JP2002367787A - Organic el display device and its manufacturing method - Google Patents

Organic el display device and its manufacturing method

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Publication number
JP2002367787A
JP2002367787A JP2001169650A JP2001169650A JP2002367787A JP 2002367787 A JP2002367787 A JP 2002367787A JP 2001169650 A JP2001169650 A JP 2001169650A JP 2001169650 A JP2001169650 A JP 2001169650A JP 2002367787 A JP2002367787 A JP 2002367787A
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Japan
Prior art keywords
layer
formed
color
electrode
transport layer
Prior art date
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Pending
Application number
JP2001169650A
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Japanese (ja)
Inventor
Naoto Ozasa
直人 小笹
Original Assignee
Tohoku Pioneer Corp
東北パイオニア株式会社
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Application filed by Tohoku Pioneer Corp, 東北パイオニア株式会社 filed Critical Tohoku Pioneer Corp
Priority to JP2001169650A priority Critical patent/JP2002367787A/en
Publication of JP2002367787A publication Critical patent/JP2002367787A/en
Application status is Pending legal-status Critical

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Classifications

    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/28Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including components using organic materials as the active part, or using a combination of organic materials with other materials as the active part
    • H01L27/32Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including components using organic materials as the active part, or using a combination of organic materials with other materials as the active part with components specially adapted for light emission, e.g. flat-panel displays using organic light-emitting diodes [OLED]
    • H01L27/3206Multi-colour light emission
    • H01L27/3211Multi-colour light emission using RGB sub-pixels
    • H01L27/3218Multi-colour light emission using RGB sub-pixels characterised by the geometrical arrangement of the RGB sub-pixels
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L51/00Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof
    • H01L51/0001Processes specially adapted for the manufacture or treatment of devices or of parts thereof
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L2251/00Indexing scheme relating to organic semiconductor devices covered by group H01L51/00
    • H01L2251/50Organic light emitting devices
    • H01L2251/55Organic light emitting devices characterised by parameters
    • H01L2251/558Thickness

Abstract

(57) Abstract: In an organic EL display device for performing full-color display, local defective resistance and disconnection of a second electrode formed on an organic layer are eliminated. A hole injection layer (40) and a hole transport layer (4) are provided over a first electrode (2) and an insulating film (3) across a plurality of first electrodes (2).
1 is formed. Regions 60a, 60b, 6 for each color
0c is selected, and the light emitting layers 42a, 42a,
42b, 42c, electron transport layers 43a, 43b, 43c,
The electron injection layers 44a, 44b, and 44c are formed. The organic layer including the hole injection layer, the hole transport layer, the light emitting layer, the electron transport layer, and the electron injection layer is formed in a region 60 selected for each color.
a, 60b, and 60c are connected to form a continuous layer. The organic layer of each color has a different thickness in order to adjust the luminous efficiency, and thereby a step is formed on the surface of the organic layer. Set to a value larger than the maximum value of adding.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

The present invention relates to an organic EL (electroluminescence) display device and a method of manufacturing the same, and more particularly, to an organic EL display device having a structure for performing full-color display and a method of manufacturing the same.

[0002]

2. Description of the Related Art An organic EL display device has an organic EL element as a basic element, and has an organic EL element formed on a flat substrate.
An image is displayed by turning on or off the element. The organic EL element includes electrodes having a predetermined area opposed to each other, one of which serves as an anode to which a positive voltage is applied, and the other serving as a cathode to which a negative voltage is applied. When a voltage is applied between the electrodes, electrons are injected from the cathode into the light-emitting layer, and holes are injected from the anode into the light-emitting layer.
This is a surface emitting element in which light emission is generated by recombination of holes. By forming the organic EL element as a unit surface light emitting element in a matrix on a flat substrate and driving it in a dot matrix, a flat panel display device capable of displaying a high-definition image can be formed.

Further, in response to the research on organic light emitting materials, the development of organic EL elements exhibiting R, G, and B luminescent colors with high color purity has led to the arrangement of these color light emitting elements for each pixel. An organic EL display device that performs full-color display has been developed. FIGS. 4 and 5 show an example of the structure, and show a structure of an organic EL display device which performs full-color display by active matrix driving. FIG. 4 is an explanatory view showing the structure, and FIG. 5 is a schematic view of the xx section.

In these figures, a TFT semiconductor layer is formed in a transistor area T on a substrate 1 made of transparent glass or the like, and a plurality of first electrodes made of a transparent conductive material such as ITO are formed. 2 (anode) are independently formed for each pixel V. On the substrate 1 between the first electrodes 2, a data line L1 and a power line L2 are formed in one direction, and a scanning line L3 is formed in a direction orthogonal to these.
Are formed. An insulating film 3 made of polyimide or the like is formed between the first electrodes 2 on which these lines are formed. Then, a plurality of organic layers 4 are formed on the first electrode 2, and the organic layers 4 are covered with Al.
A second electrode (cathode) 5 is formed.

The structure of the organic layer 4 formed on the first electrode 2 will be described with reference to FIG. 5 (here, the above-described lines L1, L2, and L3 are omitted).
A hole injection layer 40 and a hole transport layer 41 are formed on the electrode 2 and the insulating film 3.
A region on the first electrode 2 to be a color is selected, and a first light emitting layer 42a, an electron transport layer 43a, and an electron injection layer 44a are sequentially formed in that region. Further, the second light emitting layer 42b and the second light emitting layer 42b are formed in the region on the first electrode 2 selected as the second color.
An electron transport layer 43b and an electron injection layer 44b are sequentially formed,
In the region on the first electrode 2 selected as the third color, a third light emitting layer 42c, an electron transport layer 43c, and an electron injection layer 44
c are sequentially formed. Then, the organic layer 4 is formed by connecting the organic layers formed in the region selected for each color, and the second electrode 5 is formed so as to cover the organic layer 4. In the intersection area between the electrode 5 and the first electrode 2, light-emitting areas 45a, 45b, 45c of each color are formed.

Here, the above-mentioned organic layer 4 has a light emitting region 4
In order to completely cover 5a, 45b and 45c, they are formed not only on the first electrode 2 but also on the insulating film 3,
As a result, a sufficient light emission amount is secured. In order to form the second electrode 5 over the organic layer 4, it is necessary to ensure the continuity of the layers. For this purpose, a continuous layer is formed by connecting regions selected for each color. ing.

In the above description, an active matrix type organic EL display device has been described as an example. However, the structure itself of a simple matrix (passive) type organic EL display device does not differ greatly. In this case, a plurality of first electrodes 2 (anodes) made of a transparent conductive material such as ITO are formed in stripes on a substrate 1 made of transparent glass or the like,
An insulating film 3 made of polyimide or the like is formed between the first electrodes 2. A plurality of organic layers 4 are formed in a stripe shape orthogonal to the first electrode 2, and a second electrode (cathode) 5 made of Al or the like is formed in a stripe shape over the organic layer 4. Will be done.

[0008]

The above-mentioned organic EL display device corresponds to each of red (R), green (G), and blue (B) in order to perform full-color display with good color balance.
First light emitting layer 42a, electron transport layer 43a, electron injection layer 4
4a, the second light emitting layer 42b, the electron transport layer 43b, the electron injection layer 44b, and the third light emitting layer 42c, the electron transport layer 43
c, the electron injection layer 44c is formed so that the film thickness is different for each color. This takes into account the fact that the luminous efficiency of the organic luminescent material differs for each color, and the film thickness is increased for colors with low luminous efficiency, and the color is increased for the same driving voltage and voltage application time. The setting is made so that there is no difference in the light emission amount for each. In the example shown in FIG. 5, the film thicknesses of the light emitting layer and the electron transport layer are different, and the film thickness t a of the first color,
Thickness t b of the second color, the thickness t c of the third color, in consideration of the respective color light emission efficiency, are set such that t a> t b> t c . The setting of the layer thickness is performed by adjusting the vapor deposition time during the formation.

In this way, the luminous efficiency is adjusted.
In the organic EL display device shown in FIG. 1~ A4Shown in each part of
At the boundary of the area selected for each color so that
A step occurs on the surface of the mechanical layer 4. In contrast,
The second electrode 5 formed on the organic layer 4 usually has the shape of each organic layer.
Place the deposition source directly below the substrate in the same way as
Material is deposited on the boundary where the step is formed.
Cannot form an electrode layer having a required thickness.

For this reason, in the portion where the step is formed, the layer thickness of the second electrode 5 is locally reduced, the resistance value is increased, and the light emission characteristics of each color are deteriorated. the partial step is large as shown in each part 1 and a 4, breaking the second electrode 5 is formed, which by have also become a cause of the non-light emitting portion is formed. As a specific example,
R = 40 nm, G = 30 nm, B = 25 nm,
R = 40 nm, G = 25 nm, B = 20 n for the electron transport layer
When the deposition was performed by setting the second electrode to 60 nm after the electron injection layer was deposited and the deposition source was arranged directly below the substrate, and the deposition was performed, a defective light emission or a non-light emitting portion was confirmed. Was done.

That is, in the conventional organic EL display device for performing full color display, when the surface of the organic layer on which the second electrode is formed is formed flat, there is a difference in luminous efficiency between the light emitting layers of each color. There is a problem that it is difficult to obtain the required color balance and contrast, and in order to solve this problem, when a difference in film thickness is formed in the light-emitting layer or the electron transport layer for each color, it is formed on the organic layer. Since there was a problem that the thickness of the second electrode was locally reduced to cause display defects and pixel defects, a sufficiently high-quality image could not be displayed.

The present invention has been proposed to address such a problem, and an object of the present invention is to provide an organic EL display device having a structure for performing high-quality full-color display and a method of manufacturing the same. It is the purpose.

[0013]

In order to achieve the above-mentioned object, the present invention has the following features.

According to the first aspect of the present invention, a plurality of first electrodes formed on a substrate, a hole transport layer formed on the first electrode, a light emitting layer emitting any one of RGB colors, and an electron transport layer In an organic EL display device comprising an organic layer containing: and a second electrode formed over the organic layer, the organic layer is formed as a layer connecting regions selected for each color, The electrode is characterized in that the thickness of the electrode is larger than the maximum value among the thicknesses of the respective colors including the light emitting layer and the electron transport layer in the organic layer.

According to the second aspect of the present invention, a plurality of first electrodes formed on the substrate, a hole transport layer formed on the first electrode, a light emitting layer emitting any one of RGB colors, and an electron transport layer In an organic EL display device comprising an organic layer containing: and a second electrode formed over the organic layer, the organic layer is formed as a layer connecting regions selected for each color, and The layer includes a first layer formed in a region selected for each color and a second layer formed commonly for each color.

According to a third aspect of the present invention, a plurality of first electrodes are formed on a substrate, and a hole transport layer, RGB
In a method for manufacturing an organic EL display device in which an organic layer including a light emitting layer emitting any color and an electron transporting layer is formed, and a second electrode is formed over the organic layer, the organic layer is provided for each color. The selected region is formed in a continuous layer, and the second electrode is formed to have a thickness larger than the maximum value among the respective color thicknesses of the organic layer plus the light emitting layer and the electron transport layer.
It is characterized in that it is deposited on the organic layer.

According to the fourth aspect of the present invention, a plurality of first electrodes are formed on a substrate, and a hole transport layer, RGB, and the like are formed on the first electrodes.
In a method for manufacturing an organic EL display device in which an organic layer including a light emitting layer emitting any color and an electron transporting layer is formed, and a second electrode is formed over the organic layer, the organic layer is provided for each color. In forming the selected region as a continuous layer, a first electron transport layer is deposited on the region selected for each color, and then a second electron transport layer is uniformly deposited on each color. I do.

According to the fifth aspect of the present invention, a plurality of first electrodes are formed on a substrate, and a hole transport layer and an RGB are formed on the first electrodes.
In a method for manufacturing an organic EL display device in which an organic layer including a light emitting layer emitting any color and an electron transporting layer is formed, and a second electrode is formed over the organic layer, the organic layer is provided for each color. In forming the selected area as a continuous layer, a first electron transport layer is deposited on the area selected for each color, and then a second electron transport layer is uniformly deposited on each color in common. An electrode is deposited on the organic layer so that the thickness of the electrode is larger than the maximum value of the thickness of each color of the organic layer plus the light emitting layer and the electron transport layer.

In the invention according to claim 6, the above-mentioned organic EL is used.
In the method for manufacturing a display device, the formation of the second electrode may include:
It is characterized by being made by oblique deposition.

The present invention having the above-mentioned features has the following effects.

According to the first and third aspects of the present invention, even when a step is formed in the organic layer, the thickness of the second electrode formed on the organic layer is made larger than the step so that the electrode is formed at the step. To prevent disconnection. Since the adjustment of the light emission amount in the organic layer is mainly performed by adjusting the thickness of the light emitting layer and the electron transport layer, the maximum value of the step formed in the organic layer is determined by adding the light emitting layer and the electron transport layer. Smaller than the maximum value among the respective color film thicknesses. When the thickness of the second electrode is set to be equal to or more than this maximum value, the thickness of the electrode formed on the lower surface forming the step becomes higher than the upper surface forming the step, so that the upper surface And the electrode layer formed on the lower surface can be always connected. When the second electrode is formed by vapor deposition, the film thickness is set to the above-described thickness by adjusting the vapor deposition time.

According to the second and fourth aspects of the present invention, the light emitting layer and the first electron transporting layer in the organic layer are formed to have different thicknesses for each color, and the light emitting amount is adjusted. A uniform second electron transport layer for each color is formed on the first electron transport layer using the same material or a different material as the material used for the first electron transport layer. The step formed by the light emitting layer and the first electron transport layer becomes gentler by providing the second electron transport layer. Thereby, the step of the second electrode formed on the organic layer is almost eliminated.

According to a fifth aspect of the present invention, as in the case where each of the hole transport layer, the light emitting layer and the electron injection layer in the organic layer is formed to have a different thickness for each color and the amount of light emission is adjusted,
This is to deal with the case where a large step is formed in the organic layer. According to this, the above-described measures for increasing the thickness of the second electrode and the measures for providing a second electron transport layer common to each color on the first electron transport layer for each color are used in combination to increase the thickness of the organic layer. Is formed in a substantially uniform layer.

According to the invention of claim 6, further, the second
By employing oblique deposition for forming the electrodes, a sufficient film thickness is ensured even at the step portion. In addition, since steps formed on the surface of the organic layer may not be formed in one direction, it is effective to employ oblique deposition having a plurality of directions.

The invention according to each of the above-mentioned claims comprises a plurality of first electrodes formed on a substrate, a hole transport layer formed on the first electrodes, a light emitting layer for emitting any one of RGB colors, and an electron emitting layer. In an organic EL display device including an organic layer including a transport layer and a second electrode formed over the organic layer, and a method for manufacturing the same, first, a layer in which an organic layer connects a region selected for each color Since the organic layer is formed so as to completely cover the light emitting region formed between the first and second electrodes, the light emitting region is formed densely to increase the density. Thus, a sufficient light emission amount can be secured. Also,
Even when the amount of light emission is adjusted by changing the thickness of the organic layer in the region selected for each color, the thickness of the second electrode formed on the organic layer is sufficient as described above. It can be formed to a thickness. Therefore, color balance and contrast can be improved, and display defects and pixel defects do not occur. Further, high-density display can be performed, so that high-quality full-color display can be performed.

[0026]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, embodiments of the present invention will be described with reference to the drawings (the same parts as in the prior art will be denoted by the same reference numerals, and a duplicate description will be omitted). FIG. 1 is an explanatory diagram showing the structure of the organic EL display device according to the first embodiment of the present invention (here, lines L1, L2, and L3 are omitted as in FIG. 5). On one surface of a transparent substrate 1 such as glass, first electrodes 2 made of a transparent conductive material such as ITO are formed at a plurality of locations. On the substrate 1 between the first electrodes 2, an insulating film 3 made of polyimide or the like is formed so as to slightly cover the periphery of the first electrode 2.

The first electrode 2 extends across the plurality of first electrodes 2.
On the electrode 2 and the insulating film 3, a hole injection layer 40 and a hole transport layer 41 are formed. Then, the area 60 for each color
a, 60b, and 60c are selected, and in each area,
Light emitting layers 42a, 42b, 42c, electron transport layers 43a, 4
3b, 43c and electron injection layers 44a, 44b, 44c are formed, and the organic layers including the hole injection layer, the hole transport layer, the light emitting layer, the electron transport layer, and the electron injection layer are selected for each color. A continuous layer is formed by connecting the regions 60a, 60b, and 60c. Here, the layer formed between the light emitting layer and the first electrode has a two-layer structure of the hole injection layer 40 and the hole transport layer 41. However, in this embodiment and each of the embodiments described later, the hole The injection layer 40 and the hole transport layer 41
It may be a single-layer hole transport layer for injecting holes from the electrode, transporting holes, and injecting holes into the light emitting layer.

In the thus formed organic layer, the first
For example, the light emitting layer 42a for obtaining red (R) light emission and the electron transport layer 4
3a are each formed with a thickness of 40 nm, and the second
For example, the light emitting layer 42b for obtaining green (G) light emission and the electron transport layer 4
3b are formed in thicknesses of 30 nm and 25 nm, respectively, and in a region 60c selected as the third color, for example, a light emitting layer 42c for obtaining blue (B) light emission and an electron transporting layer 43c are respectively 25 nm and 20 nm. Is formed. By forming the light emitting layer and the electron transporting layer differently for each color in this manner, the difference in luminous efficiency of each color is eliminated. However, as described above, the surface of the organic layer is provided for each color. Regions 60a, 60b,
A step is formed at the boundary of 60c.

On this organic layer, the uppermost electron injection layer 4
A second electrode 50 made of Al or the like and acting as a reflective electrode is formed so as to cover 4a, 44b, and 44c. Then, by applying a driving voltage between the first electrode 2 and the second electrode 50, the regions 60a and 60 selected for each color are applied.
From the light emitting areas 45a, 45b and 45c in b and 60c, respective light emitting colors of RGB are selectively obtained through the substrate 1.

[0030] Here, in this embodiment, it is set larger than the maximum value t m of in KakuiromakuAtsu the thickness te of the second electrode 50 plus the light emitting layer and the electron transport layer. According to the setting example of each layer described above, the film thickness te of the second electrode 50 is
It is set to be larger than 80 nm, preferably about 100 nm. Accordingly, even when a step is formed on the organic layer, the thickness of the second electrode 50 is hardly affected by the step, and a locally thin portion or a disconnected portion is not formed.

The method of manufacturing the organic EL display device according to the first embodiment will be described by taking an active type (active matrix drive) device as an example.

(Step of Forming First Electrode and Insulating Film) A transparent conductive material such as I
TO is formed by a physical film forming method such as sputtering, and the first electrode 2 partitioned for each pixel is formed by a known lithography technique and etching technique. Next, an insulating material (polyimide or the like) is applied onto the substrate 1 by a spin coating method or the like while selectively covering the formation region of the first electrode 2, and an insulating film 3 is provided between the plurality of first electrodes 2. To form

(Step of Forming Hole Injection Layer and Hole Transport Layer) Next, the first electrode 2 and the insulating film 3 are formed using a predetermined mask.
A hole injection layer 40 is entirely deposited thereon. Further, a hole transport layer 41 is entirely deposited on the hole injection layer 40.

(Step of Forming Light Emitting Layer, Electron Transporting Layer, and Electron Injecting Layer for Each Color) Next, a mask having a pattern in which the selected area of the first color is opened is set on the substrate, and the first color, for example, R light emitting layer 42a Is deposited on the hole transport layer 41.
At this time, the film thickness is set to, for example, 40 nm by adjusting the deposition time. Subsequently, the mask is maintained and the electron transport layer 43 is maintained.
After e is deposited to a desired thickness, for example, 40 nm, the electron injection layer 44a is formed to a desired thickness. After that, the mask is changed or the mask is slid to selectively open the region of the second color (G), the light emitting layer 42b is deposited with a thickness of, for example, 30 nm, and the electron transport layer 43b is formed. For example, after vapor deposition with a thickness of 25 nm, the electron injection layer 44b is formed to a desired thickness. Further, by changing the mask or sliding the mask, the third color (B) region is selectively opened, and the light emitting layer 42c is formed.
Is deposited in a thickness of, for example, 25 nm to form an electron transport layer 43c.
Is deposited to a thickness of, for example, 20 nm, and then the electron injection layer 4 is deposited.
4c is formed with a desired film thickness.

(Second Electrode Forming Step) Next, the mask is changed to the same as that used in the above-described hole injecting layer and hole transporting layer forming step, and a metal such as Al is formed on the electron injecting layer. A second electrode 50 is formed by depositing a material over the entire surface. In this case, the thickness t m of the second electrode 50 is set to a large film thickness value than the maximum value among the KakuiromakuAtsu plus a luminescent layer and an electron transporting layer as described above, the film thickness The deposition time is set so as to be obtained. Also, oblique deposition having a plurality of directions is effective for forming the second electrode 50.
The second electrode layer having a sufficient film thickness can be formed even in a portion where a step is formed. For oblique vapor deposition having a plurality of directions, various known methods can be employed, and in particular, a method of arranging a plurality of vapor deposition sources obliquely downward with respect to the substrate or a method of obliquely depositing the substrate obliquely downward with respect to the substrate. And a method of rotating the substrate by disposing the substrate.

Next, FIG. 2 shows a second embodiment of the present invention.
An embodiment will be described. The same parts as those in the first embodiment are denoted by the same reference numerals, and the description thereof will not be repeated.

According to the present embodiment, the structure and the method of forming the electron transport layer formed on each color light emitting layer are characterized by
The electron transporting layer is formed by a plurality of layers of a layer formed for each color and a layer formed commonly for each color. That is, in the first color selection region 60a, the first electron transport layer 46a is formed with a thickness of, for example, 20 nm on the light emitting layer 42a, and in the second color selection region 60b, the first electron transport layer 46a is formed on the light emitting layer 42b. The first electron transport layer 46b is formed with a thickness of, for example, 5 nm. Also, the first color selection area 60c includes the first color
No electron transport layer is formed. Then, an electron transport layer 47 common to each color is uniformly formed thereon, for example, with a thickness of, for example, 20 nm, and further thereon, the electron injection layer 44 and the second electrode 51 are formed.
Is formed with a desired film thickness.

According to this embodiment, the required thickness of the electron transport layer for each color is the first electron transport layer 46a, 46a.
b and the second electron transport layer 47. Then, the first electron transport layers 46a and 46b
The steep step generated at the stage where is formed becomes gentle by providing the second electron transport layer 47 common to each color. As a result, the second electrode 51 formed thereon via the electron injection layer 44 is less likely to be affected by the step, and a locally thin portion or a disconnected portion is not formed.

The method of manufacturing the organic EL display device according to the second embodiment will be described by taking an active device as an example, as in the first embodiment. The step of forming the first electrode and the insulating film and the step of forming the hole injection layer and the hole transport layer are the same as in the first embodiment. Thereafter, a mask having a pattern in which the first color selection region is opened is set on the substrate, and the first color light emitting layer 42a is deposited on the hole transport layer 41 to a thickness of, for example, 40 nm. Subsequently, while maintaining the mask, the first electron transport layer 46a is deposited to a desired thickness, for example, 20 nm. After that, the mask is changed or the mask is slid to selectively open the region of the second color, and the light emitting layer 42b is deposited with a thickness of, for example, 30 nm,
Further, the first electron transport layer 46b is deposited to a thickness of, for example, 5 nm. Further, by changing the mask or sliding the mask, the third color light emitting layer 42c is deposited to a thickness of, for example, 25 nm.

Next, the mask was changed to the same as that used in the above-described hole injection layer and hole transport layer forming step,
An electron transport layer 47 common to each color is formed by a first electron transport layer 46a,
The same material as 46b or a different material is vapor-deposited to a thickness of, for example, 20 nm. Then, while maintaining this mask state, the electron injection layer 44 and the second electrode 51 are vapor-deposited in a desired thickness. For forming the second electrode 51, oblique deposition having a plurality of directions is effective as in the first embodiment.

Next, FIG. 3 shows a third embodiment of the present invention.
An embodiment will be described. Note that the same parts as those in the above-described embodiment are denoted by the same reference numerals, and a partially duplicated description will be omitted.

The present embodiment is effective when the step formed in the organic layer is large. For example, there is a large difference in the luminous efficiency of each color depending on the type of the material forming the light emitting layer.
In order to solve this problem, it is effective when the organic layer formed in the region selected for each color needs to have a different thickness for each color in the three layers of the hole transport layer, the light emitting layer, and the electron transport layer. It is. According to this, the electron transport layer is formed of a plurality of layers of a layer formed for each color and a layer formed commonly for each color, and the thickness of the second electrode is set to the maximum value of the sum of the light emitting layer and the electron transport layer. It was formed thicker than the value.

That is, in the selection area 60a for the first color,
The first color hole transport layer 41a is formed with a thickness of, for example, 40 nm, the light emitting layer 42a is formed with a thickness of 40 nm,
A first electron transport layer 46a is formed thereon with a thickness of, for example, 20 nm, and a second color selection region 60b has
The hole transport layer 41b of the second color is formed with a thickness of, for example, 25 nm, the light emitting layer 42b is formed with a thickness of 30 nm,
A first electron transport layer 46b is formed thereon with a thickness of, for example, 5 nm. In the third color selection region 60c, the third color hole transport layer 41c is formed with a thickness of 20 nm, and the light emitting layer 42c is formed with a thickness of 25 nm. No layer is formed. Then, an electron transport layer 47 common to each color is uniformly formed thereon with a thickness of, for example, 20 nm, and an electron injection layer 44 is further formed thereon with a desired thickness.

[0044] Here, the film thickness te of the second electrode 52 formed so as to cover the electron injection layer 44 is greater than the maximum value t m of in KakuiromakuAtsu plus the light emitting layer and an electron transport layer Setup Is done. According to setting example of the above-mentioned each layer, the thickness t m of the second electrode 52 is larger than 80 nm, preferably 100n
m. Accordingly, even when a large step is formed on the organic layer, the thickness of the second electrode 50 is hardly affected by the step, and a locally thin portion or a disconnected portion is not formed.

The method of manufacturing the organic EL display device according to the third embodiment will be described. Except that the region for each color is selected at the stage when the hole transport layer is formed, the second embodiment is described. The second electrode 5
In forming the 2, the film thickness thereof is set to be te> t m. Obviously, also in the present embodiment, oblique deposition having a plurality of directions is effective for forming the second electrode 52 as in the above-described embodiment.

According to each of the above-described embodiments, a full-color display can be formed by arranging the regions 60a, 60b, and 60c selected for each color in a matrix on a flat substrate. Since the regions 60a, 60b, and 60c selected for each color form a continuous organic layer as described above, each pixel can be formed at a high density and a sufficient light emitting region can be secured. A high-brightness, high-definition display can be formed. In addition, in the region for each color, taking into account the fact that the light emitting layer for each color has a difference in light emission efficiency, the organic layer (light emitting layer and electron transport layer or hole transport layer) that contributes to the amount of light emission is taken into consideration. Since the layers are formed with different film thicknesses, full-color display with good color balance and contrast can be executed without adjusting the driving conditions for each color. The step on the surface of the organic layer formed by setting the thickness of the organic layer for each color does not affect the thickness of the second electrode formed on the surface of the organic layer. Therefore, no defective resistance portion or disconnection portion is formed on the second electrode, and defects such as display defects and pixel defects can be completely eliminated. Therefore, the organic EL display device according to each of the above-described embodiments can execute high-quality full-color display.

In the above description, an active type (active matrix driving) device is mainly described as an example. However, the structure and manufacturing method of the present invention are not limited to this, and may be in the form of a stripe. It is also applicable to a passive type (simple matrix drive) organic EL display in which transparent electrodes are arranged in parallel. Also, the first electrode is a transparent electrode,
An example in which display is performed through a transparent substrate using the second electrode as a reflective electrode is described as an example. Conversely, the first electrode is used as a reflective electrode, and the second electrode is used as a transparent electrode. The same operation can be achieved even if the information is displayed on the side.

[0048]

Since the present invention is configured as described above,
A plurality of first electrodes formed on the substrate, a hole transport layer formed on the first electrode, an organic layer including a light emitting layer emitting any one of RGB colors and an electron transport layer; In the organic EL display device including the second electrode formed so as to cover and the method of manufacturing the same, color balance and contrast can be improved, display failure and pixel defects do not occur, and high-density display can be performed. Therefore, high-quality full-color display can be performed.

[Brief description of the drawings]

FIG. 1 is an organic EL according to a first embodiment of the present invention.
FIG. 3 is an explanatory diagram illustrating a structure of a display device.

FIG. 2 shows an organic EL according to a second embodiment of the present invention.
FIG. 3 is an explanatory diagram illustrating a structure of a display device.

FIG. 3 is an organic EL according to a third embodiment of the present invention.
FIG. 3 is an explanatory diagram illustrating a structure of a display device.

FIG. 4 is an explanatory diagram illustrating a structure of an organic EL display device that performs full-color display by active matrix driving.

FIG. 5 is a schematic view of an xx section in FIG. 4;

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Substrate 2 1st electrode 3 Insulating film 4 Organic layer 40 Hole injection layer 41 Hole transport layer 42a, 42b, 42c Light emitting layer 43a, 43b, 43c Electron transport layer 44,44a, 44b, 44c Electron injection layer 45a, 45b , 45c Light emitting areas 46a, 46b First electron transport layer 47 Second electron transport layer 5, 50, 51, 52 Second electrode 6 Insulating film 60a, 60b, 60c (selected for each color)

──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 7 Identification code FI Theme coat ゛ (Reference) H05B 33/22 H05B 33/22 D Z

Claims (6)

[Claims]
1. A plurality of first electrodes formed on a substrate, and a hole transport layer formed on the first electrode, an organic layer including a light emitting layer emitting any one of RGB colors and an electron transport layer, In an organic EL display device including a second electrode formed over the organic layer, the organic layer is formed as a layer connecting regions selected for each color, and the second electrode has a film thickness of Is larger than the maximum value among the thicknesses of the respective colors obtained by adding the light emitting layer and the electron transport layer in the organic layer.
2. A plurality of first electrodes formed on a substrate, an organic layer including a hole transport layer formed on the first electrode, a light emitting layer emitting any one of RGB colors and an electron transport layer, In an organic EL display device including a second electrode formed over the organic layer, the organic layer is formed as a layer connecting regions selected for each color, and the electron transport layer is selected for each color. An organic EL display device comprising: a first layer formed in a defined region; and a second layer formed commonly for each color.
3. A plurality of first electrodes are formed on a substrate, and a hole transport layer, a light emitting layer emitting any one of RGB colors, and an organic layer including an electron transport layer are formed on the first electrodes, In a method for manufacturing an organic EL display device, wherein a second electrode is formed over the organic layer, the organic layer is formed as a layer formed by connecting regions selected for each color, and the second electrode is formed on the organic layer. A method for manufacturing an organic EL display device, comprising: depositing a film on the organic layer so as to have a film thickness larger than the maximum value among the respective color film thicknesses including the light emitting layer and the electron transport layer.
4. A plurality of first electrodes are formed on a substrate, and a hole transport layer, an organic layer including a light emitting layer emitting any one of RGB colors and an electron transport layer are formed on the first electrodes, In a method of manufacturing an organic EL display device, wherein a second electrode is formed over the organic layer, the organic layer is formed as a continuous layer of regions selected for each color. A method for manufacturing an organic EL display device, comprising, after depositing one electron transport layer, uniformly depositing a second electron transport layer for each color.
5. A method according to claim 5, wherein a plurality of first electrodes are formed on the substrate, and a hole transport layer, an organic layer including a light emitting layer emitting any one of RGB colors and an electron transport layer are formed on the first electrodes; In a method of manufacturing an organic EL display device, wherein a second electrode is formed over the organic layer, the organic layer is formed as a continuous layer of regions selected for each color. After depositing one electron transport layer, a second electron transport layer is uniformly deposited for each color, and the second electrode has a thickness of each color obtained by adding the light emitting layer and the electron transport layer in the organic layer. A method of manufacturing an organic EL display device, wherein the organic EL display device is deposited on the organic layer so as to have a film thickness larger than the maximum value in the inside.
6. The method according to claim 3, wherein the second electrode is formed by oblique deposition.
13. The method for manufacturing an organic EL display device according to item 10.
JP2001169650A 2001-06-05 2001-06-05 Organic el display device and its manufacturing method Pending JP2002367787A (en)

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TW091111764A TW541856B (en) 2001-06-05 2002-05-31 Organic electro-luminescent display apparatus and method for manufacturing the same
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