JP2006278316A5 - - Google Patents

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Publication number
JP2006278316A5
JP2006278316A5 JP2006025000A JP2006025000A JP2006278316A5 JP 2006278316 A5 JP2006278316 A5 JP 2006278316A5 JP 2006025000 A JP2006025000 A JP 2006025000A JP 2006025000 A JP2006025000 A JP 2006025000A JP 2006278316 A5 JP2006278316 A5 JP 2006278316A5
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JP
Japan
Prior art keywords
workpiece
pivot
ion beam
axis
arm
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2006025000A
Other languages
English (en)
Japanese (ja)
Other versions
JP2006278316A (ja
Filing date
Publication date
Priority claimed from US11/049,264 external-priority patent/US7057192B2/en
Application filed filed Critical
Publication of JP2006278316A publication Critical patent/JP2006278316A/ja
Publication of JP2006278316A5 publication Critical patent/JP2006278316A5/ja
Pending legal-status Critical Current

Links

JP2006025000A 2005-02-02 2006-02-01 リボンビームで半導体ウエハのシリーズ処理するための放射走査アーム及びコリメータ Pending JP2006278316A (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/049,264 US7057192B2 (en) 2004-02-06 2005-02-02 Radial scan arm and collimator for serial processing of semiconductor wafers with ribbon beams

Publications (2)

Publication Number Publication Date
JP2006278316A JP2006278316A (ja) 2006-10-12
JP2006278316A5 true JP2006278316A5 (zh) 2006-11-24

Family

ID=37212834

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006025000A Pending JP2006278316A (ja) 2005-02-02 2006-02-01 リボンビームで半導体ウエハのシリーズ処理するための放射走査アーム及びコリメータ

Country Status (1)

Country Link
JP (1) JP2006278316A (zh)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080116390A1 (en) * 2006-11-17 2008-05-22 Pyramid Technical Consultants, Inc. Delivery of a Charged Particle Beam
JP2009081032A (ja) * 2007-09-26 2009-04-16 Axcelis Technologies Inc リボン形ビームを用いたイオン注入クラスターツール
JP4471009B2 (ja) * 2008-02-12 2010-06-02 日新イオン機器株式会社 イオン注入方法およびイオン注入装置
US9437392B2 (en) 2011-11-02 2016-09-06 Varian Semiconductor Equipment Associates, Inc. High-throughput ion implanter
CN115763310B (zh) * 2022-11-16 2023-06-30 浙江鑫钰新材料有限公司 一种离子注入装置及方法

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