JP2004053219A - Combustion detoxifying device - Google Patents

Combustion detoxifying device Download PDF

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Publication number
JP2004053219A
JP2004053219A JP2002215025A JP2002215025A JP2004053219A JP 2004053219 A JP2004053219 A JP 2004053219A JP 2002215025 A JP2002215025 A JP 2002215025A JP 2002215025 A JP2002215025 A JP 2002215025A JP 2004053219 A JP2004053219 A JP 2004053219A
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JP
Japan
Prior art keywords
combustion
gas
combustion cylinder
treated
cylinder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2002215025A
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Japanese (ja)
Inventor
Osayasu Tomita
富田 修康
Yoshiaki Sugimori
杉森 由章
Akihiko Nitta
新田 昭彦
Shuichi Koseki
小関 修一
Hirotaka Mangyo
万行 大貴
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Japan Oxygen Co Ltd
Nippon Sanso Corp
Original Assignee
Japan Oxygen Co Ltd
Nippon Sanso Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Oxygen Co Ltd, Nippon Sanso Corp filed Critical Japan Oxygen Co Ltd
Priority to JP2002215025A priority Critical patent/JP2004053219A/en
Publication of JP2004053219A publication Critical patent/JP2004053219A/en
Pending legal-status Critical Current

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Abstract

<P>PROBLEM TO BE SOLVED: To provide a combustion detoxifying device improving the combustion detoxifying efficiency by elongating a retention time of a treated gas in a combustion cylinder, to save a space and to reduce the operation cost. <P>SOLUTION: A current plate 19 for guiding the treated gas introduced into a combustion cylinder from a treated gas introduction nozzle, to the direction different from a combustion axial direction, is mounted on a combustion cylinder opening part (gas inlet 18) of the treated gas introduction nozzle 14 for introducing the treated gas into the combustion cylinder 13 of the combustion detoxifying device. <P>COPYRIGHT: (C)2004,JPO

Description

【0001】
【発明の属する技術分野】
本発明は、燃焼除害装置に関し、詳しくは、半導体製造工程や液晶製造工程で使用されるシラン、アンモニア、亜酸化窒素、その他の各種特殊材料ガスのような有害物質、また、地球温暖化等の環境に対して悪影響を及ぼす四フッ化メタン、六フッ化エタン、両者の特性を有する三フッ化窒素等を含む排ガスをバーナーを備えた燃焼筒内に導入し、該バーナーにより形成される高温雰囲気下で有害成分を燃焼又は加熱することによってこれらの除害処理又は除去処理を行う燃焼除害装置に関する。
【0002】
【従来の技術】
半導体工業プロセス、例えば、半導体製造装置やLCD製造装置から排出される排ガス中には、毒性ガス、腐食性ガス、可燃性ガス、地球環境に悪影響を及ぼす不燃性ガスや支燃性ガス等の有害成分が含まれているため、これらの有害成分の除害(無害化、除去)処理を行ってから排ガスを排出する必要がある。このような、排ガスの除害を行うための装置の一つとして、燃焼式除害装置が知られている。
【0003】
この燃焼式除害装置は、燃焼筒内に導入された排ガス中に含まれる各種有害成分を、メインバーナーの火炎によって高温に加熱された燃焼筒内で燃焼させたり、熱分解させたりして除害処理を行うもので、例えば、特開平10−110926号公報等に各種形状のものが開示されている。
【0004】
【発明が解決しようとする課題】
このような燃焼除害装置では、燃焼筒内に導入された排ガス、即ち被処理ガスは、燃焼筒内の高温雰囲気部分を通過することによって無害化される。通常、燃焼除害効率は、燃焼筒内を通過するガスの流速や滞留時間に反比例し、被処理ガスの流量が増大するのに伴い、被処理ガスを効率よく燃焼除害することが困難となってくる。したがって、所望の燃焼除害効率を得るためには、燃焼筒を大型化したり、燃焼筒内の温度をより高めなければならなくなり、スペース的な問題や燃料等の経済的な問題が発生することになる。
【0005】
そこで本発明は、燃焼筒内での被処理ガスの滞留時間を引き延ばすことにより、燃焼除害効率を向上させることができ、省スペースや運転コストの低減を図ることができる燃焼除害装置を提供することを目的としている。
【0006】
【課題を解決するための手段】
上記目的を達成するため、本発明の燃焼除害装置は、バーナーを備えた燃焼筒内に有害成分を含む被処理ガスを導入し、該燃焼筒内で前記有害成分を燃焼処理又は加熱処理することによって有害成分の除害処理を行う燃焼除害装置において、燃焼筒内に被処理ガスを導入する被処理ガス導入ノズルの燃焼筒内開口部に、該被処理ガス導入ノズルから燃焼筒内に導入される被処理ガスを燃焼筒軸線方向とは異なる方向にガイドするための整流板を設けたことを特徴としている。
【0007】
【発明の実施の形態】
図1乃至図3は、本発明の燃焼除害装置の一形態例を示すもので、図1は一部断面正面図、図2は図3のII−II線断面図、図3は整流板を設けた蓋体の底面図である。
【0008】
まず、本形態例に示す燃焼除害装置は、上端に蓋体11を有し、下端が冷却筒12内に連通する燃焼筒13と、前記蓋体11に取付けられて燃焼筒13内に被処理ガス(例えば、半導体製造装置やLCDの製造装置から排出される排ガス)を導入する被処理ガス導入ノズル14と、前記燃焼筒13内で被処理ガスを燃焼及び/又は熱分解するための火炎を形成するメインバーナー15とを備えている。なお、燃焼筒13に通常設置されているパイロットバーナーや温度測定手段等の付帯機器の図示は省略する。
【0009】
前記メインバーナー15は、内周面がV字状の周溝に形成された環状体であって、該V字状の周溝を形成する一方の面に燃料ガス供給管16から供給される燃料ガスを噴出する燃料ガス噴出ノズル16aを、他方の面に支燃性ガス供給管17から供給される支燃性ガスを噴出する支燃性ガス噴出ノズル17aをそれぞれ多数個ずつ開口させたものであって、両噴出ノズル16a,17aのノズル軸は、該バーナー15の中心方向に向けられるとともに、燃焼筒13内で交差するように設定されている。
【0010】
なお、燃料ガスとしては、LPGのような炭化水素や、水素ガスが用いられ、支燃性ガスとしては、空気、空気と酸素ガスとの混合ガス、あるいは、酸素ガスのいずれかが用いられる。このようなメインバーナー15からは、燃焼筒13内を径方向に横切る平面状の火炎が形成され、燃焼筒内を下方に向かって流れる被処理ガスが必ず火炎を横切る状態となる。
【0011】
前記蓋体11には、被処理ガス導入ノズル14の燃焼筒内開口部となるガス導入口18が、各被処理ガス導入ノズル14に対応するように設けられており、該ガス導入口18の下方に、被処理ガスの流れを制御するための整流板19がそれぞれ設けられている。
【0012】
この整流板19は、被処理ガス導入ノズル14から燃焼筒13内に導入される被処理ガスを燃焼筒軸線方向とは異なる方向にガイドするためのものであって、このような整流板19を設けることにより、燃焼筒13内における被処理ガスの流れ方向や流速を制御することができ、燃焼筒13内に流入した被処理ガスが燃焼筒13内を瞬時に通り抜けることを抑制できる。すなわち、燃焼筒13内における高温雰囲気部分での被処理ガスの滞留時間を延長することが可能となり、被処理ガス中の有害成分の燃焼除害効率を高めることができる。
【0013】
整流板19の形状や設置状態は、燃焼筒13の形状、メインバーナー15の構成、ガス導入口18の大きさ、被処理ガスの流入量、その他の条件によって適宜設定することが可能であり、例えば、本形態例に示すように、ガス導入口18から燃焼筒13内に流入した被処理ガスが燃焼筒13内で旋回流を形成するようにしたり、複数のガス導入口18を備えている場合は、燃焼筒13内に流入する被処理ガス同士を衝突させたりすることにより、被処理ガスが燃焼筒軸線方向に素通りしてしまうような状態を回避できる。また、整流板19として多孔板を用いたり、格子状や網状のものを使用することもでき、一つのガス導入口18に対して複数の整流板を組み合わせることもできる。
【0014】
なお、燃焼筒13、メインバーナー15、冷却筒12等は、従来からの一般的な燃焼除害装置と同様に構成することが可能であり、被処理ガス導入ノズル14は1個のみであってもよい。
【0015】
【実施例】
蓋体11に設けた4個の口径5cmのガス導入口18の下方に、図2,図3に示すように、10cm×15cmの金属板からなる整流板19を斜めに取り付け、ガス導入口18から燃焼筒13内に流入した被処理ガスが燃焼筒13内で旋回流を形成するようにした。また、比較として、整流板19を取り付けない蓋体を用意し、両蓋体を交換することにより、整流板19の効果を確認する実験を行った。被処理ガスには、有害成分として六フッ化エタンを含む窒素ガスを用いた。なお、整流板19の有無以外の条件は全て同一とした。
【0016】
まず、4個のガス導入口18から、合計で六フッ化エタン毎分1リットルと窒素ガス毎分600リットルとを燃焼筒13に導入した。その結果、整流板19を設けたものの燃焼除害効率は99%であったのに対し、整流板19を設けていないものの燃焼除害効率は90%であった。また、窒素ガスを毎分800リットルに増量した場合、整流板19を設けたものの燃焼除害効率は90%となったのに対し、整流板19を設けていないものの燃焼除害効率は70%となった。
【0017】
【発明の効果】
以上説明したように、本発明の燃焼除害装置によれば、燃焼筒内での被処理ガスの滞留時間を引き延ばすことができるので、燃焼除害効率を向上させることができる。したがって、装置の小型化が図れるとともに、燃焼筒内の温度を低くすることができるので、燃料等に要する運転コストを低減することができる。
【図面の簡単な説明】
【図1】本発明の燃焼除害装置の一形態例を示す一部断面正面図である。
【図2】図3のII−II線断面図である。
【図3】整流板を設けた蓋体の底面図である。
【符号の説明】
11…蓋体、12…冷却筒、13…燃焼筒、14…被処理ガス導入ノズル、15…メインバーナー、16…燃料ガス供給管、17…支燃性ガス供給管、18…ガス導入口、19…整流板
[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention relates to a combustion abatement apparatus, and more specifically, harmful substances such as silane, ammonia, nitrous oxide, and various other special material gases used in a semiconductor manufacturing process and a liquid crystal manufacturing process, and global warming. Exhaust gas containing methane tetrafluoride, ethane hexafluoride, and nitrogen trifluoride having both properties, which have an adverse effect on the environment, is introduced into a combustion cylinder equipped with a burner, and the high temperature generated by the burner The present invention relates to a combustion abatement apparatus that performs such abatement treatment or removal treatment by burning or heating harmful components in an atmosphere.
[0002]
[Prior art]
Harmful gases such as toxic gas, corrosive gas, flammable gas, non-flammable gas and flammable gas which adversely affect the global environment are contained in exhaust gas discharged from semiconductor manufacturing processes such as semiconductor manufacturing equipment and LCD manufacturing equipment. Since the components are contained, it is necessary to perform the detoxification (detoxification, removal) treatment of these harmful components before discharging the exhaust gas. As one of the devices for removing such exhaust gas, a combustion type removing device is known.
[0003]
This combustion type abatement system removes various harmful components contained in the exhaust gas introduced into the combustion cylinder by burning or pyrolyzing them in a combustion cylinder heated to a high temperature by the flame of the main burner. For example, Japanese Patent Application Laid-Open No. H10-110926 discloses various shapes.
[0004]
[Problems to be solved by the invention]
In such a combustion abatement apparatus, the exhaust gas introduced into the combustion cylinder, that is, the gas to be treated, is rendered harmless by passing through the high-temperature atmosphere portion in the combustion cylinder. Normally, the combustion abatement efficiency is inversely proportional to the flow velocity and residence time of the gas passing through the combustion cylinder, and it is difficult to efficiently burn and abate the gas to be treated as the flow rate of the gas to be treated increases. It is becoming. Therefore, in order to obtain the desired combustion abatement efficiency, it is necessary to increase the size of the combustion cylinder or raise the temperature inside the combustion cylinder, which causes a space problem and an economic problem such as fuel. become.
[0005]
Therefore, the present invention provides a combustion abatement apparatus that can improve the combustion abatement efficiency by extending the residence time of a gas to be treated in a combustion cylinder, thereby saving space and reducing operating costs. It is intended to be.
[0006]
[Means for Solving the Problems]
In order to achieve the above object, the combustion abatement apparatus of the present invention introduces a gas to be treated containing a harmful component into a combustion cylinder provided with a burner, and performs a combustion treatment or a heat treatment of the harmful component in the combustion cylinder. In the combustion abatement apparatus for performing abatement processing of harmful components by the above, in the opening in the combustion cylinder of the to-be-treated gas introduction nozzle for introducing the to-be-treated gas into the combustion cylinder, from the to-be-treated gas introduction nozzle into the combustion cylinder A rectifying plate is provided for guiding the gas to be introduced in a direction different from the axial direction of the combustion cylinder.
[0007]
BEST MODE FOR CARRYING OUT THE INVENTION
1 to 3 show one embodiment of the combustion abatement apparatus of the present invention. FIG. 1 is a partially sectional front view, FIG. 2 is a sectional view taken along line II-II of FIG. 3, and FIG. It is a bottom view of the lid provided with.
[0008]
First, the combustion abatement apparatus shown in the present embodiment has a lid 11 at the upper end and a lower end communicating with the inside of the cooling cylinder 12, and a combustion cylinder 13 attached to the lid 11 to cover the interior of the combustion cylinder 13. A gas introduction nozzle 14 for introducing a processing gas (for example, exhaust gas discharged from a semiconductor manufacturing apparatus or an LCD manufacturing apparatus), and a flame for burning and / or thermally decomposing the processing gas in the combustion tube 13 And a main burner 15 that forms In addition, illustration of auxiliary equipment normally installed in the combustion tube 13 such as a pilot burner and a temperature measuring unit is omitted.
[0009]
The main burner 15 is an annular body having an inner peripheral surface formed in a V-shaped peripheral groove, and the fuel supplied from the fuel gas supply pipe 16 to one surface forming the V-shaped peripheral groove. A fuel gas ejection nozzle 16a for ejecting gas and a plurality of combustion-supporting gas ejection nozzles 17a for ejecting combustion-supplying gas supplied from the combustion-supplying gas supply pipe 17 are opened on the other surface. In addition, the nozzle axes of the two ejection nozzles 16a and 17a are set to be directed toward the center of the burner 15 and to intersect in the combustion cylinder 13.
[0010]
Note that a hydrocarbon gas such as LPG or hydrogen gas is used as the fuel gas, and any of air, a mixed gas of air and oxygen gas, or oxygen gas is used as the supporting gas. From such a main burner 15, a flat flame which crosses the inside of the combustion cylinder 13 in the radial direction is formed, and the gas to be processed flowing downward in the combustion cylinder always crosses the flame.
[0011]
The cover 11 is provided with a gas inlet 18 serving as an opening in the combustion cylinder of the gas to be treated nozzle 14 so as to correspond to each gas to be treated nozzle 14. Below the rectifying plates 19 for controlling the flow of the gas to be processed are provided, respectively.
[0012]
The current plate 19 guides the gas to be treated introduced into the combustion cylinder 13 from the gas introduction nozzle 14 in a direction different from the axial direction of the combustion cylinder. With the provision, the flow direction and flow velocity of the gas to be treated in the combustion cylinder 13 can be controlled, and the gas to be treated flowing into the combustion cylinder 13 can be suppressed from instantaneously passing through the combustion cylinder 13. That is, the residence time of the gas to be treated in the high-temperature atmosphere portion in the combustion tube 13 can be extended, and the efficiency of burning and removing harmful components in the gas to be treated can be increased.
[0013]
The shape and installation state of the current plate 19 can be appropriately set according to the shape of the combustion cylinder 13, the configuration of the main burner 15, the size of the gas inlet 18, the inflow amount of the gas to be treated, and other conditions. For example, as shown in the present embodiment, the gas to be treated flowing into the combustion cylinder 13 from the gas introduction port 18 forms a swirling flow in the combustion cylinder 13 or has a plurality of gas introduction ports 18. In this case, the state in which the gas to be processed passes through in the axial direction of the combustion cylinder can be avoided by causing the gases to be processed flowing into the combustion cylinder 13 to collide with each other. In addition, a perforated plate, a grid-like or mesh-like plate can be used as the current plate 19, and a plurality of current plates can be combined with one gas inlet 18.
[0014]
Note that the combustion cylinder 13, the main burner 15, the cooling cylinder 12, and the like can be configured in the same manner as a conventional general combustion abatement apparatus, and there is only one gas introduction nozzle 14 to be treated. Is also good.
[0015]
【Example】
Below the four gas inlets 18 having a diameter of 5 cm provided on the lid 11, as shown in FIGS. 2 and 3, a straightening plate 19 made of a metal plate of 10 cm × 15 cm is obliquely attached. The gas to be treated, which has flowed into the combustion cylinder 13 from above, forms a swirling flow in the combustion cylinder 13. Further, as a comparison, an experiment was conducted in which a lid without the rectifying plate 19 was prepared, and the effect of the rectifying plate 19 was confirmed by exchanging both lids. As the gas to be treated, a nitrogen gas containing ethane hexafluoride as a harmful component was used. The conditions other than the presence or absence of the current plate 19 were all the same.
[0016]
First, a total of 1 liter of ethane hexafluoride per minute and 600 liters of nitrogen gas per minute were introduced into the combustion cylinder 13 from the four gas inlets 18. As a result, the combustion abatement efficiency was 99% when the current plate 19 was provided, whereas the combustion abatement efficiency was 90% when the current plate 19 was not provided. When the nitrogen gas was increased to 800 liters per minute, the combustion abatement efficiency was 90% with the straightening plate 19 provided, whereas the combustion abatement efficiency was 70% without the straightening plate 19. It became.
[0017]
【The invention's effect】
As described above, according to the combustion abatement apparatus of the present invention, the residence time of the gas to be treated in the combustion cylinder can be extended, so that the combustion abatement efficiency can be improved. Therefore, the size of the apparatus can be reduced, and the temperature in the combustion cylinder can be lowered, so that the operating cost required for fuel and the like can be reduced.
[Brief description of the drawings]
FIG. 1 is a partial cross-sectional front view showing one embodiment of a combustion abatement apparatus of the present invention.
FIG. 2 is a sectional view taken along line II-II of FIG.
FIG. 3 is a bottom view of a lid provided with a current plate.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 11 ... Lid, 12 ... Cooling cylinder, 13 ... Combustion cylinder, 14 ... Target gas introduction nozzle, 15 ... Main burner, 16 ... Fuel gas supply pipe, 17 ... Combustible gas supply pipe, 18 ... Gas introduction port, 19 ... Rectifier plate

Claims (1)

バーナーを備えた燃焼筒内に有害成分を含む被処理ガスを導入し、該燃焼筒内で前記有害成分を燃焼処理又は加熱処理することによって有害成分の除害処理を行う燃焼除害装置において、燃焼筒内に被処理ガスを導入する被処理ガス導入ノズルの燃焼筒内開口部に、該被処理ガス導入ノズルから燃焼筒内に導入される被処理ガスを燃焼筒軸線方向とは異なる方向にガイドするための整流板を設けたことを特徴とする燃焼除害装置。In the combustion abatement apparatus for introducing a gas to be treated containing a harmful component into a combustion cylinder provided with a burner, and performing a harmful component elimination process by burning or heating the harmful component in the combustion cylinder, The gas to be treated introduced into the combustion cylinder from the gas introduction nozzle to be treated is introduced into the combustion cylinder at the opening inside the combustion cylinder of the gas introduction nozzle for introducing the gas to be treated into the combustion cylinder in a direction different from the axial direction of the combustion cylinder. A combustion abatement apparatus characterized in that a straightening plate for guiding is provided.
JP2002215025A 2002-07-24 2002-07-24 Combustion detoxifying device Pending JP2004053219A (en)

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006175317A (en) * 2004-12-21 2006-07-06 Rohm Co Ltd Treatment apparatus of exhaust gas from semiconductor manufacturing process
WO2014109152A1 (en) * 2013-01-11 2014-07-17 エドワーズ株式会社 Inlet nozzle and detoxification device
JP2020201030A (en) * 2017-07-07 2020-12-17 鑑鋒國際股▲ふん▼有限公司Siw Engineering Pte.,Ltd. Device and system for controlling decomposition/oxidation of gaseous pollution

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006175317A (en) * 2004-12-21 2006-07-06 Rohm Co Ltd Treatment apparatus of exhaust gas from semiconductor manufacturing process
JP4594065B2 (en) * 2004-12-21 2010-12-08 ローム株式会社 Apparatus and method for treating fluorine compound contained in exhaust gas from semiconductor manufacturing process
WO2014109152A1 (en) * 2013-01-11 2014-07-17 エドワーズ株式会社 Inlet nozzle and detoxification device
JP2020201030A (en) * 2017-07-07 2020-12-17 鑑鋒國際股▲ふん▼有限公司Siw Engineering Pte.,Ltd. Device and system for controlling decomposition/oxidation of gaseous pollution
JP6992100B2 (en) 2017-07-07 2022-01-13 鑑鋒國際股▲ふん▼有限公司 Equipment and systems that control the decomposition and oxidation of gaseous pollutants

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