JP2001257073A - El element and its manufacturing method - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an EL element which is easy to manufacture and its manufacturing method. SOLUTION: The EL element comprises at least a base body, a first electrode formed on the base body, an EL layer formed on the first electrode, and a second electrode formed on the EL layer. At least one layer of a photocatalyst containing layer is formed at any position between the base body and the second electrode.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an EL (electroluminescence) device, and more particularly to an organic thin film EL device used for a display device.

[0002]

2. Description of the Related Art Attention has been paid to the use of EL elements as self-luminous planar display elements. Among them, an organic thin-film EL display using an organic substance as a light-emitting material has high luminous efficiency, such as realizing high-luminance light emission even at an applied voltage of slightly less than 10 V, and can emit light with a simple element structure. Is expected to be applied to advertisements for displaying the pattern of light emission and other low-cost displays for simple displays.

However, in actually manufacturing a display using EL elements, it is necessary to pattern electrodes and an organic EL layer, and typically requires a photolithography process and a patterning process using a complicated pattern film forming apparatus. However, this complicates the process and increases the cost. Further, in the method of patterning the organic EL material by mask vapor deposition, a high-priced vacuum device is required, and the yield and the cost are problematic. On the other hand, the method of forming a pattern by the ink-jet method has relatively simple steps, but has problems in terms of yield and film thickness uniformity. Advertising EL
When various shapes and large areas are required such as elements, there is a problem that productivity is significantly reduced.

As described above, in the production of an EL element, particularly, an organic EL display, the number of steps becomes very large in order to perform patterning of electrodes, organic EL layers, insulating layers, and the like. Face big challenges.

[0005]

SUMMARY OF THE INVENTION An object of the present invention is to provide an EL device which can be manufactured more easily and a method for manufacturing the same.

[0006]

Means for Solving the Problems The present inventors form a pattern based on the difference in wettability by patternwise exposing a photocatalyst-containing layer, and use the pattern to form an EL layer, a first electrode or a second electrode. It has been found that the above-mentioned problems can be solved by forming the present invention, and the present invention has been completed.

Therefore, the EL device of the present invention comprises a base, a first electrode formed on the base, an EL layer formed on the first electrode, and a second electrode formed on the EL layer. An EL device comprising at least an electrode, wherein at least one photocatalyst-containing layer is formed at any position between the base and the second electrode.

[0008]

BEST MODE FOR CARRYING OUT THE INVENTION EL Element As described above, an EL element of the present invention comprises at least a base, a first electrode, an EL layer, and a second electrode laminated on each other. At least one photocatalyst-containing layer is formed at any position between them. The EL device of the present invention can include any layer that is usually used for an EL device. In addition, it is preferable that the EL element is a display of full color display in which fine pixels are patterned, because the effect of the present invention is large.

FIG. 1 is a cross-sectional view of an example of the EL device of the present invention, in which a first electrode 2, a photocatalyst containing layer 3,
An EL layer 5 and a second electrode 6 are laminated, and another EL layer 4 is formed between the EL layer 5 and the portion 3 ′ of the photocatalyst containing layer 3 where the wettability has changed. I have.

Photocatalyst-Containing Layer (Photocatalyst-Containing Layer) In the present invention, the photocatalyst-containing layer means a layer whose wettability can be changed in the future by light irradiation and a layer which has already changed. The photocatalyst may be any substance that causes such a change. By exposing the photocatalyst-containing layer in a pattern, a pattern due to a change in wettability can be formed. Typically, the area not irradiated with light is water repellent,
The site irradiated with light becomes highly hydrophilic. In the present invention,
The pattern of the layer (EL layer, first electrode, second electrode, etc.) provided on the photocatalyst-containing layer can be easily formed with high quality using the pattern due to the difference in wettability of the surface of the photocatalyst-containing layer. .

The photocatalyst-containing layer of the present invention may be provided at any position between the base and the second electrode, for example, between the base and the first electrode, and between the first electrode and the second electrode. The space between the EL layer and the EL layer or between the EL layer and the second electrode when the EL layer includes a plurality of layers is used. The photocatalyst containing layer is provided between the first electrode and the EL layer,
It is preferable to pattern the EL layer. The photocatalyst-containing layer may be formed not only in one layer but also in a plurality of layers. In this case, the patterning of the plurality of layers formed on the photocatalyst-containing layer can be realized easily and with high quality.

If the thickness of the photocatalyst-containing layer is too small, the difference in wettability does not clearly appear and patterning becomes difficult. If the thickness is too large, the transport of holes or electrons is hindered.
Since the light emission of the L element is adversely affected, preferably 50 to
2000 °, more preferably 300 to 1000 °.

(Principle of Change in Wettability) In the present invention,
Using a photocatalyst capable of causing a chemical change in a nearby substance (such as a binder) by light irradiation, a pattern due to a difference in wettability is formed in a portion irradiated with light. The mechanism of action by the photocatalyst is not always clear, but the carrier generated in the photocatalyst by light irradiation directly changes the chemical structure of the binder or the like, or the active oxygen species generated in the presence of oxygen or water binds the binder. It is considered that the surface wettability changes by changing the chemical structure such as the above.

(Photocatalyst Material) Examples of the photocatalyst material used in the present invention include titanium oxide (TiO ₂ ), zinc oxide (ZnO), tin oxide (SnO ₂ ) and strontium titanate (SrTi) which are known as optical semiconductors.
Metal oxides such as O ₃ ) / tungsten oxide (WO ₃ ), bismuth oxide (Bi ₂ O ₃ ), and iron oxide (Fe ₂ O ₃ ) can be given, and titanium oxide is particularly preferred. Titanium oxide has a high band gap energy,
It is advantageous in that it is chemically stable, has no toxicity, and is easily available.

As titanium oxide as a photocatalyst, both anatase type and rutile type can be used, but anatase type titanium oxide is preferable. Specifically, for example, anatase titania sol of peptic hydrochloride type (Ishihara Sangyo Co., Ltd., STS-02, average crystallite diameter 7 nm), anatase titania sol of nitric acid deflocculation type (Nissan Chemical, TA-
15, average crystallite diameter of 12 nm).

The amount of the photocatalyst in the photocatalyst-containing layer is 5 to 60.
% By weight, and more preferably 20 to 40% by weight.

(Binder Component) The binder that can be used in the photocatalyst-containing layer of the present invention preferably has a high binding energy such that the main skeleton is not decomposed by the photoexcitation of the photocatalyst. Examples include organopolysiloxanes that exhibit large strength by hydrolyzing and polycondensing chloro or alkoxysilanes by reaction or the like, or (2) organopolysiloxanes obtained by crosslinking reactive silicones having excellent water repellency and oil repellency. Can be.

In the case of the above (1), the general formula Y _n SiX
One or more hydrolyzed condensates and co-hydrolyzed compounds of the silicon compound represented by _4-n (n = 1 to 3) can be the main component. In the above general formula, Y can be, for example, an alkyl group, a fluoroalkyl group, a vinyl group, an amino group or an epoxy group, and X is, for example, a halogen,
It can be a methoxyl, ethoxyl, or acetyl group.

Specifically, methyltrichlorosilane, methyltribromosilane, methyltrimethoxysilane, methyltriethoxysilane, methyltriisopropoxysilane, methyltri-t-butoxysilane; ethyltrichlorosilane, ethyltribromosilane, ethyltrichlorosilane Methoxysilane, ethyltriethoxysilane, ethyltriisopropoxysilane, ethyltri-t-butoxysilane; n
-Propyltrichlorosilane, n-propyltribromosilane, n-propyltrimethoxysilane, n-propyltriethoxysilane, n-propyltriisopropoxysilane, n-propyltri-t-butoxysilane; n-
Hexyltrichlorosilane, n-hexyltribromosilane, n-hexyltrimethoxysilane, n-hexyltriethoxysilane, n-hexyltriisopropoxysilane, n-hexyltri-t-butoxysilane; n-decyltrichlorosilane, n-decyl Tribromosilane,
n-decyltrimethoxysilane, n-decyltriethoxysilane, n-decyltriisopropoxysilane, n-
Decyltri-t-butoxysilane; n-octadecyltrichlorosilane, n-octadecyltribromosilane, n
-Octadecyltrimethoxysilane, n-octadecyltriethoxysilane, n-octadecyltriisopropoxysilane, n-octadecyltri-t-butoxysilane; phenyltrichlorosilane, phenyltribromosilane, phenyltrimethoxysilane, phenyltriethoxysilane, phenyl Triisopropoxysilane, phenyltri-t-butoxysilane; tetrachlorosilane, tetrabromosilane, tetramethoxysilane, tetraethoxysilane, tetrabutoxysilane, dimethoxydiethoxysilane; dimethyldichlorosilane, dimethyldibromosilane, dimethyldimethoxysilane , Dimethyldiethoxysilane; diphenyldichlorosilane, diphenyldibromosilane, diphenyldimethoxysilane, diphenyldiethoxysilane Phenyl methyldichlorosilane,
Phenylmethyldibromosilane, phenylmethyldimethoxysilane, phenylmethyldiethoxysilane; trichlorohydrosilane, tribromohydrosilane, trimethoxyhydrosilane, triethoxyhydrosilane, triisopropoxyhydrosilane, tri-t-butoxyhydrosilane; vinyltrichlorosilane, vinyltribromo Silane, vinyltrimethoxysilane, vinyltriethoxysilane, vinyltriisopropoxysilane, vinyltrit
-Butoxysilane; trifluoropropyltrichlorosilane, trifluoropropyltribromosilane, trifluoropropyltrimethoxysilane, trifluoropropyltriethoxysilane, trifluoropropyltriisopropoxysilane, trifluoropropyltri-t-butoxysilane; γ- Glycidoxypropylmethyldimethoxysilane, γ-glycidoxypropylmethyldiethoxysilane, γ-glycidoxypropyltrimethoxysilane, γ-glycidoxypropyltriethoxysilane, γ
Glycidoxypropyltriisopropoxysilane, γ
-Glycidoxypropyltri-t-butoxysilane; γ-
Methacryloxypropylmethyldimethoxysilane, γ
-Methacryloxypropylmethyldiethoxysilane,
γ-methacryloxypropyltrimethoxysilane, γ
-Methacryloxypropyltriethoxysilane, γ-
Methacryloxypropyltriisopropoxysilane,
γ-methacryloxypropyltri-t-butoxysilane; γ-aminopropylmethyldimethoxysilane, γ-
Aminopropylmethyldiethoxysilane, γ-aminopropyltrimethoxysilane, γ-aminopropyltriethoxysilane, γ-aminopropyltriisopropoxysilane, γ-aminopropyltri-t-butoxysilane;
γ-mercaptopropylmethyldimethoxysilane, γ-
Mercaptopropylmethyldiethoxysilane, γ-mercaptopropyltrimethoxysilane, γ-mercaptopropyltriethoxysilane, γ-mercaptopropyltriisopropoxysilane, γ-mercaptopropyltri-t-butoxysilane; β- (3,4-epoxy Cyclohexyl) ethyltrimethoxysilane, β- (3,4-epoxycyclohexyl) ethyltriethoxysilane; and partial hydrolysates thereof; and mixtures thereof.

As the binder, a polysiloxane containing a fluoroalkyl group can be used particularly preferably. Specifically, one or more hydrolyzed condensates of the following fluoroalkylsilanes, Examples include a hydrolytic condensate, and those generally known as a fluorine-based silane coupling agent may be used.

CF ₃ (CF ₂ ) ₃ CH ₂ CH ₂ Si (OCH ₃ ) ₃ CF ₃ (CF ₂ ) ₅ CH ₂ CH ₂ Si (OCH ₃ ) ₃ CF ₃ (CF ₂ ) ₇ CH ₂ CH ₂ Si ( OCH ₃ ) ₃ CF ₃ (CF ₂ ) ₉ CH ₂ CH ₂ Si (OCH ₃ ) ₃ (CF ₃ ) ₂ CF (CF ₂ ) ₄ CH ₂ CH ₂ Si (OC
_{H 3) 3 (CF 3)} 2 CF (CF 2) 6 CH 2 CH 2 Si (OC
_{H 3) 3 (CF 3)} 2 CF (CF 2) 8 CH 2 CH 2 Si (OC
_{H 3) 3 CF 3 (C} 6 H 4) C 2 H 4 Si (OCH 3) 3 CF 3 (CF 2) 3 (C 6 H 4) C 2 H 4 Si (OCH
₃ ) ₃ CF ₃ (CF ₂ ) ₅ (C ₆ H ₄ ) C ₂ H ₄ Si (OCH
₃ ) ₃ CF ₃ (CF ₂ ) ₇ (C ₆ H ₄ ) C ₂ H ₄ Si (OCH
₃ ) ₃ CF ₃ (CF ₂ ) ₃ CH ₂ CH ₂ SiCH ₃ (OC
H ₃ ) ₂ CF ₃ (CF ₂ ) ₅ CH ₂ CH ₂ SiCH ₃ (OC
H ₃ ) ₂ CF ₃ (CF ₂ ) ₇ CH ₂ CH ₂ SiCH ₃ (OC
H ₃ ) ₂ CF ₃ (CF ₂ ) ₉ CH ₂ CH ₂ SiCH ₃ (OC
_{H 3) 2 (CF 3)} 2 CF (CF 2) 4 CH 2 CH 2 SiCH 3
(OCH ₃ ) ₂ (CF ₃ ) ₂ CF (CF ₂ ) ₆ CH ₂ CH ₂ SiCH ₃
(OCH ₃ ) ₂ (CF ₃ ) ₂ CF (CF ₂ ) ₈ CH ₂ CH ₂ SiCH _{3
(OCH 3) 2 CF 3 (} C 6 H 4) C 2 H 4 SiCH 3 (OCH 3) 2 CF 3 (CF 2) 3 (C 6 H 4) C 2 H 4 SiCH
_{3 (OCH 3) 2 CF 3} (CF 2) 5 (C 6 H 4) C 2 H 4 SiCH
_{3 (OCH 3) 2 CF 3} (CF 2) 7 (C 6 H 4) C 2 H 4 SiCH
₃ (OCH ₃ ) ₂ CF ₃ (CF ₂ ) ₃ CH ₂ CH ₂ Si (OCH ₂ C
H ₃ ) ₃ CF ₃ (CF ₂ ) ₅ CH ₂ CH ₂ Si (OCH ₂ C
H ₃ ) ₃ CF ₃ (CF ₂ ) ₇ CH ₂ CH ₂ Si (OCH ₂ C
H ₃ ) ₃ CF ₃ (CF ₂ ) ₉ CH ₂ CH ₂ Si (OCH ₂ C
_{H 3) 3 CF 3 (CF} 2) 7 SO 2 N (C 2 H 5) C 2 H 4 CH
₂ Si (OCH ₃ ) ₃ By using a polysiloxane containing a fluoroalkyl group as described above as a binder, the water repellency and oil repellency of the non-light-irradiated portion of the photocatalyst containing layer are greatly improved.

The reactive silicone of the above (2) includes:
A compound having a skeleton represented by the following general formula can be given.

-(Si (R ¹ ) (R ² ) O) _n-wherein n is an integer of 2 or more, and R ¹ and R ² are each a substituted or unsubstituted alkyl, alkenyl or aryl having 1 to 10 carbon atoms. Alternatively, it can be a cyanoalkyl group. Preferably, up to 40 mol% of the total can be vinyl, phenyl or phenyl halide. Also,
It is preferable that R ¹ and / or R ² be a methyl group because the surface energy is minimized. Preferably, the methyl group is at least 60 mol%, and at least one of the methyl group and the chain end or side chain in the molecular chain It has a reactive group such as the above hydroxyl group.

Further, a stable organosilicon compound which does not cause a cross-linking reaction, such as dimethylpolysiloxane, may be mixed with the binder together with the above-mentioned organopolysiloxane.

(Other Components Used in Photocatalyst-Containing Layer) The photocatalyst-containing layer used in the present invention may contain a surfactant in order to reduce the wettability of the unexposed portion. The surfactant is not limited as long as it can be decomposed and removed by a photocatalyst, and specifically, preferably, for example, NIKKOL BL, manufactured by Nippon Surfactant Industries, Ltd.
Hydrocarbon surfactants such as BC, BO and BB series, manufactured by DuPont: ZONYL FSN, FSO, manufactured by Asahi Glass: Surflon S-141, 145, manufactured by Dainippon Ink: Megafac F-141, 144, Neos: Futagent F-200, F251; Daikin Industries: Unidyne DS-401, 402; 3M: Florard FC-170, 176, etc. Fluorinated or silicone-based nonionic surfactants. In addition, cationic, anionic and amphoteric surfactants can also be used.

The photocatalyst-containing layer suitably used in the present invention contains other components such as polyvinyl alcohol,
Unsaturated polyester, acrylic resin, polyethylene, diallyl phthalate, ethylene propylene diene monomer, epoxy resin, phenol resin, polyurethane, melamine resin, polycarbonate, polyvinyl chloride, polyamide, polyimide, styrene butadiene rubber, chloroprene rubber, polypropylene, polybutylene, polystyrene And oligomers and polymers such as polyvinyl acetate, nylon, polyester, polybutadiene, polybenzimidazole, polyacrylonitrile, epichlorohydrin, polysulfide, and polyisoprene.

Further, the photocatalyst-containing layer used in the present invention may contain a sensitizing dye which is a component for sensitizing the photoactivity of the photocatalyst. By adding such a sensitizing dye, the wettability can be changed at a low exposure dose, or the wettability can be changed at a different wavelength. Further, an EL material can be added to the photocatalyst-containing layer. For example, by mixing a charge injecting material, a charge transporting material, or a light emitting material, the light emitting characteristics of the EL element can be improved.

(Method for Forming Photocatalyst-Containing Layer) The method for forming the photocatalyst-containing layer is not particularly limited. For example, a coating solution containing a photocatalyst is applied to a substrate by a method such as spray coating, dip coating, roll coating, or bead coating. It can be formed by coating.

When a coating solution containing a photocatalyst or the like is used, the solvent that can be used for the coating solution is not particularly limited, and examples thereof include alcoholic organic solvents such as ethanol and isopropanol.

(Irradiation Light for Activating the Photocatalyst) The irradiation light for activating the photocatalyst is not limited as long as the photocatalyst can be excited. Examples of such a material include ultraviolet light, visible light, and infrared light, as well as electromagnetic waves and radiation having a shorter or longer wavelength than these light beams.

For example, when anatase type titania is used as the photocatalyst, since the excitation wavelength is 380 nm or less, the photocatalyst can be excited by ultraviolet rays. As a device emitting such ultraviolet rays, a mercury lamp, a metal halide lamp, a xenon lamp, an excimer laser, and other ultraviolet light sources can be used.

EL Layer The EL layer provided in the EL element of the present invention is not limited as long as it causes electroluminescence. The EL layer is provided on the first electrode (between the first electrode and the second electrode). However, even if the EL layer is provided directly on the first electrode, the first electrode and the EL layer may be provided as necessary. A photocatalyst containing layer or another layer may be interposed between them.

The EL layer of the present invention further comprises, as constituent elements thereof, a light emitting layer as an essential layer, a hole transporting layer for transporting holes to the light emitting layer, and an electron transporting layer for transporting electrons to the light emitting layer. May be collectively referred to as a charge transport layer), and a hole injection layer for injecting holes into the light emitting layer or the hole transport layer, and an electron injection layer for injecting electrons into the light emitting layer or the electron transport layer (these may be referred to as a charge transport layer). May be collectively referred to as a charge injection layer).

The following are examples of materials constituting these EL layers.

(Light Emitting Layer) <Dye System> Cyclopentadiene derivative, tetraphenylbutadiene derivative, triphenylamine derivative, oxadiazole derivative, pyrazoloquinoline derivative, distyrylbenzene derivative, distyrylarylene derivative, silole derivative, thiophene ring Compound, pyridine ring compound,
Perinone derivative, perylene derivative, oligothiophene derivative, trifmanylamine derivative, oxadiazole dimer, virazoline dimer <metal complex type> aluminum quinolinol complex, benzoquinolinol beryllium complex, benzoxazole zinc complex,
Benzothiazole zinc complex, azomethyl zinc complex, porphyrin zinc complex, eurobium complex, etc., have Al, Zn, Be, etc. as a central metal or rare earth metals such as Tb, Eu, Dy, etc., and oxadiazole as a ligand, Metal complexes having a thiadiazole, phenylpyridine, phenylbenzimidazole, quinoline structure or the like.

<Polymer system> Polyparaphenylene vinylene derivative, polythiophene derivative, polyparaphenylene derivative, polysilane derivative, polyacetylene derivative, polyvinylcarbazole, etc., polyfluorene derivative (doping material) perylene derivative, coumarin derivative,
Rubrene derivative, quinacridone derivative, squarium derivative, porphyrin derivative, styryl dye, tetracene derivative, pyrazoline derivative, decacyclene, phenoxazone (hole injection layer (anode buffer material)) phenylamine, starburst amine, phthalocyanine, oxidation Oxides such as vanadium, molybdenum oxide, ruthenium oxide, and aluminum oxide, amorphous carbon, polyaniline, and polythiophene derivatives (electron injection layer (cathode buffer material)) aluminum lithium, lithium fluoride, strontium, magnesium oxide, magnesium fluoride, fluoride Strontium, calcium fluoride, barium fluoride, aluminum oxide, strontium oxide, calcium, polymethyl methacrylate, polystyrene sulfonate The EL layer (partition wall layer material of the EL layer) helium can also be provided partition wall, the partition wall is particularly useful when combining EL layer emitting a different color. Examples of such a material include a photosensitive polyimide resin, an acrylic resin, a photocurable resin, a thermosetting resin, and a water-repellent resin.

First and Second Electrodes In this specification, the electrode provided first on the substrate is referred to as a first electrode, and the electrode provided thereafter on the EL layer is referred to as a second electrode. Although these electrodes are not particularly limited, preferably, the electrodes include an anode and a cathode, and in this case, the first electrode may be either an anode or a cathode. Either the anode or the cathode is transparent or translucent.
A conductive material having a large work function is preferable so that holes can be easily injected, and a conductive material having a small work function is preferable for the cathode so that electrons can be easily injected. Further, a plurality of materials may be mixed. The resistance of each electrode is preferably as low as possible. In general, a metal material is used, but an organic substance or an inorganic compound may be used.

Specifically, preferred anode materials are ITO,
Examples of indium oxide, gold, polyaniline, and cathode materials include magnesium alloys (eg, MgAg), aluminum alloys (eg, AlLi, AlCa, AlMg), and calcium metal.

Substrate In the present invention, the substrate is a substrate on which electrodes and an EL layer are provided, and can be made of a transparent material if desired, but may be an opaque material. In the EL device of the present invention, the substrate may be the first electrode itself, but usually the first electrode is provided directly or via an intermediate layer on the surface of the substrate that maintains strength.

Manufacturing Method The method for manufacturing an EL device according to the present invention employs an EL device on a photocatalyst-containing layer.
In an embodiment in which a layer is provided, a step of forming a first electrode on a substrate, a step of forming a photocatalyst-containing layer on the first electrode, and exposing the photocatalyst-containing layer in a pattern to obtain a wettability Forming a pattern based on the difference between the two, and applying an EL layer forming solution on the exposed portion of the photocatalyst-containing layer to form the patterned EL layer; and forming the second electrode on the EL layer. And a forming step.

According to the EL device of the present invention in which the first electrode is provided on the photocatalyst-containing layer, the photocatalyst-containing layer is formed on the substrate in place of the first electrode in the above-mentioned method. On the part, the first electrode forming liquid is applied,
Except for including the step of forming the patterned first electrode, it can be manufactured in the same manner as the above method.

According to the EL device of the present invention in which the second electrode is provided on the photocatalyst-containing layer, the photocatalyst-containing layer is formed on the EL layer instead of the first electrode in the above-mentioned method. It can be manufactured in the same manner as the above method except that a step of forming the patterned second electrode by applying the second electrode forming liquid on the exposed portion is included.

Except for the photocatalyst-containing layer and the layer formed thereon, a normal EL element manufacturing method can be used.

Solvents of Coating Liquids Liquids applied to form each layer on the photocatalyst-containing layer, for example, an EL layer forming liquid, a first electrode forming liquid, and a second electrode forming liquid (these are collectively referred to as a coating liquid). Preferably, the solvent is a polar solvent such as water. A coating solution using such a polar solvent has high wettability with the exposed portion of the photocatalyst-containing layer and has a strong tendency to repel the unexposed portion, which is advantageous in patterning the coating solution.

Coating Method Application of the coating solution to the photocatalyst-containing layer includes spin coating, ink jetting, dip coating, blade coating, and dropping to the photocatalyst-containing layer.

Patterning Method Layers such as the EL layer, the first electrode, and the second electrode formed on the photocatalyst-containing layer are patterned by a method of patterning in the state of a coating solution before solidification, or by forming a layer after solidification. It is also possible to peel off only a portion having low wettability in the state of being performed. Specific examples include a method of inclining the substrate before solidification, a method of blowing air, and a method of sticking and peeling off an adhesive tape after solidification.

The wetting pattern and pixel EL element of the present invention, when a display of a full color display, preferably, in correspondence to the pattern by wettability differences between the photocatalyst-containing layer to form a pixel of the display.

[0048]

Example 1 A photocatalyst-containing layer forming solution and an EL layer forming solution having the following compositions were prepared.

(Photocatalyst-containing layer forming liquid 1) Anatase titania sol (ST-K03 manufactured by Ishihara Sangyo Co., Ltd.) 2 parts by weight Fluoroalkoxylan (MF-160E manufactured by Tochem Products Co., Ltd.) 0.0012 parts by weight Hydrochloric acid 4 parts by weight Isopropyl alcohol 4.5 parts by weight (EL) Layer forming liquid 1) Polyvinylcarbazole (Lan. K81127, manufactured by Anan Corporation) 70 parts by weight Oxadiazole compound (manufactured by Wako Pure Chemical Industries, Ltd.) 30 parts by weight Coumarin 6 (manufactured by Aldrich. Chem. Co.) 1 part by weight 1,2 3367 parts by weight of dichloroethane (manufactured by Junsei Chemical) First, an ITO glass substrate patterned to a line width of 162 μm at intervals of 24 μm was washed. The above photocatalyst containing layer forming liquid 1 is applied to the entire surface by a spin coater,
After drying at 150 ° C. for 10 minutes, hydrolysis and polycondensation reactions were allowed to proceed to form a transparent photocatalyst-containing layer having a thickness of 100 ° with the photocatalyst firmly fixed in the organosiloxane. Subsequently, a mercury lamp (wavelength 365 n) is applied through a mask.
m) at 70 mW / cm ² for 50 seconds with ITO
Pattern irradiation was performed only on the photocatalyst-containing layer portion on the line width.
Next, poly (3,4) ethylenedioxythiophene / polystyrenesulfonate (abbreviated as PEDOT / PSS, trade name Baytron PTP AI 4083, Bayer) is applied to the entire surface of the pattern-irradiated photocatalyst-containing layer by a spin coater. Is dried at 100 ° C. to obtain a film thickness of about 1
PEDOT of 2,000 Å was applied only to the irradiated area on the ITO line width. Further, the above EL layer forming liquid 1 was applied to the entire surface by a spin coater. Finally, using the same mask, LiF was deposited at a thickness of 5 ° and aluminum was deposited at a thickness of 2000 ° so as to be orthogonal to the pattern of the ITO and organic EL layers. ITO electrode and upper part A
By driving the 1 electrode as an address electrode, green light emission was obtained.

Example 2 An EL element was manufactured in the same manner as in Example 1, except that the photocatalyst-containing layer was formed to a thickness of 2000 ° by reducing the weight of the solvent isopropyl alcohol in the photocatalyst-containing layer forming liquid 1. However, green light was emitted.

Example 3 A photocatalyst-containing layer forming liquid 2 having the following composition was prepared.

(Photocatalyst-Containing Layer Forming Solution 2) Anatase type titania sol (ST-K03 manufactured by Ishihara Sangyo Co., Ltd.) 2 parts by weight Fluoroalkoxylan (MF-160E manufactured by Tochem Products Co., Ltd.) 0.02 parts by weight Isopropyl alcohol 4.5 parts by weight First, at intervals of 24 μm The ITO glass substrate patterned to a line width of 162 μm was washed. The photocatalyst-containing layer forming liquid 2 is applied to the entire surface by a spin coater,
After drying at 150 ° C. for 10 minutes, hydrolysis and polycondensation reactions were allowed to proceed to form a transparent photocatalyst-containing layer having a photocatalyst firmly fixed in the organosiloxane to a film thickness of 50 °. Subsequently, a mercury lamp (wavelength 365 n) is applied through a mask.
m) with irradiation of 70 mW / cm ² for 50 seconds, ITO
Pattern irradiation was performed only on the photocatalyst-containing layer portion on the line width.
Next, poly (3,4) ethylenedioxythiophene / polystyrenesulfonate (abbreviated as PED) in which the solvent is aqueous
OT / PSS, trade name Baytron PTP AI
4083, Bayer Co.) was applied by a dip coater to the entire surface of the photocatalyst-containing layer which had been subjected to pattern irradiation.
By drying at 00 ° C, PE with a film thickness of about 1000 約
DOT was applied only to the irradiated area on the ITO line width. Further, the above EL layer forming liquid 1 is applied by a spin coater.
It was applied to the entire surface. Finally, using the same mask, ITO
In addition, LiF was deposited at a thickness of 5 ° and aluminum was deposited at a thickness of 2000 ° so as to be perpendicular to the pattern of the organic EL layer. Green light emission was obtained by driving the ITO electrode and the upper Al electrode as address electrodes.

Example 4 In Example 3, the thickness of the photocatalyst-containing layer was set to about 2000
When an EL element was produced in the same manner except that the light-emitting element was formed, green light emission was obtained.

Comparative Example 1 The procedure of Example 1 was repeated, except that the photocatalyst-containing layer was formed to a thickness of 50 ° by increasing the weight of the solvent isopropyl alcohol in the photocatalyst-containing layer forming liquid 1.
When an L element was produced, light emission was obtained, but PE
When DOT was applied in addition to the ITO line width, a line emission pattern could not be obtained.

Comparative Example 2 An EL element was manufactured in the same manner as in Example 1, except that the photocatalyst containing layer was formed to a thickness of 3000 ° by reducing the weight of the solvent isopropyl alcohol in the photocatalyst containing layer forming liquid 1. However, no light emission was obtained.

Comparative Example 3 An EL element was prepared in the same manner as in Example 1 except that the EL layer forming liquid 1 was applied directly without applying PEDOT to the pattern-irradiated photocatalyst-containing layer. However, a line emission pattern could not be obtained due to the application of the coating solution other than the ITO line width.

Comparative Example 4 An EL device was fabricated in the same manner as in Example 3 except that the photocatalyst-containing layer was formed to a thickness of 3000 °. No light emission was obtained.

Example 5 An EL element was prepared in the same manner as in Example 3 except that the EL layer forming liquid 2 was directly applied without applying PEDOT onto the pattern-irradiated photocatalyst-containing layer. Was applied to other than the ITO line width, and a uniform thin film was not formed, so that uniform light emission could not be obtained.

[0059]

According to the present invention, it is possible to provide an EL element which can be easily manufactured and a method for manufacturing the same.

[Brief description of the drawings]

FIG. 1 is a cross-sectional view of an example of the EL device of the present invention.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Base | substrate 2 1st electrode 3 Photocatalyst containing layer 3 'photocatalyst containing layer (wetting change part) 4 EL layer 5 EL layer 6 2nd electrode

Claims (15)

[Claims] An EL element comprising at least a base, a first electrode formed on the base, an EL layer formed on the first electrode, and a second electrode formed on the EL layer. An EL device, wherein at least one photocatalyst-containing layer is formed at any position between the base and the second electrode. 2. The photocatalyst-containing layer has a thickness of 50 to 2,000.
The EL device according to claim 1, wherein? 3. The photocatalyst-containing layer includes a first electrode and the E electrode.
The EL device according to claim 1, wherein the EL device is formed between the L layer and the L layer. 4. An EL device according to claim 1,
Full color display. 5. A base, a first electrode formed on the base, a photocatalyst containing layer formed on the first electrode, an EL layer formed on the photocatalyst containing layer, and the EL layer A method for manufacturing an EL element comprising at least a second electrode formed thereon, wherein: a step of forming the first electrode on the base; and a step of forming a photocatalyst-containing layer on the first electrode. Exposing the photocatalyst-containing layer in a pattern to form a pattern based on a difference in wettability; and forming an EL layer-patterned liquid by applying an EL layer-forming liquid on an exposed portion of the photocatalyst-containing layer. And a step of forming the second electrode on the EL layer. 6. A substrate, a photocatalyst containing layer formed on the substrate, a first electrode formed on the photocatalyst containing layer,
A method for manufacturing an EL element comprising at least an EL layer formed on the first electrode and a second electrode formed on the EL layer, the method comprising: forming a photocatalyst-containing layer on the base; Exposing the photocatalyst-containing layer in a pattern to form a pattern based on a difference in wettability; and applying the first electrode forming liquid onto an exposed portion of the photocatalyst-containing layer to form the first patterned electrode. A method for manufacturing an EL element, comprising: forming an electrode; forming the EL layer on the first electrode; and forming the second electrode on the EL layer. 7. A base, a first electrode formed on the base, an EL layer formed on the first electrode, a photocatalyst containing layer formed on the EL layer, and the photocatalyst containing layer A method of manufacturing an EL element comprising at least a second electrode formed on the EL device, wherein: a step of forming the first electrode on the base; and a step of forming the EL layer on the first electrode. A step of forming a photocatalyst-containing layer on the EL layer; a step of exposing the photocatalyst-containing layer in a pattern to form a pattern based on a difference in wettability; Forming a patterned second electrode by applying a second electrode forming liquid. 8. The solvent for the EL layer forming solution is a polar solvent, and the application of the EL layer forming solution is performed by spin coating, ink jetting, dip coating, blade coating, or dropping onto the photocatalyst containing layer. The method for manufacturing an EL element according to claim 5, which is performed by a selected method. 9. The method according to claim 9, wherein the solvent of the first electrode forming liquid is a polar solvent, and the first electrode forming liquid is applied by a spin coating method, an ink jet method, a dip coating method, a blade coating method, and a method for coating the photocatalyst containing layer. The method for manufacturing an EL element according to claim 6, wherein the method is performed by a method selected from dropping. 10. The method according to claim 1, wherein the solvent of the second electrode forming liquid is a polar solvent, and the application of the second electrode forming liquid is performed by a spin coating method, an ink jet method, a dip coating method, a blade coating method, or a method for coating the photocatalyst containing layer. The method for manufacturing an EL element according to claim 7, wherein the method is performed by a method selected from dropping. 11. A method of patterning the EL layer after applying the EL layer forming liquid, a method of inclining a substrate before solidifying the EL layer forming liquid, a method of blowing air, and a method of sticking and peeling off an adhesive tape after solidifying. The method for producing an EL element according to claim 5, wherein the method is performed by a method selected from the group consisting of: 12. The patterning of the first electrode after the application of the first electrode forming liquid is performed by a method of inclining the substrate before solidifying the first electrode forming liquid, a method of blowing air, and an adhesive tape after the solidification. The method for producing an EL element according to claim 6, wherein the method is performed by a method selected from a method of peeling off the EL element. 13. A method of patterning the second electrode after the application of the second electrode forming liquid, the method of inclining the substrate before solidifying the second electrode forming liquid, the method of blowing air, and the step of applying an adhesive tape after the solidification. The method for manufacturing an EL element according to claim 7, wherein the method is performed by a method selected from a method of peeling off the EL element. 14. The EL device according to claim 5, wherein a portion of the photocatalyst containing layer that is not irradiated with light is water-repellent, but a portion that is irradiated with light becomes hydrophilic. Manufacturing method. 15. The manufacturing of an EL element according to claim 5, wherein the EL element is a display of full color display, and pixels of the display are formed corresponding to a pattern due to a difference in wettability of the photocatalyst containing layer. Method.