JP2001237240A5 - - Google Patents
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- Publication number
- JP2001237240A5 JP2001237240A5 JP2000052080A JP2000052080A JP2001237240A5 JP 2001237240 A5 JP2001237240 A5 JP 2001237240A5 JP 2000052080 A JP2000052080 A JP 2000052080A JP 2000052080 A JP2000052080 A JP 2000052080A JP 2001237240 A5 JP2001237240 A5 JP 2001237240A5
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000052080A JP2001237240A (ja) | 2000-02-23 | 2000-02-23 | 低誘電率膜及びこの低誘電率膜を有する半導体素子 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000052080A JP2001237240A (ja) | 2000-02-23 | 2000-02-23 | 低誘電率膜及びこの低誘電率膜を有する半導体素子 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2001237240A JP2001237240A (ja) | 2001-08-31 |
| JP2001237240A5 true JP2001237240A5 (US20040097461A1-20040520-C00002.png) | 2006-09-07 |
Family
ID=18573648
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000052080A Pending JP2001237240A (ja) | 2000-02-23 | 2000-02-23 | 低誘電率膜及びこの低誘電率膜を有する半導体素子 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2001237240A (US20040097461A1-20040520-C00002.png) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100508901B1 (ko) * | 2002-04-18 | 2005-08-17 | 주식회사 엘지화학 | 유기실리케이트 중합체 및 이를 함유하는 절연막 |
| KR100508900B1 (ko) * | 2002-04-18 | 2005-08-17 | 주식회사 엘지화학 | 유기실리케이트 중합체 및 이를 함유하는 절연막 |
| KR100508902B1 (ko) * | 2002-05-06 | 2005-08-17 | 주식회사 엘지화학 | 유기실리케이트 중합체 및 이를 함유하는 절연막 |
| US7345351B2 (en) | 2003-04-09 | 2008-03-18 | Lg Chem, Ltd. | Coating composition for insulating film production, preparation method of insulation film by using the same, insulation film for semi-conductor device prepared therefrom, and semi-conductor device comprising the same |
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2000
- 2000-02-23 JP JP2000052080A patent/JP2001237240A/ja active Pending
