JP2006245484A - Stage device - Google Patents

Stage device Download PDF

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Publication number
JP2006245484A
JP2006245484A JP2005062467A JP2005062467A JP2006245484A JP 2006245484 A JP2006245484 A JP 2006245484A JP 2005062467 A JP2005062467 A JP 2005062467A JP 2005062467 A JP2005062467 A JP 2005062467A JP 2006245484 A JP2006245484 A JP 2006245484A
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Japan
Prior art keywords
stage
mechanism
movable stage
stage movable
movable unit
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Withdrawn
Application number
JP2005062467A
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Japanese (ja)
Inventor
Giichi Miyajima
Toshihiko Nishida
Naoaki Nishimura
Yasuto Sasaki
Hideo Tanaka
康人 佐々木
義一 宮島
英雄 田中
敏彦 西田
直亮 西邑
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Canon Inc
キヤノン株式会社
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Application filed by Canon Inc, キヤノン株式会社 filed Critical Canon Inc
Priority to JP2005062467A priority Critical patent/JP2006245484A/en
Publication of JP2006245484A publication Critical patent/JP2006245484A/en
Application status is Withdrawn legal-status Critical

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Abstract

PROBLEM TO BE SOLVED: To provide a self-step-out recovery method for a flat stage capable of automatically returning a flat stage motor that is driven accurately from a step-out state.
In a stage apparatus that drives a stage movable part by a planar motor drive system, a holding mechanism that generates a holding force with respect to a fixed part of the stage apparatus, and the holding mechanism linearly moves in an axial direction perpendicular to the plane. A step-out return mechanism having an up-and-down mechanism that rotates and a rotation mechanism that rotates the holding mechanism about an axis orthogonal to a plane with respect to the stage movable portion is provided in the stage movable portion.
[Selection] Figure 1

Description

  The present invention relates to a stage apparatus that is used in a semiconductor exposure apparatus and a liquid crystal exposure apparatus and moves a wafer, a substrate, a reticle original plate, or the like, and a method for returning from the position of a movable part of a stage mechanism using a flat motor. It is.

  FIG. 20 shows a conventional semiconductor exposure apparatus.

  2. The semiconductor exposure apparatus is an original plate. 3. Hold the reticle. 2. reticle stage; 5. Irradiate exposure light on reticle. 1. Illumination system part is exposed 1. Hold the wafer. Wafer stage, 3. 1. Exposure light from the reticle at a predetermined magnification 4. Project onto wafer Projection optical system, 1. Measure the alignment mark on the wafer and the reference mark on the stage. In-wafer alignment and 2. wafer and 7. Align between reticles 6. Alignment optical system, holding each component from floor via vibration isolation means It is comprised by the main body structure.

  In the configuration as described above, it is supplied by a wafer transfer system (not shown). 5. Wafer The light emitted from the illumination system is 4. 2. On the reticle stage 4. passing through the reticle; 1. Change to a predetermined magnification by the projection optical system. 1. on the wafer stage The reticle pattern is transferred to the wafer. A semiconductor exposure manufacturing system includes a stepper and a scanner according to an exposure method. Stepper is 8. 2. By alignment optical system 1. Convert the target position with respect to the reticle into interferometer data (not shown), and use the interferometer data as a target. 3. Wafer stage 1. Make the reticle pattern stationary by placing the reticle stage at the desired position. The transfer is performed on the wafer. 3. Wafer stage Reticle stage 8 2. By alignment optical system A target position with respect to the reticle is converted into interferometer data (not shown), and the interferometer data is driven synchronously at a desired position with the interferometer data as a target. Transfer is performed on the wafer (see, for example, Patent Document 1).

  In the semiconductor exposure apparatus, the conventional wafer stage / reticle stage movable unit drive system includes an X drive system driven by a linear motor or the like in the X direction along the X direction guide surface, and Y along the Y direction guide surface. In general, an XY stage crossbar type drive system is used which is combined with a Y drive system driven in the direction by a linear motor or the like and driven in the XY direction. As other methods, there are a planar pulse motor driving method, a planar Lorentz motor driving method and the like as a stage driving method capable of driving the movable stage in a plane without XY directions. By changing the wafer stage and reticle stage drive system to the planar stage drive system, the stage body is lighter and smaller, the system is simplified, the degree of freedom of the sequence is improved, and the shape of the movable part is simplified. There are advantages such as weight reduction and improvement of movable rigidity.

  FIG. 21 is a schematic diagram illustrating an example of a planar pulse motor driving method. FIG. 21A illustrates a top view of the planar pulse motor driving method, and FIG. 21B illustrates a side view of the planar pulse motor driving method. Represents.

  The planar pulse motor drive system is 11.1 on the grid parallel to the orthogonal XY axes. 10. On a plane with projections Configure the platen part on the fixed surface plate. This 10. 11. Platen part 8. It is slidably arranged with a predetermined gap on the surface of the convex part. 12. Symmetric about X axis on movable stage X electromagnetic drive unit, symmetrical to Y axis 13. 10. Y electromagnetic drive units are arranged, and each electromagnetic drive unit generates a moving magnetic field according to a pulse or sine wave current command. 10. A grid pattern on the platen. 8. Generate a magnetic attraction between the convex part. The movable stage unit is driven in the XY directions. 10. 11. Platen part 14. Grooves between convex parts. 9. Fill with resin etc. 8. By flattening the platen surface, 8. A predetermined gap is maintained by an air bearing (not shown) provided on the movable stage. The movable stage can be held and driven without guide in the XY directions.

  FIG. 22 is a schematic diagram illustrating an example of a planar Lorentz motor driving method.

In the planar Lorentz motor drive system, coils are arranged in parallel to the orthogonal XY axes. A coil part is comprised on a fixed surface plate. This 19. 8. It is slidably arranged on the upper surface of the coil part with a predetermined gap. 15. Halbach-type magnets are arranged on the lower surface of the movable stage. A plurality of magnet groups are arranged. When driving in the X-axis direction, 16. By passing a current through the X thrust generating coil, 16. 15. Arranged symmetrically on the Y axis corresponding to the X thrust generating coil. 8. Generate Lorentz force in the magnet group, The movable stage is driven in the X direction. Similarly, when driving in the Y-axis direction, 17. By passing a current through the Y thrust generating coil, 17. 15. Arranged symmetrically about the X axis corresponding to the Y thrust generating coil. 8. Generate Lorentz force in the magnet group. The movable stage is driven in the Y direction. Similarly, when driving in the ωZ-axis direction, 18. By passing a current through the ωZ thrust generating coil, 18. 15. X-axis asymmetrical arrangement corresponding to the ωZ thrust generating coil 8. Generate Lorentz force in the magnet group. The movable stage is driven in the ωZ direction. In this way, 16. X thrust generating coil, 17. Y thrust generating coil, 18. By controlling the value of the current flowing through the ωZ thrust generating coil, 9. It is possible to drive the movable stage in the X, Y, and ωZ directions. 8. By flattening the coiled surface, An air bearing provided on the movable stage keeps a predetermined gap and holds the movable part and can be driven without guide in the XY directions. By arranging a coil and a magnet for generating Z thrust, Lorentz force in the Z direction It is also possible to surface.
JP 2002-175963 A

  In the two types of planar driving methods, the position of the two types of motors in the normal state is not indefinite in the ωZ direction for the following reason.

  In the planar pulse motor drive system, 10. 11. Platen part 8. convex part 12, 13 of the movable stage. Since the detent torque is generated by the attractive force of the X and Y electromagnetic drive units and has a self-holding force in the X, Y and ωZ directions, the position does not become unstable in the ωZ direction. In the planar Lorentz motor drive system, 18. Since the driving force in the ωZ direction can be generated by the ωZ thrust generating coil, the ωZ direction can always be controlled and driven, so that the position in the ωZ direction does not become unstable.

  However, in each planar motor drive system, there is no guide for restraining the movable stage in the XY directions. 8. When an unexpected external force is applied to the movable stage. 8. the movable stage rotates in the ωZ direction; When the position of the movable stage becomes indefinite in the ωZ direction, each planar motor drive system cannot self-recover for the following reasons.

  In the planar pulse motor drive system, 9. When the movable stage is tilted, 10. 11. Platen part 8. convex part 12, 13 of the movable stage. 8. Since the pitch of the magnetic poles of the X and Y electromagnetic drive units is out of position with respect to the control, It will be in the state which cannot move a movable stage, ie, the state which stepped out. In the planar Lorentz motor drive system, 9. When the movable stage is tilted, each thrust generating coil and 9. 15. A movable stage. 8. Since the magnet group is out of position with respect to the control, It will be in the state which cannot move a movable stage, ie, the state which stepped out.

  In this way, when stepping out in each of the planar motor driving methods, self-recovery cannot be performed with the driving force of each motor. The position of the movable stage is adjusted and corrected to return to a position where it will not step out.

  The present invention has been made in view of such a problem, and provides a self-step-out recovery method and a stage device for a flat stage capable of automatically returning a flat stage motor that is driven accurately from a step-out state. It is in.

  In order to achieve the above object, a first invention according to the present invention is a stage device that drives a stage movable unit by a planar motor driving method, and a holding mechanism that generates a holding force with respect to a fixed portion of the stage device; A step-out return mechanism having an up-and-down mechanism that linearly moves the holding mechanism in an axial direction orthogonal to a plane; and a rotation mechanism that rotates the holding mechanism about an axis orthogonal to the plane with respect to the stage movable portion. It is provided in the movable part.

  According to a second aspect of the present invention, in the stage apparatus, the planar motor drive system is a platen on a flat plate provided with convex poles provided in a grid pattern along two coordinate axes orthogonal to the fixed portion of the stage apparatus. And a plane pulse motor drive system that moves on the platen by providing an electromagnetic drive unit that generates a moving magnetic field on each of the coordinate axes orthogonal to the stage movable unit.

  According to a third aspect of the present invention, in the stage apparatus, in the planar motor drive system, a coil is disposed in a fixed portion of the stage apparatus, a magnet group is disposed in the stage movable section, and the stage movable section is moved by Lorentz force. It is a planar Lorentz motor drive system to drive.

  According to a fourth aspect of the invention, in the stage apparatus, the stage apparatus has one or more stage movable parts.

  According to a fifth aspect of the present invention, in the stage device, each stage movable portion includes one or more step-out return mechanisms.

  According to a sixth aspect of the present invention, in the stage device, the holding mechanism that generates a holding force with respect to the fixing portion of the stage device generates a holding force with respect to the fixing portion of the stage device by electromagnetic force. Features.

  According to a seventh aspect of the present invention, in the stage device, the holding mechanism that generates a holding force with respect to the fixing portion of the stage device generates a holding force with respect to the fixing portion of the stage device by a vacuum adsorption force. It is characterized by.

  According to an eighth aspect of the present invention, in the stage device, the holding mechanism that generates a holding force with respect to the fixing portion of the stage device generates a holding force with respect to the fixing portion of the stage device by a frictional force. Features.

  According to a ninth aspect of the present invention, in the stage apparatus, the vertical mechanism that linearly moves the holding mechanism in an axial direction orthogonal to a plane is configured to move the holding mechanism to the stage mechanism when driving the stage movable unit out of step. It is characterized in that it is brought into contact with or close to the vicinity.

  According to a tenth aspect of the present invention, in the stage device, the vertical mechanism that linearly moves the holding mechanism in an axial direction orthogonal to a plane is configured to move the holding mechanism to the stage except when the stage movable unit is driven out of step. It is separated from the fixed part of the mechanism.

  According to an eleventh aspect of the present invention, in the stage device, the rotation mechanism that rotates the holding mechanism about an axis perpendicular to a plane with respect to the stage movable portion is configured such that the holding mechanism holds the fixed portion of the stage device. By rotating in a state where a force is generated, the stage movable portion is rotated with respect to the fixed portion of the stage device to perform step-out recovery.

  According to a twelfth aspect of the present invention, in the stage device, the rotation mechanism that rotates the holding mechanism with respect to the stage movable portion about an axis orthogonal to a plane is a measurement result of a measurement mechanism that measures the position of the stage movable portion. The step-out recovery is performed by rotating the stage movable unit with respect to the fixed unit of the stage device.

  According to a thirteenth aspect of the present invention, in the stage device that is a planar pulse motor driving mechanism, the rotating mechanism that rotates the holding mechanism with respect to the stage movable portion about an axis orthogonal to the plane is configured to position the stage movable portion. Based on the measurement result of the measuring mechanism to measure, the stage movable part is rotated to the vicinity of the step-out return with respect to the fixed part of the stage device, and the remaining rotation until the step-out return is the convex pole of the fixed part and the stage It is characterized in that it is automatically rotated by the force of magnetic attraction acting between the movable part and the electromagnetic drive part.

  In the invention of claim 14, in the stage apparatus, the measurement mechanism that measures the position of the stage movable unit detects the inclination of the stage movable unit and the cable bearer unit connected to the stage movable unit, The rotation amount on an axis orthogonal to the plane of the stage movable part is measured.

  According to a fifteenth aspect of the present invention, in the stage device that is a planar pulse motor drive mechanism, the measurement mechanism that measures the position of the stage movable portion is a planar pulse motor drive system and the convex pole of the fixed portion and the stage movable portion. The amount of rotation on an axis perpendicular to the plane of the stage movable unit is measured by detecting the magnetic attractive force acting between the electromagnetic driving unit and the rotational torque of the rotating mechanism.

  According to a sixteenth aspect of the present invention, in the stage device that is a planar Lorentz motor drive mechanism, the measurement mechanism that measures the position of the stage movable portion is the fixed portion that is generated when the stage movable portion is rotated by the rotation mechanism. By detecting the back electromotive force of the coil arranged at, the rotation amount and the coordinate in the plane direction on the axis orthogonal to the plane of the stage movable part are measured.

  In the invention of claim 17, in the stage device which is a planar Lorentz motor drive mechanism, the measuring mechanism for measuring the position of the stage movable part is the fixed part generated when the stage movable part is rotated by the rotating mechanism. The amount of rotation and the coordinate in the plane direction on the axis orthogonal to the plane of the stage movable part are measured by the number of coils generating counter electromotive force of the coils arranged in the axis.

  According to the invention of claim 18, in the stage device which is a planar Lorentz motor driving mechanism, the measuring mechanism for measuring the position of the stage movable portion is generated when the stage movable portion is rotated by the rotation mechanism. The amount of rotation and the coordinate in the plane direction on the axis orthogonal to the plane of the stage movable part are measured by the amount of counter electromotive force generated in the coil arranged at the position.

  According to a nineteenth aspect of the present invention, in the stage device, the measurement mechanism that measures the position of the stage movable unit includes a light receiving element disposed on the stage movable unit, and a plurality of measurement lights from the outside of the stage movable unit. By measuring the position with the light receiving element, the rotation amount and the coordinate in the plane direction on the axis orthogonal to the plane of the stage movable part are measured.

  In the invention of claim 20, the light receiving element disposed on the stage movable portion of the measurement mechanism has one or more light receiving elements disposed on the first side surface of the stage movable portion, and is disposed on the first side surface of the stage movable portion. Two or more light receiving elements are arranged on a second side surface orthogonal to each other.

  In a twenty-first aspect of the present invention, the light receiving element disposed on the stage movable portion of the measurement mechanism has one or more linear light receiving elements disposed on the first side surface of the stage movable portion, and is disposed on the first side surface of the stage movable portion. One or more light receiving elements are arranged on the second side surface orthogonal to each other.

  According to a twenty-second aspect of the present invention, in the light receiving element arranged on the stage movable portion of the measurement mechanism, one or more linear light receiving elements are arranged on the first side surface of the stage movable portion and orthogonal to the first side surface of the stage movable portion. One or more linear light receiving elements are arranged on the second side surface.

  According to a twenty-third aspect of the present invention, a plurality of measurement lights from the outside of the measurement mechanism are driven in a uniaxial direction parallel to the first side surface of the stage movable unit, and the stage movable unit The second light projecting means driven in one axial direction parallel to the second side surface of the light is irradiated to the light receiving element of the stage movable portion.

  According to a twenty-fourth aspect of the present invention, a plurality of measurement lights from the outside of the measurement mechanism is a plurality arranged such that one or more measurement lights are always incident on the linear light receiving element on the first side surface of the stage movable portion. To the light receiving element of the stage movable part, and a plurality of light projecting means arranged so that one or more measurement lights always enter the linear light receiving element on the second side surface of the stage movable part. It irradiates with respect to.

  In the invention of claim 25, in the stage apparatus, the measuring mechanism for measuring the position of the stage movable unit arranges two or more light emitting elements in the stage movable unit and recognizes the entire stage movable unit movable region. Measuring the amount of rotation and the coordinate in the plane direction on an axis orthogonal to the plane of the stage movable unit by measuring the light emitting element on the stage movable unit with one or more two-dimensional light receiving elements arranged in this manner It is characterized by.

  According to a twenty-sixth aspect of the present invention, in the stage apparatus, the measurement mechanism that measures the position of the stage movable unit includes two or more light emitting elements arranged on the stage movable unit and arranged outside the stage movable unit. An axis orthogonal to the plane of the stage movable unit by measuring the light emitting element on the stage movable unit by scanning the one-dimensional light receiving element in one axial direction so as to recognize the entire region of the movable stage movable unit. The amount of rotation and the coordinate in the plane direction are measured.

  According to a twenty-seventh aspect of the present invention, in the stage device that is a planar pulse motor driving mechanism, the measurement mechanism that measures the position of the stage movable portion is provided with a mechanism that detects the convex pole of the fixed portion on the stage movable portion. The rotation amount and the coordinate in the plane direction on the axis orthogonal to the plane of the stage movable unit are measured based on the detected number of convex poles of the fixed unit.

  According to the present invention, in a stage apparatus using a planar motor drive system, the movable stage is provided on the movable stage even if the movable stage rotates in the ωZ direction due to an unexpected external force or the like and falls into a step-out state. It is possible to automatically return from the state where the movable stage is out of step by using a self-step-out return mechanism having a holding and rotating function. In addition, since the current position of the movable stage can be detected using the movable stage position detection method, the movable stage can be automatically recovered from the step-out state using the self-step-out return mechanism safely and accurately. Is possible.

  Embodiments of the present invention will be described below with reference to the drawings.

  FIG. 1 is a schematic view of a self-step-out return mechanism of a flat motor stage according to a first embodiment of the present invention. FIG. 1 (a) shows a top view of the flat motor stage, and FIG. 1 (b) is a flat motor. The stage side view is represented.

  The planar motor stage is 20. 9. On the fixed surface plate. 8. There is a movable stage. It is levitated by an air bearing (not shown) on the movable stage. The planar motor stage is a planar pulse motor driving system or a planar Lorentz motor driving system. 8. a platen (not shown) having convex portions formed on the fixed surface plate; An XY electromagnetic drive unit (not shown) is configured on the movable stage, and a moving magnetic field is generated in the XY electromagnetic drive unit. The movable stage can be freely moved in two directions of XY directions in the drawing. In the planar Lorentz motor drive system, 20. A coil portion (not shown) in which an XY coil is arranged on the fixed surface plate is 9. A group of magnets (not shown) is configured on the movable stage, and the current flowing through the XYωZ coil is controlled by controlling the current. The movable stage can be freely moved in three directions in the XYωZ direction in the figure.

  9. The movable stage is 21. perpendicular to the X-axis direction. X bar mirror, perpendicular to the Y-axis direction 24. Y bar mirror is constructed and attached to the measurement standard outside the planar stage motor. X interferometer and 25. 21. Use Y, ωZ interferometer. X-bar mirror, 24. 8. Irradiate laser interference measurement light to the Y-bar mirror; The current position of the movable stage is measured. In FIG. From X interferometer 21. 23 against X Vermira. 8. Irradiate X interferometer measurement light. Measure the movable stage X position, 25. From Y, ωZ interferometer 24. 26. For Y bar mirror. Y interferometer measurement light and 27. 26. Irradiate ωZ interferometer measurement light; From the measured value of Y interferometer measurement light 9. Y position of movable stage, 26. Y interferometer measurement light and 27. From the measured value of ωZ interferometer measurement light 9. The ωZ position of the movable stage is measured. 9. The movable stage is 20. Regardless of the position on the fixed surface plate, 22. 23 from the X interferometer. X interferometer measurement light is 21. 21. Irradiated to X-Vermira X length of X mirror, 25. 26 from Y, ωZ interferometer. Y interferometer measurement light and 27. What is ωZ interferometer measurement light? 24. Irradiation to the Y vermira. Since it has the length of Y vermira, 9. The movable stage is 20. The current position can be measured over the entire area of the fixed surface plate.

  9. The movable stage is 28. By mounting cable bear, 9. 8. Cables for supplying signals and power to the movable stage, pneumatic piping such as VAC and pressure air, A coolant piping for adjusting the temperature of the heat source of the movable stage is connected. 28. The mounting cable bear is 9. Movable stage and 29. Connected at the movable side mounting cable connection part, 20. Fixed platen and 30. Connected to fixed side mounting cable connection.

  In the planar motor stage configured as described above, 32. The movable stage can automatically return from the step-out state. It has a self-step-out recovery mechanism. In this figure, 9. Only one is configured on the side of the movable stage. 31 on each side of the movable stage. A plurality of self-step-out return mechanisms may be configured. In this figure, 9. It is configured on the side of the movable stage. It may be configured inside the movable stage.

  FIG. 2 is an AA cross-sectional enlarged view of the self-step-out returning mechanism according to the first embodiment.

  In this embodiment, 31. The self-step-out recovery mechanism is 9. It is attached to the side of the movable stage, 32. Self-detuning return mechanism flange part and 33. Rotation mechanism and 36. Vertical drive mechanism and 39. It consists of a surface plate holder. 32. The self-step-out return mechanism flange is 9. Attached to a movable stage, 33. Rotation mechanism and 36. Vertical drive mechanism and 39. Holds the surface plate holder. 32. The self-step-out return mechanism flange part 33. A rotation mechanism is attached; 32. 34. Self-step-out return mechanism attached to the flange. 35 with respect to the rotation mechanism fixed side. The rotating mechanism rotating side can freely rotate in a slidable manner in the ωZ direction.

  33. The structure of the rotation mechanism is 34. 35 with respect to the rotation mechanism fixed side. The rotation mechanism rotation side may be anything as long as it can rotate freely in the ωZ direction. The ωZ direction sliding means may be a bearing, an air bearing or the like. The ωZ direction driving means may be a hollow motor, an AC servo motor, a DC servo motor, a pulse. A rotation mechanism via a motor or a belt may be used. However, 34. 35. rotation mechanism fixed side; The sliding means between the rotating mechanism rotating side can rotate slidably in the ωZ direction, but 36. The movement in the other direction is restricted in order to reliably transmit the drive of the vertical drive mechanism.

  35. 36. On the rotation side of the rotation mechanism. A vertical drive mechanism is attached, 36. The vertical drive mechanism and 39 surface plate holder are 35. Since it is attached to the rotating mechanism rotating side, 34. It is possible to rotate with respect to the rotation mechanism fixed side. 35. 38. With respect to the 37 vertical drive mechanism fixed side attached to the rotating mechanism rotating side. The vertical drive mechanism drive side can be slidably driven in the Z direction. 36. The vertical drive mechanism is 38. The vertical drive mechanism drive side may have any configuration as long as it can be slidably driven in the Z direction, and may be an air guide, linear guide, ball bush, linear bush, or the like as the Z direction sliding means, and a ball screw as the Z direction driving means. And a combination of a rotary motor, an air cylinder, a linear actuator, and the like. However, 37 vertical drive mechanism fixed side and 38. The sliding means between the vertical drive mechanism drive side can be slidably driven in the Z direction, but 33. In order to reliably transmit the rotation of the rotation mechanism, movement in other directions is restricted.

  39. The platen holder is 20. 9. For fixed surface plate Means for fixing the movable stage; 38. 39 on the vertical drive mechanism drive side. Since the surface plate holder is attached, 9. 35. Can be driven in the Z direction with respect to the movable stage; The vertical drive mechanism and 39 surface plate holder are 35. Since it is attached to the rotating mechanism, 9. It can be rotated in the ωZ direction with respect to the movable stage. That is, 39. The platen holder is 9. The movable stage can be freely driven in the ωZ direction and the Z direction.

  39. 20. Place the platen holder If it can be fixed to the fixed surface plate, 39. The surface plate holder is 20. Any method may be used to fix the fixed surface plate. 19. Embed an electromagnetic chuck in the bottom of the platen holder. Fixed surface plate and 39. Fixing method by electromagnetic force between the platen holding part and 39. 19. Embed a vacuum chuck in the bottom of the platen holder. Fixed surface plate and 39. 35. Fixing method by vacuum suction force between the platen holding part and 36. 20. The pressing force of the vertical drive mechanism is 20. Fixed surface plate and 39. A fixing means by frictional force generated between the surface plate holding portions may be used.

  31. The configuration as described above. 8. Using self-step-out recovery mechanism 21 of the movable stage. A platen holding rotation sequence for holding and rotating the fixed platen is shown in FIG. As shown in FIG. When the movable stage is normally XY driven, 36. By vertical drive mechanism 39. Since the platen holding part is fixed upward, 31. Self-step-out return mechanism is 20. There is no contact with the fixed surface plate. Next, move 9 movable stages to 31. 20. Self-step-out return mechanism. Hold the fixed surface plate.

  FIG. 20. Self-step-out return mechanism. FIG. 36 is a diagram for holding a fixed upper board; 38. By the vertical drive mechanism. By driving the vertical drive mechanism drive side downward in the Z direction, the 39 surface plate holding section is moved to 20. Touch the fixed upper plate. 20. 39. Touching the fixed surface plate. The surface plate holder is a predetermined holding method (electromagnetic chuck, vacuum suction, friction holding, etc.). By holding a fixed surface plate, 9. 31. Move the movable stage. 20. Self-step-out return mechanism. Fix to the fixed surface plate. Next, move 9 movable stages to 31. 20. Self-step-out return mechanism. Rotate the fixed surface plate.

  FIG. 20. Self-step-out return mechanism. FIG. 39 is a diagram for performing rotational driving in a state where the fixed upper panel is held; The surface plate holder is 20. The 33 rotation mechanism is driven to rotate while holding the fixed surface plate. 34. 35 with respect to the rotation drive mechanism fixed side. 35. The rotation side of the rotary drive mechanism rotates. The rotation drive mechanism rotation side is connected to the 20. platen holding part through 20. Since it is fixed to the fixed upper board, 39. The surface plate holder is 20. By rotating the 33 rotation mechanism while holding the fixed surface plate, 20. 9. For fixed surface plate The movable stage rotates. 31. 9. Self-step-out recovery mechanism When the predetermined rotational drive of the movable stage is completed, 31. Self-step-out return mechanism and 20. Release the holding of the fixed surface plate, 31. 8. Self-step-out return mechanism. The movable stage returns to the normal XY driving state.

  FIG. End the holding of the platen of the self-step-out return mechanism 31. Self-step-out return mechanism and 20. FIG. 39 is a diagram for releasing contact with a fixed surface plate; 20. According to a predetermined holding method (electromagnetic chuck, vacuum suction, friction holding, etc.) of the surface plate holding part. Release the fixed surface plate. Next, 36. 38. By the vertical drive mechanism. By driving the vertical drive mechanism drive side upward in the Z direction, the 39 surface plate holder is 20. Move away from the fixed upper board. 31. Self-step-out return mechanism is 20. Since there is no contact with the fixed surface plate, 9. The movable stage is 20. Usually, XY driving can be performed on the fixed surface plate.

  In the surface plate holding and rotating sequence, 31. 20. Self-step-out return mechanism. When holding the fixed upper plate, 36. 38. By the vertical drive mechanism. By driving the vertical drive mechanism drive side downward in the Z direction, the 39 surface plate holding section is moved to 20. Although it was brought into contact with the fixed upper plate, 36. 38. By the vertical drive mechanism. By driving the vertical drive mechanism drive side downward in the Z direction, the 39 surface plate holding section is moved to 20. In the state moved to the vicinity of the fixed upper board, 39. The surface plate holder is a predetermined holding method. A fixed surface plate may be held.

  31 as described above. 8. Using self-step-out recovery mechanism 21 of the movable stage. Using the surface plate holding and rotating sequence for holding and rotating the fixed surface plate, the actual 31. 8. Using self-step-out recovery mechanism FIG. 4 shows a sequence for returning the movable stage from the step-out state. FIG. 8. When an unexpected external force is applied to the movable stage. 8. The movable stage rotates in the ωZ direction with respect to the XY axis. It is the figure which fell into the state where the movable stage stepped out. 9. When the movable stage is rotated in the ωZ direction with respect to the XY axis, the planar pulse motor driving method and the planar Lorentz driving method are both used. The movable stage cannot be moved. Such 9. 9. Normal ωZ rotation angle from the state where the movable stage is out of step. In order to return the movable stage to a driveable state 31. A self-step-out return mechanism is used. 31. 8. With self-step-out recovery mechanism. As the first stage of the movable stage self-return means, 31. 9. 9 movable stages with self-reset return mechanism. Hold and fix the fixed surface plate.

  FIG. 9. 9 movable stages with self-reset return mechanism. It is the figure which fixed and fixed the fixed surface plate, and is 31. like FIG. 3 (B). 36. Self-step-out return mechanism. 19. Drive the 39 surface plate holding part downward in the Z direction by the vertical drive mechanism. Touch the fixed upper plate. 20. 39. Touching the fixed surface plate. The surface plate holder is a predetermined holding method. By holding a fixed surface plate, 9. 31. Move the movable stage. 20. Self-step-out return mechanism. Fix to the fixed surface plate. Next, 31. 8. With self-step-out recovery mechanism. As the second stage of the movable stage self-return means, 31. 20. Self-step-out return mechanism. 8. With the fixed upper board held Rotate the movable stage.

  FIG. 20. Self-step-out return mechanism. 8. With the fixed upper board held It is the figure which rotated the movable stage, and as shown in FIG. The surface plate holder is 20. 34. Hold the fixed surface plate. 35 with respect to the rotation drive mechanism fixed side. As the rotary drive mechanism rotation side rotates, as shown in FIG. 31 of the movable stage. Along with the rotation drive of the self-step-out return mechanism, 9. The movable stage is 20. The fixed platen can be rotated to the normal position. 31. 9. Self-step-out recovery mechanism When the movable stage is rotationally driven, 20. a movable stage rotation angle detection unit (not shown) and a movable stage XY coordinate detection unit (not shown). Step out on the fixed platen 9. Measure the XYωZ coordinates of the movable stage. From the XYωZ coordinates of the movable stage 31. 9. Self-step-out recovery mechanism 20. Determine a rotation angle for rotating the movable stage; 9. At a normal position on the fixed surface plate. Return the movable stage.

  20. Rotation angle detection means of the movable stage and XY coordinate detection means (not shown) of the movable stage. 9. On the fixed surface plate The means for measuring the XYωZ coordinates where the movable stage has stepped out will be described in a later embodiment. Next, 31. 8. With self-step-out recovery mechanism. As the third stage of the movable stage self-return means, 31. 20. Self-step-out return mechanism. Release the holding of the fixed surface plate, 31. 8. Self-step-out return mechanism. The movable stage returns to the normal XY driving state.

  FIG. 20. Self-step-out return mechanism. Release the holding of the fixed surface plate, 31. 8. Self-step-out return mechanism. It is the figure which returned the movable stage to the state at the time of normal XY drive, and as shown in FIG. End of holding the surface plate of the self-step-out return mechanism 36. The 39 surface plate holder is 20. Move away from the fixed upper plate. 31. 20. Self-step-out return mechanism. 9. At a normal position on the fixed surface plate. 21. return the movable stage; 9. For fixed surface plate 31 of the movable stage. Self-step-out return mechanism is 20. Since there is no contact with the fixed surface plate, 9. The movable stage is 20. Usually, XY driving can be performed on the fixed surface plate. By the sequence as described above, 31. 8. Using self-step-out recovery mechanism It is possible to return the movable stage from the step-out state.

  FIG. 5 is an enlarged view of the self-step-out return mechanism in the second embodiment. 31 in the second embodiment. The self-step-out return mechanism is the same as that of the first embodiment 31. The configuration is substantially the same as that of the self-step-out return mechanism, and 31. of the first embodiment. The change from the self-step-out return mechanism is the 31. 36. Self-step-out return mechanism. The vertical drive mechanism has an air cylinder, a linear motion motor, etc. as a drive source. Self-step-out return mechanism 40. The vertical mechanism is configured not to have a drive source.

  40 in the second embodiment. By vertical mechanism 39. As the up-and-down method of the platen holding part, as shown in FIG. 20. Place the platen holder In order to hold at the upper position away from the fixed surface plate, 40. 41. Using the tension of 43 springs configured inside the vertical mechanism 41. The 42 vertical mechanism movable side is pressed against the vertical mechanism fixed side. 40. By using the force of 43 springs configured inside the vertical mechanism, 40. The vertical mechanism is 39. The platen holding part can be stably held in the upper stage. 39. 20. Place the platen holder In order to hold and fix to the fixed upper board, 20. 20 of the surface plate holder. Force for adsorbing the fixed upper plate, ie 20. A surface plate holding unit; Using the electromagnetic adsorption force or vacuum adsorption force generated between the fixed upper plate and the 39 surface plate holder, the 39 surface plate holder moves downward. Hold and fix to the fixed surface plate. 20. 20 of the surface plate holder. If the force to attract the fixed upper plate is released, 40. 39. By the force of 43 springs configured inside the vertical mechanism. The platen holder can be moved upward and can be stably held in the upper stage.

  In this way 39. 20 of the surface plate holder. Using the force to adsorb the fixed upper plate, 39. 20. Move the platen holding part downward, and It can be held and fixed on the fixed upper board. 31 in the second embodiment. Self-step-out recovery mechanism is 40. Since it is not necessary to supply a power source to the up-and-down mechanism, a simpler configuration 31. 9. Self-step-out recovery mechanism. It is possible to return the movable stage from the step-out state. In the second embodiment, 40. Although the coil spring is configured inside the vertical mechanism, any spring may be used as long as it has a self-restoring force, and a force such as a tension spring, a leaf spring, or an air spring may be used.

  FIG. 6 is an enlarged view of the self-step-out return mechanism in the third embodiment. 31 in the third embodiment. 31 of the first embodiment of the self-step-out return mechanism. The change from the self-step-out return mechanism is the 31. In the self-step-out return mechanism 33. By rotating mechanism 36. Although the vertical drive mechanism was rotated, 31. of the third embodiment. In the self-step-out return mechanism 36. 33. By the vertical drive mechanism. The rotating mechanism is driven up and down. 31 of the third embodiment. 36. Like the self-step-out return mechanism. Vertical drive mechanism and 33. 39. Even if the arrangement of the rotation mechanism is changed. Since the surface plate holder can be driven up and down and rotated, 31. 8. Using the rotation holding mechanism of the self-step-out return mechanism It is possible to return the movable stage from the step-out state.

  FIG. 7 shows that the self-step-out recovery mechanism in the third embodiment is used. 21 of the movable stage. It is a figure showing the surface plate holding | maintenance rotation sequence which hold | maintains and rotates a fixed surface plate. As shown in FIG. When the movable stage is normally XY driven, 36. By vertical drive mechanism 39. The platen holding part is fixed upward. FIG. 36. By the self-step-out return mechanism. The 39 surface plate holder is moved by the vertical drive mechanism. Contact with the fixed upper plate, 39. The surface plate holder is a predetermined holding method (electromagnetic chuck, vacuum suction, friction holding, etc.). Hold the fixed surface plate. As shown in FIG. 20. Self-step-out return mechanism. Rotation drive is performed while holding the fixed upper plate.

  9. The movable stage is 20. Since it is fixed to the fixed upper board, 9. The movable stage is 20. Rotates relative to the fixed surface plate. FIG. 36. Release the holding of the platen of the self-step-out return mechanism. The 39 surface plate holder is moved upward in the Z direction by the vertical drive mechanism. As described above, in the third embodiment, 31. 8. Using self-step-out recovery mechanism 21 of the movable stage. Since the surface plate holding and rotating sequence for holding and rotating the fixed surface plate can be performed, 31. 8. Using self-step-out recovery mechanism It is possible to return the movable stage from the step-out state.

  FIG. 8 shows a schematic diagram of a twin stage semiconductor exposure apparatus. The twin stage semiconductor exposure system is the original version. 3. Hold the reticle. 2. reticle stage; 5. Irradiate exposure light on reticle. 1. Illumination system part is exposed 1. Hold the wafer. Wafer stage, 3. 1. Exposure light from the reticle at a predetermined magnification 4. Project onto wafer Projection optical system, 1. Measure the alignment mark on the wafer and the reference mark on the stage. In-wafer alignment and 2. wafer and 7. Align between reticles 6. Alignment optical system, holding each component from floor via vibration isolation means The main body structure and the basic configuration are the same as those of the exposure apparatus of the conventional example, but the 2. stage of the twin stage semiconductor exposure apparatus in the fourth embodiment. 44 on the wafer stage. Movable stage 1 and 45. There are two movable stages, movable stage 2.

  2. 44 on the wafer stage. Movable stage 1 and 45. By disposing the movable stage 2, the wafer exposure process and the wafer alignment process in the semiconductor exposure sequence can be performed in parallel, so that the wafer exposure process and the wafer alignment can be performed in the conventional manner. The processing speed of the entire apparatus can be improved as compared with the method in which the processing to be performed is performed in series. 1. The twin stage semiconductor exposure apparatus. 44. By applying a planar motor drive system to the wafer stage, Movable stage 1 and 45. The movable stage 2 can be independently and freely driven.

  FIG. 9 is a view showing a twin flat motor stage constituting the self-step-out returning mechanism in the fourth embodiment. The twin flat motor stage of FIG. Movable stage 1 and 45. The movable stage 2 is driven, and the driving method may be either a flat pulse motor driving method or a flat Lorentz motor driving method. In FIG. 7, the exposure side on the left side in the figure is 5. The wafer is exposed by the projection optical system, and 8. on the right alignment side in the figure. By alignment optical system Perform wafer alignment processing; 44. Movable stage 1 and 45. The movable stage 2 performs exposure processing and alignment processing in parallel. 44. When each processing is completed. Movable stage 1 and 45. Replace movable stage 2 and The movable stage after the wafer alignment process is completed. 1. Perform wafer exposure processing; The movable stage after the wafer exposure process is completed by a wafer transfer system (not shown). Newly supplied by collecting and supplying wafers. Wafer alignment processing is performed. By repeating this sequence, the wafer exposure process is continuously performed.

  The twin flat motor stage is 44. Movable stage 1 and 45. A plurality of 22 for measuring the position of the movable stage 2. X interferometer and 25. 21. Place Y, ωZ interferometer, X interferometer and 25. Interferometer measurement light of Y, ωZ interferometer is 44. Movable stage 1 and 45. 44. In the entire driving range of the movable stage 2, 44. Movable stage 1 and 45. It is configured to irradiate the X and Y bar mirrors of the movable stage 2. 46. For supplying power cables, signal cables, pneumatic piping, coolant piping, etc. The mounting cable bear 1 is 44. On the movable stage 1, 48. The mounting cable bear 2 is 45. It is connected to the movable stage 2. 44. Movable stage 1 and 45. 46. In the entire driving range of the movable stage 2. Mounting cable bear 1 and 48. In order to securely connect the mounting cable bear to the movable stage in a state where the mounting cable bear 2 is not stressed, 44. Following the drive of the movable stage 1 47. The mounting cable driving unit 1 follows and drives, 45. The 49-mounted cable drive unit 2 performs follow-up driving for driving the movable stage 2.

  In the twin planar motor stage having the above-described configuration, 44. Movable stage 1 and 45. The movable stage 2 has one self-step-out return mechanism for each movable stage. 44. 50 with respect to the movable stage 1. Self-step-out return mechanism 1 and 45. 51 with respect to the movable stage 2. 8. By configuring the self-step-out return mechanism 2, an unexpected external force is applied to each movable stage. 8. The movable stage rotates in the ωZ direction with respect to the XY axis. Even if the movable stage falls out of step, it becomes possible to return the movable stage from the step-out state using the self-step-out return mechanism by the sequence in the embodiment as described above. .

  In this embodiment, one self-step-out return mechanism is configured for each movable stage, but a plurality of self-step-out return mechanisms may be configured for each movable stage. In this embodiment, two movable stages are configured on the planar motor stage. However, two or more movable stages are configured on the planar motor stage, and one or more self-step-out return mechanisms are provided on each movable stage. By configuring, the movable stage can be returned from the step-out state.

  In the above embodiment, the self-step-out return mechanism is used. Although the configuration and method for returning the movable stage from the step-out state have been described, 31. 9. Self-step-out recovery mechanism When the movable stage returns from the step-out state, the movable stage rotation angle detection means 20. Step out on the fixed platen 9. Measure the ωZ coordinate of the movable stage. From the ωZ coordinate of the movable stage 31. 9. Self-step-out recovery mechanism. It is necessary to determine the rotation angle for rotating the movable stage.

  9. In addition to the ωZ coordinate of the movable stage, the movable stage XY coordinate detection means 20. Step out on the fixed platen 9. If the XY coordinates of the movable stage can also be measured, 31. 9. Self-step-out recovery mechanism. 9. When rotating the movable stage The rotational trajectory of the movable stage can also be calculated. 9. If the rotation trajectory of the movable stage can be recognized, 9. 8. It is possible to determine the presence or absence of interfering objects on the rotation trajectory of the movable stage, and use the self-step-out recovery mechanism more safely. It is possible to return the movable stage from the step-out state.

  Therefore, a self-step-out recovery mechanism is used. An embodiment of the movable stage rotation angle detecting means and the movable stage XY coordinate detecting means used when the movable stage is returned from the step-out state will be described.

  FIG. 10 is a diagram showing a movable stage rotation angle detection method in the fifth embodiment. FIG. 10A is a schematic view of a planar motor stage, and the configuration of the planar motor stage is the same as that of the planar motor in the first embodiment. The rotation angle detection mechanism in this embodiment is 9. 29. Connection between the movable stage and the actual cable track. Configure the movable side mounting cable connection.

  FIG. 8. It is an enlarged view of a movable side mounting cable connection part (B part), Connected to movable stage 53. Movable stage side flange plate and 28. 52. Connected to mounting cable carrier 54. Install the cable carrier flange plate. The connection is slidable in the ωZ direction via the bearing. 52. 53. Cable bear side flange plate; In order to detect the rotation angle in the ωZ direction of the movable stage side flange plate 55. Install the encoder. With the above configuration, 52. 53. Cable bear side flange plate; The movable stage side flange is rotatable in the ωZ direction, and 55. Since the encoder is configured, 52. 53. For cable carrier flange plate The rotation angle of the movable stage side flange in the ωZ direction is detected.

  FIG. 11 shows a step-out using the movable stage rotation angle detecting means in the fifth embodiment. It is a figure showing the method to detect rotation angle (theta) of the ωZ direction of a movable stage. FIG. FIG. 9 is a diagram illustrating a state in which the movable stage is normally driven; 8. The movable stage is driven at a normal rotation angle in the ωZ direction parallel to the XY axis direction. Connect to movable stage 53. The movable stage side flange plate is also held at a normal rotation angle in the ωZ direction parallel to the XY axis direction.

  28. 8. Mount the cable carrier while maintaining the normal rotation angle in the ωZ direction parallel to the XY axis. Since it follows the movable stage, 28. Connect to the mounting cable carrier 52. The cable bearer side flange plate is also held at a normal rotation angle in the ωZ direction parallel to the XY axis direction. 53. 52. movable stage side flange plate; What is the cable carrier flange plate? 8. It is slidably connected in the ωZ direction via a bearing. In a state where the movable stage is normally driven, 53. 52. movable stage side flange plate; The cable bearer side flange plate is maintained at a normal rotation angle in the ωZ direction parallel to the XY axis direction.

  FIG. FIG. 9 is a diagram illustrating a state in which the movable stage is stepped out by the rotation angle θ in the ωZ direction; Connect to movable stage 53. The movable stage side flange plate is 9. As the movable stage rotates, it rotates by the rotation angle θ in the ωZ direction. 52. movable stage side flange plate; 54. Install the cable carrier flange plate. Since it is slidably connected in the ωZ direction through the bearing, 28. Connect to the mounting cable carrier 52. The cable carrier flange plate is 53. The normal rotation angle in the ωZ direction parallel to the XY axis direction, which is the same rotation angle in the ωZ direction as in the normal conveyance state, is maintained without accompanying the rotation of the movable stage side flange plate.

  This 53. 52. movable stage side flange plate; The rotation angle θ in the ωZ direction of the cable carrier side flange plate is set to 55. 9. By detecting with an encoder, the normal ωZ direction rotation angle parallel to the XY axis direction is detected. The rotation angle θ in the ωZ direction of the movable stage can be detected. 8. Detected by the movable stage rotation angle detection method Only the rotation angle θ in the ωZ direction of the movable stage 31. 9. Self-step-out recovery mechanism By rotating the movable stage, 9. Since the movable stage can return to the normal rotation angle in the ωZ direction from the state in which the movable stage has stepped out in the ωZ direction by the rotation angle θ, 9. The movable stage can be returned to the state where the movable stage can be driven at the normal ωZ rotation angle from the state where the movable stage is stepped out in the ωZ direction by the rotation angle θ.

  As described above, the movable stage rotation angle detection method of the fifth embodiment makes it possible to return the movable stage from the step-out state using the self-step-out return mechanism.

  In this embodiment, 9. A movable stage and 28. 8. The rotation angle of the mounted cable track was detected by the encoder. A movable stage and 28. Any rotation angle detection method can be used if the rotation angle or the rotation relationship of the mounted cable carrier is known. A detection method using a linear encoder as a rotation angle detection method, a detection method using a comb tooth and a photo sensor, a comb tooth and a proximity sensor. The detection method used may be used.

  In this embodiment, one 9. Although an embodiment relating to a planar motor stage driven by a movable stage has been described, a plurality of 9. As for the planar motor stage driven by the movable stage, each 9. By incorporating the movable stage rotation angle detection method of the movable stage fifth embodiment, each 9. The position of the movable stage in the ωZ direction can be detected.

  FIG. 12 is a diagram showing a movable stage rotation angle detection method in the sixth embodiment. This embodiment is an embodiment relating to a movable stage rotation angle detection method in a plane pulse motor drive system.

  FIG. 8. Using self-step-out recovery mechanism 31. During the step-out return drive of the movable stage Self-step-out return mechanism 33. It is a figure showing the rotation torque change of a rotation mechanism. 9. From the step-out state where the movable stage rotates in the ωZ direction with respect to the XY axis, the normal ωZ rotation angle is 9. In order to return the movable stage to a driveable state 31. 8. Using self-step-out recovery mechanism The movable stage is rotated so as to have a normal rotation angle in the ωZ direction. 9. When the movable stage approaches the normal rotation angle in the ωZ direction, in the planar pulse motor drive system, 10. 11. Platen part 8. convex part 12, 13 of the movable stage. A detent torque is generated by the attractive force of the X and Y electromagnetic drive units, and the rotational torque of the motor is smaller than the rotational torque of the motor during normal rotation by the self-returning force in the ωZ direction by the detent torque.

  31. 9. Rotation by self-step-out return mechanism When the movable stage is rotated beyond the normal rotation angle in the ωZ direction, the rotational torque of the motor increases more than the rotational torque of the motor during normal rotation due to the self-returning force in the ωZ direction due to the detent torque. 9. When the movable stage is in the normal rotation angle in the ωZ direction, the self-returning force in the ωZ direction due to the detent torque does not work, so the motor rotation torque is equal to the motor rotation torque during normal rotation.

  As described above, in the planar pulse motor driving method, the self-returning force in the ωZ direction due to the detent torque changes. 8. By detecting the rotational torque of the rotation mechanism of the self-step-out recovery mechanism. Since the normal rotation angle in the ωZ direction of the movable stage can be recognized, 9. When the movable stage is out of step in the ωZ direction, the normal rotation angle in the ωZ direction is 9. It is possible to return to a state where the movable stage can be driven.

  31. 8. detecting a change in rotational torque of the rotation mechanism of the self-step-out return mechanism; When the motor of the rotation mechanism is turned off while the movable stage is in the state where the self-returning force in the ωZ direction due to the detent torque is applied, the self-returning force in the ωZ direction due to the detent torque of the planar pulse motor drive system is automatically set to 9. The movable stage returns to the normal rotation angle in the ωZ direction.

  9. The state where the self-returning force in the ωZ direction by the detent torque is acting on the movable stage is 9. 8. The movable stage may approach the normal rotation angle in the ωZ direction, and the rotational torque of the motor may be smaller than the rotational torque of the motor during normal rotation due to the self-returning force in the ωZ direction due to detent torque. The movable stage may be rotated beyond the normal rotation angle in the ωZ direction, and the rotational torque of the motor may be higher than the rotational torque of the motor during normal rotation due to the self-returning force in the ωZ direction due to the detent torque.

  In this way, the self-step-out return mechanism is used by the movable stage rotation angle detection method of the sixth embodiment. It is possible to return the movable stage from the step-out state.

  In this embodiment, one 9. Although an embodiment relating to a planar motor stage driven by a movable stage has been described, a plurality of 9. As for the planar motor stage driven by the movable stage, each 9. By incorporating the movable stage rotation angle detection method of the movable stage sixth embodiment, each 9. The position of the movable stage in the ωZ direction can be detected.

  FIG. 13 is a diagram showing a movable stage rotation angle detection method and a movable stage XY coordinate detection method in the seventh embodiment. The present embodiment relates to a movable stage rotation angle detection method and a movable stage XY coordinate detection method in a planar Lorentz motor drive system.

  FIG. 8. Using self-step-out recovery mechanism FIG. 6 is a top view of a planar motor stage of a planar Lorentz motor driving method during a step-out return driving of the movable stage. 9. From the step-out state where the movable stage rotates in the ωZ direction with respect to the XY axis, the normal ωZ rotation angle is 9. In order to return the movable stage to a driveable state 31. 8. Using self-step-out recovery mechanism The movable stage is rotated so as to have a normal rotation angle in the ωZ direction. 9. When the movable stage is rotated in the ωZ direction, 9. 15. Arranged on a movable stage. 19. Arranged on magnet group and fixed surface plate. Since the positional relationship changes between the coil portions, 9. 15. Arranged on a movable stage. Back electromotive force is generated in the coil portion corresponding to the magnet group.

  In the planar motor stage of FIG. 15. A movable stage is arranged. 56 corresponding to the magnet group. X. back electromotive force generating coil; 8. Coil the Y back electromotive force generating coil. A counter electromotive force is generated along with the rotation of the movable stage. Therefore 31. 8. Using self-step-out recovery mechanism 56. Back electromotive force is generated as the movable stage rotates. X. back electromotive force generating coil; By recognizing the position of the Y back electromotive force generating coil, 9. 19. The movable stage is on the fixed surface plate. It is possible to recognize where the coil portion is. In the above manner, 31. 8. Using self-step-out recovery mechanism By recognizing the position of the coil where the back electromotive force is generated with the rotation of the movable stage, the movable stage XY coordinates can be detected.

  9. 8. As the movable stage approaches the normal rotation angle in the ωZ direction, 15. Arranged on a movable stage. Since the number of coils corresponding to the magnet group decreases, 9. 56. Back electromotive force is generated as the movable stage rotates. X. back electromotive force generating coil; 56. The number of Y back electromotive force generating coils decreases and back electromotive force is generated X. back electromotive force generating coil; The number of Y back electromotive force generating coils is 9. The minimum is when the movable stage is at a normal rotation angle in the ωZ direction.

  Therefore 31. 8. Using self-step-out recovery mechanism 56. Back electromotive force is generated as the movable stage rotates. X. back electromotive force generating coil; By recognizing the number of Y back electromotive force generating coils, 9. 8. How much the movable stage has a rotation angle on the fixed surface plate, It is possible to recognize which rotation angle is the normal rotation angle of the movable stage in the ωZ direction. In the above manner, 31. 8. Using self-step-out recovery mechanism The rotational angle of the movable stage can be detected by recognizing the number of coils that generate counter electromotive force as the movable stage rotates.

  As described above, the self-step-out recovery mechanism is used by the movable stage XY coordinate detection method and the movable stage rotation angle detection method in the seventh embodiment. It is possible to return the movable stage from the step-out state.

  In this embodiment, 9. 8. The rotational angle of the movable stage was detected by recognizing the number of coils that generate back electromotive force as the movable stage rotates. The rotational angle of the movable stage may be detected by detecting the magnitude of the back electromotive force of the coil generated with the rotation of the movable stage.

  9. 8. Corresponds to one coil as the movable stage approaches the normal rotation angle in the ωZ direction. 15. Arranged on a movable stage. As the number of magnet groups increases, the back electromotive force generated in the coil increases. 9. 8. By recognizing the magnitude of the back electromotive force of the coil generated as the movable stage rotates. It is possible to recognize which rotation angle is the normal rotation angle of the movable stage in the ωZ direction. In addition, 9. 31. A regenerative brake that works between the coil and magnet that is proportional to the counter electromotive force of the coil that occurs as the movable stage rotates. By detecting using the rotational torque change of the rotation mechanism of the self-step-out return mechanism, 9. It is possible to recognize which rotation angle is the normal rotation angle of the movable stage in the ωZ direction.

  In this embodiment, one 9. Although an embodiment relating to a planar motor stage driven by a movable stage has been described, a plurality of 9. As for the planar motor stage driven by the movable stage, each 9. By incorporating the movable stage rotation angle detection method and the movable stage XY coordinate detection method of the movable stage seventh embodiment, each 9. The position of the movable stage in the XYωZ direction can be detected.

  FIG. 14 is a diagram showing a movable stage rotation angle detection method and a movable stage XY coordinate detection method in the eighth embodiment. FIG. 14 is a schematic diagram of the movable stage rotation angle detection mechanism and the movable stage XY coordinate detection mechanism of the planar motor stage, and the configuration of the planar motor stage is the same as that of the planar motor in the first embodiment. In the movable stage rotation angle detection method and the movable stage XY coordinate detection method in this embodiment, 58. On the side parallel to the X axis of the movable stage. 8. arrange X linear light receiving element; 59 on the side parallel to the Y axis of the movable stage. A Y linear light receiving element is disposed.

  In addition, 9. 58 of the movable stage. 60. perpendicular to the X-axis direction toward the X linear light receiving element X irradiation with measurement light 62. 64. The X light projecting unit can be driven parallel to the X-axis direction. Arranged on the X movable body, 62. By driving the X light projecting unit in the X-axis direction, 9. 8. Over the entire driving range of the movable stage 58 of the movable stage. 60 for the X linear light receiving element. X measurement light can be irradiated. Similarly, outside the planar motor stage, 9. 59 of the movable stage. Perpendicular to the Y-axis direction toward the Y linear light receiving element 61. Irradiate Y measurement light The Y light projecting unit can be driven parallel to the Y-axis direction. Arranged on the Y movable body, 63. By driving the Y light projecting portion in the Y-axis direction, 9. 8. Over the entire driving range of the movable stage 59 of the movable stage. 61. For Y linear light receiving element. Y measurement light can be irradiated.

  15 shows a step-out in the ωZ direction by the rotation angle θ using the movable stage rotation angle detection method and the movable stage XY coordinate detection method in the eighth embodiment. It is a figure showing the method of detecting the position of the movable stage of XYωZ direction. 8. Step out of rotation angle θ in ωZ direction. In order to measure the position of the movable stage in the XYωZ direction, 64. 8. Move the X movable body in the X-axis direction. Scan across the entire driving range of the movable stage 62. 60. Irradiated from X light projecting section. X measurement light 58. Light is received by an X linear light receiving element; 62. X light projection part is 60. X coordinates X1 irradiated with X measurement light, and 62. X light projecting unit irradiated at X coordinate X1 position 60. Receive X measurement light 58. The measurement position XL1 of the X linear light receiving element is measured.

  Similarly, 65. 8. Move the Y movable body in the Y-axis direction. Scan across the entire driving range of the movable stage 63. 61. Irradiation from Y light projecting unit Y measurement light 59. Light is received by the Y linear light receiving element; Y light projecting part is 61. Y coordinates Y1, Y2, and 63. irradiated with Y measuring light. 61. Y light projecting unit irradiates at Y coordinate Y1, Y2 position Receive Y measurement light 59. Measurement positions YL1 and YL2 of the Y linear light receiving element are measured.

  8. Step out by the rotation angle θ in the ωZ direction using the measurement result measured as described above. The position of the movable stage in the XYωZ direction is calculated. 9. The rotational angle θ in the ωZ direction of the movable stage is 61. Distance Y2-Y1 between Y coordinates Y1, Y2 irradiated with Y measurement light; 61 irradiated by Y light projecting unit. Receive Y measurement light 59. It can be uniquely calculated from a trigonometric function using the distances YL2 to YL1 between the measurement positions YL1 and YL2 of the Y linear light receiving element.

  9. The XY coordinates of the movable stage were calculated earlier. A rotation angle θ of the movable stage in the ωZ direction, 62. X light projection part is 60. X coordinates X1 irradiated with X measurement light, and 62. X light projecting unit irradiated at X coordinate X1 position 60. Receive X measurement light 58. Measurement position XL1 of the X linear light receiving element; Y light projecting part is 61. Y coordinates Y1 irradiated with Y measurement light, and 63. 61. Y light projecting unit irradiates at Y coordinate Y1 position Receive Y measurement light 59. It can be uniquely calculated using the measurement position YL1 of the Y linear light receiving element.

  As described above, it was measured by the movable stage rotation angle detection method of the eighth embodiment. Only the rotation angle θ in the ωZ direction of the movable stage 31. 9. Self-step-out recovery mechanism By rotating the movable stage, 9. It is possible to return to the normal rotation angle in the ωZ direction from the state where the movable stage has stepped out in the ωZ direction by the rotation angle θ. Further, it was measured by the movable stage XY coordinate detecting means of the eighth embodiment. Depending on the XY coordinates of the movable stage, 31. 9. Self-step-out recovery mechanism. 9. When rotating the movable stage Since the rotation trajectory of the movable stage can also be calculated, 9. 8. It is possible to determine the presence or absence of interfering objects on the rotation trajectory of the movable stage, and use the self-step-out recovery mechanism more safely. It is possible to return the movable stage from the step-out state.

  In this embodiment, 9. By measuring one point in the X-axis direction and two points in the Y-axis direction of the movable stage, 9. 8. The position of the movable stage in the XYωZ direction was calculated. Similarly, measuring 2 points in the X-axis direction and 1 point in the Y-axis direction of the movable stage. The position of the movable stage in the XYωZ direction can be calculated. 9. By measuring a plurality of points in the X-axis direction and a plurality of points in the Y-axis direction of the movable stage, 9. 8. When the position of the movable stage in the XYωZ direction is measured, each measurement error can be averaged, so that the accuracy is higher. It is possible to calculate the position of the movable stage in the XYωZ direction.

  In this embodiment, 9. 58. On the movable stage. X linear light receiving element and 59. 8. arrange Y linear light receiving element; By measuring one point in the X-axis direction and two points in the Y-axis direction of the movable stage, 9. The position of the movable stage in the XYωZ direction has been calculated. However, as shown in FIG. 66. One light receiving element on the side surface parallel to the X axis of the movable stage. 8. arrange X light receiving element; 67. Two light receiving elements on the side surface parallel to the Y axis of the movable stage Y light receiving elements 1 and 68. Even if the Y light receiving element 2 is configured, 62. The X light projecting unit is 63. 8. The Y floodlight scans in the Y direction. Since one point can be measured in the X-axis direction and two points in the Y-axis direction of the movable stage, 9. The position of the movable stage in the XYωZ direction can be calculated.

  Similarly, 9. 66. One light receiving element on the side surface parallel to the X axis of the movable stage. 8. arrange X light receiving element; 59 on the side parallel to the Y axis of the movable stage. Even if the Y linear light receiving element is configured, 62. The X light projecting unit is 63. 8. The Y floodlight scans in the Y direction. Since one point can be measured in the X-axis direction and two points in the Y-axis direction of the movable stage, 9. The position of the movable stage in the XYωZ direction can be calculated.

  In this embodiment, 9. 58. On the movable stage. X linear light receiving element and 59. 62. arrange a Y linear light receiving element; The X light projecting unit is 63. When the Y light projecting unit scans in the Y direction, 9. By measuring one point in the X-axis direction and two points in the Y-axis direction of the movable stage, 9. The position of the movable stage in the XYωZ direction has been calculated. However, as shown in FIG. X projecting section and a plurality of 63. 8. Place Y light projecting section, 58 of the movable stage. X linear light receiving element and 59. 62. For the Y linear light receiving element. X light projecting unit and 63. The measurement light from the Y floodlight is 58. One or more points for the X linear light receiving element, 59. The same effect can be obtained even if the Y linear light receiving element is always irradiated with two or more points. Even in the above configuration, 9. Since one point can be measured in the X-axis direction and two points in the Y-axis direction of the movable stage, 9. The position of the movable stage in the XYωZ direction can be calculated.

  In this embodiment, one 9. Although an embodiment relating to a planar motor stage driven by a movable stage has been described, a plurality of 9. As for the planar motor stage driven by the movable stage, each 9. By incorporating the movable stage rotation angle detection method and the movable stage XY coordinate detection method of the movable stage eighth embodiment, The position of the movable stage in the XYωZ direction can be detected.

  FIG. 18 is a diagram showing a movable stage rotation angle detection method and a movable stage XY coordinate detection method in the ninth embodiment. FIG. 14 is a schematic diagram of a movable stage rotation angle detection method and a movable stage XY coordinate detection method for a planar motor stage, and the configuration of the planar motor stage is the same as that of the planar motor in the first embodiment. In the movable stage rotation angle detection method and the movable stage XY coordinate detection method in this embodiment, Two or more issuing elements are arranged on the movable stage. 9. 71. The entire drive range of the movable stage can be imaged. A 70.2-dimensional light receiving element having an imaging region is arranged.

  8. Step out by the rotation angle θ in the ωZ direction using the movable stage rotation angle detection method and the movable stage XY coordinate detection method in the ninth embodiment. A method for detecting the position of the movable stage in the XYωZ direction is as follows. 8. Step out of rotation angle θ in ωZ direction. In order to measure the XYωZ position of the movable stage, 9. Two 69 on the movable stage. Light was emitted from the light-emitting element; The position of the light emitting element is measured with a 70.2-dimensional light receiving element. 9. The rotational angle θ in the ωZ direction of the movable stage is two 69. It can be uniquely calculated from the inclination from the straight line connecting the light emitting elements and the inclination of the 70.2-dimensional light receiving element with respect to the measurement standard. 9. The XY coordinates of the movable stage are two 69. with respect to the measurement reference of the 70.2-dimensional light receiving element. It can be calculated uniquely depending on the position of the light emitting element.

  As described above, it was measured by the movable stage rotation angle detection method of the ninth embodiment. Only the rotation angle θ in the ωZ direction of the movable stage 31. 9. Self-step-out recovery mechanism By rotating the movable stage, 9. It is possible to return to the normal rotation angle in the ωZ direction from the state where the movable stage has stepped out in the ωZ direction by the rotation angle θ. Further, it was measured by the movable stage XY coordinate detecting means of the eighth embodiment. Depending on the XY coordinates of the movable stage, 31. 9. Self-step-out recovery mechanism. 9. When rotating the movable stage Since the rotation trajectory of the movable stage can also be calculated, 9. 8. It is possible to determine the presence or absence of interfering objects on the rotation trajectory of the movable stage, and use the self-step-out recovery mechanism more safely. It is possible to return the movable stage from the step-out state.

  In this embodiment, 9. Two 69. on the movable stage. The light emitting element is arranged, and two 69. It calculated by measuring the position of a light emitting element with a 70.2-dimensional light receiving element. However, as shown in FIG. One on the movable stage 69. One light emitting element and one 72. Even if a linear light emitting element is disposed, the same effect can be obtained. Even in the above configuration, 9. One on the movable stage 72. 8. The inclination of the linear light emitting element with respect to the measurement reference of the 70.2-dimensional light receiving element 8. Calculate the rotation angle θ of the movable stage in the ωZ direction; The XY coordinates of the movable stage are 69. with respect to the measurement reference of the 70.2-dimensional light receiving element. One light emitting element and one 72. It can be calculated from the position of the linear light emitting element.

  In this embodiment, 9. 69 of the movable stage. The position of the light emitting element was detected by the 70.2 dimensional light receiving element. 69 on the movable stage. As long as the position of the light emitting element can be detected two-dimensionally, the 70.2-dimensional light receiving element may be a two-dimensional CMOS sensor, a two-dimensional CCD sensor, or the like. By scanning the entire surface of the movable stage drive range, 9. 69 on the movable stage. The position of the light emitting element may be detected. In addition, one 70.2-dimensional light receiving element is used for 9. Although the movable stage drive range was detected, a plurality of 70.2-dimensional light receiving elements were used to perform 9. 8. Detect within movable stage drive range, The position of the movable stage in the XYωZ direction may be detected.

  In this embodiment, one 9. Although an embodiment relating to a planar motor stage driven by a movable stage has been described, a plurality of 9. As for the planar motor stage driven by the movable stage, each 9. By incorporating the movable stage rotation angle detection method and the movable stage XY coordinate detection method of the movable stage ninth embodiment, The position of the movable stage in the XYωZ direction can be detected.

  9. In the tenth embodiment A method for performing the movable stage rotation angle detection method and the movable stage XY coordinate detection method of the movable stage will be described below. This embodiment is an embodiment relating to a movable stage rotation angle detection method and a movable stage XY coordinate detection method in a plane pulse motor drive system.

  The configuration of the planar motor stage in the tenth embodiment is the same as that of the planar motor in the first embodiment. 9. A convex part detection mechanism for detecting the convex part of the platen part is provided on the movable stage. 9. 8. During movable stage drive, and 8. An unexpected external force is applied to the movable stage. Even when the movable stage rotates in the ωZ direction, the number of convex portions of the platen portion is measured by the convex portion detecting mechanism, and the number of convex portions of the platen portion detected by the convex portion detecting mechanism of the platen portion is calculated according to 9. The position of the movable stage in the XYωZ direction is estimated.

  As described above, it was measured by the movable stage rotation angle detection method of the ninth embodiment. Only the rotation angle θ in the ωZ direction of the movable stage 31. 9. Self-step-out recovery mechanism By rotating the movable stage, 9. It is possible to return to the normal rotation angle in the ωZ direction from the state where the movable stage has stepped out in the ωZ direction by the rotation angle θ.

  Further, it was measured by the movable stage XY coordinate detecting means of the eighth embodiment. Depending on the XY coordinates of the movable stage, 31. 9. Self-step-out recovery mechanism. 9. When rotating the movable stage Since the rotation trajectory of the movable stage can also be calculated, 9. 8. It is possible to determine the presence or absence of interfering objects on the rotation trajectory of the movable stage, and use the self-step-out recovery mechanism more safely. It is possible to return the movable stage from the step-out state.

  As long as the convex part detection mechanism for detecting the convex part of the platen part can detect the convex part of the platen part, any convex part method of the platen part may be used. A convex detecting mechanism may be used.

  In this embodiment, one 9. Although an embodiment relating to a planar motor stage driven by a movable stage has been described, a plurality of 9. As for the planar motor stage driven by the movable stage, each 9. By incorporating the movable stage rotation angle detection method and the movable stage XY coordinate detection method of the movable stage ninth embodiment, The position of the movable stage in the XYωZ direction can be detected.

  In the fifth to tenth embodiments, the movable stage rotation angle detection method and the movable stage XY coordinate detection method are described as independent methods. However, the movable stage rotation angle detection and the movable stage are combined with each other. 8. High accuracy by detecting XY coordinates Since the position of the movable stage can be detected, 31. 8. Using self-step-out recovery mechanism It is possible to return the movable stage from the step-out state.

BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1A is a plan view of a self-step-out returning mechanism of a planar motor stage according to a first embodiment of the present invention, and FIG. It is an enlarged view of the self-step-out return mechanism according to the first embodiment. (A) (B) (C) (D) It is a figure showing the surface plate holding | maintenance rotation sequence which hold | maintains and rotates the fixed surface plate of a movable stage using a self-step-out return mechanism. (A) (B) (C) (D) It is a figure showing the return sequence from the step-out state of the movable stage using the self-step-out return mechanism. (A) (B) It is an enlarged view of the self-step-out return mechanism in 2nd Example. It is an enlarged view of the self-step-out return mechanism in the third embodiment. (A) (B) (C) (D) The self-step-out recovery mechanism in the third embodiment was used. 21 of the movable stage. It is a figure showing the surface plate holding | maintenance rotation sequence which hold | maintains and rotates a fixed surface plate. It is the schematic of a twin stage semiconductor exposure apparatus. It is a figure showing the twin plane motor stage which comprised the self-step-out return mechanism in 4th Example. (A) (B) It is a figure showing the movable stage rotation angle detection method in 5th Example. (A) (B) Step out using the movable stage rotation angle detection means in the fifth embodiment. It is a figure showing the method of detecting rotation angle (theta) of the ωZ direction of a movable stage. It is a figure showing the movable stage rotation angle detection method in 6th Example. It is a figure showing the movable stage rotation angle detection method and movable stage XY coordinate detection method in 7th Example. It is a figure showing the movable stage rotation angle detection method and movable stage XY coordinate detection method in 8th Example. 8. Step out by the rotation angle θ in the ωZ direction using the movable stage rotation angle detection method and the movable stage XY coordinate detection method in the eighth embodiment. It is a figure showing the method of detecting the position of XYωZ direction of a movable stage. It is a figure which shows another example of the movable stage rotation angle detection method and movable stage XY coordinate detection method in 8th Example. It is a figure which shows another example of the movable stage rotation angle detection method and movable stage XY coordinate detection method in 8th Example. It is a figure showing the movable stage rotation angle detection method and movable stage XY coordinate detection method in 9th Example. It is a figure which shows another example of the movable stage rotation angle detection method in 9th Example, and the movable stage XY coordinate detection method. It is a figure showing the conventional semiconductor exposure apparatus. FIG. 2A is a schematic diagram of a planar pulse motor driving method, FIG. 3A is a top view of a planar pulse motor driving method, and FIG. It is the figure showing the schematic of an example of a plane Lorentz motor drive system.

Explanation of symbols

1. Wafer 2. 2. Wafer stage Reticle4. Reticle stage5. 5. Projection optical system 6. Illumination system Main body structure 8. 8. Alignment optical system Movable stage 10. Platen section 11. Convex part 12. X electromagnetic drive unit 13. Y electromagnetic drive unit 14. Resin 15. Magnet group 16. X thrust generating coil 17. Y thrust generating coil 18. ωZ thrust generating coil 19. Coil unit 20. Fixed surface plate 21. X bar mirror 22. X interferometer 23. X interferometer measurement light 24. Y bar mirror 25. Y, ωZ interferometer 26. Y interferometer measurement light 27. ωZ interferometer measurement light 28. Mounting cable bear 29. Movable side mounting cable connection part 30. Fixed-side mounting cable connection part 31. Self-step-out return mechanism 32. Self-detuning return mechanism flange portion 33. Rotating mechanism 34. Rotation mechanism fixed side 35. Rotation mechanism rotation side 36. Vertical drive mechanism 37. Vertical drive mechanism fixed side 38. Vertical drive mechanism drive side 39. Surface plate holder 40. Vertical mechanism 41. Vertical mechanism fixed side 42. Vertical mechanism movable side 43. Spring 44. Movable stage 1
45. Movable stage 2
46. Mounting cable bear 1
47. Mounting cable drive 1
48. Mounting cable bear 2
49. Mounting cable drive 2
50. Self-step-out recovery mechanism 1
51. Self-step-out recovery mechanism 2
52. Cable bear side flange plate 53. Movable stage flange plate 54. Bearing 55. Encoder 56. X back electromotive force generating coil 57. Y back electromotive force generating coil 58. X linear light receiving element 59. Y linear light receiving element 60. X measurement light 61. Y measurement light 62. X light projecting unit 63. Y light projecting unit 64. X movable body 65. Y movable body 66. X light receiving element 67. Y light receiving element 1
68. Y light receiving element 2
69. Light-emitting element 70. Two-dimensional light receiving element 71. Imaging region 72. Linear light emitting device

Claims (27)

  1.   In a stage apparatus that drives a stage movable part by a planar motor drive system, a holding mechanism that generates a holding force with respect to a fixed part of the stage apparatus, and a vertical mechanism that linearly moves the holding mechanism in an axial direction perpendicular to the plane. A stage apparatus, comprising: a step-out return mechanism having a rotating mechanism that rotates the holding mechanism about an axis orthogonal to a plane with respect to the stage movable unit.
  2.   In the stage apparatus, the planar motor drive system includes a platen on a flat plate having convex poles provided in a grid pattern along two coordinate axes orthogonal to the fixed part of the stage apparatus, and the stage movable part. 2. The stage apparatus according to claim 1, wherein the stage apparatus is a plane pulse motor drive system in which an electromagnetic drive unit that generates a moving magnetic field is provided on each of orthogonal coordinate axes to move on the platen.
  3.   In the stage apparatus, the planar motor drive system is a planar Lorentz motor drive system in which a coil is disposed in a fixed part of the stage apparatus, a magnet group is disposed in the stage movable part, and the stage movable part is driven by Lorentz force. The stage apparatus according to claim 1, wherein:
  4.   4. The stage apparatus according to claim 1, wherein the stage apparatus has one or more stage movable parts.
  5.   5. The stage device according to claim 1, wherein each of the stage movable parts includes one or more step-out return mechanisms. 6.
  6.   2. The stage device according to claim 1, wherein the holding mechanism that generates a holding force with respect to the fixing portion of the stage device generates a holding force with respect to the fixing portion of the stage device by an electromagnetic force. 5. The stage apparatus according to any one of 5.
  7.   2. The stage device according to claim 1, wherein the holding mechanism that generates a holding force with respect to the fixing portion of the stage device generates a holding force with respect to the fixing portion of the stage device by a vacuum suction force. The stage apparatus in any one of thru | or 5.
  8.   2. The stage device according to claim 1, wherein the holding mechanism that generates a holding force with respect to the fixing portion of the stage device generates a holding force with respect to the fixing portion of the stage device by a frictional force. 5. The stage apparatus according to any one of 5.
  9.   In the stage apparatus, the up-and-down mechanism that linearly moves the holding mechanism in an axial direction orthogonal to a plane brings the holding mechanism into contact with a fixed portion of the stage mechanism when driving the stage movable unit out of step. The stage apparatus according to claim 1, wherein the stage apparatus is close to the vicinity.
  10.   In the stage apparatus, the vertical mechanism that linearly moves the holding mechanism in an axial direction perpendicular to the plane separates the holding mechanism from the fixing portion of the stage mechanism except when the stage movable unit is driven to return to step out. The stage apparatus according to any one of claims 1 to 9, wherein
  11.   In the stage apparatus, the rotation mechanism that rotates the holding mechanism with respect to the stage movable portion about an axis orthogonal to a plane rotates in a state where the holding mechanism generates a holding force with respect to the fixed portion of the stage apparatus. 11. The stage apparatus according to claim 1, wherein step-out recovery is performed by rotating the stage movable unit with respect to the fixed unit of the stage apparatus.
  12.   In the stage apparatus, the rotation mechanism that rotates the holding mechanism with respect to the stage movable part about an axis orthogonal to a plane is based on a measurement result of a measurement mechanism that measures the position of the stage movable part. The stage apparatus according to any one of claims 1 to 11, wherein step-out recovery is performed by rotating the stage movable unit with respect to the fixed unit.
  13.   In the stage device that is a planar pulse motor drive mechanism, the rotation mechanism that rotates the holding mechanism with respect to the stage movable unit about an axis orthogonal to the plane is a measurement result of a measurement mechanism that measures the position of the stage movable unit The stage movable unit is rotated with respect to the fixed unit of the stage device to the vicinity of the step-out return, and the remaining rotation until the step-out return is performed between the convex pole of the fixed unit and the electromagnetic drive unit of the stage movable unit. The stage apparatus according to any one of claims 1 to 12, wherein the stage apparatus is automatically rotated by a magnetic attraction force acting between the two.
  14.   In the stage apparatus, the measuring mechanism that measures the position of the stage movable unit is orthogonal to the plane of the stage movable unit by detecting the inclination of the stage movable unit and the cable bearer connected to the stage movable unit. The stage apparatus according to any one of claims 1 to 13, wherein a rotation amount in an axis to be measured is measured.
  15.   In the stage apparatus that is a planar pulse motor drive mechanism, the measurement mechanism that measures the position of the stage movable unit is a plane pulse motor drive system between the convex pole of the fixed unit and the electromagnetic drive unit of the stage movable unit. The amount of rotation in an axis orthogonal to the plane of the stage movable part is measured by detecting a working magnetic attraction force with the rotational torque of the rotation mechanism. The stage device according to any one of 7, 8, 9, 10, 11, 12, and 13.
  16.   In the stage apparatus that is a planar Lorentz motor drive mechanism, the measurement mechanism that measures the position of the stage movable unit is the reverse of the coil disposed in the fixed unit that is generated when the stage movable unit is rotated by the rotation mechanism. The amount of rotation and the coordinate in the plane direction on an axis orthogonal to the plane of the stage movable part are measured by detecting an electromotive force, and characterized in that: The stage apparatus according to any one of 9, 10, 11, and 12.
  17.   In the stage apparatus that is a planar Lorentz motor drive mechanism, the measurement mechanism that measures the position of the stage movable unit is the reverse of the coil disposed in the fixed unit that is generated when the stage movable unit is rotated by the rotation mechanism. The rotation amount and the coordinate in the plane direction on an axis orthogonal to the plane of the stage movable part are measured according to the number of coils generating an electromotive force. The stage device according to any one of 7, 8, 9, 10, 11, 12, and 16.
  18.   In the stage apparatus that is a planar Lorentz motor drive mechanism, the measurement mechanism that measures the position of the stage movable unit is generated in a coil disposed in the fixed unit that is generated when the stage movable unit is rotated by the rotation mechanism. The amount of rotation and the coordinate in the plane direction on an axis orthogonal to the plane of the stage movable part are measured by the counter electromotive force being applied. , 9, 10, 11, 12, 16, 17.
  19.   In the stage apparatus, the measurement mechanism that measures the position of the stage movable unit arranges a light receiving element on the stage movable unit, and measures the positions of a plurality of measurement lights from outside the stage movable unit with the light receiving element. The stage apparatus according to claim 1, wherein a rotation amount and a coordinate in a plane direction on an axis orthogonal to the plane of the stage movable unit are measured.
  20.   The light receiving element disposed on the stage movable portion of the measurement mechanism has one or more light receiving elements disposed on the first side surface of the stage movable portion, and receives light on a second side surface orthogonal to the first side surface of the stage movable portion. The stage device according to claim 19, wherein two or more elements are arranged.
  21.   The light receiving element disposed on the stage movable portion of the measurement mechanism has one or more linear light receiving elements disposed on the first side surface of the stage movable portion, and receives light on the second side surface orthogonal to the first side surface of the stage movable portion. The stage apparatus according to claim 19, wherein one or more elements are arranged.
  22.   The light receiving element disposed on the stage movable portion of the measurement mechanism has one or more linear light receiving elements disposed on the first side surface of the stage movable portion, and linear light reception on the second side surface orthogonal to the first side surface of the stage movable portion. The stage apparatus according to claim 19, wherein one or more elements are arranged.
  23.   A plurality of measurement lights from the outside of the measurement mechanism are parallel to the first side surface of the stage movable unit and in parallel to the second side surface of the stage movable unit. The stage device according to any one of claims 19 to 22, wherein the light receiving element of the stage movable unit is irradiated by a second light projecting unit that is driven in a single axis direction.
  24.   A plurality of measuring lights from the outside of the measuring mechanism, a plurality of light projecting means arranged so that one or more measuring lights always enter the linear light receiving element on the first side surface of the stage movable unit, The light receiving element of the stage movable part is irradiated by a plurality of light projecting means arranged so that one or more measurement lights always enter the linear light receiving element on the second side surface of the stage movable part. The stage apparatus according to claim 19 or 22, wherein the stage apparatus is characterized in that:
  25.   In the stage apparatus, the measurement mechanism that measures the position of the stage movable unit includes at least one light emitting element disposed on the stage movable unit and arranged to recognize the entire stage movable unit movable region. The rotation amount and the coordinate in the plane direction on an axis orthogonal to the plane of the stage movable unit are measured by measuring the light emitting element on the stage movable unit with the two-dimensional light receiving element. 14. The stage apparatus according to any one of 13 to 13.
  26.   In the stage apparatus, the measuring mechanism for measuring the position of the stage movable unit includes two or more light emitting elements arranged on the stage movable unit, and arranged outside the stage movable unit so that the entire area of the stage movable unit movable region is covered. By scanning the one-dimensional light receiving element in one axial direction so as to be recognized, by measuring the light emitting element on the stage movable unit, the amount of rotation on the axis orthogonal to the plane of the stage movable unit and the plane direction The stage apparatus according to claim 1, wherein coordinates are measured.
  27.   In the stage apparatus which is a planar pulse motor drive mechanism, the measurement mechanism for measuring the position of the stage movable unit is provided with a mechanism for detecting the convex pole of the fixed unit in the stage movable unit, and the detected fixed unit The amount of rotation and the coordinate in the plane direction on an axis orthogonal to the plane of the stage movable part are measured by the number of convex poles, characterized in that, 1, 2, 4, 5, 6, 7, 8, 9, The stage device according to any one of 10, 11, 12, and 13.
JP2005062467A 2005-03-07 2005-03-07 Stage device Withdrawn JP2006245484A (en)

Priority Applications (1)

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006288172A (en) * 2005-04-05 2006-10-19 Mitsutoyo Corp Direct acting apparatus
JP2008145140A (en) * 2006-12-06 2008-06-26 Ushio Inc Magnetic flux sensor, and plane stage equipped with same
JP2011216883A (en) * 2010-03-31 2011-10-27 Asml Netherlands Bv Lithographic apparatus, device manufacturing method, and substrate exchanging method
WO2019017387A1 (en) * 2017-07-20 2019-01-24 Tdk株式会社 Actuator

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006288172A (en) * 2005-04-05 2006-10-19 Mitsutoyo Corp Direct acting apparatus
JP2008145140A (en) * 2006-12-06 2008-06-26 Ushio Inc Magnetic flux sensor, and plane stage equipped with same
JP2011216883A (en) * 2010-03-31 2011-10-27 Asml Netherlands Bv Lithographic apparatus, device manufacturing method, and substrate exchanging method
US8947636B2 (en) 2010-03-31 2015-02-03 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method, and substrate exchanging method
WO2019017387A1 (en) * 2017-07-20 2019-01-24 Tdk株式会社 Actuator

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