JP2005221917A - Electromechanical type optical shutter element and optical shutter array - Google Patents

Electromechanical type optical shutter element and optical shutter array Download PDF

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JP2005221917A
JP2005221917A JP2004031630A JP2004031630A JP2005221917A JP 2005221917 A JP2005221917 A JP 2005221917A JP 2004031630 A JP2004031630 A JP 2004031630A JP 2004031630 A JP2004031630 A JP 2004031630A JP 2005221917 A JP2005221917 A JP 2005221917A
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light
electrode
support substrate
movable electrode
movable
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Fumihiko Mochizuki
文彦 望月
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Fujifilm Holdings Corp
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Fuji Photo Film Co Ltd
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<P>PROBLEM TO BE SOLVED: To provide an electromechanical type optical shutter element having large freedom in design and a simple structure, manufactured at a low cost, easily controlled and independent of wavelength. <P>SOLUTION: The electromechanical type optical switch element is composed by providing: a fixed electrode erected vertically on a transparent substrate; a movable electrode which is supported facing to the fixed electrode with a gap on the supporting substrate; and a light shielding film which shields light advancing vertically to the supporting substrate on the movable electrode. The electromechanical type optical switch element having a large stroke is obtained by using the two electromechanical type optical switches. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

本発明は、静電気力、電磁力、電歪等の吸引力により可動薄膜を移動させて、光の透過、遮断を行う電気機械式光シャッター素子及び光シャッターアレイに関する。   The present invention relates to an electromechanical optical shutter element and an optical shutter array that transmit and block light by moving a movable thin film by an attractive force such as electrostatic force, electromagnetic force, and electrostriction.

この分野において、電気機械式光シャッター素子で光の制御を行う光スイッチとしてはシリコン基板上に梁が垂直に動くようにした回折格子光バルブ等が早くから知られている(例えば、特許文献1および2参照)。
特表平10−510374号公報 特開平11−258558号公報
In this field, as an optical switch for controlling light with an electromechanical optical shutter element, a diffraction grating light valve or the like in which a beam moves vertically on a silicon substrate has been known (for example, Patent Document 1 and 2).
Japanese National Patent Publication No. 10-510374 JP 11-258558 A

特許文献1記載の光ビーム変調器は、次のa〜dから構成されている。
a.各要素が第一の縁及び第二の縁及び光反射平面を有する複数の細長い要素と、前記要素は第一のグループの要素が第二のグループの要素と互いにかみあわされるように前記第一のグループと前記第二のグループにグループ分けされ、かつ前記要素は互いに平行に配列されている。
b.それらの縁で前記第一のグループ及び前記第二のグループの要素を懸架する手段、 c.前記第一のグループに第一のバイアス電圧を印加する手段及び前記反射表面が実質的に同一平面にありかつ入射光ビームを反射する第一の平面内にあるように前記第二のグループに第二のバイアス電圧を印加する手段、
d.第一の平面に平行でありかつ前記入射光ビームを回折する第二の平面に向けて前記平面に垂直な前記第一のグループの前記要素を選択的に偏向させる手段。
The light beam modulator described in Patent Document 1 includes the following a to d.
a. A plurality of elongate elements, each element having a first edge and a second edge and a light reflecting plane; and the elements are arranged in such a way that the first group of elements are interdigitated with the second group of elements. And the second group, and the elements are arranged in parallel to each other.
b. Means for suspending the elements of the first group and the second group at their edges; c. Means for applying a first bias voltage to the first group and the second group such that the reflective surface is substantially coplanar and in a first plane that reflects the incident light beam; Means for applying a second bias voltage;
d. Means for selectively deflecting the elements of the first group that are parallel to a first plane and perpendicular to the plane toward a second plane that diffracts the incident light beam;

このように、特許文献1記載の発明である回折格子光バルブは、入射光ビームを変調するもので、複数の細長い要素がそれぞれ反射表面を有する反射型であるため、光の透過/遮断の制御を行うことができないという問題があった。   As described above, the diffraction grating light valve according to the invention described in Patent Document 1 modulates an incident light beam, and a plurality of elongated elements each have a reflective surface, and thus control of light transmission / blocking. There was a problem that could not be done.

一方、特許文献2記載の光変調器は、紫外線の平面光源上に、電気機械動作により平面光源からの光を光変調する一次元又は二次元マトリクス状の光変調部を配設し、この光変調部から出射される光に励起される蛍光体を光変調部に対して対向配置し、また光変調部を、導光板上に設けた一方の電極である透明な信号電極と、この信号電極に空隙を挟んで対向する透明な可撓薄膜と、可撓薄膜に設けられ信号電極に対向する他方の電極である走査電極とを具備し、信号電極と走査電極とに電界を印加することで発生した静電気力によって可撓薄膜を撓ませ、可撓薄膜を透過して出射する光を変調するものである。   On the other hand, the light modulator described in Patent Document 2 has a one-dimensional or two-dimensional matrix-shaped light modulation unit that modulates light from a planar light source by an electromechanical operation on an ultraviolet planar light source. A fluorescent material excited by light emitted from the modulation section is disposed opposite to the light modulation section, and the light modulation section is a transparent signal electrode which is one electrode provided on the light guide plate, and the signal electrode A transparent flexible thin film facing each other with a gap in between, and a scanning electrode which is provided on the flexible thin film and is opposed to the signal electrode, and applying an electric field to the signal electrode and the scanning electrode. The flexible thin film is bent by the generated electrostatic force, and light emitted through the flexible thin film is modulated.

特許文献2記載の発明は、透過形のもので、光利用効率が良く、高真空化が不要で、安価なコストで大面積化が可能であり、しかも高画質が得られるものである。しかしながら、透過型光制御で干渉を用いているため、干渉膜の歪みなどがあると光スイッチのON/OFFに影響するので歪みがないように素子を作らなければならないという作製上の制御が難しくなる欠点や、干渉膜を用いているため、多層構成となり、構造が複雑となり、コスト高になる欠点があった。   The invention described in Patent Document 2 is of a transmissive type, has good light utilization efficiency, does not require high vacuum, can be increased in area at low cost, and can provide high image quality. However, since interference is used in transmissive light control, if there is distortion of the interference film, etc., it affects the ON / OFF of the optical switch. Since the interference film is used, there is a disadvantage that the structure becomes multi-layered, the structure is complicated, and the cost is high.

本発明はこれらの欠点を解決するもので、透過型にして設計の自由度の大きい、構造が簡単で、コスト安で、制御が簡単で、単純に光の経路をシャットするだけなので波長依存性がない電気機械式光シャッター素子を提供することを目的としている。   The present invention solves these drawbacks, and is transmissive and has a high degree of design freedom, simple structure, low cost, easy control, and simply shuts down the light path, so it is wavelength dependent. An object of the present invention is to provide an electromechanical optical shutter element that does not have any.

上記の課題を解決するため、請求項1記載の電気機械式光シャッター素子の発明は、透明もしくは光を透過する機能を有した支持基板上に該支持基板に対して垂直に立設された固定電極と、前記支持基板又は固定電極上に前記固定電極と間隔を置いて対向配置状態に支持された可動電極又は電極付き可動膜(以下、可動電極と言う)と、前記支持基板に対して垂直方向に進む光を遮断もしくは反射する機能を有した膜(以下、遮光膜と言う)を前記可動電極に設け、前記固定電極と前記可動電極との間に作用する力で前記可動電極を変位させてその遮光膜で光の透過/遮断を制御することを特徴とする。   In order to solve the above-mentioned problems, the invention of the electromechanical optical shutter element according to claim 1 is characterized in that the fixing is erected perpendicularly to the support substrate on the support substrate having a function of being transparent or transmitting light. An electrode, a movable electrode or a movable film with an electrode (hereinafter referred to as a movable electrode) supported on the support substrate or the fixed electrode at a distance from the fixed electrode, and perpendicular to the support substrate A film having a function of blocking or reflecting light traveling in the direction (hereinafter referred to as a light shielding film) is provided on the movable electrode, and the movable electrode is displaced by a force acting between the fixed electrode and the movable electrode. The transmission / blocking of light is controlled by the light-blocking film.

請求項2記載の電気機械式光シャッター素子の発明は、請求項1記載の電気機械式光シャッター素子を複数個、不動作時に互いにその遮光板を突き合わせ状態で配置したことを特徴とする。   The invention of the electromechanical optical shutter element according to claim 2 is characterized in that a plurality of electromechanical optical shutter elements according to claim 1 are arranged with their light-shielding plates abutting each other when not operating.

請求項3記載の電気機械式光シャッター素子の発明は、透明もしくは光を透過する機能を有した支持基板上に該支持基板に対して垂直に立設された固定電極と、前記支持基板又は固定電極上に前記固定電極と間隔を置いて対向配置状態に支持された可動電極と、前記支持基板に対して垂直方向に進む光を遮断する遮光膜を前記可動電極に設け、前記固定電極と前記可動電極との間に作用する力で前記可動電極を変位させてその遮光膜で光の透過/遮断を制御する電気機械式光シャッター素子を2個、不動作時に互いにその遮光板を突き合わせ状態で配置した電気機械式光シャッター素子であって、前記固定電極側に設けられた支持部材と前記可動電極の互いの対向面側に、動作時に互いに嵌(はま)り合うことのできる凹凸状の起伏を形成したことを特徴とする。   According to a third aspect of the present invention, there is provided an electromechanical optical shutter element comprising: a fixed electrode standing vertically to a support substrate having a transparent or light transmitting function; and the support substrate or the fixed substrate. A movable electrode supported in a state of being opposed to the fixed electrode at an interval on the electrode, and a light-shielding film that blocks light traveling in a direction perpendicular to the support substrate are provided on the movable electrode, and the fixed electrode and the Two electromechanical optical shutter elements that control the transmission / blocking of light by the light shielding film by displacing the movable electrode with a force acting between the movable electrode and the light shielding plate in contact with each other when not operating. An electromechanical optical shutter element that is arranged in a concavo-convex shape that can be fitted into each other during operation on the opposing surfaces of the support member and the movable electrode provided on the fixed electrode side. Forming undulations It is characterized in.

請求項4記載の電気機械式光シャッター素子の発明は、透明もしくは光を透過する機能を有した支持基板上に該支持基板に対して垂直に立設された固定電極と、前記支持基板又は固定電極上に前記固定電極と間隔を置いて対向配置状態に支持された可動電極と、前記支持基板に対して垂直方向に進む光を遮断する遮光膜を前記可動電極に設け、前記固定電極と前記可動電極との間に作用する力で前記可動電極を変位させてその遮光膜で光の透過/遮断を制御する電気機械式光シャッター素子を2個、不動作時に互いにその遮光板を突き合わせ状態で配置した電気機械式光シャッター素子であって、前記可動電極の両端部および/又は前記可動電極を支持する支持部材の前記可動電極との接触部位近傍を柔らかい材料で形成したことを特徴とする。   According to a fourth aspect of the present invention, there is provided an electromechanical optical shutter element comprising: a fixed electrode standing vertically to the support substrate on a support substrate having a transparent or light transmitting function; and the support substrate or the fixed substrate. A movable electrode supported in a state of being opposed to the fixed electrode at an interval on the electrode, and a light-shielding film that blocks light traveling in a direction perpendicular to the support substrate are provided on the movable electrode, and the fixed electrode and the Two electromechanical optical shutter elements that control the transmission / blocking of light by the light shielding film by displacing the movable electrode with a force acting between the movable electrode and the light shielding plate in contact with each other when not operating. An electromechanical optical shutter element arranged, characterized in that both end portions of the movable electrode and / or the vicinity of a contact portion of the support member supporting the movable electrode with the movable electrode are formed of a soft material. .

請求項5記載の電気機械式光シャッター素子の発明は、透明もしくは光を透過する機能を有した支持基板上に該支持基板に対して垂直に立設された固定電極と、前記支持基板又は固定電極上に前記固定電極と間隔を置いて対向配置状態に支持された可動電極と、前記支持基板に対して垂直方向に進む光を遮断する遮光膜を前記可動電極に設け、前記固定電極と前記可動電極との間に作用する力で前記可動電極を変位させてその遮光膜で光の透過/遮断を制御する電気機械式光シャッター素子を2個、不動作時に互いにその遮光板を突き合わせ状態で配置した電気機械式光シャッター素子であって、前記可動電極がその一端で前記固定電極と広い間隔を置き、その他端で前記固定電極と狭い間隔を置いて前記固定電極に対向配置されたことを特徴とする。   According to a fifth aspect of the present invention, there is provided an electromechanical optical shutter element comprising: a fixed electrode standing vertically to the support substrate on a support substrate having a transparent or light transmitting function; and the support substrate or the fixed substrate. A movable electrode supported in a state of being opposed to the fixed electrode at an interval on the electrode, and a light-shielding film that blocks light traveling in a direction perpendicular to the support substrate are provided on the movable electrode, and the fixed electrode and the Two electromechanical optical shutter elements that control the transmission / blocking of light by the light shielding film by displacing the movable electrode with a force acting between the movable electrode and the light shielding plate in contact with each other when not operating. An electromechanical optical shutter element disposed, wherein the movable electrode is disposed opposite to the fixed electrode with a wide gap from the fixed electrode at one end and a narrow gap from the fixed electrode at the other end. Special To.

請求項6記載の電気機械式光シャッター素子の発明は、透明もしくは光を透過する機能を有した支持基板上に該支持基板に対して垂直に立設された円筒状固定電極と、前記円筒状固定電極内に不動作時に前記円筒状固定電極と同心配置になるように前記支持基板上にそれぞれ支持された2個の半円筒状可動電極と、前記支持基板に対して垂直方向に進む光を遮断する遮光膜を前記半円筒状可動電極に設け、前記円筒状固定電極と前記半円筒状可動電極との間に作用する力で前記半円筒状可動電極を変位させてその遮光膜で光の透過/遮断を制御することを特徴とする。   According to a sixth aspect of the present invention, there is provided an electromechanical optical shutter element comprising: a cylindrical fixed electrode that is erected vertically on a support substrate having a transparent or light transmitting function; and the cylindrical shape. Two semi-cylindrical movable electrodes respectively supported on the support substrate so as to be concentrically arranged with the cylindrical fixed electrode when not operating in the fixed electrode, and light traveling in a direction perpendicular to the support substrate A light shielding film for blocking is provided on the semi-cylindrical movable electrode, and the semi-cylindrical movable electrode is displaced by a force acting between the cylindrical fixed electrode and the semi-cylindrical movable electrode, and light is transmitted by the light shielding film. It is characterized by controlling transmission / blocking.

請求項7記載の電気機械式光シャッター素子の発明は、透明もしくは光を透過する機能を有した支持基板上に該支持基板に対して垂直に立設された固定電極と、前記支持基板又は固定電極上に前記固定電極と間隔を置いて対向配置状態に支持された可動電極と、前記支持基板に対して垂直方向に進む光を遮断する機能を有した遮光膜を前記可動電極に設け、前記固定電極と前記可動電極との間に作用する力で前記可動電極を変位させてその遮光膜で光の透過/遮断を制御する電気機械式光シャッター素子を2個、その遮光板を上下に重ねた状態で配置した電気機械式光シャッター素子であって、前記各遮光板に複数のスリットを設け、不動作時に上下のスリットが互いにずれて遮光状態となり、動作時に上下のスリットが重なり合うことを特徴とする。   According to a seventh aspect of the present invention, there is provided an electromechanical optical shutter element comprising: a fixed electrode which is erected vertically on a support substrate having a transparent or light transmitting function; and the support substrate or the fixed substrate. Provided on the movable electrode is a movable electrode supported in a state of being opposed to the fixed electrode on the electrode, and a light-shielding film having a function of blocking light traveling in a direction perpendicular to the support substrate, Two electromechanical optical shutter elements that displace the movable electrode by a force acting between the fixed electrode and the movable electrode and control light transmission / blocking by the light shielding film, and the light shielding plates are stacked one above the other. The electro-mechanical optical shutter element is arranged in a state where a plurality of slits are provided in each of the light shielding plates, and the upper and lower slits are shifted from each other in a non-operating state to be in a light shielding state, and the upper and lower slits are overlapped during an operation. To.

請求項8記載の発明は、請求項2〜7のいずれか1項記載の電気機械式光シャッター素子において、前記突き合わせ配置された2個の遮光膜の間にできる隙間が、使用する光の波長の1/10以下であることを特徴とする。   The invention according to claim 8 is the electromechanical optical shutter element according to any one of claims 2 to 7, wherein a gap formed between the two light-shielding films arranged in contact with each other is a wavelength of light to be used. 1/10 or less.

請求項9記載の電気機械式光シャッターアレイの発明は、請求項1〜8のいずれか1項記載の電気機械式光シャッター素子を複数個アレイ状に配置したことを特徴とする。   The invention of an electromechanical optical shutter array according to claim 9 is characterized in that a plurality of electromechanical optical shutter elements according to any one of claims 1 to 8 are arranged in an array.

請求項10記載の光シャッターアレイの発明は、請求項9記載の電気機械式光シャッターアレイと、前記電気機械式光シャッターアレイの入射光側および/又は出射光側に集光レンズを複数個アレイ状に配置したことを特徴とする。   According to a tenth aspect of the present invention, there is provided an optical shutter array according to the ninth aspect, and an array of a plurality of condensing lenses on the incident light side and / or the outgoing light side of the electromechanical optical shutter array. It is characterized by arranging in a shape.

本発明によれば、上記のような構成にしたことにより、透過形光シャッターが得られ、電極同士が平行平板であるので高速応答が可能となり、この光シャッターを2個並置することでストロークが2倍稼げることができ、又は同じ変位量であれば低電圧化にすることができる、といった特徴を有する。
さらに、この光シャッターを4個並置すれば2個並置の光シャッターの2倍の面積の光を制御することができる。
また、特許文献1記載の反射形シャッターと比べると、反射形シャッターは回折を利用しているので、サイズは使用する光と回折角度で決まってしまい、設計の自由度および精細度に問題があったが、本発明によれば設計の自由度が大幅に向上する。
また、特許文献2記載の透過形シャッターは多層膜を使用しているので、作製が難しく、干渉を利用しているので形状を維持する制御が難しかったが、本発明によれば光のオン・オフ制御であるので制御が簡単となる。
According to the present invention, a transmission type optical shutter is obtained by adopting the configuration as described above, and since the electrodes are parallel plates, high-speed response is possible, and the stroke can be increased by juxtaposing two optical shutters. It has a feature that it can be doubled or the voltage can be lowered if the amount of displacement is the same.
Further, if four optical shutters are juxtaposed, light having an area twice that of two juxtaposed optical shutters can be controlled.
Also, compared to the reflective shutter described in Patent Document 1, the reflective shutter uses diffraction, so the size is determined by the light used and the diffraction angle, and there is a problem in design flexibility and definition. However, according to the present invention, the degree of freedom in design is greatly improved.
In addition, since the transmission type shutter described in Patent Document 2 uses a multilayer film, it is difficult to manufacture and it is difficult to control the shape because interference is used. Since it is off control, the control becomes simple.

以下、本発明の実施の形態について実施例1〜6に基づき図面を参照して説明する。   Hereinafter, embodiments of the present invention will be described based on Examples 1 to 6 with reference to the drawings.

図1は本発明の実施例1に係る電気機械式光シャッター素子の斜視図で、(a)は動作前(電圧無印加時)、(b)は動作後(電圧印加時)である。
図1(a)および(b)において、11は実施例1に係る電気機械式光スイッチ素子、10は支持基板である。支持基板10はここではガラス基板などの透明体を用いている。 しかし透明体でなくても、光を透過する機能を有するものであればかまわない。例えば、プラスチック基板、樹脂基板、また、光を透過するように穴空け加工を施したシリコン加工基板などが挙げられる。
支持基板10は、図において支持基板の手前側端縁と奥側端縁が高くなった段差10aを形成されており、両端縁の間の中間部は低く(谷形成)なっているので、これによって後述の可動電極は容易に変位ができるようになる。谷形成等のプロセスおよびその材料については、纏めて後述する。
1A and 1B are perspective views of an electromechanical optical shutter element according to Embodiment 1 of the present invention, in which FIG. 1A is before operation (when no voltage is applied), and FIG. 1B is after operation (when voltage is applied).
1A and 1B, reference numeral 11 denotes an electromechanical optical switch element according to the first embodiment, and reference numeral 10 denotes a support substrate. Here, the support substrate 10 uses a transparent body such as a glass substrate. However, even if it is not a transparent body, it does not matter as long as it has a function of transmitting light. For example, a plastic substrate, a resin substrate, or a silicon processed substrate that has been drilled so as to transmit light may be used.
The support substrate 10 is formed with a step 10a in which the front side edge and the back side edge of the support substrate are increased in the figure, and the middle part between both end edges is low (valley formation). Thus, the movable electrode described later can be easily displaced. A process such as valley formation and its material will be described later.

12、13は支持基板10の上に垂直に立設された矩形状の固定電極である。
固定電極12、13の表面には電極保護層がコーティングされているが、ここでは見易くするため図示していない。
14、15は支持基板10上に両支持状態で立設された可動電極で、矩形状をした固定電極12、13と対向した矩形状をしている。また、可動電極14、15は固定電極12、13側に支持されるようにしてもよい。可動電極14、15は電極自体が可撓性・弾性と強度を備えたものが良いが、この代わりに箔状の電極を表面に張り付けた可動膜であってもよい。(以下、これらを纏めて単に可動電極と言う)
16、17は固定電極12、13と可動電極14、15との間に介在する支持部材で、支持基板10上に立設されている。これは例えばSiNで構成されている。また、支持部材16、17は固定電極12、13に支持されるようにしてもよい。
18、19は可動電極14、15の側面に立設され遮光板で、ここへ到来した光L1を(反射又は吸収により)遮断させる遮光機能を有している。ここでは金属反射板を用いている。金属反射板としては、金属板の他に、金、銀、パラジウム、亜鉛、アルミニウム、ニッケルを用いることができる。
Reference numerals 12 and 13 denote rectangular fixed electrodes which are erected vertically on the support substrate 10.
The surface of the fixed electrodes 12 and 13 is coated with an electrode protective layer, but is not shown here for the sake of clarity.
Reference numerals 14 and 15 denote movable electrodes which are erected on the support substrate 10 in both supported states, and have a rectangular shape facing the rectangular fixed electrodes 12 and 13. The movable electrodes 14 and 15 may be supported on the fixed electrodes 12 and 13 side. The movable electrodes 14 and 15 are preferably electrodes that are flexible, elastic, and strong, but instead may be movable films in which foil-like electrodes are attached to the surface. (Hereafter, these are collectively referred to as a movable electrode)
Reference numerals 16 and 17 are support members interposed between the fixed electrodes 12 and 13 and the movable electrodes 14 and 15, and are erected on the support substrate 10. This is made of, for example, SiN. The support members 16 and 17 may be supported by the fixed electrodes 12 and 13.
Reference numerals 18 and 19 denote light-shielding plates which are provided on the side surfaces of the movable electrodes 14 and 15 and have a light-shielding function for blocking the light L1 arriving here (by reflection or absorption). Here, a metal reflector is used. As the metal reflector, gold, silver, palladium, zinc, aluminum, or nickel can be used in addition to the metal plate.

なお、上記例では18、19として反射板を用いたが、反射板の代わりに、光を吸収する吸収板を用いてもよい。これによれば、光の吸収と透過による光変調を行わせるようになる。その場合の吸収板はカーボン樹脂膜等の有機膜を塗布や転写することによって得ることができる。   In the above example, the reflecting plates are used as 18 and 19, but an absorbing plate that absorbs light may be used instead of the reflecting plate. According to this, light modulation by light absorption and transmission is performed. In this case, the absorbing plate can be obtained by applying or transferring an organic film such as a carbon resin film.

次に、このようにして得られた電気機械式光スイッチ素子11の動作について説明する。
図1(a)のように、固定電極12、13と可動電極14、15との間に電圧が印加されないときは固定電極12、13と可動電極14、15との間に静電気力は働かないので可動電極14、15は動かず、可動電極14、15に立設された遮光板18、19も動かない。したがって支持基板10に垂直に到来した光L1は遮光板18、19に到来しても、遮光板18、19により反射されて、もと来た光路へ戻る。
Next, the operation of the electromechanical optical switch element 11 thus obtained will be described.
As shown in FIG. 1A, when no voltage is applied between the fixed electrodes 12, 13 and the movable electrodes 14, 15, no electrostatic force acts between the fixed electrodes 12, 13 and the movable electrodes 14, 15. Therefore, the movable electrodes 14 and 15 do not move, and the light shielding plates 18 and 19 erected on the movable electrodes 14 and 15 do not move. Therefore, even if the light L1 arriving perpendicularly to the support substrate 10 arrives at the light shielding plates 18 and 19, it is reflected by the light shielding plates 18 and 19 and returns to the original optical path.

次に、図1(b)のように、固定電極12、13と可動電極14、15との間に電圧が印加されると、固定電極12、13と可動電極14、15との間に静電気力が働らき、互いに吸引し合うようになる。したがって可動電極14、15は固定電極12、13の方向に折曲がり、これに伴って可動電極14、15に立設された遮光板18、19も固定電極12、13の方向に移動(変位)する。したがって、元遮光板にあった箇所が開放されるので、支持基板10に垂直に到来した光L1は遮光板18、19に反射されることなく遮光板18、19の間を通過する(光L1参照)。   Next, as shown in FIG. 1B, when a voltage is applied between the fixed electrodes 12 and 13 and the movable electrodes 14 and 15, static electricity is generated between the fixed electrodes 12 and 13 and the movable electrodes 14 and 15. Power works and sucks each other. Accordingly, the movable electrodes 14 and 15 are bent in the direction of the fixed electrodes 12 and 13, and accordingly, the light shielding plates 18 and 19 erected on the movable electrodes 14 and 15 are also moved (displaced) in the direction of the fixed electrodes 12 and 13. To do. Accordingly, since the portion that was on the original light shielding plate is opened, the light L1 arriving perpendicularly to the support substrate 10 passes between the light shielding plates 18 and 19 without being reflected by the light shielding plates 18 and 19 (light L1). reference).

そして、再び固定電極12、13と可動電極14、15との間の電圧を無くすと、固定電極12、13と可動電極14、15との間に静電気力が働かなくなるので可動電極14、15の弾性復帰力で図1(a)の状態に戻る。
この場合の復帰は両支持の可動電極14、15の両端で行われるため、片持ち支持の電気機械式光シャッタと比べて、復元力が大きくなり、高速可動に適している。また、先行文献2のように干渉を用いないので光の波長に依存しない簡単な構成の電気機械式光スイッチングを行うことができ、液晶でなく電気機械式光スイッチ素子を用いるので光のコントラスト比が高くなる。また、単純な構成であるので製作が容易となり、高密度の集積化が可能となる。
When the voltage between the fixed electrodes 12 and 13 and the movable electrodes 14 and 15 is removed again, the electrostatic force does not work between the fixed electrodes 12 and 13 and the movable electrodes 14 and 15. It returns to the state of FIG.
Since the return in this case is performed at both ends of the movable electrodes 14 and 15 that are both supported, the restoring force is larger than that of the electromechanical optical shutter that is cantilevered and is suitable for high-speed movement. Further, unlike the prior art document 2, since interference is not used, electromechanical optical switching with a simple configuration that does not depend on the wavelength of light can be performed, and since an electromechanical optical switch element is used instead of liquid crystal, the contrast ratio of light is increased. Becomes higher. In addition, since it has a simple configuration, it can be easily manufactured and integrated at a high density.

以上、電気機械式光スイッチ素子を2個(12、14、16、18)、(13、15、17、19)、不動作時に互いにその遮光板18、19を突き合わせ状態で配置した例を示したが、このようにすれば、可動電極の移動(変位)ストロークが小さくても、遮光板18、19の移動で見れば倍のストロークが得られることとなる。あるいは、同じストロークであれば低電圧化が可能となる。   The above shows an example in which two electromechanical optical switch elements (12, 14, 16, 18), (13, 15, 17, 19) and their light shielding plates 18 and 19 are arranged in abutment with each other when not in operation. However, if this is done, even if the movement (displacement) stroke of the movable electrode is small, double strokes can be obtained by the movement of the light shielding plates 18 and 19. Or if it is the same stroke, a low voltage will be attained.

本発明によれば、上記のような構成にしたことにより、透過形光シャッターが得られ、電極同士が平行平板であるので高速応答が可能となり、この光シャッターを2個並置することでストロークが2倍稼げることができ、又は同じ変位量であれば低電圧化にすることができる、といった特徴を有する。   According to the present invention, a transmission type optical shutter is obtained by adopting the configuration as described above, and since the electrodes are parallel plates, high-speed response is possible, and the stroke can be increased by juxtaposing two optical shutters. It has a feature that it can be doubled or the voltage can be lowered if the amount of displacement is the same.

さらに、電気機械式光スイッチ素子を4個用いて、その遮光板同士を左右に2個の遮光板とこれをサンドイッチ状に上下から挟むように上下に2個の遮光板を並置するようにすれば、2個並置の上記電気機械式光スイッチ素子のさらに2倍の面積の光を制御することができるようになる。   Furthermore, four electromechanical optical switch elements are used, and the two light shielding plates are arranged side by side so that the light shielding plates are sandwiched between the two light shielding plates on the left and right. For example, it is possible to control light having an area twice as large as that of the two electromechanical optical switch elements arranged side by side.

しかしながら、集光レンズを用いて電気機械式光スイッチ素子1個の遮光板18又は19に集光させるようにすれば、逆に、ストロークの狭い電気機械式光スイッチ素子1個であっても光を制御することも可能となる。   However, if light is condensed on the light shielding plate 18 or 19 of one electromechanical optical switch element using a condensing lens, on the contrary, even if one electromechanical optical switch element with a narrow stroke is used, no light is emitted. Can also be controlled.

なお、遮光板18、19同士は非動作時に互いに接触した状態にしているが、必ずしもピッタリと接触させておく必要はない。両者の間に若干隙間があったとしても、使用する光の波長の1/10以下の隙間であればその光はその隙間に染み出すことはあっても、通過することはできないので、実際上は差し支えない。
もちろん、光が染み出したら困るような条件下においては、遮光板同士を同一平面上ではなくて、上下の別の平面にそれぞれを配置してその先端同士が若干重なるようにしておけば、光が染み出す虞も無くなるので、このようにすることも可能である。
Although the light shielding plates 18 and 19 are in contact with each other when not operating, it is not always necessary to make contact with each other. Even if there is a slight gap between the two, if the gap is less than 1/10 of the wavelength of the light used, the light may ooze out but cannot pass through. Is fine.
Of course, under conditions where it would be a problem if light oozes out, if the light-shielding plates are not on the same plane but are placed on separate upper and lower planes and their tips are slightly overlapped, Since there is no risk of oozing out, it is possible to do this.

図2は本発明の実施例2に係る電気機械式光シャッター素子の斜視図で、(a)は動作前(電圧無印加時)、(b)は動作後(電圧印加時)である。
図2(a)および(b)において、21は実施例2に係る電気機械式光スイッチ素子、10は実施例1と同じ支持基板、22、23は支持基板10の上に垂直に立設された矩形状の固定電極である。
24、25は支持基板10上に両支持状態で立設された可動電極で、矩形状をした固定電極22、23と対向した矩形状をしている。26、27は固定電極22、23と可動電極24、25との間に介在する支持部材で、支持基板10上に立設されている。28、29は可動電極24、25の側面に立設され遮光板である。各部材の材質は実施例1の対応部材と同じである。
この実施例によると、固定電極22、23側に設けられた支持部材26、27と可動電極24、25の互いの対向面側に、動作時に互いに嵌(はま)り合うことのできる凹凸状の起伏を形成した点が特徴である。すなわち、図(a)において、可動電極24には支持部材26の対向面側に突起24aが複数個(図では5個)形成されており、一方、支持部材26には可動電極24の対向面側に突起26aが複数個(図では5個)形成されており、各々の突起24a、26aは相手側の突起と突起の間の谷間に対向している。そこで、電圧が印加されると、図(b)のように、可動電極24の突起24aは支持部材26の谷間に入り込み、支持部材26の突起26aは可動電極24の谷間に入り込むようになる。
2A and 2B are perspective views of an electromechanical optical shutter element according to a second embodiment of the present invention, in which FIG. 2A is before operation (when no voltage is applied), and FIG. 2B is after operation (when voltage is applied).
2A and 2B, 21 is an electromechanical optical switch element according to the second embodiment, 10 is the same support substrate as that of the first embodiment, and 22 and 23 are vertically installed on the support substrate 10. It is a rectangular fixed electrode.
Numerals 24 and 25 are movable electrodes erected on the support substrate 10 in both supported states, and have a rectangular shape facing the fixed electrodes 22 and 23 having a rectangular shape. Reference numerals 26 and 27 are support members interposed between the fixed electrodes 22 and 23 and the movable electrodes 24 and 25, and are erected on the support substrate 10. Reference numerals 28 and 29 are light shielding plates provided on the side surfaces of the movable electrodes 24 and 25. The material of each member is the same as the corresponding member in the first embodiment.
According to this embodiment, the concave and convex shapes that can be fitted to each other during operation on the opposing surfaces of the support members 26 and 27 and the movable electrodes 24 and 25 provided on the fixed electrodes 22 and 23 side. This is characterized by the formation of undulations. That is, in FIG. 1A, the movable electrode 24 has a plurality of protrusions 24 a (five in the figure) formed on the opposite surface side of the support member 26, while the support member 26 has the opposite surface of the movable electrode 24. A plurality of protrusions 26a (five in the figure) are formed on the side, and each protrusion 24a, 26a faces a valley between the protrusions on the other side. Therefore, when a voltage is applied, the protrusion 24 a of the movable electrode 24 enters the valley of the support member 26 and the protrusion 26 a of the support member 26 enters the valley of the movable electrode 24 as shown in FIG.

次に、このようにして得られた電気機械式光スイッチ素子21の動作について説明する。
図2(a)のように、固定電極22、23と可動電極24、25との間に電圧が印加されないときは固定電極22、23と可動電極24、25との間に静電気力は働かないので可動電極24、25は動かず、可動電極24、25に立設された遮光板28、29も動かない。したがって支持基板10に垂直に到来した光L1は遮光板28、29に到来しても、遮光板28、29により反射されて、もと来た光路へ戻る。
Next, the operation of the electromechanical optical switch element 21 thus obtained will be described.
As shown in FIG. 2A, when no voltage is applied between the fixed electrodes 22 and 23 and the movable electrodes 24 and 25, no electrostatic force acts between the fixed electrodes 22 and 23 and the movable electrodes 24 and 25. Therefore, the movable electrodes 24 and 25 do not move, and the light shielding plates 28 and 29 erected on the movable electrodes 24 and 25 do not move. Therefore, even if the light L1 arriving perpendicularly to the support substrate 10 arrives at the light shielding plates 28 and 29, it is reflected by the light shielding plates 28 and 29 and returns to the original optical path.

次に、図2(b)のように、固定電極22、23と可動電極24、25との間に電圧が印加されると、それぞれ凹凸状の起伏形状が互いの相手の凸凹に入り込むので、互いの電極間の対向面積が大幅に増加し、静電気力を増加させることができ、可動電極の可動動作が動き易くなる。したがって、固定電極22、23と可動電極24、25との間に強い静電気力が働らき、互いに強力に吸引し合うようになる。したがって可動電極24、25は固定電極22、23の方向に高速に折曲がり、これに伴って可動電極24、25に立設された遮光板28、29も固定電極22、23の方向に高速移動する。したがって、支持基板10に垂直に到来した光L1は遮光板28、29に反射されることなく遮光板28、29の間を通過する(光L1参照)。   Next, when a voltage is applied between the fixed electrodes 22 and 23 and the movable electrodes 24 and 25 as shown in FIG. The facing area between the electrodes is greatly increased, the electrostatic force can be increased, and the movable operation of the movable electrode becomes easy to move. Accordingly, a strong electrostatic force acts between the fixed electrodes 22 and 23 and the movable electrodes 24 and 25, so that they are attracted to each other strongly. Accordingly, the movable electrodes 24 and 25 are bent at high speed in the direction of the fixed electrodes 22 and 23, and accordingly, the light shielding plates 28 and 29 erected on the movable electrodes 24 and 25 are also moved at high speed in the direction of the fixed electrodes 22 and 23. To do. Therefore, the light L1 arriving perpendicularly to the support substrate 10 passes between the light shielding plates 28 and 29 without being reflected by the light shielding plates 28 and 29 (see the light L1).

そして、再び固定電極22、23と可動電極24、25との間の電圧を無くすと、固定電極22、23と可動電極24、25との間に静電気力が働かなくなるので可動電極24、25の弾性復帰力で図2(a)の状態に戻る。
この場合の復帰は両支持の可動電極24、25の両端で行われるため、片持ち支持の電気機械式光シャッタと比べて、復元力が大きくなり、高速可動に適している。
When the voltage between the fixed electrodes 22 and 23 and the movable electrodes 24 and 25 is removed again, the electrostatic force does not work between the fixed electrodes 22 and 23 and the movable electrodes 24 and 25. The state returns to the state of FIG.
Since the return in this case is performed at both ends of the movable electrodes 24 and 25 of both supports, the restoring force is larger than that of the electromechanical optical shutter of the cantilever support, and it is suitable for high speed movement.

本実施例によれば、電極に凹凸状の起伏を形成することで、電極間の面積を増やしたので、電極間により大きな力を発生させことができ、静電気力の増加によって可動電極の可動動作が動き易くなる。   According to the present embodiment, the area between the electrodes is increased by forming irregularities on the electrodes, so that a larger force can be generated between the electrodes, and the movable operation of the movable electrode can be performed by increasing the electrostatic force. Becomes easy to move.

図3は本発明の実施例3に係る電気機械式光シャッター素子の斜視図で、(a)は動作前(電圧無印加時)、(b)は動作後(電圧印加時)である。
図3(a)および(b)において、31は実施例3に係る電気機械式光スイッチ素子、10は実施例1と同じ支持基板、32、33は固定電極、34、35は支持基板10上に両支持状態で立設された可動電極、36、37は固定電極32、33と可動電極34、35との間に介在する支持部材、38、39は可動電極34、35の側面に立設され遮光板である。各部材の材質は実施例1の対応部材と同じである。
この実施例によると、可動電極34、35の両端部34a、35aに柔らかい材料のもの、例えば有機膜、有機材料、樹脂を用いるようにしたことを特徴としている。これによって、僅かな静電気力で柔らかい材料部分が可動するようになるので、可動電極の可動動作が動き易くなる。
3A and 3B are perspective views of an electromechanical optical shutter element according to Embodiment 3 of the present invention, in which FIG. 3A is before operation (when no voltage is applied), and FIG. 3B is after operation (when voltage is applied).
3A and 3B, 31 is an electromechanical optical switch element according to the third embodiment, 10 is the same support substrate as that of the first embodiment, 32 and 33 are fixed electrodes, and 34 and 35 are on the support substrate 10. The movable electrodes 36 and 37 are erected on both sides of the movable electrodes 34 and 35, the support members are interposed between the fixed electrodes 32 and 33 and the movable electrodes 34 and 35, and 38 and 39 are erected on the side surfaces of the movable electrodes 34 and 35. It is a shading plate. The material of each member is the same as the corresponding member in the first embodiment.
This embodiment is characterized in that a soft material such as an organic film, an organic material, or a resin is used for both end portions 34a, 35a of the movable electrodes 34, 35. As a result, the soft material portion can move with a slight electrostatic force, so that the movable operation of the movable electrode becomes easy to move.

次に、このようにして得られた電気機械式光スイッチ素子31の動作について簡単に説明する。
図3(a)のように、固定電極32、33と可動電極34、35との間に電圧が印加されないときは固定電極32、33と可動電極34、35との間に静電気力は働かないので可動電極34、35は動かず、可動電極34、35に立設された遮光板38、39も動かない。したがって支持基板10に垂直に到来した光L1は遮光板38、39により反射されて、もと来た光路へ戻る。
Next, the operation of the electromechanical optical switch element 31 thus obtained will be briefly described.
As shown in FIG. 3A, when no voltage is applied between the fixed electrodes 32 and 33 and the movable electrodes 34 and 35, no electrostatic force acts between the fixed electrodes 32 and 33 and the movable electrodes 34 and 35. Therefore, the movable electrodes 34 and 35 do not move, and the light shielding plates 38 and 39 provided on the movable electrodes 34 and 35 do not move. Therefore, the light L1 arriving perpendicularly to the support substrate 10 is reflected by the light shielding plates 38 and 39 and returns to the original optical path.

次に、図3(b)のように、固定電極32、33と可動電極34、35との間に電圧が印加されると、僅かな静電気力で可動電極34、35の柔らかい材料部分34a、35aが可動するようになるので、可動電極34、35の可動動作が動き易くなるため可動電極34、35は固定電極32、33の方向に高速に折曲がり、これに伴って可動電極34、35に立設された遮光板38、39も固定電極32、33の方向に高速移動する。したがって、支持基板10に垂直に到来した光L1は遮光板38、39に反射されることなく遮光板38、39の間を通過する(光L1参照)。   Next, as shown in FIG. 3B, when a voltage is applied between the fixed electrodes 32 and 33 and the movable electrodes 34 and 35, the soft material portion 34a of the movable electrodes 34 and 35 with a slight electrostatic force, Since the movable movement of the movable electrodes 34 and 35 is easy to move, the movable electrodes 34 and 35 are bent at high speed in the direction of the fixed electrodes 32 and 33, and accordingly the movable electrodes 34 and 35 are moved. The light-shielding plates 38 and 39 erected on the side also move at high speed in the direction of the fixed electrodes 32 and 33. Therefore, the light L1 arriving perpendicularly to the support substrate 10 passes between the light shielding plates 38 and 39 without being reflected by the light shielding plates 38 and 39 (see the light L1).

本実施例によれば、可動電極34、35の両端部34a、35aに柔らかい材料のものを用いるようにすることで、僅かな静電気力で柔らかい材料部分が可動するようになり、可動電極の可動動作が動き易くなる。   According to the present embodiment, by using a soft material for both end portions 34a and 35a of the movable electrodes 34 and 35, the soft material portion can be moved with a slight electrostatic force. Operation becomes easy to move.

図4は本発明の実施例4に係る電気機械式光シャッター素子の斜視図で、(a)は動作前(電圧無印加時)、(b)は動作後(電圧印加時)である。
図4(a)および(b)において、41は実施例4に係る電気機械式光スイッチ素子、10は支持基板、42、43は固定電極、44、45は可動電極、46、47は固定電極42、43と可動電極44、45との間に介在する支持部材、48、49は可動電極44、45の側面に立設され遮光板である。各部材の材質は実施例1の対応部材と同じである。
この実施例によると、支持部材46、47の可動電極42、43と接触する支柱部46a、47aに柔らかい材料のもの、例えば有機膜を用いるようにしたことを特徴としている。それ以外の部分46b、47bは前述の支持部材16、17等と同じ材質となっている。
これによって、僅かな静電気力で柔らかい支柱部46a、47aが可動するようになるので、可動電極の可動動作が動き易くなる。
FIGS. 4A and 4B are perspective views of an electromechanical optical shutter element according to Example 4 of the present invention, where FIG. 4A is before operation (when no voltage is applied), and FIG. 4B is after operation (when voltage is applied).
4 (a) and 4 (b), 41 is an electromechanical optical switch element according to Example 4, 10 is a support substrate, 42 and 43 are fixed electrodes, 44 and 45 are movable electrodes, and 46 and 47 are fixed electrodes. Support members 48, 49 interposed between the movable electrodes 44, 45 and the movable electrodes 44, 45 are light shielding plates that stand on the side surfaces of the movable electrodes 44, 45. The material of each member is the same as the corresponding member in the first embodiment.
According to this embodiment, a soft material such as an organic film is used for the support portions 46a and 47a that are in contact with the movable electrodes 42 and 43 of the support members 46 and 47, respectively. The other portions 46b and 47b are made of the same material as the support members 16 and 17 described above.
As a result, the soft support portions 46a and 47a can be moved by a slight electrostatic force, so that the movable operation of the movable electrode can be easily performed.

次に、このようにして得られた電気機械式光スイッチ素子41の動作について簡単に説明する。
図4(a)のように、固定電極42、43と可動電極44、45との間に電圧が印加されないときは固定電極42、43と可動電極44、45との間に静電気力は働かないので可動電極44、45は動かず、可動電極44、45に立設された遮光板48、49も動かない。したがって支持基板10に垂直に到来した光L1は遮光板48、49により反射されて、もと来た光路へ戻る。
Next, the operation of the electromechanical optical switch element 41 thus obtained will be briefly described.
As shown in FIG. 4A, when no voltage is applied between the fixed electrodes 42 and 43 and the movable electrodes 44 and 45, no electrostatic force acts between the fixed electrodes 42 and 43 and the movable electrodes 44 and 45. Therefore, the movable electrodes 44 and 45 do not move, and the light shielding plates 48 and 49 erected on the movable electrodes 44 and 45 also do not move. Accordingly, the light L1 arriving perpendicularly to the support substrate 10 is reflected by the light shielding plates 48 and 49 and returns to the original optical path.

次に、図4(b)のように、固定電極42、43と可動電極44、45との間に電圧が印加されると、僅かな静電気力で支持部材46、47の柔らかい材料部分46a、47aが可動するようになるので、可動電極44、45の可動動作が動き易くなるため可動電極44、45は固定電極42、43の方向に高速に折曲がり、これに伴って可動電極44、45に立設された遮光板48、49も固定電極42、43の方向に高速移動する。したがって、支持基板10に垂直に到来した光L1は遮光板48、49に反射されることなく遮光板48、49の間を通過する(光L1参照)。   Next, as shown in FIG. 4B, when a voltage is applied between the fixed electrodes 42 and 43 and the movable electrodes 44 and 45, the soft material portions 46a of the support members 46 and 47 with a slight electrostatic force, 47a becomes movable, so that the movable operation of the movable electrodes 44 and 45 is easy to move, so that the movable electrodes 44 and 45 are bent at high speed in the direction of the fixed electrodes 42 and 43, and accordingly the movable electrodes 44 and 45 are moved. The light shielding plates 48 and 49 erected on the side also move at high speed in the direction of the fixed electrodes 42 and 43. Therefore, the light L1 arriving perpendicularly to the support substrate 10 passes between the light shielding plates 48 and 49 without being reflected by the light shielding plates 48 and 49 (see the light L1).

本実施例によれば、支持部材46、47の両端部64a、47aに柔らかい材料のものを用いるようにすることで、僅かな静電気力で柔らかい材料部分が可動するようになり、可動電極の可動動作が動き易くなる。   According to the present embodiment, by using a soft material for both ends 64a and 47a of the support members 46 and 47, the soft material portion can be moved with a slight electrostatic force, and the movable electrode can be moved. Operation becomes easy to move.

なお、実施例3および実施例4を共に採用した実施例も可能である。すなわち、可動電極の両端部および支持部材の両端部に柔らかい材料のものを用いるようにすることで、相乗効果が現れ可動電極の可動動作がより一層動き易くなる。   In addition, the Example which employ | adopted both Example 3 and Example 4 is also possible. That is, by using soft materials for both ends of the movable electrode and both ends of the support member, a synergistic effect appears and the movable operation of the movable electrode becomes even easier to move.

図5は本発明の実施例5に係る電気機械式光シャッター素子の斜視図で、(a)は動作前(電圧無印加時)、(b)は動作後(電圧印加時)である。
図5(a)および(b)において、51は実施例5に係る電気機械式光スイッチ素子、10は支持基板、52、53は固定電極、54、55は可動電極、56、57は固定電極52、53と可動電極54、55との間に介在する支持部材で、長尺部材55b、57bとこれに直角に立設する短尺部材56a、57aのみで構成される。可動電極54、55は短尺部材56aの端部から長尺部材55bの端部に向けて斜めに支持されている(楔型構造)。58、59は可動電極54、55の側面に立設され遮光板である。各部材の材質は実施例1の対応部材と同じである。
この実施例によると、実施例1における平行平板型構造の電極を止めて、楔(くさび)型構造としているので、可動電極54、55がその一端で固定電極52、53と広い間隔を置き、その他端で固定電極52、53と狭い間隔を置いて固定電極52、53に対向配置され、また、これと同時に、遮光板58、59の取付位置も最大ギャップ部と同じ位置に配置するようにしている。静電気力は距離の二乗で効いてくるので、このようにすることで、両電極間の対向間隔が最も狭い部位に最も大きな静電気力が生じることとなり、弱い吸引力であっても両電極間の対向間隔が最も狭い部位から動き始める。したがって同じ電圧でも平行平板型構造と比べると動きやすくなる。それが順次、間隔の広い方向に吸引が移っていくので、動作が動き易くなる。
FIGS. 5A and 5B are perspective views of an electromechanical optical shutter element according to Example 5 of the present invention, where FIG. 5A is before operation (when no voltage is applied), and FIG. 5B is after operation (when voltage is applied).
5 (a) and 5 (b), 51 is an electromechanical optical switch element according to Example 5, 10 is a support substrate, 52 and 53 are fixed electrodes, 54 and 55 are movable electrodes, and 56 and 57 are fixed electrodes. 52, 53 and the movable electrodes 54, 55 are support members interposed between the long members 55b, 57b and the short members 56a, 57a standing at right angles thereto. The movable electrodes 54 and 55 are supported obliquely from the end of the short member 56a toward the end of the long member 55b (wedge type structure). 58 and 59 are light shielding plates provided upright on the side surfaces of the movable electrodes 54 and 55. The material of each member is the same as the corresponding member in the first embodiment.
According to this embodiment, the parallel plate structure electrode in Embodiment 1 is stopped to form a wedge structure, so that the movable electrodes 54 and 55 are spaced apart from the fixed electrodes 52 and 53 at one end, At the other end, it is arranged opposite to the fixed electrodes 52 and 53 with a small gap from the fixed electrodes 52 and 53. At the same time, the mounting positions of the light shielding plates 58 and 59 are also arranged at the same position as the maximum gap portion. ing. Since the electrostatic force works as the square of the distance, by doing this, the largest electrostatic force is generated in the part where the facing distance between both electrodes is the narrowest, and even between weak electrodes, even between weak electrodes The movement starts from the part where the facing distance is the narrowest. Therefore, it becomes easier to move than the parallel plate type structure even at the same voltage. Since the suction moves sequentially in the direction of wide intervals, the operation becomes easy to move.

次に、このようにして得られた電気機械式光スイッチ素子51の動作について簡単に説明する。
図5(a)のように、固定電極52、53と可動電極54、55との間に電圧が印加されないときは固定電極52、53と可動電極54、55との間に静電気力は働かないので可動電極54、55は動かず、可動電極54、55に立設された遮光板58、59も動かない。したがって支持基板10に垂直に到来した光L1は遮光板58、59により反射されて、もと来た光路へ戻る。
Next, the operation of the electromechanical optical switch element 51 thus obtained will be briefly described.
As shown in FIG. 5A, when no voltage is applied between the fixed electrodes 52 and 53 and the movable electrodes 54 and 55, no electrostatic force acts between the fixed electrodes 52 and 53 and the movable electrodes 54 and 55. Therefore, the movable electrodes 54 and 55 do not move, and the light shielding plates 58 and 59 provided on the movable electrodes 54 and 55 do not move. Therefore, the light L1 arriving perpendicularly to the support substrate 10 is reflected by the light shielding plates 58 and 59 and returns to the original optical path.

次に、図5(b)のように、固定電極52、53と可動電極54、55との間に電圧が印加されると、弱い吸引力であっても両電極間の対向間隔が最も狭い部位から動き始めるので可動電極54、55動き易くなり、可動電極54、55は固定電極52、53の方向に高速に折曲がり、これに伴って可動電極54、55に立設された遮光板58、59も固定電極52、53の方向に高速移動する。したがって、支持基板10に垂直に到来した光L1は遮光板58、59に反射されることなく遮光板58、59の間を通過する(光L1参照)。   Next, as shown in FIG. 5B, when a voltage is applied between the fixed electrodes 52 and 53 and the movable electrodes 54 and 55, the facing distance between the electrodes is the narrowest even with a weak suction force. Since it starts to move from the part, it becomes easy to move the movable electrodes 54, 55. The movable electrodes 54, 55 bend at high speed in the direction of the fixed electrodes 52, 53, and accordingly, the light shielding plate 58 standing on the movable electrodes 54, 55. , 59 also move at high speed in the direction of the fixed electrodes 52, 53. Therefore, the light L1 arriving perpendicularly to the support substrate 10 passes between the light shielding plates 58 and 59 without being reflected by the light shielding plates 58 and 59 (see the light L1).

本実施例によれば、可動電極54、55がその一端で固定電極52、53と広い間隔を置き、その他端で固定電極52、53と狭い間隔を置いて固定電極52、53に対向配置されるようにすることで、弱い吸引力であっても両電極間の対向間隔が最も狭い部位から動き始めるので可動電極54、55動き易くなり、可動電極54、55は固定電極52、53の方向に高速に折曲がることができる。   According to the present embodiment, the movable electrodes 54 and 55 are arranged so as to be opposed to the fixed electrodes 52 and 53 at one end with a wide space from the fixed electrodes 52 and 53 and at the other end with a narrow space from the fixed electrodes 52 and 53. By doing so, the movable electrodes 54 and 55 can be moved easily because the opposing distance between the two electrodes starts to move from the narrowest even with a weak suction force, and the movable electrodes 54 and 55 are in the direction of the fixed electrodes 52 and 53. It can be bent at high speed.

実施例6は、実施例1〜実施例5が主として平行平板型のものおよびその変形であったのに対して、ここでは静電気力を上げるために両電極を二重円筒の構造体で構成し、内側円筒を半円筒2個で構成し、それぞれの端部を支持部材に固定させている。   In the sixth embodiment, while the first to fifth embodiments are mainly the parallel plate type and its modification, in order to increase the electrostatic force, both electrodes are formed of a double cylindrical structure. The inner cylinder is composed of two half-cylinders, and each end is fixed to the support member.

図6は本発明の実施例6に係る電気機械式光シャッター素子の斜視図で、(a)は動作前(電圧無印加時)、(b)は動作後(電圧印加時)である。
図6(a)および(b)において、61は実施例6に係る電気機械式光スイッチ素子、10は支持基板、62は支持基板10に垂直に立設した円筒状固定電極、64、65は支持基板10の段部10aに各端部が両支持された2個の半円筒状可動電極、66は円筒状固定電極62と可動電極64、65との間に介在する円筒状支持部材で、支柱66a、66bを形成し、ここに2個の半円筒状可動電極64、65の両端部を固定している。68、69は可動電極64、65の側面に立設され遮光板である。各部材の材質は実施例1の対応部材と同じである。
6A and 6B are perspective views of an electromechanical optical shutter element according to Example 6 of the present invention, in which FIG. 6A is before operation (when no voltage is applied), and FIG. 6B is after operation (when voltage is applied).
6 (a) and 6 (b), 61 is an electromechanical optical switch element according to the sixth embodiment, 10 is a support substrate, 62 is a cylindrical fixed electrode erected vertically to the support substrate 10, and 64 and 65 are Two semi-cylindrical movable electrodes having both ends supported by the stepped portion 10a of the support substrate 10, 66 is a cylindrical support member interposed between the cylindrical fixed electrode 62 and the movable electrodes 64, 65. Support columns 66a and 66b are formed, and both end portions of the two semi-cylindrical movable electrodes 64 and 65 are fixed thereto. 68 and 69 are light shielding plates provided upright on the side surfaces of the movable electrodes 64 and 65. The material of each member is the same as the corresponding member in the first embodiment.

次に、このようにして得られた電気機械式光スイッチ素子61の動作について簡単に説明する。
図6(a)のように、円筒状固定電極62と半円筒状可動電極64、65との間に電圧が印加されないときは円筒状固定電極62と半円筒状可動電極64、65との間に静電気力は働かないので半円筒状可動電極64、65は動かず、半円筒状可動電極64、65に立設された遮光板68、69も動かない。したがって支持基板10に垂直に到来した光L1は遮光板68、69により反射されて、もと来た光路へ戻る。
Next, the operation of the electromechanical optical switch element 61 thus obtained will be briefly described.
As shown in FIG. 6A, when no voltage is applied between the cylindrical fixed electrode 62 and the semi-cylindrical movable electrodes 64 and 65, it is between the cylindrical fixed electrode 62 and the semi-cylindrical movable electrodes 64 and 65. Since the electrostatic force does not work, the semi-cylindrical movable electrodes 64 and 65 do not move, and the light shielding plates 68 and 69 standing on the semi-cylindrical movable electrodes 64 and 65 do not move. Therefore, the light L1 arriving perpendicularly to the support substrate 10 is reflected by the light shielding plates 68 and 69 and returns to the original optical path.

次に、図6(b)のように、円筒状固定電極62と半円筒状可動電極64、65との間に電圧が印加されると、両電極間に生じる吸引力で半円筒状可動電極64、65が外側に引かれ、楕円円筒状に変形する。これに伴って半円筒状可動電極64、65に立設された遮光板68、69は円筒状固定電極62の方向に移動する。したがって、支持基板10に垂直に到来した光L1は遮光板68、69に反射されることなく遮光板68、69の間を通過する(光L1参照)。   Next, as shown in FIG. 6B, when a voltage is applied between the cylindrical fixed electrode 62 and the semi-cylindrical movable electrodes 64 and 65, the semi-cylindrical movable electrode is generated by the suction force generated between the two electrodes. 64 and 65 are pulled outward and deformed into an elliptical cylindrical shape. Accordingly, the light shielding plates 68 and 69 erected on the semi-cylindrical movable electrodes 64 and 65 move in the direction of the cylindrical fixed electrode 62. Therefore, the light L1 arriving perpendicularly to the support substrate 10 passes between the light shielding plates 68 and 69 without being reflected by the light shielding plates 68 and 69 (see the light L1).

本実施例によれば、円筒状固定電極62と半円筒状可動電極64、65の円筒形状によって狭いスペースで電極長を長くできるので、面積が広くなり、静電気力がアップする。実施例1と比較すると、同じスペースであれば吸引力が増し、高速化が可能となり、同じストロークであれば低電圧化が可能となる。   According to the present embodiment, the cylindrical length of the cylindrical fixed electrode 62 and the semi-cylindrical movable electrodes 64 and 65 can increase the electrode length in a narrow space, so that the area is increased and the electrostatic force is increased. Compared with the first embodiment, if the space is the same, the suction force is increased and the speed can be increased. If the stroke is the same, the voltage can be reduced.

実施例1〜実施例6ではいずれも2枚の遮光板(又は反射板)を当接し(突き合わせ)て光を遮断し、離間させて光を通過させていたが、実施例7では遮光板の移動方向に対して直角方向に可動電極のストロークの2倍幅のスリット(貫通長穴)を多数、各遮光板にそれぞれ可動電極のストロークの2倍幅の等間隔で平行に設け、しかも、その遮光板は上下に重なって配置され、その際、動作前の状態では上下の各遮光板のスリットは互いに相手の遮光板の非スリット部位によって光遮断された状態にあることを特徴としている。   In each of Examples 1 to 6, two light shielding plates (or reflecting plates) were brought into contact with each other (blocked) to block light and separated to allow light to pass. A number of slits (through holes) that are twice the width of the movable electrode in the direction perpendicular to the moving direction are provided in parallel at equal intervals of two times the stroke of the movable electrode on each light shielding plate, The light shielding plates are arranged so as to overlap each other. At that time, before the operation, the slits of the upper and lower light shielding plates are in a state where light is blocked by the non-slit portions of the other light shielding plate.

図7は本発明の実施例7に係る電気機械式光シャッター素子の斜視図で、(a)は動作前(電圧無印加時)、(b)は動作後(電圧印加時)である。
図7(a)および(b)において、71は実施例7に係る電気機械式光スイッチ素子、10は支持基板、72、73は固定電極、74、75は可動電極、76、77は支持部材、78、79は遮光板である。各部材の材質は実施例1の対応部材と同じである。
この実施例によると、各遮光板78、79に、遮光板78、79の移動方向に対して直角方向に可動電極74、75のストロークの2倍幅のスリット(貫通長穴)78aを多数、それぞれ可動電極74、75のストロークの2倍幅の等間隔で平行に設けている。そして、その遮光板78、79を同一平面に置かずに上下に重ねて配置し、その際、動作前(電圧非印加)の状態で上下の遮光板78、79のスリット78aと79aとは互いに相手の遮光板の非スリット部位によって光遮断された状態にあり、動作後(電圧印加)、上の遮光板78は1ストローク分移動し、下の遮光板79も1ストローク分離れる方向に移動し、相対的にスリットは2ストローク移動する。したがって、上下のスロット78aと79aは完全に重なりあい、最大の開口部が開ける。
7A and 7B are perspective views of an electromechanical optical shutter element according to Example 7 of the present invention, in which FIG. 7A is before operation (when no voltage is applied), and FIG. 7B is after operation (when voltage is applied).
7A and 7B, 71 is an electromechanical optical switch element according to Example 7, 10 is a support substrate, 72 and 73 are fixed electrodes, 74 and 75 are movable electrodes, and 76 and 77 are support members. 78 and 79 are light shielding plates. The material of each member is the same as the corresponding member in the first embodiment.
According to this embodiment, each of the light shielding plates 78 and 79 has a large number of slits (through holes) 78a having a width twice the stroke of the movable electrodes 74 and 75 in a direction perpendicular to the moving direction of the light shielding plates 78 and 79. Each of the movable electrodes 74 and 75 is provided in parallel at an equal interval that is twice the width of the stroke. Then, the light shielding plates 78 and 79 are arranged on the top and bottom without being placed on the same plane. At this time, the slits 78a and 79a of the upper and lower light shielding plates 78 and 79 are in a state before operation (no voltage is applied). Light is blocked by the non-slit portion of the other light-shielding plate. After operation (voltage application), the upper light-shielding plate 78 moves by one stroke, and the lower light-shielding plate 79 also moves in a direction to separate one stroke. The relative movement of the slit is two strokes. Therefore, the upper and lower slots 78a and 79a are completely overlapped, and the maximum opening is opened.

次に、このようにして得られた電気機械式光スイッチ素子71の動作について簡単に説明する。
図7(a)のように、固定電極72、73と可動電極74、75との間に電圧が印加されないときは固定電極72、73と可動電極74、75との間に静電気力は働かないので可動電極74、75は動かず、可動電極74、75に立設された遮光板78、79も動かない。したがって支持基板10に垂直に到来した光L1は遮光板78、79により反射されて、もと来た光路へ戻る。
Next, the operation of the electromechanical optical switch element 71 thus obtained will be briefly described.
As shown in FIG. 7A, when no voltage is applied between the fixed electrodes 72 and 73 and the movable electrodes 74 and 75, no electrostatic force acts between the fixed electrodes 72 and 73 and the movable electrodes 74 and 75. Therefore, the movable electrodes 74 and 75 do not move, and the light shielding plates 78 and 79 installed on the movable electrodes 74 and 75 do not move. Therefore, the light L1 arriving perpendicularly to the support substrate 10 is reflected by the light shielding plates 78 and 79 and returns to the original optical path.

次に、図7(b)のように、固定電極72、73と可動電極74、75との間に電圧が印加されると、可動電極74、75は固定電極72、73の方向に移動し、これに伴って可動電極74、75に立設された遮光板78、79も固定電極72、73の方向に移動する。その結果、上のスロット78aと下のスロット79aは完全に重なり、最大の開口部が開け、支持基板10に垂直に到来した光L1は各スリットの間を通過する(光L1参照)。   Next, as shown in FIG. 7B, when a voltage is applied between the fixed electrodes 72 and 73 and the movable electrodes 74 and 75, the movable electrodes 74 and 75 move in the direction of the fixed electrodes 72 and 73. Accordingly, the light shielding plates 78 and 79 erected on the movable electrodes 74 and 75 also move in the direction of the fixed electrodes 72 and 73. As a result, the upper slot 78a and the lower slot 79a are completely overlapped, the largest opening is opened, and the light L1 arriving perpendicularly to the support substrate 10 passes between the slits (see the light L1).

本実施例によれば、動作後の状態では、上下の各遮光板のスリットは互いに重なり、各スリットを通って、光は通過することとなる。このスリットが複数個(図では6個)設けてあるので、ストローク分の光量の6倍の光量が通過することができるようになる。このように実施例7によれば、僅かの変位量で、多量の光を通過させることができる。   According to the present embodiment, in the state after the operation, the slits of the upper and lower light shielding plates overlap each other, and light passes through each slit. Since a plurality of slits (six in the figure) are provided, a light amount that is six times the light amount corresponding to the stroke can pass. As described above, according to the seventh embodiment, a large amount of light can be transmitted with a small amount of displacement.

ここで、本発明の実施例1に係る電気機械式光スイッチ素子11を例にして、その作製プロセスについて、図8および図9を用いて簡単に説明しておく。
なお、実施例2〜7についても、作製プロセスは基本的に実施例1と同じであるので、これらについての作製プロセスは説明を省略する。
図8は作製プロセスの前半、図9は後半をそれぞれ示す斜視図である。
図8の(1)の「基板洗浄」プロセスにおいて、まず、直方体状の平板から成るガラス基板10をアルカリで洗浄し、乾燥させる。
次に、(2)の「基板パターニング」プロセスにおいて、(1)のガラス基板10の両端部(図で手前の端部と向こうの端部)に段差10aを形成するため、まず、レジストを成膜し、フォトリソ工程でレジストをパターニングする。次いで、CF4ガスを用いてドライエッチングで削って、段差を形成し、ウエット又は酸素ガスプラズマ下で残りのレジスト剥離をする。これによって、図(2)の段差10a付きガラス基板10が得られる。 (3)の「犠牲層成膜」プロセスで、段差付きガラス基板10の段差の窪み部分をポリイミド成膜し、ベークし、表面を研磨(例えば、CMP研磨法で)し、面だしして段差部10aと面イチにする。ここで犠牲層とは、最終的に空隙を形成するため工程の後で除去されてなくなってしまう層のことである。
Here, taking the electromechanical optical switch element 11 according to the first embodiment of the present invention as an example, a manufacturing process thereof will be briefly described with reference to FIGS.
In addition, since the manufacturing process of Examples 2 to 7 is basically the same as that of Example 1, the description of the manufacturing process for these is omitted.
FIG. 8 is a perspective view showing the first half of the manufacturing process, and FIG. 9 is a perspective view showing the second half.
In the “substrate cleaning” process of (1) in FIG. 8, first, the glass substrate 10 formed of a rectangular parallelepiped flat plate is cleaned with an alkali and dried.
Next, in the “substrate patterning” process of (2), in order to form the step 10a at both ends of the glass substrate 10 of (1) (the end opposite to the front in the figure), first, a resist is formed. Then, the resist is patterned by a photolithography process. Next, a step is formed by dry etching using CF4 gas, and the remaining resist is stripped under wet or oxygen gas plasma. As a result, the glass substrate 10 with the step 10a shown in FIG. In the “sacrificial layer deposition” process of (3), a stepped recess portion of the stepped glass substrate 10 is formed with polyimide, baked, the surface is polished (for example, by CMP polishing method), and the surface is stepped. The surface is the same as the part 10a. Here, the sacrificial layer is a layer that is not removed after the process in order to finally form a void.

(4)からは電極を垂直に形成するプロセスであり、電極は電解メッキで形成することとする。まず、「金属膜真空成膜及びパターニング」プロセスで、電気が通る下地に電極パターンをパターニングする。そのためにフォトリソで、まず、金属(Au,Ni,Al等で、ここではAuを使用。)を真空成膜し、フォトリソエッチング、レジスト剥離で、将来の固定電極となる12,13と可動電極となる14,15だけを残す。この結果、電極12,13、14,15の上にだけAuが残っている。
(5)の「絶縁膜成膜及びパターニング」プロセスでは、プラズマCVDでSiNx成膜し、フォトリソ、ドライエッチング(CF4)で、電極部分だけ絶縁層内に垂直方向の空隙を形成する。
(4) is the process of forming the electrodes vertically, and the electrodes are formed by electrolytic plating. First, in the “metal film vacuum film formation and patterning” process, an electrode pattern is patterned on a base through which electricity passes. For this purpose, first, metal (Au, Ni, Al, etc., Au is used here) is vacuum-deposited by photolithography, and photolithography etching and resist stripping are used for future fixed electrodes 12, 13 and a movable electrode. Leave only 14,15. As a result, Au remains only on the electrodes 12, 13, 14, and 15.
In the “insulating film formation and patterning” process (5), a SiNx film is formed by plasma CVD, and a vertical gap is formed in the insulating layer only at the electrode portion by photolithography and dry etching (CF4).

(6)の「電極成膜」プロセスでは、メッキ(Ni等電解メッキ)で電極12,13、14,15の上に電極を成長させて上まで到達させる。
(7)の「絶縁膜パターニング」プロセスでは、固定電極12,13と可動電極14,15間に絶縁膜を形成させる。そのために、フォトリソ、ドライエッチング(CF4)で絶縁層(SiNで、支持部材となる。)16,17を残す。
(8)の「犠牲層成膜」プロセスでは、再びポリイミド成膜、ベーク、研磨(CMP)で表面の面だしをする。
(9)の「遮光あるいは反射層成膜及びパターニング」プロセスからは遮光板を形成するもので、まず、真空成膜(アルミ:スパッター)で全面に遮光板を付けて、フォトリソでパターニングして、遮光板18,19だけが残る。
(10)の「犠牲層除去」プロセスで完成する。すなわち、図(9)で見て、電極と遮光板が金属、絶縁膜17がSiN(無機材料)、その他はポりイミド(有機材料)とから成っているので、この状態でドライエッチング(O2)をかけると、有機物(ポりイミド)がすべて除去されるので、金属の電極12〜15と遮光板18,19、無機材料の絶縁膜(SiN)17、18が残り、製品が完成する。
なお、配線については、上記のプロセス(1)かプロセス(4)の際に組み込むのがもっとも容易なのれ、そのようにするとよい。。
In the “electrode deposition” process (6), electrodes are grown on the electrodes 12, 13, 14, and 15 by plating (electrolytic plating such as Ni) to reach the top.
In the “insulating film patterning” process (7), an insulating film is formed between the fixed electrodes 12 and 13 and the movable electrodes 14 and 15. Therefore, the insulating layers (SiN, which becomes a supporting member) 16 and 17 are left by photolithography and dry etching (CF4).
In the “sacrificial layer deposition” process of (8), the surface is exposed again by polyimide deposition, baking, and polishing (CMP).
The light shielding plate is formed from the “light shielding or reflective layer film formation and patterning” process of (9). First, a light shielding plate is attached to the entire surface by vacuum film formation (aluminum: sputtering), and patterned by photolithography. Only the light shielding plates 18 and 19 remain.
It is completed by the “sacrificial layer removal” process of (10). That is, as shown in FIG. 9, the electrodes and the light shielding plate are made of metal, the insulating film 17 is made of SiN (inorganic material), and the others are made of polyimide (organic material). ), All the organic matter (polyimide) is removed, so that the metal electrodes 12 to 15, the light shielding plates 18 and 19, and the inorganic insulating films (SiN) 17 and 18 remain, thereby completing the product.
It should be noted that the wiring is most easily incorporated during the process (1) or the process (4), and it is preferable to do so. .

以上の実施例では、すべて静電気力で両電極の吸引を行わせている例を示したが、本発明は静電気力に限定されるものではなく、コイルと磁性体とによる電磁力、圧電素子による電歪力でも上記可動電極に相当する部位を移動させることができるので、これらの吸引力によって遮光膜を動かすことにより、光の透過/遮断を制御する電気機械式光シャッター素子が得られる。   In the above-described embodiments, an example in which both electrodes are attracted by electrostatic force is shown. However, the present invention is not limited to electrostatic force. Electromagnetic force by a coil and a magnetic material, and piezoelectric element are used. Since the portion corresponding to the movable electrode can be moved even by electrostrictive force, an electromechanical optical shutter element that controls transmission / blocking of light can be obtained by moving the light shielding film by these suction forces.

以上の実施例1〜7のいずれかの電気機械式光シャッター素子を複数個1次元又は2次元に配列し、その各入射光側および各出射光側に集光レンズ(マイクロレンズ)を配置することにより、効率の良い小型の光シャッターアレイを得ることができる。
図10はこのような光シャッターアレイを示す断面図で、(a)は電圧無印加時、(b)は電圧印加時である。図において、11、11’は実施例1に係る電気機械式光シャッター素子の2個、81は光シャッターアレイ、82は入射側マイクロレンズアレイ、83は出射側マイクロレンズアレイである。
以下では、2個の電気機械式光シャッター素子のうち、電気機械式光シャッター素子11について説明する。
図10(a)のように、固定電極12、13と可動電極14、15との間に電圧が印加されないときは可動電極14、15は動かず、可動電極14、15に立設された遮光板18、19は閉じたままである。したがって平行光L1がマイクロレンズアレイ82で集光された光は遮光板18、19に到来しても、遮光板18、19により反射されて、もと来た光路へ戻る。
A plurality of electromechanical optical shutter elements according to any of the first to seventh embodiments are arranged one-dimensionally or two-dimensionally, and a condensing lens (microlens) is arranged on each incident light side and each outgoing light side. Thus, an efficient small optical shutter array can be obtained.
FIG. 10 is a cross-sectional view showing such an optical shutter array, where (a) shows no voltage applied and (b) shows a voltage applied. In the figure, 11 and 11 'are two electromechanical optical shutter elements according to the first embodiment, 81 is an optical shutter array, 82 is an incident side microlens array, and 83 is an output side microlens array.
Hereinafter, the electromechanical optical shutter element 11 among the two electromechanical optical shutter elements will be described.
As shown in FIG. 10A, when no voltage is applied between the fixed electrodes 12 and 13 and the movable electrodes 14 and 15, the movable electrodes 14 and 15 do not move, and the light shielding provided on the movable electrodes 14 and 15. The plates 18, 19 remain closed. Therefore, even if the parallel light L1 collected by the microlens array 82 reaches the light shielding plates 18 and 19, it is reflected by the light shielding plates 18 and 19 and returns to the original optical path.

次に、図10(b)のように、固定電極12、13と可動電極14、15との間に電圧が印加されると、固定電極12と可動電極14、固定電極13と可動電極15との間に静電気力が働らき、互いに吸引し合うようになる。したがって可動電極14は固定電極12の方向に、可動電極15は固定電極13の方向に折曲がり、これに伴って遮光板18、19も互いに離反する方向に移動し、遮光板にあった箇所が開放されるので、到来した光L1は遮光板18、19の間を通過し、出射側マイクロレンズアレイ83に到達し、そこで再び平行光に戻されて出射側マイクロレンズアレイ83から出ていく。
このように光路絞込手段であるマイクロレンズアレイ82の全面に平行に入射した光L1はその凸レンズ部分で遮光板18、19上に絞り込まれて細いビームとなり、遮光板18、19で反射したり(電圧無印加時)、遮光板18、19の開放部を通過したり(電圧印加時)するので、光の利用効率がよくなる。
Next, as shown in FIG. 10B, when a voltage is applied between the fixed electrodes 12, 13 and the movable electrodes 14, 15, the fixed electrode 12, the movable electrode 14, the fixed electrode 13, and the movable electrode 15 During this period, electrostatic forces act and attract each other. Therefore, the movable electrode 14 bends in the direction of the fixed electrode 12 and the movable electrode 15 bends in the direction of the fixed electrode 13, and accordingly, the light shielding plates 18 and 19 move away from each other. Since the light is released, the light L1 that has arrived passes between the light shielding plates 18 and 19 and reaches the emission-side microlens array 83, where it is converted back into parallel light and exits from the emission-side microlens array 83.
Thus, the light L1 incident in parallel on the entire surface of the microlens array 82 as the optical path narrowing means is narrowed down on the light shielding plates 18 and 19 by the convex lens portion to become a thin beam and reflected by the light shielding plates 18 and 19. Since the light passes through the open portions of the light shielding plates 18 and 19 (when no voltage is applied), the light utilization efficiency is improved.

以上のように、本発明によれば、透過形光シャッターが得られるので設計の自由度が大きくなり、構造が簡単で、コスト安で、制御が簡単で、単純に光の経路をシャットするだけなので波長依存性がない電気機械式光シャッター素子が得られる。また、電極同士が平行平板であるので高速応答が可能となり、この光シャッターを2個並置することでストロークが2倍稼げることができ、又は同じ変位量であれば低電圧化にすることができる。
さらに、この光シャッターを4個並置すれば2個並置の光シャッターの2倍の面積の光を制御することができる。
また、このような光シャッターとマイクロレンズアレイとを組み合わせることで、光の利用効率がよい光シャッターアレイが得られる。
As described above, according to the present invention, since a transmissive optical shutter can be obtained, the degree of freedom in design is increased, the structure is simple, the cost is low, the control is simple, and the light path is simply shut down. Therefore, an electromechanical optical shutter element having no wavelength dependency can be obtained. In addition, since the electrodes are parallel plates, high-speed response is possible, and by arranging two optical shutters in parallel, the stroke can be doubled, or the voltage can be lowered if the displacement is the same. .
Further, if four optical shutters are juxtaposed, light having an area twice that of two juxtaposed optical shutters can be controlled.
Further, by combining such an optical shutter and a microlens array, an optical shutter array with good light utilization efficiency can be obtained.

本発明の実施例1に係る電気機械式光シャッター素子の斜視図で、(a)は動作前(電圧無印加時)、(b)は動作後(電圧印加時)である。BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a perspective view of an electromechanical optical shutter element according to Embodiment 1 of the present invention, where (a) is before operation (when no voltage is applied), and (b) is after operation (when voltage is applied). 本発明の実施例2に係る電気機械式光シャッター素子の斜視図で、(a)は動作前(電圧無印加時)、(b)は動作後(電圧印加時)である。It is a perspective view of the electromechanical optical shutter element which concerns on Example 2 of this invention, (a) is before operation | movement (at the time of no voltage application), (b) is after operation | movement (at the time of voltage application). 本発明の実施例3に係る電気機械式光シャッター素子の斜視図で、(a)は動作前(電圧無印加時)、(b)は動作後(電圧印加時)である。It is a perspective view of the electromechanical optical shutter element which concerns on Example 3 of this invention, (a) is before operation | movement (at the time of no voltage application), (b) is after operation | movement (at the time of voltage application). 本発明の実施例4に係る電気機械式光シャッター素子の斜視図で、(a)は動作前(電圧無印加時)、(b)は動作後(電圧印加時)である。It is a perspective view of the electromechanical optical shutter element which concerns on Example 4 of this invention, (a) is before operation | movement (at the time of no voltage application), (b) is after operation | movement (at the time of voltage application). 本発明の実施例5に係る電気機械式光シャッター素子の斜視図で、(a)は動作前(電圧無印加時)、(b)は動作後(電圧印加時)である。It is a perspective view of the electromechanical optical shutter element which concerns on Example 5 of this invention, (a) is before operation | movement (at the time of no voltage application), (b) is after operation | movement (at the time of voltage application). 本発明の実施例6に係る電気機械式光シャッター素子の斜視図で、(a)は動作前(電圧無印加時)、(b)は動作後(電圧印加時)である。It is a perspective view of the electromechanical optical shutter element which concerns on Example 6 of this invention, (a) is before operation | movement (at the time of no voltage application), (b) is after operation | movement (at the time of voltage application). 本発明の実施例7に係る電気機械式光シャッター素子の斜視図で、(a)は動作前(電圧無印加時)、(b)は動作後(電圧印加時)である。It is a perspective view of the electromechanical optical shutter element which concerns on Example 7 of this invention, (a) is before operation | movement (at the time of no voltage application), (b) is after operation | movement (at the time of voltage application). 本発明の実施例1に係る電気機械式光スイッチ素子の作製プロセスの説明図の前半部である。It is the first half part of explanatory drawing of the manufacturing process of the electromechanical optical switch element which concerns on Example 1 of this invention. 本発明の実施例1に係る電気機械式光スイッチ素子の作製プロセスの説明図の後半部である。It is the second half part of explanatory drawing of the manufacturing process of the electromechanical optical switch element which concerns on Example 1 of this invention. 本発明の実施例1に係る電気機械式光スイッチ素子を用いた光シャッターアレイを示す断面図で、(a)は電圧無印加時、(b)は電圧印加時である。2A and 2B are cross-sectional views showing an optical shutter array using an electromechanical optical switch element according to Embodiment 1 of the present invention, in which FIG.

符号の説明Explanation of symbols

11 実施例1に係る電気機械式光スイッチ素子
21 実施例2に係る電気機械式光スイッチ素子
31 実施例3に係る電気機械式光スイッチ素子
41 実施例4に係る電気機械式光スイッチ素子
51 実施例5に係る電気機械式光スイッチ素子
61 実施例6に係る電気機械式光スイッチ素子
71 実施例7に係る電気機械式光スイッチ素子
10 支持基板
10a 段差
12、13、22、23、32、33、42、43、52、53、62、72、73 固定電極
14、15、24、25、34、35、44、45、54、55、64、65、74、75 可動電極
16、17、26、27、36、37、46、47、56、57、66、76、77 支持部材
18、19、28、29、38、39、48、49、58、59、68、69、78、79 遮光板
81 実施例8に係る光シャッターアレイ
82 入射側マイクロレンズアレイ
83 出射側マイクロレンズアレイ
L1 光
11 Electromechanical optical switch element 21 according to Example 1 Electromechanical optical switch element 31 according to Example 2 Electromechanical optical switch element 41 according to Example 3 Electromechanical optical switch element 51 according to Example 4 Electromechanical optical switch element 61 according to Example 5 Electromechanical optical switch element 71 according to Example 6 Electromechanical optical switch element 10 according to Example 7 Support substrate 10a Steps 12, 13, 22, 23, 32, 33 , 42, 43, 52, 53, 62, 72, 73 Fixed electrodes 14, 15, 24, 25, 34, 35, 44, 45, 54, 55, 64, 65, 74, 75 Movable electrodes 16, 17, 26 27, 36, 37, 46, 47, 56, 57, 66, 76, 77 Support member 18, 19, 28, 29, 38, 39, 48, 49, 58, 59, 68, 69, 78, 79 Optical Plate 81 Optical Shutter Array 82 According to Example 8 Incident Side Microlens Array 83 Output Side Microlens Array L1 Light

Claims (10)

透明もしくは光を透過する機能を有した支持基板上に該支持基板に対して垂直に立設された固定電極と、前記支持基板又は固定電極上に前記固定電極と間隔を置いて対向配置状態に支持された可動電極又は電極付き可動膜(以下、可動電極と言う)と、前記支持基板に対して垂直方向に進む光を遮断もしくは反射する機能を有した膜(以下、遮光膜と言う)を前記可動電極に設け、前記固定電極と前記可動電極との間に作用する力で前記可動電極を変位させてその遮光膜で光の透過/遮断を制御することを特徴とする電気機械式光シャッター素子。   A fixed electrode standing vertically to the support substrate on a support substrate having a transparent or light-transmitting function, and being placed opposite to the fixed electrode on the support substrate or the fixed electrode. A supported movable electrode or a movable film with an electrode (hereinafter referred to as a movable electrode) and a film having a function of blocking or reflecting light traveling in a direction perpendicular to the support substrate (hereinafter referred to as a light shielding film) An electromechanical optical shutter provided on the movable electrode, wherein the movable electrode is displaced by a force acting between the fixed electrode and the movable electrode, and light transmission / blocking is controlled by the light shielding film. element. 請求項1記載の電気機械式光シャッター素子を複数個、不動作時に互いにその遮光板を突き合わせ状態で配置したことを特徴とする電気機械式光シャッター素子。   2. An electromechanical optical shutter element according to claim 1, wherein a plurality of electromechanical optical shutter elements according to claim 1 are arranged with their light-shielding plates abutting each other when not operating. 透明もしくは光を透過する機能を有した支持基板上に該支持基板に対して垂直に立設された固定電極と、前記支持基板又は固定電極上に前記固定電極と間隔を置いて対向配置状態に支持された可動電極と、前記支持基板に対して垂直方向に進む光を遮断する遮光膜を前記可動電極に設け、前記固定電極と前記可動電極との間に作用する力で前記可動電極を変位させてその遮光膜で光の透過/遮断を制御する電気機械式光シャッター素子を2個、不動作時に互いにその遮光板を突き合わせ状態で配置した電気機械式光シャッター素子であって、
前記固定電極側に設けられた支持部材と前記可動電極の互いの対向面側に、動作時に互いに嵌(はま)り合うことのできる凹凸状の起伏を形成したことを特徴とする電気機械式光シャッター素子。
A fixed electrode standing vertically to the support substrate on a support substrate having a transparent or light-transmitting function, and being placed opposite to the fixed electrode on the support substrate or the fixed electrode. A movable electrode that is supported and a light-shielding film that blocks light traveling in a direction perpendicular to the support substrate are provided on the movable electrode, and the movable electrode is displaced by a force acting between the fixed electrode and the movable electrode. Two electromechanical optical shutter elements that control transmission / blocking of light by the light shielding film, and arranged in a state where the light shielding plates are in contact with each other when not operating,
An electro-mechanical type characterized in that a concavo-convex undulation that can be fitted to each other during operation is formed on the opposing surface side of the support member provided on the fixed electrode side and the movable electrode. Optical shutter element.
透明もしくは光を透過する機能を有した支持基板上に該支持基板に対して垂直に立設された固定電極と、前記支持基板又は固定電極上に前記固定電極と間隔を置いて対向配置状態に支持された可動電極と、前記支持基板に対して垂直方向に進む光を遮断する遮光膜を前記可動電極に設け、前記固定電極と前記可動電極との間に作用する力で前記可動電極を変位させてその遮光膜で光の透過/遮断を制御する電気機械式光シャッター素子を2個、不動作時に互いにその遮光板を突き合わせ状態で配置した電気機械式光シャッター素子であって、
前記可動電極の両端部および/又は前記可動電極を支持する支持部材の前記可動電極との接触部位近傍を柔らかい材料で形成したことを特徴とする電気機械式光シャッター素子。
A fixed electrode standing vertically to the support substrate on a support substrate having a transparent or light-transmitting function, and being placed opposite to the fixed electrode on the support substrate or the fixed electrode. A movable electrode that is supported and a light-shielding film that blocks light traveling in a direction perpendicular to the support substrate are provided on the movable electrode, and the movable electrode is displaced by a force acting between the fixed electrode and the movable electrode. Two electromechanical optical shutter elements that control transmission / blocking of light by the light shielding film, and arranged in a state where the light shielding plates are in contact with each other when not operating,
An electromechanical optical shutter element, characterized in that both ends of the movable electrode and / or the vicinity of a contact portion of the support member supporting the movable electrode with the movable electrode are formed of a soft material.
透明もしくは光を透過する機能を有した支持基板上に該支持基板に対して垂直に立設された固定電極と、前記支持基板又は固定電極上に前記固定電極と間隔を置いて対向配置状態に支持された可動電極と、前記支持基板に対して垂直方向に進む光を遮断する遮光膜を前記可動電極に設け、前記固定電極と前記可動電極との間に作用する力で前記可動電極を変位させてその遮光膜で光の透過/遮断を制御する電気機械式光シャッター素子を2個、不動作時に互いにその遮光板を突き合わせ状態で配置した電気機械式光シャッター素子であって、前記可動電極がその一端で前記固定電極と広い間隔を置き、その他端で前記固定電極と狭い間隔を置いて前記固定電極に対向配置されたことを特徴とする電気機械式光シャッター素子。   A fixed electrode standing vertically to the support substrate on a support substrate having a transparent or light-transmitting function, and being placed opposite to the fixed electrode on the support substrate or the fixed electrode. A movable electrode that is supported and a light-shielding film that blocks light traveling in a direction perpendicular to the support substrate are provided on the movable electrode, and the movable electrode is displaced by a force acting between the fixed electrode and the movable electrode. An electromechanical optical shutter element in which two electromechanical optical shutter elements that control transmission / blocking of light by the light shielding film are disposed in a state where the light shielding plates are in contact with each other when not operating, the movable electrode The electromechanical optical shutter element has a wide interval with the fixed electrode at one end and a small interval with the fixed electrode at the other end. 透明もしくは光を透過する機能を有した支持基板上に該支持基板に対して垂直に立設された円筒状固定電極と、前記円筒状固定電極内に不動作時に前記円筒状固定電極と同心配置になるように前記支持基板上にそれぞれ支持された2個の半円筒状可動電極と、前記支持基板に対して垂直方向に進む光を遮断する遮光膜を前記半円筒状可動電極に設け、前記円筒状固定電極と前記半円筒状可動電極との間に作用する力で前記半円筒状可動電極を変位させてその遮光膜で光の透過/遮断を制御することを特徴とする電気機械式光シャッター素子。   A cylindrical fixed electrode standing perpendicular to the support substrate on a transparent or light-transmitting support substrate, and concentrically arranged with the cylindrical fixed electrode when not operating in the cylindrical fixed electrode Two semi-cylindrical movable electrodes each supported on the support substrate, and a light-shielding film that blocks light traveling in a direction perpendicular to the support substrate is provided on the semi-cylindrical movable electrode, Electromechanical light characterized in that the semi-cylindrical movable electrode is displaced by a force acting between a cylindrical fixed electrode and the semi-cylindrical movable electrode, and transmission / blocking of light is controlled by the light shielding film. Shutter element. 透明もしくは光を透過する機能を有した支持基板上に該支持基板に対して垂直に立設された固定電極と、前記支持基板又は固定電極上に前記固定電極と間隔を置いて対向配置状態に支持された可動電極と、前記支持基板に対して垂直方向に進む光を遮断する機能を有した遮光膜を前記可動電極に設け、前記固定電極と前記可動電極との間に作用する力で前記可動電極を変位させてその遮光膜で光の透過/遮断を制御する電気機械式光シャッター素子を2個、その遮光板を上下に重ねた状態で配置した電気機械式光シャッター素子であって、前記各遮光板に複数のスリットを設け、不動作時に上下のスリットが互いにずれて遮光状態となり、動作時に上下のスリットが重なり合うことを特徴とする電気機械式光シャッター素子。   A fixed electrode standing vertically to the support substrate on a support substrate having a transparent or light-transmitting function, and being placed opposite to the fixed electrode on the support substrate or the fixed electrode. A movable electrode supported and a light shielding film having a function of blocking light traveling in a direction perpendicular to the support substrate are provided on the movable electrode, and the force acting between the fixed electrode and the movable electrode Two electromechanical optical shutter elements that displace the movable electrode and control transmission / blocking of light by the light shielding film, and are arranged in a state where the light shielding plates are vertically stacked, An electromechanical optical shutter element, wherein a plurality of slits are provided in each of the light shielding plates, and the upper and lower slits are shifted from each other when not in operation to be in a light shielding state, and the upper and lower slits overlap during operation. 前記突き合わせ配置された2個の遮光膜の間にできる隙間が、使用する光の波長の1/10以下であることを特徴とする請求項2〜7のいずれか1項記載の電気機械式光シャッター素子。   The electromechanical light according to any one of claims 2 to 7, wherein a gap formed between the two light-shielding films arranged in contact with each other is 1/10 or less of a wavelength of light to be used. Shutter element. 請求項1〜8のいずれか1項記載の電気機械式光シャッター素子を複数個アレイ状に配置したことを特徴とする電気機械式光シャッターアレイ。   An electromechanical optical shutter array comprising a plurality of electromechanical optical shutter elements according to claim 1 arranged in an array. 請求項9記載の電気機械式光シャッターアレイと、前記電気機械式光シャッターアレイの入射光側および/又は出射光側に集光レンズを複数個アレイ状に配置したことを特徴とする光シャッターアレイ。   10. An electromechanical optical shutter array according to claim 9, and an optical shutter array comprising a plurality of condensing lenses arranged in an array on the incident light side and / or the outgoing light side of the electromechanical optical shutter array. .
JP2004031630A 2004-02-09 2004-02-09 Electromechanical type optical shutter element and optical shutter array Pending JP2005221917A (en)

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WO2014123862A1 (en) * 2013-02-05 2014-08-14 Pixtronix, Inc. Display apparatus incorporating multi-level shutters
WO2014164142A1 (en) * 2013-03-13 2014-10-09 Pixtronix, Inc. Mems shutter assemblies for high-resolution displays
JP2014240957A (en) * 2013-05-15 2014-12-25 国立大学法人 香川大学 Plasmon waveguide element and manufacturing method thereof
JP2016026330A (en) * 2005-02-23 2016-02-12 ピクストロニクス,インコーポレイテッド Display device
US9291813B2 (en) 2010-12-20 2016-03-22 Pixtronix, Inc. Systems and methods for MEMS light modulator arrays with reduced acoustic emission
WO2016052116A1 (en) * 2014-10-03 2016-04-07 住友精密工業株式会社 Shutter device and drive device
US9632307B2 (en) 2013-03-13 2017-04-25 Snaptrack, Inc. MEMS shutter assemblies for high-resolution displays

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Publication number Priority date Publication date Assignee Title
JP2016026330A (en) * 2005-02-23 2016-02-12 ピクストロニクス,インコーポレイテッド Display device
US9291813B2 (en) 2010-12-20 2016-03-22 Pixtronix, Inc. Systems and methods for MEMS light modulator arrays with reduced acoustic emission
WO2014123862A1 (en) * 2013-02-05 2014-08-14 Pixtronix, Inc. Display apparatus incorporating multi-level shutters
US9170421B2 (en) 2013-02-05 2015-10-27 Pixtronix, Inc. Display apparatus incorporating multi-level shutters
WO2014164142A1 (en) * 2013-03-13 2014-10-09 Pixtronix, Inc. Mems shutter assemblies for high-resolution displays
US9134532B2 (en) 2013-03-13 2015-09-15 Pixtronix, Inc. MEMS shutter assemblies for high-resolution displays
CN105074535A (en) * 2013-03-13 2015-11-18 皮克斯特隆尼斯有限公司 MEMS shutter assemblies for high-resolution displays
US9632307B2 (en) 2013-03-13 2017-04-25 Snaptrack, Inc. MEMS shutter assemblies for high-resolution displays
JP2014240957A (en) * 2013-05-15 2014-12-25 国立大学法人 香川大学 Plasmon waveguide element and manufacturing method thereof
WO2016052116A1 (en) * 2014-10-03 2016-04-07 住友精密工業株式会社 Shutter device and drive device
JPWO2016052116A1 (en) * 2014-10-03 2017-07-13 住友精密工業株式会社 Shutter device and driving device

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