JP2003243358A5 - - Google Patents
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- Publication number
- JP2003243358A5 JP2003243358A5 JP2002035387A JP2002035387A JP2003243358A5 JP 2003243358 A5 JP2003243358 A5 JP 2003243358A5 JP 2002035387 A JP2002035387 A JP 2002035387A JP 2002035387 A JP2002035387 A JP 2002035387A JP 2003243358 A5 JP2003243358 A5 JP 2003243358A5
- Authority
- JP
- Japan
- Prior art keywords
- cleaning
- plasma reaction
- micropore
- plasma
- reaction product
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004140 cleaning Methods 0.000 claims 21
- 238000000034 method Methods 0.000 claims 12
- 239000007795 chemical reaction product Substances 0.000 claims 7
- 238000004519 manufacturing process Methods 0.000 claims 3
- 230000005855 radiation Effects 0.000 claims 3
- 239000004065 semiconductor Substances 0.000 claims 3
- 239000002904 solvent Substances 0.000 claims 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 2
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 claims 2
- 238000001020 plasma etching Methods 0.000 claims 2
- 230000001678 irradiating effect Effects 0.000 claims 1
- 229920000642 polymer Polymers 0.000 claims 1
- 239000000047 product Substances 0.000 claims 1
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002035387A JP3876167B2 (ja) | 2002-02-13 | 2002-02-13 | 洗浄方法および半導体装置の製造方法 |
| US10/361,570 US6897161B2 (en) | 2002-02-13 | 2003-02-11 | Method of cleaning component in plasma processing chamber and method of producing semiconductor devices |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002035387A JP3876167B2 (ja) | 2002-02-13 | 2002-02-13 | 洗浄方法および半導体装置の製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2003243358A JP2003243358A (ja) | 2003-08-29 |
| JP2003243358A5 true JP2003243358A5 (https=) | 2005-08-18 |
| JP3876167B2 JP3876167B2 (ja) | 2007-01-31 |
Family
ID=27654970
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002035387A Expired - Fee Related JP3876167B2 (ja) | 2002-02-13 | 2002-02-13 | 洗浄方法および半導体装置の製造方法 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US6897161B2 (https=) |
| JP (1) | JP3876167B2 (https=) |
Families Citing this family (37)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3958080B2 (ja) * | 2002-03-18 | 2007-08-15 | 東京エレクトロン株式会社 | プラズマ処理装置内の被洗浄部材の洗浄方法 |
| KR101024044B1 (ko) * | 2003-01-23 | 2011-03-22 | 가부시키가이샤 알박 | 성막 장치용 구성부품 및 그 세정 방법 |
| US7045020B2 (en) * | 2003-05-22 | 2006-05-16 | Applied Materials, Inc. | Cleaning a component of a process chamber |
| US7250114B2 (en) * | 2003-05-30 | 2007-07-31 | Lam Research Corporation | Methods of finishing quartz glass surfaces and components made by the methods |
| US7192875B1 (en) * | 2004-10-29 | 2007-03-20 | Lam Research Corporation | Processes for treating morphologically-modified silicon electrode surfaces using gas-phase interhalogens |
| KR100541867B1 (ko) * | 2005-08-22 | 2006-01-11 | (주)케이.씨.텍 | 상압 플라즈마 발생용 전극 제조방법 및 전극구조와 이를이용한 상압 플라즈마 발생장치 |
| US7442114B2 (en) * | 2004-12-23 | 2008-10-28 | Lam Research Corporation | Methods for silicon electrode assembly etch rate and etch uniformity recovery |
| US7247579B2 (en) | 2004-12-23 | 2007-07-24 | Lam Research Corporation | Cleaning methods for silicon electrode assembly surface contamination removal |
| US7507670B2 (en) * | 2004-12-23 | 2009-03-24 | Lam Research Corporation | Silicon electrode assembly surface decontamination by acidic solution |
| JP4813115B2 (ja) * | 2005-07-14 | 2011-11-09 | 国立大学法人東北大学 | 半導体製造装置用部材及びその洗浄方法 |
| US7912720B1 (en) * | 2005-07-20 | 2011-03-22 | At&T Intellectual Property Ii, L.P. | System and method for building emotional machines |
| GB0610578D0 (en) * | 2006-05-27 | 2006-07-05 | Rolls Royce Plc | Method of removing deposits |
| US7449072B1 (en) * | 2006-07-20 | 2008-11-11 | Tpl, Inc. | Ultrasonic removal of materials from containers |
| US7767028B2 (en) | 2007-03-14 | 2010-08-03 | Lam Research Corporation | Cleaning hardware kit for composite showerhead electrode assemblies for plasma processing apparatuses |
| US7578889B2 (en) * | 2007-03-30 | 2009-08-25 | Lam Research Corporation | Methodology for cleaning of surface metal contamination from electrode assemblies |
| US8221552B2 (en) * | 2007-03-30 | 2012-07-17 | Lam Research Corporation | Cleaning of bonded silicon electrodes |
| US8292698B1 (en) * | 2007-03-30 | 2012-10-23 | Lam Research Corporation | On-line chamber cleaning using dry ice blasting |
| KR100892089B1 (ko) * | 2007-10-04 | 2009-04-06 | 우범제 | 웨이퍼 세정 처리장치 |
| US8276898B2 (en) * | 2008-06-11 | 2012-10-02 | Lam Research Corporation | Electrode transporter and fixture sets incorporating the same |
| TWI368543B (en) * | 2009-01-12 | 2012-07-21 | Inotera Memories Inc | A showerhead clean rack and a ultrasonic cleaning method thereof |
| US8673083B2 (en) * | 2009-04-22 | 2014-03-18 | Inotera Memories, Inc. | Method of cleaning showerhead |
| JP5896915B2 (ja) * | 2009-12-18 | 2016-03-30 | ラム リサーチ コーポレーションLam Research Corporation | プラズマチャンバで使用される上方電極から表面金属汚染を洗浄するための方法 |
| DE102010005762A1 (de) * | 2010-01-25 | 2011-07-28 | Oerlikon Trading Ag, Trübbach | Reinigungsverfahren für Beschichtungsanlagen |
| US9396912B2 (en) * | 2011-10-31 | 2016-07-19 | Lam Research Corporation | Methods for mixed acid cleaning of showerhead electrodes |
| DE102013100473A1 (de) * | 2013-01-17 | 2014-07-17 | Seho Systemtechnik Gmbh | Verfahren und Vorrichtung zum Reinigen einer Lötdüse |
| US20140261535A1 (en) * | 2013-03-13 | 2014-09-18 | Lam Research Corporation | Standing Wave Generation in Holes to Enhance Cleaning in the Holes in Liquid Sonification Cleaning Systems |
| US10391526B2 (en) | 2013-12-12 | 2019-08-27 | Lam Research Corporation | Electrostatic chuck cleaning fixture |
| JP2017528598A (ja) * | 2014-08-28 | 2017-09-28 | アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated | マスク、キャリア、及び堆積ツールの構成要素から堆積材料を取り除くための剥脱プロセス |
| US9939501B2 (en) | 2014-11-12 | 2018-04-10 | The Board Of Trustees Of The Leland Stanford Junior University | Iterative minimization procedure with uncompressed local SAR estimate |
| DE102015106343A1 (de) * | 2015-04-24 | 2016-10-27 | Weber Ultrasonics Gmbh | Vorrichtung und Verfahren zum Entgraten von Bauteilen mittels Ultraschall |
| US20170213705A1 (en) * | 2016-01-27 | 2017-07-27 | Applied Materials, Inc. | Slit valve gate coating and methods for cleaning slit valve gates |
| JP6893018B2 (ja) * | 2016-11-14 | 2021-06-23 | 株式会社キーレックス | 超音波接合装置 |
| GB201819238D0 (en) | 2018-11-27 | 2019-01-09 | Rolls Royce Plc | Finishing a surface of a component made by additive manufacturing |
| DE102019205737A1 (de) * | 2019-04-18 | 2020-10-22 | Glatt Gesellschaft Mit Beschränkter Haftung | Verfahren zur Überwachung eines Düsenmundstücks auf Ablagerungen an einer Düse |
| KR102482464B1 (ko) * | 2021-05-28 | 2022-12-28 | 주식회사 비이아이랩 | 원자층 증착장치 |
| CN113421950B (zh) * | 2021-06-21 | 2023-04-28 | 安徽华晟新能源科技有限公司 | 太阳能电池片的制造方法 |
| JP2023180400A (ja) * | 2022-06-09 | 2023-12-21 | 株式会社ディスコ | バリ除去装置及び切削装置 |
Family Cites Families (28)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5765370A (en) | 1980-10-09 | 1982-04-20 | Sanko Co Inc | Ultrasonic washing method and its device |
| US4444146A (en) * | 1982-01-13 | 1984-04-24 | Honeywell Inc. | Ultrasonic subsurface cleaning |
| US5074456A (en) | 1990-09-18 | 1991-12-24 | Lam Research Corporation | Composite electrode for plasma processes |
| US5217163A (en) | 1990-12-18 | 1993-06-08 | Nlb Corp. | Rotating cavitating jet nozzle |
| JPH0513396A (ja) | 1991-07-09 | 1993-01-22 | Shimada Phys & Chem Ind Co Ltd | 半導体装置の洗浄方法 |
| US5415697A (en) * | 1993-05-28 | 1995-05-16 | Courtaulds Fibres (Holdings) Limited | Cleaning of spinnerette jets |
| JP2668056B2 (ja) | 1994-03-04 | 1997-10-27 | バブコック日立株式会社 | ウォータージェット用ノズル |
| US5574485A (en) | 1994-10-13 | 1996-11-12 | Xerox Corporation | Ultrasonic liquid wiper for ink jet printhead maintenance |
| EP0793546B1 (en) * | 1994-11-22 | 1998-08-26 | United Technologies Corporation | Cleaning method for turbine airfoils by ultrasonics |
| JPH08243516A (ja) | 1995-03-13 | 1996-09-24 | Toto Ltd | 超音波洗浄装置 |
| US5569356A (en) | 1995-05-19 | 1996-10-29 | Lam Research Corporation | Electrode clamping assembly and method for assembly and use thereof |
| TW449820B (en) | 1996-02-15 | 2001-08-11 | Tokai Carbon Kk | Plasma-etching electrode plate |
| JP3454333B2 (ja) * | 1996-04-22 | 2003-10-06 | 日清紡績株式会社 | プラズマエッチング電極 |
| US5863376A (en) | 1996-06-05 | 1999-01-26 | Lam Research Corporation | Temperature controlling method and apparatus for a plasma processing chamber |
| JP3871748B2 (ja) | 1996-11-15 | 2007-01-24 | ユー・エム・シー・ジャパン株式会社 | プラズマ処理装置の電極板洗浄方法 |
| JPH10270418A (ja) | 1997-03-24 | 1998-10-09 | Mitsubishi Electric Corp | 半導体製造装置 |
| DE19712513B4 (de) * | 1997-03-25 | 2005-05-04 | Air Liquide Gmbh | Verfahren und Vorrichtung zum Reinigen einer Innenwandung einer Form mittels Trockeneis |
| US5849091A (en) * | 1997-06-02 | 1998-12-15 | Micron Technology, Inc. | Megasonic cleaning methods and apparatus |
| JP3288313B2 (ja) | 1997-11-21 | 2002-06-04 | 株式会社カイジョー | 超音波洗浄装置およびこれを用いた洗浄乾燥装置 |
| PL187959B1 (pl) * | 1997-12-05 | 2004-11-30 | Jens Werner Kipp | Sposób strumieniowego oczyszczania rur oraz urządzenie strumieniowe do strumieniowego oczyszczania wewnętrznych ścian rur |
| US6073577A (en) | 1998-06-30 | 2000-06-13 | Lam Research Corporation | Electrode for plasma processes and method for manufacture and use thereof |
| US6290778B1 (en) * | 1998-08-12 | 2001-09-18 | Hudson Technologies, Inc. | Method and apparatus for sonic cleaning of heat exchangers |
| US6350007B1 (en) | 1998-10-19 | 2002-02-26 | Eastman Kodak Company | Self-cleaning ink jet printer using ultrasonics and method of assembling same |
| US6336976B1 (en) | 1999-01-04 | 2002-01-08 | Kabushiki Kaisha Sankyo Seiki Seisakusho | Hole processing apparatus and method thereof and dynamic pressure bearings cleaning method |
| US6237528B1 (en) * | 2000-01-24 | 2001-05-29 | M.E.C. Technology, Inc. | Showerhead electrode assembly for plasma processing |
| JP4145457B2 (ja) | 2000-02-08 | 2008-09-03 | 信越化学工業株式会社 | プラズマエッチング装置用電極板 |
| US6530388B1 (en) * | 2000-02-15 | 2003-03-11 | Quantum Global Technologies, Llc | Volume efficient cleaning systems |
| EP1149637B1 (en) * | 2000-04-28 | 2007-02-28 | Kao Corporation | Horn for ultrasonic cleaning apparatus |
-
2002
- 2002-02-13 JP JP2002035387A patent/JP3876167B2/ja not_active Expired - Fee Related
-
2003
- 2003-02-11 US US10/361,570 patent/US6897161B2/en not_active Expired - Fee Related
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