JP2005221984A5 - - Google Patents

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JP2005221984A5
JP2005221984A5 JP2004032396A JP2004032396A JP2005221984A5 JP 2005221984 A5 JP2005221984 A5 JP 2005221984A5 JP 2004032396 A JP2004032396 A JP 2004032396A JP 2004032396 A JP2004032396 A JP 2004032396A JP 2005221984 A5 JP2005221984 A5 JP 2005221984A5
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Prior art keywords
resistor
optical
optical element
liquid crystal
crystal layer
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JP2004032396A
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Japanese (ja)
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JP4451669B2 (en
JP2005221984A (en
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Priority claimed from JP2004032396A external-priority patent/JP4451669B2/en
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Publication of JP2005221984A5 publication Critical patent/JP2005221984A5/ja
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Claims (15)

液晶層と、該液晶層を保持する基板と、該基板上に設けられた複数の電極と、該複数の電極を電気的に接続する抵抗体を有し、該抵抗体を通電することにより前記複数の電極の各々に所望の電位を与え、前記液晶層の液晶分子方向を制御する光学素子において、
前記抵抗体は、少なくとも所望の抵抗値を発現するための材料を前記基板に塗布することにより形成された塗布型抵抗体であることを特徴とする光学素子。
A liquid crystal layer; a substrate that holds the liquid crystal layer; a plurality of electrodes provided on the substrate; and a resistor that electrically connects the plurality of electrodes. In an optical element that applies a desired potential to each of a plurality of electrodes and controls the liquid crystal molecule direction of the liquid crystal layer,
The optical element, wherein the resistor is a coating type resistor formed by applying a material for expressing at least a desired resistance value to the substrate.
請求項1記載の光学素子において、
前記塗布型抵抗体は、前記基板上の前記液晶層を通過する光の光路外に配置されていることを特徴とする光学素子。
The optical element according to claim 1, wherein
The optical element according to claim 1, wherein the coating type resistor is disposed outside an optical path of light passing through the liquid crystal layer on the substrate.
請求項1または2記載の光学素子において、
前記塗布型抵抗体は、前記基板上の前記液晶層より外側に配置されていることを特徴とする光学素子。
The optical element according to claim 1 or 2,
The optical element according to claim 1, wherein the coating-type resistor is disposed outside the liquid crystal layer on the substrate.
請求項1〜3の何れか一つに記載の光学素子において、
前記塗布型抵抗体の材料は、導電性有機材料を含むことを特徴とする光学素子。
In the optical element as described in any one of Claims 1-3,
The optical element characterized in that the material of the coating type resistor includes a conductive organic material.
請求項1〜4の何れか一つに記載の光学素子において、
前記塗布型抵抗体の周囲の湿度変動に伴う前記塗布型抵抗体の抵抗値の変動を抑制するための防湿手段を設けることを特徴とする光学素子。
In the optical element as described in any one of Claims 1-4 ,
An optical element comprising a moisture-proof means for suppressing a variation in resistance value of the coating type resistor due to a humidity variation around the coating type resistor .
請求項1〜の何れか一つに記載の光学素子において、
前記塗布型抵抗体に対して少なくとも所望の波長域の光が照射されるのを防止する遮光手段を備えることを特徴とする光学素子。
In the optical element as described in any one of Claims 1-5 ,
An optical element comprising light shielding means for preventing at least light in a desired wavelength range from being applied to the coating resistor.
請求項記載の光学素子において、
前記遮光手段が、オーバーコート層であることを特徴とする光学素子。
The optical element according to claim 6 .
The optical element , wherein the light shielding means is an overcoat layer .
請求項1〜7の何れか一つに記載の光学素子からなる光偏向素子であって
少なくとも液晶層と、該液晶層を挟持する透明な一対の基板と、該基板上に平行に配置された複数の電極と、該複数の電極を電気的に接続する塗布型抵抗体を備え、前記塗布型抵抗体に通電することにより、前記複数の電極に電位勾配を発生させることで電界を発生させ、その電界方向により、前記液晶層の液晶分子の配向方向を切換え、入射光に対する出射光の光路を切換えることを特徴とする光偏向素子
An optical deflection element comprising the optical element according to any one of claims 1 to 7 ,
Comprising at least a liquid crystal layer, a transparent pair of substrates sandwiching the liquid crystal layer, a plurality of electrodes arranged in parallel on the substrate, and a coating resistor for electrically connecting the plurality of electrodes, By energizing the coating-type resistor, an electric field is generated by generating a potential gradient in the plurality of electrodes, and the orientation direction of the liquid crystal molecules of the liquid crystal layer is switched according to the direction of the electric field. An optical deflection element characterized by switching an optical path .
請求項1〜7の何れか一つに記載の光学素子からなる光偏向素子であって
少なくともホメオトロピック配向をなすキラルスメクチックC相を形成可能な液晶層と、該液晶層を挟持する透明な一対の基板と、該基板上に平行に配置された複数の電極と、該複数の電極を電気的に接続する塗布型抵抗体とを備え、前記塗布型抵抗体に通電することにより、前記複数の電極に電位勾配を発生させることで電界を発生させ、その電界方向によって、前記液晶層の液晶分子の配向方向を切換え、入射光に対する出射光の光路を切換えることを特徴とする光偏向素子。
An optical deflection element comprising the optical element according to any one of claims 1 to 7 ,
A liquid crystal layer capable of forming a chiral smectic C phase having at least homeotropic alignment, a pair of transparent substrates sandwiching the liquid crystal layer, a plurality of electrodes arranged in parallel on the substrate, and the plurality of electrodes A coating resistor that is electrically connected, and by energizing the coating resistor, an electric field is generated by generating a potential gradient in the plurality of electrodes. An optical deflection element characterized by switching the orientation direction of liquid crystal molecules and switching the optical path of outgoing light with respect to incident light .
少なくとも、請求項8または9記載の光偏向素子と、該光偏向素子の前記抵抗体に対して電極の配列方向に電圧を印加する電圧印加手段を備えたことを特徴とする光偏向装置 At least, the optical deflection apparatus characterized by comprising an optical deflection element of claim 8 or 9, wherein a voltage applying means for applying a voltage to the array direction of the electrode relative to the resistor of the light deflection element. 請求項10記載の光偏向装置において、
前記電圧印加手段として、基板上の複数の電極と電気的に接続されてなる抵抗体に同一の電源を接続することを特徴とする光偏向装置
The optical deflection apparatus according to claim 10 , wherein
An optical deflection apparatus characterized in that, as the voltage applying means, the same power source is connected to a resistor electrically connected to a plurality of electrodes on a substrate .
少なくとも、画像情報に従って光を二次元的に制御可能な画像表示手段と、該画像表示手段の画像情報を観察または投射するための光学部材と、画像フィールドを時間的に分割した複数のサブフィールド毎に画像表示手段と光学部材の間の光路を偏向する光偏向装置とを備えた画像表示装置において、
前記光偏向装置として請求項10または11記載の光偏向装置を備えたことを特徴とする画像表示装置
At least an image display means capable of two-dimensionally controlling light according to image information, an optical member for observing or projecting image information of the image display means, and a plurality of subfields obtained by temporally dividing the image field In an image display device comprising an optical deflection device for deflecting an optical path between the image display means and the optical member ,
12. An image display device comprising the light deflection device according to claim 10 or 11 as the light deflection device .
請求項1〜7の何れか一つに記載の光学素子の前記抵抗体の形成方法において、
前記抵抗体を、所望の抵抗値を発現する材料を基板に塗布することにより形成することを特徴とする抵抗体形成方法。
In the formation method of the resistor of the optical element according to any one of claims 1 to 7 ,
The resistor is formed by applying a material that expresses a desired resistance value to a substrate .
請求項13記載の抵抗体形成方法において、
前記抵抗体は、インクジェツト方式による液状抵抗材の噴射により形状を制御し、塗布することを特徴とする抵抗体形成方法
The resistor forming method according to claim 13 ,
The resistor is formed by controlling the shape of the resistor by spraying a liquid resistor using an ink jet method, and applying the resistor .
請求項13記載の抵抗体形成方法において、
前記抵抗体の含有水分量の調節により所望の抵抗値にした後、防湿手段を施すことを特徴とする抵抗体形成方法
The resistor forming method according to claim 13 ,
A resistor forming method , wherein moisture resistance is applied after a desired resistance value is obtained by adjusting the moisture content of the resistor .
JP2004032396A 2004-02-09 2004-02-09 Optical element, optical deflection element, optical deflection apparatus, image display apparatus, and resistor forming method Expired - Fee Related JP4451669B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004032396A JP4451669B2 (en) 2004-02-09 2004-02-09 Optical element, optical deflection element, optical deflection apparatus, image display apparatus, and resistor forming method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004032396A JP4451669B2 (en) 2004-02-09 2004-02-09 Optical element, optical deflection element, optical deflection apparatus, image display apparatus, and resistor forming method

Publications (3)

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JP2005221984A JP2005221984A (en) 2005-08-18
JP2005221984A5 true JP2005221984A5 (en) 2007-03-29
JP4451669B2 JP4451669B2 (en) 2010-04-14

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JP4808715B2 (en) 2005-07-29 2011-11-02 カルピス株式会社 Menopause prevention / amelioration agent and functional food and drink
JP5004461B2 (en) * 2005-11-17 2012-08-22 株式会社アルバック Method for forming porous silica film
JP2008107487A (en) * 2006-10-24 2008-05-08 Seiko Epson Corp Method for manufacturing wavelength conversion element and wavelength conversion element
US9772429B2 (en) 2013-05-14 2017-09-26 Essilor International (Compagnie Generale D'optique) Fluorine-doped stannic oxide colloids and method for preparing same

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