JP2007047027A - Automatic analyzer and its cleaning method - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an automatic analyzer and its cleaning method capable of removing stains powerfully with a simple constitution. <P>SOLUTION: This analyzer is equipped with: a sample dispensation probe 16, the first reagent dispensation probe 14 and the second reagent dispensation probe 15 for dispensing a test sample, a reagent and cleaning liquid into a reaction container 4; an agitator of an agitation unit 11 for agitating mixed liquid of the test sample and the reagent dispensed into the reaction container 4; a constant-temperature part 23 for setting the mixed liquid in the reaction container 4 at a measuring temperature; a measuring unit 13 for measuring the mixed liquid set at the measuring temperature; and a cleaning unit 12 for cleaning the reaction container 4 wherein the mixed liquid after measurement is stored. The cleaning liquid is set at a higher cleaning temperature than the measuring temperature by using the constant-temperature part 23, and thereby at least one among the reaction container 4, the sample dispensation probe 16, the first reagent dispensation probe 14, the second reagent dispensation probe 15 and the agitator of the agitation unit 11 is cleaned. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

  The present invention relates to an automatic analyzer for analyzing components of a test sample and a cleaning method thereof, and more particularly to an automatic analyzer for analyzing components contained in body fluids such as human serum and urine and a cleaning method thereof.

  As an automatic analyzer, a change in color caused by the reaction of a mixed solution obtained by dispensing a test sample and a reagent collected from a sample into a reaction container and mixing them is measured by measuring the amount of transmitted light. Devices for measuring the concentration and activity of various components (items) in a test sample are known.

  In this automatic analyzer, measurement of a measurement item selected according to an inspection is performed from among a large number of items that can be measured by setting analysis conditions for each test sample. The test sample and the reagent corresponding to the item are dispensed into the reaction container using the sample and the reagent dispensing probe, and the test sample and the reagent dispensed into the reaction container are mixed using the stirring bar. The mixed liquid is measured after being held at a measurement temperature for measurement through the reaction vessel using a constant temperature unit, and the sample and reagent dispensing probe in contact with the test sample and the reagent, and the liquid mixture The reaction vessel and the stirring bar that are in contact with each other are repeatedly used for the measurement.

  Therefore, in order to prevent cross-contamination between test samples, between reagents, and between mixed solutions, the sample and reagent dispensing probe and stirrer are generally used every time a test sample and reagent are dispensed, and each mixed solution is stirred. Cleaning is performed using normal temperature water, and when the inspection is completed, automatic cleaning is performed using a normal temperature cleaning solution. In order to prevent cross-contamination between the mixed liquids, the reaction container is generally cleaned by discharging and sucking a normal temperature cleaning liquid, water, etc. into the reaction container at the measurement temperature every time the measurement of the mixed liquid is completed. When the inspection is completed, the same cleaning as after the completion of the measurement or the automatic cleaning in which the cleaning liquid is put in the reaction container at the measurement temperature for a predetermined time is performed.

  However, in an automatic analyzer that measures a large number of test samples over many items, the sample and reagent dispensing probe, the stirrer, and the reaction vessel are washed during measurement and automatically washed during long-term use. Dirt that cannot be removed by accumulation alone accumulates, and there is a problem in that the cross-contamination between test samples, reagents, and mixed solutions is increased to adversely affect measurement results.

Therefore, in the sample and reagent dispensing probe, automatic analysis is provided with a high-temperature heating device that heats and cleans the cleaning liquid in the vicinity of the sample and reagent dispensing probe and in the pipe flow path leading to the sample and reagent dispensing probe. An apparatus is known (for example, refer to Patent Document 1).
Japanese Patent Laid-Open No. 11-94843

  However, in the automatic analyzer equipped with a high-temperature heating device, powerful washing of the sample and reagent dispensing probe can be performed, but the stirrer and reaction vessel are completely removed by normal washing such as automatic washing. There is a problem that dirt that cannot be completely accumulated accumulates and the cross-contamination between the mixed liquids at the time of measurement is increased to adversely affect the measurement result. In addition, it is necessary to provide a dedicated high-temperature heating apparatus, which causes a problem that the apparatus becomes large and costs increase.

  The present invention has been made to solve the above-described problems, and an object of the present invention is to provide an automatic analyzer capable of powerfully removing dirt with a simple configuration and a cleaning method thereof.

  In order to achieve the above object, the automatic analyzer of the present invention according to claim 1 includes a sample dispensing probe for dispensing a test sample into a reaction container and a reagent dispensing probe for dispensing a reagent into the reaction container. And a stirrer that stirs the mixed solution of the test sample and the reagent dispensed in the reaction container, and the mixed solution in the reaction container that is stirred by the stirrer through the reaction container. A temperature setting means for setting the measurement temperature, a measurement means for measuring the mixed solution set to the measurement temperature by the temperature setting means, a washing temperature higher than the measurement temperature, the reaction vessel, the sample It is characterized by comprising a high temperature washing control means for controlling the temperature setting means so as to wash at least one of the dispensing probe, the reagent dispensing probe, and the stirring bar.

  In addition, the automatic analyzer cleaning method of the present invention according to claim 8 dispenses a test sample into a reaction container using a sample dispensing probe, and dispenses the reagent into the reaction container using a reagent dispensing probe. The mixture of the test sample and the reagent dispensed in the reaction vessel is stirred using a stir bar, and the mixture in the reaction vessel stirred with the stir bar is set to the measurement temperature. Set, measure the mixed solution set to the measurement temperature, wash the reaction vessel containing the measured mixed solution, and then wash the reaction vessel at a washing temperature higher than the measurement temperature, At least one of the sample dispensing probe, the reagent dispensing probe, and the stirring bar is washed.

  According to the present invention, it is possible to strongly remove dirt that cannot be removed by normal cleaning with a simple configuration, and it is possible to improve the measurement accuracy of analysis data without being affected by cross contamination.

Hereinafter, an embodiment of an automatic analyzer according to the present invention will be described with reference to FIGS.
FIG. 1 is a block diagram showing a configuration of an automatic analyzer according to an embodiment of the present invention. The automatic analyzer 100 includes an analysis unit 19 that measures a test sample and a calibrator, an analysis control unit 30 that controls the measurement operation of the analysis unit 19, a high-temperature washing operation, and the analysis output from the analysis unit 19. Analytical data processing unit 40 for processing signals to calculate analytical data, output unit 50 for outputting analytical data from analytical data processing unit 40, and operation unit for inputting analytical conditions, high temperature cleaning conditions, various command signals, etc. 60 and a system control unit 70 that controls these units in an integrated manner.

  The analysis unit 19 includes a calibrator for each item, a sample unit 20 that handles a sample such as a test sample obtained from the subject, a reagent unit 21 that handles a reagent for chemically reacting with the sample, and a mixed solution of the sample and the reagent And a constant temperature unit 23 capable of raising the cleaning solution for cleaning the mixed solution and various units to a measurement temperature for measuring and a cleaning temperature for high-temperature cleaning. Yes.

  The analysis control unit 30 drives each unit included in the constant temperature unit 23 and a mechanism unit 31 including mechanisms that drive the units included in the sample unit 20, the reagent unit 21, and the reaction unit 22 of the analysis unit 19. And a control unit 32 that controls each mechanism of the mechanism unit 31.

  The analysis data processing unit 40 includes a calculation unit 41 that creates a calibration table, calculates analysis data, and the like from a calibrator signal output from the analysis unit 19 and an analysis signal, a calibration table created by the calculation unit 41, And a storage unit 42 for storing the calculated analysis data and the like.

  The calculation unit 41 creates a calibration table for each item from the calibrator signal for each item output from the analysis unit 19, outputs the calibration table to the output unit 50, and saves it in the storage unit 42. In addition, the calculation unit 41 reads out a calibration table corresponding to each analysis signal item output from the analysis unit 19 from the storage unit 42 and then uses the calibration table. The analysis data is calculated and output to the output unit 50 and stored in the storage unit 42.

  The storage unit 42 includes a hard disk and stores a calibration table, analysis data, and the like output from the calculation unit 41 for each test sample.

  The output unit 50 includes a printing unit 51 that prints and outputs a calibration table, analysis data, and the like output from the analysis data processing unit 40 and a display unit 52 that displays and outputs the calibration table. The printing unit 51 includes a printer and prints out the calibration table, analysis data, and the like output from the analysis data processing unit 40 on a printer sheet based on a preset format. The display unit 52 includes a monitor such as a CRT or a liquid crystal panel, and sets analysis conditions according to display of a calibration table, analysis data, and the like output from the analysis data processing unit 40 and instructions from the system control unit 60. A screen for setting a high temperature cleaning condition for cleaning the analyzer 19 at a high temperature.

The operation unit 60 includes input devices such as a keyboard, a mouse, a button, and a touch key panel, and sets analysis conditions, sets high temperature cleaning conditions, inputs subject information such as a subject ID and a subject name of a subject, Various operations such as selection of measurement items for each test sample of the subject, calibration operation of each item, test sample analysis operation, and the like are performed.
The system control unit 70 includes a CPU and a storage circuit (not shown), and stores information such as an operator command signal, analysis conditions, high temperature cleaning conditions, sample information, and measurement items for each sample to be supplied from the operation unit 60. After storing, based on these pieces of information, control for causing each unit constituting the analysis unit 19 to perform measurement operation in a predetermined sequence of a fixed cycle, control for causing each unit constituting the analysis unit 19 to perform high temperature cleaning operation, calibration table Control of the entire system, such as creation of data, control of calculation and output of analysis data.

Next, details of the analysis unit 19 and the analysis control unit 30 will be described with reference to FIGS.
FIG. 2 is a perspective view for explaining the configuration of the sample unit 20, the reagent unit 21, and the reaction unit 22 of the analysis unit 19.

  The sample unit 20 sucks a sample from the sample container 17 for storing a sample such as a test sample or a calibrator, a disk sampler 6 that rotatably holds the sample container 17, and the sample container 17 and discharges the sample to the reaction unit 22. A sample dispensing probe 16 and a sample dispensing arm 10 that holds the sample dispensing probe 16 so as to be able to rotate between the disk sampler 6 and the reaction unit 22 and to move up and down in the disk sampler 6 and the reaction unit 22 are provided. .

  The sample dispensing probe 16 finishes sucking the test sample from the same sample container 17 and includes a sample dispensing probe 16 in order to prevent cross-contamination between the test samples every time the test sample is sucked from the new sample container 17. The outer wall is cleaned.

  The reagent unit 21 includes a plurality of first reagents that react selectively with a sample, a plurality of second reagents that are paired with the first reagent, and reagent bottles 7a and 7b that store cleaning liquids, and reagent bottles 7a and 7b, respectively. The reagent racks 1a and 1b to be stored, the reagent storage 2 that rotatably holds the reagent rack 1a storing the reagent bottles 7a for the first reagent and the cleaning liquid, and the reagent bottles 7b for the second reagent and the cleaning liquid are stored. And a reagent storage 3 for rotatably holding the reagent rack 1b.

  The reagent unit 21 also includes a first reagent dispensing probe 14 that sucks the first and second reagents and the cleaning liquid from the reagent bottles 7a and 7b at the first and second reagent suction positions and discharges them to the reaction unit 22 and The second reagent dispensing probe 15 is rotated between the first and second reagent suction positions and the reaction unit 22, and the first reagent dispensing probe 14 and the second reagent dispensing probe 15 are rotated at the first and second reagent suction positions and the reaction unit 22. A first reagent dispensing arm 8 and a second reagent dispensing arm 9 that hold the two reagent dispensing probe 15 so as to move up and down are provided.

  The first reagent dispensing probe 14 and the second reagent dispensing probe 15 are cross-contaminated between the first and second reagents every time the first and second reagents are aspirated and discharged from the reagent bottles 7 of the reagent containers 2 and 3. The inner and outer walls are cleaned to prevent nation.

  The reaction unit 22 is configured such that the sample discharged from the sample dispensing probe 16 rotated from the disk sampler 6 of the sample unit 20 to the sample discharge position of the reaction unit 22, the first and second reagent suction positions of the reagent unit 21, and the reaction unit The reaction container 4 for storing the first reagent, the second reagent, and the cleaning liquid discharged by the first reagent probe 14 and the second reagent probe 15 rotated to the first and second reagent discharge positions of 22 are arranged on the circumference. Vertical movement having a reaction disk 5 for rotatably holding a plurality of reaction vessels 4 and a stirrer for stirring a mixed solution, a washing solution, etc. of the sample and reagent in the reaction vessel 4 stopped at the stirring position of the reaction unit 22 And a possible stirring unit 11.

  In addition, the reaction unit 22 irradiates the reaction container 4 moved to the photometric position containing the mixed liquid after stirring, and measures the absorbance at the set wavelength from the transmitted light. There are provided a washing nozzle for sucking, washing and drying the mixed solution after measurement of the reaction vessel 4 stopped at the position, and a washing unit 12 having a drying nozzle and movable up and down.

  Each time the measurement of the mixed solution is completed, the reaction container 4 is cleaned and dried by the cleaning unit 12 in order to prevent cross contamination between the mixed solutions, and used again for measurement.

  The photometric unit 13 irradiates the rotating reaction vessel 4 with light from the photometric position to measure the change in absorbance of the liquid mixture, and the analysis signal or calibration signal of the test sample or calibrator obtained from the measurement is analyzed. The data is output to the processing unit 40.

  In the stirring unit 11, the surface of the stirring bar is washed every time the mixed solution in the reaction vessel 4 is stirred to prevent cross contamination between the mixed solutions.

  FIG. 3 is a diagram for explaining the configuration of the constant temperature unit 23 of the analysis unit 19. The constant temperature unit 23 heats or cools the heat medium 81 that transfers heat to the reaction vessel 4 of the reaction unit 22, a thermostat 82 that keeps the temperature of the reaction vessel 4 and the heat medium 81 constant, and the heat medium 81. A constant temperature unit 83 for controlling the mixed liquid or the cleaning liquid in the reaction vessel 4 to the measurement temperature or the cleaning temperature, a position sensor 89 for detecting the position of the liquid surface of the heat medium 81 accommodated in the constant temperature bath 82, and an externally disposed unit. And a supply pump 90 for supplying the heat medium 81 into the thermostat 82.

  As the heat medium 81, water having a large specific heat and fluidity is used, and heat from the constant temperature unit 83 is transmitted to the mixed liquid or the cleaning liquid discharged into the reaction container 4 through the side surface and the bottom surface of the reaction container 4. To do.

  The constant temperature bath 82 forms a circular flow path whose upper side opens in accordance with the circular orbit of the reaction container 4 that rotates and moves, and the reaction container 4 is disposed in the flow path.

  The constant temperature unit 83 includes a cooler 84 that cools the heat medium 81, a heater 85 that heats the heat medium 81 from the cooler 84, and the heat medium 81 in the cooler 84, the heater 85, and the constant temperature bath 82. A circulation pump 86 for circulation, and the control unit 32 in the analysis control unit 30 based on a measurement instruction from the system control unit 70 or a high temperature washing instruction controls the mixed solution in the reaction vessel 4 at 37 ° C. at the time of measurement. The cleaning liquid in the reaction vessel 4 is raised to, for example, 70 to 80 ° C. and a cleaning temperature higher than the measurement temperature during high-temperature cleaning.

  The cooler 84 includes a cooling fin that cools the heat medium 81 and a fan that cools the cooling fin. Under the control of the control unit 32, the fan is turned when the heat medium 81 is higher than the measurement temperature or the cleaning temperature. Forcibly cool.

  The heater 85 includes a heater 87 that heats the heat medium 81 sent from the circulation pump 86, and a temperature sensor 88 that detects the temperature of the heat medium 81, and the temperature sensor 88 is a detected temperature in the heater 85. Is output to the control unit 32 as a temperature detection signal, and is heated by the heater 87 when the heat medium 81 is lower than the measured temperature or the cleaning temperature by the control of the control unit 32 based on the temperature detection signal from the temperature sensor 88.

  The circulation pump 86 sucks the heat medium 81 from the thermostat 82 and sends the sucked heat medium 81 to the cooler 84, the heater 85, the thermostat 82, and the like. In the thermostatic chamber 81, the heat medium 81 flows in the direction opposite to the rotation direction of the reaction vessel 4.

  The position sensor 89 that detects the position of the liquid surface of the heat medium 81 in the thermostat 82 outputs the position detection signal to the analysis control unit 30.

  When the position of the liquid level of the heat medium 81 in the thermostatic chamber 82 is lower than the normal height, the supply pump 90 has a normal height by the control of the control unit 32 based on the position detection signal from the position sensor 89. The external heat medium is supplied into the thermostat 82 until it becomes.

  Next, the configuration of the analysis control unit 30 will be described in detail. The mechanism unit 31 of the analysis control unit 30 rotates each of the disk sampler 6 and the reagent containers 2 and 3 of the analysis unit 19, rotates the reaction disk 5, the sample dispensing arm 10, the first reagent dispensing arm 8, and the second. A mechanism is provided for rotating and vertically moving the reagent dispensing arm 9 and vertically moving the stirring unit 11 and the washing unit 12.

  The mechanism unit 31 also includes a sample dispensing pump that sucks and discharges the sample via the sample dispensing probe 16, and first and second samples via the first reagent dispensing probe 14 and the second reagent dispensing probe 15. The first and second reagent pumps for sucking and discharging the reagent and the cleaning liquid, the suction of the mixed liquid and the cleaning liquid in the reaction container 4 through the plurality of cleaning nozzles of the cleaning unit 12, and the reaction container cleaning liquid for the reaction container 4 And a cleaning pump that discharges and sucks pure water, and a drying pump that sucks residual liquid after cleaning through a drying nozzle.

  Further, the mechanism unit 31 includes a mechanism for driving the stirring bar of the stirring unit 11.

  The control unit 32 includes a disk sampler 6, a reagent storage 2 and 3, a reaction disk 5, a sample dispensing arm 10, a first reagent dispensing arm 8, a second reagent dispensing arm 9, a stirring unit 11, a washing unit of the mechanism unit 31. A control circuit for controlling each mechanism such as the unit 12, the sample dispensing pump, the first and second reagent pumps, the washing pump, and the drying pump is provided.

  The control unit 32 also supplies the heater 87 of the constant temperature unit 23, the fan of the cooler 84, and the supply based on the temperature detection signal and the position detection signal output from the temperature sensor 88 and the position sensor 89 in the constant temperature unit 23 of the analysis unit 19. A control circuit for controlling the pump 90 is provided.

  Next, the high temperature cleaning operation of the automatic analyzer 100 will be described with reference to FIGS.

  FIG. 4 is a diagram showing an example of a screen for setting high temperature cleaning conditions. The high-temperature cleaning condition setting screen 53 includes a cleaning condition display area 54 that displays high-temperature cleaning conditions, and a setting area 55 for selecting and setting each high-temperature cleaning condition displayed in the cleaning condition display area 54. The cleaning condition setting screen display operation from the operation unit 60 is displayed on the display unit 52.

  In the cleaning condition display area 54, “cleaning of the reaction container” corresponding to the high temperature cleaning of the reaction container 4 of the analyzer 19, “cleaning of the sample dispensing probe” corresponding to the high temperature cleaning of the sample dispensing probe 16, “Cleaning of reagent dispensing probe” corresponding to high temperature cleaning of reagent dispensing probe 14 and second reagent dispensing probe 15, “Washing of stirring bar” corresponding to high temperature cleaning of stirring bar of stirring unit 11, and reaction container “Reaction container cleaning liquid filling and cleaning” corresponding to stronger high temperature cleaning than “Reaction container cleaning” of 4 is displayed.

  In the setting area 55, square frames 55a to 55e for selecting and setting the high temperature cleaning conditions are displayed. The “reaction container cleaning” and “sample dispensing probe cleaning” displayed in the cleaning condition display area 54, respectively. "," Reagent dispensing probe cleaning "," Stirr bar cleaning ", and" Reaction container cleaning liquid container cleaning ".

  Then, by the high temperature cleaning condition setting operation from the operation unit 60, the system control unit 70 displays “R” in the square frames 55 a to 55 e of the setting area 55 of the high temperature cleaning condition setting screen 53 in the display unit 52. Save the selected high temperature cleaning conditions in the internal memory circuit.

  FIG. 5 is a flowchart showing the high temperature cleaning operation of the automatic analyzer 100 corresponding to each high temperature cleaning condition on the high temperature cleaning condition setting screen 53 displayed on the display unit 52.

  Each step of the high temperature cleaning operation shown in FIGS. 5A, 5B, 5C, 5D, and 5E includes square frames 55a and 55b in the setting area 55 of the high temperature cleaning condition setting screen 53, respectively. This is executed by selecting and setting 55c, 55d, and 55e.

  FIG. 5A corresponds to the high temperature cleaning operation of the reaction vessel 4, the cleaning temperature setting step S <b> 1 until the heat medium 81 in the thermostat 82 of the analysis unit 19 is raised to the cleaning temperature, and the temperature of the reaction vessel 4 to the cleaning temperature. It is comprised from reaction container washing | cleaning process S10 which carries out high temperature washing | cleaning in this state.

  FIG. 5B corresponds to the high-temperature cleaning operation of the sample dispensing probe 16, and includes a cleaning temperature setting step S1 and a sample dispensing probe cleaning step S20 that performs high-temperature cleaning of the sample dispensing probe 16 using a cleaning liquid at the cleaning temperature. Consists of

  FIG. 5C corresponds to the high temperature washing operation of the first reagent dispensing probe 14 and the second reagent dispensing probe 15, and the washing temperature setting step S1, the first reagent dispensing probe 14 and the second reagent dispensing. It comprises a reagent dispensing probe cleaning step S30 for cleaning the probe 15 at a high temperature using a cleaning liquid at a cleaning liquid temperature.

  FIG. 5D corresponds to the high temperature cleaning operation of the stirrer of the stirring unit 11, the cleaning temperature setting step S <b> 1, and the stirrer cleaning step S <b> 40 for cleaning the stirrer of the stirring unit 11 at a high temperature using the cleaning liquid at the cleaning temperature. Consists of

  FIG. 5 (e) corresponds to a high-temperature cleaning operation by adding a cleaning liquid into the reaction container 4, and a cleaning temperature setting step S1 and a reaction container that performs high-temperature cleaning with a cleaning liquid that has been brought into the reaction container 4 to reach the cleaning temperature. It is comprised from washing | cleaning liquid addition washing | cleaning process S50.

  FIG. 6 is a flowchart showing details of the high temperature cleaning operation of the reaction vessel 4. The operation unit 60 is operated in advance to select and set within the rectangular frame 55a from the high temperature cleaning condition setting screen 53 of the display unit 52, and the automatic analyzer 100 starts a high temperature cleaning operation by a high temperature cleaning start operation (step S0). ).

  First, in the cleaning temperature setting step S <b> 1, in response to a high temperature cleaning instruction from the system control unit 70 to the control unit 32 of the analysis control unit 30, the control unit 32 controls the liquid level from the position sensor 89 in the constant temperature unit 23 of the analysis unit 19. It is determined from the detection signal whether or not the liquid level of the heat medium 81 in the thermostat 82 has a normal height (step S2).

  And when the liquid level of the heat medium 81 in the thermostat 82 is a normal height (Yes of step S2), the control part 32 adds the heat medium 81 in the thermostat 82 to the heater 87 of the thermostat 23. Is raised to the washing temperature (step S4).

  When the liquid level of the heat medium 81 in the thermostat 82 is lower than the normal level (No in step S2), the control unit 32 sets the liquid level to the normal level in the supply pump 90 of the thermostat 23. Until the heat medium 81 is supplied into the thermostat 82 (step S3). Thereafter, the process proceeds to step S4.

  In the reaction container cleaning step S10 that is performed after the cleaning temperature setting step S1, the control unit 32 drives the drive mechanism of each unit such as the mechanism of the cleaning unit 12 of the mechanism unit 31, the cleaning pump, and the drying pump, and the reaction unit The reaction vessel 4 at the washing / drying position 22 is washed at a high temperature (step S11). And the drive mechanism of the reaction disk 5 of the mechanism part 31 is driven, and the reaction container 4 which finished high temperature washing | cleaning is rotated (1 pitch) to the position of the adjacent reaction container 4 of a rotation direction.

  If the reaction container 4 at the washing / drying position is not washed at high temperature (No in step S12), the process returns to step S11. If the reaction container 4 at the washing / drying position has been washed at a high temperature (Yes in step S12), the reaction container washing step S10 ends. Upon completion of the reaction container cleaning step S10, the system control unit 70 instructs the control unit 32 to stop the high temperature cleaning operation by the unit drive mechanisms of the mechanism unit 31 and the constant temperature unit 23 (step S100).

  By the high-temperature cleaning of the reaction vessel 4 using the above-described cleaning unit 12, the oil and fat component, which is one component of the soil, dissolves or the viscosity of the soil decreases, making it easy to move and remove. Due to the action of making it easier to separate the dirt, the dirt attached to the inner wall of the reaction vessel 4 can be strongly removed.

  FIG. 7 is a flowchart showing details of the high-temperature cleaning operation of the sample dispensing probe 16. The sample dispensing probe 16 is cleaned at a high temperature by operating the operation unit 60 in advance and selecting and setting it within the rectangular frame 55b from the high temperature cleaning condition setting screen 53 of the display unit 52. In addition, description is abbreviate | omitted about the process mentioned above.

  In the sample dispensing probe cleaning step S20 performed subsequent to the cleaning temperature setting step S1, first, the control unit 32 includes each unit drive mechanism such as the cleaning unit 12 of the mechanism unit 31 and the drive mechanism of the reaction disk 5, the cleaning pump, and the drying pump. And the L reaction containers 4 for high-temperature cleaning of the sample dispensing probe 16 are cleaned at a high temperature using the cleaning unit 12 (step S21).

  Next, the control unit 32 drives the drive mechanism of the reaction disk 5 of the mechanism unit 31 to rotate and move the reaction container 4 after the high temperature cleaning to the first reagent discharge position of the reaction unit 22, and then the mechanism unit 31. The reagent storage 2 and the mechanism of the first reagent dispensing arm 8 and the first reagent pump store cleaning liquids according to applications such as an alkaline detergent and a detergent containing a surfactant disposed in the reagent storage 2, for example. The cleaning liquid is sucked from the reagent bottle 7 and discharged into the reaction container 4 at the first reagent discharge position. This operation is repeated L times, and the cleaning liquid is discharged into the L reaction containers 4 that have finished the high-temperature cleaning (step S22).

  After a predetermined time after the cleaning liquid in the L reaction containers 4 reaches the cleaning temperature, the control unit 32 drives the drive mechanism of the reaction disk 5 of the mechanism unit 31 to place the reaction container 4 containing the cleaning liquid in the reaction unit 22. The sample is rotated to the sample discharge position (step S23). Next, the mechanism of the sample dispensing arm 10 of the mechanism unit 31 and the sample dispensing pump are driven, and the cleaning liquid is sucked and discharged a plurality of times while the sample dispensing probe 16 is immersed in the cleaning liquid in the reaction vessel 4 to increase the temperature. Cleaning is performed (step S24).

  If the high temperature cleaning of the sample dispensing probe 16 has not reached L high temperature cleanings using the cleaning liquid of the L reaction containers 4 (No in step S25), the process returns to step S23. In addition, when the high temperature cleaning of the sample dispensing probe 16 is completed L times of high temperature cleaning using the cleaning liquid of the L reaction containers 4 (Yes in step S25), the sample dispensing probe cleaning step S20 is completed.

  By the high-temperature cleaning of the sample dispensing probe 16 using the cleaning liquid having the above-described cleaning temperature, the dirt attached to the inner and outer walls of the sample dispensing probe 16 can be strongly removed by the same action as the high-temperature cleaning of the reaction vessel 4. .

  FIG. 8 is a flowchart showing details of the high-temperature cleaning operation of the first reagent dispensing probe 14 and the second reagent dispensing probe 15. The first reagent dispensing probe 14 and the second reagent dispensing probe 15 are washed at a high temperature by operating the operation unit 60 in advance and selecting and setting within the rectangular frame 55c from the high temperature washing condition setting screen 53 of the display unit 52. Is done. In addition, description is abbreviate | omitted about the process mentioned above.

  In the reagent dispensing probe cleaning step S30 performed subsequent to the cleaning temperature setting step S1, the control unit 32 drives the cleaning unit 12 of the mechanism unit 31 and each drive mechanism of the reaction disk 5, and each unit of the cleaning pump and the drying pump. The drive mechanism is driven, and the 2M reaction vessels 4 for high temperature cleaning of the first reagent dispensing probe 14 and the second reagent dispensing probe 15 are washed at a high temperature using the washing unit 11 (step S31).

  Next, the control unit 32 drives the drive mechanism of the reaction disk 5 of the mechanism unit 31 to rotate and move the reaction container 4 that has finished the high temperature cleaning to the first and second reagent discharge positions of the reaction unit 22, The respective drive mechanisms of the reagent storages 2 and 3 of the mechanism unit 31, the drive mechanisms of the first reagent dispensing arm 8 and the second reagent dispensing arm 9, and the first and second reagent pumps are driven, thereby the reagent storage. The cleaning liquid is aspirated from the reagent bottle 7 containing the cleaning liquid arranged in 2 and 3, and is discharged into the reaction container 4 at the first and second reagent discharge positions. This operation is repeated M times, and the cleaning liquid is discharged into 2M reaction containers 4 that have finished the high temperature cleaning (step S32).

  After a predetermined time when the cleaning liquid in the 2M reaction containers 4 reaches the cleaning temperature, the control unit 32 drives the drive mechanism of the reaction disk 5 of the mechanism unit 31 to place the reaction container 4 containing the cleaning liquid in the reaction unit 22. Rotate and move to the first and second reagent discharge positions (step S33). Next, the driving mechanism of the first reagent dispensing arm 8 and the second reagent dispensing arm 9 and the first and second reagent pumps of the mechanism unit 31 are driven, and the first reagent dispensing probe 14 and the second reagent dispensing are driven. The high temperature cleaning is performed by sucking and discharging the cleaning liquid a plurality of times while the probe 15 is immersed in the cleaning liquid in the reaction vessel 4 (step S34).

  Then, when the high temperature cleaning of the first reagent dispensing probe 14 and the second reagent dispensing probe 15 has not reached M high temperature cleaning using the cleaning liquid of the 2M reaction containers 4 (No in step S35), The process returns to step S33. In addition, when the high temperature cleaning of the first reagent dispensing probe 14 and the second reagent dispensing probe 15 has completed M times of high temperature cleaning using the cleaning liquid of the 2M reaction containers 4 (Yes in step S35), the reagent Dispensing probe cleaning step S30 ends.

  By the high temperature washing of the first reagent dispensing probe 14 and the second reagent dispensing probe 15 using the washing liquid having the above washing temperature, the first reagent dispensing probe 14 and the second reagent dispensing probe 14 are operated in the same manner as the high temperature washing of the reaction vessel 4. The dirt adhering to the inner and outer walls of the two-agent dispensing probe 15 can be strongly removed.

  FIG. 9 is a flowchart showing details of the high temperature cleaning operation of the stirring bar of the stirring unit 11. By operating the operation unit 60 in advance and selecting and setting within the rectangular frame 55d from the high temperature cleaning condition setting screen 53 of the display unit 52, the high temperature cleaning of the stirrer is performed. In addition, description is abbreviate | omitted about the process mentioned above.

  In the stirrer cleaning step S40 performed subsequent to the cleaning temperature setting step S1, the control unit 32 drives the cleaning unit 12 of the mechanism unit 31 and the drive mechanism of the reaction disk 5, and sets the unit drive mechanisms of the cleaning pump and the drying pump. The N reaction vessels 4 for high temperature cleaning of the stirrer are driven to perform high temperature cleaning using the cleaning unit 11 (step S41).

  Next, the control unit 32 drives the drive mechanism of the reaction disk 5 of the mechanism unit 31 to rotate and move the reaction container 4 after the high temperature cleaning to the first reagent discharge position of the reaction unit 22, and then the mechanism unit 31. The drive mechanism of the reagent storage 2 and the first reagent dispensing arm 8 and the first reagent pump are driven, and the cleaning liquid is aspirated from the reagent bottle 7 containing the cleaning liquid disposed in the reagent storage 2, and the first reagent Discharge into the reaction container 4 at the discharge position. This operation is repeated N times, and the cleaning liquid is discharged into the N reaction containers 4 that have finished the high-temperature cleaning (step S42).

  After a predetermined time when the cleaning liquid in the N reaction vessels 4 reaches the cleaning temperature, the control unit 32 drives the drive mechanism of the reaction disk 5 of the mechanism unit 31 to place the reaction vessel 4 containing the cleaning liquid in the reaction unit 22. Rotate to the stirring position (step S43). Next, each drive mechanism of the stirring unit 11 of the mechanism unit 31 is driven to perform a high temperature cleaning by performing a stirring operation in a state where the stirring bar is immersed in the cleaning liquid in the reaction vessel 4 (step S44).

  If the high temperature cleaning of the stirring bar of the stirring unit 11 has not reached N high temperature cleanings using the cleaning liquid of the N reaction containers 4 (No in step S45), the process returns to step S43. Further, when the high temperature cleaning of the stirrer has completed N times of high temperature cleaning using the cleaning liquid of the N reaction containers 4 (Yes in step S45), the stirrer cleaning step S40 ends.

  By the high temperature cleaning operation of the stirring bar of the stirring unit 11 using the cleaning liquid having the above cleaning temperature, the dirt attached to the surface of the stirring bar can be strongly removed by the same action as the high temperature cleaning of the reaction vessel 4.

  FIG. 10 is a flowchart showing details of the high-temperature cleaning operation by putting the cleaning liquid into the reaction vessel 4. By operating the operation unit 60 in advance and selecting and setting in the rectangular frame 55e from the high temperature cleaning condition setting screen 53 of the display unit 52, high temperature cleaning is performed by adding a cleaning liquid into the reaction vessel 4. In addition, description is abbreviate | omitted about the process mentioned above.

  In the reaction container cleaning liquid addition cleaning step S50 performed subsequent to the cleaning temperature setting step S1, the control unit 32 includes the cleaning unit 12 of the mechanism unit 31 and each drive mechanism of the reaction disk 5, each unit drive mechanism of the cleaning pump, and the drying pump. The reaction vessel 4 that is driven and stopped at the cleaning / drying position of the reaction unit 22 is subjected to high-temperature cleaning using the cleaning unit 11 (step S51).

  Next, the control part 32 drives the drive mechanism of the reaction disk 5 of the mechanism part 31, and moves the reaction container 4 which finished high temperature washing | cleaning 1 pitch. When the reaction vessel 4 that has been cleaned at a high temperature stops at the first or second reagent discharge position of the reaction unit 22, the reagent container 2 or 3, the first reagent dispensing arm 8, or the second reagent of the mechanism unit 31. The driving mechanism of the dispensing arm 9 and the driving mechanism of the first or second reagent pump are driven to suck the cleaning liquid from the reagent bottle 7 containing the cleaning liquid arranged in the reagent storage 2 or 3, It is made to discharge to the reaction container 4 of a 2nd reagent discharge position (step S52).

  Then, after the same operation is repeated and the washing liquid is completely put into all the reaction containers 4, the control unit 32 puts the washing liquid into the reaction container 4 and keeps the washing temperature at a washing temperature, for example, for a predetermined time of 5 to 15 minutes. High temperature cleaning is performed (step S53).

  After the predetermined time has elapsed, the control unit 32 drives the cleaning unit 12 of the mechanism unit 31 and the driving mechanisms of the reaction disk 5, the driving units of the cleaning pump, and the drying pump, so that all the reaction containers are supplied to the cleaning unit 12. The cleaning liquid is sucked from 4 and is washed at a high temperature (step S54). Then, when the high temperature cleaning of all the reaction containers 4 is completed, the reaction container cleaning liquid addition cleaning step S50 is completed.

  Due to the high temperature cleaning by adding the cleaning liquid into the reaction vessel 4 as described above, the inner wall of the reaction vessel 4 is stronger than the high temperature cleaning by the high temperature cleaning operation of the reaction vessel 4 shown in FIG. Dirt adhered to can be removed.

  According to the embodiment of the present invention described above, using the constant temperature portion 23 for maintaining the mixed solution of the test sample and the reagent at the measurement temperature, the cleaning liquid raised to the cleaning temperature higher than the measurement temperature is used. By washing the reaction vessel 4, the sample dispensing probe, the first reagent dispensing probe, the second reagent dispensing probe, the stirrer of the stirring unit 11 and the like at a high temperature, dirt attached to these units can be washed off strongly. As a result, the measurement accuracy of the analysis data can be improved.

  The present invention is not limited to the above embodiment, and a plurality of cleaning conditions are selected and set from the high temperature cleaning condition setting screen 53 of the display unit 52, and the reaction container 4, the sample dispensing probe 16, and the first reagent are selected. A plurality of units among the dispensing probe 14, the second reagent dispensing probe 15, and the stirring bar of the stirring unit 11 may be washed at a high temperature.

  In this way, by selecting and setting a plurality of units at the same time and performing high-temperature cleaning, it is possible to reduce the number of common cleaning steps and shorten the cleaning time, compared to selecting and setting each unit individually and performing high-temperature cleaning. .

  In addition, a washing liquid dispensing unit for dispensing the washing liquid is provided in the reaction unit 22, and the reaction container 4, the sample dispensing probe 16, the first reagent dispensing probe 14, the second reagent dispensing probe 15, and the stirring unit 11 are stirred. A cleaning liquid for high-temperature cleaning of the child may be dispensed into the reaction vessel 4 from the cleaning liquid dispensing unit.

The block diagram which shows the structure of the automatic analyzer which concerns on the Example of this invention. The figure which shows the structure of the analysis part which concerns on the Example of this invention. The figure which shows the structure of the thermostat based on the Example of this invention. The figure which shows an example of the high temperature washing condition setting screen which concerns on the Example of this invention. The figure which shows the high temperature washing process which concerns on the Example of this invention. The flowchart which shows the high temperature washing | cleaning operation | movement of the reaction container which concerns on the Example of this invention. The flowchart which shows the high temperature washing | cleaning operation | movement of the sample dispensing probe which concerns on the Example of this invention. The flowchart which shows the high temperature washing | cleaning operation | movement of the reagent dispensing probe which concerns on the Example of this invention. The flowchart which shows the high temperature washing operation | movement of the stirring element which concerns on the Example of this invention. The flowchart which shows the washing | cleaning liquid addition high temperature washing | cleaning operation | movement of the reaction container concerning the Example of this invention.

Explanation of symbols

DESCRIPTION OF SYMBOLS 19 Analysis part 20 Sample part 21 Reagent part 22 Reaction part 23 Constant temperature part 30 Analysis control part 31 Mechanism part 32 Control part 40 Analysis data processing part 41 Operation part 42 Storage part 50 Output part 51 Printing part 52 Display part 60 Operation part 70 System Control unit 100 Automatic analyzer

Claims (8)

A sample dispensing probe for dispensing a test sample into a reaction vessel;
A reagent dispensing probe for dispensing a reagent into the reaction vessel;
A stir bar for stirring the mixed solution of the test sample and the reagent dispensed in the reaction container;
Temperature setting means for setting the mixed liquid in the reaction vessel stirred by the stirring bar to a measurement temperature via the reaction vessel;
Measuring means for measuring the mixed liquid set at the measurement temperature by the temperature setting means;
High temperature cleaning control for controlling the temperature setting means to clean at least one of the reaction vessel, the sample dispensing probe, the reagent dispensing probe, and the stirring bar at a cleaning temperature higher than the measurement temperature. And an automatic analyzer. A washing unit for washing the reaction vessel containing the mixed solution measured by the measuring means at a predetermined cycle at the measurement temperature set by the temperature setting means;
2. The automatic analyzer according to claim 1, wherein the high temperature cleaning means is configured to clean the reaction container using the cleaning unit.   The said temperature setting means has a heat medium which transmits heat to the said reaction container, and a constant temperature unit which sets the temperature of this heat medium to the said measurement temperature and the said washing | cleaning temperature, It is characterized by the above-mentioned. Automatic analyzer.   The high temperature cleaning means sets the cleaning liquid dispensed in the reaction vessel to the cleaning temperature by the temperature setting means, and sucks the cleaning liquid set to the cleaning temperature into the sample dispensing probe to perform high temperature cleaning. The automatic analyzer according to claim 1, wherein:   The high temperature washing means sets the washing liquid dispensed in the reaction vessel to the washing temperature by the temperature setting means, and sucks the washing liquid set to the washing temperature into the reagent dispensing probe to perform high temperature washing. The automatic analyzer according to claim 1, wherein:   The high temperature cleaning means sets the cleaning liquid dispensed in the reaction container to the cleaning temperature by the temperature setting means, and the stirrer is placed in the reaction container in which the cleaning liquid set to the cleaning temperature is dispensed. The automatic analyzer according to claim 1, wherein high temperature cleaning is performed by putting   The high temperature cleaning means sets the cleaning liquid dispensed in the reaction container to the cleaning temperature by the temperature setting means, and then holds the cleaning time in the reaction container to perform high temperature cleaning. The automatic analyzer according to claim 1. Dispense the test sample into the reaction vessel using the sample dispensing probe,
Dispense the reagent into the reaction container using a reagent dispensing probe,
Stir the mixed solution of the test sample and the reagent dispensed in the reaction vessel using a stir bar,
Setting the mixed solution in the reaction vessel stirred by the stir bar to a measurement temperature;
Measure the mixture set at the measurement temperature,
After washing the reaction vessel containing the measured mixture,
A cleaning method for an automatic analyzer, wherein at least one of the reaction vessel, the sample dispensing probe, the reagent dispensing probe, and the stirrer is washed at a washing temperature higher than the measurement temperature.

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