JP2001194784A5 - - Google Patents

Description

（Ｒ^１は少なくとも２個以上の炭素原子を有する３価または４価の有機基を表し、Ｒ^２は少なくとも２個以上の炭素原子を有する２価の有機基を表す。Ｒ^３は水素、アルカリ金属イオン、アンモニウムイオン、または、炭素数１〜３０の有機基より選ばれた少なくとも１種を表し、うち３０〜１００モル％は水素からなる。ｎは１または２を表す。）
【化２】

（Ｒ^４は炭素数１〜３０の有機基を表し、うち５０〜１００モル％は光感応性基を含んだ有機基を表す。）
【請求項２】一般式（３）で表されるアミン化合物を含むことを特徴とする請求項１記載のネガ型感光性ポリイミド前駆体組成物。
【化３】

（Ｒ^５、Ｒ^６、Ｒ^７は炭素数１〜３０の有機基であり、うち、少なくとも１つは光感応性基を含む有機基である。）
【請求項３】厚さ１０μｍのプリベーク膜におけるポリマーのカルボキシル基濃度が構造単位に対して１０〜１５０モル％であることを特徴とする請求項１記載のネガ型感光性ポリイミド前駆体組成物。
【請求項４】厚さ１０μｍのプリベーク膜におけるポリマーのイミド化率が０〜０．４であることを特徴とする請求項１記載のネガ型感光性ポリイミド前駆体組成物。 [Claims]
Features and 1. A (a) a polymer or oligomer having a structural unit represented by the general formula (1), the Rukoto obtained by reacting represented by vinyl ether compound (b) formula (2) A negative photosensitive polyimide precursor composition.
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(R ¹ represents a trivalent or tetravalent organic group having at least 2 or more carbon atoms, R ² represents a divalent organic group having at least 2 or more carbon atoms. R ³ represents hydrogen, alkali (It represents at least one selected from a metal ion, an ammonium ion, or an organic group having 1 to 30 carbon atoms, of which 30 to 100 mol% consists of hydrogen, and n represents 1 or 2.)
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(R ⁴ represents an organic group having 1 to 30 carbon atoms, of which 50 to 100 mol% represents an organic group containing a photosensitive group.)
2. The negative photosensitive polyimide precursor composition according to claim 1, comprising an amine compound represented by the general formula (3) .
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(R ⁵ , R ⁶ , and R ⁷ are organic groups having 1 to 30 carbon atoms, at least one of which is an organic group containing a photosensitive group.)
3. The negative photosensitive polyimide precursor composition according to claim 1, wherein the carboxyl group concentration of the polymer in the prebaked film having a thickness of 10 μm is 10 to 150 mol% based on the structural unit.
4. The negative photosensitive polyimide precursor composition according to claim 1, wherein the imidation ratio of the polymer in the prebaked film having a thickness of 10 μm is from 0 to 0.4.

[0005]
[Means for Solving the Problems]
The present invention is i.e., wherein Rukoto obtained by reacting a vinyl ether compound represented by (a) a polymer or oligomer having a structural unit represented by the general formula (1), (b) the general formula (2) And a negative photosensitive polyimide precursor composition.