JP2007225850A - Method for manufacturing color filter and color filter - Google Patents

Method for manufacturing color filter and color filter Download PDF

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JP2007225850A
JP2007225850A JP2006046403A JP2006046403A JP2007225850A JP 2007225850 A JP2007225850 A JP 2007225850A JP 2006046403 A JP2006046403 A JP 2006046403A JP 2006046403 A JP2006046403 A JP 2006046403A JP 2007225850 A JP2007225850 A JP 2007225850A
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color
pixel
colored
edge
colored pixel
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Tadashi Amagasaki
匡 尼崎
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Toppan Printing Co Ltd
凸版印刷株式会社
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Abstract

[PROBLEMS] To provide a color filter in which a front color pixel and a back color pixel are faced to each other, and there is no gap between side surfaces of the front color pixel and the back color pixel, or a reverse tapered side surface. Provided is a method of manufacturing a color filter for forming a colored pixel having no color.
In this case, a rear color pixel is formed so that the upper side edge D of the adjacent rear color pixel is not in contact with the upper side edge D of the front color pixel. The rear colored pixel is formed so that the side edge H of the adjacent rear colored pixel is not in contact with the side surface of the forward taper A.
[Selection] Figure 7

Description

  The present invention relates to a method of manufacturing a color filter in which a plurality of colored pixels are sequentially provided adjacent to each other, and in particular, there is no gap between the side surfaces of a front color pixel and a rear color pixel or vice versa. The present invention relates to a method of manufacturing a color filter that forms a colored pixel having no tapered side surface.

FIG. 1 is a plan view schematically showing an example of a color filter used in a liquid crystal display device. 2 is a cross-sectional view taken along line XX ′ of the color filter shown in FIG.
As shown in FIGS. 1 and 2, the color filter used in the liquid crystal display device has a black matrix (1), a colored pixel (2), and a transparent conductive film (3) sequentially on a glass substrate (10). It is formed.
FIGS. 1 and 2 schematically show a color filter, and 12 colored pixels (2) are represented. In an actual color filter, for example, several hundreds of pixels are displayed on a 17-inch diagonal screen. A large number of colored pixels of about μm are arranged.

As a method of manufacturing a color filter having the above structure, which is used in many liquid crystal display devices, first, a black matrix is formed on a glass substrate, and then a colored pixel is aligned with this black matrix pattern. A method of forming a transparent conductive film and aligning a transparent conductive film is widely used.
The black matrix (1) is a matrix having light shielding properties, and the colored pixels (2) have, for example, red, green and blue filter functions and are provided adjacent to each other. The transparent conductive film (3) is provided as a transparent electrode.

  The black matrix (1) is composed of a matrix portion (1A) between the colored pixels (2) and a frame portion (1B) surrounding the periphery of the region (display portion) where the colored pixels (2) are formed. Yes. The black matrix determines the position of the colored pixels of the color filter, makes the size uniform, and shields unwanted light when used in a display device, making the image of the display device uniform and uniform. In addition, it has a function of making an image with improved contrast.

The black matrix is formed on the glass substrate by, for example, forming a metal thin film on the glass substrate (10) and photoetching the metal thin film.
Alternatively, the black matrix (1) is formed on the glass substrate (10) by photolithography using a black photoresist for forming a black matrix.

  In addition, the colored pixel (2) is formed by providing a coating film on a glass substrate on which the black matrix is formed using, for example, a negative colored photoresist in which a pigment or other pigment is dispersed. A method is employed in which colored pixels are sequentially formed for each color by exposure to light and development. The transparent conductive film (3) is formed by, for example, forming a transparent conductive film on a glass substrate on which a black matrix and colored pixels are formed by sputtering using ITO (Indium Tin Oxide). ing.

When forming the black matrix, the colored pixels, and the associated layers as a pattern by photolithography, for example, first, a glass substrate is subjected to a cleaning treatment as necessary, and then a photoresist is applied by a coating apparatus. Then, a preliminary drying process by a reduced pressure drying apparatus, a pre-baking process by a pre-baking apparatus, a pattern exposure by an exposure apparatus, a developing process by a developing process unit, and a post-baking process by a heating unit are sequentially performed to form a predetermined pattern on the glass substrate.
The color filter shown in FIGS. 1 and 2 has a basic function as a color filter used in a liquid crystal display device.

  As the pixels of liquid crystal display devices become finer, the width of the formed black matrix is becoming increasingly narrow. Due to the narrowing of the black matrix, there may be a gap due to the positional deviation of the colored pixel when forming the colored pixel, that is, a gap between the black matrix and the colored pixel.

FIG. 3 is an explanatory diagram enlarging a portion indicated by reference numeral (S) in FIG. In FIG. 3, the transparent conductive film (3) is omitted.
FIG. 3A shows an example in which the black matrix (1) has a sufficient width (W1). As shown in FIG. 3A, the end of the first color pixel (2-1) and the end of the second color pixel (2-2) overlap the end of the black matrix (1). It is formed as follows. The amount of overlap is sufficient and is the state before the black matrix is narrowed.

  FIG. 3B is an explanatory diagram of a state in which the black matrix is narrowed. As shown in FIG. 3B, the width of the black matrix (1) is narrow (W2). The end of the first color pixel (2-1) is formed to overlap the end of the black matrix (1), but the end of the second color pixel (2-2) is a color pixel. Due to the misalignment of the black matrix (1), the end does not overlap the end of the black matrix (1), and there is a gap (M) between the black matrix (1) and the second color pixel (2-2). This is an example.

This gap (M) is also referred to as a white spot. When such a color filter is used in a liquid crystal display device, the display quality is adversely affected. Therefore, the generation of the gap (M) is not preferable. Absent.
Therefore, in order to avoid the occurrence of such white spots (gap) (M), the side surface of the first color pixel (2-1) and the second color at the center of the width of the black matrix (1). The colored pixel is formed in a state where both side surfaces of the side surface of the colored pixel (2-2) are abutted.

That is, as shown in FIG. 3C, a butt (N) in which both side surfaces are in contact with each other without providing a space between the first color pixel (2-1) and the second color pixel (2-2). In this state, the first color pixel (2-1) and the second color pixel (2-2) are formed.
As a result, the occurrence of white spots (gap) (M) due to positional deviation when forming colored pixels is avoided.
However, when the colored pixel is formed in such a state that the both sides of the colored pixel are in contact with each other (N), the side surface of the first colored pixel (2-1) and the second colored pixel (2-2) are formed. Another problem arises in that a gap resulting from the development processing described later occurs at a portion where both side surfaces of the side surface of () are butted (N).

FIGS. 4A to 4C are explanatory views schematically showing the occurrence of gaps resulting from the development processing. FIG. 4 shows an example in which the number of colors of the colored pixels is three. In FIG. 4, the black matrix (1) and the transparent conductive film (3) are omitted.
FIG. 4A is a cross-sectional view of the stage where the first color pixel (2-1) is formed on the glass substrate (10). As shown in FIG. 4A, the colored pixel (2-1) of the first color usually has a trapezoidal shape (isosceles trapezoidal shape) in cross section.

As shown in FIG. 4A, a state where the side surface of the colored pixel is inclined like a trapezoidal side surface whose upper base is smaller than the lower base is referred to as a forward taper (A) in the present invention. That is, the cross-sectional shape of the colored pixel (2-1) of the first color shown in FIG. 4A is a trapezoid, and its side surface is a forward taper (A).
In FIG. 3, the cross-sectional shape of the colored pixels is rectangular for the sake of explanation.

FIG. 4B is a cross-sectional view of the stage where the second color pixel (2-2) is subsequently formed. As shown in FIG. 4B, the side of the second color pixel (2-2) facing the first color pixel (2-1) is colored like the inverted trapezoid side. It has a side surface parallel to the forward taper (A) of the side surface of the pixel (2-1).
In addition, the other side surface of the second color pixel (2-2) has a forward taper (A) like a trapezoidal side surface. A gap (C) is generated between the first color pixel (2-1) and the second color pixel (2-2).

In the present invention, the side surface of the colored pixel is inclined like an inverted trapezoidal side surface whose lower base is smaller than the upper base is referred to as an inverted taper (B).
That is, the cross-sectional shape of the colored pixel (2-2) of the second color shown in FIG. 4B has a reverse taper (B) on the side surface facing the colored pixel (2-1) of the first color. The other side surface is a forward taper (A).
Note that the reverse taper (B) may be referred to as an overhang.

FIG. 4C is a cross-sectional view at a stage where a colored pixel (2-3) of the third color is subsequently formed. As shown in FIG. 4C, the cross-sectional shape of the third color pixel (2-3) is an inverted trapezoid.
The side surface facing the colored pixel (2-2) of the second color has a reverse taper (B) parallel to the forward taper (A) of the colored pixel (2-2) of the second color. The other side faces the colored pixel (2-1B) of the first color, and becomes a reverse taper (B) parallel to the forward taper (A) of the colored pixel (2-1B) of the first color. ing. Between the second color pixel (2-2) and the third color pixel (2-3), and between the third color pixel (2-3) and the first color pixel (2-1B). Each has a gap (C) due to the development process.

As described above, when the colored pixel is formed in a state in which both end faces of the colored pixel are in contact with each other as shown in FIG. 3C, between the colored pixels of the first color and the second color, between the colored pixels of the second color and the third color, And a gap (C) caused by the development processing between the colored pixels of the third color and the first color, that is, between the colored pixels of the previous color and the adjacent colored pixels of the adjacent rear color within the sequential formation of the colored pixels. Will occur.
Then, at least one side surface of the colored pixels of the second and subsequent colors has a cross-sectional shape of reverse taper (overhang) (B).

  As described above, when there is a gap (C) between the colored pixels and the side surfaces of the colored pixels are inversely tapered (B), the transparent conductive film (3 shown in FIG. ) May not be formed uniformly. In the gap (C), the film thickness of the transparent conductive film (3) becomes thin or a disconnection occurs, which hinders the display screen. Moreover, the components of the colored pixels may be eluted from a portion where the transparent conductive film (3) has a small film thickness or a broken portion, which may hinder the display screen.

As shown in FIG. 3C, the method of forming the colored pixels in a state in which the side surfaces facing each other of the adjacent colored pixels face each other is a countermeasure for the narrowing of the black matrix as described above. In addition to the above, the black matrix may be used in a color filter having a sufficient width.
For example, when it is desired to avoid the reflected light from the metal thin film when the metal thin film is used as the material of the black matrix, this is a method adopted to cover the metal thin film. Even in such a case, disconnection of the transparent conductive film (3) occurs in the same manner, and there is a problem similarly.
JP-A-8-201797

The present invention has been made in order to solve the above-described problem, and a plurality of colored pixels are sequentially provided adjacent to each other, and the colored pixels of the front color and the colored pixels of the rear color are provided to face each other. To provide a method for producing a color filter that can form a color pixel without a gap between the side surfaces of the front color pixel and the back color pixel or without a reverse tapered side surface even for the color filter. Is an issue.
It is another object of the present invention to provide a color filter manufactured using the above-described color filter manufacturing method.
As a result, a transparent conductive film having a uniform film thickness is formed on the entire surface of the colored pixels, and the occurrence of disconnection or the like and the elution of the components of the colored pixels are avoided. That is, the display screen is not hindered.

The present invention provides a color filter manufacturing method in which a plurality of colored pixels are sequentially provided adjacent to each other by photolithography on a substrate.
At the initial stage of development after exposure to the photoresist coating film through the photomask, the upper edge of the adjacent colored pixel in the adjacent rear color is in contact with the upper edge of the preceding colored pixel in the sequential order. Forming a colored pixel of the subsequent color so as not to prevent the colored pixel of the subsequent color from contacting the forward tapered side surface of the colored pixel of the preceding color in the sequential order with the side edge of the adjacent colored pixel of the subsequent color not touching Forming a color filter.

  Further, the present invention provides the color filter manufacturing method according to claim 1, wherein the rear color of the front color pixel is overlapped with the upper side edge of at least one of the adjacent rear color pixels. A color filter manufacturing method characterized by forming colored pixels.

  According to the present invention, in the color filter manufacturing method according to claim 1, at the end of development, at least one of the adjacent colored pixels of the rear color adjacent to the lower edge of the colored pixels of the preceding color in the sequential order. A color filter manufacturing method is characterized in that a colored pixel of a rear color is formed so that a lower side end of the color filter comes into contact.

  Moreover, this invention is a color filter manufactured using the manufacturing method of the color filter of any one of Claims 1-3.

  In the present invention, at the initial stage of development after exposure of the photoresist coating film through the photomask, the adjacent colored pixels of the rear color are adjacent to the upper edge of the colored pixels of the previous color in the sequential order. A rear color pixel is formed so that the upper edge is not touched, or a rear color so that the side edge of the adjacent rear color pixel is not in contact with the forward tapered side surface of the previous color pixel in the sequential order. Therefore, even if the color filter is provided by matching the front color pixel and the back color pixel, the front color pixel and the back color pixel This is a method for producing a color filter that can form colored pixels with no gaps between the side surfaces or without the reverse tapered side surfaces.

In the present invention, the rear color pixel is formed on the upper side edge of the front color pixel so that the upper side edge of at least one of the adjacent rear color pixels overlaps, or the development end stage so,
Since it is a manufacturing method of a color filter that forms a colored pixel of a rear color so that the lower edge of at least one of the adjacent colored pixels of the rear color is in contact with the lower edge of the colored pixel of the previous color, Even if the color filter is provided by matching the colored pixels of the rear color, it is possible to form a colored pixel that has no gap between the side surfaces of the colored pixel of the previous color and the colored pixel of the rear color or that has no reverse tapered side surface. It becomes the manufacturing method of the color filter which can be performed.

Hereinafter, embodiments of the present invention will be described in detail.
When the present inventor forms a colored pixel in a state in which the side surfaces of the adjacent colored pixels facing each other are abutted, a portion where the side surfaces of the front color pixel and the side surfaces of the rear color pixel are abutted, As a result of scrutinizing a state in which a gap due to the development processing is generated, the cause has been found and the present invention has been made.

  FIGS. 5A to 5E are explanatory diagrams showing details of the process in which gaps due to development processing occur. FIGS. 5A to 5E are explanatory views schematically showing the generation of gaps in the first color pixel (2-1) and the second color pixel (2-2). In FIG. 5, the black matrix (1) and the transparent conductive film (3) are omitted. FIG. 5A is a cross-sectional view of the stage where the first color pixel (2-1) is formed on the glass substrate (10). As shown in FIG. 5A, the cross-sectional shape of the first color pixel (2-1) is trapezoidal, and the side surface is a forward taper (A).

FIG. 5B is a cross-sectional view of a stage where a colored photoresist coating film 12 is subsequently formed. For example, when a colored photoresist is applied using a spinner, the film thickness (T2) of the coating film on the first color pixel (2-1) is equal to the film thickness (T1) of the coating film on the glass substrate (10). It is formed thinner.
FIG. 5C is a cross-sectional view of the stage where the colored photoresist coating film 12 is subsequently exposed through the first photomask PM1. In this example, a negative colored photoresist is used as the colored photoresist, and the second colored pixel (2-2) is applied by the irradiation light (L) transmitted through the light transmitting portion of the first photomask (PM1). Exposure to form is performed.

FIG. 5D is a cross-sectional view of a state where development is performed on the exposed coating film 12, and is a state at an early stage of development. As shown in FIG. 5D, the coating film (12) provided on the colored pixel (2-1) of the first color is dissolved and removed by development, but the coating on the glass substrate (10). The film (12) is being dissolved and removed from its upper part by development.
In the initial stage of development, the unexposed coating film of the photoresist on the first color pixel (2-1) is dissolved and removed, and the first color pixel (2-1 upper surface) is exposed. Points to the stage.

  When the coating film (12) provided on the first color pixel (2-1) is dissolved and removed, the second color is applied to the upper edge (D) of the first color pixel (2-1). The upper edge (E) of the colored pixel (2-2) is in contact. This is because the upper edge (E) is in contact with the upper edge (D) when the coating film (12) provided on the first color pixel (2-1) is dissolved and removed. This is because the first photomask (PM1) in which the light transmission part is adjusted in advance is used, and is performed in order to find the cause of the occurrence of the gap.

From this state, when the development is continued, the developer (20) moves from the position where the upper edge (D) and the upper edge (E) are in contact with the side surface of the colored pixel (2-1) of the first color. It penetrates the interface of the side surface of the colored pixel (2-2) of the second color and passes along the side surface of the forward taper (A) of the colored pixel (2-1) of the first color of the colored pixel (2-2) of the second color. The coating film (12) in the meantime is dissolved and the coating film (12) in the meantime is dissolved. As shown in FIG. 5 (e), the side of the first color pixel (2-1) and the second color pixel ( A gap (C) is formed between the side surfaces of 2-2). And the side surface which opposes the colored pixel (2-1) of the 1st color of the colored pixel (2-2) of the 2nd color becomes reverse taper (B).

On the other hand, the colored pixel (2-1) of the first color is a pixel that has already been subjected to the post-baking process and is not dissolved by the developer (20). Therefore, as shown in FIG. 5A, the cross-sectional shape of the colored pixel (2-1) of the first color is a trapezoid, and the side surface remains a forward taper (A).
The development completion stage refers to a stage where the unexposed coating film (12) of the photoresist on the glass substrate (10) is dissolved and removed, and the surface of the glass substrate (10) is exposed.

  In this way, similarly to the color pixels of the first color and the second color, between the color pixels of the second color and the third color, and between the color pixels of the third color and the first color, that is, within the sequential formation of the color pixels. A gap (C) caused by the development process is generated between the colored pixel of the previous color and the adjacent colored pixel of the subsequent color. In addition, at least one side surface of the colored pixels for the second and subsequent colors has a reverse taper (B) cross-sectional shape (see FIG. 4C).

6A to 6B show the stage where the unexposed coating film (12) of the photoresist on the colored pixel (2-1) of the first color is dissolved and removed, that is, at the initial stage of development. In the stage, the light transmission part is previously set so that the side edge (H) of the colored pixel (2-2) of the second color is in contact with the side surface of the forward taper (A) of the colored pixel (2-1) of the first color. It is explanatory drawing at the time of using the adjusted 2nd photomask (PM2).
FIG. 6A is a cross-sectional view at a stage where the photoresist coating film (12) is exposed through the second photomask (PM2).

  FIG. 6B shows a state at an early stage of development. That is, the coating film (12) provided on the colored pixel (2-1) of the first color is dissolved and removed by development, but the coating film (12) on the glass substrate (10) is developed by development. It is dissolved and removed from the top. The side surface end (H) of the colored pixel (2-2) of the second color is in contact with the side surface of the forward taper (A) of the colored pixel (2-1) of the first color.

  From this state, when the development is continued, the developer (20) moves from the position where the side edge (H) contacts the side surface of the forward taper (A) to the colored pixel (2-1) of the first color. It penetrates into the interface between the side surface and the side surface of the second color pixel (2-2), and the second color pixel (2-2) along the side surface of the forward taper (A) of the first color pixel (2-1). The coating film (12) in the meantime is dissolved.

  Similarly to the behavior shown in FIGS. 5D and 5E, at the end of development, the side surface of the first color pixel (2-1) and the side surface of the second color pixel (2-2) are displayed. A gap (C) is formed between them. And the side surface which opposes the colored pixel (2-1) of the 1st color of the colored pixel (2-2) of the 2nd color becomes reverse forward taper (B). On the other hand, the colored pixel (2-1) of the first color is a pixel that has already been subjected to the post-baking process and is not dissolved by the developer (20). That is, the cross-sectional shape of the colored pixel (2-1) of the first color is a trapezoid, and the side surface remains a forward taper (A).

The present invention has been made based on the results of the above-described examination.
7A to 7C are explanatory views of an example of a method for manufacturing a color filter according to the second aspect of the present invention. In this manufacturing method, as shown in FIG. 7B, the unexposed coating film (12) of the photoresist on the colored pixel (2-1) of the first color is dissolved and removed, that is, in the development process. In the initial stage, the second color of the second color pixel (2-2) overlaps the upper surface (D) of the first color pixel (2-1) from the upper side edge (D) of the second color. It is a manufacturing method which forms a colored pixel (2-2).

  FIG. 7A is a cross-sectional view at a stage where the photoresist coating film 12 is exposed through the third photomask PM3. This third photomask (PM3) is an upper stage from the upper edge (D) of the first color pixel (2-1) to the upper surface of the first color pixel (2-2) at the initial stage of development. This is a third photomask (PM3) in which the light transmission portion is adjusted in advance so that the end (E) overlaps.

FIG. 7B shows a state at an early stage of development. That is, the unexposed coating film (12) provided on the colored pixel (2-1) of the first color is dissolved and removed by development, but the coating film (12) on the glass substrate (10). Is being dissolved and removed from the top by development. The upper edge (E) of the colored pixel (2-2) of the second color overlaps the upper surface from the upper edge (D) of the colored pixel (2-1) of the first color.
The overlap width (W3) is preferably larger than the film thickness (T3) of the remaining coating film (12).

  From this state, when the development is continued, the developer (20) has an upper surface (E) of the upper surface of the first color pixel (2-1) and the second color pixel (2-2). Does not reach the upper edge (D) of the first color pixel (2-1). Accordingly, the process proceeds below the colored pixel (2-2) of the second color along the side of the forward taper (A) of the colored pixel (2-1) of the first color, and dissolving the coating film (12) in the meantime. Absent.

  Then, as shown in FIG. 7C, at the development end stage, the side of the second color pixel (2-2) facing the first color pixel (2-1) is the first color pixel. The reverse taper (B) is in close contact with the forward taper (A) of the colored pixel (2-1). However, the gap (C) does not occur due to the overlapping of the upper edge (E) of the second color pixel (2-2). The overlapping amount of the upper edge (E) of the colored pixel (2-2) of the second color is adjusted mainly by the photomask used.

  FIGS. 8A to 8C are explanatory views of an example of a color filter manufacturing method according to the invention of claim 3. In this manufacturing method, as shown in FIG. 8B, the unexposed coating film (12) of the photoresist on the colored pixel (2-1) of the first color is dissolved and removed, that is, in the development process. Coloring the second color so that the side edge (H) of the colored pixel (2-2) of the second color does not contact the side surface of the forward taper (A) of the colored pixel (2-1) of the first color in the initial stage The pixel (2-2) is formed, and as shown in FIG. 8C, the second color is applied to the lower edge (F) of the first color pixel (2-1) at the development end stage. In this manufacturing method, the colored pixel (2-2) of the second color is formed so that the lower edge (G) of the colored pixel (2-2) is in contact.

  FIG. 8A is a cross-sectional view at a stage where the photoresist coating film (12) is exposed through the fourth photomask (PM4). This fourth photomask (PM4) is provided at the initial stage of development on the side surface of the first color pixel (2-1) with the forward taper (A) on the side surface end of the second color pixel (2-2). (H) does not touch so as to form the second color pixel (2-2), and at the end of development, at the lower edge (F) of the first color pixel (2-1), A fourth photomask (PM4) whose light transmission portion was adjusted in advance was used so that the lower edge (G) of the second color pixel (2-2) was in contact.

FIG. 8B shows a state at an early stage of development. That is, the unexposed coating film (12) provided on the colored pixel (2-1) of the first color is dissolved and removed by development, but the coating film (12) on the glass substrate (10) is It is being dissolved and removed from the upper part by development. On the side surface of the forward taper (A) of the first color pixel (2-1), the second color pixel (
The side end (H) of 2-2) is not in contact.

When development is continued from this state, the developer (20) continues to dissolve and remove the unexposed portions of the coating film (12), and as shown in FIG. In the stage, the second color pixel (2-) so that the lower side edge (F) of the second color pixel (2-2) is in contact with the lower side edge (F) of the first color pixel (2-1). 2) is formed.
Accordingly, a V-shaped gap (C ′) different from the gap (C) is generated between the first color pixel (2-1) and the second color pixel (2-2). A side surface of the second color pixel (2-2) facing the first color pixel (2-1) is a forward taper (A).

  That is, since the side surface of the colored pixel (2-1) of the first color and the side surface of the colored pixel (2-2) of the second color are both sides of the forward taper (A), The disconnection of the transparent conductive film does not occur.

It is the top view which showed typically an example of the color filter used for a liquid crystal display device. It is sectional drawing in the X-X 'line | wire of the color filter shown in FIG. (A) is an example when the width of the black matrix is sufficient. (B) is explanatory drawing of the state by which the black matrix was narrowed. (C) is explanatory drawing of the state which matched both the side surfaces of the coloring pixel. (A)-(c) is explanatory drawing which showed typically the generation | occurrence | production state of the clearance gap resulting from a development process. (A)-(e) is explanatory drawing of the content which examined closely the process in which the clearance gap resulting from a development process generate | occur | produces. (A)-(b) used the adjusted 2nd photomask so that the side edge of the color pixel of the 2nd color might contact | connect the side surface of the forward taper of the color pixel of the 1st color in the initial stage of image development. It is explanatory drawing in the case. (A)-(c) is explanatory drawing of an example of the manufacturing method of the color filter by the invention concerning Claim 2. (A)-(c) is explanatory drawing of an example of the manufacturing method of the color filter by the invention concerning Claim 3.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 ... Black matrix 2 ... Colored pixel 2-1, 2-1B ... Colored pixel of the 1st color 2-2 ... Colored pixel of the 2nd color 2-3 ... Colored pixel 3 of the 3rd color ... Transparent conductive film 10 ... Glass substrate 12 ... Photoresist coating film 20 ... Developer A ... Side taper forward B ... Side taper reverse (overhang)
C: Gap caused by development when forming colored pixels C '... V-shaped gap D ... Upper edge E of the first colored pixel E ... Upper edge of the colored pixel of the second color F: Lower edge G of the colored pixel of the first color G ... Lower edge H of the colored pixel of the second color H ... Side edge L of the colored pixel ... Irradiation light M ... When forming the colored pixel White spots (gap) due to misalignment
N ... Matching PM1-PM4 ... First-fourth photomask

Claims (4)

  1. In a method for manufacturing a color filter, in which a plurality of colored pixels are sequentially provided adjacent to each other by photolithography on a substrate,
    At the initial stage of development after exposure to the photoresist coating film through the photomask, the upper edge of the adjacent colored pixel in the adjacent rear color is in contact with the upper edge of the preceding colored pixel in the sequential order. Forming a colored pixel of the subsequent color so as not to prevent the colored pixel of the subsequent color from contacting the forward tapered side surface of the colored pixel of the preceding color in the sequential order with the side edge of the adjacent colored pixel of the subsequent color not touching Forming a color filter.
  2.   2. The method of manufacturing a color filter according to claim 1, wherein the colored pixel of the rear color is formed so that the upper edge of at least one of the adjacent colored pixels of the rear color overlaps the upper edge of the colored pixel of the preceding color. A method for producing a color filter characterized by the above.
  3.   2. The color filter manufacturing method according to claim 1, wherein at the end of development, at least one lower side edge of the adjacent rear color pixel is in contact with a lower side edge of the preceding color pixel in the sequential order. And forming a colored pixel of the rear color.
  4.   The color filter manufactured using the manufacturing method of the color filter of any one of Claims 1-3.
JP2006046403A 2006-02-23 2006-02-23 Method for manufacturing color filter and color filter Pending JP2007225850A (en)

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Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6360426A (en) * 1986-08-30 1988-03-16 Canon Inc Ferroelectric liquid crystal element
JPS6382405A (en) * 1986-09-27 1988-04-13 Canon Inc Ferroelectric liquid crystal element
JPH0784248A (en) * 1993-09-16 1995-03-31 Hitachi Device Eng Co Ltd Liquid crystal display element and its production
JPH0821995A (en) * 1994-07-05 1996-01-23 Casio Comput Co Ltd Color liquid crystal display device and its manufacture
JPH10268292A (en) * 1997-01-21 1998-10-09 Sharp Corp Color filter substrate and color filter display element
JPH11212076A (en) * 1998-01-27 1999-08-06 Toppan Printing Co Ltd Color filter for liquid crystal display device
JP2003232915A (en) * 2002-11-14 2003-08-22 Seiko Epson Corp Color filter substrate, method for manufacturing the same, electrooptic device, method for manufacturing the same, and electronic apparatus

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6360426A (en) * 1986-08-30 1988-03-16 Canon Inc Ferroelectric liquid crystal element
JPS6382405A (en) * 1986-09-27 1988-04-13 Canon Inc Ferroelectric liquid crystal element
JPH0784248A (en) * 1993-09-16 1995-03-31 Hitachi Device Eng Co Ltd Liquid crystal display element and its production
JPH0821995A (en) * 1994-07-05 1996-01-23 Casio Comput Co Ltd Color liquid crystal display device and its manufacture
JPH10268292A (en) * 1997-01-21 1998-10-09 Sharp Corp Color filter substrate and color filter display element
JPH11212076A (en) * 1998-01-27 1999-08-06 Toppan Printing Co Ltd Color filter for liquid crystal display device
JP2003232915A (en) * 2002-11-14 2003-08-22 Seiko Epson Corp Color filter substrate, method for manufacturing the same, electrooptic device, method for manufacturing the same, and electronic apparatus

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