JP2003243358A5 - - Google Patents

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Publication number
JP2003243358A5
JP2003243358A5 JP2002035387A JP2002035387A JP2003243358A5 JP 2003243358 A5 JP2003243358 A5 JP 2003243358A5 JP 2002035387 A JP2002035387 A JP 2002035387A JP 2002035387 A JP2002035387 A JP 2002035387A JP 2003243358 A5 JP2003243358 A5 JP 2003243358A5
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JP
Japan
Prior art keywords
cleaning
plasma reaction
micropore
plasma
reaction product
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JP2002035387A
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English (en)
Japanese (ja)
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JP3876167B2 (ja
JP2003243358A (ja
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Priority to JP2002035387A priority Critical patent/JP3876167B2/ja
Priority claimed from JP2002035387A external-priority patent/JP3876167B2/ja
Priority to US10/361,570 priority patent/US6897161B2/en
Publication of JP2003243358A publication Critical patent/JP2003243358A/ja
Publication of JP2003243358A5 publication Critical patent/JP2003243358A5/ja
Application granted granted Critical
Publication of JP3876167B2 publication Critical patent/JP3876167B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2002035387A 2002-02-13 2002-02-13 洗浄方法および半導体装置の製造方法 Expired - Fee Related JP3876167B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2002035387A JP3876167B2 (ja) 2002-02-13 2002-02-13 洗浄方法および半導体装置の製造方法
US10/361,570 US6897161B2 (en) 2002-02-13 2003-02-11 Method of cleaning component in plasma processing chamber and method of producing semiconductor devices

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002035387A JP3876167B2 (ja) 2002-02-13 2002-02-13 洗浄方法および半導体装置の製造方法

Publications (3)

Publication Number Publication Date
JP2003243358A JP2003243358A (ja) 2003-08-29
JP2003243358A5 true JP2003243358A5 (https=) 2005-08-18
JP3876167B2 JP3876167B2 (ja) 2007-01-31

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JP2002035387A Expired - Fee Related JP3876167B2 (ja) 2002-02-13 2002-02-13 洗浄方法および半導体装置の製造方法

Country Status (2)

Country Link
US (1) US6897161B2 (https=)
JP (1) JP3876167B2 (https=)

Families Citing this family (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3958080B2 (ja) * 2002-03-18 2007-08-15 東京エレクトロン株式会社 プラズマ処理装置内の被洗浄部材の洗浄方法
KR101024044B1 (ko) * 2003-01-23 2011-03-22 가부시키가이샤 알박 성막 장치용 구성부품 및 그 세정 방법
US7045020B2 (en) * 2003-05-22 2006-05-16 Applied Materials, Inc. Cleaning a component of a process chamber
US7250114B2 (en) * 2003-05-30 2007-07-31 Lam Research Corporation Methods of finishing quartz glass surfaces and components made by the methods
US7192875B1 (en) * 2004-10-29 2007-03-20 Lam Research Corporation Processes for treating morphologically-modified silicon electrode surfaces using gas-phase interhalogens
KR100541867B1 (ko) * 2005-08-22 2006-01-11 (주)케이.씨.텍 상압 플라즈마 발생용 전극 제조방법 및 전극구조와 이를이용한 상압 플라즈마 발생장치
US7442114B2 (en) * 2004-12-23 2008-10-28 Lam Research Corporation Methods for silicon electrode assembly etch rate and etch uniformity recovery
US7247579B2 (en) 2004-12-23 2007-07-24 Lam Research Corporation Cleaning methods for silicon electrode assembly surface contamination removal
US7507670B2 (en) * 2004-12-23 2009-03-24 Lam Research Corporation Silicon electrode assembly surface decontamination by acidic solution
JP4813115B2 (ja) * 2005-07-14 2011-11-09 国立大学法人東北大学 半導体製造装置用部材及びその洗浄方法
US7912720B1 (en) * 2005-07-20 2011-03-22 At&T Intellectual Property Ii, L.P. System and method for building emotional machines
GB0610578D0 (en) * 2006-05-27 2006-07-05 Rolls Royce Plc Method of removing deposits
US7449072B1 (en) * 2006-07-20 2008-11-11 Tpl, Inc. Ultrasonic removal of materials from containers
US7767028B2 (en) 2007-03-14 2010-08-03 Lam Research Corporation Cleaning hardware kit for composite showerhead electrode assemblies for plasma processing apparatuses
US7578889B2 (en) * 2007-03-30 2009-08-25 Lam Research Corporation Methodology for cleaning of surface metal contamination from electrode assemblies
US8221552B2 (en) * 2007-03-30 2012-07-17 Lam Research Corporation Cleaning of bonded silicon electrodes
US8292698B1 (en) * 2007-03-30 2012-10-23 Lam Research Corporation On-line chamber cleaning using dry ice blasting
KR100892089B1 (ko) * 2007-10-04 2009-04-06 우범제 웨이퍼 세정 처리장치
US8276898B2 (en) * 2008-06-11 2012-10-02 Lam Research Corporation Electrode transporter and fixture sets incorporating the same
TWI368543B (en) * 2009-01-12 2012-07-21 Inotera Memories Inc A showerhead clean rack and a ultrasonic cleaning method thereof
US8673083B2 (en) * 2009-04-22 2014-03-18 Inotera Memories, Inc. Method of cleaning showerhead
JP5896915B2 (ja) * 2009-12-18 2016-03-30 ラム リサーチ コーポレーションLam Research Corporation プラズマチャンバで使用される上方電極から表面金属汚染を洗浄するための方法
DE102010005762A1 (de) * 2010-01-25 2011-07-28 Oerlikon Trading Ag, Trübbach Reinigungsverfahren für Beschichtungsanlagen
US9396912B2 (en) * 2011-10-31 2016-07-19 Lam Research Corporation Methods for mixed acid cleaning of showerhead electrodes
DE102013100473A1 (de) * 2013-01-17 2014-07-17 Seho Systemtechnik Gmbh Verfahren und Vorrichtung zum Reinigen einer Lötdüse
US20140261535A1 (en) * 2013-03-13 2014-09-18 Lam Research Corporation Standing Wave Generation in Holes to Enhance Cleaning in the Holes in Liquid Sonification Cleaning Systems
US10391526B2 (en) 2013-12-12 2019-08-27 Lam Research Corporation Electrostatic chuck cleaning fixture
JP2017528598A (ja) * 2014-08-28 2017-09-28 アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated マスク、キャリア、及び堆積ツールの構成要素から堆積材料を取り除くための剥脱プロセス
US9939501B2 (en) 2014-11-12 2018-04-10 The Board Of Trustees Of The Leland Stanford Junior University Iterative minimization procedure with uncompressed local SAR estimate
DE102015106343A1 (de) * 2015-04-24 2016-10-27 Weber Ultrasonics Gmbh Vorrichtung und Verfahren zum Entgraten von Bauteilen mittels Ultraschall
US20170213705A1 (en) * 2016-01-27 2017-07-27 Applied Materials, Inc. Slit valve gate coating and methods for cleaning slit valve gates
JP6893018B2 (ja) * 2016-11-14 2021-06-23 株式会社キーレックス 超音波接合装置
GB201819238D0 (en) 2018-11-27 2019-01-09 Rolls Royce Plc Finishing a surface of a component made by additive manufacturing
DE102019205737A1 (de) * 2019-04-18 2020-10-22 Glatt Gesellschaft Mit Beschränkter Haftung Verfahren zur Überwachung eines Düsenmundstücks auf Ablagerungen an einer Düse
KR102482464B1 (ko) * 2021-05-28 2022-12-28 주식회사 비이아이랩 원자층 증착장치
CN113421950B (zh) * 2021-06-21 2023-04-28 安徽华晟新能源科技有限公司 太阳能电池片的制造方法
JP2023180400A (ja) * 2022-06-09 2023-12-21 株式会社ディスコ バリ除去装置及び切削装置

Family Cites Families (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5765370A (en) 1980-10-09 1982-04-20 Sanko Co Inc Ultrasonic washing method and its device
US4444146A (en) * 1982-01-13 1984-04-24 Honeywell Inc. Ultrasonic subsurface cleaning
US5074456A (en) 1990-09-18 1991-12-24 Lam Research Corporation Composite electrode for plasma processes
US5217163A (en) 1990-12-18 1993-06-08 Nlb Corp. Rotating cavitating jet nozzle
JPH0513396A (ja) 1991-07-09 1993-01-22 Shimada Phys & Chem Ind Co Ltd 半導体装置の洗浄方法
US5415697A (en) * 1993-05-28 1995-05-16 Courtaulds Fibres (Holdings) Limited Cleaning of spinnerette jets
JP2668056B2 (ja) 1994-03-04 1997-10-27 バブコック日立株式会社 ウォータージェット用ノズル
US5574485A (en) 1994-10-13 1996-11-12 Xerox Corporation Ultrasonic liquid wiper for ink jet printhead maintenance
EP0793546B1 (en) * 1994-11-22 1998-08-26 United Technologies Corporation Cleaning method for turbine airfoils by ultrasonics
JPH08243516A (ja) 1995-03-13 1996-09-24 Toto Ltd 超音波洗浄装置
US5569356A (en) 1995-05-19 1996-10-29 Lam Research Corporation Electrode clamping assembly and method for assembly and use thereof
TW449820B (en) 1996-02-15 2001-08-11 Tokai Carbon Kk Plasma-etching electrode plate
JP3454333B2 (ja) * 1996-04-22 2003-10-06 日清紡績株式会社 プラズマエッチング電極
US5863376A (en) 1996-06-05 1999-01-26 Lam Research Corporation Temperature controlling method and apparatus for a plasma processing chamber
JP3871748B2 (ja) 1996-11-15 2007-01-24 ユー・エム・シー・ジャパン株式会社 プラズマ処理装置の電極板洗浄方法
JPH10270418A (ja) 1997-03-24 1998-10-09 Mitsubishi Electric Corp 半導体製造装置
DE19712513B4 (de) * 1997-03-25 2005-05-04 Air Liquide Gmbh Verfahren und Vorrichtung zum Reinigen einer Innenwandung einer Form mittels Trockeneis
US5849091A (en) * 1997-06-02 1998-12-15 Micron Technology, Inc. Megasonic cleaning methods and apparatus
JP3288313B2 (ja) 1997-11-21 2002-06-04 株式会社カイジョー 超音波洗浄装置およびこれを用いた洗浄乾燥装置
PL187959B1 (pl) * 1997-12-05 2004-11-30 Jens Werner Kipp Sposób strumieniowego oczyszczania rur oraz urządzenie strumieniowe do strumieniowego oczyszczania wewnętrznych ścian rur
US6073577A (en) 1998-06-30 2000-06-13 Lam Research Corporation Electrode for plasma processes and method for manufacture and use thereof
US6290778B1 (en) * 1998-08-12 2001-09-18 Hudson Technologies, Inc. Method and apparatus for sonic cleaning of heat exchangers
US6350007B1 (en) 1998-10-19 2002-02-26 Eastman Kodak Company Self-cleaning ink jet printer using ultrasonics and method of assembling same
US6336976B1 (en) 1999-01-04 2002-01-08 Kabushiki Kaisha Sankyo Seiki Seisakusho Hole processing apparatus and method thereof and dynamic pressure bearings cleaning method
US6237528B1 (en) * 2000-01-24 2001-05-29 M.E.C. Technology, Inc. Showerhead electrode assembly for plasma processing
JP4145457B2 (ja) 2000-02-08 2008-09-03 信越化学工業株式会社 プラズマエッチング装置用電極板
US6530388B1 (en) * 2000-02-15 2003-03-11 Quantum Global Technologies, Llc Volume efficient cleaning systems
EP1149637B1 (en) * 2000-04-28 2007-02-28 Kao Corporation Horn for ultrasonic cleaning apparatus

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