JP2005248249A - Film deposition apparatus and film deposition method - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a film deposition apparatus and a film deposition method which are adaptive even to continuous film deposition by quickly performing film deposition treatment after the alignment of a substrate and a mask and thereby dispensing with a substrate transport system between different chambers. <P>SOLUTION: The inside of the same vacuum chamber 2 is provided with: an alignment unit 3 aligning a substrate 5 and a mask 6; a transport tray 14 receiving the substrate 5 and the mask 6 from the alignment unit 3; and a plurality of film deposition sources 81A to 81F arranged along the transport passage of the transport tray 4. Regarding the transfer of the substrate 5 and the mask 6 between the alignment unit 3 and the transport tray 4, a magnet holder 61 is separated from a magnet elevation mechanism 12 via a locking part 67. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

  The present invention relates to a film forming apparatus and a film forming method for forming a film after aligning a substrate and a mask in the same vacuum chamber.

  2. Description of the Related Art An alignment technique for aligning a substrate and a mask with high accuracy is important in a film forming apparatus for forming a film by overlapping a mask on a substrate. For example, in the manufacture of an organic EL (Electro Luminescence) display device using an organic thin film, a predetermined mask pattern (opening) is formed when three types of organic thin films that generate light of three primary colors are formed on the same substrate. A predetermined film forming process such as vapor deposition or sputtering is performed by positioning the mask on which the film is formed with high accuracy on the film forming surface of the substrate.

  By the way, conventionally, in a film forming apparatus used for manufacturing an organic EL display device, a metal mask made of a magnetic material is used as a mask. After the substrate is aligned on the mask, a magnet is formed on the substrate. Are stacked and the substrate is sandwiched between the magnet and the mask to maintain the contact state between the substrate and the mask aligned with each other (see Patent Documents 1 and 2 below).

  In the conventional film forming apparatus, the alignment chamber for aligning the substrate and the mask and the film forming chamber are configured as separate chambers, and the substrate (and mask) is transferred from the alignment chamber to the film forming chamber by a transfer robot or the like. When transporting or forming a multilayer film, the substrate was carried out / in from one film formation chamber to the other film formation chamber (see Patent Document 2 below).

JP 2001-358202 A Japanese Patent Laid-Open No. 2002-367881

  However, in the conventional film forming apparatus, since the alignment chamber and the film forming chamber are configured as different chambers as described above, a substrate transfer system is required between these chambers, and rapid formation after alignment is required. There is a problem that membrane treatment cannot be performed and productivity is inferior.

  Further, in the conventional film forming apparatus, when forming a multilayer film, it is necessary to transfer a substrate across a plurality of film forming chambers. In this case as well, a substrate transfer system between different types of chambers is essential. There is a problem that the configuration is complicated and the productivity is lowered.

  The present invention has been made in view of the above-described problems, and allows a film forming process to be performed quickly after alignment between a substrate and a mask, eliminates the need for a substrate transfer system between different types of chambers, and can also support continuous film forming. It is another object of the present invention to provide a film forming method.

  The above-described problems include an alignment unit that aligns a substrate and a mask in the same vacuum chamber, a transfer tray that receives the substrate and the mask from the alignment unit, and a transfer path of the transfer tray. This is solved by a film forming apparatus comprising a film forming means arranged in the manner described above.

  In addition, the above-described problems are an alignment process in which the substrate and the mask are aligned by the alignment unit in the same vacuum chamber, and a transfer process in which the substrate and the mask are transferred from the alignment unit to a transfer tray. It is solved by a film forming method comprising: forming a film on the film forming surface of the substrate while transporting the transport tray along a transport path.

  According to the present invention, the alignment unit that aligns the substrate and the mask in the same vacuum chamber, the transfer tray that receives the substrate and the mask from the alignment unit, and the transfer path of the transfer tray Since the substrate transported in the vacuum chamber is aligned with the mask, the substrate is transferred to the transport tray, and the substrate film is formed in the transport process by the transport tray. A film can be formed on the surface through a mask. Accordingly, since the film forming process can be performed rapidly after the alignment of the substrates, it is possible to improve productivity while eliminating the need for a complicated substrate transfer system between different types of chambers.

  Further, by disposing film forming means such as a plurality of evaporation sources and sputtering targets in the film forming chamber, it is possible to continuously form a substrate, and it is possible to deal with multilayer film formation.

  As described above, according to the present invention, after the alignment of the substrate and the mask, it is possible to continuously shift to the film forming process, so that the productivity can be improved and the substrate can be formed in one vacuum chamber. The alignment process and the film forming process can be realized, and the multilayer film forming can be sufficiently handled.

  Hereinafter, embodiments of the present invention will be described with reference to the drawings.

  FIG. 1 is a side sectional view showing a schematic configuration of a film forming apparatus 1 according to an embodiment of the present invention. The film forming apparatus 1 includes an alignment unit 3 that aligns the substrate 5 and the mask 6 with each other and maintains the state in one vacuum chamber 2, a transport tray 4 that transports the substrate 5 and the mask 6, and a transport A film forming unit 8 for forming a film on the substrate 5 on the tray 4 through a mask 6 is provided.

  2 to 4 show a schematic configuration of the alignment unit 3. FIG. 2 is a front sectional view of the main part, FIG. 3 is a side view of the main part, and FIG. 4 is a plan view of the main part. The alignment unit 3 includes a substrate support unit 10 that supports the substrate 5, a mask holder 11 that supports the mask 6, and a magnet lifting mechanism 12 that lifts and lowers a magnet 7 (see FIG. 5) that closely contacts the substrate 5 and the mask 6. It has.

  The substrate support unit 10 is disposed at two locations (a total of four locations) on each of a pair of opposite side portions of the substrate 5, and has hooks 21 that support the lower peripheral edge of the substrate 5. Each of these hooks 21 can be moved up and down by a lifting shaft 21A extending in the vertical direction.

  Each of these substrate support units 10 includes a substrate elevating mechanism 31 that elevates and lowers each hook 21 simultaneously.

  The substrate elevating mechanism 31 includes a guide plate 23 that is integrally fixed to the outer periphery of the elevating shaft 21A, and a guide rail 24 that is erected on the support plate 13 that is mounted on the top plate 2a of the vacuum chamber 2. , And a linear bearing 25 that moves the guide plate 23 along the guide rail 24.

  The guide plate 23 supports the lifting shafts 21A and 21A of the pair of substrate support units 10 and 10 adjacent to each other, and the guide plate 23 is configured so that the rotational movement of the ball screw 14 is changed to the lifting movement of the guide plate 23. A block member 15 to be converted is attached (FIG. 3). The ball screw 14 is supported by a base plate 16 and a support plate 13 attached to the upper end of the guide rail 24 and extends in the vertical direction.

  Further, a first drive unit 41 that rotationally drives the ball screw 14 is attached to the base plate 16 (FIG. 3). A pulley 41b is fixed to the drive shaft 41a of the first drive unit 41, and a belt 26A is stretched between the pulley 41b and the pulley 14a fixed to the upper end of the ball screw 14. A pair of pulleys 41b on the first drive unit 41 side is provided, and the other pulley 41b moves up and down the guide plate 23 that supports the lift shaft 21A of the remaining substrate support unit 10 located on the opposite side to the direction shown in FIG. A belt 26B for rotating the ball screw 14 to be rotated is stretched. Thereby, each board | substrate support unit 10 can be raised / lowered simultaneously by the drive of the 1st drive part 41. FIG.

  These substrate support units 10 are also provided with a second drive unit 42 made of a rotary actuator or the like for turning the hook 21 around the lifting shaft 21A (FIG. 3). The second drive unit 42 is connected to the upper end of the elevating shaft 21A via a magnetic fluid seal 27.

  The substrate support unit 10 is configured as described above, and these constitute a “substrate support mechanism” according to the present invention. The substrate 5 is movable up and down relatively with respect to the mask 6 supported by the mask holder 11 at a position directly below the inside of the vacuum chamber 2 by the substrate support mechanism.

  Next, the configuration of the mask holder 11 will be described.

  The mask holder 11 includes a plurality of support claws 51 that support, for example, the lower surfaces of the four corners of the periphery of the mask 6 made of magnetic metal, a plurality of support rods 52 that respectively support the support claws 51 at the lower end portions, and the support rods 52. Is mounted, and a hollow shaft 54 that supports the mounting plate 53 is provided.

  The hollow shaft 54 is inserted into a hollow support shaft 34 that supports the guide rod 33 that guides the lifting and lowering of the mounting plate 53, and can move up and down relatively with respect to the support shaft 34. The guide rod 33 is held at a fixed position inside the vacuum chamber 2, and is connected to the mounting plate 53 via a guide bush 35.

  The mask holder 11 including these hollow shafts 54 is supported on the upper surface of a suspension plate 60 of a magnet lifting mechanism 12 to be described later, and ascends as the suspension plate 60 moves upward, and the suspension plate 60 descends. As it moves, it descends due to its own weight. The lowest position of the mask holder 11 is regulated by a stopper 36 provided at the lower end of the guide rod 33.

  Meanwhile, the support shaft 34 is rotatable on the support plate 13 by a motor 56 and is connected to an XY direction moving portion 58 via a magnetic fluid seal 57. By driving the motor 56 and the XY direction moving unit 58, the mask holder 11 and the mask 6 supported by the guide rod 33, and the mask 6 supported by the guide rod 33, can be moved relative to each other in the X, Y, and θ directions. Thereby, the mask 6 is highly accurate with respect to the substrate 5 supported by the substrate support unit 10 based on the alignment image between the substrate 5 and the mask 6 by the CCD (Charge Coupled Device) camera 59 (FIG. 1). Aligned.

  The motor 56, the XY direction moving unit 58, the CCD camera 59, and the like constitute the “alignment mechanism” of the present invention.

  On the other hand, the magnet elevating mechanism 12 includes a magnet 7 (see FIG. 5) for closely contacting the substrate 5 and the mask 6 that are precisely aligned with each other, a magnet holder 61 for holding the magnet 7 on the lower surface, and a suspension for suspending the magnet holder 61. The plate 60, the magnet raising / lowering shaft 62 which raises / lowers this suspension plate 60, and the 3rd drive part 43 which is connected with the magnet raising / lowering shaft 62 and raises / lowers the magnet holder 61 are provided.

  The magnet elevating shaft 62 is inserted so as to be relatively movable with respect to the axial center portion of the hollow shaft 54 of the mask holder 11, and a third drive unit 43 made of a hydraulic or pneumatic reciprocating cylinder is connected to the upper end portion thereof. ing. A suspension plate 60 is fixed to the lower end portion of the magnet lifting shaft 62.

  The suspension plate 60 supports the mask holder 11 on its upper surface, and moves the mask holder 11 up and down in conjunction with the up and down movement of the magnet lifting shaft 62. A plurality of suspension hooks 66 having a substantially L-shaped cross section for suspending the magnet holder 61 are attached to a lower surface of the suspension plate 60 at predetermined positions. As will be described later, the suspension hook 66 is bent from the standby position of the transport tray 4 toward the transport direction.

  A plate-like magnet 7 is attached to the lower surface of the magnet holder 61, and a locking portion 67 that is detachably locked to the hanging hook 66 of the hanging plate 60 is formed on the upper surface of the magnet holder 61. A plurality of units are attached to correspond. The locking portion 67 is formed in a substantially annular shape, and as will be described later, the direction of separation from the hanging hook 66 is the direction in which the transport tray 4 moves toward the film forming portion 8.

  The magnet holder 61 is provided with a substrate presser 64 that restricts the positional deviation of the substrate 5 when the magnet 7 is attached to or detached from the substrate 5. The substrate retainer 64 has a thin plate shape made of a nonmagnetic metal material such as aluminum, and is suspended through a plurality of stepped pins 63 so as to be movable up and down by a predetermined distance relative to the magnet holder 61. .

  The alignment unit 3 is configured as described above. Next, the transport tray 4 will be described. 5 and 6 are diagrams showing the configuration of the transport tray 4, FIG. 5 is a cross-sectional view seen from the transport direction, and FIG. 6 is a plan view thereof.

  The transport tray 4 includes a rectangular tray main body 70 in which an opening 71 that exposes the film formation surface of the substrate 5 to the lower outside of the tray is formed in the center, and wheel brackets 72A provided on both sides of the tray main body. , 72B and wheels 73A, 73B attached to the wheel brackets 72A, 72B, respectively.

  The opening 71 of the transport tray 4 has a substantially rectangular shape, and is tapered in a reverse mortar shape from the upper surface side to the lower surface side of the tray body 70. The peripheral upper surface portion of the opening 71 is a mounting surface for the mask 6 and the substrate 5, the magnet 7, and the like superimposed thereon. Further, an adhesion preventing plate 78 is attached to the lower peripheral surface of the opening 71.

  Recess grooves 75 and 75 for avoiding interference with the support claws 51 of the mask holder 11 that supports the mask 6 are formed on both sides of the opening 71 in the tray conveyance direction, respectively, over the rear end of the tray body 70. . Thereby, after placing the mask 6 and the substrate 5 or magnet 7 or the like superimposed on the placement surface of the tray main body 70, these escape grooves are moved as the tray main body 70 moves in the conveyance direction of the conveyance tray 4. A support claw 51 is pulled out from the rear end portion of the tray body 4 via 75.

  Note that the hook 21 of the substrate support unit 10 that supports the substrate 5 is transported together with the support claws 51 of the mask holder 11 through a predetermined relief portion formed on the side edge of the mask 6 superimposed on the substrate 5. As the tray 4 is transported, the tray body 70 comes out of the rear end.

  The wheels 73A and 73B are supported by a pair of transport rails 74A and 74B that constitute the transport path of the transport tray 4. One wheel 73A has a substantially V-shaped groove formed on the rolling contact surface of the transport rail 74A, and the transport rail 74A that supports the groove also has a protrusion having a substantially triangular cross section corresponding thereto. In the other wheel 73B, the rolling contact surface of the transport rail 74B is flat, and the transport rail 74B that supports it also has a flat shape corresponding thereto. Thereby, the conveyance tray 4 is positioned with respect to the one wheel 73A side as a reference.

  Regarding the positioning of the transport tray 4, as shown in FIG. 2, guide rollers 76 </ b> A and 76 </ b> B that are in rolling contact with the wheel brackets 72 </ b> A and 72 </ b> B of the transport tray 4 are further provided. The guide rollers 76A and 76B can be moved back and forth between a retracted position indicated by a solid line in FIG. 2 and a guide position indicated by an alternate long and short dash line by drive portions 77A and 77B attached to both side walls of the vacuum chamber 2.

  A rack-and-pinion mechanism is adopted for the transport method of the transport tray 4. That is, a rack 79 attached to the lower end of one wheel bracket 72A is configured to mesh with a pinion gear (not shown) arranged in parallel with the transport rail 74A, and the transport tray 4 can be precisely fed. It is possible.

  As described above, the “guide mechanism” of the present invention is configured by the wheels 73A and 73B, the conveyance rails 74A and 74B, the guide rollers 76A and 76B, and the like.

  The wheels 73A and 73B are attached inward to the outer walls of the substantially U-shaped wheel brackets 72A and 72B, respectively. Then, in order to prevent the deposition material from adhering to the wheels 73A and 73B and the transport rails 74A and 74B, along the transport path of the transport tray 4 so as to cover the wheels 73A and 73B and the transport rails 74A and 74B from the inside. Shielding plates 75A and 75B are provided respectively.

  Next, the film forming unit 8 will be described with reference to FIG.

  The film forming unit 8 is configured in a straight cylindrical tube 80 of the vacuum chamber 2, and a plurality of film forming units are arranged adjacent to each other along the transfer path of the transfer tray 4. In this embodiment, an example in which six types of sputtering target units 81A to 81F are provided and a film forming material is formed on a substrate by a sputtering method is shown. Instead, an evaporation source is provided, and a film formation source corresponding to the film formation method is installed.

  The sputter target units 81A to 81F are provided on a film formation source mounting base 82 disposed below the transport rails 74A and 74B, so that the film formation source can be easily changed according to the application. . Each of the sputter target units 81A to 81F may be composed of targets of the same material, or may be composed of targets of different materials.

  A maintenance outlet 83 is provided at the rear end of the cylindrical tube 80 for taking out the transport tray 4 out of the system.

  The film forming apparatus 1 of the present embodiment is configured as described above. The alignment unit 3 of the film forming apparatus 1 is generally configured on a support plate 13 placed on the top plate portion 2 a of the vacuum chamber 2, so that the pressure difference between the inside and outside of the vacuum chamber 2 can be reduced. The alignment operation is prevented from being affected by the resulting deformation of the top plate 2a.

  In the vacuum chamber 2, the film forming apparatus 1 aligns the substrate 5 and the mask 6 by the alignment unit 3, and transfers the substrate 5 and the mask 6 from the alignment unit 3 to the transport tray 4. A transfer process and a film forming process for forming a film on the film forming surface of the substrate 5 by the film forming unit 8 while carrying the transfer tray 4 along the transfer path are performed. Hereinafter, the operation of the film forming apparatus 1 will be described.

  First, referring to FIG. 2, the lower surface of the peripheral portion of the substrate 5 carried into the vacuum chamber 2 with the film formation surface facing downward is supported by a hook 21 of each substrate support unit 10 by a robot (not shown). The film formation surface (lower surface) side of the substrate 5 supported by the substrate support unit 10 faces the mask 6 supported by the mask holder 11, and the opposite non-film formation surface (upper surface) side is suspended from the magnet holder 61. It faces the pressed substrate holder 64.

  Next, in the state shown in FIG. 2, the alignment unit 3 aligns the substrate 5 and the mask 6. The substrate 5 and the mask 6 are aligned with respect to the substrate 5 stationary by the substrate support unit 10 by moving the mask holder 11 that supports the mask 6 to θ, X, and Y by the motor 56 and the XY direction moving unit 58. The substrate 5 and the mask 6 are aligned by relative movement in the direction.

  Specifically, each image of the alignment mark on the substrate 5 and the alignment mark on the mask 6 is acquired by the CCD camera 59, and the motor 56 and the XY-direction moving unit 58 are driven based on these alignment marks, and the mask holder 11 is moved in each direction of θ, X, and Y.

  After the alignment of the substrate 5 and the mask 6 is performed as described above, the substrate supporting units 10 are simultaneously lowered by driving the substrate lifting mechanism unit 31 and the suspension plate 60 is driven by the third driving unit 43. The mask holder 11 supported by the above is lowered, and the mask 6 and the substrate 5 are transferred in this order onto the mounting surface of the transport tray 4 waiting below. At this time, the mask holder 11 is lowered by obtaining a guide action by the guide rod 33, and a predetermined alignment accuracy is ensured.

  In addition, not only the above-described operation example in which the substrate 5 is lowered together with the mask 6 toward the transport tray 4, but the substrate 5 is once stacked on the mask 6 and the support action of the substrate 5 by the substrate support unit 10 is released. The mask 6 and the substrate 5 supported by the mask holder 6 may be integrally transferred to the transport tray 4. In this case, if each substrate support unit 10 overlaps the substrate 5 on the mask 6 and then turns each hook 21 to the outside of the substrate 5 by driving the second drive unit 42, the substrate 5 The transfer operation to the transport tray 4 is not hindered.

  Next, the third drive unit 43 is further driven to move the suspension plate 60 downward relative to the mask holder 11 as shown in FIG. 7, and the magnet holder 61 suspended from the suspension plate 60. Is overlaid on the non-deposition surface (upper surface) of the substrate 5.

  At this time, the substrate retainer 64 suspended from the magnet holder 61 reaches the upper surface of the substrate 5 before the magnet 7 attached to the lower surface of the magnet holder 61, and the substrate 5 is moved by its own weight. The action of pressing toward the mask 6 is performed. Then, the magnet 7 is placed on the substrate presser 64 in contact with the substrate 5 while suppressing deformation of the mask 6 toward the magnet 7 due to the magnetic force of the magnet 7. Thereby, precise alignment and adhesion between the substrate 5 and the mask 6 can be achieved (FIG. 5).

  As described above, the transfer process of the substrate 5 and the mask 6 to the transport tray 4 is completed. Subsequently, a film forming process is performed on the film forming surface of the substrate 5 while the transfer tray 4 is transferred along the transfer path.

  As shown in FIGS. 1 and 2, the transport tray 4 stands by at a transfer position that is directly below the alignment unit 3. After the substrate 5 and the mask 6 integrated by the magnet 7 are placed on the placing surface of the carrying tray 4, the guide rollers 76A and 76B extended by the driving units 77A and 77B are used to appropriately move in the carrying direction. While being guided, the film is transported to the film forming unit 8 along the transport rails 74A and 74B.

  At this time, the locking portion 67 of the magnet holder 61 locked to the hanging hook 66 of the hanging plate 60 is suspended when the transport tray 4 moves in the direction indicated by the arrow A as shown in FIG. The locking action with the hook 66 is released. Thereby, the suspending plate 60 and the magnet holder 61 are separated from each other, and the magnet holder 61 is supported on the transport tray 4 together with the magnets 7.

  The film formation on the substrate 5 is performed through the opening 71 of the transfer tray 4 at positions immediately above the sputtering target units 81 </ b> A to 81 </ b> F, and a film formation pattern having a shape corresponding to the opening pattern of the mask 6 is formed on the substrate 5. It is formed on the film surface. In the film forming process in the film forming unit 8, the transfer tray 4 may be intermittently sent to positions directly above the sputter target units 81A to 81F, or the positions directly above the sputter target units 81A to 81F may be set at a constant speed. You may make it send continuously.

  Further, if a sputter target of the same material is applied to each of the sputter target units 81A to 81F, a thick film formation pattern can be obtained, and if a sputter target of a different material is applied, a multi-layer film formation pattern can be obtained. Can be obtained.

  As described above, according to the present embodiment, the alignment unit 3 that aligns the substrate 5 and the mask 6 with high accuracy and the film formation unit 8 that forms the film formation pattern of the predetermined material on the substrate 5 are the same. Since it is equipped in the vacuum chamber 2, it is possible to quickly move to the film forming process after the alignment process, thereby improving the productivity.

  Further, since the substrate 5 is transferred from the alignment unit 3 to the film forming unit 8 by the transfer tray 4, the configuration of the transfer system can be simplified as compared with the conventional substrate transfer system between different vacuum chambers. Thus, it is possible to reduce the device manufacturing cost and improve the maintainability.

  Subsequently, after the film formation of the substrate 5 is performed in the film forming unit 8, the transport tray 4 is returned to the initial transfer position along the transport rails 74 </ b> A and 74 </ b> B, and the film is formed from the transport tray 4 to the alignment unit 3. A step of transferring the already-finished substrate 5 together with the mask 6 and the magnet 7 is performed.

  At the transfer position, the support claw 51 of the mask holder 11 and the hook 21 of the substrate support unit 10 are on standby, and the support claw 51 is placed on the lower peripheral edge of the substrate 5 and the mask 6 by returning the transfer tray 4 to the transfer position. And the hook 21 face each other. Further, the locking portion 67 of the magnet holder 61 and the hanging hook 66 of the hanging plate 60 are locked. And the magnet raising / lowering axis | shaft 62 is raised and the magnet holder 61 is lifted via the suspension plate 60 (FIG. 7).

  At this time, since the upper surface of the substrate 5 is pressed by the substrate retainer 64, the bending deformation of the mask 6 due to the magnetic force of the magnet 7 is suppressed, and the positional deviation between the substrate 5 and the mask 6 is prevented. Thereby, damage to the pattern formed on the film formation surface of the substrate 5 due to the positional deviation between the substrate 5 and the mask 6 can be avoided, and the film formation surface of the substrate 5 can be protected.

  Next, the substrate 5 is lifted by raising the substrate support unit 10, and the mask holder 11 is lifted integrally with the suspension plate 60, thereby transferring the substrate 5 and the mask 6 from the transport tray 4 to the alignment unit 3. Complete. Thereafter, a robot (not shown) enters below the substrate 5 and is carried out of the vacuum chamber 2, and a new substrate 5 to be processed next is placed on the hook 21 of the substrate support unit 10.

  The embodiment of the present invention has been described above. Of course, the present invention is not limited to this, and various modifications can be made based on the technical idea of the present invention.

  For example, in the above embodiment, after the substrate 5 and the mask 6 are placed on the transport tray 4, the substrate 5 and the mask 6 are brought into close contact with the magnet 7. After the alignment with the mask 6 is completed, the configuration of the magnet elevating mechanism 12 may be changed so that the substrate 5 is overlaid on the mask 6 and is brought into close contact with the magnet 7 before being transferred to the transport tray 4. Good. In this case, the substrate 5 and the mask 6 are transferred to the transport tray 4 in a state of being integrated by the magnet 7.

It is a schematic block diagram of the film-forming apparatus 1 by embodiment of this invention. 3 is a front sectional view showing a main part of the alignment unit 3. FIG. 3 is a side view showing a main part of the alignment unit 3. FIG. 4 is a plan view showing a main part of the alignment unit 3. FIG. It is sectional drawing when the conveyance tray 4 is seen from the conveyance direction. FIG. 4 is a plan view of a transport tray 4. 5 is a front cross-sectional view illustrating an operation of the alignment unit 3. FIG. FIG. 6 is a side sectional view for explaining an operation of the transport tray 4.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Film-forming apparatus 2 Vacuum chamber 3 Alignment unit 4 Transfer tray 5 Substrate 6 Mask 7 Magnet 8 Film-forming part 10 Substrate support unit 11 Mask holder 12 Magnet elevating mechanism 13 Support plate 21 Hook 21A Elevating shaft 31 Substrate elevating mechanism part 33 Guide rod 34 Support shaft 41 1st drive part 42 2nd drive part 43 3rd drive part 51 Supporting claw 54 Hollow shaft 56 Motor 58 XY direction moving part 59 CCD camera 60 Hanging plate 61 Magnet holder 62 Magnet lifting shaft 64 Substrate presser 67 Locking part 70 Tray body 71 Opening part 73A, 73B Wheel 74A, 74B Transport rail 81A-81F Sputter target unit

Claims (10)

  In the same vacuum chamber, an alignment unit that aligns the substrate and the mask, a transfer tray that receives the substrate and the mask from the alignment unit, and a component that is disposed along the transfer path of the transfer tray. A film forming apparatus comprising a film means.   The alignment unit includes a substrate support mechanism that supports the substrate so as to be movable up and down with respect to the mask made of a magnetic material supported by a mask holder, an alignment mechanism that aligns the mask and the substrate, and the mask 2. A magnet lifting mechanism that lifts and lowers a magnet that closely contacts the substrate with respect to the substrate, and the magnet is provided with an engaging portion that is detachable from the magnet lifting mechanism. 2. The film forming apparatus according to 1.   The magnet lifting mechanism includes a magnet holder that is fixed to a lower end of a lifting shaft and holds the magnet, and a substrate presser that is suspended relative to the magnet holder and is opposed to the upper surface of the substrate. The film forming apparatus according to claim 2.   The said conveyance tray is provided with the tray main body in which the opening part which exposes the film-forming surface of the said board | substrate to the exterior of a tray was formed, and the guide mechanism which guides this tray main body to the said conveyance path | route. Film forming equipment.   The film forming apparatus according to claim 1, wherein the film forming unit is a plurality of evaporation sources or sputter targets arranged along the transfer path.   The film forming apparatus according to claim 1, wherein the alignment unit is supported on a support plate disposed on a top plate of the vacuum chamber.   In the same vacuum chamber, an alignment step of aligning the substrate and the mask by the alignment unit, a transfer step of transferring the substrate and the mask from the alignment unit to the transfer tray, and a transfer path for the transfer tray And a film forming step of forming a film on the film forming surface of the substrate while being conveyed along the substrate.   The film forming method according to claim 7, further comprising a step of transferring the substrate and the mask from the transfer tray to the alignment unit after forming the substrate.   In the alignment step, the substrate and the mask are brought into close contact with each other by attaching a magnet to the mask made of a magnetic material via the substrate, and in the transfer step, the substrate and the mask are held by holding the magnet. The film-forming method of Claim 7 including the process of isolate | separating the said magnet from the alignment unit which aligns. The film forming method according to claim 7, wherein in the film forming step, the substrate is transported on a plurality of evaporation sources or sputtering targets arranged along the transport path.

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