JP2003287215A - Operation method for heat accumulation type exhaust gas treatment facility - Google Patents

Operation method for heat accumulation type exhaust gas treatment facility

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Publication number
JP2003287215A
JP2003287215A JP2002090919A JP2002090919A JP2003287215A JP 2003287215 A JP2003287215 A JP 2003287215A JP 2002090919 A JP2002090919 A JP 2002090919A JP 2002090919 A JP2002090919 A JP 2002090919A JP 2003287215 A JP2003287215 A JP 2003287215A
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JP
Japan
Prior art keywords
exhaust gas
heat storage
gas treatment
chamber
type exhaust
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2002090919A
Other languages
Japanese (ja)
Other versions
JP3957542B2 (en
Inventor
Kazuhiko Fujimoto
和彦 藤本
Original Assignee
Chugai Ro Co Ltd
中外炉工業株式会社
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Filing date
Publication date
Application filed by Chugai Ro Co Ltd, 中外炉工業株式会社 filed Critical Chugai Ro Co Ltd
Priority to JP2002090919A priority Critical patent/JP3957542B2/en
Publication of JP2003287215A publication Critical patent/JP2003287215A/en
Application granted granted Critical
Publication of JP3957542B2 publication Critical patent/JP3957542B2/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Abstract

<P>PROBLEM TO BE SOLVED: To prevent clogging of a heat accumulation chamber by silica caused by reduction of an amount of exhaust gas when the exhaust gas containing organic silicone and a harmful component is treated at a heat accumulation type exhaust gas treatment facility. <P>SOLUTION: In the operation method for a heat accumulation type exhaust gas treatment facility, when the exhaust gas containing the organic silicone and the harmful component is subjected to a deodorant treatment, two or more of the heat accumulation type exhaust gas treatment devices TA, TB are provided in parallel, the number of the heat accumulation type exhaust gas treatment devices operated corresponding to a generation amount of the exhaust gas is changed and a cross section pausing speed of the gas at the heat accumulation chamber of the heat accumulation type exhaust gas treatment device is retained at a predetermined speed or higher. <P>COPYRIGHT: (C)2004,JPO

Description

【発明の詳細な説明】Detailed Description of the Invention
【0001】[0001]
【発明の属する技術分野】本発明は、蓄熱式排ガス処理
設備の操業方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of operating a heat storage type exhaust gas treatment facility.
【0002】[0002]
【従来の技術】塗装乾燥炉や金属熱処理炉等からの排ガ
スには、有機溶剤、可塑剤、油分あるいは界面活性剤等
の他、それらが熱分解して発生した高沸点、高分子のヤ
ニ成分や、アンモニア、硫化水素、あるいはダイオキシ
ン類等の有害成分が含有されている。
2. Description of the Related Art Exhaust gas from a paint drying furnace, a metal heat treatment furnace, etc. contains organic solvents, plasticizers, oils, surfactants, etc. It also contains harmful components such as ammonia, hydrogen sulfide, and dioxins.
【0003】したがって、従来、一般に、前記有害成分
を含有する前記排ガスは、蓄熱式排ガス処理装置に供給
して前記有害成分を加熱分解して無害化したのち排気塔
から大気放散している。
Therefore, conventionally, the exhaust gas containing the harmful component is generally supplied to a heat storage type exhaust gas treating apparatus to thermally decompose the harmful component to render it harmless, and then diffused to the atmosphere from an exhaust tower.
【0004】すなわち、前記蓄熱式排ガス処理装置T’
は、図2に示すように、一端部が燃焼室2に連通する少
なくとも2以上の蓄熱室3(3a,3b,3c,3d)
と、これら蓄熱室3の他端部に設けられた回転式分配弁
V’とからなり、排ガス源Ga,Gbからの排ガスを排
ガス供給ダクトP’aから処理ファンFにより前記回転
式分配弁V’を介して前記蓄熱室3のいずれか、たとえ
ば、蓄熱室3a,3bに供給して蓄熱体Sで予熱したう
えで燃焼室2に供給し、ここで有害成分をケーシング1
に設けたバーナ4により加熱分解して無害化し、無害化
された処理ガスを他の蓄熱室3c,3dを通過させ、該
蓄熱体Sと熱交換させて降温したのち前記回転式分配弁
V’を介して処理ガス排気ダクトP’bに排出し、排気
塔5から大気放散する。
That is, the heat storage type exhaust gas treatment device T '
As shown in FIG. 2, at least two heat storage chambers 3 (3a, 3b, 3c, 3d) each having one end communicating with the combustion chamber 2
And a rotary distribution valve V'provided at the other end of the heat storage chamber 3, the exhaust gas from the exhaust gas sources Ga and Gb is supplied from the exhaust gas supply duct P'a to the processing fan F by the rotary distribution valve V '. Through the heat storage chamber 3 to, for example, the heat storage chambers 3a, 3b to be preheated by the heat storage body S and then supplied to the combustion chamber 2 where harmful components are contained.
The heat-decomposed and detoxified by the burner 4 provided in the above, the detoxified processing gas is passed through the other heat storage chambers 3c and 3d, the heat is exchanged with the heat storage body S to lower the temperature, and the rotary distribution valve V ′ Through the exhaust gas to the processing gas exhaust duct P′b, and is emitted to the atmosphere from the exhaust tower 5.
【0005】そして、所定時間が経過すると、前記回転
式分配弁V’を駆動させて流路を順次切換え、前工程で
処理ガスにより加熱された蓄熱体Sを内蔵する蓄熱室3
c,3dから排ガスを供給して予熱する一方、前工程で
排ガスにより冷却された蓄熱体Sを内蔵する蓄熱室3
a,3bに高温の処理ガスを供給し、処理ガスを降温さ
せて大気に放散する工程を繰り返す。
After a lapse of a predetermined time, the rotary distribution valve V'is driven to sequentially switch the flow paths, and the heat storage chamber 3 containing the heat storage body S heated by the processing gas in the previous step is built in.
The heat storage chamber 3 in which the exhaust gas is supplied from c and 3d to be preheated, while the heat storage body S cooled by the exhaust gas in the previous step is built therein.
The process of supplying a high-temperature processing gas to a and 3b, lowering the temperature of the processing gas, and discharging it to the atmosphere is repeated.
【0006】なお、前記蓄熱体Sはセラミック製のハニ
カム状の蓄熱部材を複数段積層したもの、セラミック製
あるいは金属製の球状の蓄熱部材を所定高さに積層した
もの、さらには、セラミック製または金属製のパイプを
所定長さに切断したもの等で構成されている。
The heat storage element S is formed by stacking a plurality of ceramic honeycomb heat storage members in a plurality of layers, stacking a ceramic or metal spherical heat storage member at a predetermined height, and further making a ceramic or It is configured by cutting a metal pipe into a predetermined length.
【0007】[0007]
【発明が解決しようとする課題】ところで、前記排ガス
中に有機シリコンが含有されている場合があるが、この
場合、排ガス中の有機シリコンは前工程において処理ガ
スの通過により高温となった蓄熱体Sを有する蓄熱室3
中を通過する際に250℃以上に加熱されると結晶状シ
リコン(Si)となり、450℃以上に加熱されると微
粉状の酸化シリコン(SiO:以下、シリカと称す)
となる。
By the way, there are cases where the exhaust gas contains organic silicon. In this case, the organic silicon in the exhaust gas has a high temperature due to the passage of the processing gas in the previous step. Heat storage chamber 3 having S
When it is heated to 250 ° C or higher while passing through it, it becomes crystalline silicon (Si), and when it is heated to 450 ° C or higher, fine powdery silicon oxide (SiO 2 : hereinafter referred to as silica).
Becomes
【0008】前記結晶状シリコンは蓄熱体Sの表面、特
に、蓄熱体Sの燃焼室2側の端面に付着しやすいため、
蓄熱体Sの表面で成長し、やがて蓄熱室3のガス通路を
閉塞させる。また、蓄熱体Sの表面に前記結晶状シリコ
ンが形成されると、前記シリカは微粉末であるので、こ
れが障害となってシリカの通過を妨害し、結晶状シリコ
ンの周囲にシリカが堆積してガス通路の閉塞を助長す
る。さらに、前記蓄熱体Sの燃焼室側の端面は蓄熱体S
の中で最も温度が高いので、燃焼室2に面した部分に形
成された結晶状シリコンや結晶状シリコンの周りに堆積
したシリカは、この熱により焼成固着してしまう課題を
有する。
Since the crystalline silicon easily adheres to the surface of the heat storage body S, particularly to the end surface of the heat storage body S on the combustion chamber 2 side,
It grows on the surface of the heat storage body S and eventually closes the gas passage of the heat storage chamber 3. Further, when the crystalline silicon is formed on the surface of the heat storage body S, since the silica is fine powder, this impedes the passage of the silica and the silica is deposited around the crystalline silicon. Helps close the gas passages. Further, the end surface of the heat storage body S on the combustion chamber side is the heat storage body S.
Since the temperature is the highest among the above, the crystalline silicon formed in the portion facing the combustion chamber 2 and the silica deposited around the crystalline silicon have a problem of being baked and fixed by this heat.
【0009】前記課題を解決する手段として、本出願人
は、特願2000−247496にて、蓄熱式排ガス処
理装置の燃焼室の温度を750℃以上850℃以下に維
持すること、すなわち、蓄熱体における排ガスの断面通
過速度を所定速度以上(たとえば、2.3m/秒)維持
する方法、さらに、前記排ガスに希釈空気を混合し、蓄
熱室への排ガスの供給量を増やして蓄熱室における排ガ
スの断面通過速度を所定速度以上に保持する方法を提案
している。
As a means for solving the above-mentioned problems, the applicant of the present application has disclosed in Japanese Patent Application No. 2000-247496 that the temperature of the combustion chamber of the heat storage type exhaust gas treatment device is maintained at 750 ° C. or higher and 850 ° C. or lower, that is, the heat storage body. Of maintaining the cross-sectional velocity of the exhaust gas at a predetermined speed or higher (for example, 2.3 m / sec), and further, by mixing dilution air with the exhaust gas to increase the supply amount of the exhaust gas to the heat storage chamber, A method for keeping the cross-section passing speed above a predetermined speed is proposed.
【0010】しかしながら、前述の方法は、蓄熱式排ガ
ス処理装置にその装置の定格処理量に相当する排ガスが
常時供給されていることが前提条件となるため、上流側
の工程で排ガスの発生量が低下した場合、下記の課題を
払拭することができない。
However, in the above-mentioned method, since the exhaust gas corresponding to the rated throughput of the heat storage type exhaust gas treatment apparatus is always supplied to the heat storage type exhaust gas treatment apparatus, the amount of exhaust gas generated in the upstream process is If it decreases, the following problems cannot be eliminated.
【0011】前者では、排ガス供給量が少なくなると、
前記蓄熱室におけるガスの断面通過速度を所定速度に維
持できなくなり、つまり、排ガスの蓄熱室を通過する時
間が長くなって前記理由により、蓄熱室のガス通路をシ
リカにより閉塞させてしまうという課題を有する。
In the former case, when the exhaust gas supply amount decreases,
It becomes impossible to maintain the cross-sectional passage speed of the gas in the heat storage chamber at a predetermined speed, that is, the time for the exhaust gas to pass through the heat storage chamber becomes long, and for the above reason, the gas passage of the heat storage chamber is blocked by silica. Have.
【0012】また、後者では、排ガスの発生量の低下に
伴って該排ガスに混合する前記希釈空気の供給量を増や
す必要があるが、希釈空気の供給量を増大すると、排ガ
ス中の有害成分濃度が自然限界濃度より低くなり燃焼室
の雰囲気温度が低下するので、燃焼室に設けたバーナの
燃焼時間が長くなったり、バーナの燃焼量を高くする必
要があるので燃料消費量が増大してしまうという課題を
有する。
Further, in the latter case, it is necessary to increase the supply amount of the dilution air mixed with the exhaust gas as the generation amount of the exhaust gas decreases. However, when the supply amount of the dilution air is increased, the concentration of harmful components in the exhaust gas is increased. Is lower than the natural limit concentration, and the ambient temperature in the combustion chamber decreases, so the combustion time of the burner installed in the combustion chamber becomes longer, and the combustion amount of the burner must be increased, resulting in an increase in fuel consumption. Has the problem.
【0013】したがって、本発明は、上流側の工程にお
ける排ガスの発生量が低下した場合でも、蓄熱室のガス
通路を閉塞させることなく、しかも、燃料消費量を増大
させることのない蓄熱式排ガス処理設備の操業方法を提
供することを目的とする。
Therefore, according to the present invention, the heat storage type exhaust gas treatment does not block the gas passage of the heat storage chamber and does not increase the fuel consumption even when the amount of exhaust gas generated in the upstream process is reduced. The purpose is to provide a method of operating equipment.
【0014】[0014]
【課題を解決するための手段】本発明は前記目的を達成
するために、蓄熱体を内蔵する蓄熱室を少なくとも2室
以上備え、各蓄熱室の一端部を加熱手段を有する燃焼室
に連通するとともに、他端部を排ガス供給ダクトと処理
ガス排気ダクトに分配弁を介して連通し、有機シリコン
および有害成分を含有する排ガスを、前記分配弁の駆動
により一部の蓄熱室へ供給し、前記燃焼室内で有害成分
を加熱分解した処理ガスを残りの蓄熱室を介して熱交換
したのち処理ガス排気ダクトから排出する工程を順次実
施する蓄熱式排ガス処理装置を2基以上並設した蓄熱式
排ガス処理設備において、排ガスの発生量に応じた数の
蓄熱式排ガス処理装置の分配弁を駆動して排ガスを当該
蓄熱式排ガス処理装置の所定蓄熱室を介して予熱したの
ち燃焼室にて有害成分を加熱分解し、生じた処理ガスを
残る蓄熱室を介して熱交換させて脱臭処理する蓄熱式排
ガス処理設備の操業方法である。
In order to achieve the above-mentioned object, the present invention comprises at least two heat storage chambers containing a heat storage body, and one end of each heat storage chamber communicates with a combustion chamber having a heating means. Together, the other end is communicated with the exhaust gas supply duct and the treated gas exhaust duct via a distribution valve, the exhaust gas containing organic silicon and harmful components is supplied to a part of the heat storage chamber by driving the distribution valve, Heat storage type exhaust gas in which two or more heat storage type exhaust gas treatment devices are installed in parallel to sequentially perform the process of exchanging heat of the process gas obtained by thermally decomposing harmful components in the combustion chamber through the remaining heat storage chamber and then discharging from the process gas exhaust duct. In the treatment equipment, the number of distribution valves of the heat storage type exhaust gas treatment device is driven according to the amount of exhaust gas generated, the exhaust gas is preheated through the predetermined heat storage chamber of the heat storage type exhaust gas treatment device, and then harmful in the combustion chamber. Min heating decompose a regenerative operation method of exhaust gas treatment equipment for deodorizing by heat exchange through the regenerator remaining processing gas generated.
【0015】また、前記蓄熱式排ガス処理装置を、1つ
のケーシング内に隔壁により複数区画に分割した分割室
内に各々設置するとともに、処理ガス排気ダクトから分
岐した循環ダクトを前記分配弁に接続し、排ガスの発生
量に応じた数の蓄熱式排ガス処理装置の蓄熱室に供給し
て脱臭するに際し、排ガスの供給が停止状態にある分配
弁を介して前記循環ダクトから気体を蓄熱室に循環供給
し、運転状態の燃焼室圧力と停止状態の燃焼室圧力とを
同圧に保持しながら排ガスを脱臭処理する蓄熱式排ガス
処理設備の操業方法である。
Further, the heat storage type exhaust gas treatment device is installed in each of the divided chambers divided into a plurality of compartments by a partition in one casing, and a circulation duct branched from a treated gas exhaust duct is connected to the distribution valve, When supplying to the heat storage chamber of the heat storage type exhaust gas treatment device of the number corresponding to the amount of generated exhaust gas to deodorize, gas is circulated and supplied from the circulation duct to the heat storage chamber via the distribution valve in which the supply of exhaust gas is stopped. Is a method for operating a heat storage type exhaust gas treatment facility for deodorizing exhaust gas while maintaining the combustion chamber pressure in the operating state and the combustion chamber pressure in the stopped state at the same pressure.
【0016】[0016]
【発明の実施の形態】つぎに、本発明の実施の形態を図
にしたがって説明する。図1は、本発明の第1の実施形
態を示し、蓄熱式排ガス処理設備Tを構成する第1蓄熱
式排ガス処理装置TAと第2蓄熱式排ガス処理装置TB
を1つのケーシング11内を隔壁12により複数区画
(図では2区画)に区画された区画室13A,13B内
に設置した構成となっている。
DESCRIPTION OF THE PREFERRED EMBODIMENTS Next, embodiments of the present invention will be described with reference to the drawings. FIG. 1 shows a first embodiment of the present invention, in which a first heat storage type exhaust gas treatment device TA and a second heat storage type exhaust gas treatment device TB which constitute a heat storage type exhaust gas treatment facility T are shown.
The inside of one casing 11 is installed in the compartments 13A and 13B divided into a plurality of compartments (two compartments in the figure) by the partition wall 12.
【0017】前記蓄熱式排ガス処理装置TAは、1つの
区画室13A内に蓄熱体Sを内蔵する4つの蓄熱室15
A(15a,15b,15c,15d)を、その一端部
を加熱手段であるバーナ16Aを備えた第1燃焼室14
Aに連通し、他端部を駆動機構Mにより作動する回転式
分配弁VAを介して排ガス供給ダクトPaと処理ガス
排気ダクトPaに連通させたものである。
The heat storage type exhaust gas treatment apparatus TA has four heat storage chambers 15 in each of which a heat storage body S is built in one compartment 13A.
A (15a, 15b, 15c, 15d), the first combustion chamber 14 provided with a burner 16A as a heating means at one end thereof.
The exhaust gas supply duct Pa 1 and the process gas exhaust duct Pa 2 are communicated with each other through the rotary distribution valve VA whose other end is operated by the drive mechanism M.
【0018】また、前記蓄熱式排ガス処理装置TBも、
蓄熱式排ガス処理装置TAと同様構成からなり、区画室
13B内に蓄熱体Sを内蔵する4つの蓄熱室15B(1
5e,15f,15g,15h)を、その一端部をバー
ナ16Bを備えた第2燃焼室14Bに連通し、他端部を
前記駆動機構Mにより作動する回転式分配弁VBを介し
て排ガス供給ダクトPbと処理ガス排気ダクトPb
に連通させたものである。
The heat storage type exhaust gas treatment device TB is also
Four heat storage chambers 15B (1 having the same structure as the heat storage type exhaust gas treatment device TA and having the heat storage body S built in the compartment 13B)
5e, 15f, 15g, 15h), one end of which communicates with the second combustion chamber 14B having the burner 16B, and the other end of which is connected via the rotary distribution valve VB operated by the drive mechanism M to the exhaust gas supply duct. Pb 1 and process gas exhaust duct Pb 2
It was made to communicate with.
【0019】なお、前記バーナ16A,16Bは第1燃
焼室14Aあるいは第2燃焼室14Bの温度が所定温度
となるようにそれぞれ温度計TEと温度調節計TICに
よりその燃焼量を制御されるものである。
The burners 16A and 16B are those whose combustion amount is controlled by a thermometer TE and a temperature controller TIC so that the temperature of the first combustion chamber 14A or the second combustion chamber 14B becomes a predetermined temperature. is there.
【0020】前記各排ガス供給ダクトPa,Pb
は、途中に分配弁入口遮断弁Va,Vbを備え、
その上流側は1本の排ガス集合供給ダクトPAを介して
異なる排ガス源Ga,Gbに連通している。
Each of the exhaust gas supply ducts Pa 1 , Pb
1 is equipped with distribution valve inlet shutoff valves Va 1 and Vb 1 on the way,
The upstream side thereof communicates with different exhaust gas sources Ga and Gb via one exhaust gas collective supply duct PA.
【0021】また、前記排ガス集合供給ダクトPAには
上流側から圧力発信器PEと、圧力調節計PICと、希
釈弁Vと、前記圧力調節計PICからの信号により回
転数制御される処理ファンFとを備えている。
A pressure transmitter PE, a pressure regulator PIC, a dilution valve V 1, and a processing fan whose number of revolutions is controlled by signals from the pressure regulator PIC are arranged upstream from the exhaust gas collecting and supplying duct PA. It has F and.
【0022】さらに、前記各回転式分配弁VA,VBの
処理ガス排出部はそれぞれの処理ガス排気ダクトP
,Pbを通って先端が排気塔17に接続する処理
ガス集合排気ダクトPBに連通している。前記処理ガス
排気ダクトPa,Pbには分配弁出口遮断弁V
,Vbが設けられている。
Further, the processing gas discharge portion of each rotary distribution valve VA, VB has a processing gas exhaust duct P.
The front end communicates with the process gas collective exhaust duct PB connected to the exhaust tower 17 through a 2 and Pb 2 . The process gas exhaust ducts Pa 2 and Pb 2 have distribution valve outlet cutoff valves V
a 2 and Vb 2 are provided.
【0023】なお、前記処理ガス排気ダクトPa,P
の前記回転式分配弁VA,VBと分配弁出口遮断弁
Va,Vbとの間から前記回転式分配弁VA,VB
の排ガス供給部に処理ガス循環ダクトPc,Pc
設けられ、この処理ガス循環ダクトPc,Pcには
処理ガス排気ダクトPa,Pb側から処理ガス遮断
弁V2a,V2bと循環ファンFa,Fbが設けられる
とともに、前記循環ファンFa,Fbには遮断弁
3a,V3bを備えたパージダクトPd,Pd
設けられている。
The processing gas exhaust ducts Pa 2 , P 2
b 2 between the rotary distribution valves VA and VB and the distribution valve outlet shutoff valves Va 2 and Vb 2 from the rotary distribution valves VA and VB.
Processing the exhaust gas supply unit the gas circulation duct Pc 1 of, Pc 2 is provided, the process gas circulation duct Pc 1, Pc is the second process gas exhaust duct Pa 2, Pb 2 side from the processing gas shutoff valve V 2a, V 2b And circulation fans Fa and Fb, and the circulation fans Fa and Fb are provided with purge ducts Pd 1 and Pd 2 having cutoff valves V 3a and V 3b .
【0024】つぎに、前記構成からなる蓄熱式排ガス処
理設備Tの操業方法について説明する。まず、前記両第
1,第2燃焼室14A,14Bがバーナ16A,16B
により所定温度に昇温されており、しかも、処理すべき
排ガス量が蓄熱式排ガス処理設備Tの定格処理量である
とする。
Next, a method of operating the heat storage type exhaust gas treatment facility T having the above-mentioned structure will be described. First, the first and second combustion chambers 14A and 14B are burners 16A and 16B.
Therefore, the exhaust gas amount to be treated is the rated treatment amount of the heat storage type exhaust gas treatment facility T.
【0025】この場合、希釈弁Vを閉、分配弁入口遮
断弁Va,Vbと分配弁出口遮断弁Va,Vb
をそれぞれ開とし、処理ファンFおよび駆動機構Mによ
り両回転式分配弁VA,VBを所定時間間隔で間欠回転
させる。
In this case, the dilution valve V 1 is closed, the distribution valve inlet cutoff valves Va 1 and Vb 1 and the distribution valve outlet cutoff valves Va 2 and Vb 2 are closed.
Are opened, and the processing fan F and the drive mechanism M intermittently rotate both rotary distribution valves VA and VB at predetermined time intervals.
【0026】前記排ガス源Ga,Gbからの排ガスは各
回転式分配弁VA,VBを介して、たとえば、蓄熱室1
5a,15bと15e,15fを通過して予熱されて第
1燃焼室14Aと第2燃焼室14Bに至り、ここで有機
溶剤等が加熱分解される。
Exhaust gas from the exhaust gas sources Ga and Gb passes through the rotary distribution valves VA and VB, for example, the heat storage chamber 1
After passing through 5a, 15b, 15e, and 15f, they are preheated and reach the first combustion chamber 14A and the second combustion chamber 14B, where the organic solvent and the like are thermally decomposed.
【0027】前記のようにして、有機溶剤等が加熱分解
された処理ガスは、残る蓄熱室15c,15d,15
g,15hの蓄熱体Sと熱交換され、所定温度に降温し
たのち回転式分配弁VA,VBの処理ガス排出部から処
理ガス排気ダクトPa,Pb を経て排気塔17から
大気に放散される。
As described above, the organic solvent is decomposed by heating.
The treated gas is stored in the remaining heat storage chambers 15c, 15d, 15
Heat is exchanged with the heat storage body S of g, 15h, and the temperature is lowered to a predetermined temperature.
After that, the rotary distribution valves VA and VB are processed from the process gas discharge section.
Physical gas exhaust duct PaTwo, Pb TwoFrom the exhaust tower 17
Dissipated into the atmosphere.
【0028】所定時間経過すると、前記回転式分配弁V
A,VBが切換わり、蓄熱室15c,15d,15g,
15hで排ガスの予熱を、蓄熱室15a,15b,15
e,15fで処理ガスと熱交換を行なって排気塔17か
ら大気に放散される。
After a predetermined time has passed, the rotary distribution valve V
A and VB are switched, the heat storage chambers 15c, 15d, 15g,
Preheating of the exhaust gas in 15h, the heat storage chamber 15a, 15b, 15
Heat is exchanged with the processing gas at e and 15f, and the heat is released from the exhaust tower 17 to the atmosphere.
【0029】前記の場合は、排ガス量が十分であるた
め、第1,第2蓄熱室15A,15Bにおけるガスの断
面通過速度を所定速度に維持できるため、各蓄熱室15
A,15Bのガス通路が閉塞されることはない。
In the above case, since the amount of exhaust gas is sufficient, the cross-sectional passage speed of the gas in the first and second heat storage chambers 15A and 15B can be maintained at a predetermined speed, so that each heat storage chamber 15
The gas passages of A and 15B are not blocked.
【0030】つぎに、たとえば、排ガス源Ga,Gbの
うちの一方が排ガスの発生を停止し、蓄熱式排ガス処理
装置TA,TBへ供給される排ガス量が定格処理量以下
となった場合について説明する。
Next, for example, the case where one of the exhaust gas sources Ga and Gb stops the generation of exhaust gas and the amount of exhaust gas supplied to the heat storage type exhaust gas treatment devices TA and TB becomes equal to or less than the rated treatment amount will be described. To do.
【0031】この場合、排ガス供給量が大幅に減少する
ため、前記圧力調節計PICからの信号にもとづいて、
たとえば、排ガス供給ダクトPbに設けた分配弁入口
遮断弁Vb,処理ガス排気ダクトPbに設けた分配
弁出口遮断弁Vbを閉とし、排ガスを回転式分配弁V
Aから蓄熱室15a,15bを介して第1燃焼室14A
に供給して加熱分解させ、他方の蓄熱室15c,15d
で処理ガスと熱交換を行なって排気塔17から大気に放
散することを所定時間毎に切換えて行なう。
In this case, since the exhaust gas supply amount is greatly reduced, based on the signal from the pressure regulator PIC,
For example, dispensing valve inlet shutoff valve Vb 1 provided in an exhaust gas supply duct Pb 1, a dispensing valve outlet shutoff valve Vb 2 provided in the process gas exhaust duct Pb 2 is closed, the exhaust gas a rotary distribution valve V
The first combustion chamber 14A from A through the heat storage chambers 15a and 15b
To the other heat storage chamber 15c, 15d
The heat exchange with the processing gas and the emission from the exhaust tower 17 to the atmosphere are switched every predetermined time.
【0032】このように、排ガス供給量に応じた数の燃
焼室で燃焼脱臭するから、排ガス(処理ガス)が流通す
る蓄熱室におけるガスの断面通過速度は所定速度に維持
され、蓄熱室のガス通路が閉塞することはない。
In this way, since combustion and deodorization are performed in the number of combustion chambers corresponding to the amount of exhaust gas supplied, the cross-section passing speed of the gas in the heat storage chamber in which the exhaust gas (processing gas) flows is maintained at a predetermined speed, and the gas in the heat storage chamber is maintained. The passage is never blocked.
【0033】しかしながら、排ガス供給量が少なく、一
部の燃焼室で排ガスを処理する場合、他の燃焼室との圧
力に圧力差、すなわち、たとえば、第1燃焼室14A内
の圧力が第2燃焼室14B内の圧力より高い状態が長時
間続き、これにより隔壁12が損傷する危険性がある。
However, when the exhaust gas is supplied in a small amount and the exhaust gas is processed in a part of the combustion chambers, the pressure difference between the pressures of the other combustion chambers, that is, for example, the pressure in the first combustion chamber 14A is the second combustion chamber. The pressure higher than the pressure in the chamber 14B continues for a long time, which may damage the partition wall 12.
【0034】したがって、このような場合、停止中の、
たとえば蓄熱式排ガス処理装置TB側の処理ガス遮断弁
bを開とするとともに、循環ファンFbを駆動する
ことにより回転式分配弁VBを介して残存する処理ガス
を蓄熱室15Bを介して燃焼室14Bに供給、循環させ
ることにより当該第2燃焼室14B内の圧力を上昇させ
て燃焼中の第1燃焼室14Aとの圧力差を出来るだけ少
なくして隔壁12の破損を防止するのが好ましい。
Therefore, in such a case, the
For example, the processing gas cutoff valve V 2 b on the side of the heat storage type exhaust gas treatment device TB is opened, and the processing gas remaining via the rotary distribution valve VB is combusted via the heat storage chamber 15B by driving the circulation fan Fb. It is preferable that the pressure in the second combustion chamber 14B be increased by supplying and circulating the same to the chamber 14B to minimize the pressure difference between the second combustion chamber 14B and the first combustion chamber 14A during combustion to prevent the partition wall 12 from being damaged. .
【0035】なお、前記説明では、排ガス供給量が大幅
に変更された場合について説明したが、許容範囲内であ
れば、排ガス供給量の減少に応じて希釈弁Vから空気
を供給して見掛けの排ガス供給量を所定の定格処理量と
して操業してもよい。
In the above description, the case where the exhaust gas supply amount is significantly changed has been described. However, if the exhaust gas supply amount is within the allowable range, air is apparently supplied from the dilution valve V 1 according to the decrease in the exhaust gas supply amount. The exhaust gas supply amount may be used as a predetermined rated throughput.
【0036】また、前記説明では、排ガスの蓄熱室15
A,15Bへの供給と処理ガスの蓄熱室15A,15B
からの排出を回転式分配弁VA,VBの駆動により連続
して間欠的に切換えて行なう場合について述べたが、回
転式分配弁VA,VBの切換えにあたり、排ガス供給側
の分配弁入口遮断弁VaあるいはVbを閉、処理ガ
ス遮断弁V2aあるいは遮断弁V2bを開として、循環
ファンFaあるいはFbを駆動して蓄熱室15A,15
B内に存在する排ガスを処理ガスで完全に第1燃焼室1
4A、第2燃焼室14Bにパージしてから回転式分配弁
VA,VBを切換えて、処理ガス中への排ガスの混入を
防止するのが好ましい。
In the above description, the exhaust gas heat storage chamber 15 is used.
Heat storage chambers 15A and 15B for supplying and processing gas to A and 15B
The discharge from the rotary distribution valves VA and VB is continuously and intermittently switched. However, when switching the rotary distribution valves VA and VB, the distribution valve inlet cutoff valve Va on the exhaust gas supply side is described. 1 or Vb 1 is closed and the processing gas shutoff valve V 2a or shutoff valve V 2b is opened, and the circulation fan Fa or Fb is driven to store the heat storage chambers 15A, 15A.
The exhaust gas existing in B is completely treated with the processing gas in the first combustion chamber 1
4A and the second combustion chamber 14B are preferably purged, and then the rotary distribution valves VA and VB are switched to prevent the exhaust gas from being mixed into the processing gas.
【0037】この場合、処理ガスに代えて遮断弁V
a,Vbを開として空気により排ガスをパージして
もよい。
In this case, the shutoff valve V is used instead of the processing gas.
The exhaust gas may be purged with air by opening 3 a and V 3 b.
【0038】さらに、第1,第2燃焼室14A,14B
と、処理ガス集合ダクトPBとの間にホットバイパスダ
クトPCを設け、このホットバイパスダクトPCに熱交
換器18を配設し、温度調節計TICによりホットバイ
パス弁Vを制御するようにして余剰熱量を回収するよ
うにしてもよい。
Further, the first and second combustion chambers 14A, 14B
And a processing gas collecting duct PB, a hot bypass duct PC is provided, the heat exchanger 18 is arranged in the hot bypass duct PC, and the hot bypass valve V 4 is controlled by the temperature controller TIC. The amount of heat may be recovered.
【0039】前記第1の実施形態では、複数の蓄熱式排
ガス処理装置TA,TBを1つのケーシング11内に隔
壁12により区画された区画室13A,13B内に設置
した場合であるが、各蓄熱式排ガス処理装置TA,TB
を独立した個々のケーシング内に設けた形式としてもよ
い。ただし、この場合、隔壁12を有さないため、一部
の蓄熱式排ガス処理装置TA,TBを使用する場合にお
いて、残りの蓄熱式排ガス処理装置内に処理ガス等を供
給して内圧を高める必要がないことは勿論である。
In the first embodiment, a plurality of heat storage type exhaust gas treatment devices TA, TB are installed in compartments 13A, 13B divided by the partition wall 12 in one casing 11. Type exhaust gas treatment equipment TA, TB
May be provided in an independent individual casing. However, in this case, since the partition wall 12 is not provided, when using some of the heat storage type exhaust gas treatment devices TA and TB, it is necessary to supply a process gas or the like into the remaining heat storage type exhaust gas treatment devices to increase the internal pressure. Of course there is no.
【0040】[0040]
【発明の効果】以上の説明で明らかなように、請求項1
の発明では、有機シリコンおよび有害成分を含有する排
ガスを脱臭処理するにあたり、蓄熱式排ガス処理装置を
2基以上並設し、排ガス発生量に応じて操業する蓄熱式
排ガス処理装置台数を変え、蓄熱式排ガス処理装置の蓄
熱室でのガスの断面通過速度を所定速度以上に保持する
ため、シリカの蓄熱体への付着を防止して蓄熱室のガス
通路がシリカにより閉塞されることが防止できる。
As is apparent from the above description, claim 1
In the invention of 2, when deodorizing exhaust gas containing organic silicon and harmful components, two or more heat storage type exhaust gas processing devices are installed in parallel, and the number of heat storage type exhaust gas processing devices to be operated varies according to the amount of exhaust gas generated Since the cross-sectional passage speed of the gas in the heat storage chamber of the exhaust gas treatment apparatus is maintained at a predetermined speed or higher, it is possible to prevent silica from adhering to the heat storage body and prevent the gas passage of the heat storage chamber from being blocked by silica.
【0041】また、請求項2の発明では、1つのケーシ
ング内に隔壁で複数の区画室を形成し、この区画室内に
前記蓄熱式排ガス処理装置を形成する場合、排ガス発生
量が減少し、ある蓄熱式排ガス処理装置を操業停止して
脱臭処理を行なうと、当該蓄熱式排ガス処理装置と操業
蓄熱式排ガス処理装置間で圧力差が生じ、隔壁が破損す
ることになるが、操業停止中の蓄熱式排ガス処理装置内
にガスを供給循環させるようにして前記圧力差をなくす
ため、隔壁の損傷を防止することができる。
According to the second aspect of the invention, when a plurality of compartments are formed by partition walls in one casing and the heat storage type exhaust gas treatment device is formed in the compartments, the exhaust gas generation amount is reduced. If the heat storage type exhaust gas treatment equipment is deactivated and deodorized, a pressure difference will occur between the heat storage type exhaust gas treatment equipment and the operation heat storage type exhaust gas treatment equipment, and the partition wall will be damaged. Since the gas is circulated in the exhaust gas treatment apparatus to eliminate the pressure difference, damage to the partition wall can be prevented.
【図面の簡単な説明】[Brief description of drawings]
【図1】 本発明を適用する蓄熱式排ガス処理設備の概
略図。
FIG. 1 is a schematic diagram of a heat storage type exhaust gas treatment facility to which the present invention is applied.
【図2】 従来の蓄熱式排ガス処理設備の概略図。FIG. 2 is a schematic diagram of a conventional heat storage type exhaust gas treatment facility.
【符号の説明】[Explanation of symbols]
11〜ケーシング、12〜隔壁、14A〜第1燃焼室、
14B〜第2燃焼室、15A,15B〜蓄熱室、16
A,16B〜バーナ、VA,VB〜回転式分配弁、G
a,Gb〜排ガス源、F〜処理ファン、Pa,Pb
〜排ガス供給ダクト、Pa,Pb〜処理ガス排気ダ
クト、TA,TB〜蓄熱式排ガス処理装置、Va,V
〜分配弁入口遮断弁、Va,Vb〜分配弁出口
遮断弁。
11-casing, 12-partition, 14A-first combustion chamber,
14B-second combustion chamber, 15A, 15B-heat storage chamber, 16
A, 16B ~ burner, VA, VB ~ rotary distribution valve, G
a, Gb-exhaust gas source, F-processing fan, Pa 1 , Pb 1
~ Exhaust gas supply duct, Pa 2, Pb 2 ~ process gas exhaust duct, TA, TB~ regenerative exhaust gas treatment apparatus, Va 1, V
b 1 to distribution valve inlet cutoff valve, Va 2 , Vb 2 to distribution valve outlet cutoff valve.

Claims (2)

    【特許請求の範囲】[Claims]
  1. 【請求項1】 蓄熱体を内蔵する蓄熱室を少なくとも2
    室以上備え、各蓄熱室の一端部を加熱手段を有する燃焼
    室に連通するとともに、他端部を排ガス供給ダクトと処
    理ガス排気ダクトに分配弁を介して連通し、有機シリコ
    ンおよび有害成分を含有する排ガスを、前記分配弁の駆
    動により一部の蓄熱室へ供給し、前記燃焼室内で有害成
    分を加熱分解した処理ガスを残りの蓄熱室を介して熱交
    換したのち処理ガス排気ダクトから排出する工程を順次
    実施する蓄熱式排ガス処理装置を2基以上並設した蓄熱
    式排ガス処理設備において、 排ガスの発生量に応じた数の蓄熱式排ガス処理装置の分
    配弁を駆動して排ガスを当該蓄熱式排ガス処理装置の所
    定蓄熱室を介して予熱したのち燃焼室にて有害成分を加
    熱分解し、生じた処理ガスを残る蓄熱室を介して熱交換
    させて脱臭処理することを特徴とする蓄熱式排ガス処理
    設備の操業方法。
    1. A heat storage chamber containing at least two heat storage bodies.
    Chamber and above, one end of each heat storage chamber communicates with a combustion chamber having a heating means, and the other end communicates with an exhaust gas supply duct and a treated gas exhaust duct via a distribution valve to contain organic silicon and harmful components The exhaust gas to be supplied is supplied to a part of the heat storage chamber by driving the distribution valve, and the process gas obtained by thermally decomposing harmful components in the combustion chamber is heat-exchanged through the remaining heat storage chamber and then discharged from the process gas exhaust duct. In a heat storage-type exhaust gas treatment facility in which two or more heat storage-type exhaust gas treatment devices that sequentially perform steps are installed in parallel, drive the distribution valves of the heat storage-type exhaust gas treatment devices in the number corresponding to the amount of generated exhaust gas A heat storage type characterized by preheating through a predetermined heat storage chamber of an exhaust gas treatment device, then thermally decomposing harmful components in the combustion chamber, and heat-decomposing the generated processing gas through the remaining heat storage chamber for deodorization. Exhaust gas treatment facility operation method.
  2. 【請求項2】 前記請求項1に記載の蓄熱式排ガス処理
    装置を、1つのケーシング内に隔壁により複数区画に分
    割した分割室内に各々設置するとともに、処理ガス排気
    ダクトから分岐した循環ダクトを前記分配弁に接続し、
    排ガスの発生量に応じた数の蓄熱式排ガス処理装置の蓄
    熱室に供給して脱臭するに際し、排ガスの供給が停止状
    態にある分配弁を介して前記循環ダクトから気体を蓄熱
    室に循環供給し、運転状態の燃焼室圧力と停止状態の燃
    焼室圧力とを同圧に保持しながら排ガスを脱臭処理こと
    を特徴とする蓄熱式排ガス処理設備の操業方法。
    2. The heat storage type exhaust gas treatment device according to claim 1 is installed in each of the divided chambers divided into a plurality of compartments by a partition in one casing, and a circulation duct branched from a treated gas exhaust duct is provided. Connected to the distribution valve,
    When supplying to the heat storage chamber of the heat storage type exhaust gas treatment device of the number corresponding to the amount of generated exhaust gas to deodorize, gas is circulated and supplied from the circulation duct to the heat storage chamber via the distribution valve in which the supply of exhaust gas is stopped. A method for operating a heat storage type exhaust gas treatment facility, characterized in that the exhaust gas is deodorized while the combustion chamber pressure in the operating state and the combustion chamber pressure in the stopped state are kept at the same pressure.
JP2002090919A 2002-03-28 2002-03-28 Operation method of regenerative exhaust gas treatment equipment Expired - Fee Related JP3957542B2 (en)

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WO2011036940A1 (en) * 2009-09-22 2011-03-31 新東工業株式会社 Regenerative thermal oxidization system and method for operating same
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