JP2003060127A5 - Adhesive film for mounting semiconductor devices - Google Patents

Adhesive film for mounting semiconductor devices Download PDF

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JP2003060127A5
JP2003060127A5 JP2002131897A JP2002131897A JP2003060127A5 JP 2003060127 A5 JP2003060127 A5 JP 2003060127A5 JP 2002131897 A JP2002131897 A JP 2002131897A JP 2002131897 A JP2002131897 A JP 2002131897A JP 2003060127 A5 JP2003060127 A5 JP 2003060127A5
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adhesive
adhesive film
adhesive layer
film according
film
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JP2003060127A (en
JP3617504B2 (en
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Claims (14)

半導体素子を基板に搭載するための接着フィルムであって、An adhesive film for mounting a semiconductor element on a substrate,
ベースフィルムと、該ベースフィルム上に形成された接着剤層とを備え、A base film, and an adhesive layer formed on the base film;
上記接着剤層は、エポキシ基含有アクリル共重合体とエポキシ樹脂とを含有する熱硬化性樹脂からなり、The adhesive layer is made of a thermosetting resin containing an epoxy group-containing acrylic copolymer and an epoxy resin,
上記接着剤層は、動的粘弾性測定装置を用いて測定した場合の接着剤硬化物の貯蔵弾性率が25℃で10〜2000MPa、260℃で3〜50MPaであり、The adhesive layer has a storage elastic modulus of 10 to 2000 MPa at 25 ° C. and 3 to 50 MPa at 260 ° C. when measured using a dynamic viscoelasticity measuring device,
上記接着剤硬化物は、示差熱量計を用いて測定した場合の全硬化発熱量の95〜100%の発熱を終えた状態であり、The adhesive cured product is in a state where heat generation of 95 to 100% of the total curing calorific value as measured using a differential calorimeter has been completed,
上記貯蔵弾性率は、上記接着剤硬化物に引張り荷重をかけて、周波数10Hz、昇温速度5〜10℃/分で−50℃から300℃まで測定する温度依存性測定モード測定されたものであることを特徴とする接着フィルム。The storage elastic modulus is a temperature-dependent measurement mode in which a tensile load is applied to the cured adhesive and the frequency is 10 Hz, and the heating rate is 5 to 10 ° C./min and the temperature is measured from −50 ° C. to 300 ° C. Adhesive film characterized by being.
上記ベースフィルムは、ポリテトラフルオロエチレンフィルム、ポリエチレンテレフタレートフィルム、離型処理したポリエチレンテレフタレートフィルム、ポリエチレンフィルム、ポリプロピレンフィルム、ポリメチルペンテンフィルム及びポリイミドフィルムのうちから選ばれることを特徴とする請求項1記載の接着フィルム。The base film is selected from the group consisting of polytetrafluoroethylene film, polyethylene terephthalate film, release-treated polyethylene terephthalate film, polyethylene film, polypropylene film, polymethylpentene film and polyimide film. Adhesive film. 上記接着剤層は、エポキシ樹脂硬化剤を含むことを特徴とする請求項1記載の接着フィルム。The adhesive film according to claim 1, wherein the adhesive layer contains an epoxy resin curing agent. 上記エポキシ樹脂硬化剤は、アミン、ポリアミド、酸無水物、ポリスルフィッド、三弗化硼素及びフェノール性水酸基を1分子中に2個以上有する化合物のうちから選ばれることを特徴とする請求項3記載の接着フィルム。The epoxy resin curing agent is selected from amines, polyamides, acid anhydrides, polysulfides, boron trifluoride, and compounds having two or more phenolic hydroxyl groups in one molecule. Adhesive film. 上記接着剤層は、エポキシ樹脂硬化促進剤を含むことを特徴とする請求項1記載の接着フィルム。The adhesive film according to claim 1, wherein the adhesive layer contains an epoxy resin curing accelerator. 上記接着剤層は、イミダゾール類を含むことを特徴とする請求項1記載の接着フィルム。The adhesive film according to claim 1, wherein the adhesive layer contains an imidazole. 上記イミダゾール類は、2−メチルイミダゾール、2−エチル−4−メチルイミダゾール、1−シアノエチル−2−フェニルイミダゾール、及び、1−シアノエチル−2−フェニルイミダゾリウムトリメリテートのうちから選ばれる化合物であることを特徴とする請求項6記載の接着フィルム。The above imidazole is a compound selected from 2-methylimidazole, 2-ethyl-4-methylimidazole, 1-cyanoethyl-2-phenylimidazole, and 1-cyanoethyl-2-phenylimidazolium trimellitate The adhesive film according to claim 6, characterized in that. 上記エポキシ基含有アクリル共重合体は、ガラス転移温度が−10℃以上であることを特徴とする請求項2記載の接着フィルム。The adhesive film according to claim 2, wherein the epoxy group-containing acrylic copolymer has a glass transition temperature of -10 ° C or higher. 上記エポキシ基含有アクリル共重合体は、グリシジル(メタ)アクリレート2〜6重量%を含むアクリル系共重合体であることを特徴とする請求項2記載の接着フィルム。The adhesive film according to claim 2, wherein the epoxy group-containing acrylic copolymer is an acrylic copolymer containing 2 to 6% by weight of glycidyl (meth) acrylate. 上記エポキシ基含有アクリル共重合体は、重量平均分子量が80万以上であることを特徴とする請求項2記載の接着フィルム。The adhesive film according to claim 2, wherein the epoxy group-containing acrylic copolymer has a weight average molecular weight of 800,000 or more. 上記接着剤層に含まれる残存溶媒量は5重量%以下であることを特徴とする請求項1記載の接着フィルム。The adhesive film according to claim 1, wherein the amount of residual solvent contained in the adhesive layer is 5% by weight or less. 上記接着剤層は、示差熱量計を用いて測定した場合の全硬化発熱量の10〜40%の発The adhesive layer generates 10 to 40% of the total curing calorific value as measured using a differential calorimeter. 熱を終えた状態である請求項1記載の接着フィルム。The adhesive film according to claim 1, which is in a state of finishing heat. 上記接着剤層は、シランカップリング剤を含むことを特徴とする請求項1記載の接着フィルム。The adhesive film according to claim 1, wherein the adhesive layer contains a silane coupling agent. 上記接着剤層は、THF抽出率が80重量%以下の状態であり、The adhesive layer has a THF extraction ratio of 80% by weight or less,
上記THF抽出率は、テトラヒドロフラン中に重量W1の上記接着剤層を浸し、25℃で20時間放置した後、非溶解分を200メッシュのナイロン布で濾過して乾燥した後の重量W2を測定し、下記数式(2)により算出される値であることを特徴とする請求項1記載の接着フィルム。The THF extraction rate is determined by immersing the adhesive layer of weight W1 in tetrahydrofuran and leaving it to stand at 25 ° C. for 20 hours, and then measuring the weight W2 after filtering the non-dissolved matter with a 200 mesh nylon cloth and drying. The adhesive film according to claim 1, wherein the adhesive film is a value calculated by the following formula (2).
Figure 2003060127
Figure 2003060127
JP2002131897A 1996-10-08 2002-05-07 Adhesive film for mounting semiconductor elements Expired - Lifetime JP3617504B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002131897A JP3617504B2 (en) 1996-10-08 2002-05-07 Adhesive film for mounting semiconductor elements

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
JP26646096 1996-10-08
JP31770996 1996-11-28
JP9-111430 1997-04-28
JP8-317709 1997-04-28
JP11143097 1997-04-28
JP8-266460 1997-04-28
JP2002131897A JP3617504B2 (en) 1996-10-08 2002-05-07 Adhesive film for mounting semiconductor elements

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP51739298A Division JP3453390B2 (en) 1996-10-08 1997-10-08 Semiconductor device, substrate for mounting semiconductor chip, and method of manufacturing the same

Publications (3)

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JP2003060127A JP2003060127A (en) 2003-02-28
JP3617504B2 JP3617504B2 (en) 2005-02-09
JP2003060127A5 true JP2003060127A5 (en) 2005-06-09

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Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005109307A (en) * 2003-10-01 2005-04-21 Matsushita Electric Ind Co Ltd Board with built-in circuit part, and manufacturing method of the same
US7453157B2 (en) * 2004-06-25 2008-11-18 Tessera, Inc. Microelectronic packages and methods therefor
US7560821B2 (en) * 2005-03-24 2009-07-14 Sumitomo Bakelite Company, Ltd Area mount type semiconductor device, and die bonding resin composition and encapsulating resin composition used for the same
JP4523611B2 (en) * 2007-02-20 2010-08-11 日東電工株式会社 Manufacturing method of semiconductor device
WO2009001492A1 (en) 2007-06-22 2008-12-31 Sumitomo Bakelite Co., Ltd. Adhesive film and semiconductor device obtained with the same
JP5083070B2 (en) * 2007-11-19 2012-11-28 日立化成工業株式会社 Sealing film
JP5493327B2 (en) * 2007-12-18 2014-05-14 日立化成株式会社 Resin composition for sealing filling, semiconductor device and method for manufacturing the same
JP2008263234A (en) * 2008-07-17 2008-10-30 Hitachi Chem Co Ltd Semiconductor chip mounting substrate, semiconductor package, and their manufacturing method
KR101866901B1 (en) * 2016-10-12 2018-06-14 한국기계연구원 Multi-layered carrier film and the transfer method using the device and electronics manufacturing method using the same method
TWI791721B (en) * 2017-12-27 2023-02-11 日商三菱瓦斯化學股份有限公司 Resin composition, prepreg, laminate, meta foil-clad laminate, printed wiring board, and multilayer printed wiring board
CN113423753B (en) * 2019-02-21 2024-06-11 松下知识产权经营株式会社 Semiconductor packaging material and semiconductor device

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