JP2001217290A5 - - Google Patents

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Publication number
JP2001217290A5
JP2001217290A5 JP2000028894A JP2000028894A JP2001217290A5 JP 2001217290 A5 JP2001217290 A5 JP 2001217290A5 JP 2000028894 A JP2000028894 A JP 2000028894A JP 2000028894 A JP2000028894 A JP 2000028894A JP 2001217290 A5 JP2001217290 A5 JP 2001217290A5
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JP
Japan
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Application number
JP2000028894A
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Japanese (ja)
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JP2001217290A (ja
JP4090657B2 (ja
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Priority to JP2000028894A priority Critical patent/JP4090657B2/ja
Priority claimed from JP2000028894A external-priority patent/JP4090657B2/ja
Publication of JP2001217290A publication Critical patent/JP2001217290A/ja
Publication of JP2001217290A5 publication Critical patent/JP2001217290A5/ja
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Publication of JP4090657B2 publication Critical patent/JP4090657B2/ja
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Expired - Lifetime legal-status Critical Current

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JP2000028894A 2000-02-01 2000-02-01 プローブ装置 Expired - Lifetime JP4090657B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000028894A JP4090657B2 (ja) 2000-02-01 2000-02-01 プローブ装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000028894A JP4090657B2 (ja) 2000-02-01 2000-02-01 プローブ装置

Publications (3)

Publication Number Publication Date
JP2001217290A JP2001217290A (ja) 2001-08-10
JP2001217290A5 true JP2001217290A5 (enrdf_load_stackoverflow) 2006-03-02
JP4090657B2 JP4090657B2 (ja) 2008-05-28

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ID=18554229

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000028894A Expired - Lifetime JP4090657B2 (ja) 2000-02-01 2000-02-01 プローブ装置

Country Status (1)

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JP (1) JP4090657B2 (enrdf_load_stackoverflow)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4596968B2 (ja) 2005-05-11 2010-12-15 株式会社リコー 半導体装置の不良箇所観察のためのシリコン基板加工方法及び不良箇所特定方法
JP2007114040A (ja) * 2005-10-20 2007-05-10 Renesas Technology Corp プロービング装置
JP2008004569A (ja) * 2007-09-26 2008-01-10 Hitachi Ltd 帯電中和制御方法、及びそれを用いた荷電粒子線装置
JP5042282B2 (ja) * 2009-07-27 2012-10-03 株式会社日立製作所 イオンビーム装置
US9941096B2 (en) 2011-09-12 2018-04-10 Fei Company Glancing angle mill
JP7113613B2 (ja) * 2016-12-21 2022-08-05 エフ イー アイ カンパニ 欠陥分析
CN108254666B (zh) * 2017-12-25 2020-06-05 建荣半导体（深圳）有限公司 一种针对蓝牙系统级的晶圆测试装置及方法
CN108761309B (zh) * 2018-05-23 2024-05-17 昆山龙雨智能科技有限公司 一种测试装置
CN110557877B (zh) * 2019-09-11 2021-03-12 北京航空航天大学 朗缪尔探针、朗缪尔探针检测系统及检测方法
CN110718439B (zh) * 2019-09-30 2020-12-18 中国科学院长春光学精密机械与物理研究所 离子束加工设备
CN115236483B (zh) * 2022-06-17 2025-11-14 长鑫存储技术有限公司 一种测试设备、失效分析方法和测试系统
KR102762911B1 (ko) * 2023-03-09 2025-02-07 한국표준과학연구원 오페란도 트랜지스터 분석 장치

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