JP2003503598A - 銅箔の製造法 - Google Patents

銅箔の製造法

Info

Publication number
JP2003503598A
JP2003503598A JP2001506304A JP2001506304A JP2003503598A JP 2003503598 A JP2003503598 A JP 2003503598A JP 2001506304 A JP2001506304 A JP 2001506304A JP 2001506304 A JP2001506304 A JP 2001506304A JP 2003503598 A JP2003503598 A JP 2003503598A
Authority
JP
Japan
Prior art keywords
oxide
coating layer
coating
metal
valve metal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001506304A
Other languages
English (en)
Japanese (ja)
Other versions
JP2003503598A5 (https=
Inventor
ハーディー，ケネス・エル
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eltech Systems Corp
Original Assignee
Eltech Systems Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eltech Systems Corp filed Critical Eltech Systems Corp
Publication of JP2003503598A publication Critical patent/JP2003503598A/ja
Publication of JP2003503598A5 publication Critical patent/JP2003503598A5/ja
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F13/00—Inhibiting corrosion of metals by anodic or cathodic protection
    • C23F13/02—Inhibiting corrosion of metals by anodic or cathodic protection cathodic; Selection of conditions, parameters or procedures for cathodic protection, e.g. of electrical conditions
    • C23F13/06—Constructional parts, or assemblies of cathodic-protection apparatus
    • C23F13/08—Electrodes specially adapted for inhibiting corrosion by cathodic protection; Manufacture thereof; Conducting electric current thereto
    • C23F13/12—Electrodes characterised by the material
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
    • C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
    • C25B11/091—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
    • C25C7/00—Constructional parts, or assemblies thereof, of cells; Servicing or operating of cells
    • C25C7/02—Electrodes; Connections thereof
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/10—Electrodes, e.g. composition, counter electrode

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Mechanical Engineering (AREA)
  • Electrodes For Compound Or Non-Metal Manufacture (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
JP2001506304A 1999-06-28 2000-06-23 銅箔の製造法 Pending JP2003503598A (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US14129999P 1999-06-28 1999-06-28
US60/141,299 1999-06-28
US09/599,339 US6527939B1 (en) 1999-06-28 2000-06-22 Method of producing copper foil with an anode having multiple coating layers
US09/599,339 2000-06-22
PCT/US2000/017403 WO2001000905A1 (en) 1999-06-28 2000-06-23 Method of producing copper foil

Publications (2)

Publication Number Publication Date
JP2003503598A true JP2003503598A (ja) 2003-01-28
JP2003503598A5 JP2003503598A5 (https=) 2012-05-17

Family

ID=26838971

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001506304A Pending JP2003503598A (ja) 1999-06-28 2000-06-23 銅箔の製造法

Country Status (4)

Country Link
US (1) US6527939B1 (https=)
JP (1) JP2003503598A (https=)
TW (1) TWI224632B (https=)
WO (1) WO2001000905A1 (https=)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014526608A (ja) * 2011-12-26 2014-10-06 ペルメレック電極株式会社 酸素発生用陽極及びその製造方法
JP2014526609A (ja) * 2011-12-26 2014-10-06 ペルメレック電極株式会社 酸素発生用陽極及びその製造方法
JP2014530292A (ja) * 2011-12-26 2014-11-17 ペルメレック電極株式会社 耐高負荷用酸素発生用陽極及びその製造方法

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7247229B2 (en) * 1999-06-28 2007-07-24 Eltech Systems Corporation Coatings for the inhibition of undesirable oxidation in an electrochemical cell
JP3458781B2 (ja) * 1999-07-06 2003-10-20 ダイソー株式会社 金属箔の製造方法
US7258778B2 (en) * 2003-03-24 2007-08-21 Eltech Systems Corporation Electrocatalytic coating with lower platinum group metals and electrode made therefrom
EP1620582B1 (en) * 2003-05-07 2016-12-21 De Nora Tech, Inc. Smooth surface morphology anode coatings
ITMI20031542A1 (it) * 2003-07-28 2005-01-29 De Nora Elettrodi Spa Anodo per processi elettrochimici
FR2909390B1 (fr) * 2006-11-30 2009-12-11 Electro Rech Anode pour dispositif d'electrodeposition de revetements metalliques anticorrosion ou cosmetique quelconque sur une piece metallique
US8124556B2 (en) * 2008-05-24 2012-02-28 Freeport-Mcmoran Corporation Electrochemically active composition, methods of making, and uses thereof
IT1391767B1 (it) * 2008-11-12 2012-01-27 Industrie De Nora Spa Elettrodo per cella elettrolitica
US8038855B2 (en) * 2009-04-29 2011-10-18 Freeport-Mcmoran Corporation Anode structure for copper electrowinning
TWI490371B (zh) * 2009-07-28 2015-07-01 Industrie De Nora Spa 電解應用上的電極及其製法以及在電極表面上陽極釋氧之電解法和電冶法
TWI433964B (zh) 2010-10-08 2014-04-11 Water Star Inc 複數層之混合金屬氧化物電極及其製法
ITMI20110089A1 (it) * 2011-01-26 2012-07-27 Industrie De Nora Spa Elettrodo per evoluzione di ossigeno in processi elettrochimici industriali
EP2700119A1 (en) * 2011-04-20 2014-02-26 Topsøe Fuel Cell A/S Process for surface conditioning of a plate or sheet of stainless steel and application of a layer onto the surface, interconnect plate made by the process and use of the interconnect plate in fuel cell stacks
WO2013018773A1 (ja) * 2011-07-29 2013-02-07 古河電気工業株式会社 電解銅合金箔、その製造方法、それの製造に用いる電解液、それを用いた二次電池用負極集電体、二次電池及びその電極
CN102515315A (zh) * 2011-12-30 2012-06-27 南京大学 一种阳极电极材料、其制备方法及在电化学氧化处理含酚废水中的应用和工作方法
CN109534457B (zh) * 2014-07-10 2021-12-14 加州理工学院 电解电极
CN106521564A (zh) * 2016-10-27 2017-03-22 建滔（连州）铜箔有限公司 一种用于生产低轮廓电解铜箔的复合添加剂及其沉积工艺
CN108017120A (zh) * 2017-12-05 2018-05-11 淮南师范学院 一种采用新型阳极电催化氧化处理苯酚有机废水的方法
IT201800006544A1 (it) * 2018-06-21 2019-12-21 Anodo per evoluzione elettrolitica di cloro
US11668017B2 (en) 2018-07-30 2023-06-06 Water Star, Inc. Current reversal tolerant multilayer material, method of making the same, use as an electrode, and use in electrochemical processes
IT201800007835A1 (it) 2018-08-03 2020-02-03 Industrie De Nora Spa Elettrodo per la galvanotecnica o l’elettrodeposizione di un metallo
CN114450252A (zh) 2019-06-25 2022-05-06 加州理工学院 用于废水处理的反应性电化学膜
US12545605B2 (en) 2020-12-14 2026-02-10 California Institute Of Technology “Super-bubble” electro-photo hybrid catalytic system for advanced treatment of organic wastewater

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62161975A (ja) * 1986-10-01 1987-07-17 ペルメレック電極株式会社 電解槽に使用する電極およびその製造方法
JPH01312096A (ja) * 1988-06-13 1989-12-15 Kamioka Kogyo Kk 電解用電極及びその製造方法
JPH06330368A (ja) * 1993-05-20 1994-11-29 Permelec Electrode Ltd 電解用電極
JPH0860391A (ja) * 1994-08-22 1996-03-05 Permelec Electrode Ltd 不溶性金属陽極
JPH10330998A (ja) * 1997-06-03 1998-12-15 Permelec Electrode Ltd 電気めっき方法

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US3751296A (en) 1967-02-10 1973-08-07 Chemnor Ag Electrode and coating therefor
US3840443A (en) 1967-02-10 1974-10-08 Chemnor Corp Method of making an electrode having a coating comprising a platinum metal oxide
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US3933616A (en) 1967-02-10 1976-01-20 Chemnor Corporation Coating of protected electrocatalytic material on an electrode
US3778307A (en) 1967-02-10 1973-12-11 Chemnor Corp Electrode and coating therefor
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US3711385A (en) 1970-09-25 1973-01-16 Chemnor Corp Electrode having platinum metal oxide coating thereon,and method of use thereof
DE2100652A1 (de) 1971-01-08 1972-07-20 Metallgesellschaft Ag Elektrode für die Chloralkalielektrolyse und Verfahren zu ihrer Herstellung
US3926751A (en) 1972-05-18 1975-12-16 Electronor Corp Method of electrowinning metals
IT959730B (it) 1972-05-18 1973-11-10 Oronzio De Nura Impianti Elett Anodo per sviluppo di ossigeno
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US3882002A (en) 1974-08-02 1975-05-06 Hooker Chemicals Plastics Corp Anode for electrolytic processes
SE425412B (sv) 1974-10-29 1982-09-27 Diamond Shamrock Techn Forfarande for framstellning av en elektrod lemplig for anvendning i elektrolytiska forfaranden
US4005003A (en) 1975-04-15 1977-01-25 Olin Corporation Multi-component metal electrode
US3950240A (en) 1975-05-05 1976-04-13 Hooker Chemicals & Plastics Corporation Anode for electrolytic processes
CA1088026A (en) 1977-11-09 1980-10-21 Noranda Mines Limited Stable electrode for electrochemical applications
JPS55500123A (https=) 1978-03-28 1980-03-06
CA1225066A (en) 1980-08-18 1987-08-04 Jean M. Hinden Electrode with surface film of oxide of valve metal incorporating platinum group metal or oxide
US4437948A (en) 1981-10-16 1984-03-20 Bell Telephone Laboratories, Incorporated Copper plating procedure
EP0097154A1 (en) 1981-12-28 1984-01-04 Diamond Shamrock Corporation Electrocatalytic electrode
JPS58171589A (ja) 1982-03-31 1983-10-08 Ishifuku Kinzoku Kogyo Kk 電解用電極及びその製造方法
US4469564A (en) 1982-08-11 1984-09-04 At&T Bell Laboratories Copper electroplating process
US5324407A (en) 1989-06-30 1994-06-28 Eltech Systems Corporation Substrate of improved plasma sprayed surface morphology and its use as an electrode in an electrolytic cell
US5262040A (en) * 1989-06-30 1993-11-16 Eltech Systems Corporation Method of using a metal substrate of improved surface morphology
US5167788A (en) 1989-06-30 1992-12-01 Eltech Systems Corporation Metal substrate of improved surface morphology
US5207889A (en) 1991-01-16 1993-05-04 Circuit Foil Usa, Inc. Method of producing treated copper foil, products thereof and electrolyte useful in such method
NL9101753A (nl) 1991-10-21 1993-05-17 Magneto Chemie Bv Anodes met verlengde levensduur en werkwijzen voor hun vervaardiging.
JP2963266B2 (ja) 1992-01-28 1999-10-18 ペルメレック電極株式会社 不溶性電極構造体
JP3124847B2 (ja) 1992-11-06 2001-01-15 ペルメレック電極株式会社 金属箔の電解による製造方法
JP3124848B2 (ja) * 1992-11-11 2001-01-15 ペルメレック電極株式会社 金属箔の電解による製造方法
US5783050A (en) 1995-05-04 1998-07-21 Eltech Systems Corporation Electrode for electrochemical cell
JP3422885B2 (ja) * 1995-11-01 2003-06-30 ペルメレック電極株式会社 電極基体
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Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62161975A (ja) * 1986-10-01 1987-07-17 ペルメレック電極株式会社 電解槽に使用する電極およびその製造方法
JPH01312096A (ja) * 1988-06-13 1989-12-15 Kamioka Kogyo Kk 電解用電極及びその製造方法
JPH06330368A (ja) * 1993-05-20 1994-11-29 Permelec Electrode Ltd 電解用電極
JPH0860391A (ja) * 1994-08-22 1996-03-05 Permelec Electrode Ltd 不溶性金属陽極
JPH10330998A (ja) * 1997-06-03 1998-12-15 Permelec Electrode Ltd 電気めっき方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014526608A (ja) * 2011-12-26 2014-10-06 ペルメレック電極株式会社 酸素発生用陽極及びその製造方法
JP2014526609A (ja) * 2011-12-26 2014-10-06 ペルメレック電極株式会社 酸素発生用陽極及びその製造方法
JP2014530292A (ja) * 2011-12-26 2014-11-17 ペルメレック電極株式会社 耐高負荷用酸素発生用陽極及びその製造方法

Also Published As

Publication number Publication date
WO2001000905A1 (en) 2001-01-04
US6527939B1 (en) 2003-03-04
TWI224632B (en) 2004-12-01

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