JP2007059119A - Organic electroluminescence element and organic electroluminescence display - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an organic electroluminescence element having white light emission, high luminance, and low electric power consumption. <P>SOLUTION: This organic electroluminescence element has a plurality of light emitting layers having a light extracting and/or condensing sheet on the light extracting side. The organic electroluminescence element is characterized in that the light taking-out and/or condensing sheet satisfies the following requirements (A) and (B): (A) the light extracting and/or condensing sheet is set so that the front luminance amplification rate (a) in the wavelength region of 430 nm to 480 nm is 2.0 ≤ a ≤ 5.0, and the front luminance amplification rate (b) in the wavelength region of 510 nm to 550 nm is 1.5 ≤ b ≤ 4.0, and the front luminance amplification rate (c) in the wavelength region of 600 nm to 640 nm is 1.0 ≤ c ≤ 3.0, and (a) has a maximum value, and (B) The light extracted from the light extracting and/or condensing sheet is white light. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

  The present invention relates to an organic electroluminescence element and an organic electroluminescence display.

  As a light-emitting electronic display device, there is an electroluminescence display (ELD). Examples of the constituent elements of ELD include inorganic electroluminescent elements (inorganic EL elements) and organic electroluminescent elements (hereinafter also referred to as organic EL elements). Inorganic electroluminescent elements have been used as planar light sources, but an alternating high voltage is required to drive the light emitting elements.

  An organic electroluminescence element has a structure in which a light emitting layer containing a compound that emits light is sandwiched between a cathode and an anode, and injects electrons and holes into the light emitting layer to recombine excitons. This is an element that emits light by utilizing the emission of light (fluorescence / phosphorescence) when this exciton is deactivated, and can emit light at a voltage of several volts to several tens of volts. Therefore, it has a wide viewing angle, high visibility, and since it is a thin-film type completely solid element, it has attracted attention from the viewpoints of space saving and portability.

  However, for organic EL elements for practical use in the future, development of organic EL elements that emit light efficiently and with high brightness with further low power consumption is desired.

  On the other hand, as one means for achieving high brightness, a technique for extracting light from a transparent substrate to the outside has been studied.

In particular, in an organic electroluminescence backlight that emits light from a substrate (glass substrate, resin substrate, etc.), part of the light emitted from the light emitting layer causes total reflection at the interface between the substrate and air. The problem of loss of light occurs. In order to solve this problem, the prism surface or lens sheet is processed on the surface of the substrate, or the prism sheet or lens sheet is attached to the surface of the substrate, thereby suppressing total reflection and improving the light extraction efficiency. (For example, Patent Documents 1 and 2). However, these prior arts are exclusively for the purpose of external extraction efficiency, and there is no description referring to low voltage and color balance.
Japanese Patent Laid-Open No. 10-223367 JP 2003-59641 A

  An object of the present invention is to provide an organic electroluminescence device that emits white light, has high luminance, and has low power consumption, and can be used particularly as a white backlight, and has excellent color reproducibility in combination with a color filter. An organic electroluminescence device capable of providing an organic electroluminescence display is provided.

  The above object of the present invention is achieved by the following means.

1. In the organic electroluminescence device having a light extraction and / or light collecting sheet on the light extraction side, the organic electroluminescence device includes an organic material including at least an anode, a cathode, and a plurality of light emitting layers between the anode and the cathode on a support substrate. It has a configuration in which compound layers are laminated,
And the said light extraction and / or condensing sheet satisfy | fill the requirements of the following (A) and (B), The organic electroluminescent element characterized by the above-mentioned.
(A) The front luminance amplification factor at a wavelength of 430 nm to 480 nm of the light extraction and / or condensing sheet is a, the front luminance amplification factor at a wavelength of 510 nm to 550 nm is b, and the front luminance amplification factor at a wavelength of 600 nm to 640 nm is c. Where a to c are
2.0 ≦ a ≦ 5.0
1.5 ≦ b ≦ 4.0
1.0 ≦ c ≦ 3.0
And a has the maximum value.
(B) The light extracted from the light extraction and / or the light collecting sheet is white light.

  2. 2. The organic electroluminescent element according to 1 above, wherein light emitted from the light emitting layer is composed of three colors of blue, green, and red.

  3. 3. The organic electroluminescence device as described in 1 or 2 above, which has at least one light emitting layer containing at least one phosphorescent dopant.

  4). Blue light, green light, and red light are obtained from white light extracted from the organic electroluminescence element according to any one of 1 to 3 through a blue filter, a green filter, and a red filter. Organic electroluminescence display.

  A first object of the present invention is to provide an organic electroluminescence device capable of extracting white light with low power, high luminance and excellent color balance, and an organic electroluminescence display using the device. The second purpose is to provide a white backlight having excellent color reproducibility in combination with a color filter.

  Hereinafter, details of each component according to the present invention will be sequentially described.

《Organic electroluminescence device》
The organic electroluminescence element of the present invention will be described.
The organic electroluminescent element of the present invention is composed of a substrate, an electrode, a light emitting layer, and a light extraction and / or light collecting sheet.

《Light emission, front luminance, chromaticity of organic electroluminescence device》
The emission color of the organic electroluminescence device of the present invention and the compound related to the device is shown in FIG. 4.16 on page 108 of “New Color Science Handbook” (Edited by the Japan Color Society, University of Tokyo Press, 1985). It is determined by the color when the result measured with the total CS-1000 (manufactured by Konica Minolta Sensing) is applied to the CIE chromaticity coordinates. The white color in the organic electroluminescence device of the present invention means that the chromaticity of the CIE1931 color system is x = 0.33 ± 0.07, y = 0.33 when the 2 ° C. viewing angle front luminance is measured by the above method. It is characterized by being in the range of ± 0.07.

<< Light extraction and / or condensing sheet >>
In particular, for organic electroluminescence devices for backlights, it is usually desirable that the light is radiated in all directions and the brightness does not change even if the viewing angle changes. It is desirable to reduce the luminance at a large viewing angle (an angle observed from an oblique direction). For this purpose, a diffusion plate and a prism sheet for controlling the radiation angle are combined on the organic electroluminescence element.

  In addition, in an organic electroluminescence element that emits light from a substrate (glass substrate, resin substrate, etc.), part of the light emitted from the light emitting layer causes total reflection at the interface between the substrate and air, and the light is emitted. The problem of loss occurs. In order to solve this problem, the prism surface or lens sheet is processed on the surface of the substrate, or the prism sheet or lens sheet is attached to the surface of the substrate, thereby suppressing total reflection and improving the light extraction efficiency. . Although the preferable form of the light extraction and / or condensing sheet of this invention is demonstrated below, if it is in the range which does not impair the objective effect in this invention, it will not be limited to these.

(1) Configuration in which a diffusing plate and a prism sheet are placed on a glass substrate In an organic electroluminescence device comprising a glass substrate / transparent conductive film / organic light emitting layer / electrode / sealing layer, the glass substrate has a side opposite to the light emitting layer. A first diffusion plate is placed in contact with the substrate surface. A first lens sheet (for example, 3M BEF II) is arranged so as to be in contact with the diffusion plate so that the lens surface faces the opposite side of the glass substrate, and the second lens sheet is formed with a stripe of the first lens. It is arranged so as to be orthogonal to the stripe of the lens and the lens surface thereof facing away from the glass substrate. Next, a second diffusion plate is disposed so as to be in contact with the second lens sheet. As the shape of the first and second lens sheets, a Δ-shaped stripe having an apex angle of 90 degrees and a pitch of 50 μm is formed of acrylic resin on a PET base material. A shape with a rounded apex angle (3M RBEF), a shape with a randomly changed pitch (3M BEF III), or other similar shapes may be used. As the first diffusion plate, a film in which beads for diffusing light are mixed is formed on a PET substrate of about 100 μm, and the transmittance is about 85% and the haze value is about 75%. As the second diffusion plate, a film in which beads for diffusing light are mixed is formed on a PET substrate of about 100 μm, and the transmittance is about 90% and the haze value is about 30%. The diffusion plate arranged in contact with the glass substrate may be bonded to the glass substrate via an optical adhesive. Further, a layer for diffusing light may be directly applied to the surface of the glass substrate, or a fine structure for diffusing light may be provided on the surface of the glass substrate. The glass substrate has been described above, but the substrate may be a resin substrate.

(2) When forming a microlens array on the surface of a substrate In an organic electroluminescence device comprising a glass substrate / transparent conductive film / organic light emitting layer / electrode / sealing layer, the surface of the glass substrate provided with the organic light emitting layer; Attach a microlens array sheet to the opposite surface via an optical adhesive. Each microlens array sheet has a shape in which microlenses each having a square apex of 50 μm (pyramid shape) and an apex angle of 90 degrees are aligned at a pitch of 50 μm. The sheet is manufactured by injecting UV curable resin between a metal mold that is the mother mold of the microlens array and a glass plate placed between 0.5 mm spacers, and UV exposure from the glass substrate. By doing so, the resin is cured to obtain a microlens array sheet. Here, as the shape of each microlens, a conical shape, a triangular pyramid shape, a convex lens shape, or the like is applicable. Although described as a structure in which the microlens array sheet is attached to the glass substrate, the microlens array sheet may be attached to the resin substrate. Moreover, the structure of providing a transparent electrode / organic light emitting layer / electrode / sealing layer on the surface opposite to the surface provided with the microlens array of the microlens array sheet may be used.

(3) Structure for adhering the microlens array sheet downward on the surface of the substrate In an organic electroluminescence device comprising a glass substrate / transparent conductive film / organic light emitting layer / electrode / sealing layer, an organic light emitting layer of the glass substrate is provided. The microlens array sheet is attached to the surface opposite to the surface on which the concave and convex surfaces of the microlens face the glass substrate side via an optical adhesive. The microlens array sheet has a shape in which microlenses having a structure in which the apexes of a rectangular shape each having a side of 50 μm are flat are arranged at a pitch of 50 μm. The flat top portion is adhered to the surface of the glass substrate. Here, as the shape of each microlens, a conical shape, a triangular pyramid shape, a convex lens shape, or the like is applicable.
Although described as a structure in which the microlens array sheet is attached to the glass substrate, the microlens array sheet may be attached to the resin substrate.

  In order to further increase the light extraction efficiency, it is preferable to insert a low refractive index layer. When a low refractive index medium is formed between the transparent electrode and the transparent substrate with a thickness longer than the wavelength of light, the light extracted from the transparent electrode has a higher extraction efficiency to the outside as the refractive index of the medium is lower. . Examples of the low refractive index layer include aerogel, porous silica, magnesium fluoride, and a fluorine-based polymer. Since the refractive index of the transparent substrate is generally about 1.5 to 1.7, the low refractive index layer preferably has a refractive index of about 1.5 or less. Furthermore, it is preferable that it is 1.35 or less. The thickness of the low refractive index medium is preferably at least twice the wavelength in the medium. This is because the effect of the low refractive index layer is diminished when the thickness of the low refractive index medium is about the wavelength of light and the electromagnetic wave that has exuded by evanescent enters the substrate. Examples of the low refractive index layer of the present invention will be described below, but the present invention is not limited to these as long as the object effects are not impaired.

(1) Dispersing hollow silica A method for producing a glass substrate having a low refractive index layer in which hollow silica is dispersed by a sol-gel method will be described.

A low refractive index layer is formed on a glass substrate by the following procedure. Metal alkoxide (tetraethyl silicate Si (OC ₂ H ₅ ) ₄ [abbreviated TEOS]) as a raw material compound, ethanol as a solvent, acetic acid as a catalyst, and water necessary for hydrolysis are added to a preparation liquid having a low refractive index. A material (catalyst chemical industry, silica particles (refractive index: 1.35)) added to isopropyl alcohol is mixed, and kept at several tens of degrees C to cause hydrolysis and polycondensation reaction to produce a liquid sol. . When the prepared sol is applied on a glass substrate by spin coating and reacted, it is solidified as a gel. This is further dried in an atmosphere of 150 ° C. to obtain a dry gel, and the conditions of the solution preparation and spin coating are set so that the film thickness at that time becomes 0.5 μm. As a result, a low refractive index layer having a thickness of 0.5 μm and a refractive index of 1.37 is formed. Here, spin coating is described as the solution coating method, but any method that can obtain a uniform film thickness may be used, such as dip coating. Although an example of a glass substrate is shown as the substrate, since the process temperature is 150 ° C. or less, it can be applied directly on the resin substrate. Further effects can be expected by selecting a lower refractive index as a raw material compound or a low refractive index material, and setting the refractive index of the resulting low refractive index layer to 1.37 or less. The film thickness is preferably 0.5 μm or more, more preferably 1 μm or more.

(2) In the case of silica airgel Examples of the material for forming the transparent substrate include transparent synthetic resins such as glass, quartz, sapphire, or polyester polycarbonate. The low refractive index layer is formed by a silica airgel obtained by supercritical drying of a wet gel formed by a sol-gel reaction of silicon alkoxide. Silica airgel is a light-transmitting porous body having a uniform ultrafine structure. Liquid A was prepared by mixing tetramethoxysilane oligomer and methanol, and liquid B was prepared by mixing water, aqueous ammonia and methanol. An alkoxysilane solution obtained by mixing the A liquid and the B liquid is applied onto the substrate 2. After the alkoxysilane is gelled, it is immersed in a curing solution of water, aqueous ammonia, and methanol and cured at room temperature for one day. Next, the cured gel-like compound is immersed in an isopropanol solution of hexamethyldisilazane, hydrophobized, and then subjected to supercritical drying to form a silica airgel. A transparent anode is formed by a technique such as sputtering, ion plating, or vacuum deposition. As the transparent anode, for example, ITO (Indium Tin Oxide), IZO, or the like is preferably used. A light emitting layer and a cathode are vapor-deposited on the anode.

(3) In the case of porous silica As a low refractive index material, a film of a low relative dielectric constant material containing hexamethyldisiloxane or hexamethyldisilazane having water repellency is applied on a substrate to form a film. In addition to a water-repellent material such as hexamethyldisiloxane or hexamethyldisilazane, alcohol or butyl acetate may be added as an additive to the solution of the low relative dielectric constant material used here. . Then, a low refractive index film made of a porous silica material is formed by evaporating the solvent, water, acid, alkali catalyst, surfactant, or the like in the solution of the low relative dielectric constant material by firing treatment or the like. After cleaning this, an intermediate layer is formed on the low refractive index film with a transparent insulating film made of a SiO ₂ film by RF sputtering. Thereafter, an ITO film is formed on the intermediate layer by DC sputtering.

  In order to further increase the light extraction efficiency, it is preferable to use a method in which a diffraction grating is introduced into an interface or any medium that causes total reflection. This method is generated from the light emitting layer by utilizing the property that the diffraction grating can change the direction of light to a specific direction different from refraction by so-called Bragg diffraction such as first-order diffraction or second-order diffraction. Of the light, light that cannot go out due to total reflection between layers, etc., is diffracted by introducing a diffraction grating in any layer or medium (in the transparent substrate or transparent electrode) It tries to take out light. The introduced diffraction grating desirably has a two-dimensional periodic refractive index. This is because light emitted from the light-emitting layer is randomly generated in all directions, so in a general one-dimensional diffraction grating having a periodic refractive index distribution only in a certain direction, only light traveling in a specific direction is diffracted. The light extraction efficiency does not increase so much. However, by making the refractive index distribution a two-dimensional distribution, light traveling in all directions is diffracted, and light extraction efficiency is increased. As described above, the position where the diffraction grating is introduced may be in any of the layers or in the medium (in the transparent substrate or the transparent electrode), but is preferably in the vicinity of the organic light emitting layer where light is generated. At this time, the period of the diffraction grating is preferably about 1/2 to 3 times the wavelength in the medium of the light to be amplified. The arrangement of the diffraction gratings is preferably two-dimensionally repeated, such as a square lattice, a triangular lattice, or a honeycomb lattice. Examples of the method for introducing the diffraction grating of the present invention will be described below, but the present invention is not limited to these examples as long as the object effects are not impaired.

  For example, in order to form a diffraction grating on a glass substrate, a positive resist is applied to the surface after cleaning the glass substrate. Next, two parallel lights having a wavelength λ that are coherent with each other are irradiated on the resist so as to face each other at an angle of θ degrees from the substrate vertical direction. At this time, interference fringes having a pitch d are formed in the resist. Here, d = λ / (2 cos θ). When an argon laser having a wavelength of 488 nm is used and a 300 nm pitch is formed as a photonic crystal, if both light beams are exposed at an angle of 35.6 degrees from a direction perpendicular to the substrate, a first interference fringe having a pitch of 300 nm is formed. Is done. Next, the substrate is rotated 90 degrees in the plane of the substrate to form a second interference fringe so as to be orthogonal to the first interference fringe. If the light beam to be exposed is maintained as it is, second interference fringes are formed at a pitch of 300 nm. Two interference fringes are superimposed on the resist and exposed to form a grid-like exposure pattern. By appropriately setting the exposure power and the development conditions, the development is performed so that the resist is removed only at the portion where the two interference fringes overlap and is strongly exposed. On the glass substrate, a pattern in which the resist is removed in a substantially circular shape is formed in the overlapping portion of the lattices each having a vertical and horizontal pitch of 300 nm. The diameter of the circle is 220 nm. Next, dry etching is performed to form a hole having a depth of 200 nm in the portion where the range is removed. Thereafter, the resist is removed and the glass substrate is washed. As described above, a glass substrate in which holes having a depth of 200 nm and a diameter of 220 nm are arranged on the apexes of a square lattice having a pitch of 300 nm in length and width is formed on the surface. Next, an ITO film having a thickness of about 300 nm as measured from the bottom of the hole was formed by bias sputtering. By appropriately controlling the bias sputtering conditions, the surface irregularities can be flattened to 50 nm or less. Further, it is possible to make a space without filling ITO in the hole depending on the bias sputtering conditions. By polishing the surface of the glass substrate with ITO prepared as described above, a glass substrate with ITO for organic EL is formed. In the examples, a method of applying a photoresist to a glass substrate, patterning it, and etching the glass substrate was shown. However, a glass mold was formed by the same method, and a UV-curable resist was nanoimprinted on the glass substrate. The present invention can also be implemented by a method of transferring the glass substrate and etching the glass substrate. In addition, the pattern formed on the glass substrate is transferred to a mold by a technique such as nickel electroforming, and the mold is transferred to a resin by a nanoimprint technique. Is possible.

The light extraction and / or light collecting sheet produced as described above has a front luminance amplification factor of the sheet,
The front luminance amplification factor a is in a range of 2.0 ≦ a ≦ 5.0 at a wavelength of 430 nm or more and 480 nm or less,
When the wavelength is 510 nm or more and 550 nm or less, the front luminance amplification factor b is in the range of 1.5 ≦ b ≦ 4.0,
When the wavelength is 600 nm or more and 640 nm or less, the front luminance amplification factor c is in the range of 1.0 ≦ c ≦ 3.0,
Further, the light extracted in combination with the electrode and the light emitting layer of the present invention has a chromaticity of CIE1931 color system where x = 0.33 ± 0 when the 2 ° C. viewing angle front luminance is measured by the above method. .07, y = 0.33 ± 0.07, so that the white light is in the region.

  Usually, the emission color is classified into blue emission from 420 nm to less than 500 nm, green emission from 500 nm to less than 550 nm, and red emission from 600 nm to less than 650 nm. Therefore, although it varies depending on the material (substantially dopant) that emits light, in the present invention, the front luminance peak value of the organic electroluminescence element when there is no light extraction and / or light collecting sheet is compared with the case where the sheet is present. Qualitatively, blue is the smallest ratio.

  Since the blue color is generally rate-determined in the lifetime in continuous driving or the like, the organic electroluminescence element of the present invention can have a longer lifetime. In addition, the driving voltage is restricted by blue having the largest energy gap between HOMO and LUMO. Therefore, the drive voltage can be lowered in the embodiment of the present invention that is designed to reduce the blue front luminance.

  The light extraction and / or condensing sheet of the present invention is characterized by increasing the front luminance amplification factor, and in particular, has a high blue front luminance amplification factor.

  Accordingly, the present invention can reduce the film thickness of the blue light emitting layer and reduce the driving voltage. Therefore, the life can be increased as compared with the case where the light extraction and / or light collecting sheet is not provided. To obtain white light.

  The reason for making the preferred embodiment of the present invention to increase the light extraction efficiency by diffusing with respect to blue light is not clear, but in the concavo-convex shape of the diffusion plate, the diameter in terms of circular area is preferably in the range of 75 nm to 1500 nm. . In addition, the depth and height of the concavo-convex portion are 50 nm to 1600 nm, more preferably 50 nm to 1200 nm, and further preferably 50 nm to 1000 nm.

  Here, the front luminance amplification factor refers to the emission luminance from the front (2 ° C. viewing angle front luminance) using a spectral radiance meter CS-1000 (manufactured by Konica Minolta Sensing Co., Ltd.). For organic EL devices without a condensing sheet, measurement was performed so that the optical axis of the spectral radiance meter coincided with the normal line from the light emitting surface, and light emission at each wavelength in the wavelength range of 430 to 480 nm. Measure the brightness and take the integrated brightness. In addition, with the light extraction and / or condensing sheet (or the structure having the effect) on the light extraction side this time, the emission luminance is measured again from the front using a spectral radiance meter for each wavelength, and integration is also performed. Take brightness.

Integrated luminance with light extraction and / or condensing sheet / Integrated luminance without light extraction and / or condensing sheet = Front luminance gain a
From the above, the front luminance amplification factor is calculated.

  Similarly, measurement and calculation are performed in the same manner at wavelengths of 510 nm to 550 nm, and the front luminance amplification factor b is obtained by measuring and calculating in the same manner at wavelengths of 600 nm to 640 nm.

  Next, the organic electroluminescence element will be described below.

"Layer structure"
The light emitting layer that is a constituent layer of the organic electroluminescence device according to the present invention includes at least two layers having different emission spectra having emission maximum wavelengths in the range of 430 nm to 480 nm, 510 nm to 550 nm, and 600 nm to 640 nm, respectively. , Preferably there are 3 or more layers.

  Although the preferable specific example of the layer structure in this invention is shown below, this invention is not limited to these.

(I) Anode / light emitting layer unit / electron transport layer / cathode (ii) Anode / hole transport layer / light emitting layer unit / electron transport layer / cathode (iii) Anode / hole transport layer / light emitting layer unit / hole blocking Layer / electron transport layer / cathode (iv) anode / hole transport layer / light emitting layer unit / hole blocking layer / electron transport layer / cathode buffer layer / cathode (v) anode / anode buffer layer / hole transport layer / light emission Layer unit / hole blocking layer / electron transport layer / cathode buffer layer / cathode Here, the light emitting layer unit is a light emitting layer unit having at least two layers in the range of 430 nm to 480 nm, 510 nm to 550 nm, and 600 nm to 640 nm, respectively. What has a light emitting layer is a light emitting layer unit. Moreover, it is preferable that this unit has a nonluminous intermediate | middle layer between each light emitting layer.

<Light emitting layer>
The light emitting layer according to the present invention is a layer that emits light by recombination of electrons and holes injected from the electrode, the electron transport layer, or the hole transport layer, and the light emitting portion is in the layer of the light emitting layer. May be the interface between the light emitting layer and the adjacent layer. The light emitting layer according to the present invention has at least three light emitting layers: a light emitting layer A having a light emission maximum wavelength in the range of 430 nm to 480 nm, a light emitting layer B in the range of 510 nm to 550 nm, and a light emitting layer C in the range of 600 nm to 640 nm. If it has layers A, B, and C, there will be no restriction | limiting in particular.

  In addition, when the number of light emitting layers is more than four, there may be a plurality of layers having the same emission spectrum or emission maximum wavelength. In the present invention, a layer having an emission maximum wavelength in the range of 430 nm to 480 nm is hereinafter referred to as a blue light emitting layer, a layer in the range of 510 nm to 550 nm is referred to as a green light emitting layer, and a layer in the range of 600 nm to 640 nm is hereinafter referred to as a red light emitting layer. There is no restriction | limiting in particular as a lamination order of a light emitting layer, It is preferable to have a nonluminous intermediate | middle layer between each light emitting layer. In the present invention, it is preferable that at least one blue light emitting layer is provided at a position closest to the anode in all the light emitting layers. When four or more light-emitting layers are provided, for example, blue / green / red / blue, blue / green / red / blue / green, blue / green / red / blue / green / red from the order close to the anode. In order to improve luminance stability, it is preferable to sequentially stack blue, green, and red. The total thickness of the light emitting layer is not particularly limited, but from the viewpoint of improving the uniformity of the film, preventing unnecessary application of a high voltage during light emission, and improving the stability of the emission color with respect to the drive current. It is preferable to adjust in the range of 2 nm to 5 μm, more preferably in the range of 2 nm to 200 nm, and particularly preferably in the range of 10 nm to 20 nm. For the production of the light-emitting layer, a light-emitting dopant or a host compound, which will be described later, is formed and formed by a known thinning method such as a vacuum deposition method, a spin coating method, a casting method, an LB method, or an ink-jet method. it can. The thickness of each light emitting layer is preferably adjusted to a range of 2 nm to 100 nm, more preferably adjusted to a range of 2 nm to 20 nm. There is no particular limitation on the relationship between the film thicknesses of the blue, green and red light emitting layers. Moreover, in the range which maintains the said maximum wavelength, you may mix a several luminescent compound in each light emitting layer. For example, a blue light emitting layer may be used by mixing a blue light emitting compound having a maximum wavelength of 430 nm to 480 nm and a green light emitting compound having a maximum wavelength of 510 nm to 550 nm. Next, a host compound and a light emitting dopant (also referred to as a light emitting dopant compound) included in the light emitting layer will be described.

(Host compound)
The host compound contained in the light emitting layer of the organic EL device according to the present invention is defined as a compound having a phosphorescence quantum yield of phosphorescence emission at room temperature (25 ° C.) of less than 0.1. The phosphorescence quantum yield is preferably less than 0.01. Moreover, it is preferable that the mass ratio in the layer is 20% or more among the compounds contained in a light emitting layer. As the host compound, known host compounds may be used alone or in combination of two or more. By using a plurality of types of host compounds, it is possible to adjust the movement of charges, and the organic EL element can be made highly efficient. Moreover, it becomes possible to mix different light emission by using multiple types of phosphorescent compounds etc. which are used as the light emission dopant mentioned later, and thereby, arbitrary luminescent colors can be obtained. It is possible to adjust the kind of phosphorescent compound and the amount of doping, and it can be applied to illumination and backlight.

  As a host compound concerning this invention, the compound represented by following General formula (1) is mentioned as an example of the compound used preferably. Moreover, the said compound is preferably used also for the adjacent layer (for example, hole-blocking layer etc.) of a light emitting layer.

In the formula, Z ₁ represents an aromatic heterocyclic ring which may have a substituent, Z ₂ represents an aromatic heterocyclic ring or an aromatic hydrocarbon ring which may each have a substituent, and Z ₃ represents a divalent linking group or a simple bond. R ₁₀₁ represents a hydrogen atom or a substituent. In the general formula (1), examples of the aromatic heterocycle represented by Z ₁ and Z ₂ include a furan ring, a thiophene ring, a pyridine ring, a pyridazine ring, a pyrimidine ring, a pyrazine ring, a triazine ring, a benzimidazole ring, Diazole ring, triazole ring, imidazole ring, pyrazole ring, thiazole ring, indole ring, benzimidazole ring, benzothiazole ring, benzoxazole ring, quinoxaline ring, quinazoline ring, phthalazine ring, carbazole ring, carboline ring, carboline ring And a ring in which the carbon atom of the hydrocarbon ring is further substituted with a nitrogen atom. Furthermore, the aromatic heterocyclic ring may have a substituent represented by R ₁₀₁ described later. In the general formula (1), examples of the aromatic hydrocarbon ring represented by Z ₂ include benzene ring, biphenyl ring, naphthalene ring, azulene ring, anthracene ring, phenanthrene ring, pyrene ring, chrysene ring, naphthacene ring, triphenylene. Ring, o-terphenyl ring, m-terphenyl ring, p-terphenyl ring, acenaphthene ring, coronene ring, fluorene ring, fluoranthrene ring, naphthacene ring, pentacene ring, perylene ring, pentaphen ring, picene ring, pyrene Ring, pyranthrene ring, anthraanthrene ring and the like. Furthermore, the aromatic hydrocarbon ring may have a substituent represented by R ₁₀₁ described later. In the general formula (1), examples of the substituent represented by R ₁₀₁ include an alkyl group (eg, methyl group, ethyl group, propyl group, isopropyl group, tert-butyl group, pentyl group, hexyl group, octyl group, dodecyl group). Group, tridecyl group, tetradecyl group, pentadecyl group, etc.), cycloalkyl group (eg, cyclopentyl group, cyclohexyl group, etc.), alkenyl group (eg, vinyl group, allyl group, etc.), alkynyl group (eg, ethynyl group, propargyl group, etc.) Etc.), aryl groups (eg phenyl group, naphthyl group etc.), aromatic heterocyclic groups (eg furyl group, thienyl group, pyridyl group, pyridazinyl group, pyrimidinyl group, pyrazinyl group, triazinyl group, imidazolyl group, pyrazolyl group) , Thiazolyl group, quinazolinyl group, phthalazinyl group, etc.), heterocyclic group (eg Pyrrolidyl group, imidazolidyl group, morpholyl group, oxazolidyl group, etc.), alkoxy group (for example, methoxy group, ethoxy group, propyloxy group, pentyloxy group, hexyloxy group, octyloxy group, dodecyloxy group, etc.), cyclo An alkoxy group (eg, cyclopentyloxy group, cyclohexyloxy group, etc.), an aryloxy group (eg, phenoxy group, naphthyloxy group, etc.), an alkylthio group (eg, methylthio group, ethylthio group, propylthio group, pentylthio group, hexylthio group, Octylthio group, dodecylthio group etc.), cycloalkylthio group (eg cyclopentylthio group, cyclohexylthio group etc.), arylthio group (eg phenylthio group, naphthylthio group etc.), alkoxycarbonyl group (eg methyl Xycarbonyl group, ethyloxycarbonyl group, butyloxycarbonyl group, octyloxycarbonyl group, dodecyloxycarbonyl group, etc.), aryloxycarbonyl group (eg, phenyloxycarbonyl group, naphthyloxycarbonyl group, etc.), sulfamoyl group (eg, Aminosulfonyl group, methylaminosulfonyl group, dimethylaminosulfonyl group, butylaminosulfonyl group, hexylaminosulfonyl group, cyclohexylaminosulfonyl group, octylaminosulfonyl group, dodecylaminosulfonyl group, phenylaminosulfonyl group, naphthylaminosulfonyl group, 2 -Pyridylaminosulfonyl group, etc.), acyl group (for example, acetyl group, ethylcarbonyl group, propylcarbonyl group, pentylcarbonyl group, cyclohexane) A silcarbonyl group, an octylcarbonyl group, a 2-ethylhexylcarbonyl group, a dodecylcarbonyl group, a phenylcarbonyl group, a naphthylcarbonyl group, a pyridylcarbonyl group, etc.), an acyloxy group (for example, an acetyloxy group, an ethylcarbonyloxy group, a butylcarbonyloxy group) Octylcarbonyloxy group, dodecylcarbonyloxy group, phenylcarbonyloxy group, etc.), amide group (for example, methylcarbonylamino group, ethylcarbonylamino group, dimethylcarbonylamino group, propylcarbonylamino group, pentylcarbonylamino group, cyclohexylcarbonyl) Amino group, 2-ethylhexylcarbonylamino group, octylcarbonylamino group, dodecylcarbonylamino group, phenylcarbonylamino group, naphthylca Carbonylamino group, etc.), carbamoyl group (for example, aminocarbonyl group, methylaminocarbonyl group, dimethylaminocarbonyl group, propylaminocarbonyl group, pentylaminocarbonyl group, cyclohexylaminocarbonyl group, octylaminocarbonyl group, 2-ethylhexylaminocarbonyl) Group, dodecylaminocarbonyl group, phenylaminocarbonyl group, naphthylaminocarbonyl group, 2-pyridylaminocarbonyl group, etc.), ureido group (for example, methylureido group, ethylureido group, pentylureido group, cyclohexylureido group, octylureido group, Dodecylureido group, phenylureido group, naphthylureido group, 2-pyridylaminoureido group, etc.), sulfinyl group (for example, methylsulfinyl group, ethylsulfide group, etc.) Sulfonyl group, butylsulfinyl group, cyclohexylsulfinyl group, 2-ethylhexylsulfinyl group, dodecylsulfinyl group, phenylsulfinyl group, naphthylsulfinyl group, 2-pyridylsulfinyl group, etc.), alkylsulfonyl group (for example, methylsulfonyl group, ethylsulfonyl group) , Butylsulfonyl group, cyclohexylsulfonyl group, 2-ethylhexylsulfonyl group, dodecylsulfonyl group, etc.), arylsulfonyl group (phenylsulfonyl group, naphthylsulfonyl group, 2-pyridylsulfonyl group etc.), amino group (for example, amino group, ethyl group) Amino group, dimethylamino group, butylamino group, cyclopentylamino group, 2-ethylhexylamino group, dodecylamino group, anilino group, naphthylamino group, 2-pyridyla Group), halogen atoms (for example, fluorine atom, chlorine atom, bromine atom, etc.), fluorinated hydrocarbon groups (for example, fluoromethyl group, trifluoromethyl group, pentafluoroethyl group, pentafluorophenyl group, etc.), And cyano group, nitro group, hydroxy group, mercapto group, silyl group (for example, trimethylsilyl group, triisopropylsilyl group, triphenylsilyl group, phenyldiethylsilyl group, etc.). These substituents may be further substituted with the above substituents. In addition, a plurality of these substituents may be bonded to each other to form a ring. Preferred substituents are an alkyl group, a cycloalkyl group, a fluorinated hydrocarbon group, an aryl group, and an aromatic heterocyclic group. As the divalent linking group, in addition to hydrocarbon groups such as alkylene, alkenylene, alkynylene, and arylene, those containing a hetero atom may be used, and a thiophene-2,5-diyl group, pyrazine-2, It may be a divalent linking group derived from a compound having an aromatic heterocyclic ring (also called a heteroaromatic compound) such as a 3-diyl group, or may be a chalcogen atom such as oxygen or sulfur. . Further, it may be a group such as an alkylimino group, a dialkylsilanediyl group, or a diarylgermandiyl group that connects and connects heteroatoms. A mere bond is a bond that directly bonds the connecting substituents together. In the present invention, Z _{1 in the} general formula (1) is preferably a 6-membered ring. Thereby, luminous efficiency can be made higher. Furthermore, the lifetime can be further increased. In the present invention, it is preferable that the Z ₂ in the general formula (1) is a 6-membered ring. Thereby, luminous efficiency can be made higher. Furthermore, the lifetime can be further increased. Furthermore, it is preferable that Z ₁ and Z _{2 in} the general formula (1) are both 6-membered rings because the luminous efficiency can be further increased. Furthermore, it is preferable because the lifetime can be further increased. Hereinafter, although the specific example of a compound represented by General formula (1) based on this invention is shown, this invention is not limited to these.

  The light emitting host used in the present invention may be a conventionally known low molecular compound or a high molecular compound having a repeating unit, and a low molecular compound having a polymerizable group such as a vinyl group or an epoxy group (deposition polymerization property). (Light emitting host). As the known host compound, a compound that has a hole transporting ability and an electron transporting ability, prevents the emission of light from being increased in wavelength, and has a high Tg (glass transition temperature) is preferable. Specific examples of known host compounds include compounds described in the following documents. For example, Japanese Patent Application Laid-Open Nos. 2001-257076, 2002-308855, 2001-313179, 2002-319491, 2001-357777, 2002-334786, 2002-8860 Gazette, 2002-334787 gazette, 2002-15871 gazette, 2002-334788 gazette, 2002-43056 gazette, 2002-334789 gazette, 2002-75645 gazette, 2002-338579 gazette. No. 2002-105445, No. 2002-343568, No. 2002-141173, No. 2002-352957, No. 2002-203683, No. 2002-363227, No. 2002-231453. No. 2003-3165, No. 2002-234888, No. 2003-27048, No. 2002-255934, No. 2002-286061, No. 2002-280183, No. 2002-299060. 2002-302516, 2002-305083, 2002-305084, 2002-308837, and the like. In the present invention, at least three light emitting layers A, a light emitting layer A having a light emission maximum wavelength in the range of 430 nm to 480 nm, a light emitting layer B in the range of 510 nm to 550 nm, and a light emitting layer C in the range of 600 nm to 640 nm, B and C, but 50% by mass or more of the host compounds of at least two layers of the three layers each have a phosphorescence emission energy of 2.9 eV or more and a Tg (glass transition point) of 90 ° C. or more. These compounds are preferred, and more preferred are compounds at 100 ° C. or higher. Among these, from the viewpoint of improving the storage stability of organic EL elements (also referred to as durability improvement) and reducing the uneven distribution of the compound at the light emitting layer interface, the molecular structures of the compounds are preferably the same. Here, the reason why it is preferable that the host compounds have the same physicochemical characteristics or the same molecular structure will be described in detail in the non-light emitting intermediate layer described later.

(Tg (glass transition point))
Here, the glass transition point (Tg) is a value obtained by a method based on JIS-K-7121 using DSC (Differential Scanning Colorimetry). By using a host compound having the same physical characteristics as described above, and more preferably by using a host compound having the same molecular structure, the entire organic compound layer (also referred to as an organic layer) of the organic EL element is used. Homogeneous film properties can be obtained, and furthermore, adjusting the phosphorescence emission energy of the host compound to be 2.9 eV or more can effectively suppress the energy transfer from the dopant and obtain high luminance. I can do it.

(Phosphorescent energy)
The phosphorescent energy according to the present invention will be described.

  The phosphorescence emission energy according to the present invention refers to the peak energy of the 0-0 band of phosphorescence emission obtained when measuring the photoluminescence of a deposited film of 100 nm on a support substrate (which may be simply a substrate).

<< Method for measuring phosphorescence emission 0-0 band >>
First, a method for measuring a phosphorescence spectrum will be described. The luminescent host compound to be measured is dissolved in a well-deoxygenated mixed solvent of ethanol / methanol = 4/1 (volume / volume), put into a phosphorescence measurement cell, and then excited with light at a liquid nitrogen temperature of 77 ° K. Irradiation and emission spectrum at 100 ms after irradiation with excitation light are measured. Since phosphorescence has a longer emission lifetime than fluorescence, it can be considered that light remaining after 100 ms is almost phosphorescence. For compounds with a phosphorescence lifetime shorter than 100 ms, measurement may be performed with a short delay time. However, if the delay time is set so short that it cannot be distinguished from fluorescence, phosphorescence and fluorescence cannot be separated. Therefore, it is necessary to select a delay time that can be separated. In addition, for a compound that cannot be dissolved in the solvent system, any solvent that can dissolve the compound may be used (substantially, the solvent effect of the phosphorescence wavelength is negligible in the above measurement method). Next, the 0-0 band is determined. In the present invention, the emission maximum wavelength that appears on the shortest wavelength side in the phosphorescence spectrum chart obtained by the above-described measurement method is defined as the 0-0 band. Since the phosphorescence spectrum usually has a low intensity, when it is enlarged, it may be difficult to distinguish between noise and peak. In such a case, the emission spectrum during excitation light irradiation (for convenience, this is referred to as a steady light spectrum) is expanded, and the emission spectrum 100 ms after excitation light irradiation (for convenience, this is referred to as a phosphorescence spectrum) is superimposed. It can be determined by reading the peak wavelength of the phosphorescence spectrum from the stationary light spectrum portion derived from the light spectrum. Further, by performing a smoothing process on the phosphorescence spectrum, it is possible to separate the noise and the peak and read the peak wavelength. As the smoothing process, a smoothing method of Savitzky & Golay can be applied.

(Luminescent dopant)
The light emitting dopant according to the present invention will be described. As the light-emitting dopant according to the present invention, a fluorescent compound or a phosphorescent emitter (also referred to as a phosphorescent compound or a phosphorescent compound) can be used. From the viewpoint of obtaining an organic EL element with higher luminous efficiency. The light-emitting dopant used in the light-emitting layer or light-emitting unit of the organic EL device of the present invention (sometimes simply referred to as a light-emitting material) contains the above-mentioned host compound and at the same time contains a phosphorescent emitter. preferable.

(Phosphorescent emitter (also called phosphorescent dopant))
The phosphorescent emitter (phosphorescent dopant) according to the present invention is a compound in which light emission from an excited triplet is observed, specifically, a compound that emits phosphorescence at room temperature (25 ° C.). Although the yield is defined to be a compound of 0.01 or more at 25 ° C., the preferred phosphorescence quantum yield is 0.1 or more. The phosphorescence quantum yield can be measured by the method described in Spectroscopic II, page 398 (1992 edition, Maruzen) of Experimental Chemistry Course 4 of the 4th edition. Although the phosphorescence quantum yield in a solution can be measured using various solvents, the phosphorescence emitter according to the present invention achieves the phosphorescence quantum yield (0.01 or more) in any solvent. Just do it. There are two types of light emission of phosphorescent emitters in principle. One is the recombination of carriers on the host compound to which carriers are transported to generate an excited state of the host compound, and this energy is transferred to the phosphorescent emitter. Energy transfer type to obtain light emission from the phosphorescent emitter, and another is a carrier in which the phosphorescent emitter becomes a carrier trap and recombination of carriers occurs on the phosphorescent emitter to obtain light emission from the phosphorescent emitter. Although it is a trap type, in any case, it is a condition that the excited state energy of the phosphorescent emitter is lower than the excited state energy of the host compound. The phosphorescent luminescent material can be appropriately selected from known materials used for the light emitting layer of the organic EL device. The phosphorescent emitter according to the present invention is preferably a complex compound containing a group 8-10 metal in the periodic table of elements, more preferably an iridium compound, an osmium compound, or a platinum compound (platinum complex compound). ), Rare earth complexes, and most preferred are iridium compounds. Specific examples of the compound used as the phosphorescent emitter are shown below, but the present invention is not limited to these. These compounds are described, for example, in Inorg. Chem. 40, 1704-1711, and the like.

(Fluorescent light emitter (also called fluorescent dopant))
Representative examples of fluorescent emitters (fluorescent dopants) include coumarin dyes, pyran dyes, cyanine dyes, croconium dyes, squalium dyes, oxobenzanthracene dyes, fluorescein dyes, rhodamine dyes, and pyrylium dyes. Examples thereof include dyes, perylene dyes, stilbene dyes, polythiophene dyes, and rare earth complex phosphors. In addition, conventionally known dopants can also be used in the present invention. For example, WO 00/70655 pamphlet, JP 2002-280178 A, JP 2001-181616 A, JP 2002-280179 A, JP 2001-181617 A, JP 2002-280180 A, JP 2001-247859 A, JP 2002-299060 A, JP 2001-313178 A, JP 2002-302671 A, JP JP 2001-345183 A, JP 2002-324679 A, WO 02/15645 Pamphlet, JP 2002-332291 A, JP 2002-50484 A, JP 2002-332292 A, JP 2002-2002 A. -83684 publication, special table 2002 JP 40572, JP 2002-117978, JP 2002-338588, JP 2002-170684, JP 2002-352960, WO 01/93642, JP 2002-50483. JP, JP-A No. 2002-1000047, JP-A No. 2002-173684, JP-A No. 2002-359082, JP-A No. 2002-175854, JP-A No. 2002-363552, JP-A No. 2002-184582 JP, 2003-7469, JP 2002-525808, JP 2003-7471, JP 2002-525833, JP 2003-31366, JP 2002-226495, JP JP 2002-234894, JP No. 002-235076, JP 2002-241751, JP 2001-319779, JP 2001-319780, JP 2002-62824, JP 2002-1000047, JP 2002 No. 203679, JP-A No. 2002-343572, JP-A No. 2002-203678, and the like.

<Non-light emitting intermediate layer>
The non-light emitting intermediate layer according to the present invention will be described. The non-light-emitting intermediate layer according to the present invention means each light emission of the light-emitting layer unit having at least three light-emitting layers having emission maximum wavelengths in the range of 430 nm to 480 nm, 510 nm to 550 nm, and 600 nm to 640 nm, respectively. Between the layers.

  The film thickness of the non-light emitting intermediate layer is preferably in the range of 1 nm to 50 nm, and further in the range of 3 nm to 10 nm suppresses interaction such as energy transfer between adjacent light emitting layers, and This is preferable from the viewpoint of not applying a large load to the current-voltage characteristics of the element.

  The material used for the non-light emitting intermediate layer may be the same as or different from the host compound of the light emitting layer, but may be the same as the host material of at least one of the adjacent light emitting layers. preferable.

  The non-light emitting intermediate layer may contain a compound (for example, a host compound) common to the non-light emitting layers, and each of the common host materials (here, the common host material is used) means phosphorescence. In the case where the physicochemical characteristics such as luminescence energy and glass transition point are the same or the molecular structure of the host compound is the same, etc.), the injection barrier between the light emitting layer and the non-light emitting layer is contained. Thus, even if the voltage (current) is changed, the hole and electron injection balance can be easily maintained. It has also been found that the effect of improving the color shift when a voltage (current) is applied can be obtained. Furthermore, the host compound contained in each light emitting layer in the undoped light emitting layer is a major problem in the conventional organic EL device production by using a host material having the same physical characteristics or the same molecular structure. The complexity of device fabrication can also be eliminated.

  Furthermore, as described above, by using a material in which the lowest excited triplet energy level T1 of the common host material is higher than the lowest excited triplet energy level T2 of the phosphorescent light emitter, the light emitting layer is used. It has been found that a highly efficient device can be obtained because the triplet excitons are effectively confined in the light emitting layer. In addition, in the organic EL element of three colors of blue, green, and red, when a phosphorescent emitter is used for each light emitting material, the excited triplet energy of the blue phosphorescent emitter is the largest, A host material having an excited triplet energy larger than that of the phosphorescent emitter may be included as a common host material in the light emitting layer and the non-light emitting intermediate layer. In the organic EL device of the present invention, since the host material is responsible for carrier transport, a material having carrier transport capability is preferable. Carrier mobility is used as a physical property representing carrier transport ability, but the carrier mobility of an organic material generally depends on the electric field strength. Since a material having a high electric field strength dependency easily breaks the balance of hole and electron injection / transport, it is preferable to use a material having a low electric field strength dependency of mobility for the intermediate layer material and the host material. On the other hand, in order to optimally adjust the injection balance of holes and electrons, it is also preferable that the non-light emitting intermediate layer functions as a blocking layer, that is, a hole blocking layer and an electron blocking layer. It is done.

(When non-light emitting intermediate layer functions as hole blocking region)
The hole blocking region (may be referred to as a layer) is, in a broad sense, an electron transporting region (also referred to as a layer), which has a function of transporting electrons and has a very small ability to transport holes. The electron-hole recombination probability can be improved by blocking holes while transporting electrons. The hole blocking region has a role of blocking the holes moving from the hole transport region from reaching the cathode and a compound that can efficiently transport the electrons injected from the cathode in the direction of the light emitting region. It is formed. The physical properties required of the material constituting the hole blocking region are higher than the ionization potential of the light emitting region in order to have high electron mobility and low hole mobility and to efficiently confine holes in the light emitting region. It is preferable to have an ionization potential value or a band gap larger than that of the light emitting region. Use of at least one of styryl compounds, triazole derivatives, phenanthroline derivatives, oxadiazole derivatives, and boron derivatives as the hole blocking material is also effective in obtaining the effects of the present invention. Examples of other compounds include exemplified compounds described in JP-A Nos. 2003-31367, 2003-31368, and Japanese Patent No. 2721441.

(When non-light emitting intermediate layer functions as an electron blocking region)
On the other hand, electron blocking in the case of functioning as an electron blocking region is hole transport in a broad sense, and includes a material that has a function of transporting holes while having a remarkably small ability to transport electrons in the undoped region, By blocking electrons while transporting holes, the probability of recombination of electrons and holes can be improved. The non-light emitting intermediate layer (also simply referred to as a non-light emitting layer) is the light emitting layer in which the light emitting layer A is closest to the anode, and the light emitting layer A and the light emitting layer next to the anode side next. In the meantime, a compound whose ionization potential (the measurement method of the ionization potential is the same as the measurement method of the ionization potential of the compound related to the blocking layer) with respect to the host compound contained in the light emitting layer A is 0.2 eV or more. It is preferable from a viewpoint of the brightness improvement of the organic electroluminescent element of this invention to have a nonluminous layer containing 50 mass% or more.

<< Injection layer: electron injection layer, hole injection layer >>
The injection layer is provided as necessary, and there are an electron injection layer and a hole injection layer, and as described above, it exists between the anode and the light emitting layer or the hole transport layer and between the cathode and the light emitting layer or the electron transport layer. May be. An injection layer is a layer provided between an electrode and an organic layer in order to reduce drive voltage and improve light emission luminance. “Organic EL element and its forefront of industrialization (issued by NTT Corporation on November 30, 1998) 2), Chapter 2, “Electrode Materials” (pages 123 to 166) in detail, and includes a hole injection layer (anode buffer layer) and an electron injection layer (cathode buffer layer).

  The details of the anode buffer layer (hole injection layer) are described in JP-A-9-45479, JP-A-9-260062, JP-A-8-288069 and the like. As a specific example, copper phthalocyanine is used. Examples thereof include a phthalocyanine buffer layer represented by an oxide, an oxide buffer layer represented by vanadium oxide, an amorphous carbon buffer layer, and a polymer buffer layer using a conductive polymer such as polyaniline (emeraldine) or polythiophene. The details of the cathode buffer layer (electron injection layer) are described in JP-A-6-325871, JP-A-9-17574, JP-A-10-74586, and the like. Specifically, strontium, aluminum, etc. Metal buffer layer typified by lithium, alkali metal compound buffer layer typified by lithium fluoride, alkaline earth metal compound buffer layer typified by magnesium fluoride, oxide buffer layer typified by aluminum oxide, etc. . The buffer layer (injection layer) is preferably a very thin film, and the film thickness is preferably in the range of 0.1 nm to 5 μm although it depends on the material.

<Blocking layer: hole blocking layer, electron blocking layer>
As described above, the blocking layer is provided as necessary in addition to the basic constituent layer of the organic compound thin film. For example, it is described in JP-A Nos. 11-204258, 11-204359, and “Organic EL elements and their forefront of industrialization” (issued by NTT, Inc. on November 30, 1998). There is a hole blocking (hole blocking) layer.

  The hole blocking layer has a function of an electron transport layer in a broad sense, and is made of a hole blocking material that has a function of transporting electrons and has a remarkably small ability to transport holes. The probability of recombination of electrons and holes can be improved by blocking. Moreover, the structure of the electron carrying layer mentioned later can be used as a hole-blocking layer concerning this invention as needed. The hole blocking layer of the organic EL device of the present invention is preferably provided adjacent to the light emitting layer.

  Further, in the present invention, a plurality of light emitting layers having different emission colors are provided. In such a case, it is preferable that the light emitting layer whose emission maximum wavelength is the shortest is the closest to the anode among all the light emitting layers. However, in such a case, it is preferable to additionally provide a hole blocking layer between the shortest wave layer and the light emitting layer next to the anode next to the anode. Furthermore, it is preferable that 50% by mass or more of the compound contained in the hole blocking layer provided at the position has an ionization potential of 0.2 eV or more larger than the host compound of the shortest wave emitting layer.

  The ionization potential is defined by the energy required to emit an electron at the HOMO (highest occupied molecular orbital) level of the compound to the vacuum level, and can be obtained by the following method, for example.

(1) Using Gaussian 98 (Gaussian 98, Revision A.11.4, MJ Frisch, et al, Gaussian, Inc., Pittsburgh PA, 2002.), a molecular orbital calculation software manufactured by Gaussian, USA The ionization potential can be obtained as a value obtained by rounding off the second decimal place of a value (eV unit converted value) calculated by performing structural optimization using B3LYP / 6-31G ^* . This calculation value is effective because the correlation between the calculation value obtained by this method and the experimental value is high.

  (2) The ionization potential can also be obtained by a method of directly measuring by photoelectron spectroscopy. For example, a method known as ultraviolet photoelectron spectroscopy can be suitably used by using a low energy electron spectrometer “Model AC-1” manufactured by Riken Keiki Co., Ltd.

  On the other hand, the electron blocking layer has a function of a hole transport layer in a broad sense, and is made of a material that has a function of transporting holes and has an extremely small ability to transport electrons, and transports electrons while transporting holes. By blocking, the recombination probability of electrons and holes can be improved. Moreover, the structure of the positive hole transport layer mentioned later can be used as an electron blocking layer as needed. The film thickness of the hole blocking layer and the electron transport layer according to the present invention is preferably 3 nm to 100 nm, and more preferably 5 nm to 30 nm.

《Hole transport layer》
The hole transport layer is made of a hole transport material having a function of transporting holes, and in a broad sense, a hole injection layer and an electron blocking layer are also included in the hole transport layer. The hole transport layer can be provided as a single layer or a plurality of layers. The hole transport material has any one of hole injection or transport and electron barrier properties, and may be either organic or inorganic. For example, triazole derivatives, oxadiazole derivatives, imidazole derivatives, polyarylalkane derivatives, pyrazoline derivatives and pyrazolone derivatives, phenylenediamine derivatives, arylamine derivatives, amino-substituted chalcone derivatives, oxazole derivatives, styrylanthracene derivatives, fluorenone derivatives, hydrazone derivatives, Examples thereof include stilbene derivatives, silazane derivatives, aniline copolymers, and conductive polymer oligomers, particularly thiophene oligomers. The above-mentioned materials can be used as the hole transport material, but it is preferable to use a porphyrin compound, an aromatic tertiary amine compound and a styrylamine compound, particularly an aromatic tertiary amine compound. Representative examples of aromatic tertiary amine compounds and styrylamine compounds include N, N, N ', N'-tetraphenyl-4,4'-diaminophenyl; N, N'-diphenyl-N, N'- Bis (3-methylphenyl)-[1,1′-biphenyl] -4,4′-diamine (TPD); 2,2-bis (4-di-p-tolylaminophenyl) propane; 1,1-bis (4-di-p-tolylaminophenyl) cyclohexane; N, N, N ′, N′-tetra-p-tolyl-4,4′-diaminobiphenyl; 1,1-bis (4-di-p-tolyl) Aminophenyl) -4-phenylcyclohexane; bis (4-dimethylamino-2-methylphenyl) phenylmethane; bis (4-di-p-tolylaminophenyl) phenylmethane; N, N'-diphenyl-N, N ' − (4-methoxyphenyl) -4,4'-diaminobiphenyl; N, N, N ', N'-tetraphenyl-4,4'-diaminodiphenyl ether; 4,4'-bis (diphenylamino) quadriphenyl; N, N, N-tri (p-tolyl) amine; 4- (di-p-tolylamino) -4 '-[4- (di-p-tolylamino) styryl] stilbene; 4-N, N-diphenylamino- (2-diphenylvinyl) benzene; 3-methoxy-4′-N, N-diphenylaminostilbenzene; N-phenylcarbazole, and two more described in US Pat. No. 5,061,569 Having a condensed aromatic ring of, for example, 4,4'-bis [N- (1-naphthyl) -N-phenylamino] biphenyl (NPD), JP-A-4-308 4,4 ', 4 "-tris [N- (3-methylphenyl) -N-phenylamino] triphenylamine in which three triphenylamine units described in Japanese Patent No. 88 are linked in a starburst type ( MTDATA) etc. Further, a polymer material in which these materials are introduced into a polymer chain or these materials are used as a polymer main chain can also be used. An inorganic compound such as SiC can also be used as a hole injecting material and a hole transporting material, and also disclosed in Japanese Patent Application Laid-Open No. 11-251067, J. Huang et al. (Applied Physics Letters 80 (2002), It is also possible to use a so-called p-type hole transport material as described in p.139). Since the obtained, it is preferable to use these materials. The hole transport layer can be formed by thinning the hole transport material by a known method such as a vacuum deposition method, a spin coating method, a casting method, a printing method including an ink jet method, or an LB method. it can. Although there is no restriction | limiting in particular about the film thickness of a positive hole transport layer, Usually, 5 nm-about 5 micrometers, Preferably it is 5 nm-200 nm. The hole transport layer may have a single layer structure composed of one or more of the above materials. Alternatively, a hole transport layer having a high p property doped with impurities can be used. Examples thereof include JP-A-4-297076, JP-A-2000-196140, JP-A-2001-102175, J.A. Appl. Phys. 95, 5773 (2004), and the like. In the present invention, it is preferable to use a hole transport layer having such a high p property because a device with lower power consumption can be produced.

《Electron transport layer》
The electron transport layer is made of a material having a function of transporting electrons, and in a broad sense, an electron injection layer and a hole blocking layer are also included in the electron transport layer. The electron transport layer can be provided as a single layer or a plurality of layers. Conventionally, in the case of a single electron transport layer and a plurality of layers, an electron transport material (also serving as a hole blocking material) used for an electron transport layer adjacent to the light emitting layer on the cathode side is injected from the cathode. As long as it has a function of transferring electrons to the light-emitting layer, any material can be selected and used from among conventionally known compounds. For example, nitro-substituted fluorene derivatives, diphenylquinone derivatives Thiopyrandioxide derivatives, carbodiimides, fluorenylidenemethane derivatives, anthraquinodimethane and anthrone derivatives, oxadiazole derivatives and the like. Furthermore, in the above oxadiazole derivative, a thiadiazole derivative in which the oxygen atom of the oxadiazole ring is substituted with a sulfur atom, and a quinoxaline derivative having a quinoxaline ring known as an electron withdrawing group can also be used as an electron transport material. Furthermore, a polymer material in which these materials are introduced into a polymer chain or these materials are used as a polymer main chain can also be used. In addition, metal complexes of 8-quinolinol derivatives such as tris (8-quinolinol) aluminum (Alq), tris (5,7-dichloro-8-quinolinol) aluminum, tris (5,7-dibromo-8-quinolinol) aluminum Tris (2-methyl-8-quinolinol) aluminum, tris (5-methyl-8-quinolinol) aluminum, bis (8-quinolinol) zinc (Znq), and the like, and the central metals of these metal complexes are In, Mg, Metal complexes replaced with Cu, Ca, Sn, Ga or Pb can also be used as the electron transport material. In addition, metal-free or metal phthalocyanine, or those having terminal ends substituted with an alkyl group or a sulfonic acid group can be preferably used as the electron transporting material. In addition, the distyrylpyrazine derivative exemplified as the material of the light emitting layer can also be used as an electron transport material, and similarly to the hole injection layer and the hole transport layer, inorganic such as n-type-Si and n-type-SiC can be used. A semiconductor can also be used as an electron transport material. The electron transport layer can be formed by thinning the electron transport material by a known method such as a vacuum deposition method, a spin coating method, a casting method, a printing method including an ink jet method, or an LB method. Although there is no restriction | limiting in particular about the film thickness of an electron carrying layer, Usually, 5 nm-about 5 micrometers, Preferably it is 5-200 nm. The electron transport layer may have a single layer structure composed of one or more of the above materials. Further, an electron transport layer having a high n property doped with impurities can also be used. Examples thereof include JP-A-4-297076, JP-A-10-270172, JP-A-2000-196140, JP-A-2001-102175, J. Pat. Appl. Phys. 95, 5773 (2004), and the like. In the present invention, it is preferable to use an electron transport layer having such a high n property because an element with lower power consumption can be manufactured.

《Support base》
The support substrate (hereinafter also referred to as a substrate, a substrate, a substrate, a support, etc.) according to the organic EL device of the present invention is not particularly limited in the type of glass, plastic, etc., and is transparent or opaque. It may be. In the case where light is extracted from the support base side, the support base is preferably transparent. Examples of the transparent support substrate preferably used include glass, quartz, and a transparent resin film. A particularly preferable support base is a resin film capable of giving flexibility to the organic EL element. Examples of the resin film include polyesters such as polyethylene terephthalate (PET) and polyethylene naphthalate (PEN), polyethylene, polypropylene, cellophane, cellulose diacetate, cellulose triacetate, cellulose acetate butyrate, cellulose acetate propionate (CAP), Cellulose esters such as cellulose acetate phthalate (TAC) and cellulose nitrate or derivatives thereof, polyvinylidene chloride, polyvinyl alcohol, polyethylene vinyl alcohol, syndiotactic polystyrene, polycarbonate, norbornene resin, polymethylpentene, polyether ketone, polyimide , Polyethersulfone (PES), polyphenylene sulfide, polysulfones, Cycloolefin resins such as polyether imide, polyether ketone imide, polyamide, fluororesin, nylon, polymethyl methacrylate, acrylic or polyarylate, Arton (trade name, manufactured by JSR) or Appel (trade name, manufactured by Mitsui Chemicals) Can be mentioned. An inorganic or organic film or a hybrid film of both may be formed on the surface of the resin film, and the water vapor permeability measured by a method in accordance with JIS K 7129-1992 is 0.01 g / m ^2. It is preferably a barrier film of day · atm or less, and further, the oxygen permeability measured by a method according to JIS K 7126-1992 is 10 ⁻³ g / m ² / day or less, water vapor permeability Is preferably a high barrier film of 10 ⁻³ g / m ² / day or less, and the water vapor permeability and oxygen permeability are both 10 ⁻⁵ g / m ² / day or less, Further preferred. As a material for forming a barrier film formed on the surface of the resin film in order to obtain a high barrier film, any material may be used as long as it has a function of suppressing intrusion of an element such as moisture or oxygen that causes deterioration of the element. Silicon, silicon dioxide, silicon nitride, or the like can be used. Further, in order to improve the brittleness of the film, it is more preferable to have a laminated structure of these inorganic layers and layers made of organic materials. Although there is no restriction | limiting in particular about the lamination | stacking order of an inorganic layer and an organic layer, It is preferable to laminate | stack both alternately several times.

<Method for forming barrier film>
The method for forming the barrier film is not particularly limited. For example, the vacuum deposition method, the sputtering method, the reactive sputtering method, the molecular beam epitaxy method, the cluster ion beam method, the ion plating method, the plasma polymerization method, the atmospheric pressure plasma weighting. A combination method, a plasma CVD method, a laser CVD method, a thermal CVD method, a coating method, and the like can be used, but an atmospheric pressure plasma polymerization method as described in JP-A-2004-68143 is particularly preferable. Examples of the opaque support base include metal plates / films such as aluminum and stainless steel, opaque resin substrates, ceramic substrates, and the like.

  The external extraction efficiency at room temperature of light emission of the organic EL device of the present invention is preferably 1% or more, more preferably 5% or more. Here, the external extraction quantum efficiency (%) = the number of photons emitted to the outside of the organic EL element / the number of electrons sent to the organic EL element × 100. In addition, a hue improvement filter such as a color filter may be used in combination, or a color conversion filter that converts the emission color from the organic EL element into multiple colors using a phosphor.

  Here, an example of a layer structure of a transparent barrier film used for the support base according to the present invention will be described with reference to FIG. 1, and an example of an atmospheric pressure plasma discharge treatment apparatus preferably used for forming the barrier layer will be described with reference to FIG. Will be described. FIG. 1 is a schematic diagram illustrating an example of a layer configuration of a barrier film (also referred to as a gas barrier film) and a density profile thereof. The barrier film 201 (which may be transparent or opaque) has a configuration in which layers having different densities are stacked on the base material 202. In the present invention, a medium density layer 204 is provided between the low density layer 203 and the high density layer 205, and the medium density layer 204 is also provided on the high density layer 205, and these low density layer and medium density layer are provided. FIG. 1 shows an example in which a unit composed of a high-density layer and a medium-density layer is one unit, and two units are stacked. At this time, the density distribution in each density layer is uniform, and the density change between adjacent layers is stepped. In FIG. 1, the medium density layer 204 is shown as one layer, but a configuration of two or more layers may be adopted as necessary. In addition, as a layer structure of the barrier film (gas barrier film) according to the present invention, at least one layer among the three layers having different densities (a high density layer, a medium density layer, and a low density layer) may be provided. Preferably, it has two or three layers with different densities.

Here, an atmospheric pressure plasma discharge processing apparatus as shown in FIG. 2 below is used as an example for forming the high-density layer, the medium-density layer, and the low-density layer. Examples of the set values of the density of the high-density layer, medium-density layer, and low-density layer, materials used for forming each layer (for example, silicon oxide, silicon oxynitride, alumina oxide, etc.) and formation conditions are shown in the examples. This will be specifically described in FIG. FIG. 2 is a schematic view showing an example of an atmospheric pressure plasma discharge treatment apparatus for treating a substrate. The atmospheric pressure plasma discharge processing apparatus is an apparatus having at least a plasma discharge processing apparatus 230, an electric field applying means 240 having two power supplies, a gas supply means 250, and an electrode temperature adjusting means 260. FIG. 2 shows an interval (discharge space) 232 between the roll rotating electrode (first electrode) 235 and the square tube type fixed electrode group (second electrode) 236 (each electrode is also a square tube type fixed electrode 236). Thus, the substrate F is subjected to plasma discharge treatment to form a thin film. In FIG. 4, a pair of rectangular tube type fixed electrode group (second electrode) 236 and roll rotating electrode (first electrode) 235 form one electric field. Is formed. FIG. 4 shows a configuration example in which a total of five units having such a configuration are provided. In each unit, the types of raw materials to be supplied, the output voltage, and the like are controlled arbitrarily and independently. A mold barrier film (also referred to as a transparent gas barrier layer) can be formed continuously. In the discharge space (between the counter electrodes) 232 between the roll rotating electrode (first electrode) 235 and the square tube type fixed electrode group (second electrode) 236, the roll rotating electrode (first electrode) 235 has a first power source. The first high-frequency electric field having the frequency ω1, the electric field intensity V1, and the current I1 from 241 and the frequency ω2, the electric field intensity V2 from the corresponding second power source 242 to the rectangular tube fixed electrode group (second electrode) 236, respectively. A second high-frequency electric field of current I2 is applied. A first filter 243 is installed between the roll rotation electrode (first electrode) 235 and the first power source 241. The first filter 243 easily passes a current from the first power source 241 to the first electrode. In addition, the current from the second power source 242 is grounded so that the current from the second power source 242 to the first power source is difficult to pass. In addition, a second filter 244 is installed between the square tube type fixed electrode group (second electrode) 236 and the second power source 242, and the second filter 244 is connected to the second electrode from the second power source 242. It is designed so that the current from the first power source 241 is grounded and the current from the first power source 241 to the second power source is difficult to pass. The roll rotating electrode 235 may be the second electrode, and the square tube fixed electrode group 236 may be the first electrode. In any case, the first power source is connected to the first electrode, and the second power source is connected to the second electrode. The first power source preferably applies a higher high-frequency electric field strength (V1> V2) than the second power source. Further, the frequency has the ability to satisfy ω1 <ω2. The current is preferably I1 <I2. Current I1 of the first high-frequency electric field is preferably ^{0.3mA / cm 2 ~20mA / cm 2} , more preferably at ^{1.0mA / cm 2 ~20mA / cm 2} . Furthermore, current I2 of the second high-frequency electric field is preferably ^{10mA / cm 2 ~100mA / cm 2} , more preferably ^{20mA / cm 2 ~100mA / cm 2} . The gas G generated by the gas generator 251 of the gas supply means 250 is introduced into the plasma discharge processing container 231 from the air supply port while controlling the flow rate. The base material F is unwound from the original winding (not shown) and is transported, or transported from the previous process, and air or the like accompanying the base material is blocked by the nip roll 265 via the guide roll 264. Then, while being wound while being in contact with the roll rotating electrode 235, it is transferred between the square tube fixed electrode group 236, the roll rotating electrode (first electrode) 235 and the square tube fixed electrode group (second electrode) 236, An electric field is applied from both sides to generate discharge plasma between the counter electrodes (discharge space) 232. The base material F forms a thin film with a gas in a plasma state while being wound while being in contact with the roll rotating electrode 235. The substrate F passes through the nip roll 266 and the guide roll 267, and is taken up by a winder (not shown) or transferred to the next process. Discharged treated exhaust gas G ′ is discharged from the exhaust port 253. In order to heat or cool the roll rotating electrode (first electrode) 235 and the rectangular tube type fixed electrode group (second electrode) 236 during the thin film formation, a medium whose temperature is adjusted by the electrode temperature adjusting means 260 is used as a liquid feed pump. P is sent to both electrodes via the pipe 261, and the temperature is adjusted from the inside of the electrode. Reference numerals 268 and 269 denote partition plates that partition the plasma discharge processing vessel 231 and the outside.

<Sealing>
Examples of the sealing means used for sealing the organic EL element of the present invention include a method of bonding a sealing member, an electrode, and a support base with an adhesive. The sealing member may be disposed so as to cover the display area of the organic EL element, and may be concave or flat. Moreover, transparency and electrical insulation are not particularly limited. Specific examples include a glass plate, a polymer plate / film, and a metal plate / film. Examples of the glass plate include soda-lime glass, barium / strontium-containing glass, lead glass, aluminosilicate glass, borosilicate glass, barium borosilicate glass, and quartz.

  Examples of the polymer plate include polycarbonate, acrylic, polyethylene terephthalate, polyether sulfide, and polysulfone. Examples of the metal plate include those made of one or more metals or alloys selected from the group consisting of stainless steel, iron, copper, aluminum, magnesium, nickel, zinc, chromium, titanium, molybdenum, silicon, germanium, and tantalum. In the present invention, a polymer film and a metal film can be preferably used because the element can be thinned.

Furthermore, the polymer film preferably has an oxygen permeability of 10 ⁻³ g / m ² / day or less and a water vapor permeability of 10 ⁻⁵ g / m ² / day or less. Further, it is more preferable that both the water vapor permeability and the oxygen permeability are 10 ⁻⁵ g / m ² / day or less. For processing the sealing member into a concave shape, sandblasting, chemical etching, or the like is used.

  Specific examples of the adhesive include photocuring and thermosetting adhesives having a reactive vinyl group of acrylic acid oligomers and methacrylic acid oligomers, and moisture curing adhesives such as 2-cyanoacrylate. be able to. Moreover, the heat | fever and chemical curing types (two-component mixing), such as an epoxy type, can be mentioned. Moreover, hot-melt type polyamide, polyester, and polyolefin can be mentioned. Moreover, a cationic curing type ultraviolet curing epoxy resin adhesive can be mentioned. In addition, since an organic EL element may deteriorate by heat processing, what can be adhesive-hardened from room temperature to 80 degreeC is preferable. A desiccant may be dispersed in the adhesive. Application | coating of the adhesive agent to a sealing part may use commercially available dispenser, and may print it like screen printing.

  In addition, it is also preferable to coat the electrode and the organic layer on the outside of the electrode facing the support substrate with the organic layer interposed therebetween, and form an inorganic or organic layer in contact with the support substrate to form a sealing film. it can. In this case, the material for forming the film may be any material that has a function of suppressing intrusion of elements that cause deterioration of the element such as moisture and oxygen. For example, silicon oxide, silicon dioxide, silicon nitride, or the like may be used. it can. Furthermore, in order to improve the brittleness of the film, it is preferable to have a laminated structure of these inorganic layers and layers made of organic materials.

  The method for forming these films is not particularly limited. For example, vacuum deposition, sputtering, reactive sputtering, molecular beam epitaxy, cluster-ion beam method, ion plating method, plasma polymerization method, atmospheric pressure plasma A polymerization method, a plasma CVD method, a laser CVD method, a thermal CVD method, a coating method, or the like can be used. In the gap between the sealing member and the display area of the organic EL element, an inert gas such as nitrogen or argon, or an inert liquid such as fluorinated hydrocarbon or silicon oil is injected in the gas phase and the liquid phase. Is preferred. A vacuum can also be used. Moreover, a hygroscopic compound can also be enclosed inside. Examples of the hygroscopic compound include metal oxides (eg, sodium oxide, potassium oxide, calcium oxide, barium oxide, magnesium oxide, aluminum oxide), sulfates (eg, sodium sulfate, calcium sulfate, magnesium sulfate, cobalt sulfate, etc.). Metal halides (eg, calcium chloride, magnesium chloride, cesium fluoride, tantalum fluoride, cerium bromide, magnesium bromide, barium iodide, magnesium iodide, etc.), perchloric acids (eg, barium perchlorate, In particular, anhydrous salts are preferably used in sulfates, metal halides and perchloric acids.

《Protective film, protective plate》
In order to increase the mechanical strength of the element, a protective film or a protective plate may be provided outside the sealing film or the sealing film on the side facing the support substrate with the organic layer interposed therebetween. In particular, when sealing is performed by the sealing film, the mechanical strength is not necessarily high, and thus it is preferable to provide such a protective film and a protective plate. As a material that can be used for this, the same glass plate, polymer plate / film, metal plate / film, etc. used for the sealing can be used, but the polymer film is light and thin. Is preferably used.

"anode"
As the anode in the organic EL element, an electrode material made of a metal, an alloy, an electrically conductive compound, or a mixture thereof having a high work function (4 eV or more) is preferably used. Specific examples of such electrode materials include metals such as Au, and conductive transparent materials such as CuI, indium tin oxide (ITO), SnO ₂ and ZnO. Alternatively, an amorphous material such as IDIXO (In ₂ O ₃ —ZnO) capable of forming a transparent conductive film may be used. For the anode, these electrode materials may be formed into a thin film by a method such as vapor deposition or sputtering, and a pattern having a desired shape may be formed by a photolithography method, or when the pattern accuracy is not required (about 100 μm or more) ), A pattern may be formed through a mask having a desired shape when the electrode material is deposited or sputtered. Or when using the substance which can be apply | coated like an organic electroconductivity compound, wet film forming methods, such as a printing system and a coating system, can also be used. When light emission is extracted from the anode, it is desirable that the transmittance be greater than 10%, and the sheet resistance as the anode is preferably several hundred Ω / □ or less. Further, although the film thickness depends on the material, it is usually selected in the range of 10 nm to 1000 nm, preferably 10 nm to 200 nm.

"cathode"
On the other hand, as the cathode, a material having a low work function (4 eV or less) metal (referred to as an electron injecting metal), an alloy, an electrically conductive compound, and a mixture thereof as an electrode material is used. Specific examples of such electrode materials include sodium, sodium-potassium alloy, magnesium, lithium, magnesium / copper mixture, magnesium / silver mixture, magnesium / aluminum mixture, magnesium / indium mixture, aluminum / aluminum oxide (Al ₂ O ₃ ) Mixtures, indium, lithium / aluminum mixtures, rare earth metals and the like. Among these, from the point of durability against electron injection and oxidation, etc., a mixture of an electron injecting metal and a second metal which is a stable metal having a larger work function than this, for example, a magnesium / silver mixture, Suitable are a magnesium / aluminum mixture, a magnesium / indium mixture, an aluminum / aluminum oxide (Al ₂ O ₃ ) mixture, a lithium / aluminum mixture, aluminum and the like. The cathode can be produced by forming a thin film of these electrode materials by a method such as vapor deposition or sputtering. The sheet resistance as a cathode is preferably several hundred Ω / □ or less, and the film thickness is usually selected in the range of 10 nm to 5 μm, preferably 50 nm to 200 nm. In order to transmit the emitted light, if either one of the anode or the cathode of the organic EL element is transparent or translucent, the emission luminance is advantageously improved.

  Moreover, after producing the said metal by the film thickness of 1 nm-20 nm to a cathode, the transparent or semi-transparent cathode can be produced by producing the electroconductive transparent material quoted by description of the anode on it, By applying this, an element in which both the anode and the cathode are transmissive can be manufactured.

<< Method for producing organic EL element >>
As an example of the method for producing the organic EL device of the present invention, a method for producing an organic EL device comprising an anode / hole injection layer / hole transport layer / light emitting layer / hole blocking layer / electron transport layer / cathode will be described. First, a desired electrode material, for example, a thin film made of a material for an anode is formed on a suitable support base by a method such as vapor deposition or sputtering so as to have a film thickness of 1 μm or less, preferably 10 nm to 200 nm. To do. Next, an organic compound thin film of a hole injection layer, a hole transport layer, a light emitting layer, a hole blocking layer, and an electron transport layer, which are organic EL element materials, is formed thereon. As a method for thinning the organic compound thin film, there are a vapor deposition method and a wet process (spin coating method, casting method, ink jet method, printing method) as described above, but it is easy to obtain a uniform film and a pinhole. From the point of being difficult to form, a vacuum deposition method, a spin coating method, an ink jet method, and a printing method are particularly preferable. Further, different film forming methods may be applied for each layer. When a vapor deposition method is employed for film formation, the vapor deposition conditions vary depending on the type of compound used, but generally a boat heating temperature of 50 ° C. to 450 ° C., a vacuum degree of 10 ⁻⁶ Pa to 10 ⁻² Pa, a vapor deposition rate of 0. It is desirable to select appropriately within the range of 01 nm / second to 50 nm / second, substrate temperature −50 ° C. to 300 ° C., film thickness 0.1 nm to 5 μm, preferably 5 nm to 200 nm. After forming these layers, a thin film made of a cathode material is formed thereon by a method such as vapor deposition or sputtering so as to have a film thickness of 1 μm or less, preferably in the range of 50 nm to 200 nm, and a cathode is provided. Thus, a desired organic EL element can be obtained. The organic EL element is preferably produced from the hole injection layer to the cathode consistently by a single evacuation, but may be taken out halfway and subjected to different film forming methods. At that time, it is necessary to consider that the work is performed in a dry inert gas atmosphere. In addition, it is also possible to reverse the production order and produce the cathode, the electron injection layer, the electron transport layer, the light emitting layer, the hole transport layer, the hole injection layer, and the anode in this order. When a DC voltage is applied to the multicolor display device thus obtained, light emission can be observed by applying a voltage of about 2 V to 40 V with the anode as + and the cathode as-. An alternating voltage may be applied. The alternating current waveform to be applied may be arbitrary.

<Application>
The organic electroluminescence element of the present invention can be used as a display device, a display, or various light sources. Examples of light sources include home lighting, interior lighting, clock and liquid crystal backlights, billboard advertisements, traffic lights, light sources for optical storage media, light sources for electrophotographic copying machines, light sources for optical communication processors, and light sources for optical sensors. Although it is not limited to this, it can be effectively used especially as a backlight of a liquid crystal display device combined with a color filter and a light source for illumination. In the organic electroluminescence element of the present invention, patterning may be performed by a metal mask, an ink jet printing method, or the like at the time of film formation, if necessary. When patterning, only the electrode may be patterned, the electrode and the light emitting layer may be patterned, or the entire element layer may be patterned.

<Display device>
The display device of the present invention will be described. The display device of the present invention is used for a multicolor or white display device. In the case of a multicolor or white display device, a shadow mask is provided only at the time of forming a light emitting layer, and a film can be formed on one surface by a vapor deposition method, a cast method, a spin coating method, an ink jet method, a printing method, or the like. When patterning is performed only on the light-emitting layer, the method is not limited, but a vapor deposition method, an inkjet method, and a printing method are preferable. In the case of using a vapor deposition method, patterning using a shadow mask is preferable. Further, the manufacturing order is reversed, and the cathode, the electron transport layer, the hole blocking layer, and the light emitting layer unit (having at least three layers of the above light emitting layers A, B, and C, and a non-light emitting intermediate layer between the light emitting layers) It is also possible to produce the hole transport layer and the anode in this order. When a DC voltage is applied to the multicolor or white display device thus obtained, light emission can be observed by applying a voltage of about 2V to 40V with the anode as + and the cathode as-. Further, even when a voltage is applied with the opposite polarity, no current flows and no light emission occurs. Further, when an AC voltage is applied, light is emitted only when the anode is in the + state and the cathode is in the-state. The alternating current waveform to be applied may be arbitrary. Light sources include home lighting, interior lighting, clock and liquid crystal backlights, billboard advertisements, traffic lights, light sources for optical storage media, light sources for electrophotographic copying machines, light sources for optical communication processors, light sources for optical sensors, etc. Although it is mentioned, it is not limited to these.

《Lighting device》
The lighting device of the present invention will be described. The organic EL element of the present invention may be used as a kind of lamp such as an illumination or exposure light source, or a projection device that projects an image, or a display device that directly recognizes a still image or a moving image. (Display) may be used. When used as a display device for reproducing moving images, the driving method may be either a simple matrix (passive matrix) method or an active matrix method. In the white organic electroluminescent element used for this invention, you may pattern by a metal mask, the inkjet printing method, etc. at the time of film forming as needed. When patterning, only the electrode may be patterned, the electrode and the light emitting layer may be patterned, or the entire element layer may be patterned. The light emitting material used for the light emitting layer is not particularly limited. For example, in the case of a backlight in a liquid crystal display element, the platinum complex according to the present invention is known so as to be suitable for the wavelength range corresponding to the CF (color filter) characteristics. Any one of the light emitting materials may be selected and combined, or may be combined with the light extraction and / or light collecting sheet according to the present invention to be whitened.

  As described above, the white organic EL element used in the present invention is combined with CF (color filter), and the element and the driving transistor circuit are arranged in accordance with the CF (color filter) pattern. As described, the white light extracted from the organic electroluminescence element is used as a backlight, and blue light, green light, and red light are obtained through a blue filter, a green filter, and a red filter. A long-life, full-color organic electroluminescence display is preferable.

  In addition to these displays, various light-emitting light sources and lighting devices are also useful for home lighting, interior lighting, and as a kind of lamp such as an exposure light source for display devices such as backlights for liquid crystal display devices. It is done. Others such as backlights for watches, signboard advertisements, traffic lights, light sources for optical storage media, light sources for electrophotographic copying machines, light sources for optical communication processors, light sources for optical sensors, etc. There are a wide range of uses such as household appliances.

  EXAMPLES Hereinafter, the present invention will be specifically described with reference to examples, but the present invention is not limited thereto.

Example 1
<< Preparation of Organic Electroluminescence Element 101 >>
Transparent support with this ITO transparent electrode after patterning on a substrate (also referred to as a support substrate) in which ITO (Indium Tin Oxide) is deposited to a thickness of 120 nm on a glass substrate of 30 mm × 30 mm and a thickness of 0.5 mm as an anode The substrate (101 in FIG. 1) was ultrasonically cleaned with isopropyl alcohol, dried with dry nitrogen gas, and subjected to UV ozone cleaning for 5 minutes. This transparent support base was fixed to a substrate holder of a commercially available vacuum deposition apparatus. Each of the deposition crucibles in the vacuum deposition apparatus was filled with CuPc (copper phthalocyanine), m-MTDATA, BCzVBi, compound 1 (host compound), rubrene, BAlq, and Alq ₃ in an optimum amount for device fabrication. The evaporation crucible used was made of a resistance heating material made of molybdenum or tungsten.

Next, after reducing the vacuum to 4 × 10 ⁻⁴ Pa, the deposition crucible containing CuPc was energized and heated, and deposited on the ITO electrode side of the transparent support base at a deposition rate of 0.1 nm / second. A hole injection layer was provided. In addition, the crucible for vapor deposition loaded with the above materials was energized at the mixing ratio shown in Table 1 and co-evaporated or single-deposited to form a hole transport layer, a light emitting layer 1, an intermediate layer. 1 and the light emitting layer 2 were each formed into a film. Further, the deposition crucible containing BAlq was energized and heated, and deposited on the light emitting layer 2 at a deposition rate of 0.1 nm / second to prepare a hole blocking layer, and then the Alq ₃ contained The crucible for vapor deposition was energized and heated, and vapor deposition was performed on the hole blocking layer at a vapor deposition rate of 0.1 nm / second to provide an electron transport layer. In addition, the substrate temperature at the time of vapor deposition was room temperature. Subsequently, lithium fluoride 0.5 nm was vapor-deposited, and aluminum 110 nm was vapor-deposited to form a cathode.

  Finally, the vapor deposition surface side is covered with a glass cover, and sealing is performed in a glove box under a nitrogen atmosphere (in an atmosphere of high-purity nitrogen gas with a purity of 99.999% or more) without contacting each layer of the organic EL element with the air. An organic electroluminescence device 101 was produced. 3 is an external view, and FIG. 4 is a cross-sectional view of the lighting device. In FIGS. 3 and 4, 101 is a glass substrate, 102 is a glass cover, 105 is a cathode, 106 is an organic EL layer, and 107 is transparent. An electrode (anode) is shown. The glass cover 102 is filled with nitrogen gas 108 and a water catching agent 109 is provided.

<< Preparation of organic electroluminescence elements 102-104 >>
Elements 102 to 104 were produced in the same manner as the element 101 except that the mixing ratios and film thicknesses described in Table 1 were changed, and were similarly sealed.

<< Production of Organic Electroluminescence Elements 105-108 >>
Moreover, with respect to the produced organic electroluminescence elements 101 to 104, a diffusion plate (Tsunden light diffusion film D124) is placed on the light extraction side of each support substrate, and a prism sheet (3M BEF II) is placed thereon. ) So that the prism surface faces the opposite side of the support substrate, and the same prism sheet is placed so that the same prism row is orthogonal and the prism surface faces the opposite side of the support base. 108 was produced. Note that a double-sided adhesive tape (model number CS9621) manufactured by Nitto Denko was used for bonding the sheets. The prism sheet is a 125 μm thick PET substrate in which Δ-shaped stripes with an apex angle of 90 degrees and a pitch of 50 μm are formed of acrylic resin, and the haze value of the diffusion plate is about 87%. It was.

<Evaluation of element sealing treatment and front luminance>
The driving voltage (V) and the light emission lifetime (hr) at which the front luminance of each organic electroluminescence element produced as described above was 1000 cd / m ² were evaluated.

The lifetime was expressed as a relative value with the element 101 taken as 100, taking a relative time until the luminance was reduced by half while continuing to drive at the initial current value giving 1000 cd / m ² .

Here, all the elements have a chromaticity of x = 0.33 ± 0.07 and y = 0.33 ± 0.07 in a CIE1931 color system at a 2 ° C. viewing angle front luminance of 1000 cd / m ² . The range was confirmed to be white. The obtained results are shown in Table 2.

Moreover, when measuring the front luminance amplification factor when the sheet of the present invention is pasted,
a: 2.2 times, b: 1.8 times, c: 1.5 times.

  In addition, the front luminance amplification factor is measured using a spectral radiance meter CS-1000 manufactured by Konica Minolta Sensing Co., Ltd. before installing a diffusing plate and a prism sheet on the light extraction side of the organic EL element using this. The front luminance at 2 ° C. viewing angle was measured in the wavelength range of 430 to 480 nm so that the optical axis of the spectral radiance meter coincided with the normal line from the light emitting surface, and after taking the integrated intensity, After taking out and / or a light collecting sheet and measuring in the same manner to obtain integrated intensity, the respective integrated intensity ratios were taken to determine the front luminance amplification factor a.

  The wavelength ranges were similarly measured separately for 510 to 550 nm and 600 to 640 nm, respectively, and front luminance gains b and c in the respective wavelength ranges were determined.

  From the results of Table 2, the organic electroluminescent elements 105 to 108 of the present invention are low in voltage and the light emitting layer is a thin film, compared with the comparative elements 101 to 104, and the predetermined front luminance, It can be seen that white light emission is obtained and the continuous driving life is improved. This is considered to be because the front luminance gain was increased by the light extraction and condensing sheet of the present invention, as can be seen from the result of the front luminance gain measurement. In particular, it is considered that the film thickness of the blue light-emitting layer could be reduced because the front luminance amplification factor at the wavelength in the blue region was high.

  As described above, in the blue / yellow two-color emission configuration, the effect of lowering the voltage and extending the service life has been confirmed as a result of taking advantage of the high front luminance amplification factor of the blue color of the sheet in any combination of fluorescence / phosphorescence. It was done.

Example 2
<< Production of Organic Electroluminescence Elements 201-210 >>
As a base material, on a polyethylene terephthalate film having a thickness of 100 μm (a film made by Teijin-Dyupon Co., Ltd., hereinafter abbreviated as PEN), the following atmospheric pressure plasma discharge treatment apparatus and discharge conditions, the profile configuration shown in FIG. That is, a support base (also referred to as a gas barrier film) having a transparent barrier layer in which three units of a low density layer, a medium density layer, a high density layer, and a medium density layer were laminated was produced.

(Atmospheric pressure plasma discharge treatment equipment)
A set of a roll electrode covered with a dielectric and a plurality of rectangular tube electrodes was produced as follows using an atmospheric pressure plasma discharge treatment apparatus 230 shown in FIG.

  The roll rotating electrode 235 serving as the first electrode is coated with a high-density, high-adhesive alumina sprayed film by an atmospheric plasma method on a titanium alloy T64 jacket roll metallic base material having cooling means by cooling water, The roll diameter was set to 1000 mmφ. On the other hand, the square electrode of the second electrode is a rectangular tube-shaped fixed electrode group 236 which is coated with 1 mm of the same dielectric material as the above on a hollow rectangular tube-shaped titanium alloy T64 under the same conditions, and is opposed thereto. It was.

Twenty-four square tube electrodes 236 were arranged around the roll rotating electrode 235 with a counter electrode gap of 1 mm. The total discharge area of the rectangular tube type fixed electrode group 236 was 150 cm (length in the width direction) × 4 cm (length in the transport direction) × 24 (number of electrodes) = 14400 cm ² .

  During plasma discharge, the first electrode (roll rotating electrode) 235 and the second electrode (square tube type fixed electrode group) 236 are adjusted and maintained at 80 ° C., and the roll rotating electrode 235 is rotated by a drive to form a thin film. went. Among the 24 rectangular tube type fixed electrode groups 236, 4 from the upstream side are used for forming the following first layer (low density layer 1), and the following 6 are used for the following second layer (medium density layer 1). The following 8 pieces are used for forming the third layer (high density layer 1) and the remaining 6 pieces are used for forming the fourth layer (medium density layer 2). The conditions were set and 4 layers were stacked in one pass. This condition was further repeated twice to produce a transparent gas barrier film 1.

(First layer: low density layer 1)
Plasma discharge was performed under the following conditions to form a low density layer 1 having a thickness of about 90 nm.

<Gas conditions>
Discharge gas: Nitrogen gas 94.8% by volume
Thin film forming gas: hexamethyldisiloxane (hereinafter abbreviated as HMDSO)
(Vaporized by mixing with nitrogen gas in a Lintec vaporizer) 0.2% by volume
Additive gas: Oxygen gas 5.0% by volume
<Power supply conditions: Only the power supply on the first electrode side was used>
1st electrode side Power supply type
Frequency 80kHz
Output density 10W / cm ²
The density of the formed first layer (low density layer) was 1.90 as a result of measurement by the X-ray reflectivity method using MXP21 manufactured by MacScience.

(Second layer: Medium density layer 1)
Plasma discharge was performed under the following conditions to form a medium density layer 1 having a thickness of about 90 nm.

<Gas conditions>
Discharge gas: Nitrogen gas 94.9% by volume
Thin film forming gas: hexamethyldisiloxane (hereinafter abbreviated as HMDSO)
(Vaporized by mixing with nitrogen gas in a Lintec vaporizer) 0.1% by volume
Additive gas: Oxygen gas 5.0% by volume
<Power supply conditions: Only the power supply on the first electrode side was used>
1st electrode side Power supply type
Frequency 80kHz
Output density 10W / cm ²
The density of the formed second layer (medium density layer) was 2.05 as a result of measurement by the X-ray reflectivity method using MXP21 manufactured by MacScience.

(Third layer: High-density layer 1)
Plasma discharge was performed under the following conditions to form a high-density layer 1 having a thickness of about 90 nm.

<Gas conditions>
Discharge gas: Nitrogen gas 94.9% by volume
Thin film forming gas: hexamethyldisiloxane (hereinafter abbreviated as HMDSO)
(Vaporized by mixing with nitrogen gas in a Lintec vaporizer) 0.1% by volume
Additive gas: Oxygen gas 5.0% by volume
<Power supply conditions>
1st electrode side Power supply type
Frequency 80kHz
Output density 10W / cm ²
Second electrode side Power supply type High frequency power supply manufactured by Pearl Industrial Co., Ltd.
Frequency 13.56MHz
Output density 10W / cm ²
The density of the formed third layer (high density layer) was 2.20 as a result of measurement by the X-ray reflectivity method using MXP21 manufactured by MacScience.

(Fourth layer: Medium density layer 2)
The medium density layer 2 was formed under the same conditions as the second layer (medium density layer 1).

(5th to 12th layers)
This was repeated twice under the same conditions as the formation of the first layer to the fourth layer (1 unit) to produce a transparent gas barrier film 1.

  A low-refractive layer using silica airgel was provided on the gas barrier film transparent substrate. This low refractive layer was produced as follows. That is, liquid A was prepared by mixing tetramethoxysilane oligomer and methanol, and liquid B was prepared by mixing water, ammonia water, and methanol. The alkoxysilane solution obtained by mixing the liquid A and the liquid B was applied on the same glass substrate as used in Example 1. After the alkoxysilane was gelled, it was immersed in a curing solution of water, aqueous ammonia and methanol, and cured for one day at room temperature. Next, the cured gel-like compound was immersed in an isopropanol solution of hexamethyldisilazane and subjected to a hydrophobic treatment. Thereafter, supercritical drying was performed to form a silica airgel layer on the glass substrate. Silica airgel is a light-transmitting porous body having a uniform ultrafine structure. The refractive index of the layer is 1.3 or less, which is lower than the refractive index of glass of about 1.5 and the refractive index of ITO film of about 1.9. After the ITO (indium tin oxide) 120 nm film was formed on the low refractive layer thus prepared and patterned, the substrate with the ITO transparent electrode and the silica airgel layer was ultrasonically cleaned with isopropyl alcohol, Drying was performed with dry nitrogen gas, and UV ozone cleaning was performed for 5 minutes.

  Next, except that the materials and film thicknesses listed in Table 3 were changed and the light emitting layer was changed to three layers, co-evaporation or single vapor deposition was performed in the same manner as described in Example 1, and this time, Using the above (gas barrier film), the periphery of the element was bonded and sealed with an adhesive in an atmosphere of high-purity nitrogen gas to prepare organic EL elements 201-209. Next, in the combinations described in Table 3, the light extraction and condensing sheets of the present invention (1 and 2 below) are organic EL elements as shown in Table 3 in the same manner as the steps of the elements 105 to 108 of Example 1. The organic EL elements 205 to 209 were fabricated by pasting on the light emitting surface.

About the elements 205-208, as the light extraction and condensing sheet, the following 1 was prepared in the same manner as in Example 1 except that the light diffusion film was changed.
1. Tsujiden Light Diffusing Film D121 / Prism Sheet 3M BEF II / Prism Sheet 3M BEF II
The two prism sheets were installed so that the same prism row was orthogonal, and the prism surface was facing away from the support base.

As for the element 209, the following 2 was prepared and used in the same manner as in Example 1, except that the light diffusion film was changed.
2. Tsujiden Light Diffusion Film D114 / Prism Sheet 3M BEF II / Prism Sheet 3M BEF II
The two prism sheets were also installed so that the same prism row was orthogonal and the prism surface was facing away from the support base.

  In both cases, a double-sided adhesive tape (model number CS9621) manufactured by Nitto Denko was used as the adhesive.

put it here,

Phosphorescence G (phosphorescent dopant): Ir-1
Phosphorescence R (phosphorescent dopant): Ir-9
Cs: Cesium fluoride (CsF)
<Evaluation of element sealing treatment and front luminance>
The drive voltage (V), the light emission lifetime (hr), and the front luminance amplification factor at which the front luminance of each fabricated device was 1000 cd / m ² were evaluated.

The lifetime was expressed as a relative value with the element 101 taken as 100, taking a relative time until the luminance was reduced by half while continuing to drive at an initial current value giving 1000 cd / m ² .

Here, all the elements have a chromaticity of x = 0.33 ± 0.07 and y = 0.33 ± 0.07 in a CIE1931 color system at a 2 ° C. viewing angle front luminance of 1000 cd / m ² . The range was confirmed to be white.

Table 4 shows the obtained results. The front luminance amplification factor when the sheet of the present invention was attached was as follows.
1.
a: 4.5 times
b: 3.5 times c: 2.8 times 2.
a: 3.0 times b: 2.5 times c: 2.0 times

  From the results shown in Table 4, the organic electroluminescent elements 205 to 210 of the present invention can obtain a predetermined front luminance at a low voltage and have an improved continuous driving life as compared with the comparative elements 201 to 204. I understand that. This is because the front luminance amplification factor is increased by the light extraction and condensing sheet of the present invention, and in addition, since the front luminance amplification factor is particularly high in the wavelength of the blue region, the film thickness of the blue light emitting layer is particularly narrowed. This is thought to be due to this. Even when the stacking order of the organic light emitting layers between the anode and the cathode was changed as shown in Table 3, the effect of the present invention was similarly recognized.

  That is, in the three-color configuration of blue / green / red, and in any combination of fluorescence / phosphorescence, the sample using the light extraction and condensing sheet of the present invention has a high front brightness amplification factor, The effect of low voltage and long life was confirmed.

It is a schematic diagram which shows an example of the laminated constitution of a barrier film, and its density profile. It is the schematic which shows an example of the atmospheric pressure plasma discharge processing apparatus which processes a base material. It is an external view of an illuminating device. It is sectional drawing of an illuminating device.

Explanation of symbols

DESCRIPTION OF SYMBOLS 101 Glass substrate 107 Transparent electrode 106 Organic EL layer 105 Cathode 102 Glass cover 108 Nitrogen gas 109 Water trapping agent 201 Barrier film 202 Base material 203 Low density layer 204 Medium density layer 205 High density layer 230 Plasma discharge treatment apparatus 231 Plasma discharge treatment vessel 231 235 Roll rotation electrode 236 Square tube type fixed electrode group 240 Electric field application means 250 Gas supply means 251 Gas generator 253 Exhaust port 260 Electrode temperature adjustment means F Base material P Liquid feed pump 261 Piping 266 Nip roll 267 Guide roll 268, 269 Partition plate

Claims (4)

In the organic electroluminescence device having a light extraction and / or light collecting sheet on the light extraction side, the organic electroluminescence device includes an organic material including at least an anode, a cathode, and a plurality of light emitting layers between the anode and the cathode on a support substrate. It has a configuration in which compound layers are laminated,
And the said light extraction and / or condensing sheet satisfy | fill the requirements of the following (A) and (B), The organic electroluminescent element characterized by the above-mentioned.
(A) The front luminance amplification factor at a wavelength of 430 nm to 480 nm of the light extraction and / or condensing sheet is a, the front luminance amplification factor at a wavelength of 510 nm to 550 nm is b, and the front luminance amplification factor at a wavelength of 600 nm to 640 nm is c. Where a to c are
2.0 ≦ a ≦ 5.0
1.5 ≦ b ≦ 4.0
1.0 ≦ c ≦ 3.0
And a has the maximum value.
(B) The light extracted from the light extraction and / or the light collecting sheet is white light. 2. The organic electroluminescence device according to claim 1, wherein light emitted from the light emitting layer is composed of three colors of blue, green, and red. The organic electroluminescence device according to claim 1, wherein the organic electroluminescence device has at least one light emitting layer containing at least one phosphorescent dopant. Blue light, green light, and red light are obtained from white light extracted from the organic electroluminescence element according to any one of claims 1 to 3 through a blue filter, a green filter, and a red filter. Organic electroluminescence display.

Images