and an anode 12 made of a transparent conductive film formed in a plurality of device formation regions A. In addition, a plurality of organic EL functional layers 21 are provided as multilayer thin film layers stacked on the anodes 12 in a plurality of device formation regions A.

  Each organic EL functional layer 21 includes a hole injecting and transporting layer 17 formed by applying a functional liquid containing a hole injecting and transporting layer forming material onto the anode 12 and drying, and an organic EL light emitting material 3 It has three color light emitting layers 18R, 18G, and 18B laminated on the hole injecting and transporting layer 17 by applying seed functional liquid and drying.

  As shown in FIG. 1B, the multi-layer bank 13 includes a first bank 14, a second bank 15, and a third bank 16, and the first bank 14 and the second bank 15 are located inside the device formation region A. Two stepped portions 14 a and 15 a are formed on the wall surface of the multilayer bank 13 so as to protrude.

  The first bank 14 is made of an insulating material and is provided so as to cover the anode 12 in a frame shape using an inorganic material such as silicon oxide or nitride, for example. The thickness is approximately 50 nm, and is formed to be approximately the same thickness as the hole injecting and transporting layer 17. Thereby, the cathode 19 and the anode 12 formed so as to cover each organic EL functional layer 21 are prevented from being electrically short-circuited.

  The second bank 15 is made of an organic material. For example, an acrylic photosensitive resin is applied, and the second bank 15 is stacked on the first bank 14 so that a part of the first bank 14 protrudes to the device formation region A by photolithography. Has been. The thickness is about 100 nm, and it is formed to have a thickness substantially equal to each of the light emitting layers 18R, 18G, and 18B.

  The third bank 16 is made of an organic material, and for example, polyimide or an organic compound having a fluorine bond can be used. The thickness is approximately 50 to 100 nm, and the second bank 15 is laminated on the second bank 15 so that a part of the second bank 15 protrudes to the device formation region A.

  In such a multilayer bank 13, the first bank 14 is lyophilic with respect to the functional liquid containing the hole injection transport layer forming material, and the second bank 15 is more lyophobic than the first bank 14. Show. Further, when comparing the second bank 15 and the third bank 16 with respect to three kinds of functional liquids including the organic EL light emitting material, the second bank 15 exhibits lyophilicity, and the third bank 15 is more lyophilic than the second bank 15. Bank 16 exhibits liquid repellency. Therefore, when the functional liquid containing the hole injection transport layer forming material is applied to the device forming region A partitioned by the multilayer bank 13 having the two step portions 14a and 15a on the wall surface and dried, the functional liquid becomes the first. Since the stepped portion 14a of the bank 14 is well spread and repelled by the second bank 15, the edge portion of the functional liquid is stably pinned at the boundary between the stepped portion 14a and the second bank 15. Similarly, if three functional liquids containing an organic EL light emitting material are applied to the device formation region A and dried, the edge portion of the functional liquid is stable at the boundary between the step portion 15a and the third bank 16. Pinned to. As described above, since the edge portion of each functional liquid is stably pinned, in the cross-sectional shape, the pinning position is unstable, so that the functional liquid rises or falls in the device formation region A and is dried. And a thin film layer having a substantially constant film thickness after drying can be obtained. Therefore, the organic EL functional layer 21 includes the light emitting layers 18R, 18G, and 18B having a flat cross-sectional shape and a substantially constant film thickness, as well as the hole injection and transport layer 17 having a flat cross-sectional shape and a substantially constant film thickness. Are stacked.

  As described above, when providing a thin film device having a thin film layer composed of m layers in the device forming region A partitioned by the multilayer bank 13, the multilayer bank 13 is laminated with at least m + 1 bank layers. The nth bank layer is lyophilic with respect to the functional liquid forming the nth thin film layer, and the (n + 1) th bank layer is more lyophobic than the nth bank layer. Provide as follows. This is intended to stabilize the pinning position of the edge portion of the functional liquid after drying. In this case, m is a natural number of 2 or more, and n is a natural number of 1 or more.

  As shown in FIG. 1A, the element substrate 2 is made of a transparent substrate such as glass, and a base protective film 2a made of a silicon oxide film is formed on the element substrate 2, and the base protective film 2a is formed on the base protective film 2a. An island-shaped semiconductor film 4 made of polycrystalline silicon is formed. In the semiconductor film 4, a source region 4a and a drain region 4b are formed by high concentration P ion implantation. A portion where P ions are not introduced is a channel region 4c. Further, a transparent gate insulating film 5 covering the base protective film 2a and the semiconductor film 4 is formed. On the gate insulating film 5, a gate electrode 6 made of Al, Mo, Ta, Ti, W or the like is formed. A transparent first interlayer insulating film 7 and a second interlayer insulating film 8 are formed on the gate insulating film 5. The gate electrode 6 is provided at a position corresponding to the channel region 4 c of the semiconductor film 4. Further, contact holes 9 and 10 are formed through the first interlayer insulating film 7 and the second interlayer insulating film 8 and connected to the source region 4a and the drain region 4b of the semiconductor film 4, respectively. A transparent anode 12 made of ITO (Indium Tin Oxide) or the like is patterned and arranged in a predetermined shape on the second interlayer insulating film 8, and one contact hole 9 is connected to the anode 12. The other contact hole 10 is connected to the power line 11. In this way, the driving thin film transistor 3 a connected to each anode 12 is formed in the circuit element portion 3. In the circuit element section 3, a storage capacitor and a switching thin film transistor are also formed, but these are not shown in FIG.

  The light emitting element section 22 covers the anode 12, the hole injection transport layer 17, the light emitting layers 18R, 18G, and 18B sequentially stacked on the anode 12, the multilayer bank 13, and the light emitting layers 18R, 18G, and 18B. And a cathode 19 laminated in this manner. If the cathode 19, the sealing substrate 23, and the getter agent 23a are made of a transparent material, light emitted from the sealing substrate 23 side can be emitted. Moreover, it forms using the manufacturing method of the light emitting element part as a manufacturing method of the thin film device mentioned later.

  The organic EL device 20 has a scanning line (not shown) connected to the gate electrode 6 and a signal line (not shown) connected to the source region 4a, and a thin film transistor for switching by a scanning signal transmitted to the scanning line. When (not shown) is turned on, the potential of the signal line at that time is held in the storage capacitor, and the on / off state of the driving thin film transistor 3a is determined according to the state of the storage capacitor. Then, a current flows from the power supply line 11 to the anode 12 through the channel region 4c of the driving thin film transistor 3a, and the organic EL functional layer 21 (the hole injection transport layer 17 and the light emitting layers 18R, 18G, and 18B) is further connected. A current flows through the cathode 19 through the cathode 19. Each light emitting layer 18R, 18G, 18B emits light according to the amount of current flowing through it. The organic EL device 20 can display desired characters, images, and the like by such a light emission mechanism of the light emitting element unit 22. In addition, since each of the light emitting layers 18R, 18G, and 18B has the organic EL functional layer 21 having a flat cross-sectional shape and a substantially constant film thickness, there are few display problems such as light emission unevenness and luminance unevenness due to non-uniform cross-sectional shape. Has display quality.

<Method for manufacturing light-emitting element portion>
Next, the manufacturing method of the light emitting element part 22 as a manufacturing method of the thin film device of this embodiment is demonstrated based on FIGS. 2 is a flowchart showing a method for manufacturing a light emitting element part, FIGS. 3A to 3E and 4F to 4I are schematic cross-sectional views showing a method for manufacturing the light emitting element part, and FIG. FIG. 2 is a schematic exploded perspective view showing a structure of a droplet discharge head. 3A to 3E and FIGS. 4F to 4I, the circuit element portion 3 formed on the element substrate 2 is not shown.

  As shown in FIG. 2, the manufacturing method of the light emitting element portion 22 of the present embodiment includes an anode forming step (step S1) for forming an anode 12 made of a transparent conductive film for each of a plurality of device forming regions A, and a plurality of devices. Different functional materials are used for the bank forming step (steps S2 to S4) for forming the multilayer bank 13 as the partition wall so as to partition the forming region A, and the plurality of device forming regions A partitioned by the multilayer bank 13. A process of forming the organic EL functional layer 21 as a multilayer thin film layer by applying and drying a plurality of types of functional liquids (step S5 to step S6), and covering the multilayer bank 13 and each organic EL functional layer 21 Thus, a cathode forming step (step S7) for forming the cathode 19 is provided.

  Step S1 in FIG. 2 is an anode forming process. In step S1, as shown in FIG. 3A, a transparent conductive film such as ITO is formed by vacuum deposition or sputtering so as to cover the surface of the element substrate 2 on which the circuit element portion 3 is formed. Then, the anode 12 is formed by patterning the transparent conductive film so as to have a predetermined shape by photolithography. In this case, the film thickness of the anode 12 is approximately 50 to 100 nm. Then, the process proceeds to step S2.

Step S2 in FIG. 2 is a step of forming the first bank 14. In step S2, as shown in FIG. 3B, a silicon oxide film is formed to a thickness of about 50 nm so as to cover the surface of the element substrate 2 on which each anode 12 is formed. Then, each first bank 14 is formed by patterning the silicon oxide film so as to surround each anode 12 in a frame shape by photolithography. Further, the surface of the element substrate 2 on which each first bank 14 is formed is subjected to plasma processing using O ₂ gas as a processing gas. As a result, the surface including the surface of the anode 12 and the surface of the first bank 14 is activated to perform lyophilic treatment. The method for imparting lyophilicity to the surface of the first bank 14 is not limited to the plasma treatment. Since the first bank 14 is made of an insulating inorganic material, the element substrate 2 on which the first bank 14 is formed is made lyophilic by performing wet cleaning using pure water or dry cleaning such as UV irradiation. Can be granted. Furthermore, these lyophilic treatments are not essential, and if the surface of the first bank 14 after patterning is sufficiently clean, lyophilicity may be exhibited. Then, the process proceeds to step S3.

  Step S3 in FIG. 2 is a step of forming the second bank 15. In step S3, as shown in FIG. 3C, each of the device formation regions A is partitioned, and the first bank 14 has an extension amount of 3 to 5 μm inside the device formation region A. A second bank 15 is formed on the bank 14. As the material of the second bank 15, an acrylic photosensitive resin material can be used. As a method for forming the second bank 15, for example, a photosensitive resin material is applied to the surface of the element substrate 2 on which the first bank 14 is formed by a roll coat method or a spin coat method, and dried to have a thickness of about 100 nm. A photosensitive resin layer is formed. Then, a method of forming the second bank 15 by exposing and developing a mask having an opening corresponding to the device formation region A and facing the element substrate 2 at a predetermined position can be mentioned. As a result, the stepped portion 14a of the first bank 14 exhibits lyophilicity with respect to the functional liquid 30 applied later, and the wall surface of the second bank 15 exhibits liquid repellency compared to the stepped portion 14a. . Then, the process proceeds to step S4.

  Step S4 in FIG. 2 is a step of forming the third bank 16. In step S4, as shown in FIG. 3D, each device formation region A is partitioned, and the second bank 15 has an extension amount of 3 to 5 μm inside the device formation region A. A third bank 16 is formed on the bank 15. As a material of the third bank 16, polyimide or an organic compound having a fluorine bond can be used. As a method for forming the third bank 16, for example, a mask in which the device formation region A is shielded and an opening corresponding to the formation region of the third bank 16 is opposed to the element substrate 2 at a predetermined position is used. There is a method of drying a thick film formed by spraying a solution containing an organic compound having polyimide or a fluorine bond through a film. In this case, the thickness of the third bank 16 is approximately 0.5 to 1 μm. Accordingly, the second bank 15 made of an acrylic photosensitive resin is lyophilic with respect to each of the functional liquids 40, 41, and 42 to be applied later, and the third bank made of an organic compound containing polyimide or a fluorine bond. Reference numeral 16 denotes liquid repellency as compared with the second bank 15. Then, the process proceeds to step S5.

  Step S5 in FIG. 2 is a hole injection transport layer forming step. In step S5, as shown in FIG. 3E, the functional liquid 30 containing the hole injection transport layer forming material is applied to the device forming region A. As a method for applying the functional liquid 30, the liquid droplet ejection head 50 capable of ejecting the functional liquid 30 as liquid droplets, and the liquid droplet ejection head 50 facing the element substrate 2, the liquid droplet ejection head 50 and the element substrate are provided. 2 is used. A droplet discharge device (not shown) provided with a scanning mechanism capable of relative movement with respect to 2 is used.

  Here, the droplet discharge head 50 will be described. As shown in FIG. 5, the droplet discharge head 50 includes a nozzle plate 51 having a plurality of nozzles 52 from which droplets are discharged, and a cavity plate 53 having partition walls 54 that define cavities 55 through which the plurality of nozzles 52 communicate with each other. And a vibration plate 58 having vibrators 59 corresponding to the plurality of cavities 55 are sequentially stacked and joined.

  The cavity plate 53 has a partition wall 54 that defines a cavity 55 that communicates with the nozzle 52, and also has flow paths 56 and 57 for filling the cavity 55 with the functional liquid L. The flow path 57 is sandwiched between the nozzle plate 51 and the vibration plate 58, and the completed space serves as a reservoir in which the functional liquid L is stored.

  The functional liquid L is supplied through a pipe from a supply mechanism (not shown), stored in a reservoir through a supply hole 58 a provided in the vibration plate 58, and then filled into each cavity 55 through a flow path 56.

  The vibrator 59 is, for example, a piezoelectric element (piezo element), and deforms the bonded diaphragm 58 by applying a driving voltage pulse from the outside. As a result, the volume of the cavity 55 partitioned by the partition wall 54 increases, the functional liquid L is sucked into the cavity 55 from the reservoir, and when the application of the driving voltage pulse is completed, the diaphragm 58 returns to the base and is filled with the functional liquid L Pressurize. Thus, the functional liquid L can be discharged as droplets from the nozzle 52.

  As shown in FIG. 3E, the functional liquid 30 ejected from the droplet ejection head 50 lands on the anode 12 of the element substrate 2 as droplets and spreads. A required amount of the functional liquid 30 is ejected as droplets according to the area of the device formation region A, and the functional liquid 30 is raised by the surface tension. Then, as shown in FIG. 4F, by heating the element substrate 2 by a method such as lamp annealing, the solvent component of the functional liquid 30 is dried and removed. By drying, the edge portion of the functional liquid 30 recedes toward the anode 12 along the wall surface of the multilayer bank 13 and is pinned at the boundary with the second bank 15 of the step portion 14a. As a result, a hole injection / transport layer 17 having a flat cross-sectional shape and a substantially constant film thickness is formed in the region partitioned by the first bank 14. As the hole injection transport layer forming material, polyphenylene vinylene whose polymer precursor is polytetrahydrothiophenylphenylene, 1,1-bis- (4-N, N-ditolylaminophenyl) cyclohexane, tris (8-hydroxyquinolinol) ) Aluminum, polystyrene sulfonic acid, a mixture of polyethylene dioxythiophene and polystyrene sulfonic acid (PEDOT / PSS), and the like. Examples of the solvent include polar solvents such as isopropyl alcohol, N-methylpyrrolidone, and 1,3-dimethyl-imidazolinone. In this embodiment, PEDOT (Polyethylene Dioxy Thiophene) was used. In this case, the hole injecting and transporting layer 17 made of the same material is formed in each device forming region A. However, the material of the hole injecting and transporting layer 17 is changed to the device forming region A corresponding to the material for forming the light emitting layer later. You may change every. Then, the process proceeds to step S6.

  Step S6 in FIG. 2 is a light emitting layer forming step. In step S6, as shown in FIG. 4G, three types of functional liquids 40, 41, and 42 containing an organic EL light emitting material are applied to a plurality of device formation regions A. As a method of applying each of the functional liquids 40, 41, and 42, as in the previous step S5, the liquid droplet ejection head 50 is filled with each of the functional liquids 40, 41, and 42, and each device corresponds to a droplet. Land on the formation area A. The functional liquid 40 includes a material that forms the light emitting layer 18R (red), the functional liquid 41 includes a material that forms the light emitting layer 18G (green), and the functional liquid 42 includes a material that forms the light emitting layer 18B (blue). It is out.

  Examples of the organic EL light-emitting material include polyfluorene derivatives (PF), polyparaphenylene vinylene derivatives (PPV), polyphenylene derivatives (PP), polyparaffins, which are known polymer light emitting materials capable of emitting fluorescence or phosphorescence. Polysilanes such as phenylene derivatives (PPP), polyvinylcarbazole (PVK), polythiophene derivatives, polydialkylfluorene (PDAF), polyfluorenebenzothiadiazole (PFBT), polyalkylthiophene (PAT), polymethylphenylsilane (PMPS), etc. Can be suitably used. In addition, these organic EL light emitting materials include polymer materials such as perylene dyes, coumarin dyes, rhodamine dyes, rubrene, perylene, 9,10-diphenylanthracene, tetraphenylbutadiene, Nile red, coumarin 6, A low molecular material such as quinacridone can also be used by doping.

  Examples of the solvent contained in each of the functional liquids 40, 41, and 42 include, in addition to water, alcohols such as methanol, ethanol, propanol, and butanol, n-heptane, n-octane, decane, dodecane, tetradecane, toluene, Hydrocarbon compounds such as xylene, cymene, durene, indene, dipentene, tetrahydronaphthalene, decahydronaphthalene, cyclohexylbenzene, ethylene glycol dimethyl ether, ethylene glycol diethyl ether, ethylene glycol methyl ethyl ether, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol Ether systems such as methyl ethyl ether, 1,2-dimethoxyethane, bis (2-methoxyethyl) ether, p-dioxane Compounds, propylene carbonate, .gamma.-butyrolactone, N- methyl-2-pyrrolidone, dimethylformamide, dimethyl sulfoxide, can be exemplified polar compounds such as cyclohexanone.

  Of these, water, alcohols, hydrocarbon compounds, and ether compounds are preferred from the viewpoints of fine particle dispersibility and functional liquid stability, and ease of application to the droplet discharge method (inkjet method). More preferred solvents include water and hydrocarbon compounds.

  As shown in FIG. 4G, each of the landed functional liquids 40, 41, and 42 wets and spreads in the device formation region A, and the cross-sectional shape rises in an arc shape. Then, as shown in FIG. 4H, by heating the element substrate 2 by a method such as lamp annealing, the solvent components of the functional liquids 40, 41, and 42 are dried and removed. By drying, the edge portions of the functional liquids 40, 41, and 42 recede toward the hole injection / transport layer 17 side along the wall surface of the multilayer bank 13 and are pinned at the boundary with the third bank 16 of the step portion 15a. Thus, the light emitting layers 18R, 18G, and 18B having a flat cross-sectional shape and a substantially constant film thickness are formed in the region partitioned by the second bank 15. Then, the process proceeds to step S7.

  In addition, the drying method of each applied functional liquid 40, 41, 42 is not limited to the method of drying all at once after all the functional liquids 40, 41, 42 are applied, and for each functional liquid 40, 41, 42, You may dry. As a drying method, vacuum drying is preferable because the evaporation rate of the solvent can be made substantially constant.

Step S7 in FIG. 2 is a cathode forming step. In step S7, as shown in FIG. 4I, the cathode 19 is formed so as to cover the light emitting layers 18R, 18G, 18B of the element substrate 2 and the surface of the multilayer bank 13. As a material for the cathode 19, it is preferable to use a combination of metals such as Ca, Ba, and Al and fluorides such as LiF. In particular, it is preferable to form a film of Ca, Ba, or LiF having a small work function on the side close to the light emitting layer and to form a film of Al or the like having a large work function on the far side. A protective layer such as SiO ₂ or SiN may be laminated on the cathode 19. In this way, oxidation of the cathode 19 can be prevented. Examples of the method for forming the cathode 19 include vapor deposition, sputtering, and CVD. In particular, the vapor deposition method is preferable in that the light emitting layer can be prevented from being damaged by heat.

<Method for manufacturing organic EL device>
The manufacturing method of the organic EL device 20 according to the present embodiment includes a step of forming the light emitting element portion 22 on the substrate 1 on which the circuit element portion 3 is formed using the above-described thin film device manufacturing method, and the light emitting element portion 22 is formed. A step of sealing and bonding the substrate 1 and the sealing substrate 23 with the sealing resin through the space 24. In the organic EL device 20 manufactured in this way, since the cross-sectional shape of each light emitting layer 18R, 18G, 18B is substantially flat and the film thickness is substantially constant, the resistance of each light emitting layer 18R, 18G, 18B is almost constant. It becomes constant. That is, when the circuit element unit 3 applies a driving voltage to the light emitting element unit 22 to emit light, the light emitting layer 18R, 18G, and 18B has less unevenness in light emission and luminance due to uneven resistance, and the display quality is good. can get.

The effects of the first embodiment are as follows.
(1) In the organic EL device 20 of Embodiment 1 described above, the light emitting element portion 22 as a thin film device includes the multilayer bank 13 that partitions the device formation region A and has two step portions 14a and 15a on the wall surface, and device formation. The region A includes a multilayer organic EL functional layer 21 formed by applying a plurality of types of functional liquids 30, 40, 41, and 42 containing a plurality of types of functional materials and drying. In the multilayer bank 13, the nth bank layer is lyophilic with respect to the functional liquid forming the nth thin film layer, and the (n + 1) th bank layer is compared with the nth bank layer. It is provided so as to exhibit liquid repellency. Thereby, the pinning position of the edge part of each functional liquid after drying can be stabilized. Since the pinning position is stabilized, the cross-sectional shapes of the hole injection / transport layer 17 and the light emitting layers 18R, 18G, and 18B of the organic EL functional layer 21 can be made flat and substantially constant. In this case, n is a natural number of 1 or more.

  (2) The organic EL device 20 of the first embodiment includes a multilayer organic EL functional layer 21 having a flat cross-sectional shape and a substantially constant film thickness, and includes an anode 12 and a cathode 19 that covers the organic EL functional layer 21. If the drive current is applied between the organic EL functional layer 21, the organic EL device 20 including the light emitting element portion 22 as a thin film device with less emission unevenness and luminance unevenness due to uneven film thickness and stable light emission can be obtained. Can be provided.

  (3) In the manufacturing method of the light emitting element portion 22 of the first embodiment, in the bank formation step (step S2 to step S4), the second step portions 14a and 15a are formed on the wall surface on the device formation region A side. The multi-bank 13 is formed by stacking the first bank 14, the second bank 15, and the third bank 16. In the process of forming the organic EL functional layer 21 (step S5 to step S6), a plurality of types of functional liquids containing different functional materials are applied to each of the plurality of device formation regions A partitioned by the multilayer bank 13. Then, the hole injection transport layer 17 and the light emitting layers 18R, 18G, and 18B are laminated to form the organic EL functional layer 21 as a multilayer thin film layer. Since the first bank 14 is lyophilic and the second bank 15 is more lyophobic than the first bank 14 with respect to the functional liquid 30 that forms the hole injecting and transporting layer 17, the function after drying The edge portion of the liquid 30 is stably pinned at the boundary between the step portion 14a and the second bank 15. Similarly, the second bank 15 is lyophilic with respect to the functional liquids 40, 41, and 42 forming the light emitting layers 18R, 18G, and 18B, and the third bank 16 is liquid repellent compared to the second bank 15. Therefore, the edge portions of the functional liquids 40, 41, and 42 after drying are stably pinned at the boundary with the third bank 16 of the step portion 15a. Accordingly, since the pinning position of the edge portion of each functional liquid after drying is stabilized, the organic EL composed of the hole injection transport layer 17 and the light emitting layers 18R, 18G, and 18B having a flat cross-sectional shape and a substantially constant film thickness. The functional layer 21 can be formed. That is, it is possible to manufacture the light emitting element portion 22 as a thin film device that can emit light stably with little unevenness of light emission and uneven brightness due to the unevenness of the film thickness of the organic EL functional layer 21.

  (4) In the manufacturing method of the organic EL device 20 of the first embodiment, the light emitting element portion 22 is formed by using the manufacturing method of the light emitting element portion as the manufacturing method of the thin film device. Therefore, it is possible to manufacture the organic EL device 20 including the light emitting element portion 22 as a thin film device that can emit light with less unevenness of light emission and unevenness of luminance due to unevenness of the film thickness of the organic EL functional layer 21 and stable light emission.

(Embodiment 2)
In the present embodiment, a liquid crystal display device including a color filter as a thin film device and a manufacturing method thereof will be described as an example.

<Liquid crystal display device>
FIG. 6 is a schematic perspective view showing the structure of the liquid crystal display device. As shown in FIG. 6, the liquid crystal display device 100 of this embodiment includes a TFT (Thin Film Transistor) transmissive liquid crystal display panel 120 and an illumination device 130 that illuminates the liquid crystal display panel 120. The liquid crystal display panel 120 includes a color filter 111 including colored layers 108R, 108G, and 108B, an element substrate 112 having a TFT element 115 having one of three terminals connected to the pixel electrode 114, and a pair of these substrates 111. , 112 and a liquid crystal (not shown) as an electro-optical material. Further, an upper polarizing plate 118 and a lower polarizing plate 119 for deflecting transmitted light are provided on the surfaces of the pair of substrates 111 and 112 on the outer surface side of the liquid crystal display panel 120.

  The color filter 111 includes a substrate 101 made of transparent glass or the like, and a multilayer bank 102 as a partition wall that partitions a plurality of colored regions as device forming regions in a matrix. Further, the transparent resin layer 107 as a functional layer formed by applying a functional liquid containing a transparent functional material to a plurality of colored regions partitioned by the multilayer bank 102 and drying, is different from the plurality of colored regions. It is provided with three color layers 108R, 108G, and 108B of RGB colors laminated on the transparent resin layer 107 by applying and drying a plurality of types of functional liquids including a coloring layer forming material. Further, an overcoat layer (OC layer) 109 as a planarization layer covering the multilayer bank 102 and the colored layers 108R, 108G, and 108B, and transparent such as ITO (Indium Tin Oxide) formed so as to cover the OC layer 109 And a counter electrode 110 made of a conductive film.

  The multilayer bank 102 is provided on a light-shielding film 103 made of a light-shielding metal such as Cr or an oxide film thereof (downward in FIG. 6), and the first bank 104, the second bank 105, and the third bank. 106. On the wall surface of the multi-layer bank 102, there are provided two step portions 104a and 105a in which the first bank 104 and the second bank 105 project to the colored region side.

  The first bank 104 is made of an organic material. For example, an acrylic photosensitive resin is applied and laminated on the light shielding film 103 by a photolithography method. The thickness is approximately 0.5 μm, and is formed to be approximately the same thickness as the transparent resin layer 107.

  The second bank 105 is made of an organic material. For example, a phenol-based photosensitive resin is applied, and the second bank 105 is laminated on the first bank 104 so that a part of the first bank 104 protrudes to the colored region by photolithography. Yes. The thickness is approximately 1.0 to 1.5 μm, and is formed to have a thickness substantially equal to that of the colored layers 108R, 108G, and 108B.

  The third bank 106 is made of an organic material, and for example, polyimide or an organic compound having a fluorine bond can be used. The thickness is approximately 0.5 μm, and the second bank 105 is laminated on the second bank 105 so that a part of the second bank 105 protrudes into the colored region.

  In such a multilayer bank 102, the first bank 104 exhibits lyophilicity with respect to a functional liquid containing a transparent resin material, and the second bank 105 exhibits liquid repellency compared to the first bank 104. Further, when the second bank 105 and the third bank 106 are compared with the three types of functional liquids containing the coloring layer forming material, the second bank 105 exhibits lyophilicity, and the third bank 105 is more lyophilic than the second bank 105. The bank 106 exhibits liquid repellency. Therefore, if a functional liquid containing a transparent resin material is applied to a colored region partitioned by the multilayer bank 102 having two step portions 104a and 105a on the wall surface and dried, the functional liquid is stepped by the step portion 104a of the first bank 104. Therefore, the edge portion of the functional liquid is stably pinned at the boundary between the step portion 104a and the second bank 105. Similarly, if a plurality of types (three colors) of functional liquids containing different colored layer forming materials are applied to the colored region and dried, the edge portion of the functional liquid at the boundary with the third bank 106 of the stepped portion 105a. Is pinned stably. In this way, the edge of each functional fluid is stably pinned, so the cross-sectional shape of the pinning position is unstable, preventing the functional fluid from rising or falling in the colored area and drying. Thus, the transparent resin layer 107 and the colored layers 108R, 108G, and 108B having a flat and substantially constant film thickness after drying are obtained. Therefore, the color filter 111 is formed by laminating the transparent resin layer 107 and the colored layers 108R, 108G, and 108B having a flat cross-sectional shape and a substantially constant film thickness.

  As described above, the basic configuration of the multilayer bank 102 is the same as that of the multilayer bank 13 of the first embodiment. When a thin film device having m thin film layers is provided in the device forming region, at least m + 1 bank layers are provided. Are stacked. The nth bank layer is lyophilic with respect to the functional liquid forming the nth thin film layer, and the (n + 1) th bank layer is more lyophobic than the nth bank layer. Provide as follows. This is intended to stabilize the pinning position of the edge portion of the functional liquid after drying. m is a natural number of 2 or more, and n is a natural number of 1 or more.

  Such a color filter 111 is manufactured using a color filter manufacturing method as a method of manufacturing a thin film device described later.

  The element substrate 112 is also made of a material such as transparent glass, and includes a pixel electrode 114 formed in a matrix via an insulating film 113 and a plurality of TFT elements 115 formed corresponding to the pixel electrode 114. is doing. Of the three terminals of the TFT element 115, the other two terminals not connected to the pixel electrode 114 are connected to the scanning line 116 and the data line 117, which are arranged in a grid so as to surround the pixel electrode 114 while being insulated from each other. It is connected.

  The illumination device 130 uses, for example, a white LED, EL, cold cathode tube, or the like as a light source, and a light guide plate, a diffusion plate, a reflection plate, or the like that can emit light from these light sources toward the liquid crystal display panel 120. Any device having a configuration may be used.

  As described above, the liquid crystal display device 100 includes the color filter 111 having the transparent resin layer 107 and the colored layers 108R, 108G, and 108B having a flat cross-sectional shape and a substantially constant film thickness. , 108G and 108B have high display quality with little color unevenness due to film thickness unevenness. In addition, since the colored layers 108R, 108G, and 108B are laminated on the transparent resin layer 107, the liquid crystal side surfaces of the multilayer bank 102 and the colored layers 108R, 108G, and 108B are compared with the case where the transparent resin layer 107 is not provided. Unevenness can be reduced, and by further stacking the OC layer 109, a flatter counter electrode 110 can be obtained. Therefore, it is possible to reduce the variation in the distance (cell thickness) between the counter electrode 110 and the pixel electrode 114. That is, display unevenness due to cell thickness unevenness can be reduced. The OC layer 109 is not essential, and the counter electrode 110 may be provided so as to cover the multilayer bank 102 and the colored layers 108R, 108G, and 108B.

  The liquid crystal display device 100 is not limited to the TFT element 115 as a switching element, but may include a TFD (Thin Film Diode) element, and further includes colored layers 108R, 108G, and 108B on at least one substrate. If so, it may be a passive liquid crystal display device in which electrodes constituting a pixel are arranged so as to cross each other. Moreover, each polarizing plate 118 and 119 may be combined with an optical functional film such as a retardation film used for the purpose of improving the viewing angle dependency.

<Color filter manufacturing method>
Next, the manufacturing method of the color filter 111 as a manufacturing method of the thin film device of this embodiment is demonstrated based on FIGS. FIG. 7 is a flowchart showing a method for manufacturing a color filter, and FIGS. 8A to 8E and 9F to 9I are schematic cross-sectional views showing a method for manufacturing a color filter.

  As shown in FIG. 7, in the method of manufacturing the color filter 111 of this embodiment, a step of forming the light shielding film 103 on the surface of the substrate 101 (step S11) and a step of forming the multilayer bank 102 on the light shielding film 103 (step S11). Step S12 to Step S14). Also, a step of forming a transparent resin layer 107 by applying a functional liquid containing a transparent resin material to a colored region as a device forming region using a droplet discharge device (step S15), and forming a different colored layer in the colored region There is provided a colored layer forming step (step S16) in which three types (three colors) of functional liquids including materials are applied and dried to form the respective colored layers 108R, 108G, and 108B. Further, an OC layer forming step (step S17) is provided for forming the OC layer 109 so as to cover the multilayer bank 102 and the colored layers 108R, 108G, and 108B.

  In the actual manufacturing process of the color filter 111, a mother substrate designed so that the color filters 111 corresponding to one liquid crystal display panel 120 are arranged in a matrix is used. The mother substrate is increased in size in order to manufacture the liquid crystal display panel 120 efficiently and inexpensively. As a method of forming a colored layer of a plurality of colors on such a large mother substrate, a droplet discharge method (inkjet method) is used to efficiently form a colored layer using a colored layer forming material without waste. Yes.

  Step S11 in FIG. 7 is a light shielding film forming step. In step S11, a light shielding film 103 is formed on the substrate 101 as shown in FIG. As the material of the light shielding film 103, for example, an opaque metal such as Cr, Ni, or Al, or a compound such as an oxide of these metals can be used. As a method for forming the light shielding film 103, a film made of the above material is formed on the substrate 101 by an evaporation method or a sputtering method. The film thickness may be set in accordance with the material selected to maintain the light shielding property. For example, if Cr, 100 to 200 nm is preferable. Then, a portion other than the portion corresponding to the opening 103a is covered with a resist by a photolithography method, and the film is etched using an etching solution such as an acid corresponding to the above material. Thereby, the light shielding film 103 having the opening 103a is formed. Then, the process proceeds to step S12.

  Step S12 in FIG. 7 is a first bank forming step. In step S <b> 12, as shown in FIG. 8B, the first bank 104 is formed on the light shielding film 103. As the material of the first bank 104, an acrylic photosensitive resin material can be used. As a method for forming the first bank 104, for example, the photosensitive resin material is applied to the surface of the substrate 101 on which the light-shielding film 103 is formed by a roll coating method or a spin coating method and dried to have a thickness of about 0.5 μm. The photosensitive resin layer is formed. Then, there is a method of forming the first bank 104 by exposing and developing a mask provided with an opening having a size corresponding to the colored region D, facing the substrate 101 at a predetermined position. Note that the light-shielding film 103 may be omitted if a light-shielding material is used for the photosensitive resin material constituting the first bank 104. Then, the process proceeds to step S13.

  Step S13 in FIG. 7 is a second bank forming step. In step S13, as shown in FIG. 8C, each colored region D is partitioned, and the first bank 104 is set so that the amount of the first bank 104 protruding to the inside of the colored region D is 3 to 5 μm. A second bank 105 is formed thereon. As the material of the second bank 105, a phenol-based photosensitive resin material can be used. As a method for forming the second bank 105, for example, the photosensitive resin material is applied to the surface of the substrate 101 on which the first bank 104 is formed by a roll coating method or a spin coating method, and dried to have a thickness of about 1. A photosensitive resin layer of 0 to 1.5 μm is formed. Then, a mask provided with an opening corresponding to the colored region D is exposed and developed with the substrate 101 facing the substrate 101 at a predetermined position, so that a part of the first bank 104 protrudes toward the colored region side. A method of forming the two banks 105 is mentioned. Accordingly, the first bank 104 made of an acrylic photosensitive resin material exhibits lyophilicity with respect to the functional liquid 60 applied later, and the second bank 105 made of a phenol-based photosensitive resin material has a first Compared to the bank 104, it exhibits liquid repellency. Then, the process proceeds to step S14.

  Step S14 in FIG. 7 is a third bank forming step. In step S14, as shown in FIG. 8D, each colored region D is partitioned, and the second bank 105 is set so that the amount of the second bank 105 protruding to the inside of the colored region D is 3 to 5 μm. A third bank 106 is formed thereon. As a material of the third bank 106, polyimide or an organic compound having a fluorine bond can be used. As a method for forming the third bank 106, for example, a mask provided with an opening corresponding to the formation region of the third bank 106 that shields the colored region D is opposed to the substrate 101 at a predetermined position, and the third bank 106 is interposed through the mask. And a method of drying a thick film formed by spraying a solution containing polyimide or an organic compound having a fluorine bond. In this case, the thickness of the third bank 106 is approximately 0.5 μm. Thereby, the third bank 106 is formed so that a part of the second bank 105 protrudes toward the colored region D side. Further, the second bank 105 made of a phenol-based photosensitive resin is lyophilic with respect to each of the functional liquids 70, 71, 72 applied later, and is a third bank made of an organic compound containing polyimide or a fluorine bond. Reference numeral 106 denotes liquid repellency as compared with the second bank 105. Then, the process proceeds to step S15.

  Step S15 in FIG. 7 is a transparent resin layer forming step. In step S15, as shown in FIG. 8E, the functional liquid 60 containing a transparent resin material is filled in the droplet discharge head 50 and applied to the colored region D. The required amount of the functional liquid 60 is ejected as droplets according to the area of the colored region D, and the functional liquid 60 is raised by the surface tension. Then, as shown in FIG. 9F, the substrate 101 is heated by a method such as lamp annealing to dry and remove the solvent component of the functional liquid 60. The edge portion of the functional liquid 60 is retreated to the substrate 101 side along the wall surface of the multilayer bank 102 by drying, and is pinned at the boundary between the step portion 104a and the second bank 105. Thereby, a transparent resin layer 107 having a flat cross-sectional shape and a substantially constant film thickness is formed in the region partitioned by the first bank 104. In this case, it is preferable to use an acrylic resin as the transparent resin material and an alcohol or a hydrocarbon compound as the solvent. Then, the process proceeds to step S16.

  Step S16 in FIG. 7 is a colored layer forming step. In step S16, as shown in FIG. 9G, functional liquids 70, 71, 72 corresponding to the respective colored regions D are applied as droplets from the droplet discharge head 50. The functional liquid 70 contains an R (red) colored layer forming material, the functional liquid 71 contains a G (green) colored layer forming material, and the functional liquid 72 contains a B (blue) colored layer forming material. A necessary amount of functional liquids 70, 71, 72 is applied to each colored region D and swells. Then, as shown in FIG. 9H, the solvent component is removed from the applied functional liquids 70, 71, 72 by heating the substrate 101 by a method such as lamp annealing. The edge portions of the functional liquids 70, 71, 72 are retreated to the substrate 101 side along the wall surface of the multilayer bank 102 by the drying, and are pinned at the boundary with the third bank 106 of the step portion 105a. As a result, colored layers 108R, 108G, and 108B having a flat cross-sectional shape and a substantially constant film thickness are formed in the regions partitioned by the second bank 105. The method for collectively drying the applied functional liquids 70, 71, 72 is not limited to this, and a reduced-pressure drying method that can uniformly dry the solvent component is desirable. Then, the process proceeds to step S17.

Step S17 in FIG. 7 is an OC layer forming process. In step S17, as shown in FIG. 9I, the OC layer 109 is formed so as to cover the multilayer bank 102 and the colored layers 108R, 108G, and 108B. As a material of the OC layer 109, a transparent acrylic resin material can be used. Examples of the forming method include spin coating and offset printing. The OC layer 109 is provided to alleviate unevenness on the surface of the substrate 101 on which the colored layers 108R, 108G, and 108B are formed, and to flatten the counter electrode 110 that is subsequently formed on the surface. In addition, a thin film such as SiO ₂ may be further formed on the OC layer 109 in order to ensure adhesion with the counter electrode 110.

  According to the manufacturing method of the color filter 111 described above, it is possible to manufacture the color filter 111 including the transparent resin layer 107 having a flat cross-sectional shape and a substantially constant film thickness, and the colored layers 108R, 108G, and 108B. is there.

<Method for manufacturing liquid crystal display device>
The manufacturing method of the liquid crystal display device 100 of the present embodiment includes a step of forming the color filter 111 on the substrate 101 using the manufacturing method of the color filter 111, a pixel electrode 114, a TFT element 115, a scanning line 116, and data. A step of bonding the element substrate 112 on which the lines 117 and the like are formed to the substrate 101 with an adhesive at a predetermined interval and filling the gap with liquid crystal. According to this, it is possible to manufacture the liquid crystal display device 100 having good display quality with reduced defects such as color unevenness. A known method may be used as a method for forming the counter electrode 110 in the color filter 111 and a method for forming the pixel electrode 114, the TFT element 115, the scanning line 116, the data line 117, and the like on the element substrate 112.

The effects of the second embodiment are as follows.
(1) In the liquid crystal display device 100 of the second embodiment, the color filter 111 as a thin film device defines the colored region D and the multilayer bank 102 having two step portions 104a and 105a on the wall surface, and the colored region D. A transparent resin layer 107 formed by applying and drying a plurality of types of functional liquids 60, 70, 71, 72 including a plurality of types of functional materials and the colored layers 108R, 108G, 108B are provided. In the multi-layer bank 102, the n-th bank layer is lyophilic with respect to the functional liquid forming the n-th thin film layer, and the n + 1-th bank layer is compared with the n-th bank layer. It is provided so as to exhibit liquid repellency. Thereby, the pinning position of the edge part of each functional liquid after drying can be stabilized. Since the pinning position is stable, the cross-sectional shapes of the transparent resin layer 107 and the colored layers 108R, 108G, and 108B of the color filter 111 can be made flat and substantially constant. In this case, n is a natural number of 1 or more.

  (2) The liquid crystal display device 100 of the second embodiment includes a multilayer color filter 111 having a flat cross-sectional shape and a substantially constant film thickness, and a driving voltage can be applied between the pixel electrode 114 and the counter electrode 110. For example, it is possible to provide the liquid crystal display device 100 including the color filter 111 as a thin film device that can obtain stable display quality with little color unevenness due to the film thickness unevenness of the colored layers 108R, 108G, and 108B. In addition, since the transparent resin layer 107 is provided on the substrate 101 side and the colored layers 108R, 108G, and 108B are stacked thereon, the unevenness between the multilayer bank 102 and the colored layers 108R, 108G, and 108B can be reduced. A flatter counter electrode 110 can be obtained. Accordingly, variation in cell thickness between the pixel electrode 114 and the counter electrode 110 can be reduced, and display unevenness due to cell thickness unevenness can be reduced.

  (3) In the manufacturing method of the color filter 111 of the second embodiment, in the bank formation step (steps S12 to S14), two step portions 104a and 105a are formed on the wall surface on the colored region D side as the device formation region. As described above, the first bank 104, the second bank 105, and the third bank 106 are stacked to form the multilayer bank 102. In the step of forming the color filter 111 (step S15 to step S16), a plurality of types of functional liquids containing different functional materials are applied to each of the plurality of colored regions D partitioned by the multilayer bank 102 and dried. As a result, the transparent resin layer 107 and the colored layers 108R, 108G, and 108B are laminated to form a multilayer color filter 111. Since the first bank 104 is lyophilic and the second bank 105 is more lyophobic than the first bank 104 with respect to the functional liquid 60 that forms the transparent resin layer 107, the functional liquid 60 after drying is used. This edge portion is stably pinned at the boundary between the step portion 104a and the second bank 105. Similarly, the second bank 105 is lyophilic with respect to the functional liquids 70, 71, and 72 that form the colored layers 108 R, 108 G, and 108 B, and the third bank 106 is liquid repellent compared to the second bank 105. Therefore, the edge portions of the functional liquids 70, 71, 72 after drying are stably pinned at the boundary between the step portion 105a and the third bank 106. Therefore, since the pinning position of the edge portion of each functional liquid after drying is stabilized, the color filter 111 including the transparent resin layer 107 having a flat cross-sectional shape and a substantially constant film thickness and the colored layers 108R, 108G, and 108B is provided. Can be formed. That is, the color filter 111 can be manufactured as a thin film device with little color unevenness due to the film thickness unevenness of the colored layers 108R, 108G, and 108B.

  (4) In the manufacturing method of the liquid crystal display device 100 of the second embodiment, the color filter 111 is formed by using the manufacturing method of the color filter as the manufacturing method of the thin film device. Therefore, it is possible to manufacture the liquid crystal display device 100 including the color filter 111 as a thin film device with little color unevenness due to the film thickness unevenness of the colored layers 108R, 108G, and 108B.

(Embodiment 3)
Next, a specific example of an electronic apparatus including the organic EL device of the first embodiment or the liquid crystal display device of the second embodiment will be described. FIG. 10A is a schematic perspective view showing a mobile phone as an electronic apparatus, and FIG. 10B is a schematic perspective view showing a portable information processing apparatus as an electronic apparatus.

  As shown in FIG. 10A, the mobile phone 200 as the electronic apparatus according to the present embodiment has the organic EL device 20 or the liquid crystal display device 100 mounted on the display unit 201.

  As shown in FIG. 10B, the portable information processing device 300 as the electronic apparatus according to the present embodiment includes an information processing device main body 303 having an input keyboard 302 and a display unit 301. The organic EL device 20 or the liquid crystal display device 100 is mounted on the display unit 301.

The effects of the third embodiment are as follows.
(1) Since the mobile phone 200 and the portable information processing device 300 according to the third embodiment include the organic EL device 20 according to the first embodiment or the liquid crystal display device 100 according to the second embodiment, uneven light emission and luminance It is possible to provide the mobile phone 200 and the portable information processing device 300 as electronic devices that can check information such as characters and images with high display quality with few display problems such as unevenness and color unevenness.

  As mentioned above, although embodiment of this invention was described, various deformation | transformation can be added with respect to said each embodiment in the range which does not deviate from the meaning of this invention. For example, modifications other than the above-described embodiments are as follows.

  (Modification 1) In the multilayer bank 13 of the organic EL device 20 of the first embodiment, the second bank 15 and the third bank 16 made of different materials are not limited to being stacked on the first bank 14. For example, the second bank 15 and the third bank 16 are formed of acrylic photosensitive resin of the same material so that a stepped portion is formed on the wall surface, and plasma treatment is performed with a fluorine-based processing gas, thereby making the liquid repellent Can be provided such that the second bank 15 <the third bank 16. Further, by adding a material capable of imparting lyophilicity or liquid repellency to the bank constituent member and changing the amount of the material added, the relative lyophilicity between the second bank 15 and the third bank 16 or You may make it produce a difference in the degree of liquid repellency. This modification can be similarly applied to the multilayer bank 102 of the liquid crystal display device 100 of the second embodiment.

  (Modification 2) The sealing substrate 23 of the organic EL device 20 of Embodiment 1 is not necessarily required. For example, the light emitting element portion 22 of the element substrate 2 may be sealed with a sealing agent made of a light-shielding resin or the like.

  (Modification 3) The configuration of the organic EL device 20 of the first embodiment is not limited to this. For example, the substrate 101 including the color filter 111 is used instead of the sealing substrate 23 and the cathode 19 is formed in a transparent state. The so-called top emission type organic EL device 20 can be formed by sealing with the substrate 1 including the light emitting element portion 22 having a light emitting layer capable of emitting white light.

  (Modification 4) In the liquid crystal display device 100 of the second embodiment, the transparent functional layer constituting the color filter 111 is not limited to the transparent resin layer 107. For example, if a functional layer is formed using transparent materials having different refractive indexes for the colored layers 108R, 108G, and 108B, the illumination light emitted from the illumination device 130 and transmitted through the colored layers 108R, 108G, and 108B It is possible to control the emission direction such as diffusion or directivity in the layers.

  (Modification 5) In the liquid crystal display device 100 of the second embodiment, the arrangement of the colored layers 108R, 108G, and 108B of the color filter 111 is not limited to this. FIG. 11 is a plan view showing the arrangement of the colored layers. For example, the colored layers 108R, 108G, and 108B are arranged in a stripe shape as shown in FIG. 5A, but as shown in FIG. Alternatively, the color filter manufacturing method as a method for manufacturing a thin film device of the present invention can also be applied to a delta shape in which a colored layer is disposed at the apex of a triangle as shown in FIG. The same applies to the arrangement of the light emitting layers 18R, 18G, and 18B of the organic EL device 20 of the first embodiment. Further, the color layer is not limited to three colors, and may have a multicolor configuration in which other colors that expand the color reproduction range are added in addition to RGB.

  (Modification 6) The electronic device on which the organic EL device 20 of the first embodiment or the liquid crystal display device 100 of the second embodiment is mounted is not limited to the mobile phone 200 or the portable information processing device 300 of the third embodiment. For example, portable information devices called PDA (Personal Digital Assistants), portable terminal devices, word processors, digital still cameras, in-vehicle monitors, digital video cameras, liquid crystal televisions, viewfinder types, monitor direct view type video tape recorders, car navigation systems Examples of such devices include devices, pagers, electronic notebooks, calculators, workstations, videophones, POS terminals, and the like that use electro-optical devices such as organic EL devices and liquid crystal display devices.

  (Modification 7) In each of the above-described embodiments, the light emitting element portion 22 and the color filter 111 are exemplified as the thin film devices. However, any device including a multilayer thin film layer can be applied to other devices.

(A) And (b) is a schematic sectional drawing which shows the principal part structure of an organic electroluminescent apparatus. The flowchart which shows the manufacturing method of a light emitting element part. (A)-(e) is a schematic sectional drawing which shows the manufacturing method of a light emitting element part. (F)-(i) is a schematic sectional drawing which shows the manufacturing method of a light emitting element part. FIG. 3 is a schematic exploded perspective view showing a structure of a droplet discharge head. The schematic perspective view which shows the structure of a liquid crystal display device. The flowchart which shows the manufacturing method of a color filter. (A)-(e) is a schematic sectional drawing which shows the manufacturing method of a color filter. (F)-(i) is a schematic sectional drawing which shows the manufacturing method of a color filter. (A) is a schematic perspective view which shows the mobile telephone as an electronic device, (b) is a schematic perspective view which shows the portable information processing apparatus as an electronic device. (A)-(c) is a top view which shows arrangement | positioning of a colored layer.

Explanation of symbols

DESCRIPTION OF SYMBOLS 2 ... Element board | substrate as a board | substrate, 12 ... Anode, 13 ... Multi-layer bank, 14 ... 1st bank as a bank layer, 15 ... 2nd bank as a bank layer, 16 ... 3rd bank as a bank layer, 17 ... Thin film Hole injection transport layer as a layer, 18R, 18G, 18B ... Light emitting layer as a thin film layer, 20 ... Organic EL device, 21 ... Organic EL functional layer, 22 ... Light emitting element part as a thin film device, 30, 40, 41 , 42, 60, 70, 71, 72 ... functional liquid, 100 ... liquid crystal display device, 101 ... substrate, 102 ... multilayer bank, 104 ... first bank as a bank layer, 105 ... second bank as a bank layer, 106 3rd bank as a bank layer 107 Transparent resin layer as a thin film layer 108R, 108G, 108B Color layer as a thin film layer 111 Color fill as a thin film device , 200 ... mobile phone as an electronic device, 300 ... mobile information processing device as an electronic device, A ... device forming region, D ... colored regions as a device formation region.

Claims (15)

Formed on a substrate having a plurality of device formation regions;
A multi-layer bank as a partition provided to partition the plurality of device formation regions;
A plurality of thin film layers laminated by applying a plurality of types of functional liquids containing different functional materials to each of the plurality of device formation regions;
The thin film device according to claim 1, wherein the multi-layer bank is composed of at least three layers, and at least two step portions are provided on the wall surface of the multi-layer bank so that the bank layer protrudes toward the device forming region.   In the multi-layer bank, n is a natural number of 1 or more, and the n-th bank layer is lyophilic with respect to the functional liquid for forming the n-th layer of the multi-layer thin film layer, and n + 1 layers 2. The thin film device according to claim 1, wherein the eye bank layer exhibits liquid repellency as compared with the n th bank layer.   3. The multilayer bank according to claim 1, wherein n is a natural number equal to or greater than 1, and the thickness of the nth bank layer is substantially equal to the thickness of the nth layer of the multilayer thin film layer. The thin film device described. The plurality of device formation regions have an anode made of a transparent conductive film,
The thin film device according to any one of claims 1 to 3, wherein the multilayer thin film layer is an organic EL functional layer having a light emitting function laminated on the anode.   4. The thin film device according to claim 1, wherein the multilayer thin film layer is a color filter including an optically transparent functional layer and a colored layer laminated on the functional layer. 5. .   An organic EL device comprising the thin film device according to claim 4.   A liquid crystal display device comprising the thin film device according to claim 5.   An electronic apparatus comprising the organic EL device according to claim 6 or the liquid crystal display device according to claim 7. A method of manufacturing a thin film device having a multilayer thin film layer formed on a substrate having a plurality of device formation regions and laminated on each of the plurality of device formation regions,
A bank forming step of forming a multi-layer bank as a partition so as to partition the plurality of device forming regions;
A thin film forming step of forming the multilayer thin film layer by applying and drying a plurality of types of functional liquids containing different functional materials to each of the plurality of device forming regions partitioned by the multilayer bank,
In the bank forming step, at least three or more bank layers are stacked, and at least two or more stepped portions are formed on the wall surface of the multilayer bank so that the bank layer protrudes toward the device forming region. A method for manufacturing a thin film device.   In the bank forming step, n is a natural number of 1 or more, and the nth bank layer is lyophilic with respect to the functional liquid for forming the nth layer of the multilayer thin film layer, and n + 1 10. The method of manufacturing a thin film device according to claim 9, wherein the multilayer bank is formed so that the bank layer of the first layer exhibits liquid repellency as compared with the bank layer of the nth layer.   In the thin film forming step, n is a natural number of 1 or more, and the functional liquid is applied and dried so as to have a thickness substantially equal to the thickness of the nth bank layer of the multilayer bank. The thin film device manufacturing method according to claim 9, wherein the nth layer of the thin film layer is formed. Before the bank forming step, an anode forming step of forming an anode made of a transparent conductive film in each of the plurality of device forming regions on the substrate,
In the thin film forming step, the organic EL functional layer as a thin film device is formed by applying and drying the plurality of types of functional liquids including at least an organic EL light emitting material on the anode in the device forming region. The method for manufacturing a thin film device according to claim 9, wherein the thin film device is manufactured.   In the thin film forming step, a functional liquid containing a transparent functional material is applied to the device forming region and dried to form a functional layer, and a plurality of functions including different colored layer forming materials on the functional layer. The method for producing a thin film device according to any one of claims 9 to 11, wherein a color filter as a thin film device is formed by laminating a plurality of colored layers by applying a liquid and drying. . At least one substrate having a plurality of device formation regions, an anode made of a transparent conductive film formed for each of the plurality of device formation regions, and an organic EL functional layer including an organic EL light-emitting layer laminated on the anode An organic EL device manufacturing method comprising:
A method for manufacturing an organic EL device, wherein the organic EL functional layer is formed using the method for manufacturing a thin film device according to claim 12. A pair of substrates each having a plurality of device formation regions, a color filter including a plurality of colored layers formed in the plurality of device formation regions, and a liquid crystal sandwiched between the pair of substrates. A method of manufacturing a liquid crystal display device,
A method for manufacturing a liquid crystal display device, wherein a color filter is formed using the method for manufacturing a thin film device according to claim 13.

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