JP2006276358A - Liquid crystal apparatus and electronic equipment - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a structure wherein an alignment defect is hardly generated, in a vertical alignment type liquid crystal apparatus. <P>SOLUTION: The liquid crystal apparatus includes an element substrate having a scanning line 9 and a data line 13 extended in directions crossing each other and a pixel electrode 31 electrically connected to the data line 13 via a thin film diode 40, a counter substrate having a counter electrode opposed to the pixel electrode 31 and a liquid crystal layer interposed between the element substrate and the counter substrate. The liquid crystal layer is composed of a liquid crystal vertically aligned in its initial alignment state and having negative dielectric anisotropy, the pixel electrode 31 is provided on the scanning line 9 via an insulating film, a holding capacitance 5 is formed in an overlapping part where the pixel electrode 31 two-dimensionally overlaps with the scanning line 9 and an electrode slit 31H provided by removing a portion of the pixel electrode 31 is formed in the overlapping part. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

  The present invention relates to a liquid crystal device and an electronic apparatus using a thin film diode (TFD) as a pixel switching element.

In recent years, liquid crystal devices have been used as image display means for electronic devices such as computers and mobile phones. In general, a liquid crystal layer made of TN (twisted nematic) liquid crystal or the like is sandwiched between a pair of substrates. Has been applied. However, since this type of liquid crystal device has a problem that the viewing angle is narrow, recently, a liquid crystal device of a vertical alignment mode (VA mode) having a wide viewing angle has been used.
On the other hand, as an active matrix type liquid crystal device, a liquid crystal device using a thin film diode having a first conductive film / insulating film / second conductive film laminated structure (MIM structure) as a pixel switching element is known. The non-linear element having the above structure is effective in reducing the cost of the liquid crystal device because a high manufacturing yield is obtained and it can be manufactured at low cost. In addition, this type of liquid crystal device is also known as a storage capacitor addressed diode type liquid crystal device (SCAD type liquid crystal device) whose driving characteristics are improved by introducing a storage capacitor (see Patent Document 1).
Therefore, by combining these methods, a liquid crystal device with high display quality can be provided at low cost.
Japanese Patent Laid-Open No. 62-134628

In the VA mode, it is necessary to control the direction in which the liquid crystal is tilted by the voltage by some method. In other words, when the VA mode is adopted, a negative type liquid crystal is generally used. However, since the liquid crystal molecules in the initial alignment state are standing perpendicular to the substrate surface by voltage application, nothing is devised. Otherwise, the direction in which the liquid crystal molecules are tilted cannot be controlled, resulting in disorder of alignment (disclination), resulting in display defects such as light leakage, and deteriorated display characteristics.
The present invention has been made to solve the above-described problems, and includes a vertical alignment type liquid crystal device which controls the direction in which liquid crystal molecules are tilted when a voltage is applied and hardly causes alignment failure, and such a liquid crystal device. An object is to provide an electronic device with high display quality.

In order to solve the above problems, a liquid crystal device according to the present invention includes a scanning line and a data line extending in a direction intersecting each other, and a pixel electrode electrically connected to the data line via a thin film diode. A first substrate; a second substrate having a counter electrode facing the pixel electrode; and a liquid crystal layer sandwiched between the first substrate and the second substrate, wherein the liquid crystal layer is in an initial alignment state The pixel electrode is provided on the scanning line via an insulating film, and a storage capacitor is formed in a portion overlapping the scanning line in a plane. On the other hand, the overlapping portion is provided with an electrode slit formed by removing a part of the pixel electrode.
According to this configuration, since the electrode slit is provided in the pixel electrode, the alignment direction of the liquid crystal can be controlled by the lateral electric field generated at the edge portion of the electrode slit. This lateral electric field includes both those generated by the electric field between the pixel electrode and the counter electrode, and those generated by the electric field between the pixel electrode and the scanning line. Since the distance between the scanning line and the scanning line is short, the alignment control power is very large.

In the present invention, the scanning line may be formed such that a portion overlapping the pixel electrode in plan view is formed wider than the other portions.
According to this configuration, since the storage capacitance between the pixel electrode and the scanning line is increased, more stable driving characteristics can be obtained.

In the present invention, a plurality of electrode slits may be provided.
According to this configuration, it is possible to provide a liquid crystal device with more excellent alignment.

An electronic apparatus according to the present invention includes the above-described liquid crystal device according to the present invention.
According to this configuration, an electronic device having good display characteristics can be provided.

  Embodiments according to the present invention will be described below with reference to the drawings. In addition, in each figure, in order to make each layer and each member into a size that can be recognized on the drawing, the scale is varied for each layer and each member.

<Liquid crystal device>
The liquid crystal device of the present embodiment described below is an example of an active matrix type liquid crystal display device using a thin film diode (hereinafter abbreviated as TFD) as a switching element, and is particularly a vertical alignment type liquid crystal device. Is a transmission type liquid crystal display device using
FIG. 1 shows an equivalent circuit for the liquid crystal device 100 of the present embodiment.
The liquid crystal device 100 includes a plurality of data lines 13 extending in the Y direction and a plurality of scanning lines 9 extending in the X direction intersecting with the Y direction. The data line 13 is driven by the data signal driving circuit 110 and the scanning line 9 is driven by the scanning signal driving circuit 120. In each pixel 150, the TFD element 40, the liquid crystal display element 160 (liquid crystal layer), and the storage capacitor 5 are connected between the data line 13 and the scanning line 9.

FIG. 2 shows an equivalent circuit for one pixel 150.
As shown in the figure, each pixel 150 includes a TFD element 40 formed by connecting a capacitor Ctfd and a variable resistor Rtfd in parallel, a holding capacitor 5 (capacitor Cs), and a data line 13 and a scanning line 9. A liquid crystal display element 160 connected in series between the capacitor Clcd and the resistor Rlcd in parallel is configured as a circuit connected in parallel to the storage capacitor 5. In this configuration, a voltage is applied to each liquid crystal display element 160 by matrix addressing the data lines 13 and the scanning lines 9. In the equivalent circuit, the end of the liquid crystal display element 160 opposite to the TFD element 40 is connected to the counter electrode 8. The counter electrode 8 is formed over the entire display area, and is held at a constant voltage within one frame. A liquid crystal device having such a configuration is called a SCAD type liquid crystal device, and can provide better driving characteristics than a normal TFD-LCD.

Next, a schematic structure of the liquid crystal device 100 will be described with reference to FIGS.
FIG. 3 is a schematic diagram illustrating a planar configuration of the display area of the liquid crystal device 100, and FIG. 4 is a cross-sectional view taken along line AA ′ in FIG.

  As shown in these drawings, the liquid crystal device 100 includes a first substrate (element substrate) 10 bonded to face each other via a frame-shaped sealing material (not shown), and the first substrate 10. And a liquid crystal layer 50 sandwiched between these substrates. Further, on the opposite side of the first substrate 10 from the liquid crystal layer 50, an illumination device (not shown) such as a backlight is disposed.

The first substrate 10 and the second substrate 25 include base materials 10A and 25A having light transmissivity such as glass and plastic.
On the first substrate 10, the data lines 13 and the scanning lines 9 are formed on the side of the base 10 </ b> A that faces the liquid crystal layer 50. These data lines 13 and scanning lines 9 are band-like electrodes made of a conductive material such as Ta or Cr. In addition, a plurality of pixel electrodes 31 are provided on the base material 10 </ b> A along the extending direction of the data lines 13. These pixel electrodes 31 are electrically connected to the data line 13 via the TFD element 40. In the display area, these pixel electrodes 31 are provided in a matrix along the X and Y directions. On the lower layer side of the pixel electrode 31 (that is, the base material 10 </ b> A side), the scanning line 9 is provided via the insulating film 7. The scanning line 9 is provided so as to cross the central portion of the pixel electrode 31, and the storage capacitor 5 is formed in a portion where the scanning line 9 and the pixel electrode 31 overlap in a plane. The holding capacitor 5 serves to supply a data signal to the pixel electrode 31 via the scanning line 9 and hold it for a certain period. That is, the scanning line 9 functions as a capacitor electrode that is one electrode of the storage capacitor 5 at the same time as a signal wiring for supplying a scanning signal. An alignment film 27 made of polyimide or the like is provided on the surface of the pixel electrode 31. The alignment film 27 functions as a vertical alignment film that aligns liquid crystal molecules perpendicularly to the film surface in the initial alignment state.
In the present embodiment, each region in which each pixel electrode 31 is formed is one pixel, and a TFD element 40 is provided for each pixel arranged in a matrix so that display can be performed for each pixel. It has become.

  On the other hand, on the second substrate 25 side, the counter electrode 8 is formed on the surface of the base material 25 facing the liquid crystal layer 50. The counter electrode 8 is formed as a solid over the entire display area, and functions as a common electrode common to each pixel. An alignment film 33 made of polyimide or the like is provided on the surface of the counter electrode 8. The alignment film 33 functions as a vertical alignment film that aligns liquid crystal molecules perpendicularly to the film surface in the initial alignment state.

  Actually, a color matrix of a plurality of colors and a black matrix for shielding the gaps between the pixels are formed on the surface of the first substrate 10 or the second substrate 25. In FIG. These elements are not shown.

  Liquid crystal 50 is sealed in a space surrounded by the substrates 10 and 25 and the sealing material thus configured. The liquid crystal layer 50 is made of a liquid crystal having a negative dielectric anisotropy in which the initial alignment state is vertical alignment. In the liquid crystal layer 50, a chiral agent may be added to the liquid crystal material in order to improve the transmittance.

Next, the pixel structure of the liquid crystal device 100 will be described with reference to FIGS.
FIG. 5 is a plan view showing the configuration of elements formed on the surface of the first substrate 10 facing the liquid crystal layer 50. In the figure, only elements relating to one pixel are shown, but the other pixels have the same configuration. As shown in FIGS. 3 to 5, a plurality of pixel electrodes 31 are arranged in a matrix in the display region of the first substrate 10 in the X direction and the Y direction. Each pixel electrode 31 is a substantially rectangular electrode formed of a conductive material such as ITO. The scanning line 9 (the outer shape is indicated by a two-dot chain line in FIG. 5) faces the pixel electrodes 31 for one row arranged in the X direction with the insulating film 7 (see FIG. 4) interposed therebetween. On the other hand, the data line 13 extends in the Y direction in the gap between the pixel electrodes 31. As shown in FIG. 5, a TFD element 40, which is a two-terminal nonlinear element, is arranged in the gap between each pixel electrode 31 and the data line 13 adjacent thereto. The counter electrode 8 on the second substrate 25 shown in FIG. 4 is opposed to all the pixel electrodes 31 arranged in a matrix with the liquid crystal layer 50 interposed therebetween. A liquid crystal display element 160 shown in FIG. 1 includes a pixel electrode 31, a counter electrode 8 facing the pixel electrode 31, and a liquid crystal layer 50 sandwiched between the two.

  In the center of the pixel electrode 31, an electrode slit (opening) 31H formed by removing a part of the electrode is provided. The electrode slit 31H is provided in a portion where the pixel electrode 31 and the scanning line 9 overlap in plan (that is, a portion where the storage capacitor 5 is formed). When such an electrode slit 31H is provided, a lateral electric field is generated at the edge portion of the electrode slit 31H, and the tilt direction based on voltage application of liquid crystal molecules vertically aligned in the initial state can be regulated.

  Here, the horizontal electric field includes both those generated by the electric field between the pixel electrode 31 and the counter electrode 8 and those generated by the electric field between the pixel electrode 31 and the scanning line 9. However, while the distance between the pixel electrode 31 and the counter electrode 8 is several μm, the distance between the pixel electrode 31 and the scanning line 9 is several hundreds nm at most, so the magnitude of the lateral electric field is greater in the latter. Overwhelmingly large. Therefore, it can be considered that the influence on the liquid crystal is more dominant. In addition, since the distance between the pixel electrode 31 and the scanning line 9 is so short, the liquid crystal alignment control power is much higher than that of a normal liquid crystal device (that is, a liquid crystal device having no SCAD type configuration). It will be big.

6 is a cross-sectional view taken along line BB ′ in FIG. 5, and FIG. 7 is a cross-sectional view taken along line CC ′ in FIG. 5.
As shown in FIGS. 5 to 7, the TFD element 40 includes a long first conductive layer 41 that intersects the data line 13 with the X direction as the longitudinal direction, and an anodized surface of the first conductive layer 41. Insulating film (dielectric layer) 42 formed by this, and second conductive layers 131 and 43 formed on the surface of insulating film 42 so as to be separated from each other. Of these, the first conductive layer 41 is formed of various conductive materials such as a single metal such as tantalum (Ta) or an alloy containing tantalum as a main component and a metal such as tungsten (W). When the first conductive layer 41 is formed of tantalum, the insulating layer 42 obtained by anodizing the first conductive layer 41 is made of tantalum oxide (TaOx).

  The second conductive layer 131 is configured as a part of the data line 13. That is, the data line 13 is disposed on the first conductive layer 41 via the insulating film 42, and the portion where the data line 13 and the first conductive layer 41 overlap in plan is the second conductive layer 131. Yes. On the other hand, the second conductive layer 43 extends in the X direction so as to overlap the first conductive layer 41 with the insulating layer 42 interposed therebetween. The end portion of the second conductive layer 43 extends to the pixel electrode side, and the pixel electrode 31 is formed so as to partially overlap the end portion of the second conductive layer 43 and is electrically connected to the second conductive layer 43. Connected. The data line 13 including the second conductive layer 131 and the second conductive layer 43 are formed of a conductive material having a low resistivity. Examples of such a conductive material include simple metals such as chromium (Cr) and aluminum (Al), and alloys containing these as main components.

  The TFD element 40 shown in FIG. 1 includes a first element 40a and a second element 40b. That is, as shown in FIG. 6, in the first element 40a, the second conductive layer 131 (data line 13), the insulating layer 42, and the first conductive layer 41 are stacked in this order as viewed from the data line 13 side. It has a configuration. Thus, since the first element 40a has a metal / insulator / metal sandwich structure, it exhibits diode switching characteristics in both positive and negative directions. On the other hand, the second element 40b has a configuration in which the first conductive layer 41, the insulating layer 42, and the second conductive layer 43 are stacked in this order when viewed from the base material 10A side. Therefore, the second element 40b exhibits a diode switching characteristic opposite to that of the first element 40a. Thus, since the TFD element 40 has a configuration in which two diodes are connected in series so as to be opposite to each other, one diode (only one of the first element 40a and the second element 40b) is provided. Compared with the case of using, the current-voltage nonlinear characteristic is symmetric in both positive and negative directions.

  As shown in FIG. 7, the first conductive layer 41 and the scanning line 9 are provided in the same layer. These are formed by a common process. The insulating film 42 and the insulating film 7 are formed by anodizing the surfaces of the first conductive layer 41 and the scanning line 9, respectively. These film thicknesses are optimally set according to the respective functions. For example, in this embodiment, the insulating layer 7 is formed sufficiently thicker than the insulating layer 42 of the TFD element 40 (D2> D1). By doing so, it is possible to prevent the storage capacitor 5 from functioning as a diode, and to maintain electrical insulation between the storage capacitor line 17 and the scanning line 13.

<Display operation of liquid crystal device>
Next, the display operation of the liquid crystal device 100 will be described.
Light emitted from an illumination device such as a backlight enters the liquid crystal layer 50 through a polarizing plate or the like. When no voltage is applied, the liquid crystal molecules aligned perpendicular to the substrate have almost no refractive index anisotropy, so that incident light travels through the liquid crystal layer 50 while maintaining its polarization state.

  On the other hand, when an electric field (vertical electric field E0) is applied to the liquid crystal layer 50, the liquid crystal molecules are aligned so as to fall in the substrate surface direction, and exhibit refractive index anisotropy with respect to transmitted light. Therefore, part of the light incident on the liquid crystal layer 50 from the backlight is transmitted or absorbed by the polarizing plate or the like. Further, gradation display can be performed by adjusting the voltage applied to the liquid crystal layer 50 under such a configuration. At this time, in the present embodiment, since the electrode slit 31H is provided in the central portion of the pixel electrode 31, the tilt direction of the liquid crystal molecules is defined as one direction, and the occurrence of disclination or the like is prevented.

FIG. 8 is a schematic diagram showing the movement of the liquid crystal molecules L in the vicinity of the electrode slit 31H.
As described above, the signal supplied to the pixel electrode 31 is held for a certain period by the holding capacitor 5 formed with the scanning line 9. At this time, a strong alignment regulating force is generated in the opening region of the pixel electrode 31 by the lateral electric field E1 generated between the pixel electrode 31 and the scanning line 9. The lateral electric field E1 acts to tilt the liquid crystal molecules L toward the center of the electrode slit 31H. Therefore, when a selection voltage is applied between the pixel electrode 31 and the counter electrode 8, an oblique electric field is generated at the center of the pixel electrode 31, and the liquid crystal molecules L that are vertically aligned when the non-selection voltage is applied are It is inclined radially from the peripheral part toward the central part. As a result, a plurality of directors of the liquid crystal molecules L can be created, and a liquid crystal display device with a wide viewing angle can be provided.

<Method for manufacturing liquid crystal device>
Next, a method for manufacturing the liquid crystal device 100 will be described with reference to FIGS.
FIG. 9A to FIG. 9D are diagrams showing an element manufactured in each process by paying attention to one pixel.

First, as shown in FIG. 9A, a conductive film 61 is formed on the surface of the first substrate 10 (first step).
More specifically, the conductive film 61 is formed by patterning a tantalum thin film formed on the surface of the first substrate 10 by a film forming technique such as sputtering using a photolithography technique and an etching technique. The conductive film 61 has an outer shape in which a conductive portion to be the first conductive layer 41 of each TFD element 40 is connected to a straight portion 61a extending in the X direction. The straight line portion 61a includes a portion that becomes the scanning line 9. At this stage, the first conductive layers 41 in the pixels for one row arranged in the X direction are connected via the connecting portion 611 (see FIG. 9B). They are connected to each other (electrically connected). Furthermore, as shown in FIG. 10A, the conductive film 61 formed in this step includes a connecting portion 62 that extends in the Y direction and is connected to the ends of all the straight portions 61a. Yes. Note that an insulating film made of tantalum oxide (Ta ₂ O ₅ ) or the like may be formed on the surface of the first substrate 10 before the conductive film 61 is formed. If the conductive film 61 is formed using this insulating film as a base, the adhesion between the conductive film 61 and the first substrate 10 can be improved, and the diffusion of impurities from the first substrate 10 to the conductive film 61 can be suppressed. it can.

Next, an insulating layer is formed on the surface of the conductive film 61 (second step).
Here, first, the first anodic oxidation is performed on the surface of the conductive film 61. More specifically, after the first substrate 10 is immersed in the electrolytic solution, a predetermined voltage is applied between the electrolytic solution and the connecting portion 62 to oxidize the entire surface of the conductive film 61 (that is, Then, an insulating layer is collectively formed on the surface of the portion that becomes the first conductive layer 41 and the scanning line 9). In this step, the oxide film formed on the surface of the first conductive layer 41 becomes the insulating layer 42 of the TFD element 40. Further, the oxide film formed on the surface of the scanning line 9 becomes an insulating film 71 constituting a part of the insulating film 7.
Thereafter, as shown in FIG. 9B, a portion 611 connecting the first conductive layer 41 and the straight portion 61a is removed by a photolithography technique and an etching technique. As a result, the first conductive layer 41 constituting the TFD element 40 and the insulating layer 42 formed on the surface thereof are separated from the portion to be the scanning line 9. As shown in FIG. 10B, at this stage, all the straight portions 61 a (that is, the portions that become the scanning lines 9) remain connected to the connecting portion 62.

Next, as shown in FIG. 9C, the second anodic oxidation is performed on the surface of the conductive film 61 by the same procedure as the first anodic oxidation. By this anodic oxidation, the surface of the scanning line 9 is further oxidized to increase the thickness of the oxide film. On the other hand, the oxidation of the first conductive layer 41 separated from the conductive film 61 does not proceed. By this step, the insulating film 7 having a larger thickness than the insulating layer 42 on the surface of the first conductive layer 41 is formed on the surface of the scanning line 9.
Thereafter, the connecting portions 62 that have connected the straight portions 61a are removed by the photolithography technique and the etching technique (third step).

Next, as shown in FIG. 9D, the data line 13 (including the second conductive layer 13a) and the second conductive layer 43 are formed (fourth step). More specifically, a chromium thin film is formed on the surface of the first substrate 10 by a film forming technique such as sputtering, and this is patterned by using a photolithography technique and an etching technique, so that these elements can be collectively treated. It is formed. In this step, the data line 13 and the second conductive layer 43 are formed so as to cover the first conductive layer 41 and the insulating layer 42, whereby the TFD in which the first element 40a and the second element 40b are connected in series. Element 40 is obtained.
Thereafter, an ITO thin film is formed by a film forming technique such as sputtering, and the pixel electrode 31 shown in FIG. 5 is formed by patterning the ITO thin film.

  As described above, in the present embodiment, since the electrode slit 31H is provided in the pixel electrode 31, the alignment direction of the liquid crystal can be controlled by the lateral electric field generated at the edge portion of the electrode slit 31H. In particular, in the present embodiment, since the SCAD type structure is adopted on the first substrate 10 side, a very strong lateral electric field can be generated between the scanning lines 9 and the conventional structure which does not employ such a structure. As compared with the structure, it is possible to provide a liquid crystal device having more excellent alignment stability.

<Modification>
Next, a modification of the liquid crystal device of the present embodiment will be described based on FIG.
FIG. 11 shows an example in which the arrangement and shape of the electrode slit 31H are modified.
In FIG. 11A, the electrode slit 31H is provided on each of the two left and right edges (two edges parallel to the data line 13) of the pixel electrode 31. In this example, the electrode slit 31H is provided as a notch portion of the pixel electrode 31. Each electrode slit 31 </ b> H is provided at the center of each edge, and is disposed so as to be symmetric with respect to the center of the pixel electrode 31. The scanning line 9 is disposed so as to face the portion where the electrode slits 31H are formed.
In this configuration, since the two electrode slits 31H are provided in one pixel, the alignment division in one pixel can be performed more reliably.

In FIG. 11B, four electrode slits 31H are provided at the center of the pixel electrode. In this example, the electrode slit 31 </ b> H is provided as an opening of the pixel electrode 31. The electrode slits 31 </ b> H are formed in a triangular shape, and each electrode slit 31 </ b> H is disposed at a position that is rotationally symmetric with respect to the center of the pixel electrode 31. In the scanning line 9, the portion overlapping the pixel electrode 31 in a plan view is formed wider than the other portions, and the four electrode slits 31 </ b> H are opposed to the wide portion. In this example, the number of electrode slits 31H is four, but this number is not limited to this.
In this configuration, since the storage capacitance between the pixel electrode 31 and the scanning line 9 is increased, more stable driving characteristics can be obtained. Further, since a plurality of electrode slits 31H are provided, it is possible to provide a liquid crystal device with more excellent alignment. Further, since the width of the scanning line 9 where the data line 13 overlaps with the plane is narrow, it is possible to make it difficult for capacitive coupling to occur with the data line 13.

<Electronic equipment>
Next, an electronic apparatus including the liquid crystal device according to the present invention will be described.
FIG. 12 is a perspective view showing a configuration of a mobile phone having the liquid crystal device according to the embodiment. As shown in this figure, the mobile phone 1200 includes a plurality of operation buttons 1202 operated by a user, a mouthpiece 1204 for outputting a sound received from another terminal device, and a sound transmitted to the other terminal device. In addition to the mouthpiece 1206 for inputting, a liquid crystal device D for displaying various images is provided. The liquid crystal device D is a liquid crystal device according to the present invention.

  Note that, as an electronic device in which the liquid crystal device according to the present invention can be used, in addition to the cellular phone shown in FIG. Examples include a recorder, a digital camera, a car navigation device, a pager, an electronic notebook, a calculator, a word processor, a workstation, a videophone, a POS terminal, and a device equipped with a touch panel.

  The preferred embodiments of the present invention have been described above with reference to the accompanying drawings, but it goes without saying that the present invention is not limited to such examples. Various shapes, combinations, and the like of the constituent members shown in the above-described examples are examples, and various modifications can be made based on design requirements and the like without departing from the gist of the present invention. For example, in the above embodiment, the liquid crystal device 100 is a transmissive liquid crystal device, but the present invention can also be applied to a reflective liquid crystal device or a transflective liquid crystal device.

It is a block diagram which shows the electric constitution of the liquid crystal device which concerns on embodiment of this invention. 2 is an equivalent circuit diagram focusing on one pixel in the liquid crystal device. FIG. It is a top view which shows the display area of the liquid crystal device. It is sectional drawing seen from the AA 'line in FIG. It is a top view which shows the structure of one pixel. It is sectional drawing seen from the BB 'line in FIG. It is sectional drawing seen from the CC 'line in FIG. It is a schematic diagram which shows the effect | action of the horizontal electric field which arises in the electrode slit part of a pixel electrode. It is process drawing for demonstrating the manufacturing method of a liquid crystal device. It is process drawing for demonstrating the manufacturing method of a liquid crystal device. It is a top view which shows the pixel structure of the liquid crystal device which concerns on a modification. 1 is a perspective view illustrating a configuration of a mobile phone that is an example of an electronic apparatus of the present invention.

Explanation of symbols

DESCRIPTION OF SYMBOLS 5 ... Retention capacity, 7 ... Insulating film, 8 ... Counter electrode, 9 ... Scan line, 10 ... 1st board | substrate (element board | substrate), 13 ... Data line, 25 ... 2nd board | substrate (opposite board | substrate), 31 ... Pixel electrode, 31H ... Electrode slit, 40 ... TFD element (thin film diode), 50 ... Liquid crystal layer, 100 ... Liquid crystal device, 150 ... Pixel, 1200 ... Electronic equipment, E1 ... Lateral electric field, L ... Liquid crystal molecule

Claims (4)

A first substrate having a scanning line and a data line extending in a direction crossing each other, and a pixel electrode electrically connected to the data line via a thin film diode;
A second substrate having a counter electrode facing the pixel electrode;
A liquid crystal layer sandwiched between the first substrate and the second substrate,
The liquid crystal layer is composed of a liquid crystal having a negative dielectric anisotropy in which an initial alignment state is a vertical alignment,
The pixel electrode is provided on the scanning line via an insulating film, and a storage capacitor is formed in a portion overlapping the scanning line in a plane, while a part of the pixel electrode is formed in the overlapping portion. An electrode slit formed by removing the liquid crystal device is provided.   2. The liquid crystal device according to claim 1, wherein the scanning line is formed such that a portion overlapping the pixel electrode in a plan view is wider than other portions.   The liquid crystal device according to claim 2, wherein a plurality of the electrode slits are provided. An electronic apparatus comprising the liquid crystal device according to claim 1.

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