JP2003297562A - Vapor deposition method - Google Patents

Vapor deposition method

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Publication number
JP2003297562A
JP2003297562A JP2002095992A JP2002095992A JP2003297562A JP 2003297562 A JP2003297562 A JP 2003297562A JP 2002095992 A JP2002095992 A JP 2002095992A JP 2002095992 A JP2002095992 A JP 2002095992A JP 2003297562 A JP2003297562 A JP 2003297562A
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JP
Japan
Prior art keywords
vapor deposition
substrate
organic
mask
glass substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2002095992A
Other languages
Japanese (ja)
Inventor
Ryuji Nishikawa
龍司 西川
Original Assignee
Sanyo Electric Co Ltd
三洋電機株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Electric Co Ltd, 三洋電機株式会社 filed Critical Sanyo Electric Co Ltd
Priority to JP2002095992A priority Critical patent/JP2003297562A/en
Publication of JP2003297562A publication Critical patent/JP2003297562A/en
Pending legal-status Critical Current

Links

Abstract

<P>PROBLEM TO BE SOLVED: To suppress deviation of dimensions due to vapor deposition mask, degradation of machining precision, and thermal expansion. <P>SOLUTION: The size of a shadow mask 200 is molded smaller than the glass substrate 201. And the shadow mask 200 and a vapor deposition source 202 that is arranged opposed to it are fixed to the vacuum chamber not shown in the figure, and the glass substrate 201 is moved along the shadow mask 200 by a moving mechanism. The organic EL vapor deposition material evaporated from the vapor deposition source 202 is deposited on the glass substrate 201 and a desired vapor deposition pattern is formed on the whole face of the glass substrate 201. <P>COPYRIGHT: (C)2004,JPO

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a vapor deposition method, and in particular, a substrate and a vapor deposition mask are opposed to each other, and a vapor deposition material is deposited on the surface of the substrate from an vapor deposition source through an opening provided in the vapor deposition mask. The present invention relates to a vapor deposition method for performing vapor deposition to form a pattern.

[0002]

2. Description of the Related Art Recently, an organic EL display device using an organic electroluminescence (Electro Luminescence: hereinafter referred to as "organic EL") element has been used as a CRT or LC.
As a display device replacing D, attention has been paid to, for example, a thin film transistor (TFT) as a switching element for driving the EL element.
Called. ) Are also being researched and developed.

Since the organic EL materials used for the hole transport layer, the light emitting layer and the electron transport layer of the organic EL device have the characteristics of low solvent resistance and weakness against moisture, the photolithography technique in the semiconductor process is used. I can't. Therefore, pattern formation of the hole transport layer, the light emitting layer, and the electron transport layer of the organic EL element is performed by vapor deposition using a so-called shadow mask.

Next, a pattern forming method by vapor deposition of the organic EL material will be described with reference to FIGS. First, in FIG. 6, 100 is a vacuum vapor deposition apparatus, 101
Is an exhaust system attached to the vacuum vapor deposition apparatus 100, and 110 is a support stand installed in the chamber of the vacuum vapor deposition apparatus,
On this support 110, nickel (Ni) or Invar alloy
A shadow mask (vapor deposition mask) 111 made of a magnetic material such as (Fe 64 Ni 36 ) is placed. Shadow mask 1
A plurality of openings 112 are provided at predetermined positions of 11.

A magnet 120 is vertically movably arranged on a shadow mask 111 mounted on a support 110. Reference numeral 130 denotes a glass substrate called mother glass which is inserted between the magnet 120 and the shadow mask 111, and an organic EL element is formed on this glass substrate. A vapor deposition source 140 is disposed below the shadow mask 111 and is movable in the left-right direction along the shadow mask 111.

In FIG. 6, it is assumed that the inside of the chamber of the vacuum vapor deposition apparatus 100 is kept in a vacuum state by the exhaust system 101. Therefore, the glass substrate 130 is transferred to the magnet 120 and the shadow mask 11 by a transport mechanism (not shown).
It is inserted between 1. Then, as shown in FIG. 7, the glass substrate 130 is placed on the shadow mask 111 by the transport mechanism.

Next, as shown in FIG.
0 is moved downward to a position where it contacts the upper surface of the glass substrate 130. Then, the shadow mask 111 receives the magnetic force of the magnet 120 and is brought into close contact with the lower surface of the glass substrate 130, that is, the pattern forming surface.

Next, as shown in FIG. 9, the shadow mask 111 is moved while the vapor deposition source 140 is moved horizontally from the left end to the right end of the glass substrate 130 by a moving mechanism (not shown).
The organic EL material and the material of the cathode 65 (for example, aluminum) on the surface of the glass substrate 130 through the opening 112 of
Vapor deposition is performed. Here, the vapor deposition source 140 is composed of an elongated crucible, and the vapor deposition material housed in the crucible is heated and evaporated by a heater.

When the vapor deposition is completed, the magnet 120 is moved upward. Then, the glass substrate 130 is lifted from the shadow mask 111 by the transfer mechanism and transferred to the work position of the next process. Thereby, the pattern formation of the organic EL element 60 can be performed.

[0010]

Recently, the glass substrate 13 is used.
The size of 0 is, for example, about 300 mm × 400 mm,
It tends to be larger. However, since the area of the shadow mask 111 is the same as the area of the glass substrate 130, the processing accuracy of the shadow mask 111 due to the etching process or the plating process deteriorates as the size increases, and the dimensions of the shadow mask 111 become incorrect due to thermal expansion. Therefore, there has been a problem that the accuracy of the vapor deposition pattern is deteriorated.

[0011]

SUMMARY OF THE INVENTION The present invention has been made in view of the above-mentioned problems of the prior art, in which a substrate and an evaporation mask are opposed to each other, and an evaporation source is used to pass through an opening provided in the evaporation mask. In the vapor deposition method of depositing a vapor deposition material on the surface of the substrate to form a pattern, the area of the vapor deposition mask is smaller than the area of the substrate, and the substrate is relatively moved in one direction with respect to the vapor deposition mask. It is characterized in that vapor deposition is performed.

According to the present invention, since the area of the vapor deposition mask is processed and formed smaller than the area of the substrate to be vapor-deposited, deterioration of processing accuracy and dimensional deviation due to thermal expansion are suppressed. Further, by performing vapor deposition while moving the substrate relative to the vapor deposition mask in one direction, it is possible to form a vapor deposition pattern over the entire substrate.

[0013]

BEST MODE FOR CARRYING OUT THE INVENTION A vapor deposition method according to an embodiment of the present invention will be described with reference to the drawings. FIG. 1 is a perspective view showing the vapor deposition method of the present embodiment. The glass substrate 2 of FIG.
It is sectional drawing which follows the longitudinal direction of 01.

In the vacuum chamber, the shadow mask 20
0 (vapor deposition mask) is arranged so as to face the glass substrate 201. A vapor deposition source 202 is arranged so as to face the shadow mask 200. The vapor deposition source 202 is configured by a “crucible” in the shape of a long and thin box, and the organic EL vapor deposition material housed in this “crucible” is heated by a heater and evaporated.

The shadow mask 200 has a plurality of openings 203 corresponding to a desired vapor deposition pattern. The pattern of the opening 203 is processed by, for example, etching or plating. This shadow mask 200
Are molded into a smaller area than the glass substrate 201.

For example, the size of the glass substrate 201 is 30
If the size is 0 mm × 400 mm, the shadow mask 200
A size of about 300 mm × 20 mm is suitable. This improves the processing accuracy of the shadow mask 200 and can reduce the influence of thermal expansion.
As a result, the accuracy of forming the vapor deposition pattern can be improved.

In addition to the above structure, the glass substrate 20
By moving 1 in one direction with respect to the shadow mask 200, a vapor deposition pattern can be formed on the entire surface of the glass substrate 201. In this case, the shadow mask 200 and the vapor deposition source 202 disposed opposite to each other are fixed to a vacuum chamber (not shown), and the glass substrate 201 is moved along the shadow mask 200 by the moving mechanism. The organic EL vapor deposition material evaporated from the vapor deposition source 202 passes through the opening 203 of the shadow mask 200 and passes through the glass substrate 2
No. 01 is vapor-deposited to form a desired vapor-deposition pattern.

Regarding the method of moving the glass substrate 201,
Shadow mask 200 with vapor deposition source 202 turned on
A method of linearly moving and a method of repeating moving and stopping can be considered. In the case of the latter moving method, the glass substrate 201 is stopped at a predetermined position, the vapor deposition source 202 is turned on to perform vapor deposition, and the vapor source 202 is moved during the movement.
Turn off to stop vapor deposition.

Further, when the glass substrate 201 is moved, a guide pillar 204 is formed on the glass substrate 201 side in order to bring the glass substrate 201 and the shadow mask 200 close to each other and keep the distance therebetween constant. good. The guide pillars 204 can be formed by patterning a photoresist material. Its height is about 4μ.

Specifically, as shown in FIG. 3, stripe-shaped pillars 204A are formed on the glass substrate 201 except the organic EL element region 210, for example, between the adjacent organic EL element regions 210 and 210. Alternatively, a ring-shaped pillar 204B may be provided around the organic EL element region 210.
May be formed. Further, the guide pillars 204 may be formed in a dot shape.

The guide pillar 204 is a vapor deposition source 202.
It is necessary when the vapor deposition from isotropic is isotropic, but is unnecessary when the anisotropy is strong. In that case, an appropriate gap may be present between the glass substrate 201 and the shadow mask 200.

In the above embodiment, the shadow mask 2 is used.
00 and the vapor deposition source 202 are fixed and the glass substrate 201 is moved, but the present invention is not limited to this. On the contrary, the glass substrate 201 is fixed and the shadow mask 200
Alternatively, the evaporation source 202 may be moved with respect to the glass substrate 201.

Next, the structure of the organic EL display device to which the vapor deposition method of the present invention is applied will be described.

FIG. 4 is a plan view showing the vicinity of the display pixel of the organic EL display device, FIG. 5 (a) is a sectional view taken along the line AA in FIG. 4, and FIG. 5 (b) is a view. 4 is a sectional view taken along line BB in FIG.

As shown in FIGS. 4 and 5, the display pixels 115 are formed in a region surrounded by the gate signal lines 51 and the drain signal lines 52 and arranged in a matrix.

In the display pixel 115, the organic EL element 60, which is a self-luminous element, and the switching TFT 3 for controlling the timing of supplying a current to the organic EL element 60.
0 and a driving TFT that supplies a current to the organic EL element 60
40 and a storage capacitor are arranged. In addition, organic EL
The element 60 is composed of an anode 61 which is a first electrode, a light emitting element layer which is made of a light emitting material, and a cathode 65 which is a second electrode.

That is, a first TFT 30, which is a switching TFT, is provided near the intersection of both signal lines 51 and 52, and the source 33 s of the TFT 30 has a capacitance forming a capacitance with the storage capacitance electrode line 54. It also serves as the electrode 55 and is connected to the gate 41 of the second TFT 40, which is the EL element driving TFT, and the source 4 of the second TFT.
3s is connected to the anode 61 of the organic EL element 60, and the other drain 43d is connected to the drive power supply line 53 which is a current source supplied to the organic EL element 60.

A storage capacitor electrode line 54 is arranged in parallel with the gate signal line 51. This storage capacitor electrode line 54
Is made of chrome or the like and accumulates charges between the source 33 s of the TFT and the capacitance electrode 55 connected to the source 33 s via the gate insulating film 12 to form a capacitance. This holding capacity 56
Are provided for holding the voltage applied to the gate electrode 41 of the second TFT 40.

As shown in FIG. 5, the organic EL display device is
A TFT and an organic EL element are sequentially laminated on a substrate 10 such as a substrate made of glass or synthetic resin, a substrate having conductivity, or a semiconductor substrate. However, substrate 1
When a conductive substrate and a semiconductor substrate are used as 0, an insulating film such as SiO 2 or SiN is formed on the substrate 10 and then the first and second TFTs and the organic EL are formed.
Form an element. Each of the TFTs has a so-called top gate structure in which the gate electrode is above the active layer via the gate insulating film.

First, the first TFT 30, which is a switching TFT, will be described.

As shown in FIG. 5A, an amorphous silicon film (hereinafter referred to as "a-Si film") is CV on an insulating substrate 10 made of quartz glass, non-alkali glass or the like.
A film is formed by the D method or the like, and the a-Si film is irradiated with laser light to be melted and recrystallized to form a polycrystalline silicon film (hereinafter referred to as “p-
"Si film". ), And this is the active layer 33.
A single layer or a laminated body of a SiO 2 film and a SiN film is formed thereon as the gate insulating film 32. On top of that, C
It is provided with a gate signal line 51 also serving as a gate electrode 31 made of a refractory metal such as r and Mo and a drain signal line 52 made of Al, which is a driving power source for an organic EL element and is Al.
Drive power supply line 53 is arranged.

Then, the gate insulating film 32 and the active layer 33.
An interlayer insulating film 15 in which a SiO 2 film, a SiN film, and a SiO 2 film are laminated in this order is formed on the entire upper surface, and a drain in which a metal such as Al is filled in a contact hole provided corresponding to the drain 33d. An electrode 36 is provided, and a flattening insulating film 17 made of an organic resin is formed on the entire surface to make the surface flat.
Are formed.

Next, the second TFT 40, which is a driving TFT for the organic EL element, will be described. As shown in FIG. 5B, an a-Si film is irradiated with a laser beam to polycrystallize the active layer 43 and the gate insulating film 12 on the insulating substrate 10 made of quartz glass, alkali-free glass or the like. , And C
A gate electrode 41 made of a refractory metal such as r and Mo is formed in order, and a channel 43 is formed in the active layer 43.
c, and a source 43s and a drain 43d are provided on both sides of the channel 43c. Then, an interlayer insulating film 15 in which a SiO 2 film, a SiN film, and a SiO 2 film are laminated in this order is formed on the entire surface of the gate insulating film 12 and the active layer 43, and Al is formed in a contact hole provided corresponding to the drain 43d. A driving power supply line 53 filled with a metal such as the above and connected to the driving power supply is arranged. Further, a flattening insulating film 17 made of, for example, an organic resin for flattening the surface is provided on the entire surface. Then, a contact hole is formed in the flattening insulating film 17 at a position corresponding to the source 43s, and the ITO is brought into contact with the source 43s through the contact hole.
A transparent electrode made of, that is, an anode 61 of an organic EL element is provided on the flattening insulating film 17. The anode 61 is separately formed in an island shape for each display pixel.

The organic EL element 60 has a general structure and includes an anode 61 made of a transparent electrode such as ITO (Indium Tin Oxide) and MTDATA (4,4-bis (3-methylphenylphene).
ylamino) biphenyl) first hole transport layer, TPD
(4,4,4-tris (3-methylphenylphenylamino) triphenylan
ine) and a second hole transport layer 62 composed of a hole transport layer, Be containing a quinacridone derivative
Light-emitting layer 63 made of bq2 (10-benzo [h] quinolinol-beryllium complex), electron transport layer 64 made of Bebq2, cathode 6 made of magnesium-indium alloy or aluminum, or aluminum alloy.
5 is a structure in which layers are formed in this order.

In the organic EL element 60, the holes injected from the anode 61 and the electrons injected from the cathode 65 are recombined inside the light emitting layer to excite the organic molecules forming the light emitting layer to generate excitons. Occurs. Light is emitted from the light emitting layer in the process of radiation deactivation of the excitons, and this light is emitted to the outside from the transparent anode 61 through the transparent insulating substrate.

The vapor deposition method of the present invention can be applied to the formation of the hole transport layer 62, the light emitting layer 63, and the electron transport layer 64 of the organic EL element 60 described above.

[0037]

According to the vapor deposition method of the present invention, since the vapor deposition mask is processed and formed smaller than the substrate to be vapor-deposited, deterioration of processing accuracy and dimensional deviation due to thermal expansion are suppressed. Further, by performing vapor deposition while moving the substrate relative to the vapor deposition mask in one direction, it is possible to form a vapor deposition pattern over the entire substrate.

[Brief description of drawings]

FIG. 1 is a perspective view illustrating a vapor deposition method according to an embodiment of the present invention.

FIG. 2 is a sectional view illustrating a vapor deposition method according to an embodiment of the present invention.

FIG. 3 is a perspective view illustrating a vapor deposition method according to an embodiment of the present invention.

FIG. 4 is a plan view of an organic EL display device.

5 is a cross-sectional view taken along the line BB in FIG.

FIG. 6 is a diagram showing a pattern forming method by vapor deposition of an organic EL material.

FIG. 7 is a diagram showing a pattern forming method by vapor deposition of an organic EL material.

FIG. 8 is a diagram showing a pattern forming method by vapor deposition of an organic EL material.

FIG. 9 is a diagram showing a pattern forming method by vapor deposition of an organic EL material.

[Explanation of symbols]

200 Shadow mask 201 Glass substrate 2
02 evaporation source 203 opening 204 pillar for guide 21
0 Organic EL element area

Claims (11)

[Claims]
1. A vapor deposition method in which a substrate and a vapor deposition mask are opposed to each other, and a vapor deposition material is vapor deposited on a surface of the substrate from an vapor deposition source through an opening provided in the vapor deposition mask to form a pattern. Is smaller than the area of the substrate, and the vapor deposition is performed while moving the substrate relatively in one direction with respect to the vapor deposition mask.
2. The vapor deposition method according to claim 1, wherein vapor deposition is performed while continuously moving the substrate with respect to the vapor deposition mask.
3. The vapor deposition method according to claim 1, wherein vapor deposition is performed by repeatedly stopping and moving the substrate with respect to the vapor deposition mask.
4. The vapor deposition method according to claim 3, wherein the vapor deposition source is turned off when the substrate is stopped and the vapor deposition source is turned on when the substrate is moved.
5. The vapor deposition method according to claim 1, wherein a pillar for guiding is provided on the surface of the substrate or the surface of the vapor deposition mask.
6. The insulating substrate and the vapor deposition mask are opposed to each other,
In a vapor deposition method for depositing an organic EL device material on a surface of the insulating substrate from an evaporation source through an opening provided in the vapor deposition mask to form a pattern of the organic EL device, the area of the vapor deposition mask is the insulating film. A vapor deposition method characterized in that the area of the insulating substrate is smaller than that of the insulating substrate, and the insulating substrate is vapor-deposited while moving the insulating substrate in one direction relative to the vapor deposition mask.
7. The vapor deposition method according to claim 6, wherein vapor deposition is performed while continuously moving the insulating substrate with respect to the vapor deposition mask.
8. The vapor deposition method according to claim 6, wherein vapor deposition is performed by repeatedly stopping and moving the insulating substrate with respect to the vapor deposition mask.
9. The vapor deposition method according to claim 6, wherein the vapor deposition source is turned off when the insulating substrate is stopped and the vapor deposition source is turned on when the insulating substrate is moved.
10. The vapor deposition method according to claim 6, wherein a pillar for guiding is provided on the surface of the insulating substrate or the surface of the vapor deposition mask.
11. The vapor deposition method according to claim 9, wherein the guide pillar is provided in a region other than the organic EL device region on the insulating substrate.
JP2002095992A 2002-03-29 2002-03-29 Vapor deposition method Pending JP2003297562A (en)

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Publication number Priority date Publication date Assignee Title
JP2010261081A (en) * 2009-05-08 2010-11-18 V Technology Co Ltd Vapor deposition method and vapor deposition apparatus
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US8053976B2 (en) 2007-07-12 2011-11-08 Hitachi Displays, Ltd. Organic EL display device including display panel
WO2011148750A1 (en) * 2010-05-28 2011-12-01 シャープ株式会社 Evaporation mask, and production method and production apparatus for organic el element using evaporation mask
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US8945974B2 (en) 2012-09-20 2015-02-03 Samsung Display Co., Ltd. Method of manufacturing organic light-emitting display device using an organic layer deposition apparatus
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US8993360B2 (en) 2013-03-29 2015-03-31 Samsung Display Co., Ltd. Deposition apparatus, method of manufacturing organic light emitting display apparatus, and organic light emitting display apparatus
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US9051636B2 (en) 2011-12-16 2015-06-09 Samsung Display Co., Ltd. Organic layer deposition apparatus, method of manufacturing organic light-emitting display apparatus using the same, and organic light-emitting display apparatus
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US8053976B2 (en) 2007-07-12 2011-11-08 Hitachi Displays, Ltd. Organic EL display device including display panel
JP2010261081A (en) * 2009-05-08 2010-11-18 V Technology Co Ltd Vapor deposition method and vapor deposition apparatus
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US8916237B2 (en) 2009-05-22 2014-12-23 Samsung Display Co., Ltd. Thin film deposition apparatus and method of depositing thin film
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US8882920B2 (en) 2009-06-05 2014-11-11 Samsung Display Co., Ltd. Thin film deposition apparatus
US8882921B2 (en) 2009-06-08 2014-11-11 Samsung Display Co., Ltd. Thin film deposition apparatus
US9174250B2 (en) 2009-06-09 2015-11-03 Samsung Display Co., Ltd. Method and apparatus for cleaning organic deposition materials
US8802200B2 (en) 2009-06-09 2014-08-12 Samsung Display Co., Ltd. Method and apparatus for cleaning organic deposition materials
US8907326B2 (en) 2009-06-24 2014-12-09 Samsung Display Co., Ltd. Organic light-emitting display device and thin film deposition apparatus for manufacturing the same
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US8921831B2 (en) 2009-08-24 2014-12-30 Samsung Display Co., Ltd. Thin film deposition apparatus, method of manufacturing organic light-emitting display device by using the apparatus, and organic light-emitting display device manufactured by using the method
US8137466B2 (en) 2009-08-24 2012-03-20 Samsung Mobile Display Co., Ltd. Thin film deposition apparatus and method of manufacturing organic light-emitting display device by using the same
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US8193011B2 (en) 2009-08-24 2012-06-05 Samsung Mobile Display Co., Ltd. Thin film deposition apparatus and method of manufacturing organic light-emitting display device by using the same
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US9453282B2 (en) 2010-03-11 2016-09-27 Samsung Display Co., Ltd. Thin film deposition apparatus
US8973525B2 (en) 2010-03-11 2015-03-10 Samsung Display Co., Ltd. Thin film deposition apparatus
US8865252B2 (en) 2010-04-06 2014-10-21 Samsung Display Co., Ltd. Thin film deposition apparatus and method of manufacturing organic light-emitting display device by using the same
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US9136310B2 (en) 2010-04-28 2015-09-15 Samsung Display Co., Ltd. Thin film deposition apparatus, method of manufacturing organic light-emitting display device by using the apparatus, and organic light-emitting display device manufactured by using the method
WO2011148750A1 (en) * 2010-05-28 2011-12-01 シャープ株式会社 Evaporation mask, and production method and production apparatus for organic el element using evaporation mask
US9580791B2 (en) 2010-05-28 2017-02-28 Sharp Kabushiki Kaisha Vapor deposition mask, and manufacturing method and manufacturing device for organic EL element using vapor deposition mask
US9279177B2 (en) 2010-07-07 2016-03-08 Samsung Display Co., Ltd. Thin film deposition apparatus, method of manufacturing organic light-emitting display device by using the apparatus, and organic light-emitting display device manufactured by using the method
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US8833294B2 (en) 2010-07-30 2014-09-16 Samsung Display Co., Ltd. Thin film deposition apparatus including patterning slit sheet and method of manufacturing organic light-emitting display device with the same
US8846547B2 (en) 2010-09-16 2014-09-30 Samsung Display Co., Ltd. Thin film deposition apparatus, method of manufacturing organic light-emitting display device by using the thin film deposition apparatus, and organic light-emitting display device manufactured by using the method
US9018647B2 (en) 2010-09-16 2015-04-28 Samsung Display Co., Ltd. Thin film deposition apparatus, method of manufacturing organic light-emitting display device by using the apparatus, and organic light-emitting display device manufactured by using the method
US8871542B2 (en) 2010-10-22 2014-10-28 Samsung Display Co., Ltd. Method of manufacturing organic light emitting display apparatus, and organic light emitting display apparatus manufactured by using the method
US9388488B2 (en) 2010-10-22 2016-07-12 Samsung Display Co., Ltd. Organic film deposition apparatus and method of manufacturing organic light-emitting display device by using the same
CN102456852A (en) * 2010-10-22 2012-05-16 三星移动显示器株式会社 Organic layer deposition apparatus, and method of manufacturing organic light-emitting display apparatus using the same
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US8461058B2 (en) 2010-10-22 2013-06-11 Samsung Display Co., Ltd. Organic layer deposition apparatus, and method of manufacturing organic light-emitting display apparatus using the same
US8882922B2 (en) 2010-11-01 2014-11-11 Samsung Display Co., Ltd. Organic layer deposition apparatus
JP2014503944A (en) * 2010-12-07 2014-02-13 フオン・アルデンネ・アンラーゲンテヒニク・ゲゼルシヤフト・ミト・ベシユレンクテル・ハフツング Method for producing an organic light emitter
US8852687B2 (en) 2010-12-13 2014-10-07 Samsung Display Co., Ltd. Organic layer deposition apparatus
US8920563B2 (en) 2010-12-15 2014-12-30 Samsung Display Co., Ltd. Thin film deposition apparatus and method of manufacturing organic light-emitting display device by using the same
US9748483B2 (en) 2011-01-12 2017-08-29 Samsung Display Co., Ltd. Deposition source and organic layer deposition apparatus including the same
US9234270B2 (en) 2011-05-11 2016-01-12 Samsung Display Co., Ltd. Electrostatic chuck, thin film deposition apparatus including the electrostatic chuck, and method of manufacturing organic light emitting display apparatus by using the thin film deposition apparatus
US9076982B2 (en) 2011-05-25 2015-07-07 Samsung Display Co., Ltd. Patterning slit sheet assembly, organic layer deposition apparatus, method of manufacturing organic light-emitting display apparatus, and the organic light-emitting display apparatus
US8859043B2 (en) 2011-05-25 2014-10-14 Samsung Display Co., Ltd. Organic layer deposition apparatus and method of manufacturing organic light-emitting display device by using the same
US9249493B2 (en) 2011-05-25 2016-02-02 Samsung Display Co., Ltd. Organic layer deposition apparatus and method of manufacturing organic light-emitting display apparatus by using the same
US8707889B2 (en) 2011-05-25 2014-04-29 Samsung Display Co., Ltd. Patterning slit sheet assembly, organic layer deposition apparatus, method of manufacturing organic light-emitting display apparatus, and the organic light-emitting display apparatus
US8906731B2 (en) 2011-05-27 2014-12-09 Samsung Display Co., Ltd. Patterning slit sheet assembly, organic layer deposition apparatus, method of manufacturing organic light-emitting display apparatus, and the organic light-emitting display apparatus
US9777364B2 (en) 2011-07-04 2017-10-03 Samsung Display Co., Ltd. Organic layer deposition apparatus and method of manufacturing organic light-emitting display device by using the same
CN102867919A (en) * 2011-07-04 2013-01-09 三星显示有限公司 Organic layer deposition apparatus
US8951610B2 (en) 2011-07-04 2015-02-10 Samsung Display Co., Ltd. Organic layer deposition apparatus
US9512515B2 (en) 2011-07-04 2016-12-06 Samsung Display Co., Ltd. Organic layer deposition apparatus and method of manufacturing organic light-emitting display device by using the same
US9150952B2 (en) 2011-07-19 2015-10-06 Samsung Display Co., Ltd. Deposition source and deposition apparatus including the same
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CN102899608A (en) * 2011-07-26 2013-01-30 群康科技(深圳)有限公司 Film coating method
US9206501B2 (en) 2011-08-02 2015-12-08 Samsung Display Co., Ltd. Method of manufacturing organic light-emitting display apparatus by using an organic layer deposition apparatus having stacked deposition sources
CN102956843A (en) * 2011-08-11 2013-03-06 佳能株式会社 Method for manufacturing EL device
US9051636B2 (en) 2011-12-16 2015-06-09 Samsung Display Co., Ltd. Organic layer deposition apparatus, method of manufacturing organic light-emitting display apparatus using the same, and organic light-emitting display apparatus
US9260778B2 (en) 2012-06-22 2016-02-16 Samsung Display Co., Ltd. Organic layer deposition apparatus, method of manufacturing organic light-emitting display apparatus using the same, and organic light-emitting display apparatus manufactured using the method
US8956697B2 (en) 2012-07-10 2015-02-17 Samsung Display Co., Ltd. Method of manufacturing organic light-emitting display apparatus and organic light-emitting display apparatus manufactured by using the method
US9257649B2 (en) 2012-07-10 2016-02-09 Samsung Display Co., Ltd. Method of manufacturing organic layer on a substrate while fixed to electrostatic chuck and charging carrier using contactless power supply module
US10431779B2 (en) 2012-07-10 2019-10-01 Samsung Display Co., Ltd. Organic layer deposition apparatus, method of manufacturing organic light-emitting display apparatus using the same, and organic light-emitting display apparatus manufactured using the method
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US9461277B2 (en) 2012-07-10 2016-10-04 Samsung Display Co., Ltd. Organic light emitting display apparatus
CN103545460A (en) * 2012-07-10 2014-01-29 三星显示有限公司 Organic layer deposition apparatus, organic light-emitting display apparatus, and method of manufacturing organic light-emitting display apparatus
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US9246135B2 (en) 2012-07-10 2016-01-26 Samsung Display Co., Ltd. Organic layer deposition apparatus, method of manufacturing organic light-emitting display apparatus using the same, and organic light-emitting display apparatus manufactured using the method
US9496524B2 (en) 2012-07-10 2016-11-15 Samsung Display Co., Ltd. Organic layer deposition apparatus, method of manufacturing organic light-emitting display apparatus using the same, and organic light-emitting display apparatus manufactured using the method
US9466647B2 (en) 2012-07-16 2016-10-11 Samsung Display Co., Ltd. Flat panel display device and method of manufacturing the same
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US9887378B2 (en) 2012-08-17 2018-02-06 Samsung Display Co., Ltd. Organic light-emitting display apparatus and method of manufacturing the same
US8945974B2 (en) 2012-09-20 2015-02-03 Samsung Display Co., Ltd. Method of manufacturing organic light-emitting display device using an organic layer deposition apparatus
US8900976B2 (en) 2012-09-21 2014-12-02 Samsung Display Co., Ltd. Organic layer deposition apparatus, organic light-emitting display apparatus, and method of manufacturing the organic light-emitting display apparatus
US9012258B2 (en) 2012-09-24 2015-04-21 Samsung Display Co., Ltd. Method of manufacturing an organic light-emitting display apparatus using at least two deposition units
US9306191B2 (en) 2012-10-22 2016-04-05 Samsung Display Co., Ltd. Organic light-emitting display apparatus and method of manufacturing the same
US8969858B2 (en) 2012-11-08 2015-03-03 Samsung Display Co., Ltd. Organic light emitting display apparatus and method of manufacturing the same
US8945979B2 (en) 2012-11-09 2015-02-03 Samsung Display Co., Ltd. Organic layer deposition apparatus, method of manufacturing organic light-emitting display apparatus by using the same, and organic light-emitting display apparatus manufactured by the method
US9136476B2 (en) 2013-03-20 2015-09-15 Samsung Display Co., Ltd. Method of manufacturing organic light-emitting display apparatus, and organic light-emitting display apparatus manufactured by the method
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US9534288B2 (en) 2013-04-18 2017-01-03 Samsung Display Co., Ltd. Deposition apparatus, method of manufacturing organic light-emitting display apparatus by using same, and organic light-emitting display apparatus manufactured by using deposition apparatus
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US8962360B2 (en) 2013-06-17 2015-02-24 Samsung Display Co., Ltd. Organic layer deposition apparatus and method of manufacturing organic light-emitting display device by using the organic layer deposition apparatus
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US9496317B2 (en) 2013-12-23 2016-11-15 Samsung Display Co., Ltd. Method of manufacturing organic light emitting display apparatus

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