JP2003338084A - Recording medium - Google Patents

Recording medium

Info

Publication number
JP2003338084A
JP2003338084A JP2002146853A JP2002146853A JP2003338084A JP 2003338084 A JP2003338084 A JP 2003338084A JP 2002146853 A JP2002146853 A JP 2002146853A JP 2002146853 A JP2002146853 A JP 2002146853A JP 2003338084 A JP2003338084 A JP 2003338084A
Authority
JP
Japan
Prior art keywords
film
recording medium
layer
substrate
moisture
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2002146853A
Other languages
Japanese (ja)
Inventor
Yasumasa Iwamura
康正 岩村
Mineo Moribe
峰生 守部
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP2002146853A priority Critical patent/JP2003338084A/en
Publication of JP2003338084A publication Critical patent/JP2003338084A/en
Pending legal-status Critical Current

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  • Optical Record Carriers And Manufacture Thereof (AREA)
  • Magnetic Record Carriers (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To provide a recording medium wherein warpage due to a change in temperature and humidity is prevented and reduction of manufacturing time, reduction of manufacturing costs and enhancement of productivity can be realized. <P>SOLUTION: In the recording medium (for example, a magneto-optical disk), a recording layer 2 is formed on one surface of a substrate 1 made of polycarbonate, for example, and a moisture non-permeable film 3 and a temperature deformation preventing film 4 are successively formed on the other surface of the substrate 1. The recording layer 2 is formed by film-depositing and successively laminating a lower base layer 2d, a magnetic recording layer 2c, a reflection layer 2b and an upper base layer 2a by a sputtering method. The upper and the lower base layers 2a and 2d are made of SiN, for example, the magnetic recording layer 2c is made of TbFeCo, for example, and the reflection layer 2b is made of aluminum, for example. The moisture non-permeable film 3 is formed by film-depositing SiN, for example, by a sputtering method. SiN has light transmissivity and moisture non-permeability. The temperature deformation preventing film 4 is formed by applying a modacrylic UV curing resin, for example, by a spin coating method and then curing the resin by UV irradiation. <P>COPYRIGHT: (C)2004,JPO

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は樹脂基板を用いた記
録媒体に関し、より詳細には、環境の温湿度変化による
反りを防止すると共に、成膜の時間を短縮し、製造コス
トを低減し、生産性を向上する記録媒体(例えば、磁気
ディスク、光磁気ディスク、光ディスク等のディスク)
に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a recording medium using a resin substrate, and more specifically, it prevents warpage due to changes in temperature and humidity of the environment, shortens film formation time, and reduces manufacturing cost. Recording media that improve productivity (for example, disks such as magnetic disks, magneto-optical disks, and optical disks)
Regarding

【0002】[0002]

【従来の技術】光ディスクや磁気ディスクには樹脂基板
が用いられる。その一例として図9に従来の光磁気記録
媒体の模式的断面図を示す。従来の光磁気記録媒体(以
下、単に媒体ともいう)は、例えばポリカーボネート又
はポリアクリレート等の合成樹脂製の基板1の一面上に
記録層2及び保護コート層5がこの順に形成され、基板
1の他面上には、該基板1の損傷を防止するためにハー
ドコート層6が形成されている。記録層2は下地層2
d,磁気記録層2c,上地層2a及び反射層2bで構成
される。上地層2a及び下地層2dはそれぞれ、不透湿
性を有する無機物からなり、ハードコート層6は合成樹
脂からなる。
2. Description of the Related Art Resin substrates are used for optical disks and magnetic disks. As an example thereof, FIG. 9 shows a schematic sectional view of a conventional magneto-optical recording medium. In a conventional magneto-optical recording medium (hereinafter, also simply referred to as a medium), a recording layer 2 and a protective coating layer 5 are formed in this order on one surface of a substrate 1 made of a synthetic resin such as polycarbonate or polyacrylate. A hard coat layer 6 is formed on the other surface to prevent damage to the substrate 1. Recording layer 2 is base layer 2
d, the magnetic recording layer 2c, the upper layer 2a, and the reflective layer 2b. The upper layer 2a and the base layer 2d are each made of a moisture impermeable inorganic substance, and the hard coat layer 6 is made of a synthetic resin.

【0003】従来の媒体は、保管環境又は使用環境の温
湿度変化によって媒体に反りが生じる。温度が変化した
場合には、上地層2a又は下地層2d、及び基板1の熱
膨張係数の違いによるバイメタル効果によって、媒体が
お椀型に反る。湿度が変化した場合には、下地層2dと
接する基板1の下面では水分の出入りは生じないが、基
板1及びハードコート層6には水分の出入りが生じる。
なぜならば、基板1及びハードコート層6は合成樹脂か
らなり、合成樹脂材料は一般に吸水性及び透湿性を有す
るためである。したがって、湿度が変化した場合には、
この現象差によって媒体の内部の水分分布が一時的に不
均一となり、水分含有量の高い方が膨張するために媒体
に反りが生じる。
In the conventional medium, the medium warps due to changes in temperature and humidity of the storage environment or the use environment. When the temperature changes, the medium warps like a bowl due to the bimetal effect due to the difference in the thermal expansion coefficients of the upper layer 2a or the underlayer 2d and the substrate 1. When the humidity changes, moisture does not flow in and out on the lower surface of the substrate 1 that is in contact with the underlying layer 2d, but moisture does flow in and out of the substrate 1 and the hard coat layer 6.
This is because the substrate 1 and the hard coat layer 6 are made of synthetic resin, and the synthetic resin material generally has water absorbability and moisture permeability. Therefore, if the humidity changes,
Due to this phenomenon difference, the water distribution inside the medium becomes temporarily non-uniform, and the higher the water content expands, the more the medium warps.

【0004】媒体に極端な反りが生じる場合には、記録
再生ができなくなるという問題がある。そこで、特開2
001−216685公報には、複数層からなる記録層
とは反対側の基板面上に不透湿性の反り防止膜を設ける
ことにより、湿度及び湿度変化による反りを防止する光
磁気記録媒体が開示されている。前記反り防止膜は例え
ば、窒化シリコン,酸化シリコン,炭化シリコン等の不
透湿性の無機物からなる。温度及び湿度の両方による媒
体の反りを防止するために要する反り防止膜の厚さは、
記録層の各層の厚さと該記録層の各層のヤング率との積
が、反り防止膜の厚さと該反り防止膜のヤング率との積
に等しくなるように決定される。
When the medium is extremely warped, there is a problem that recording / reproducing cannot be performed. Therefore, Japanese Patent Laid-Open No.
Japanese Patent Application Laid-Open No. 001-216685 discloses a magneto-optical recording medium that prevents a warp due to humidity and a change in humidity by providing a moisture-impermeable warp prevention film on a surface of a substrate opposite to a recording layer formed of a plurality of layers. ing. The warp prevention film is made of a moisture impermeable inorganic material such as silicon nitride, silicon oxide, or silicon carbide. The thickness of the warpage prevention film required to prevent the warpage of the medium due to both temperature and humidity is
The product of the thickness of each layer of the recording layer and the Young's modulus of each layer of the recording layer is determined so as to be equal to the product of the thickness of the warp prevention film and the Young's modulus of the warp prevention film.

【0005】[0005]

【発明が解決しようとする課題】開示されている媒体の
反り防止膜は、150〜200nmもの厚さが必要であ
る。しかも反り防止膜は無機物をスパッタ法にて成膜す
るため、成膜に長時間を要し、このため製造コストが高
く、生産性が非常に悪いという問題がある。
The warp prevention film of the disclosed medium requires a thickness of 150 to 200 nm. In addition, since the warp prevention film is formed by sputtering an inorganic substance, it takes a long time to form the film, which causes a problem that the manufacturing cost is high and the productivity is very poor.

【0006】本発明は斯かる事情に鑑みてなされたもの
であり、その目的とするところは、無機物からなる不透
湿膜と、有機物からなる温度変形防止膜とを設けること
により、保管環境又は使用環境において、温度及び湿度
変化が生じた場合でも反りを防止すると共に、成膜の時
間を短縮し、製造コストを低減し、しかも生産性を向上
することができる記録媒体(例えば、磁気ディスク、光
磁気ディスク、光ディスク等のディスク)を提供するこ
とにある。
The present invention has been made in view of the above circumstances, and an object thereof is to provide a moisture-impermeable film made of an inorganic material and a temperature deformation preventing film made of an organic material so that the storage environment or A recording medium capable of preventing warpage even when the temperature and humidity change in the use environment, shortening the film formation time, reducing the manufacturing cost, and improving the productivity (for example, a magnetic disk, It is to provide a disc such as a magneto-optical disc and an optical disc.

【0007】本発明の他の目的は、必要最小限の厚さの
無機物の不透湿膜膜と、成膜が容易な有機物の温度変形
防止膜とを組み合わせることにより、保管環境又は使用
環境において、温度及び湿度変化が生じた場合でも反り
を防止すると共に、成膜の時間を短縮し、製造コストを
低減し、しかも生産性を向上することができる記録媒体
(例えば、磁気ディスク、光磁気ディスク、光ディスク
等のディスク)を提供することにある。
Another object of the present invention is to combine an inorganic moisture-impermeable film having a minimum necessary thickness with an organic temperature-deformation-preventing film that is easy to form, so that it can be used in a storage environment or a use environment. A recording medium (for example, a magnetic disk, a magneto-optical disk) capable of preventing warpage even when the temperature and humidity change, shortening the film formation time, reducing the manufacturing cost, and improving the productivity. , Optical discs and the like).

【0008】[0008]

【課題を解決するための手段】第1発明に係る記録媒体
は、基板の一面上に記録層を備える記録媒体において、
前記基板の他面上に設けられた無機物からなる不透湿膜
と、前記記録層及び/又は前記不透湿膜の面上に設けら
れた有機物からなる温度変形防止膜とを備えることを特
徴とする。
A recording medium according to a first invention is a recording medium having a recording layer on one surface of a substrate,
A moisture impermeable film made of an inorganic material provided on the other surface of the substrate, and a temperature deformation preventing film made of an organic material provided on the surface of the recording layer and / or the moisture impermeable film. And

【0009】第2発明に係る記録媒体は、基板の一面上
に記録層を備える記録媒体において、前記基板の他面上
に設けられた無機物からなる2層の不透湿膜と、該2層
の不透湿膜の間に介在させた有機物からなる温度変形防
止膜とを備えることを特徴とする。
A recording medium according to a second aspect of the present invention is a recording medium having a recording layer on one surface of a substrate, wherein two moisture-impermeable membranes made of an inorganic material are provided on the other surface of the substrate, and the two layers. And a temperature deformation prevention film made of an organic substance interposed between the moisture impermeable films.

【0010】第3発明に係る記録媒体は、第1又は第2
発明に係る記録媒体において、前記不透湿膜の膜厚は1
0nm以上80nm以下であることを特徴とする。
A recording medium according to the third invention is the first or second recording medium.
In the recording medium according to the invention, the film thickness of the moisture impermeable film is 1
It is characterized by being 0 nm or more and 80 nm or less.

【0011】第4発明に係る記録媒体は、第1乃至第3
発明のいずれかに係る記録媒体において、前記温度変形
防止膜の膜厚は2μm以上8μm以下であることを特徴
とする。
The recording medium according to the fourth aspect of the present invention is the first to third aspects.
In the recording medium according to any one of the inventions, the temperature deformation prevention film has a film thickness of 2 μm or more and 8 μm or less.

【0012】第1発明による場合は、不透湿膜側から基
板への水分の出入りが生じない。したがって、湿度が変
化した場合に記録媒体に反りが生じない。更に、温度変
形防止膜が存在することにより、温度が変化した場合で
も記録媒体に反りが生じない。しかも、前記温度変形防
止膜は成膜が容易な有機物からなるため、成膜時間の短
縮、製造コストの低減及び生産性の向上を実現できる。
In the case of the first invention, moisture does not flow into and out of the substrate from the moisture impermeable film side. Therefore, the recording medium does not warp when the humidity changes. Further, due to the presence of the temperature deformation prevention film, the recording medium does not warp even when the temperature changes. Moreover, since the temperature deformation prevention film is made of an organic material that can be easily formed, it is possible to shorten the film forming time, reduce the manufacturing cost, and improve the productivity.

【0013】第2発明による場合は、2層の不透湿膜側
から基板への水分の出入りが生じない。したがって、湿
度が変化した場合に記録媒体に反りが生じない。更に、
温度変形防止膜が前記2層の不透湿膜の間に介在されて
いるため、温度が変化した場合でも記録媒体に反りが生
じない。しかも、前記温度変形防止膜は成膜が容易な有
機物からなるため、成膜時間の短縮、製造コストの低減
及び生産性の向上を実現できる。
According to the second aspect of the invention, moisture does not flow into and out of the substrate from the two layers of the moisture impermeable film. Therefore, the recording medium does not warp when the humidity changes. Furthermore,
Since the temperature deformation prevention film is interposed between the two moisture impermeable films, the recording medium does not warp even when the temperature changes. Moreover, since the temperature deformation prevention film is made of an organic material that can be easily formed, it is possible to shorten the film forming time, reduce the manufacturing cost, and improve the productivity.

【0014】第3発明による場合は、不透湿膜の厚さの
下限値は10nmとする。10nm未満である場合は、
不透湿効果が得られない。一方、不透湿膜の厚さの上限
値は80nmとする。80nmを越えると、効果が同じ
であるが実用性を損なう程度にまで成膜に長時間を要す
る。
In the case of the third invention, the lower limit of the thickness of the moisture impermeable film is set to 10 nm. If it is less than 10 nm,
Impervious effect cannot be obtained. On the other hand, the upper limit of the thickness of the moisture impermeable film is 80 nm. If it exceeds 80 nm, the effect is the same, but it takes a long time to form the film to the extent of impairing the practicality.

【0015】これにより、従来の光磁気記録媒体(特開
2001−216685公報参照)の無機物からなる反
り防止膜よりも、同様の無機物からなる不透湿膜の厚さ
を1/20〜2/5程度と極めて薄くすることが可能に
なるため、成膜にかかる時間を大幅に減少することがで
きる。したがって、製造コストが低減し、生産性も向上
する。
As a result, the thickness of the moisture impermeable film made of the same inorganic material as that of the conventional magneto-optical recording medium (see Japanese Patent Laid-Open No. 2001-216685) is 1/20 to 2 / thickness as compared with the warp prevention film made of the same inorganic material. Since it is possible to make the thickness as thin as about 5, the time required for film formation can be significantly reduced. Therefore, the manufacturing cost is reduced and the productivity is improved.

【0016】第4発明による場合は、温度変形防止膜の
厚さの下限値は2μmとする。2μm未満である場合
は、温度変形防止効果が得られない。一方、温度変形防
止膜の厚さの上限値は8μmとする。8μmを越える
と、温度変形防止効果が得られないだけでなく、温度変
形防止膜は吸水性及び吸湿性を有する有機物からなるた
め、吸水膨張する虞がある。
In the case of the fourth invention, the lower limit of the thickness of the temperature deformation preventing film is 2 μm. If it is less than 2 μm, the effect of preventing temperature deformation cannot be obtained. On the other hand, the upper limit of the thickness of the temperature deformation prevention film is 8 μm. If the thickness exceeds 8 μm, not only the effect of preventing temperature deformation is not obtained, but also the temperature deformation preventing film is made of an organic material having water absorbability and hygroscopicity, and therefore there is a risk of water absorption and expansion.

【0017】成膜が容易な有機物からなる温度変形防止
膜を設けるため、温度変化による反りをも防止するため
に厚膜を要する従来の光磁気記録媒体の無機物からなる
反り防止膜の成膜に比べ、成膜にかかる時間を大幅に減
少することができる。そのため、製造コストが低減し、
生産性も向上する。
Since a temperature deformation prevention film made of an organic material that is easy to form is provided, a warp prevention film made of an inorganic material of a conventional magneto-optical recording medium that requires a thick film to prevent warpage due to temperature change can be formed. In comparison, the time required for film formation can be significantly reduced. Therefore, the manufacturing cost is reduced,
Productivity is also improved.

【0018】[0018]

【発明の実施の形態】以下に、本発明をその実施の形態
を示す図面に基づいて詳細に説明する。 (実施の形態1)図1に本発明の実施の形態1に係る光
磁気記録媒体(例えば光磁気ディスク)の模式的断面図
を示す。図において、1は基板を、2は記録層を、3は
不透湿膜を、4は温度変形防止膜を、それぞれ示し、基
板1の一面上に記録層2が形成され、基板1の他面上に
不透湿膜3及び温度変形防止膜4が順次形成されてい
る。
BEST MODE FOR CARRYING OUT THE INVENTION The present invention will be described in detail below with reference to the drawings showing the embodiments thereof. (Embodiment 1) FIG. 1 shows a schematic cross-sectional view of a magneto-optical recording medium (for example, a magneto-optical disk) according to Embodiment 1 of the present invention. In the figure, 1 is a substrate, 2 is a recording layer, 3 is a moisture impermeable film, and 4 is a temperature deformation preventing film. The recording layer 2 is formed on one surface of the substrate 1 The moisture impermeable film 3 and the temperature deformation preventing film 4 are sequentially formed on the surface.

【0019】基板1は、例えばポリカーボネートからな
る。記録層2は、下地層2d,磁気記録層2c,反射層
2b及び上地層2aをそれぞれスパッタ法にて成膜し順
次積層する。上地層2a及び下地層2dは、例えばSi
Nからなり、磁気記録層2cは、例えばTbFeCoか
らなり、反射層2bは、例えばアルミニウムからなる。
不透湿膜3も例えばSiNをスパッタ法により成膜す
る。SiNは光透過性及び不透湿性を有する。温度変形
防止膜4は、例えば変性アクリル紫外線硬化樹脂をスピ
ンコート法により塗布し、その後紫外線照射により硬化
させる。該アクリル系紫外線硬化樹脂の組成は、従来の
光磁気記録媒体の基板の損傷防止の目的で形成されるハ
ードコート層の組成と同様である。
The substrate 1 is made of polycarbonate, for example. As the recording layer 2, a base layer 2d, a magnetic recording layer 2c, a reflective layer 2b, and an upper layer 2a are formed by a sputtering method and are sequentially laminated. The upper layer 2a and the base layer 2d are made of, for example, Si.
The magnetic recording layer 2c is made of, for example, TbFeCo, and the reflective layer 2b is made of, for example, aluminum.
The moisture impermeable film 3 is also formed of, for example, SiN by a sputtering method. SiN has optical transparency and moisture impermeability. The temperature deformation prevention film 4 is formed by applying, for example, a modified acrylic ultraviolet curable resin by a spin coating method and then curing it by irradiating with ultraviolet rays. The composition of the acrylic ultraviolet curable resin is the same as the composition of the hard coat layer formed for the purpose of preventing damage to the substrate of the conventional magneto-optical recording medium.

【0020】本発明に係る記録媒体(例えば、磁気ディ
スク、光磁気ディスク、光ディスク等のディスク)にお
ける不透湿膜及び温度変形防止膜の膜厚はそれぞれ、好
ましくは10〜80nm、2〜8μmの範囲内とする。
以下に、その理由について説明する。
In the recording medium according to the present invention (for example, a disk such as a magnetic disk, a magneto-optical disk, an optical disk, etc.), the moisture impermeable film and the temperature deformation preventing film preferably have thicknesses of 10 to 80 nm and 2 to 8 μm, respectively. Within the range.
The reason will be described below.

【0021】図2は光磁気記録媒体(例えば光磁気ディ
スク)の反りの測定状況を示す模式的断面図である。図
において、10は光磁気記録媒体(例えば光磁気ディス
ク)を、20は光磁気記録媒体10の反りの変位を測定
する変位測定センサを、30は光磁気記録媒体10を押
さえる押さえ部を、それぞれ示す。また、A−Aは光磁
気記録媒体10の中心を示し、r1は光磁気記録媒体1
0の半径(43mm)を、r2はA−Aから変位測定セ
ンサ20の中心部までの測定半径(約38mm)を、r
3はA−Aから押さえ部30の外径までの押さえ半径
(15mm)を、それぞれ示す。光磁気記録媒体10の
反りは、光磁気記録媒体10の両面の中央部を押さえ部
30にて挟持し、温度又は湿度を変化させた場合に測定
半径r2に生じる変位を、変位センサ20にて測定す
る。なお、光磁気記録媒体10の反りについては、光磁
気記録媒体10が上に反ったときにプラスの反りとす
る。
FIG. 2 is a schematic cross-sectional view showing how the warp of a magneto-optical recording medium (for example, a magneto-optical disk) is measured. In the figure, 10 is a magneto-optical recording medium (for example, a magneto-optical disk), 20 is a displacement measurement sensor for measuring the displacement of the warp of the magneto-optical recording medium 10, and 30 is a holding portion for holding the magneto-optical recording medium 10. Show. A-A indicates the center of the magneto-optical recording medium 10, and r1 indicates the magneto-optical recording medium 1.
0 radius (43 mm), r2 is the measurement radius (about 38 mm) from AA to the center of the displacement measuring sensor 20,
3 shows the pressing radius (15 mm) from AA to the outer diameter of the pressing part 30. With respect to the warp of the magneto-optical recording medium 10, the displacement sensor 20 measures the displacement generated at the measurement radius r2 when the central portions of both surfaces of the magneto-optical recording medium 10 are sandwiched between the pressing portions 30 and the temperature or humidity is changed. taking measurement. The warp of the magneto-optical recording medium 10 is a positive warp when the magneto-optical recording medium 10 warps upward.

【0022】図3は温度変形防止膜を形成せずに不透湿
効果の測定に用いた光磁気記録媒体(例えば光磁気ディ
スク)の模式的断面図である。不透湿膜3にはSiN及
びSiOの2種類の試体を用い、基板1、上地層2
a、反射層2b、磁気記録層2c及び下地層2dの構成
材料は図1の光磁気記録媒体(以下、単に媒体ともい
う)と同様とした。図4は図3の不透湿膜の膜厚と湿度
変形係数との相関を示すグラフである。図中の湿度変形
係数は、不透湿膜3の膜厚を種々に変更し、相対湿度を
10%(以下、10%RHという)変化させた場合に、
媒体に生じた反りの変位を示し、式(1)により求め
た。
FIG. 3 is a schematic cross-sectional view of a magneto-optical recording medium (for example, a magneto-optical disk) used for measuring the moisture impermeable effect without forming a temperature deformation preventing film. For the moisture impermeable film 3, two types of samples of SiN and SiO 2 are used, and the substrate 1 and the upper layer 2 are used.
The constituent materials of a, the reflection layer 2b, the magnetic recording layer 2c, and the underlayer 2d were the same as those of the magneto-optical recording medium (hereinafter, also simply referred to as medium) of FIG. FIG. 4 is a graph showing the correlation between the film thickness of the moisture impermeable film of FIG. 3 and the humidity deformation coefficient. The humidity deformation coefficient in the figure is obtained by changing the film thickness of the moisture impermeable film 3 variously and changing the relative humidity by 10% (hereinafter referred to as 10% RH).
The displacement of the warp generated in the medium is shown and calculated by the equation (1).

【0023】 湿度変形係数=tan-1(x/(r2−r3))×(180/3.14)/103 ・・・(1) ただし、xは10%RHあたりの媒体の反りの変位(μ
m)である。つまり、図4の湿度変形係数は、測定半径
r2に生じる変位x(μm)を媒体全体の反りに換算し
ている。
Humidity deformation coefficient = tan −1 (x / (r2-r3)) × (180 / 3.14) / 10 3 (1) where x is the displacement of the warp of the medium per 10% RH (μ
m). That is, the humidity deformation coefficient in FIG. 4 converts the displacement x (μm) generated in the measurement radius r2 into the warp of the entire medium.

【0024】この測定時における各層の厚さは、基板1
は0.6mm、上地層2aは15nm、反射層2bは4
0nm、磁気記録層2cは100nm、そして下地層2
dは65nmである。なお、記録層2は不透湿性のSi
Nの上地層2a及び下地層2dのサンドイッチ構造であ
るため、記録層2から基板1へは水分の浸入はない。
The thickness of each layer at the time of this measurement is the substrate 1
Is 0.6 mm, the upper layer 2a is 15 nm, and the reflective layer 2b is 4
0 nm, the magnetic recording layer 2c is 100 nm, and the underlayer 2
d is 65 nm. The recording layer 2 is made of impermeable Si.
Since it has a sandwich structure of the N upper layer 2a and the underlayer 2d, moisture does not penetrate from the recording layer 2 to the substrate 1.

【0025】図4から、不透湿膜3の膜厚が20nm以
上であれば確実に湿度変形係数がゼロとなるが、実質的
に10nm以上で十分な不透湿効果が得られ、媒体の反
りを防止できることがわかる。したがって、不透湿膜3
の膜厚の下限値は10nmと決定できる。
As shown in FIG. 4, when the film thickness of the moisture impermeable film 3 is 20 nm or more, the humidity deformation coefficient surely becomes zero. It can be seen that the warp can be prevented. Therefore, the impermeable membrane 3
The lower limit of the film thickness of can be determined to be 10 nm.

【0026】次に、不透湿膜3の膜厚の上限値について
説明する。図5は図3の不透湿膜の膜厚と反射率との相
関を示すグラフである。図中の縦軸は、不透湿膜3の膜
厚を変化させて不透湿膜3側からレーザ光を照射したと
きの、基板1(ポリカーボネート)及び不透湿膜3の界
面における反射率を計算したものである。ただし、不透
湿膜3が、SiNの場合はSiNの屈折率を2.0と
し、SiOの場合はSiOの屈折率を1.5として
反射率を計算している。
Next, the upper limit of the film thickness of the moisture impermeable film 3 will be described. FIG. 5 is a graph showing the correlation between the film thickness of the moisture impermeable film of FIG. 3 and the reflectance. The vertical axis in the figure represents the reflectance at the interface between the substrate 1 (polycarbonate) and the impermeable film 3 when the film thickness of the impermeable film 3 is changed and laser light is irradiated from the impermeable film 3 side. Is calculated. However, non-moisture permeable membrane 3, when the SiN refractive index of SiN and 2.0, in the case of SiO 2 is calculated reflectivity refractive index of SiO 2 as 1.5.

【0027】図5から明らかなように、不透湿膜3の膜
厚の変化にしたがって、基板1及び不透湿膜3の反射率
は周期的に正弦曲線を描いている。これは、正弦曲線の
山の部分では、前記反射率が大きいために磁気記録層2
cに到達するレーザ光が減少することを意味する。その
ため、反射率が小さい、すなわち正弦曲線が谷になって
いる部分の膜厚を適宜選択すればよい。しかし、不透湿
膜3は無機物をスパッタリングしているため、不透湿膜
3が厚膜である場合は、成膜に非常に時間がかかり、製
造コスト及び生産性が著しく悪くなる。このため、可及
的に薄い不透湿膜3が要望される。したがって、正弦曲
線が谷を示す最も薄い膜厚を不透湿膜3の膜厚の上限値
と決定する。そうすると、SiNの場合では膜厚が0n
mであり、SiOの場合では膜厚が約60nmであ
る。しかし前述の如く、不透湿膜3は不透湿効果を得る
ためには10nm以上の厚さが必要であるので、この場
合は後者の約60nmを選択できる。ただし、20nm
程度の製造上の誤差を見込んで、不透湿膜3の膜厚の上
限値は80nmと決定できる。
As is apparent from FIG. 5, the reflectances of the substrate 1 and the moisture impermeable film 3 are periodically sinusoidal as the thickness of the moisture impermeable film 3 changes. This is because the reflectivity is large in the mountain portion of the sine curve, and therefore the magnetic recording layer 2
It means that the laser light reaching c is reduced. Therefore, the film thickness of the portion where the reflectance is small, that is, where the sine curve has a valley may be appropriately selected. However, since the moisture-impermeable film 3 is formed by sputtering an inorganic substance, when the moisture-impermeable film 3 is a thick film, it takes a very long time to form the film, and the manufacturing cost and the productivity are significantly deteriorated. For this reason, the moisture impermeable film 3 that is as thin as possible is desired. Therefore, the thinnest film thickness where the sine curve shows a valley is determined as the upper limit of the film thickness of the moisture impermeable film 3. Then, in the case of SiN, the film thickness is 0n.
In the case of SiO 2 , the film thickness is about 60 nm. However, as described above, the moisture-impermeable film 3 needs to have a thickness of 10 nm or more in order to obtain the moisture-impermeable effect, and in this case, the latter of about 60 nm can be selected. However, 20 nm
The upper limit of the film thickness of the moisture impermeable film 3 can be determined to be 80 nm in consideration of the manufacturing error.

【0028】以上により、本発明に係る記録媒体(例え
ば、磁気ディスク、光磁気ディスク、光ディスク等のデ
ィスク)の不透湿膜の膜厚は、好ましくは10nm以上
80nm以下とすることができ、より好ましくは、20
nm以上60nm以下である。
From the above, the film thickness of the impermeable film of the recording medium (for example, a disk such as a magnetic disk, a magneto-optical disk, an optical disk) according to the present invention can be preferably 10 nm or more and 80 nm or less. Preferably 20
It is 60 nm or more and 60 nm or less.

【0029】不透湿膜3は磁性金属材料に比べて成膜速
度の遅い無機物からなるため、前述の如く不透湿効果を
得る不透湿膜3の膜厚を、従来の媒体の無機物からなる
反り防止膜よりも膜厚を1/20〜2/5程度と極めて
薄くすることにより、成膜時間を大幅に減少することが
できる。そのため、製造コストが低減し、生産性も向上
する。しかしながら、不透湿膜3を薄くすると、温度が
変化した場合に媒体に反りが生じてしまう。したがっ
て、図1のように不透湿膜3の面上に、更に温度変形防
止膜4を設けることにより、温度変化による媒体の反り
を防止する必要がある。以下に、その説明を示す。
Since the moisture-impermeable film 3 is made of an inorganic material having a slow film formation rate as compared with the magnetic metal material, the thickness of the moisture-impermeable film 3 which obtains the moisture-impermeable effect is changed from that of the inorganic material of the conventional medium as described above. The film formation time can be greatly reduced by making the film thickness as much as 1/20 to 2/5 thinner than the warp prevention film. Therefore, the manufacturing cost is reduced and the productivity is improved. However, if the moisture-impermeable film 3 is made thin, the medium warps when the temperature changes. Therefore, it is necessary to prevent the warp of the medium due to the temperature change by further providing the temperature deformation preventing film 4 on the surface of the moisture impermeable film 3 as shown in FIG. The description will be given below.

【0030】図6は温度変形防止膜の膜厚と温度変形係
数との相関を示すグラフである。図中の温度変形係数
は、温度変形防止膜4を0,3,5,6,9及び15μ
mと変更し、温度を10℃変化させた場合に、実施の形
態1の光磁気記録媒体(図1)に生じた反りの変位を示
す。
FIG. 6 is a graph showing the correlation between the film thickness of the temperature deformation preventing film and the temperature deformation coefficient. The temperature deformation coefficient in the figure is 0, 3, 5, 6, 9 and 15 μ for the temperature deformation prevention film 4.
The displacement of the warp generated in the magneto-optical recording medium (FIG. 1) of the first embodiment when the temperature is changed by 10 ° C. by changing m to m is shown.

【0031】この測定時における各層の厚さは、基板1
は0.6mm、上地層2aは15nm、反射層2bは4
0nm、磁気記録層2cは100nm、下地層2dは6
5nm、そして不透湿膜3は60nmである。なお、図
6の測定においては、不透湿膜3にはSiNのみを用い
ている。
The thickness of each layer at the time of this measurement is the substrate 1
Is 0.6 mm, the upper layer 2a is 15 nm, and the reflective layer 2b is 4
0 nm, the magnetic recording layer 2c is 100 nm, and the underlayer 2d is 6 nm.
5 nm, and the moisture impermeable film 3 is 60 nm. In the measurement of FIG. 6, only moisture impermeable film 3 is made of SiN.

【0032】温度変形防止膜4の膜厚が0μmの場合に
生じた媒体の反りは、温度の上昇と共に記録層2,基板
1及び不透湿膜3の全てが膨張するが、基板1の膨張が
最も大きく、次いで記録層2,不透湿膜3の順となる。
The warp of the medium generated when the film thickness of the temperature deformation preventing film 4 is 0 μm causes the recording layer 2, the substrate 1 and the moisture impermeable film 3 to expand as the temperature rises, but the substrate 1 expands. Is the largest, followed by the recording layer 2 and the moisture impermeable film 3.

【0033】まず、基板1及び記録層2だけの場合の膨
張を考えると、基板1の膨張に対して記録層2の膨張は
追従しない。したがって、基板1の方がより大きく膨張
するので、媒体はプラスに反る。次に、不透湿膜3及び
基板1だけの場合の膨張について考えても、前記基板1
及び記録層2だけの場合と同様の現象が起きており、こ
の場合では、媒体はマイナスに反る。
First, considering expansion in the case of only the substrate 1 and the recording layer 2, the expansion of the recording layer 2 does not follow the expansion of the substrate 1. Therefore, since the substrate 1 expands more, the medium warps positively. Next, considering the expansion in the case of only the impermeable membrane 3 and the substrate 1, the substrate 1
Also, the same phenomenon as in the case of only the recording layer 2 occurs, and in this case, the medium warps in a negative direction.

【0034】以上のことから、基板1,記録層2及び不
透湿膜3の構成で考えた場合には、基板1の膨張に対し
て、記録層2の膨張が不透湿膜3の膨張よりも大きいた
め、記録層2と不透湿膜3との膨張の差が基板1の記録
層2側のみに働いていることと同等である。すなわち、
前述の如く基板1の膨張に対して記録層2の膨張が追従
しない場合と同じ現象になり、基板1の方がより大きく
膨張するため、媒体はプラスに反る。
From the above, when the structure of the substrate 1, the recording layer 2 and the moisture impermeable film 3 is considered, the expansion of the recording layer 2 is the expansion of the moisture impermeable film 3 with respect to the expansion of the substrate 1. Therefore, the difference in expansion between the recording layer 2 and the moisture impermeable film 3 is equivalent to the fact that only the recording layer 2 side of the substrate 1 works. That is,
As described above, the same phenomenon occurs when the expansion of the recording layer 2 does not follow the expansion of the substrate 1, and the substrate 1 expands to a greater extent, so that the medium warps positively.

【0035】温度変形防止膜4の膜厚が5μmの場合
は、温度の上昇と共に記録層2,基板1,不透湿膜3及
び温度変形防止膜4のそれぞれが膨張するが、記録層2
の膨張と(不透湿膜3+温度変形防止膜4)の膨張とが
等しくなる。つまり、基板1の両面において膨張の均衡
がとれている。したがって、基板1の膨張に対して基板
1の片側に膨張差が発生しないため、温度変化に対して
媒体に反りは生じない。
When the film thickness of the temperature deformation preventing film 4 is 5 μm, each of the recording layer 2, the substrate 1, the moisture impermeable film 3 and the temperature deformation preventing film 4 expands as the temperature rises.
And the expansion of (the moisture impermeable film 3 + the temperature deformation prevention film 4) are equal. That is, the expansion is balanced on both sides of the substrate 1. Therefore, since the expansion difference does not occur on one side of the substrate 1 due to the expansion of the substrate 1, the medium does not warp with respect to the temperature change.

【0036】温度変形防止膜4の膜厚が5μmより大き
いt(μm)の場合は、前述の如く基板1の両面におい
て膨張率の均衡がとれている状態に、更に(t−5)μ
mの温度変形防止膜を設けた場合と同じ系になる。ゆえ
に、記録層2よりも温度変形防止膜4が大きく膨張する
と考えられ、媒体はプラスに反る。
When the thickness of the temperature deformation preventing film 4 is t (μm) larger than 5 μm, the expansion coefficient is balanced on both surfaces of the substrate 1 as described above, and further (t-5) μ.
The system is the same as that of the case where the m temperature-preventing film is provided. Therefore, it is considered that the temperature deformation prevention film 4 expands more than the recording layer 2, and the medium warps positively.

【0037】以上のことから、図6において温度変形防
止膜4の膜厚が5μmの場合に最大の温度変形防止効果
が得られることがわかる。したがって、温度変形防止膜
4の最適な膜厚が5μmであると決定できる。また、同
図から、十分な温度変形防止効果が得られる温度変形防
止膜4の膜厚は5±3μm、すなわち2〜8μmである
と考えられる。そのため、温度変形防止膜4の膜厚の下
限値は2μmは決定できるが、上限値の8μmについて
は以下のことを更に考慮する必要がある。
From the above, it can be seen in FIG. 6 that the maximum temperature deformation prevention effect is obtained when the film thickness of the temperature deformation prevention film 4 is 5 μm. Therefore, it can be determined that the optimum film thickness of the temperature deformation prevention film 4 is 5 μm. Further, from the figure, it is considered that the film thickness of the temperature deformation prevention film 4 that can obtain a sufficient temperature deformation prevention effect is 5 ± 3 μm, that is, 2 to 8 μm. Therefore, the lower limit value of the film thickness of the temperature deformation preventing film 4 can be determined to be 2 μm, but regarding the upper limit value of 8 μm, it is necessary to further consider the following.

【0038】つまり、温度変形防止膜4は有機物の変性
アクリル紫外線硬化樹脂からなるため、吸水性及び吸湿
性を有する。したがって、温度変形防止膜4が厚膜であ
るほど、より吸水膨張を起こすため、媒体に反りが生じ
る虞がある。
That is, since the temperature deformation prevention film 4 is made of a modified acrylic UV-curable resin of an organic substance, it has water absorbency and hygroscopicity. Therefore, the thicker the temperature deformation preventing film 4 is, the more the water absorption and expansion occur, so that the medium may be warped.

【0039】図7は温度変形防止膜の膜厚と湿度変形係
数との相関を示すグラフである。図中の湿度変形係数
は、温度変形防止膜4を0,3,5,6,9及び15μ
mと変更し、10%RH変化させた場合に、実施の形態
1の光磁気記録媒体(図1)に生じた反りの変位を示
す。
FIG. 7 is a graph showing the correlation between the film thickness of the temperature deformation prevention film and the humidity deformation coefficient. The humidity deformation coefficient in the figure is 0, 3, 5, 6, 9 and 15μ for the temperature deformation prevention film 4.
The displacement of the warp generated in the magneto-optical recording medium of the first embodiment (FIG. 1) when changed to m and changed by 10% RH is shown.

【0040】温度変形防止膜4の膜厚が6μmまでは、
湿度に対する媒体の反りが小さい。ところが、温度変形
防止膜4の膜厚が9μm及び15μmでは、温度変形防
止膜4が吸水膨張を起こすために、媒体はプラスに反
る。この結果から、温度変形防止膜4が厚くなるほど、
急激に吸湿度が高くなることが理解できる。
When the thickness of the temperature deformation prevention film 4 is up to 6 μm,
Warpage of medium against humidity is small. However, when the film thickness of the temperature deformation prevention film 4 is 9 μm and 15 μm, the medium warps positively because the temperature deformation prevention film 4 causes water absorption expansion. From this result, as the temperature deformation prevention film 4 becomes thicker,
It can be understood that moisture absorption rapidly increases.

【0041】前述の温度変形防止膜4の膜厚が8μmの
場合は、湿度が10%RH変化したときの媒体の変形は
10μm生じ、ISOの90ミリカートリッジ光磁気デ
ィスク規格で定める動作環境での湿度変化幅3%RH〜
85%RHでも最大82μmしか変化しない。前述の温
度変形防止膜4の膜厚が9μmの場合は、10%RHの
変化で媒体変形は20μm生じ、ISOの動作環境での
湿度変化幅で164μmも変化し、目安の100μmを
大きく超える。したがって、温度変形防止膜4の膜厚の
上限値は、前述の如く8μmとすることが好ましい。
When the film thickness of the temperature deformation preventing film 4 is 8 μm, the deformation of the medium is 10 μm when the humidity changes by 10% RH, and the deformation occurs in the operating environment defined by the ISO 90 mm cartridge magneto-optical disk standard. Humidity change width 3% RH ~
Even at 85% RH, the maximum change is only 82 μm. When the film thickness of the temperature deformation preventing film 4 is 9 μm, the medium deformation occurs by 20 μm due to the change of 10% RH, and the humidity change width in the ISO operating environment also changes by 164 μm, which greatly exceeds the standard of 100 μm. Therefore, the upper limit of the film thickness of the temperature deformation prevention film 4 is preferably 8 μm as described above.

【0042】以上により、本発明に係る記録媒体(例え
ば、磁気ディスク、光磁気ディスク、光ディスク等のデ
ィスク)の温度変形防止膜の膜厚は、好ましくは2μm
以上8μm以下とすることができ、より好ましくは、5
μm程度である。
From the above, the film thickness of the temperature deformation preventing film of the recording medium (for example, a disk such as a magnetic disk, a magneto-optical disk, an optical disk) according to the present invention is preferably 2 μm.
It can be 8 μm or less and more preferably 5 μm or less.
It is about μm.

【0043】温度変化による反りをも防止するために厚
膜を要する従来の媒体の無機物からなる反り防止膜に比
べ、温度変形防止膜4は、成膜が容易な有機物からなる
ため、成膜にかかる時間を大幅に減少することができ
る。そのため、製造コストが低減し、生産性も向上す
る。
Compared with the conventional anti-warp film made of an inorganic material of a medium, which requires a thick film to prevent warpage due to temperature change, the temperature-deformation prevention film 4 is made of an organic material which can be easily formed. This time can be significantly reduced. Therefore, the manufacturing cost is reduced and the productivity is improved.

【0044】実施の形態1に係る光磁気記録媒体(例え
ば光磁気ディスク)において、温度変形防止膜は不透湿
膜の面上に設ける形態について示したが、これに限ら
ず、記録層及び/又は不透湿膜の面上に設ける形態であ
ってもよい。
In the magneto-optical recording medium (for example, magneto-optical disk) according to the first embodiment, the temperature deformation preventing film is provided on the surface of the moisture impermeable film, but the present invention is not limited to this, and the recording layer and / or Alternatively, it may be provided on the surface of the impermeable membrane.

【0045】(実施の形態2)図8に本発明の実施の形
態2に係る光磁気記録媒体(例えば光磁気ディスク)の
模式的断面図を示す。光磁気記録媒体(例えば光磁気デ
ィスク)は、基板1の一面上に、下地層2d,磁気記録
層2c,反射層2b及び上地層2aからなる記録層2が
形成されている。一方、基板1の他面上には、不透湿膜
31、温度変形防止膜4及び不透湿膜32がこの順に形
成されている。ここで、不透湿膜31,32は共にSi
Nからなり、その他の層の構成材料及び各層の成膜方法
については、実施の形態1と同様であるのでその説明を
省略する。ただし、各層の厚さについては、基板1は
0.6mm、上地層2aは15nm、反射層2bは40
nm、磁気記録層2cは100nm、下地層2dは65
nm、不透湿膜31,32はそれぞれ40nm、そして
温度変形防止膜4は3μmである。
(Embodiment 2) FIG. 8 shows a schematic sectional view of a magneto-optical recording medium (eg, a magneto-optical disk) according to Embodiment 2 of the present invention. A magneto-optical recording medium (for example, a magneto-optical disk) has a recording layer 2 including an underlayer 2d, a magnetic recording layer 2c, a reflective layer 2b and an upper layer 2a formed on one surface of a substrate 1. On the other hand, on the other surface of the substrate 1, a moisture impermeable film 31, a temperature deformation preventing film 4, and a moisture impermeable film 32 are formed in this order. Here, both the moisture impermeable films 31 and 32 are made of Si.
The constituent materials of the other layers and the film forming method of each layer are the same as those in the first embodiment, and thus the description thereof will be omitted. However, regarding the thickness of each layer, the substrate 1 has a thickness of 0.6 mm, the upper layer 2a has a thickness of 15 nm, and the reflective layer 2b has a thickness of 40 mm.
nm, the magnetic recording layer 2c is 100 nm, and the underlayer 2d is 65 nm.
nm, the moisture impermeable films 31 and 32 are each 40 nm, and the temperature deformation preventing film 4 is 3 μm.

【0046】実施の形態2に係る光磁気記録媒体(例え
ば光磁気ディスク)においても、基板1の一面上に形成
された記録層2は、不透湿性のSiNの上地層2a及び
下地層2dのサンドイッチ構造であるため、記録層2か
ら基板1へは水分の浸入はない。一方、基板1の他面上
に、有機物からなる温度変形防止膜4を介在した不透湿
性を有する2層の不透湿層31,32が形成されている
ため、実施の形態1に係る光磁気記録媒体(例えば光磁
気ディスク)と同様、温度及び湿度変化の両方による媒
体の反りを防止することができる。また、無機物からな
る薄い不透湿膜と、成膜が容易な有機物の温度変形防止
膜とを組み合わせていることにより、成膜にかかる時間
を大幅に減少することができる。そのため、製造コスト
が低減し、生産性も向上する。
Also in the magneto-optical recording medium (for example, magneto-optical disk) according to the second embodiment, the recording layer 2 formed on one surface of the substrate 1 includes the moisture impermeable upper layer 2a of SiN and the underlying layer 2d. Since it has a sandwich structure, no moisture penetrates from the recording layer 2 to the substrate 1. On the other hand, since the moisture impermeable layers 31 and 32 having moisture impermeable property with the temperature deformation prevention film 4 made of an organic material interposed are formed on the other surface of the substrate 1, the light according to the first embodiment Similar to a magnetic recording medium (for example, a magneto-optical disk), it is possible to prevent the medium from warping due to both temperature and humidity changes. Further, by combining a thin moisture impermeable film made of an inorganic material and a temperature deformation preventing film made of an organic material, which can be easily formed, the time required for the film formation can be greatly reduced. Therefore, the manufacturing cost is reduced and the productivity is improved.

【0047】以上、実施の形態1,2において、基板に
はポリカーボネートを用いて説明したが、これに限ら
ず、ポリアクリレート又はその他の合成樹脂を用いても
よい。
Although polycarbonate is used as the substrate in the first and second embodiments, the present invention is not limited to this, and polyacrylate or other synthetic resin may be used.

【0048】また、上地層2a及び下地層2dにはSi
Nを用いて説明したが、これに限らず、酸化シリコン、
炭化シリコン又はそれらの混合物を用いてもよい。
The upper layer 2a and the base layer 2d are made of Si.
Although N is used for the description, it is not limited to this, and silicon oxide,
Silicon carbide or mixtures thereof may be used.

【0049】また、磁気記録層には非晶質材料のTbF
eCoを用いて説明したが、これに限らず、Co,F
e,Ni,Co−Fe,Ni−Co等の金属又はそれら
の酸化物を用いてもよい。
The magnetic recording layer is made of an amorphous material of TbF.
Although description has been made using eCo, the present invention is not limited to this, and Co, F
Metals such as e, Ni, Co-Fe, and Ni-Co or oxides thereof may be used.

【0050】また、不透湿膜にはSiN又はSiO
用いて説明したが、これに限らず、炭化シリコン又はそ
れらの混合物を用いてもよい。
Further, although SiN or SiO 2 is used for the moisture impermeable film, the moisture impermeable film is not limited to this, and silicon carbide or a mixture thereof may be used.

【0051】更に、温度変形防止膜には有機物の変性ア
クリル紫外線硬化樹脂を用いて説明したが、これに限ら
ず、その他のアクリル系樹脂又はウレタン系樹脂を用い
てもよい。
Furthermore, although the organic modified acrylic UV-curable resin is used for the temperature deformation preventing film, the invention is not limited to this, and other acrylic resin or urethane resin may be used.

【0052】前述の実施の形態1,2では光磁気記録媒
体(例えば光磁気ディスク)を例にしたが、CD−Rや
CD−RW等の光ディスクや磁気ディスクにも本発明は
適用可能である。
In the first and second embodiments described above, the magneto-optical recording medium (eg, magneto-optical disk) is taken as an example, but the present invention can be applied to optical disks such as CD-R and CD-RW and magnetic disks. .

【0053】[0053]

【発明の効果】以上のように、本発明によれば、無機物
からなる不透湿膜と、有機物からなる温度変形防止膜と
を設けることにより、保管環境又は使用環境において、
温度及び湿度変化が生じた場合でも反りを防止すると共
に、成膜の時間を短縮し、製造コストを低減し、しかも
生産性を向上することができる記録媒体(例えば、磁気
ディスク、光磁気ディスク、光ディスク等のディスク)
を提供することができる。
As described above, according to the present invention, by providing a moisture impermeable film made of an inorganic substance and a temperature deformation preventing film made of an organic substance, in a storage environment or a use environment,
A recording medium capable of preventing warpage even when a change in temperature and humidity occurs, shortening the film formation time, reducing the manufacturing cost, and improving the productivity (for example, a magnetic disk, a magneto-optical disk, Discs such as optical discs)
Can be provided.

【0054】また、本発明によれば、必要最小限の厚さ
の無機物の不透湿膜と、成膜が容易な有機物の温度変形
防止膜とを組み合わせることにより、保管環境又は使用
環境において、温度及び湿度変化が生じた場合でも反り
を防止すると共に、成膜の時間を短縮し、製造コストを
低減し、しかも生産性を向上することができる記録媒体
(例えば、磁気ディスク、光磁気ディスク、光ディスク
等のディスク)を提供することができる。
Further, according to the present invention, by combining a moisture impermeable film of an inorganic substance having a minimum necessary thickness and a temperature deformation preventing film of an organic substance which can be easily formed, in a storage environment or a use environment, A recording medium capable of preventing warpage even when a change in temperature and humidity occurs, shortening the film formation time, reducing the manufacturing cost, and improving the productivity (for example, a magnetic disk, a magneto-optical disk, Discs such as optical discs) can be provided.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の実施の形態1に係る光磁気記録媒体の
模式的断面図である。
FIG. 1 is a schematic sectional view of a magneto-optical recording medium according to a first embodiment of the present invention.

【図2】光磁気記録媒体の反りの測定状況を示す模式的
断面図である。
FIG. 2 is a schematic cross-sectional view showing a measurement state of warpage of a magneto-optical recording medium.

【図3】温度変形防止膜を形成せずに不透湿効果の測定
に用いた光磁気記録媒体の模式的断面図である。
FIG. 3 is a schematic cross-sectional view of a magneto-optical recording medium used for measuring a moisture impermeable effect without forming a temperature deformation preventing film.

【図4】図3の不透湿膜の膜厚と湿度変形係数との相関
を示すグラフである。
FIG. 4 is a graph showing the correlation between the film thickness of the moisture impermeable film of FIG. 3 and the humidity deformation coefficient.

【図5】図3の不透湿膜の膜厚と反射率との相関を示す
グラフである。
5 is a graph showing the correlation between the film thickness of the moisture impermeable film of FIG. 3 and the reflectance.

【図6】温度変形防止膜の膜厚と温度変形係数との相関
を示すグラフである。
FIG. 6 is a graph showing the correlation between the film thickness of the temperature deformation prevention film and the temperature deformation coefficient.

【図7】温度変形防止膜の膜厚と湿度変形係数との相関
を示すグラフである。
FIG. 7 is a graph showing the correlation between the film thickness of the temperature deformation prevention film and the humidity deformation coefficient.

【図8】本発明の実施の形態2に係る光磁気記録媒体の
模式的断面図である。
FIG. 8 is a schematic sectional view of a magneto-optical recording medium according to a second embodiment of the present invention.

【図9】従来の光磁気記録媒体の模式的断面図である。FIG. 9 is a schematic cross-sectional view of a conventional magneto-optical recording medium.

【符号の説明】[Explanation of symbols]

1 基板 2 記録層 2a 上地層 2b 反射層 2c 磁気記録層 2d 下地層 3,31,32 不透湿膜 4 温度変形防止膜 5 保護コート層 6 ハードコート層 10 光磁気記録媒体(光磁気ディスク) 20 変位測定センサ 30 押さえ部 1 substrate 2 recording layers 2a Upper stratum 2b reflective layer 2c magnetic recording layer 2d underlayer 3, 31, 32 Impermeable membrane 4 Temperature deformation prevention film 5 Protective coat layer 6 hard coat layer 10 Magneto-optical recording medium (magneto-optical disk) 20 Displacement measuring sensor 30 Holding part

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) G11B 11/105 G11B 11/105 526J Fターム(参考) 5D006 CC03 CC04 DA03 FA03 FA04 5D029 LB02 LB07 LB12 LC19 LC21 NA17 NA18 NA20 5D075 EE03 FG04 ─────────────────────────────────────────────────── ─── Continuation of front page (51) Int.Cl. 7 Identification code FI theme code (reference) G11B 11/105 G11B 11/105 526J F term (reference) 5D006 CC03 CC04 DA03 FA03 FA04 5D029 LB02 LB07 LB12 LC19 LC21 NA17 NA18 NA20 5D075 EE03 FG04

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 基板の一面上に記録層を備える記録媒体
において、 前記基板の他面上に設けられた無機物からなる不透湿膜
と、 前記記録層及び/又は前記不透湿膜の面上に設けられた
有機物からなる温度変形防止膜とを備えることを特徴と
する記録媒体。
1. A recording medium having a recording layer on one surface of a substrate, wherein a moisture impermeable film made of an inorganic material is provided on the other surface of the substrate, and a surface of the recording layer and / or the moisture impermeable film. A recording medium, comprising: a temperature deformation preventing film made of an organic material provided on the recording medium.
【請求項2】 基板の一面上に記録層を備える記録媒体
において、 前記基板の他面上に設けられた無機物からなる2層の不
透湿膜と、 該2層の不透湿膜の間に介在させた有機物からなる温度
変形防止膜とを備えることを特徴とする記録媒体。
2. A recording medium having a recording layer on one surface of a substrate, comprising: a two-layer moisture impermeable film made of an inorganic material, which is provided on the other surface of the substrate; A recording medium, comprising: a temperature deformation preventing film made of an organic material interposed between the recording medium and the recording medium.
【請求項3】 前記不透湿膜の膜厚は10nm以上80
nm以下であることを特徴とする請求項1又は2に記載
の記録媒体。
3. The moisture-impermeable film has a thickness of 10 nm or more and 80 or more.
The recording medium according to claim 1 or 2, wherein the recording medium has a thickness of not more than nm.
【請求項4】 前記温度変形防止膜の膜厚は2μm以上
8μm以下であることを特徴とする請求項1乃至3のい
ずれかに記載の記録媒体。
4. The recording medium according to claim 1, wherein the film thickness of the temperature deformation prevention film is 2 μm or more and 8 μm or less.
JP2002146853A 2002-05-21 2002-05-21 Recording medium Pending JP2003338084A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002146853A JP2003338084A (en) 2002-05-21 2002-05-21 Recording medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002146853A JP2003338084A (en) 2002-05-21 2002-05-21 Recording medium

Publications (1)

Publication Number Publication Date
JP2003338084A true JP2003338084A (en) 2003-11-28

Family

ID=29705710

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002146853A Pending JP2003338084A (en) 2002-05-21 2002-05-21 Recording medium

Country Status (1)

Country Link
JP (1) JP2003338084A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006003572A2 (en) * 2004-06-28 2006-01-12 Koninklijke Philips Electronics N.V. Optical data storage medium and combi-foil cover for the production thereof
US8671420B2 (en) 2011-02-03 2014-03-11 Sony Corporation Manufacturing method of optical information recording medium and optical information recording medium

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006003572A2 (en) * 2004-06-28 2006-01-12 Koninklijke Philips Electronics N.V. Optical data storage medium and combi-foil cover for the production thereof
WO2006003572A3 (en) * 2004-06-28 2006-05-11 Koninkl Philips Electronics Nv Optical data storage medium and combi-foil cover for the production thereof
US8671420B2 (en) 2011-02-03 2014-03-11 Sony Corporation Manufacturing method of optical information recording medium and optical information recording medium

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