JP2005055798A5 - - Google Patents

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Publication number
JP2005055798A5
JP2005055798A5 JP2003288567A JP2003288567A JP2005055798A5 JP 2005055798 A5 JP2005055798 A5 JP 2005055798A5 JP 2003288567 A JP2003288567 A JP 2003288567A JP 2003288567 A JP2003288567 A JP 2003288567A JP 2005055798 A5 JP2005055798 A5 JP 2005055798A5
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Japan
Prior art keywords
optical
substrate
optical member
exposure apparatus
member according
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JP2003288567A
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Japanese (ja)
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JP4336545B2 (en
JP2005055798A (en
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Priority to JP2003288567A priority Critical patent/JP4336545B2/en
Priority claimed from JP2003288567A external-priority patent/JP4336545B2/en
Publication of JP2005055798A publication Critical patent/JP2005055798A/en
Publication of JP2005055798A5 publication Critical patent/JP2005055798A5/ja
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Publication of JP4336545B2 publication Critical patent/JP4336545B2/en
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Claims (14)

入射する光束に対して光学的作用を有する光学素子部を直接形成した基板と、
前記光束を透過する透過部を有し、前記基板を収納する保護部材とを有し、
前記保護部材は、前記基板と共同して前記光学素子部が形成された面を内包する空間を形成することを特徴とする光学部材。
A substrate on which an optical element portion having an optical effect on an incident light beam is directly formed;
They have a transmission unit for transmitting the light beams, have a protective member for accommodating the substrate,
The protective member forms a space including a surface on which the optical element portion is formed in cooperation with the substrate .
前記光学素子部は、リソグラフィーによって形成されることを特徴とする請求項1記載の光学部材。   The optical member according to claim 1, wherein the optical element portion is formed by lithography. 前記光学的作用は、屈折作用、回折作用、及び反射作用のいずれかであることを特徴とする請求項1記載の光学部材。 The optical member according to claim 1, wherein the optical action is any one of a refraction action , a diffraction action, and a reflection action . 前記空間は、ガスが充填された密閉空間であることを特徴とする請求項記載の光学部材。 The space is an optical member according to claim 1, wherein it is a sealed space filled with gas. 前記保護部材は、空気を透過し、塵芥遮蔽することを特徴とする請求項1記載の光学部材。   The optical member according to claim 1, wherein the protective member transmits air and shields dust. 前記光学部材は、複数の前記基板を有し、
両端に位置する前記基板が前記複数の光学素子部を対向させて配置されていることを特徴とする請求項1記載の光学部材。
The optical member has a plurality of the substrates,
The optical member according to claim 1, wherein the substrates positioned at both ends are arranged with the plurality of optical element portions facing each other.
前記光学部材は、複数の前記基板を有し、当該複数の基板は、
前記光束に対して光軸と垂直な面内にある第1の方向にのみ屈折作用を有する第1の光学素子部を一面に直接形成した第1の基板と、
前記光束に対して前記光軸と垂直な面内にあり前記第1の方向と直交する第2の方向にのみ屈折作用を有する第2の光学素子部を一面に直接形成した第2の基板とを有することを特徴とする請求項1記載の光学部材。
The optical member has a plurality of the substrates, and the plurality of substrates are:
A first substrate in which a first optical element portion having a refractive action only in a first direction lying in a plane perpendicular to the optical axis with respect to the luminous flux is directly formed on one surface;
A second substrate in which a second optical element portion that is in a plane perpendicular to the optical axis with respect to the light beam and has a refractive action only in a second direction orthogonal to the first direction is directly formed on one surface; The optical member according to claim 1, comprising:
光束を射出する光源と、
前記光束を用いて被照明面を照明する照明光学系とを有し、
前記照明光学系は、請求項1乃至のうちいずれか一項記載の光学部材を含むことを特徴とする照明装置。
A light source that emits a luminous flux;
An illumination optical system that illuminates the surface to be illuminated using the luminous flux,
The illumination optical system includes the optical member according to any one of claims 1 to 7 .
光源から射出した光束を用いて被照明面を照明すると共に、請求項1乃至のうちいずれか一項記載の光学部材を含む照明光学系と、
前記照明光学系により照明されたレチクル及び/又はマスクに形成されたパターンを被処理体に投影する投影光学系とを有することを特徴とする露光装置。
An illumination optical system including an optical member according to any one of claims 1 to 7 , while illuminating a surface to be illuminated with a light beam emitted from a light source;
An exposure apparatus comprising: a projection optical system that projects a pattern formed on a reticle and / or mask illuminated by the illumination optical system onto an object to be processed.
前記光学部材は、前記光束から前記被照明面を照明する複数の2次光源を形成することを特徴とする請求項記載の露光装置。 The exposure apparatus according to claim 9 , wherein the optical member forms a plurality of secondary light sources that illuminate the illuminated surface from the light flux. 前記2次光源は、前記基板と前記保護部材との間に形成されることを特徴とする請求項10記載の露光装置。 The exposure apparatus according to claim 10 , wherein the secondary light source is formed between the substrate and the protective member. 前記2次光源は、前記保護部材と前記基板が共同して形成した前記空間に形成されることを特徴とする請求項10記載の露光装置。 The exposure apparatus according to claim 10 , wherein the secondary light source is formed in the space formed by the protection member and the substrate jointly. 前記光学部材は、前記光束から複数の2次光源を虚光源として形成することを特徴とする請求項記載の露光装置。 The exposure apparatus according to claim 9 , wherein the optical member forms a plurality of secondary light sources from the light flux as virtual light sources. 請求項乃至13のうちいずれか一項記載の露光装置を用いて被処理体を露光するステップと、
露光された前記被処理体を現像するステップとを有することを特徴とするデバイス製造方法。
Exposing the object to be processed using the exposure apparatus according to any one of claims 9 to 13 ,
And developing the exposed object to be processed.
JP2003288567A 2003-08-07 2003-08-07 Optical member, illumination apparatus and exposure apparatus having the optical member Expired - Fee Related JP4336545B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2003288567A JP4336545B2 (en) 2003-08-07 2003-08-07 Optical member, illumination apparatus and exposure apparatus having the optical member

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003288567A JP4336545B2 (en) 2003-08-07 2003-08-07 Optical member, illumination apparatus and exposure apparatus having the optical member

Publications (3)

Publication Number Publication Date
JP2005055798A JP2005055798A (en) 2005-03-03
JP2005055798A5 true JP2005055798A5 (en) 2006-09-07
JP4336545B2 JP4336545B2 (en) 2009-09-30

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Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4760198B2 (en) * 2005-08-01 2011-08-31 ソニー株式会社 Exposure mask, exposure mask design method, and exposure mask design program
JP2007279458A (en) * 2006-04-07 2007-10-25 Miraial Kk Sub-wavelength grating optical element
JP4384259B2 (en) 2007-07-23 2009-12-16 パナソニック株式会社 Lens with protective film and method for manufacturing the same
JP2014197166A (en) * 2013-03-07 2014-10-16 セイコーエプソン株式会社 Optical element, method for manufacturing optical element, and projector

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JPH0241613Y2 (en) * 1979-02-01 1990-11-06
JPS60232552A (en) * 1984-05-02 1985-11-19 Canon Inc Lighting optical system
US4709066A (en) * 1985-07-15 1987-11-24 Fused Kontacts Of Chicago Acrylic silicate compositions and methods and highly oxygen-permeable polyacrylates made therefrom
JPS62118379A (en) * 1985-11-19 1987-05-29 Fujitsu Ltd Formation of hologram
JPH07104563B2 (en) * 1986-09-24 1995-11-13 株式会社ニコン Illumination optical device for exposure equipment
JPH0451201A (en) * 1990-06-19 1992-02-19 Canon Inc Transmission type diffraction grating and encoder formed by using this diffraction grating
US5417743A (en) * 1994-01-21 1995-05-23 W. L. Gore & Associates, Inc. Self-adhesive vent filter and adsorbent assembly with a diffusion tube
JP2873573B2 (en) * 1997-01-13 1999-03-24 協和電機化学株式会社 Screen plate for projection television
JP2000147227A (en) * 1998-11-04 2000-05-26 Canon Inc Diffraction optical element and optical system using same
JP2000274532A (en) * 1999-03-25 2000-10-03 Canon Inc Shielding method and holding method
JP3335134B2 (en) * 1999-03-25 2002-10-15 キヤノン株式会社 Optical element
JP2002268147A (en) * 2001-03-07 2002-09-18 Toppan Printing Co Ltd Translucent type screen and image display device
JP2002025933A (en) * 2001-04-04 2002-01-25 Sumitomo Heavy Ind Ltd Beam homogenizer and semiconductor thin film generating method

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