JP2006308483A - 多層膜及び多層膜の製造方法 - Google Patents

多層膜及び多層膜の製造方法 Download PDF

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Publication number
JP2006308483A
JP2006308483A JP2005132963A JP2005132963A JP2006308483A JP 2006308483 A JP2006308483 A JP 2006308483A JP 2005132963 A JP2005132963 A JP 2005132963A JP 2005132963 A JP2005132963 A JP 2005132963A JP 2006308483 A JP2006308483 A JP 2006308483A
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Japan
Prior art keywords
layer
multilayer film
multilayer
soft
film
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Pending
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JP2005132963A
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Japanese (ja)
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JP2006308483A5 (https=
Inventor
Takayuki Miura
隆幸 三浦
Kenji Ando
謙二 安藤
Hidehiro Kanazawa
秀宏 金沢
Koji Teranishi
康治 寺西
Takako Imai
香子 今井
Kazue Takada
和枝 高田
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Canon Inc
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Canon Inc
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Priority to JP2005132963A priority Critical patent/JP2006308483A/ja
Publication of JP2006308483A publication Critical patent/JP2006308483A/ja
Publication of JP2006308483A5 publication Critical patent/JP2006308483A5/ja
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  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2005132963A 2005-04-28 2005-04-28 多層膜及び多層膜の製造方法 Pending JP2006308483A (ja)

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JP2005132963A JP2006308483A (ja) 2005-04-28 2005-04-28 多層膜及び多層膜の製造方法

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JP2005132963A JP2006308483A (ja) 2005-04-28 2005-04-28 多層膜及び多層膜の製造方法

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JP2006308483A true JP2006308483A (ja) 2006-11-09
JP2006308483A5 JP2006308483A5 (https=) 2008-06-19

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010518594A (ja) * 2007-02-05 2010-05-27 カール・ツァイス・エスエムティー・アーゲー 第１および第２付加中間層を備えるｅｕｖリソグラフィ装置用多層反射光学素子
DE102011090192A1 (de) 2011-01-01 2012-07-05 Canon K. K. Spiegel, Verfahren zu dessen Herstellung, Belichtungsgerät, und Vorrichtungsherstellungsverfahren
CN111752085A (zh) * 2019-03-27 2020-10-09 Hoya株式会社 带多层反射膜的基板、反射型掩模坯料及反射型掩模、以及半导体装置的制造方法

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0253001A (ja) * 1988-08-17 1990-02-22 Canon Inc 軟ｘ線又は真空紫外線用多層膜の製造方法ならびに光学素子
JPH02242201A (ja) * 1989-03-16 1990-09-26 Canon Inc 軟ｘ線・真空紫外線用多層膜反射鏡
JPH03274001A (ja) * 1990-03-24 1991-12-05 Seiko Epson Corp Ｘ線反射膜
JPH06273605A (ja) * 1993-01-05 1994-09-30 American Teleph & Telegr Co <Att> 光学素子修復方法
JPH09230098A (ja) * 1996-02-21 1997-09-05 Nippon Telegr & Teleph Corp <Ntt> 多層膜ｘ線反射鏡
WO2001041155A1 (en) * 1999-11-29 2001-06-07 Tohoku Techno Arch Co., Ltd. Optical element such as multilayer film reflection mirror, production method therefor and device using it
JP2001183499A (ja) * 1999-12-22 2001-07-06 Rigaku Industrial Co Ｘ線分光素子およびそれを用いた蛍光ｘ線分析装置
JP2004532413A (ja) * 2001-05-01 2004-10-21 ザ・リージェンツ・オブ・ジ・ユニバーシティ・オブ・カリフォルニア 極値紫外線リソグラフィー（ｅｕｖｌ）の多層構造

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0253001A (ja) * 1988-08-17 1990-02-22 Canon Inc 軟ｘ線又は真空紫外線用多層膜の製造方法ならびに光学素子
JPH02242201A (ja) * 1989-03-16 1990-09-26 Canon Inc 軟ｘ線・真空紫外線用多層膜反射鏡
JPH03274001A (ja) * 1990-03-24 1991-12-05 Seiko Epson Corp Ｘ線反射膜
JPH06273605A (ja) * 1993-01-05 1994-09-30 American Teleph & Telegr Co <Att> 光学素子修復方法
JPH09230098A (ja) * 1996-02-21 1997-09-05 Nippon Telegr & Teleph Corp <Ntt> 多層膜ｘ線反射鏡
WO2001041155A1 (en) * 1999-11-29 2001-06-07 Tohoku Techno Arch Co., Ltd. Optical element such as multilayer film reflection mirror, production method therefor and device using it
JP2001183499A (ja) * 1999-12-22 2001-07-06 Rigaku Industrial Co Ｘ線分光素子およびそれを用いた蛍光ｘ線分析装置
JP2004532413A (ja) * 2001-05-01 2004-10-21 ザ・リージェンツ・オブ・ジ・ユニバーシティ・オブ・カリフォルニア 極値紫外線リソグラフィー（ｅｕｖｌ）の多層構造

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010518594A (ja) * 2007-02-05 2010-05-27 カール・ツァイス・エスエムティー・アーゲー 第１および第２付加中間層を備えるｅｕｖリソグラフィ装置用多層反射光学素子
JP2013219383A (ja) * 2007-02-05 2013-10-24 Carl Zeiss Smt Gmbh 第１および第２付加中間層を備えるｅｕｖリソグラフィ装置用多層反射光学素子
TWI427334B (zh) * 2007-02-05 2014-02-21 Zeiss Carl Smt Gmbh Ｅｕｖ蝕刻裝置反射光學元件
DE102011090192A1 (de) 2011-01-01 2012-07-05 Canon K. K. Spiegel, Verfahren zu dessen Herstellung, Belichtungsgerät, und Vorrichtungsherstellungsverfahren
US9063277B2 (en) 2011-01-01 2015-06-23 Canon Kabushiki Kaisha Mirror, method of manufacturing the same, exposure apparatus, and device manufacturing method
DE102011090192B4 (de) 2011-01-01 2020-07-30 Canon K. K. Spiegel, Verfahren zu dessen Herstellung, Belichtungsgerät und Vorrichtungsherstellungsverfahren
CN111752085A (zh) * 2019-03-27 2020-10-09 Hoya株式会社 带多层反射膜的基板、反射型掩模坯料及反射型掩模、以及半导体装置的制造方法

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