JP2006124637A - Polyimide adhesive composition and polyimide adhesive tape - Google Patents

Polyimide adhesive composition and polyimide adhesive tape Download PDF

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JP2006124637A
JP2006124637A JP2005093661A JP2005093661A JP2006124637A JP 2006124637 A JP2006124637 A JP 2006124637A JP 2005093661 A JP2005093661 A JP 2005093661A JP 2005093661 A JP2005093661 A JP 2005093661A JP 2006124637 A JP2006124637 A JP 2006124637A
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polyimide
polyimide adhesive
chemical formula
represented
adhesive
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JP4150011B2 (en
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Gyeong Ho Jang
ホー チャン,キョン
Gwang Mu Kim
クワン ムー キム,
Jeong Min Kwon
ジェオン ミン クェオン,
Gyeong Rok Lee
ロック リー,キュン
Doku Ha Park
ハ パク,ドク
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Saehan Micronics Inc
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    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J179/00Adhesives based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen, with or without oxygen, or carbon only, not provided for in groups C09J161/00 - C09J177/00
    • C09J179/04Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • C09J179/08Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2203/00Applications of adhesives in processes or use of adhesives in the form of films or foils
    • C09J2203/326Applications of adhesives in processes or use of adhesives in the form of films or foils for bonding electronic components such as wafers, chips or semiconductors
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2479/00Presence of polyamine or polyimide
    • C09J2479/08Presence of polyamine or polyimide polyimide
    • C09J2479/086Presence of polyamine or polyimide polyimide in the substrate

Abstract

<P>PROBLEM TO BE SOLVED: To provide a polyimide adhesive composition which excels in insulating properties and heat resistance, improves high temperature adhesion properties, and excels in adhesion properties to a coating layer of mutually different materials formed on a substrate layer, and a polyimide adhesive tape using this polyimide adhesive composition. <P>SOLUTION: The polyimide adhesive composition is constituted of (A) a tetracarboxylic dianhydride, (B) a diamine, (C) a diamine containing a siloxane structure, (D) a polyamino compound of any one kind or in a mixed form of two or more kinds selected from the group consisting of a triamine and a tetraamine, and (E) 3,4-diaminobenzoic acid. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

本発明は、ポリイミド接着剤用組成物およびこれを用いたポリイミド接着テープに係り、より詳しくは、絶縁性および熱抵抗性に優れるうえ、高温接着特性が向上し、基材層上に形成された相異なる材質のコーティング層との接着特性に優れたポリイミド接着剤用組成物およびこれを用いたポリイミド接着テープに関するものである。   The present invention relates to a polyimide adhesive composition and a polyimide adhesive tape using the same, and more specifically, it has excellent insulation and thermal resistance, and improved high-temperature adhesive properties, and is formed on a base material layer. The present invention relates to a polyimide adhesive composition excellent in adhesive properties with different coating layers, and a polyimide adhesive tape using the same.

一般に、電子部品用接着テープは、半導体装置を構成するリードフレーム周辺の部品間、たとえばリードピン、半導体搭載用基板、放熱板、半導体チップ自体の接着に使用するためのもので、FPC(Flexible Printed Circuit)原板用途およびTAB(Tape Automated bonding)用原板テープに適した、銅箔との接着力が増大した接着テープも含まれる。   In general, an adhesive tape for electronic components is used for bonding between peripheral components of a lead frame constituting a semiconductor device, for example, a lead pin, a semiconductor mounting substrate, a heat sink, and a semiconductor chip itself, and is an FPC (Flexible Printed Circuit). ) Adhesive tapes with increased adhesion to copper foil suitable for original plate applications and TAB (Tape Automated bonding) original plate tapes are also included.

このような電子部品用テープには、リードフレーム固定用接着テープ、リードフレーム−半導体チップの接着テープ、リードフレームダイパッド用接着テープなどがある。   Such electronic component tapes include lead frame fixing adhesive tapes, lead frame-semiconductor chip adhesive tapes, lead frame die pad adhesive tapes, and the like.

特に、LOC(Lead on Chip)パッケージ用接着テープは、高温工程でテープの一面にリードフレームが接着され、テープの他面にチップが接着されるもので、2回の高温接着工程(200℃以上の温度条件)を経て接着される。LOCパッケージが導入された初期には、400℃付近の高温工程でリードフレーム及びチップにテープを付着させたが、半導体パッケージの熱的ストレスによる収率上の損失を減らすために接着工程の温度を漸次低めるために努力しており、近年では300℃付近で接着させている。このような接着工程の温度は引き続き低くなる展望である。   In particular, the adhesive tape for LOC (Lead on Chip) package is a high temperature process in which the lead frame is bonded to one side of the tape and the chip is bonded to the other side of the tape. (Temperature condition) In the early days of the introduction of the LOC package, tape was attached to the lead frame and chip in a high temperature process around 400 ° C., but the temperature of the bonding process was reduced to reduce the yield loss due to the thermal stress of the semiconductor package. Efforts are being made to gradually lower it, and in recent years, bonding is performed at around 300 ° C. The temperature of such an adhesion process is expected to continue to decrease.

この過程で通常のエポキシ樹脂のような熱硬化性樹脂を用いる場合には、高温でテープの一面の接着層をリードフレームに接着させる工程中に他面の接着層が同時に硬化し、以後のチップとの接着工程が不可能になる。したがって、高温溶融特性を有する熱可塑性の接着素材が要求される。   If a thermosetting resin such as a normal epoxy resin is used in this process, the adhesive layer on the other side is simultaneously cured during the process of adhering the adhesive layer on one side of the tape to the lead frame at a high temperature. The bonding process becomes impossible. Therefore, a thermoplastic adhesive material having high temperature melting characteristics is required.

このため、ポリイミド樹脂は、イミド環構造自体の安定性だけでなく、主鎖の線形的な構造により鎖間の充填密度が大きいため耐熱性に優れる。この他にも、ポリイミド樹脂は耐化学性、電気絶縁性および機械的特性に優れた性質により、電子材料、接着剤、コーティング、複合材料、繊維およびフィルム材料などの様々な用途に用いられている。ところが、主にフィルム用途に応用されたポリイミドは、ガラス転移温度が300℃以上であり、高温で流動性が殆ど現れないので、接着剤用途への活用には限界がある。   For this reason, the polyimide resin is excellent not only in the stability of the imide ring structure itself but also in the heat resistance because of the large packing density between the chains due to the linear structure of the main chain. In addition to this, polyimide resins are used in various applications such as electronic materials, adhesives, coatings, composite materials, fibers and film materials due to their excellent chemical resistance, electrical insulation and mechanical properties. . However, polyimides mainly applied for film use have a glass transition temperature of 300 ° C. or higher, and hardly exhibit fluidity at high temperatures, so that there is a limit to utilization for adhesive applications.

したがって、ポリイミドを接着剤用途に活用するためにはポリイミドの物性を改善しなければならず、このような努力が引き続き行われている。公知の方法によれば、ポリイミド樹脂はテトラカルボン酸二無水物およびジアミンを有機溶媒で反応させてポリイミド前駆体のポリアミド酸を製造した後、熱的または化学的に縮合させてイミド化させる。   Therefore, in order to utilize polyimide for adhesives, the physical properties of polyimide must be improved, and such efforts are continuously made. According to a known method, a polyimide resin is reacted with a tetracarboxylic dianhydride and a diamine in an organic solvent to produce a polyimide precursor, polyamic acid, and then thermally or chemically condensed to be imidized.

ここに、従来のアミン成分であるジアミンにトリアミンまたはテトラアミンを導入し、ポリイミドの線形的構造をゲル化による3次元的な構造で合成することにより、耐熱性と機械的特性を同時に改善しようとする方法が提案された(特許文献1参照)。ところが、前記製造されたポリイミド樹脂を用いた接着剤は、フィルムの柔軟性が足りなく、ゲル化によるポリアミド酸およびポリイミドの溶解度の低下による加工特性が低くなるという欠点が指摘されている。これにより、前記ジアミンにトリアミンまたはテトラアミンのポリアミノ化合物成分を添加する方法は、接着剤の高温流動性または接着力に対する問題を依然として抱えている。   Here, triamine or tetraamine is introduced into diamine, which is a conventional amine component, and the linear structure of polyimide is synthesized with a three-dimensional structure by gelation, thereby simultaneously improving heat resistance and mechanical properties. A method has been proposed (see Patent Document 1). However, it has been pointed out that the produced adhesive using the polyimide resin has insufficient film flexibility and has low processing properties due to a decrease in solubility of polyamic acid and polyimide due to gelation. Accordingly, the method of adding a triamine or tetraamine polyamino compound component to the diamine still has a problem with respect to the high temperature fluidity or adhesive strength of the adhesive.

別の方法として、ポリイミドの製造工程中、ジアンヒドリドまたはジアミンに2つ以上のフェニル環を有し、フェニル環の間にエーテル作用基(−O−)を導入して耐熱性を低めて高温における分子動きを持つようにすることにより、高温における流動性を与えて高温接着特性を向上させようとする方法が提案された。しかしながら、接着剤の耐熱性が低下することにより、高温安定性が確保されず、高温工程の際に半導体組立過程で要求される信頼性を確保することができない。しかも、最近は300℃以下の接着工程温度が要求されるところ、このような条件では接着工程性が確保できないという欠点がある。   As another method, during the production process of polyimide, dianhydride or diamine has two or more phenyl rings, and ether functional groups (—O—) are introduced between the phenyl rings to reduce heat resistance at high temperatures. There has been proposed a method for improving the high-temperature adhesive properties by providing fluidity at high temperatures by having molecular movement. However, since the heat resistance of the adhesive is reduced, the high temperature stability is not ensured, and the reliability required in the semiconductor assembly process during the high temperature process cannot be ensured. Moreover, recently, a bonding process temperature of 300 ° C. or lower is required, but there is a disadvantage that the bonding process property cannot be secured under such conditions.

したがって、ポリイミドを、より低い温度で接着工程が可能な電子部品用接着テープに適用するためには、従来のポリイミド組成物の一般的な物性を克服することが可能な新規の接着剤を開発しなければならない。   Therefore, in order to apply polyimide to adhesive tapes for electronic components that can be bonded at a lower temperature, we developed a new adhesive that can overcome the general physical properties of conventional polyimide compositions. There must be.

特に、LOCパッケージ用接着テープの場合、一面はニッケル鉄合金または銅素材の金属リードフレームに接着され、他面は半導体チップの高分子絶縁コーティング膜に接着されることにより、相異なる素材の基材層に対する接着特性を同時に満足させなければならない技術的困難さがある。
米国特許第5231162号明細書
In particular, in the case of an adhesive tape for LOC package, one surface is bonded to a nickel iron alloy or copper metal lead frame, and the other surface is bonded to a polymer insulating coating film of a semiconductor chip, so that base materials of different materials are used. There are technical difficulties that must be satisfied simultaneously with the adhesive properties to the layers.
US Pat. No. 5,231,162

そこで、本発明者は、高温接着工程に優れた新規のポリイミド接着剤または接着テープを提供するために努力した結果、ジアンヒドリドおよびジアミンを有機溶媒で反応させて製造される工程中に、前記ジアミン成分に脂肪族構造のシロキサン基を有するジアミン、トリアミンおよびテトラアミンを含むポリアミノ化合物および3,4−ジアミノ安息香酸を添加するが、前記酸成分およびアミン成分の含量を調節してポリイミド接着剤用組成物を製造することにより、ポリイミド主鎖間の線形構造が破れた3次元構造のポリイミドの主鎖間の充填密度が低くなり、分子単位の自由体積(Free Volume)が増大し、高温で鎖の動きが増大して流動性が改善され、ポリイミド接着テープが300℃および350℃で 基材層上に形成された相異なる材質のコーティング層に対する接着力に優れることを前記組成物から確認することにより、本発明の完成に至った。   Therefore, as a result of making efforts to provide a novel polyimide adhesive or adhesive tape excellent in the high-temperature bonding process, the present inventor, during the process of reacting dianhydride and diamine with an organic solvent, Polyamide compound containing aliphatic structure siloxane group, triamine and tetraamine, and 3,4-diaminobenzoic acid are added to the component, and the content of the acid component and amine component is adjusted to adjust the composition for polyimide adhesive As a result, the packing density between the main chains of the three-dimensional structure polyimide, where the linear structure between the polyimide main chains is broken, decreases, the free volume of molecular units increases, and the movement of the chains at high temperatures. Of the different materials formed on the base material layer at 300 ° C and 350 ° C. By confirming that the excellent adhesion to computing layer from the composition, and have completed the present invention.

本発明の目的は、高温接着工程に向いているポリイミド接着剤用組成物を提供することにある。   The objective of this invention is providing the composition for polyimide adhesives suitable for a high temperature adhesion process.

本発明の他の目的は、前記ポリイミド接着剤用組成物を用いたポリイミドの製造方法を提供することにある。   Another object of the present invention is to provide a method for producing a polyimide using the polyimide adhesive composition.

本発明の別の目的は、前記製造されたポリイミドを含有する接着液を用いたポリイミド接着テープを提供することにある。   Another object of the present invention is to provide a polyimide adhesive tape using an adhesive liquid containing the produced polyimide.

上記課題を解決するために、本発明のある観点によれば、テトラカルボン酸二無水物、ジアミン、シロキサン構造を含むジアミン、トリアミンおよびテトラアミンからなる群より選択されたいずれか1種または2種以上の混合形態のポリアミノ化合物、および3,4−ジアミノ安息香酸から構成される、ポリイミド接着剤用組成物を提供する。   In order to solve the above problems, according to one aspect of the present invention, one or more selected from the group consisting of tetracarboxylic dianhydride, diamine, diamine containing a siloxane structure, triamine, and tetraamine The composition for polyimide adhesives which consists of a polyamino compound of this mixed form, and 3, 4- diaminobenzoic acid is provided.

本発明のポリイミド接着剤用組成物は、(A)テトラカルボン酸二無水物100モルに対し、(B)ジアミン60〜98モル、(C)シロキサン構造を含むジアミン0.05〜40モル、(D)ポリアミノ化合物0.01〜5モル、及び(E)3,4−ジアミノ安息香酸0.03〜10モルから構成される。   The composition for polyimide adhesives of this invention is (B) diamine 60-98 mol, (C) diamine 0.05-40 mol containing (C) siloxane structure with respect to 100 mol of (A) tetracarboxylic dianhydride, ( D) It is composed of 0.01 to 5 mol of a polyamino compound and 0.03 to 10 mol of (E) 3,4-diaminobenzoic acid.

また、前記ポリイミド接着剤用組成物は、(A)テトラカルボン酸二無水物の酸成分100モルに対し、(B)ジアミン、(C)シロキサン構造を含むジアミン、(D)ポリアミノ化合物、および(E)3,4−ジアミノ安息香酸を含む全体アミン成分が101〜106モルであることがより好ましい。   The polyimide adhesive composition may comprise (B) a diamine, (C) a diamine containing a siloxane structure, (D) a polyamino compound, and (A) 100 mol of the tetracarboxylic dianhydride acid component. E) The total amine component including 3,4-diaminobenzoic acid is more preferably 101 to 106 mol.

また、本発明は、前記ポリイミド接着剤用組成物を有機溶媒に仕込んで窒素雰囲気の下で攪拌し、100℃以下で1〜10時間反応させ、ポリイミドの前駆体であるポリアミド酸を製造し、前記ポリアミド酸を基材に塗布またはコーティングした後、250〜500℃の温度条件で熱的イミド化反応させてなるポリイミドの製造方法を提供する。   In addition, the present invention, the polyimide adhesive composition is charged in an organic solvent and stirred under a nitrogen atmosphere, reacted at 100 ° C. or lower for 1 to 10 hours to produce a polyamic acid that is a polyimide precursor, Provided is a method for producing a polyimide obtained by applying or coating the polyamic acid on a substrate and then thermally imidizing it at a temperature of 250 to 500 ° C.

前記製造方法によって製造されたポリイミドは、機械的強度、耐熱性、接着特性を同時に満足させるために、重量平均分子量が10000〜200000であることが好ましい。   The polyimide produced by the above production method preferably has a weight average molecular weight of 10,000 to 200,000 in order to satisfy the mechanical strength, heat resistance and adhesive properties at the same time.

本発明は、耐熱性の基材フィルムと、前記製造されたポリイミドを有機溶媒に溶解させて固形分の含量が15〜25重量%となるように製造されたポリイミド接着液を前記基材フィルムの片面または両面に塗布および乾燥させて形成されたポリイミド接着剤層とから構成される、ポリイミド接着テープを提供する。   The present invention relates to a heat-resistant base film and a polyimide adhesive prepared by dissolving the prepared polyimide in an organic solvent so that the solid content is 15 to 25% by weight. Provided is a polyimide adhesive tape comprising a polyimide adhesive layer formed by applying and drying on one side or both sides.

この際、前記耐熱性の基材フィルムとしてはポリイミドフィルムが最も好ましい。   In this case, a polyimide film is most preferable as the heat-resistant base film.

本発明のポリイミド接着剤用組成物およびこれを用いたポリイミド接着剤は、高温接着工程における接着特性が改善され、300℃および350℃でニッケル鉄合金、銅素材の金属リードフレームと半導体チップの高分子絶縁コーティング膜に対して優れた接着特性を持つことにより、電子部品用接着テープ、特にLOCパッケージ用両面テープとして有用である。   The composition for polyimide adhesive of the present invention and the polyimide adhesive using the same have improved adhesive properties in the high-temperature bonding process, and the high performance of nickel-iron alloy, copper-based metal lead frame and semiconductor chip at 300 ° C. and 350 ° C. Due to its excellent adhesive property to the molecular insulating coating film, it is useful as an adhesive tape for electronic parts, particularly a double-sided tape for LOC package.

以下、本発明を詳細に説明する。   Hereinafter, the present invention will be described in detail.

本発明のポリイミド接着剤用組成物は、(A)下記化学式1で表わされるテトラカルボン酸二無水物の少なくとも1種以上と、(B)下記化学式2で表わされるジアミンの少なくとも1種以上と、(C)下記化学式3で表わされるシロキサン構造を含むジアミンの少なくとも1種以上と、(D)下記化学式4で表わされるトリアミンおよび化学式5で表わされるテトラアミンよりなる群から選択されたいずれか1種または2種以上の混合形態のポリアミノ化合物の少なくとも1種以上と、(E)下記化学式6で表わされる3,4−ジアミノ安息香酸とから構成される。   The polyimide adhesive composition of the present invention comprises (A) at least one tetracarboxylic dianhydride represented by the following chemical formula 1, and (B) at least one diamine represented by the following chemical formula 2, (C) any one selected from the group consisting of at least one diamine having a siloxane structure represented by the following chemical formula 3 and (D) a triamine represented by the following chemical formula 4 and a tetraamine represented by the chemical formula 5, or It comprises at least one or more of polyamino compounds in a mixed form of two or more and (E) 3,4-diaminobenzoic acid represented by the following chemical formula 6.

Figure 2006124637
Figure 2006124637

式中、Xは2価の作用基を示す。   In the formula, X represents a divalent functional group.

より具体的に、化学式1で表わされるテトラカルボン酸二無水物のうち、前記Xは下記化学式1aで表わされる化合物から選択されたいずれか一つの化合物(X1)および下記化学式1bで表わされる化合物から選択されたいずれか一つの化合物(X2)からなり、X1及びX2のモル分率は、1:0〜0.5:0.5の範囲である。   More specifically, among the tetracarboxylic dianhydrides represented by the chemical formula 1, the X is selected from the compound represented by the following chemical formula 1a and the compound represented by the following chemical formula 1b. It consists of any one selected compound (X2), and the molar fraction of X1 and X2 is in the range of 1: 0 to 0.5: 0.5.

この際、X1の構造はポリイミド接着剤の接着特性および高温流動性と主に連関しており、X2の構造はポリイミド接着剤の耐熱性および高温信頼性と主に連関している。   At this time, the structure of X1 is mainly associated with the adhesive properties and high temperature fluidity of the polyimide adhesive, and the structure of X2 is mainly associated with the heat resistance and high temperature reliability of the polyimide adhesive.

X1とX2のモル分率が1:0〜0.5:0.50の範囲であれば、高温接着工程の際に接着剤が流動特性を持ち、基材との基本的な接着力を持つことになるが、X1とX2のモル分率が0.5:0.5〜0:1の範囲であれば、接着剤の接着特性が低下する。   If the molar fraction of X1 and X2 is in the range of 1: 0 to 0.5: 0.50, the adhesive has flow characteristics during the high temperature bonding process and has a basic adhesive force with the substrate. However, if the molar fraction of X1 and X2 is in the range of 0.5: 0.5 to 0: 1, the adhesive properties of the adhesive deteriorate.

Figure 2006124637
Figure 2006124637

式中、mは1〜10の整数を示す。   In formula, m shows the integer of 1-10.

Figure 2006124637
Figure 2006124637

Figure 2006124637
Figure 2006124637

式中、Yは2価の作用基を示す。   In the formula, Y represents a divalent functional group.

前記化学式2で表わされるジアミンは、ポリイミド接着剤の耐熱性および流動性を調節する機能を行い、要求される物性に応じて適切な構造のジアミンを2つ以上組み合わせて使用することができる。この際、ジアミンは前記化学式1で表わされるテトラカルボン酸二無水物100モルに対し、60〜98モルを使用することが好ましい。ジアミンの使用量が60モル未満であれば、ポリイミドの分子量が低下して製造コストが上昇し、ジアミンの使用量が98モル超過であれば、高温接着工程の際に流動特性および基材との接着特性が低下する。   The diamine represented by the chemical formula 2 functions to adjust the heat resistance and fluidity of the polyimide adhesive, and two or more diamines having an appropriate structure can be used in combination according to the required physical properties. At this time, the diamine is preferably used in an amount of 60 to 98 mol with respect to 100 mol of the tetracarboxylic dianhydride represented by the chemical formula 1. If the amount of diamine used is less than 60 mol, the molecular weight of the polyimide decreases and the production cost increases, and if the amount of diamine used exceeds 98 mol, the flow characteristics and the base material Adhesive properties are reduced.

より具体的には、前記Yは化学式2aで表わされる化合物の群から選択される1種以上である。   More specifically, the Y is at least one selected from the group of compounds represented by Formula 2a.

Figure 2006124637
Figure 2006124637

Figure 2006124637
Figure 2006124637

式中、R4は炭素数1〜20のアルキル基、n’は1〜20の整数を示す。 In the formula, R 4 represents an alkyl group having 1 to 20 carbon atoms, and n ′ represents an integer of 1 to 20.

前記化学式3で表わされるシロキサン構造を含むジアミンは、高温工程の際、ポリイミド接着剤の流動特性および基材との接着力と連関し、かつポリイミドの柔軟性と溶解度を調節する機能があり、特にポリアミノ化合物が添加されて3次元ネットワーク構造が形成されるとき、ゲル化による重合物の沈殿または溶解度の低下を防ぐ役割をする。この際、シロキサン構造を含むジアミンは、前記化学式1で表わされるテトラカルボン酸二無水物100モルに対し、0.05〜40モルを使用することが好ましい。シロキサン構造を含むジアミンの使用量が0.05モル未満であれば、重合の際にゲル化によるポリイミド重合体の粘度及び溶解度の側面の安定度が低下し、基材との接着特性が低下し、シロキサン構造を含むジアミンの使用量が40モル超過であれば、ポリイミド接着剤の分子量および耐熱性が低下し、製造コストが上昇するという欠点がある。   The diamine having a siloxane structure represented by Chemical Formula 3 is associated with the flow characteristics of the polyimide adhesive and the adhesive strength with the substrate during the high temperature process, and has a function of adjusting the flexibility and solubility of the polyimide. When a polyamino compound is added to form a three-dimensional network structure, the polyamino compound serves to prevent precipitation of the polymer or decrease in solubility due to gelation. At this time, it is preferable to use 0.05 to 40 moles of the diamine having a siloxane structure with respect to 100 moles of the tetracarboxylic dianhydride represented by Chemical Formula 1. If the amount of diamine containing a siloxane structure is less than 0.05 mol, the stability of the viscosity and solubility side of the polyimide polymer due to gelation will be reduced during polymerization, and the adhesive properties with the substrate will be reduced. If the amount of the diamine containing a siloxane structure is more than 40 mol, there is a drawback that the molecular weight and heat resistance of the polyimide adhesive are lowered and the production cost is increased.

本発明で使用されるシロキサン構造を含むジアミンの好適な一例としては、ビス(γ−アミノプロピル)テトラメチルジシロキサン(GAPD、n=1)、ビス(γ−アミノプロピル)ポリジメチルジシロキサン(PSX−4、n=4)、ビス(γ−アミノプロピル)ポリジメチルジシロキサン(PSX−8、n=8)などであり、シロキサン構造を含むジアミンは1種または2種以上の混合形態で使用することができる。   Preferred examples of the diamine having a siloxane structure used in the present invention include bis (γ-aminopropyl) tetramethyldisiloxane (GAPD, n = 1), bis (γ-aminopropyl) polydimethyldisiloxane (PSX). -4, n = 4), bis (γ-aminopropyl) polydimethyldisiloxane (PSX-8, n = 8), etc., and the diamine containing a siloxane structure is used in one or a mixture of two or more. be able to.

Figure 2006124637
Figure 2006124637

Figure 2006124637
Figure 2006124637

式中、A1は3価の作用基、A2は4価の作用基、n1は0または1〜3の整数、n2は0または1〜4の整数、Xは酸、qは酸の塩基数をそれぞれ示す。   In the formula, A1 is a trivalent functional group, A2 is a tetravalent functional group, n1 is an integer of 0 or 1-3, n2 is an integer of 0 or 1-4, X is an acid, and q is the number of bases of the acid. Each is shown.

より具体的に、A1の一例としては下記化学式4aの化合物から選択して使用することが好ましい。   More specifically, as an example of A1, it is preferable to select and use from the compound of the following chemical formula 4a.

Figure 2006124637
Figure 2006124637

A2の一例としては、下記化学式5aの化合物から選択して使用することが好ましい。   As an example of A2, it is preferable to select and use from the compound of the following chemical formula 5a.

Figure 2006124637
Figure 2006124637

式中、Rは−O−、−CH2−、−CO−、または−SO2−を示し、n3は0または1を示す。 In the formula, R represents —O—, —CH 2 —, —CO—, or —SO 2 —, and n 3 represents 0 or 1.

前記化学式4で表わされるトリアミンおよび化学式5で表わされるテトラアミンよりなる群から選択されたいずれか1種または2種以上の混合形態のポリアミノ化合物は、ポリイミドの3次元ネットワーク構造を形成して線形構造のポリイミドの構造に比べて主鎖間の分子単位の自由体積を増大させ、高温工程時の流動性を増大させる役割をすると同時に、耐熱特性を改善させて高温工程性および信頼性を向上させる役割をする。この際、ポリアミノ化合物の好適な使用量は、前記化学式1で表わされるテトラカルボン酸二無水物100モルに対し、0.01〜5モルであり、0.01モル未満の場合には3次元ネットワーク特性を期待することが難しく、5モル超過の場合には重合の際にゲル化による問題が発生し易く、却ってゲル化によって接着剤の高温流動特性および接着力が低下する。   Any one or two or more mixed forms of polyamino compounds selected from the group consisting of the triamine represented by Chemical Formula 4 and the tetraamine represented by Chemical Formula 5 form a three-dimensional network structure of polyimide to form a linear structure. Compared to the structure of polyimide, it increases the free volume of molecular units between main chains and increases fluidity during high-temperature processes, and at the same time, improves heat resistance and improves high-temperature processability and reliability. To do. At this time, the preferred amount of the polyamino compound used is 0.01 to 5 moles with respect to 100 moles of the tetracarboxylic dianhydride represented by the chemical formula 1, and if it is less than 0.01 moles, a three-dimensional network is used. It is difficult to expect properties, and when the amount exceeds 5 moles, problems due to gelation are likely to occur during polymerization, and on the contrary, the high-temperature flow properties and adhesive strength of the adhesive decrease due to gelation.

本発明で使用される多官能ポリアミノの具体的な化合物の一例としては、3,3',4,4'−テトラアミノジフェニルエーテル、3,3’,4,4’−テトラアミノジフェニルメタン、3,3’,4,4’−テトラアミノベンゾフェノン、3,3’,4,4’−テトラアミノジフェニルスルホン、3,3’,4,4’−テトラアミノビフェニル、1,2,4,5−テトラアミノベンゼン、3,3’,4−トリアミノジフェニル、3,3’,4−トリアミノジフェニルメタン、3,3’,4−トリアミノベンゾフェノン、3,3’,4−トリアミノジフェニルスルホン、3,3’,4−トリアミノジビフェニルおよび1,2,4−トリアミノベンゼンからなる化合物、または前記化合物のモノ−、ジ−、トリ−またはテトラ−酸塩である3,3’,4,4’−テトラアミノジフェニルエーテルテトラヒドロクロライド、3,3’,4,4’−テトラアミノジフェニルメタンテトラヒドロクロライド、3,3’,4,4’−テトラアミノベンゾフェノンテトラヒドロクロライド、3,3’,4,4’−テトラアミノジフェニルスルホンテトラヒドロクロライド、3,3’,4,4’−テトラアミノビフェニルテトラヒドロクロライド、1,2,4,5−テトラアミノベンゼンテトラヒドロクロライド、3,3’,4−トリアミノジフェニルトリヒドロクロライド、3,3’,4−トリアミノジフェニルメタントリヒドロクロライド、3,3’,4−トリアミノベンゾフェノントリヒドロクロライド、3,3’,4−トリアミノジフェニルスルホントリヒドロクロライド、3,3’,4−トリアミノジビフェニルトリヒドロクロライドおよび1,2,4−トリアミノベンゼンジヒドロクロライドからなる群より選択されたいずれか1種または2種以上の混合物を使用することが好ましい。さらに好ましくは、前記多官能ポリアミノ化合物の中でも、塩添加物の形になっていない化合物を使用する。この場合、反応の際にゲル化を形成する速度が短縮されるので、3次元ネットワーク構造を形成させるとき、ゲル化の速度調節に応じて塩添加物タイプの化合物を併用して割合を調節することができる。   Examples of specific compounds of polyfunctional polyamino used in the present invention include 3,3 ′, 4,4′-tetraaminodiphenyl ether, 3,3 ′, 4,4′-tetraaminodiphenylmethane, 3,3 ', 4,4'-tetraaminobenzophenone, 3,3', 4,4'-tetraaminodiphenyl sulfone, 3,3 ', 4,4'-tetraaminobiphenyl, 1,2,4,5-tetraamino Benzene, 3,3 ′, 4-triaminodiphenyl, 3,3 ′, 4-triaminodiphenylmethane, 3,3 ′, 4-triaminobenzophenone, 3,3 ′, 4-triaminodiphenylsulfone, 3,3 A compound comprising ', 4-triaminodibiphenyl and 1,2,4-triaminobenzene, or 3,3 which is a mono-, di-, tri- or tetra-acid salt of said compound , 4,4′-tetraaminodiphenyl ether tetrahydrochloride, 3,3 ′, 4,4′-tetraaminodiphenylmethane tetrahydrochloride, 3,3 ′, 4,4′-tetraaminobenzophenone tetrahydrochloride, 3,3 ′, 4 , 4′-tetraaminodiphenylsulfone tetrahydrochloride, 3,3 ′, 4,4′-tetraaminobiphenyltetrahydrochloride, 1,2,4,5-tetraaminobenzenetetrahydrochloride, 3,3 ′, 4-triamino Diphenyltrihydrochloride, 3,3 ′, 4-triaminodiphenylmethane trihydrochloride, 3,3 ′, 4-triaminobenzophenone trihydrochloride, 3,3 ′, 4-triaminodiphenylsulfone trihydrochloride, 3, 3 ', 4-to It is preferable to use any one or a mixture of two or more selected from the group consisting of raminodibiphenyl trihydrochloride and 1,2,4-triaminobenzene dihydrochloride. More preferably, among the polyfunctional polyamino compounds, compounds not in the form of salt additives are used. In this case, the rate at which gelation is formed during the reaction is shortened. Therefore, when a three-dimensional network structure is formed, the ratio is adjusted by using a salt additive type compound in combination according to the gelation rate adjustment. be able to.

Figure 2006124637
Figure 2006124637

前記化学式6で表わされる3、4−ジアミノ安息香酸は、金属との接着力および耐熱性を増大させる役割をする。この際、3、4−ジアミノ安息香酸の好適な使用量は、テトラカルボン酸二無水物100モルに対し、0.03〜10モルであり、0.03モル未満であれば、金属との接着力の増大効果を期待し難く、10モル超過であれば、却って高分子基材との接着特性を低下させる原因となり、高温における接着剤の流動特性が低下して接着剤の接着特性が低下する。   The 3,4-diaminobenzoic acid represented by the chemical formula 6 plays a role of increasing the adhesive strength and heat resistance with a metal. At this time, the preferred amount of 3,4-diaminobenzoic acid used is 0.03 to 10 mol with respect to 100 mol of tetracarboxylic dianhydride. It is difficult to expect the effect of increasing the force, and if it exceeds 10 moles, the adhesive property with the polymer base material will be deteriorated on the contrary, the flow property of the adhesive at high temperature is lowered and the adhesive property of the adhesive is lowered. .

本発明のポリイミド接着剤用組成物は、(A)芳香族テトラカルボン酸二無水物の酸成分と、(B)ジアミン、(C)シロキサン構造を含むジアミン、(D)ポリアミノ化合物および(E)3、4−ジアミノ安息香酸を含むアミン成分とに分類される。   The polyimide adhesive composition of the present invention comprises (A) an acid component of an aromatic tetracarboxylic dianhydride, (B) a diamine, (C) a diamine containing a siloxane structure, (D) a polyamino compound, and (E). It is classified into an amine component containing 3,4-diaminobenzoic acid.

この際、アミン成分がテトラカルボン酸二無水物の酸成分に比べて過量使用されると、金属との接着力は低下し、高分子との接着力は改善されるという特性を示す。   At this time, when an excessive amount of the amine component is used as compared with the acid component of tetracarboxylic dianhydride, the adhesive strength with the metal is lowered and the adhesive strength with the polymer is improved.

したがって、本発明のポリイミド接着剤用組成物は、(A)芳香族テトラカルボン酸二無水物100モルに対し、(B)ジアミン60〜98モル、(C)シロキサン構造を含むジアミン0.05〜40モル、(D)ポリアミノ化合物0.01〜5モル、および(E)3、4−ジアミノ安息香酸0.03〜10モルが使用される。より好ましくは、前記(A)芳香族テトラカルボン酸二無水物100モルに対し、全体アミン成分の好適な含量が101〜106モルで使用する。   Therefore, the composition for polyimide adhesives of the present invention comprises (B) diamine 60 to 98 mol, (C) diamine containing a siloxane structure 0.05 to 100 mol per 100 mol of (A) aromatic tetracarboxylic dianhydride. 40 mol, (D) 0.01-5 mol of a polyamino compound, and (E) 3,4-diaminobenzoic acid 0.03-10 mol are used. More preferably, the suitable content of the total amine component is used in an amount of 101 to 106 moles per 100 moles of the (A) aromatic tetracarboxylic dianhydride.

この際、(A)芳香族テトラカルボン酸二無水物および(B)ジアミンを重合してポリイミドを製造するとき、好ましい溶媒としては、N−メチル−2−ピロリドン(NMP)、N、N−ジメチルホルムアミド(DMF)、N、N−ジメチルアセトアミド(DMAc)、ジメチルスルホキシド(DMSO)、スルホラン、ヘキサメチルリン酸トリアミド、1、3−ジメチル−2−イミダゾリドンなどの非プロトン性極性溶媒と、フェノール、クレゾール、キシルフェノール、p−クロロフェノールなどのフェノール系溶媒などがある。また、必要に応じて、ジエチレングリコール、ジメチルエーテルなどのエーテル系溶媒、ベンゼン、トルエン、クキシレンなどの芳香族溶媒が使用でき、その他にもメチルエチルケトン、アセトン、テトラヒドロフラン、ジオキサン、モノグライム、メチルセロソルブ、セロソルブアセテート、メタノール、エタノール、イソプロパノール、塩化メチレン、クロロホルム、トリクロロエチレン、ニトロベンゼンなどの溶媒とピリジンのような3次アミンを併用することができる。前記提示された溶媒のいずれか1種または2種以上を混合して使用することもできる。   At this time, when a polyimide is produced by polymerizing (A) aromatic tetracarboxylic dianhydride and (B) diamine, preferred solvents are N-methyl-2-pyrrolidone (NMP), N, N-dimethyl. Aprotic polar solvents such as formamide (DMF), N, N-dimethylacetamide (DMAc), dimethylsulfoxide (DMSO), sulfolane, hexamethylphosphoric triamide, 1,3-dimethyl-2-imidazolidone, phenol, cresol Phenolic solvents such as xylphenol and p-chlorophenol. If necessary, ether solvents such as diethylene glycol and dimethyl ether, and aromatic solvents such as benzene, toluene, and kuxylene can be used. In addition, methyl ethyl ketone, acetone, tetrahydrofuran, dioxane, monoglyme, methyl cellosolve, cellosolve acetate, methanol , Ethanol, isopropanol, methylene chloride, chloroform, trichloroethylene, nitrobenzene and a tertiary amine such as pyridine can be used in combination. Any one or two or more of the proposed solvents may be used in combination.

本発明は、前記ポリイミド接着剤用組成物を有機溶媒に仕込んで窒素雰囲気の下で激しく攪拌することによって100℃以下で1〜10時間反応させ、ポリイミドの前駆体であるポリアミド酸を製造し、前記ポリアミド酸を塗布またはコーティングした後、250〜500℃で熱的イミド化反応させてなるポリイミドの製造方法を提供する。   In the present invention, the polyimide adhesive composition is charged in an organic solvent and vigorously stirred under a nitrogen atmosphere to react at 100 ° C. or lower for 1 to 10 hours to produce a polyamic acid that is a polyimide precursor, Provided is a method for producing a polyimide obtained by applying or coating the polyamic acid and then performing a thermal imidization reaction at 250 to 500 ° C.

1.ポリイミドの前駆体であるポリアミド酸を重合する段階
ポリアミド酸の適正分子量および相対粘度に応じて、温度−10℃〜100℃の範囲で、前記化学式1で表わされるテトラカルボン酸二無水物の少なくとも1種以上、前記化学式2で表わされるジアミンの少なくとも1種以上、前記化学式3で表わされるシロキサン構造を含むジアミンの少なくとも1種以上、前記化学式4または前記化学式5で表わされるトリまたはテトラアミンのポリアミノ化合物の少なくとも1種以上、および前記化学式6で表わされる3、4−ジアミノ安息香酸を適正量投入し、溶媒で窒素雰囲気の下に激しく攪拌することによって100℃以下で反応させてポリアミド酸を製造する。この際、好ましい反応時間は1〜10時間であり、より好ましくは2〜5時間である。反応時間が1時間未満であれば、ポリイミドの分子量分布があまり広くて接着剤の特性が不均一であり、反応時間が10時間超過であれば、生産性が低下する。
1. Step of polymerizing polyamic acid which is a precursor of polyimide At least one of tetracarboxylic dianhydrides represented by Chemical Formula 1 in the temperature range of −10 ° C. to 100 ° C. according to the proper molecular weight and relative viscosity of the polyamic acid. At least one kind of diamine represented by the chemical formula 2, at least one kind of diamine having a siloxane structure represented by the chemical formula 3, and a polyamino compound of tri- or tetraamine represented by the chemical formula 4 or the chemical formula 5. An appropriate amount of at least one or more 3,4-diaminobenzoic acid represented by the above chemical formula 6 is added, and the mixture is vigorously stirred under a nitrogen atmosphere with a solvent to react at 100 ° C. or lower to produce a polyamic acid. At this time, the preferred reaction time is 1 to 10 hours, more preferably 2 to 5 hours. If the reaction time is less than 1 hour, the molecular weight distribution of the polyimide is so wide that the properties of the adhesive are not uniform, and if the reaction time is more than 10 hours, the productivity is lowered.

2.熱的イミド化段階を用いたポリイミドの製造段階
ポリイミドの前駆体である前記ポリアミド酸を基材に塗布またはコーティングした後、最大250〜500℃まで熱を加えてイミド化させることができ、乾燥工程中にイミド化を促進させるために、溶媒に溶解された状態のポリアミド酸にピリジン、トリエチルアミン、トリブチルアミン、イソキノリンなどの3次アミン、無水酢酸、無水プロピオン酸、無水安息香酸などの酸無水物、脱水閉環剤、閉環触媒などを添加する。
2. Polyimide manufacturing step using thermal imidization step After applying or coating the polyamic acid, which is a polyimide precursor, to a substrate, it can be imidized by applying heat up to a maximum of 250 to 500 ° C, and a drying step In order to promote imidization, polyamic acid dissolved in a solvent is added to tertiary amines such as pyridine, triethylamine, tributylamine, and isoquinoline, acid anhydrides such as acetic anhydride, propionic anhydride, and benzoic anhydride, Add dehydrating ring closure agent, ring closure catalyst, etc.

ポリイミドが溶媒に対して可溶性の場合、使用できる好適な化学的イミド化法としては、まず、テトラカルボン酸二無水物およびジアミンを必要に応じてトリブチルアミン、トリエチルアミン、亜リン酸トリフェニル、イソキノリン、ピリジンなどの有機溶媒に入れて全体反応物の25重量部以下の触媒の存在下または全体反応物の25重量部以下のp−トルエンスルホン酸などの脱水触媒存在の下で100℃以上、好ましくは180℃以上に加熱して直接ポリイミドを収得することができる。また、テトラカルボン酸二無水物およびジアミンを有機溶媒中、100℃以下で反応させることにより、ポリイミドの前駆体であるポリアミド酸を収得した後、無水酢酸、無水プロピオン酸、無水安息香酸などの酸無水物、ジシクロヘキシルカルボジイミドなどのカルボジイミド化合物といった脱水閉環剤と、必要に応じてピリジン、イソキノリン、イミダゾール、トリエチルアミンなどの閉環触媒を添加し、比較的低温(室温〜100℃)で閉環させる方法などがある。この際、脱水閉環剤および閉環触媒はテトラカルボン酸二無水物に対して2〜10モル比で使用される。   If the polyimide is soluble in the solvent, suitable chemical imidization methods that can be used are: first, tetracarboxylic dianhydride and diamine, optionally tributylamine, triethylamine, triphenyl phosphite, isoquinoline, 100 ° C. or higher, preferably in the presence of a catalyst of 25 parts by weight or less of the total reactant in an organic solvent such as pyridine or in the presence of a dehydration catalyst such as p-toluenesulfonic acid of 25 parts by weight or less of the total reactant. The polyimide can be obtained directly by heating to 180 ° C. or higher. In addition, after reacting tetracarboxylic dianhydride and diamine in an organic solvent at 100 ° C. or lower to obtain polyamic acid which is a precursor of polyimide, acid such as acetic anhydride, propionic anhydride, benzoic anhydride, etc. There are methods such as adding a ring closure catalyst such as anhydride, carbodiimide compounds such as dicyclohexylcarbodiimide and ring closure catalysts such as pyridine, isoquinoline, imidazole, triethylamine as necessary, and ring closure at a relatively low temperature (room temperature to 100 ° C.). . At this time, the dehydrating ring-closing agent and the ring-closing catalyst are used in a molar ratio of 2 to 10 with respect to tetracarboxylic dianhydride.

前記製造方法で重合されたポリイミドは、機械的強度、耐熱性、接着特性を同時に満足させるために、10000〜200000の重量平均分子量を持つことが好ましく、より好ましくは30000〜100000の重量平均分子量を持つ。この際、ポリアミド酸の重量平均分子量が10000未満であれば、分子量があまり小さくて高温接着工程の際に接着剤があまり多く流れて接着部位に汚染などの問題が発生するおそれがあり、LOC用途の接着テープに適用される場合、パンチング接着工程で粉状のバー(burr)(切断断面のギザギザ)が発生する。また、ポリアミド酸の重量平均分子量が200000を超過すれば、相対的に分子量の分布が広くなって接着特性が不均一であり、特に接着剤を基材フィルムなどにコーティングする場合、基材フィルムと接着層間の界面密着性が不均一であり、界面密着性が低下する。   The polyimide polymerized by the above production method preferably has a weight average molecular weight of 10,000 to 200,000, more preferably 30,000 to 100,000, in order to satisfy mechanical strength, heat resistance and adhesive properties at the same time. Have. At this time, if the weight average molecular weight of the polyamic acid is less than 10,000, the molecular weight is too small, and there is a possibility that a large amount of adhesive flows during the high-temperature bonding process, causing problems such as contamination at the bonding site. When applied to the adhesive tape, a powdery burr (a jagged cross section) is generated in the punching adhesion process. Also, if the weight average molecular weight of the polyamic acid exceeds 200,000, the molecular weight distribution is relatively wide and the adhesive properties are non-uniform. Especially when the adhesive is coated on a base film or the like, The interfacial adhesion between the adhesive layers is uneven, and the interfacial adhesion is reduced.

本発明によって得られたポリイミドは、電気絶縁性および熱抵抗性に優れ、高温のテーピング条件で熱溶融結合が可能な電子部品用テープの用途への適用の際に優れた特性を有する。   The polyimide obtained by the present invention is excellent in electrical insulation and thermal resistance, and has excellent characteristics when applied to uses of tapes for electronic parts that can be hot-melt bonded under high temperature taping conditions.

また、本発明は、耐熱性の基材フィルムと、前記で製造されたポリイミドを有機溶媒に溶解させて固形分の含量が15〜25重量%となるように製造されたポリイミド接着液を前記基材フィルムの片面または両面に塗布および乾燥させて形成されたポリイミド接着剤層とからなる、ポリイミド接着テープを提供する。   The present invention also relates to a heat-resistant substrate film and a polyimide adhesive prepared by dissolving the polyimide prepared above in an organic solvent so that the solid content is 15 to 25% by weight. Provided is a polyimide adhesive tape comprising a polyimide adhesive layer formed by applying and drying on one side or both sides of a material film.

本発明で使用される基材フィルムとしては、耐熱性フィルムであって、ポリイミド、ポリフェニレンスルフィド、ポリエーテル、ポリパラバン酸、ポリエチレンテレフタレート、フッ素系樹脂などの耐熱性樹脂フィルムや、エポキシ樹脂−ガラス布、エポキシ樹脂−ポリイミド−ガラス布などの複合耐熱フィルムなどのような耐熱性エンジニアリングプラスチックフィルムであれば、特に制限されずに使用できるが、最も好ましくはポリイミドフィルムを使用する。   The base film used in the present invention is a heat-resistant film, and heat-resistant resin films such as polyimide, polyphenylene sulfide, polyether, polyparabanic acid, polyethylene terephthalate, and fluorine resin, epoxy resin-glass cloth, Any heat-resistant engineering plastic film such as a composite heat-resistant film such as epoxy resin-polyimide-glass cloth can be used without particular limitation, but most preferably a polyimide film is used.

商用のポリイミドフィルムとしては、Regulus(Mitsui Toatsu Chemicals, Inc.)、Kapton(Du Pont Co.)、Upilex(Ube Industries, Ltd.)、Apical AH、NPI、HP(Kanegafuchi Chemical Industry Co., Ltd.)などがあり、好適な厚さは5〜150μmであり、より好ましくは前記ポリイミド接着材層の厚さが5〜50μmである。特に、LOC用途の接着テープの場合には、基材フィルムは25μmまたは50μmのポリイミドフィルムを使用する。   Commercial polyimide films include Regulus (Mitsui Toatsu Chemicals, Inc.), Kapton (Du Pont Co.), Upilex (Ube Industries, Ltd.), Apical AH, NPI, HP (Kanegafuchi Chemical Industry Co., Ltd.). The preferred thickness is 5 to 150 μm, and the thickness of the polyimide adhesive layer is more preferably 5 to 50 μm. In particular, in the case of an adhesive tape for LOC applications, a 25 μm or 50 μm polyimide film is used as the substrate film.

また、基材フィルムとポリイミド接着剤層間の接着力を向上させるために、基材フィルムを表面処理することも好ましい。前記表面処理方法は、特に限定されず、通常の方法を採用することができるが、好ましくはプラズマ、コロナーまたはシラン処理方法を使用する。また、ポリイミド接着剤層のみから構成された接着剤シートの製造目的で基材フィルムの表面にシリコン系離型剤で離型処理された剥離性フィルムが使用されてもよく、この際、好ましい厚さは1〜200μmである。   Moreover, in order to improve the adhesive force between a base film and a polyimide adhesive layer, it is also preferable to surface-treat a base film. The surface treatment method is not particularly limited, and a normal method can be adopted, but a plasma, corona or silane treatment method is preferably used. In addition, for the purpose of producing an adhesive sheet composed only of a polyimide adhesive layer, a release film that has been subjected to a release treatment with a silicon-based release agent may be used on the surface of the base film, and in this case, a preferable thickness is used. The thickness is 1 to 200 μm.

前記において、有機溶媒はN−メチル−2−ピロリドン、N,N−ジメチルホルムアミド、N,N−ジメチルアセトアミド、ジメチルスルホキシド、スルホラン、ヘキサメチルリン酸トリアミドおよび1,3−ジメチル−2−イミダゾリドンからなる非フロトン性極性溶媒、またはフェノール、クレゾール、キシルフェノールおよびp−クロロフェノールからなるフェノール系用溶媒から選択されたいずれか一つを使用する。   In the above, the organic solvent comprises N-methyl-2-pyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, dimethyl sulfoxide, sulfolane, hexamethylphosphoric triamide, and 1,3-dimethyl-2-imidazolidone. Any one selected from a non-furotonic polar solvent or a phenolic solvent consisting of phenol, cresol, xylphenol and p-chlorophenol is used.

次に、本発明を実施例によってより詳細に説明する。   Next, the present invention will be described in more detail with reference to examples.

下記実施例は、本発明をより具体的に説明するためのもので、本発明の範囲を限定するものではない。   The following examples are for explaining the present invention more specifically, and do not limit the scope of the present invention.

<実施例1>
攪拌器、還流冷却器、窒素導入口付きの反応容器で、まず(B)ジアミン、(C)シロキサン構造を含むジアミン、(D)ポリアミノ化合物および(E)3,4−ジアミノ安息香酸を、200gのN−メチル−2−ピロリドン(NMP)を添加して15℃で溶解した後、(A)テトラカルボン酸無水物を投入し、窒素雰囲気で5時間激しく攪拌させてポリアミド酸を合成した。この際、全体モノマーの総合量は溶媒を含んだ全体反応物の15重量%となるようにした。
<Example 1>
First, 200 g of (B) diamine, (C) diamine containing a siloxane structure, (D) polyamino compound and (E) 3,4-diaminobenzoic acid in a reactor equipped with a stirrer, reflux condenser and nitrogen inlet. N-methyl-2-pyrrolidone (NMP) was added and dissolved at 15 ° C., and then (A) tetracarboxylic anhydride was added, and the mixture was vigorously stirred in a nitrogen atmosphere for 5 hours to synthesize polyamic acid. At this time, the total amount of all monomers was 15% by weight of the total reaction product including the solvent.

得られたポリアミド酸に50mLのトルエンと3.0gのp−トルエンスルホン酸を加えて190℃で加熱し、反応の進行に応じてトルエンと共沸(azeotropy)の環境を作って水分が容易に分離されるようにしながら、6時間イミド化反応を行った。その後、ポリイミド重合液をメタノールに注入し、得られた沈殿物を分離、粉砕、洗浄および乾燥させる工程を経ることにより、粉末状態のポリイミドを収得した。製造されたポリイミドをFT−IR測定したところ、1776cm-1付近領域でアミド酸のイミド基への転換を示すピークを確認することができた。 Add 50 mL of toluene and 3.0 g of p-toluenesulfonic acid to the resulting polyamic acid, heat at 190 ° C., and create an azeotropy environment with toluene as the reaction progresses, making moisture easy While being separated, an imidization reaction was performed for 6 hours. Thereafter, the polyimide polymerization solution was poured into methanol, and the resulting precipitate was separated, pulverized, washed and dried, thereby obtaining a powdered polyimide. When the produced polyimide was subjected to FT-IR measurement, a peak indicating conversion of amic acid to an imide group could be confirmed in a region around 1776 cm −1 .

前記粉末状態のポリイミドをさらにN−メチル−2−ピロリドン(NMP)に溶解させる過程で固形分が20重量%となるようにポリイミド接着液を準備した。その後、前記ポリイミド接着液をナイフコーターでガラス板上にそれぞれ塗布した後、真空乾燥機によって80℃で30分間乾燥させて溶媒を除去し、その後フィルムをガラス板上から剥がした後、さらに150℃で5分、250℃で5分間それぞれ乾燥させて厚さ50μmのポリイミドフィルムを製造した。   In the process of further dissolving the polyimide in the powder state in N-methyl-2-pyrrolidone (NMP), a polyimide adhesive solution was prepared so that the solid content would be 20% by weight. Then, after each said polyimide adhesive liquid was apply | coated on the glass plate with the knife coater, it was made to dry at 80 degreeC with a vacuum dryer for 30 minutes, the solvent was removed, and after peeling a film from the glass plate after that, it was further 150 degreeC For 5 minutes and at 250 ° C. for 5 minutes to produce a polyimide film having a thickness of 50 μm.

また、前記ガラス板の代わりに厚さ50μmのポリイミドフィルム(商品名:Apical AH, Kanegafuchi Chemical Industry Co., Ltd.)上に、前記で製造されたポリイミド接着剤溶液を塗布した後、100℃で5分、130℃で5分、150℃で5分、200℃で5分をそれぞれ乾燥させて溶媒を除去し、その後最終的に250℃で5分間乾燥させ、厚さ20μmのポリイミド接着テープを製造した。   In addition, the polyimide adhesive solution produced above was applied on a polyimide film (trade name: Apical AH, Kanegafuchi Chemical Industry Co., Ltd.) having a thickness of 50 μm instead of the glass plate, and then at 100 ° C. 5 minutes at 130 ° C., 5 minutes at 150 ° C., 5 minutes at 200 ° C., and 5 minutes at 200 ° C. to remove the solvent, and then finally dried at 250 ° C. for 5 minutes to obtain a polyimide adhesive tape having a thickness of 20 μm. Manufactured.

以下、実施例2〜18および比較例1〜10のポリイミドは表1および表2に従って合成された。   Hereinafter, the polyimides of Examples 2 to 18 and Comparative Examples 1 to 10 were synthesized according to Tables 1 and 2.

下記表1において、(A’)は、X1およびX2以外の構造であるX3の構造を有するテトラカルボン酸二無水物であり、(C)はシロキサン構造を有するジアミン、(F)はテトラカルボン酸二無水物100モルに対する全体アミン化合物のモル比を示す。この際、全体アミン化合物は(B)ジアミン、(C)シロキサン構造を含むジアミン、(D)ポリアミノ化合物および(E)3,4−ジアミノ安息香酸を含む。   In Table 1 below, (A ′) is a tetracarboxylic dianhydride having a structure of X3 which is a structure other than X1 and X2, (C) is a diamine having a siloxane structure, and (F) is a tetracarboxylic acid. The mole ratio of total amine compound to 100 moles of dianhydride is shown. In this case, the total amine compound includes (B) diamine, (C) diamine having a siloxane structure, (D) polyamino compound, and (E) 3,4-diaminobenzoic acid.

Figure 2006124637
Figure 2006124637

Figure 2006124637
Figure 2006124637

<実験例1>
前記実施例1〜18および比較例1〜10で製造されたポリイミド接着テープに対する物性を下記のように測定した。
<Experimental example 1>
The physical properties of the polyimide adhesive tapes produced in Examples 1-18 and Comparative Examples 1-10 were measured as follows.

1.相対粘度
前記実施例1〜18および比較例1〜10で製造されたポリイミドの相対粘度ηinh(ポリイミドをN,N−ジメチルアセトアミドに0.05重量%で希釈)を表3に示した。
1. Relative Viscosity Table 3 shows the relative viscosities η inh (polyimide diluted in N, N-dimethylacetamide at 0.05% by weight) of the polyimides produced in Examples 1-18 and Comparative Examples 1-10.

2.重量平均分子量
前記実施例1〜18および比較例1〜10で製造されたポリイミドの重量平均分子量をGPC(Gel Permeation Chromatography)を用いて測定して表3に示した。
2. Weight average molecular weight The weight average molecular weights of the polyimides produced in Examples 1 to 18 and Comparative Examples 1 to 10 were measured using GPC (Gel Permeation Chromatography) and shown in Table 3.

測定条件は次のようにした。   Measurement conditions were as follows.

装置:YOUNGLIN Autocho−GPC、検出器:UV730D、溶媒移送ポンプ:SP930D、カラムオーブン:CTS30、カラム温度:25℃、溶離液:N,N−ジメチルアセトアミド、溶離液の流量:1.0mL/分、試料濃度:0.2重量%、標準試料:ポリスチレン。   Apparatus: YOUNGLIN Autocho-GPC, detector: UV730D, solvent transfer pump: SP930D, column oven: CTS30, column temperature: 25 ° C., eluent: N, N-dimethylacetamide, eluent flow rate: 1.0 mL / min, Sample concentration: 0.2% by weight, standard sample: polystyrene.

3.ガラス転移温度
前記実施例1〜18および比較例1〜10で製造されたポリイミド接着テープに対してDSC(Differential Scanning Calorimetry)を用いてガラス転移温度を測定した。この際、昇温速度は10℃/min、50〜300℃の温度範囲で測定してそれぞれ下記表3に示した。
3. Glass transition temperature The glass transition temperature was measured using DSC (Differential Scanning Calorimetry) with respect to the polyimide adhesive tape manufactured in Examples 1-18 and Comparative Examples 1-10. At this time, the rate of temperature increase was measured at a temperature range of 10 ° C./min and 50 to 300 ° C. and is shown in Table 3 below.

4.5%熱分解温度
前記実施例1〜18および比較例1〜10で製造されたポリイミド接着テープに対してTGA(Thermogravimetry Analysis)を用いて5%熱分解温度を測定した。この際、昇温速度は10℃/min、50〜900℃の温度範囲で測定してそれぞれ下記表3に示した。5%熱分解温度はもともと質量を100%基準として重量が相対的に5%だけ減少する時点の温度を示す。
4.5% Pyrolysis Temperature The polyimide adhesive tapes produced in Examples 1-18 and Comparative Examples 1-10 were measured for 5% pyrolysis temperature using TGA (Thermogravimetry Analysis). At this time, the rate of temperature increase was measured at a temperature range of 10 ° C./min and 50 to 900 ° C. and is shown in Table 3 below. The 5% pyrolysis temperature originally indicates the temperature at which the weight is relatively decreased by 5% with respect to the mass as 100%.

5.弾性モジュラス
前記実施例1〜18および比較例1〜10で製造されたポリイミド接着テープに対してDMTA(Dynamic Mechanical Thermal Analysis)を用いて弾性モジュラスを測定した。この際、1Hz、昇温速度5℃/minの条件で、50〜250℃の温度範囲で測定して25℃と190℃における弾性モジュラス値を表3に示した。
5. Elastic Modulus Elastic modulus was measured for the polyimide adhesive tapes produced in Examples 1-18 and Comparative Examples 1-10 using DMTA (Dynamic Mechanical Thermal Analysis). At this time, the elastic modulus values at 25 ° C. and 190 ° C. were measured in a temperature range of 50 to 250 ° C. under the conditions of 1 Hz and a temperature increase rate of 5 ° C./min.

6.接着力
前記実施例1〜18および比較例1〜10で製造されたポリイミド接着テープをそれぞれ300℃と350℃で圧力5Kg/cm2の条件でニッケル鉄合板またはPIX−3000溶液(日立ケミカル)がコーティングされた板上に接着させた後、常温で50mm/minの速度でT−Peelテストを行って接着力を評価し、その結果を下記表3に示した。
6). Adhesive strength The polyimide adhesive tapes produced in Examples 1 to 18 and Comparative Examples 1 to 10 were subjected to nickel iron plywood or PIX-3000 solution (Hitachi Chemical) at 300 ° C. and 350 ° C. under a pressure of 5 kg / cm 2 , respectively. After bonding on the coated plate, the T-Peel test was performed at a speed of 50 mm / min at room temperature to evaluate the adhesive force. The results are shown in Table 3 below.

7.熱サイクルテスト
前記実施例1〜18および比較例1〜10で製造されたポリイミド接着液を厚さ50μmのポリイミドフィルムの両面にコーティングして接着剤層の厚さがそれぞれ25μmとなるように積層された構造の接着テープを製造した。
7). Thermal cycle test The polyimide adhesives prepared in Examples 1 to 18 and Comparative Examples 1 to 10 were coated on both sides of a polyimide film having a thickness of 50 μm, and the adhesive layers were laminated to a thickness of 25 μm. An adhesive tape having a different structure was produced.

その後、接着テープの一面を厚さ200μm、大きさ2.5cm×2.5cmの銅板に300℃および350℃で圧力5Kg/cm2の条件で熱圧着した。次に、両面接着テープの他面を300℃で圧力5Kg/cm2の条件で2.5cm×2.5cmのPIX−3000溶液(日立ケミカル)がコーティングされたガラスチップに熱圧着して熱サイクルテスト用試料を準備した。 Thereafter, the thickness of 200μm the one side of the adhesive tape, was heat pressed under a pressure of 5Kg / cm 2 at 300 ° C. and 350 ° C. in a copper plate of size 2.5 cm × 2.5 cm. Next, the other surface of the double-sided adhesive tape is thermocompression bonded to a glass chip coated with a 2.5 cm × 2.5 cm PIX-3000 solution (Hitachi Chemical) at 300 ° C. under a pressure of 5 kg / cm 2. A test sample was prepared.

評価試料を用いて−65℃〜150℃の熱サイクルテストを行った。この際、熱サイクルテストは150℃及び−65℃でそれぞれ30分間温度履歴を経ることを1サイクルとし、1000サイクルの条件で実施した。熱サイクルテスト後、剥離および発泡の有無を観察してその結果を下記表3に記載した。   A thermal cycle test of −65 ° C. to 150 ° C. was performed using the evaluation sample. At this time, the thermal cycle test was performed under the conditions of 1000 cycles, with each cycle of 30 minutes at 150 ° C. and −65 ° C. as one cycle. After the thermal cycle test, the presence or absence of peeling and foaming was observed, and the results are shown in Table 3 below.

すなわち、各実施例および比較例で製造されたポリイミド接着テープは、評価試料を10個ずつ製作し、剥離および発泡のない評価試料の個数を表3に記載した。   That is, for the polyimide adhesive tapes produced in each of the examples and comparative examples, 10 evaluation samples were produced, and the number of evaluation samples without peeling and foaming is shown in Table 3.

Figure 2006124637
Figure 2006124637

実施例1〜18および比較例1〜10で製造されたポリイミドの重量平均分子量は、45000〜153000の範囲内の値を示したが、比較例7および8の場合は、重量平均分子量がそれぞれ210000および220000であって、200000以上の値を示した。   The weight average molecular weights of the polyimides produced in Examples 1 to 18 and Comparative Examples 1 to 10 showed values in the range of 45000 to 153000. In Comparative Examples 7 and 8, the weight average molecular weights were 210,000, respectively. And 220,000, showing values over 200000.

前記実施例1〜18で製造されたポリイミド接着テープの場合、190℃における弾性モジュラス値が2.9×108〜9.7×108dyne/cm2の範囲内の値を示したが、比較例5および6で製造されたポリイミド接着テープの場合は、弾性モジュラス値がそれぞれ1.9×108、7.1×107dyne/cm2と相対的に低かった。したがって、高温における低い弾性モジュラス値によって、比較例5および6で製造されたポリイミド接着テープは、300℃および350℃で銅箔、ニッケル鉄合金およびPIX−3000との接着力が全て良好な値を示したが、熱サイクルテストで10個のうちそれぞれ6個および4個が剥離する結果を示した。 In the case of the polyimide adhesive tape manufactured in Examples 1 to 18, the elastic modulus value at 190 ° C. was a value in the range of 2.9 × 10 8 to 9.7 × 10 8 dyne / cm 2 . for polyimide adhesive tape produced in Comparative examples 5 and 6, the elastic modulus value of 1.9 × 10 8, respectively, were relatively low and 7.1 × 10 7 dyne / cm 2 . Therefore, due to the low elastic modulus value at high temperature, the polyimide adhesive tapes manufactured in Comparative Examples 5 and 6 all have good adhesive strength with copper foil, nickel iron alloy and PIX-3000 at 300 ° C. and 350 ° C. As shown, in the thermal cycle test, 6 out of 10 pieces and 4 pieces were peeled off.

前記実施例1〜18で製造されたポリイミド接着テープの場合、300℃および350℃で銅箔、ニッケル鉄合金およびPIX−3000との接着力が全て1Kgf/cm以上の良好な値を示したが、比較例1および2で製造されたポリイミド接着テープは、PIX−3000との接着力が1Kgf/cmより小さい低い値を示し、比較例3および4で製造されたポリイミド接着テープは銅箔、ニッケル鉄合金との接着力が1Kgf/cmより小さい低い値を示した。また、比較例7〜10で製造されたポリイミド接着テープは、銅箔、ニッケル鉄合金およびPIX−3000との接着力が全て1Kgf/cmより小さい値であって、接着特性が低下した。   In the case of the polyimide adhesive tape manufactured in Examples 1 to 18, the adhesive strengths with copper foil, nickel iron alloy and PIX-3000 all showed good values of 1 kgf / cm or more at 300 ° C and 350 ° C. The polyimide adhesive tapes manufactured in Comparative Examples 1 and 2 have a low adhesive strength with PIX-3000 of less than 1 kgf / cm, and the polyimide adhesive tapes manufactured in Comparative Examples 3 and 4 are copper foil, nickel. The adhesive strength with the iron alloy showed a low value of less than 1 kgf / cm. Moreover, the adhesive force with the polyimide adhesive tape manufactured by Comparative Examples 7-10 was less than 1 Kgf / cm, and the adhesive characteristic fell, all with copper foil, nickel iron alloy, and PIX-3000.

その他に、本発明の接着剤組成物を用いて製造されたポリイミド接着テープの場合、剥離および発泡を発生させていない反面、比較例の接着剤組成物を用いて製造されたポリイミド接着テープでは剥離および発泡が誘発された。   In addition, in the case of the polyimide adhesive tape manufactured using the adhesive composition of the present invention, peeling and foaming are not generated, but the polyimide adhesive tape manufactured using the comparative adhesive composition is peeled off. And foaming was induced.

以上、本発明の具体例についてのみ詳細に説明したが、本発明は係る例に限定されないことは言うまでもない。当業者であれば、特許請求の範囲に記載された範囲内において、各種の変更例または修正例に想到し得ることは明らかであり、それらについても当然に本発明の技術的範囲に属するものと了解される。
As mentioned above, although only the specific example of this invention was demonstrated in detail, it cannot be overemphasized that this invention is not limited to the example which concerns. It will be apparent to those skilled in the art that various changes and modifications can be made within the scope of the claims, and these are naturally within the technical scope of the present invention. Understood.

Claims (7)

(A)下記化学式1で表わされるテトラカルボン酸二無水物と、
(B)下記化学式2で表わされるジアミンと、
(C)下記化学式3で表わされるシロキサン構造を含むジアミンと、
(D)下記化学式4で表わされるトリアミンおよび下記化学式5で表わされるテトラアミンよりなる群から選択されたいずれか1種または2種以上の混合形態のポリアミノ化合物と、
(E)下記化学式6で表わされる3,4−ジアミノ安息香酸と、から構成されるポリイミド接着剤用組成物。
Figure 2006124637
(式中、Xは2価の作用基を示す。)
Figure 2006124637
(式中、Yは2価の作用基を示す。)
Figure 2006124637
(式中、R4は炭素数1〜20のアルキル基、n’は1〜20の整数を示す。)
Figure 2006124637
Figure 2006124637
(式中、A1は3価の作用基、A2は4価の作用基、n1は0または1〜3の整数、n2は0または1〜4の整数、Xは酸、qは酸の塩基数をそれぞれ示す。)
Figure 2006124637
(A) a tetracarboxylic dianhydride represented by the following chemical formula 1,
(B) a diamine represented by the following chemical formula 2,
(C) a diamine containing a siloxane structure represented by the following chemical formula 3,
(D) any one or two or more mixed forms of polyamino compounds selected from the group consisting of a triamine represented by the following chemical formula 4 and a tetraamine represented by the following chemical formula 5;
(E) A composition for polyimide adhesive composed of 3,4-diaminobenzoic acid represented by the following chemical formula 6.
Figure 2006124637
(In the formula, X represents a divalent functional group.)
Figure 2006124637
(In the formula, Y represents a divalent functional group.)
Figure 2006124637
(In the formula, R 4 represents an alkyl group having 1 to 20 carbon atoms, and n ′ represents an integer of 1 to 20).
Figure 2006124637
Figure 2006124637
(In the formula, A1 is a trivalent functional group, A2 is a tetravalent functional group, n1 is an integer of 0 or 1-3, n2 is an integer of 0 or 1-4, X is an acid, and q is the number of bases of the acid. Are shown respectively.)
Figure 2006124637
前記化学式1で表わされるテトラカルボン酸二無水物において、Xが下記化学式1aで表わされる化合物から選択されたいずれか一つの化合物(X1)および下記化学式1bで表わされる化合物から選択されたいずれか一つの化合物(X2)からなり、前記X1およびX2のモル分率が1:0〜0.5:0.5であることを特徴とする、請求項1に記載のポリイミド接着剤用組成物。
Figure 2006124637
Figure 2006124637
In the tetracarboxylic dianhydride represented by the chemical formula 1, any one selected from the compound represented by the following chemical formula 1b and the compound represented by the following chemical formula 1b, X is selected from the compounds represented by the following chemical formula 1a 2. The composition for polyimide adhesive according to claim 1, comprising two compounds (X2), wherein the molar fraction of X1 and X2 is 1: 0 to 0.5: 0.5.
Figure 2006124637
Figure 2006124637
前記ポリイミド接着剤用組成物は、(A)テトラカルボン酸二無水物100モルに対し、(B)ジアミン60〜98モル、(C)シロキサン構造を含むジアミン0.05〜40モル、(D)ポリアミノ化合物0.01〜5モル、及び(E)3,4−ジアミノ安息香酸0.03〜10モルから構成されることを特徴とする、請求項1に記載のポリイミド接着剤用組成物。   The polyimide adhesive composition comprises (A) 100 mol of tetracarboxylic dianhydride, (B) 60 to 98 mol of diamine, (C) 0.05 to 40 mol of diamine containing a siloxane structure, (D) The composition for polyimide adhesive according to claim 1, comprising 0.01 to 5 mol of a polyamino compound and 0.03 to 10 mol of (E) 3,4-diaminobenzoic acid. 前記ポリイミド接着剤用組成物は、(A)テトラカルボン酸二無水物の酸成分100モルに対し、(B)ジアミン、(C)シロキサン構造を含むジアミン、(D)ポリアミノ化合物、および(E)3,4−ジアミノ安息香酸を含む全体アミン成分が101〜106モルであることを特徴とする、請求項1に記載のポリイミド接着剤用組成物。   The polyimide adhesive composition comprises (B) a diamine, (C) a diamine containing a siloxane structure, (D) a polyamino compound, and (E) with respect to (A) 100 moles of the acid component of tetracarboxylic dianhydride. 2. The composition for polyimide adhesive according to claim 1, wherein the total amine component containing 3,4-diaminobenzoic acid is 101 to 106 mol. 請求項1記載のポリイミド接着剤用組成物を有機溶媒に仕込んで窒素雰囲気の下で攪拌し、100℃以下で1〜10時間反応させ、ポリイミドの前駆体であるポリアミド酸を製造し、前記ポリアミド酸を基材に塗布またはコーティングした後、250〜500℃の温度条件で熱的イミド化反応させることを特徴とする、ポリイミドの製造方法。   The composition for polyimide adhesive according to claim 1 is charged in an organic solvent, stirred in a nitrogen atmosphere, and reacted at 100 ° C. or lower for 1 to 10 hours to produce a polyamic acid which is a polyimide precursor, and the polyamide A method for producing a polyimide, characterized in that after applying or coating an acid on a substrate, a thermal imidization reaction is performed at a temperature of 250 to 500 ° C. 製造されたポリイミドの重量平均分子量が10000〜200000であることを特徴とする、請求項5に記載のポリイミドの製造方法。   The method for producing a polyimide according to claim 5, wherein the produced polyimide has a weight average molecular weight of 10,000 to 200,000. 耐熱性の基材フィルムと、
請求項5で製造されたポリイミドを有機溶媒に溶解させて固形分の含量が15〜25重量%となるように製造されたポリイミド接着液を前記基材フィルムの片面または両面に塗布および乾燥させて形成された厚さ5〜150μmのポリイミド接着剤層と、から構成されることを特徴とする、電子部品用ポリイミド接着テープ。
A heat-resistant substrate film;
The polyimide prepared in claim 5 is dissolved in an organic solvent, and a polyimide adhesive prepared to have a solid content of 15 to 25% by weight is applied to one or both sides of the base film and dried. A polyimide adhesive tape for electronic parts, comprising a polyimide adhesive layer having a thickness of 5 to 150 μm formed.
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