JP2001121427A - Rotary disk cutter - Google Patents

Rotary disk cutter

Info

Publication number
JP2001121427A
JP2001121427A JP30995999A JP30995999A JP2001121427A JP 2001121427 A JP2001121427 A JP 2001121427A JP 30995999 A JP30995999 A JP 30995999A JP 30995999 A JP30995999 A JP 30995999A JP 2001121427 A JP2001121427 A JP 2001121427A
Authority
JP
Japan
Prior art keywords
abrasive grains
substrate
abrasive
disk cutter
cutting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP30995999A
Other languages
Japanese (ja)
Other versions
JP3441685B2 (en
Inventor
Kinya Yokoi
欣也 横井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Noritake Co Ltd
Noritake Diamond Industries Co Ltd
Original Assignee
Noritake Co Ltd
Noritake Diamond Industries Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Noritake Co Ltd, Noritake Diamond Industries Co Ltd filed Critical Noritake Co Ltd
Priority to JP30995999A priority Critical patent/JP3441685B2/en
Publication of JP2001121427A publication Critical patent/JP2001121427A/en
Application granted granted Critical
Publication of JP3441685B2 publication Critical patent/JP3441685B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)

Abstract

PROBLEM TO BE SOLVED: To improve cut surface accuracy by suppressing heat generation caused by contact with a material to be cut during cutting, and by preventing distortion and vibration of a baseplate, in a rotary disk cutter having an abrasive grain layer where super abrasive grains, e.g. diamond abrasive grains, CBN abrasive grains, or the like, are electrodeposited on the outer periphery and the side surfaces of the baseplate. SOLUTION: On the peripheral part 13 including the peripheral surface and the adjacent edge part of the baseplate 10, abrasive grains D are densely fixed so that most of the abrasive grains D come in contact with each other. In the intermediate area 14 between the peripheral part 13 and a tightening part 12, groups each containing three abrasive grains D or less are uniformly arranged at intervals so that he abrasive grains are arranged and fixed in proportions of 20-60% against the number of abrasive grains when densely arranged in the same area.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は建材、タイル、鋳物
などの切断加工に使用される回転円盤カッタに関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a rotary disk cutter used for cutting construction materials, tiles, castings and the like.

【0002】[0002]

【従来の技術】建材、タイル、鋳物などの切断加工に用
いられる回転円盤カッタは、円盤状の基板の外周縁部お
よび両側面部にダイヤモンド砥粒やCBN砥粒などの超
砥粒の層を形成することによって被加工材を切断加工す
るというのが基本的な構成である。そして砥粒層の形成
は、砥粒の脱落が少なく、粉塵の発生が少ないというこ
とから、電着による砥粒層形成法が採用されている。
2. Description of the Related Art A rotating disk cutter used for cutting construction materials, tiles, castings, etc. forms a layer of super-abrasive grains such as diamond abrasive grains or CBN abrasive grains on the outer peripheral edge and both side faces of a disk-shaped substrate. The basic configuration is to cut the work material by performing the cutting. In the formation of the abrasive grain layer, an abrasive grain layer forming method by electrodeposition is adopted because the abrasive grains are less likely to fall off and dust is less generated.

【0003】この種の回転円盤カッタによる切断加工
は、電動工具を用いた手作業による加工作業が多く、手
作業の場合はカッタの姿勢が不安定になり、加工時に被
切断材にカッタの基板が接触しやすくなる。カッタの基
板が高速回転しながら被切断材に接触すると、摩擦によ
る発熱や振動が発生する。このような発熱や振動は、切
断面の精度に大きな影響を与えるほか、基板の熱歪みな
どの発生の原因となるので、極力このような現象を抑え
ることが必要であり、このための方策が従来種々提案さ
れている。
[0003] In this kind of cutting using a rotating disk cutter, there are many manual operations using an electric tool. In the case of manual operation, the posture of the cutter becomes unstable, and the substrate of the cutter is attached to the material to be cut at the time of processing. Are easily contacted. When the substrate of the cutter comes into contact with the material to be cut while rotating at a high speed, heat or vibration is generated due to friction. Such heat and vibrations have a great effect on the accuracy of the cut surface and cause thermal distortion of the substrate.Therefore, it is necessary to suppress such phenomena as much as possible. Conventionally, various proposals have been made.

【0004】たとえば特公平6−77901号公報、特
開平8−168967号公報、特開平9−300225
号公報には、基板の側面部に電着した砥粒層を分散して
配置し、砥粒の粒径を特定の条件に設定した回転円盤カ
ッタが記載されている。また特開平9−66468号公
報には、絶縁インクによるスクリーン印刷によって基板
の側面に多数の細かな電着模様を形成させた回転円盤カ
ッタが記載されている。これらの回転円盤カッタによれ
ば、切断時の発熱や振動が少なく、耐久性も向上すると
いう効果が得られるとされている。
[0004] For example, Japanese Patent Publication No. 6-77901, Japanese Patent Application Laid-Open No. 8-168969, and Japanese Patent Application Laid-Open No. 9-300225
Japanese Patent Application Laid-Open Publication No. H11-139,009 discloses a rotating disk cutter in which abrasive layers which are electrodeposited on a side surface of a substrate are dispersed and arranged, and the particle diameter of abrasive grains is set to specific conditions. Japanese Patent Application Laid-Open No. 9-66468 describes a rotating disk cutter in which a number of fine electrodeposition patterns are formed on the side surface of a substrate by screen printing using insulating ink. According to these rotary disk cutters, it is said that the effects of reducing heat generation and vibration during cutting and improving durability are obtained.

【0005】また本出願人らも、基板の側面の電着領域
での超砥粒が占める面積比率を40〜60%とした回転
円盤カッタを特開平9−123064号公報で開示して
いる。このように基板側面の超砥粒の分布を特定範囲に
設定することにより、切れ味と耐用性の向上をはかるこ
とができるとともに、基板表面の損傷を防ぐことができ
るという効果がある。
Also, the present applicant has disclosed a rotating disk cutter in which the area ratio of superabrasive grains in the electrodeposited region on the side surface of the substrate is 40 to 60% in Japanese Patent Application Laid-Open No. Hei 9-123064. By setting the distribution of the superabrasive grains on the side surface of the substrate to a specific range in this manner, it is possible to improve the sharpness and the durability and to prevent the substrate surface from being damaged.

【0006】[0006]

【発明が解決しようとする課題】ところが、上記各公報
に記載の回転円盤カッタにおいては、基板側面部に電着
した砥粒層が分散して配置されているが、各砥粒層には
それぞれ数十粒以上の砥粒が固着されており、この砥粒
層が切断加工中に被切断材と断続的に接触することにな
り、振動や騒音を発生しやすく、基板の破損の原因とな
り、切断面精度にも悪影響を与えるという問題がある。
However, in the rotating disk cutter described in each of the above publications, the abrasive grain layers electrodeposited on the side surface of the substrate are dispersed and arranged. Dozens or more abrasive grains are fixed, and this abrasive layer will intermittently come into contact with the workpiece during cutting, causing vibration and noise to occur, causing damage to the substrate, There is a problem that the accuracy of the cut surface is also adversely affected.

【0007】また、各砥粒層には砥粒が密集して固着さ
れているので、切断加工時における砥粒の切り込み深さ
は浅いものとなって上滑りしやすくなり、この上滑りに
よって発熱が大きくなるという問題がある。
Further, since the abrasive grains are densely fixed to each abrasive grain layer, the cutting depth of the abrasive grains during the cutting process becomes shallow, so that the abrasive grains easily slide upward. Problem.

【0008】本発明が解決すべき課題は、基板の外周縁
部と両側面部に砥粒層を形成した回転円盤カッタにおい
て、とくに基板側面部の砥粒の配置形態を改善して、切
断加工中の被切断材との接触によって生じる発熱を抑制
するとともに、基板の歪みや振動を防止して、切断面精
度を向上させることにある。
[0008] The problem to be solved by the present invention is to improve the arrangement of abrasive grains, particularly on the side face of the substrate, in a rotating disk cutter having an abrasive grain layer formed on the outer peripheral edge and both side faces of the substrate. The object of the present invention is to suppress the heat generated by the contact with the workpiece and to prevent the substrate from being distorted or vibrated, thereby improving the cut surface accuracy.

【0009】[0009]

【課題を解決するための手段】本発明者らは、電着によ
って形成される基板側面部の砥粒層中の砥粒の密集の態
様および砥粒層の個々の分散と切断加工中の被切断材と
の接触によって生じる発熱、基板の歪みや振動との関係
について鋭意研究を重ね、基板側面部に形成する砥粒層
の1箇所に密集する砥粒の数を3個以下とすることによ
って、上記の課題を解決できることを見出した。
Means for Solving the Problems The inventors of the present invention have developed a mode of denseness of abrasive grains in an abrasive layer on the side surface of a substrate formed by electrodeposition, and an individual dispersion of the abrasive layer and a coating during cutting. Through extensive research on the relationship between the heat generated by contact with the cutting material and the distortion and vibration of the substrate, by reducing the number of abrasive grains that converge at one location of the abrasive layer formed on the side surface of the substrate to three or less It has been found that the above problems can be solved.

【0010】すなわち本発明は、基板の外周縁部と両側
面部にダイヤモンド砥粒やCBN砥粒などの超砥粒を電
着させた砥粒層を形成した回転円盤カッタであって、前
記基板の両側面部に、1群の砥粒数を3個以下とした砥
粒層を間隔をおいて均一に配置し、前記基板の外周縁部
には砥粒を密集した状態で配置したことを特徴とする。
That is, the present invention relates to a rotary disk cutter in which an abrasive layer formed by electrodepositing superabrasives such as diamond abrasives or CBN abrasives is formed on the outer peripheral edge and both side surfaces of the substrate. An abrasive grain layer in which the number of abrasive grains in a group is 3 or less is uniformly arranged on both side faces at intervals, and abrasive grains are densely arranged on an outer peripheral edge of the substrate. I do.

【0011】ここで、「1群の砥粒数を3個以下とした
砥粒層を間隔をおいて均一に配置」するということは、
基板側面部における砥粒層の配置を、砥粒を1個づつ単
独に、あるいは、隣接した2個または3個の砥粒を1群
として、互いに間隔をおいて基板の両側面部に均一に配
置することを指す。基板側面部における均一性の点から
は、砥粒層の1群内の砥粒の個数を同じ個数に揃えるほ
うが望ましいが、1群内の砥粒の個数が異なる群を配置
することもできる。
[0011] Here, "arranging the abrasive layers with the number of abrasive grains in one group equal to or less than 3 uniformly at intervals" means that:
The arrangement of the abrasive layer on the side surface of the substrate is such that the abrasive particles are individually arranged one by one, or two or three adjacent abrasive particles are grouped as a group, and are uniformly arranged on both side surfaces of the substrate at an interval from each other. To do. From the viewpoint of uniformity in the side surface portion of the substrate, it is desirable to make the number of abrasive grains in one group of the abrasive layer the same, but a group in which the number of abrasive grains in one group is different can also be arranged.

【0012】前述した従来の回転円盤カッタでは、基板
側面部に電着した砥粒層が分散しているとはいえ、各砥
粒層においてそれぞれ数十粒以上の砥粒が密集して固着
されているので、切断加工時における砥粒の切り込み深
さは浅いものとなって上滑りしやすくなり、この上滑り
によって発熱が大きくなる。これに対し本発明の回転円
盤カッタにおいては、1群3個以下の砥粒層を間隔をお
いて均一に配置しているので、砥粒の切り込み深さを深
くすることができ、これによって上滑りが防止され、発
熱が抑制される。
In the above-mentioned conventional rotary disk cutter, although several abrasive grains are electrodeposited on the side surface of the substrate, several tens or more grains are densely fixed in each abrasive grain layer. Therefore, the cutting depth of the abrasive grains at the time of the cutting process is shallow, and it is easy to slip upward, and heat generation increases due to the slip. On the other hand, in the rotating disk cutter according to the present invention, three or less abrasive layers per group are uniformly arranged at intervals, so that the cutting depth of the abrasive grains can be increased, thereby increasing the slipperiness. Is prevented, and heat generation is suppressed.

【0013】また、前述した従来の回転円盤カッタで
は、分散配置された電着砥粒層が切断加工中に被切断材
と断続的に接触することになり、振動や騒音を発生しや
すく、基板破損の原因となり、切断面精度へも悪影響を
与えるという問題があったが、本発明の回転円盤カッタ
においては、1群3個以下の砥粒層を間隔をおいて均一
に配置しているので、切断加工中の発熱、振動や騒音が
軽減され、基板の破損も防止されて良好な切断面精度を
得ることができる。
In the conventional rotary disk cutter described above, the dispersed electrodeposited abrasive layer is intermittently brought into contact with the material to be cut during the cutting process, so that vibration and noise are easily generated, and Although there was a problem of causing breakage and adversely affecting the cut surface accuracy, in the rotating disk cutter of the present invention, three or less abrasive layers per group are uniformly arranged at intervals. In addition, heat, vibration and noise during the cutting process are reduced, and breakage of the substrate is prevented, so that good cut surface accuracy can be obtained.

【0014】本発明の回転円盤カッタにおいては、前記
基板両側面部の砥粒数を、同じ面積内に砥粒を密集配置
した場合の砥粒数に対して20〜60%の割合とするの
が望ましい。この割合が20%未満では砥粒数が少なす
ぎて基板の保護性、耐摩耗性に劣り、60%を超えると
接触する砥粒数が多くなって砥粒の切り込み深さが浅く
なり、上滑りにより発熱しやすくなる。
In the rotating disk cutter according to the present invention, the number of abrasive grains on both side surfaces of the substrate is preferably set to 20 to 60% of the number of abrasive grains when the abrasive grains are densely arranged in the same area. desirable. If this ratio is less than 20%, the number of abrasive grains is too small, resulting in poor protection and abrasion resistance of the substrate. If it exceeds 60%, the number of abrasive grains in contact increases, the cutting depth of the abrasive grains becomes shallow, and slippage occurs. This makes it easier to generate heat.

【0015】[0015]

【発明の実施の形態】図1は本発明の実施形態における
回転円盤カッタを示す正面図であり、図2はその断面構
造を示す図である。
FIG. 1 is a front view showing a rotary disk cutter according to an embodiment of the present invention, and FIG. 2 is a view showing a sectional structure thereof.

【0016】図において、鋼製の円盤状の基板10の中
央には切断装置の回転主軸を通すための装着孔11を設
け、この装着孔11の周囲を締付け部12としている。
基板10の寸法は、外径100mm、厚さ0.5mm、
装着孔11の内径20mm、締付け部12の半径方向の
幅15mmである。
In the drawing, a mounting hole 11 for passing a rotating main shaft of a cutting device is provided at the center of a steel disk-shaped substrate 10, and a periphery of the mounting hole 11 is a fastening portion 12.
The dimensions of the substrate 10 are an outer diameter of 100 mm, a thickness of 0.5 mm,
The inner diameter of the mounting hole 11 is 20 mm, and the width of the fastening portion 12 in the radial direction is 15 mm.

【0017】本実施形態においては、基板10の周面と
これに続く縁部を含む周縁部13には、図1、図2の部
分拡大図および図3の(c)に示すように、ほぼすべて
のダイヤモンド砥粒Dが互いに接触するように密集した
状態で固着されている。周縁部13と締付け部12の間
の中間領域14には、図1、図2の部分拡大図および図
3の(a)に示すように、1個づつのダイヤモンド砥粒
Dが間隔をおいて均一に配置されている。ダイヤモンド
砥粒Dの平均粒径は500μmである。
In the present embodiment, the peripheral surface 13 including the peripheral surface of the substrate 10 and the edge following the peripheral surface is substantially formed as shown in FIGS. All the diamond abrasive grains D are fixed in a dense state so as to be in contact with each other. In the intermediate region 14 between the peripheral portion 13 and the fastening portion 12, as shown in FIGS. 1 and 2 and a partially enlarged view of FIG. They are arranged uniformly. The average diameter of the diamond abrasive grains D is 500 μm.

【0018】周縁部13と中間領域14の砥粒密集度
は、周縁部13の砥粒密集度を100とすると、中間領
域14の砥粒密集度は約40である。このように中間領
域14において砥粒Dを1個づつ単独に互いに間隔をお
いて均一に配置したことにより、切断加工時の発熱、振
動や騒音が軽減されるとともに、良好な切断面精度を得
ることができる。
Assuming that the density of the abrasive grains in the peripheral portion 13 and the intermediate region 14 is 100, the density of the abrasive particles in the intermediate region 14 is about 40, assuming that the density of the abrasive particles in the peripheral portion 13 is 100. In this way, by arranging the abrasive grains D one by one in the intermediate region 14 independently and uniformly, heat generation, vibration and noise during cutting are reduced, and good cutting surface accuracy is obtained. be able to.

【0019】図3の(b)は中間領域14の砥粒配置の
別の例を示す図である。この例では、互いに隣接した3
個の砥粒Dを1群として、この1群3個の砥粒層を互い
に間隔をおいて中間領域14に均一に配置した例であ
る。この場合の砥粒密集度も約40であり、1群1個の
場合と同様な効果を得ることができる。
FIG. 3B is a view showing another example of the arrangement of the abrasive grains in the intermediate area 14. In this example, three adjacent
This is an example in which three abrasive grains D are grouped as one group, and three abrasive grain layers per group are uniformly arranged in the intermediate region 14 at intervals. In this case, the density of abrasive grains is also about 40, and the same effect as in the case of one group can be obtained.

【0020】〔試験例〕図4の(a)に示す外周部スリ
ット21付きの基板20の中間領域22の砥粒密集度を
周縁部23の砥粒密集度に対して100%から10%の
範囲で種々変えたカッタ(カッタ番号1〜6)、およ
び、図4の(b)に示すように、外周部スリット31付
きの基板30の周縁部33および放射状に形成した中間
領域32に砥粒密集度100%の砥粒層を設けたカッタ
(カッタ番号7)を使用して以下の条件で切断加工試験
を行った。切断加工条件使用機械:手持ち式電動切断機
100V 6A、回転数900rpm被切断材:セラ
ミックス系外壁材 300mm×300mm×5mm切
断方法:乾式 手動送り切断
[Test Example] The density of the abrasive grains in the intermediate region 22 of the substrate 20 having the outer peripheral slit 21 shown in FIG. As shown in FIG. 4B, the cutters (cutter numbers 1 to 6) changed variously in the range and the peripheral edge 33 of the substrate 30 having the outer peripheral slit 31 and the intermediate region 32 formed radially have abrasive grains. A cutting test was performed under the following conditions using a cutter (cutter number 7) provided with an abrasive layer having a density of 100%. Cutting process conditions Machine used: Hand-held electric cutting machine 100V 6A, rotation speed 900rpm Material to be cut: Ceramic outer wall material 300mm x 300mm x 5mm Cutting method: Dry manual feed cutting

【0021】表1にカッタの仕様を示す。Table 1 shows the specifications of the cutter.

【表1】 [Table 1]

【0022】図5および図6に試験結果を示す。図5
は、各カッタによる切断加工において、基板側面部から
火花が発生するまでの切断回数を示す。図6は、各カッ
タにより切断した10カット目の被切断材のチッピング
の大きさT(図7参照)の平均値を示す。チッピングの
測定は、図7に示すように、切断後の被切断材Sの切断
面Fに対して直角方向にチッピングの大きさTを切断方
向Cに20mm間隔で14点の位置において測定し、そ
の平均値を図6に示した。
FIGS. 5 and 6 show the test results. FIG.
Indicates the number of cuts until a spark is generated from the side surface of the substrate in the cutting by each cutter. FIG. 6 shows the average value of the chipping magnitude T (see FIG. 7) of the material to be cut at the tenth cut by each cutter. As shown in FIG. 7, the measurement of chipping is performed by measuring the magnitude T of chipping in a direction perpendicular to the cut surface F of the cut material S after cutting at 14 points at intervals of 20 mm in the cutting direction C. The average value is shown in FIG.

【0023】図5および図6からわかるように、カッタ
番号1,2は砥粒密集度が高すぎるために、砥粒切り込
みが浅くなり、上滑りによる発熱により火花発生までの
切断回数が少なく、チッピングも大きい状態となった。
一方、カッタ番号6は、砥粒数が少なすぎるために、被
切断材に基板が接触して発熱し、極端に切断回数が少な
くなった。カッタ番号7は、砥粒層領域が部分的である
ので切断時の発熱は少ないが、砥粒層が被切断材に断続
的に接触するためにチッピングが大きいものとなった。
これに対し本発明品のカッタ番号3,4,5は、砥粒密
集度が適切であることにより、砥粒の上滑りおよび被切
断材への基板の接触もなく、また砥粒の均一配列により
被切断材との断続的な接触もないことから、火花が発生
するまでの切断回数が多く、かつチッピングも小さいも
のとなっている。
As can be seen from FIGS. 5 and 6, the cutters Nos. 1 and 2 have too high abrasive grain densities, so that the cutting depth of the abrasive grains becomes shallow. Also became large.
On the other hand, in cutter number 6, since the number of abrasive grains was too small, the substrate came into contact with the material to be cut, generating heat, and the number of cuts was extremely reduced. Cutter No. 7 has a small heat generation during cutting because the abrasive grain layer region is partial, but has a large chipping because the abrasive grain layer intermittently contacts the workpiece.
On the other hand, the cutter numbers 3, 4, and 5 of the product of the present invention have an appropriate abrasive grain density, so that the abrasive grains do not slip and the substrate does not contact the workpiece, and the uniform arrangement of the abrasive grains. Since there is no intermittent contact with the material to be cut, the number of cuts before sparks are generated is large, and chipping is small.

【0024】[0024]

【発明の効果】本発明によって以下の効果を奏すること
ができる。
According to the present invention, the following effects can be obtained.

【0025】(1)1群の砥粒数を3個以下とした砥粒
層を基板両側面部に間隔をおいて均一に配置することに
より、砥粒の切り込み深さを深くすることができ、これ
によって上滑りが防止され、発熱が抑制される。また、
基板両側面に1群3個以下の砥粒層を間隔をおいて均一
に配置しているので、切断加工中の断続接触による振動
や騒音が軽減され、基板の破損も防止されて良好な切断
面精度を得ることができる。
(1) By arranging the abrasive layers in which the number of abrasive grains in one group is 3 or less uniformly on both side surfaces of the substrate at intervals, the cutting depth of the abrasive grains can be increased. This prevents an upward slip and suppresses heat generation. Also,
Since three or less abrasive layers per group are uniformly spaced on both sides of the substrate, vibration and noise due to intermittent contact during the cutting process are reduced, and breakage of the substrate is prevented, resulting in good cutting. Surface accuracy can be obtained.

【0026】(2)基板両側面部に配置する砥粒の数を
特定の範囲にすることにより、基板の保護性、耐摩耗性
を維持したうえで、上記の効果を確実に発揮することが
できる。
(2) By setting the number of abrasive grains arranged on both side surfaces of the substrate in a specific range, the above-mentioned effects can be surely exerted while maintaining the protection and wear resistance of the substrate. .

【図面の簡単な説明】[Brief description of the drawings]

【図1】 実施形態における回転円盤カッタを示す正面
図である。
FIG. 1 is a front view showing a rotating disk cutter according to an embodiment.

【図2】 図1の回転円盤カッタの断面構造を示す図で
ある。
FIG. 2 is a view showing a sectional structure of the rotating disk cutter of FIG. 1;

【図3】 砥粒の配置状態を示す図である。FIG. 3 is a view showing an arrangement state of abrasive grains.

【図4】 切断加工試験に使用したカッタの砥粒層を示
す図である。
FIG. 4 is a view showing an abrasive layer of a cutter used in a cutting test.

【図5】 試験結果を示すグラフである。FIG. 5 is a graph showing test results.

【図6】 試験結果を示すグラフである。FIG. 6 is a graph showing test results.

【図7】 チッピングの測定方法の説明図である。FIG. 7 is an explanatory diagram of a chipping measurement method.

【符号の説明】[Explanation of symbols]

10 基板 11 装着孔 12 締付け部 13 周縁部 14 中間領域 20,30 基板 21,31 外周部スリット 22,32 中間領域 23,33 周縁部 D ダイヤモンド砥粒 T チッピング DESCRIPTION OF SYMBOLS 10 Substrate 11 Mounting hole 12 Tightening part 13 Peripheral edge 14 Intermediate area 20, 30 Substrate 21, 31 Outer peripheral slit 22, 32 Intermediate area 23, 33 Peripheral edge D Diamond abrasive grain T Chipping

───────────────────────────────────────────────────── フロントページの続き Fターム(参考) 3C058 AA03 AA09 CA01 CB01 CB10 3C063 AA02 AB03 BA12 BB02 BB21 BC02 BG07 CC12 EE31 FF03 FF11 FF30  ──────────────────────────────────────────────────続 き Continued on the front page F term (reference) 3C058 AA03 AA09 CA01 CB01 CB10 3C063 AA02 AB03 BA12 BB02 BB21 BC02 BG07 CC12 EE31 FF03 FF11 FF30

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 基板の外周縁部と両側面部にダイヤモン
ド砥粒やCBN砥粒などの超砥粒を電着させた砥粒層を
形成した回転円盤カッタであって、前記基板の両側面部
に、1群の砥粒数を3個以下とした砥粒層を間隔をおい
て均一に配置し、前記基板の外周縁部には砥粒を密集し
た状態で配置した回転円盤カッタ。
1. A rotating disk cutter having an abrasive grain layer formed by electrodepositing superabrasive grains such as diamond abrasive grains or CBN abrasive grains on an outer peripheral edge and both side faces of a substrate, wherein the both sides of the substrate are provided. A rotating disk cutter in which a group of abrasive grains in which the number of abrasive grains in a group is 3 or less is uniformly arranged at intervals, and the abrasive grains are densely arranged on an outer peripheral portion of the substrate;
【請求項2】 前記基板両側面部の砥粒数を、同じ面積
内に砥粒を密集配置した場合の砥粒数に対して20〜6
0%の割合とした請求項1記載の回転円盤カッタ。
2. The number of abrasive grains on both sides of the substrate is 20 to 6 with respect to the number of abrasive grains when the abrasive grains are densely arranged in the same area.
2. The rotating disk cutter according to claim 1, wherein the ratio is 0%.
JP30995999A 1999-10-29 1999-10-29 Rotating disk cutter Expired - Fee Related JP3441685B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP30995999A JP3441685B2 (en) 1999-10-29 1999-10-29 Rotating disk cutter

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP30995999A JP3441685B2 (en) 1999-10-29 1999-10-29 Rotating disk cutter

Publications (2)

Publication Number Publication Date
JP2001121427A true JP2001121427A (en) 2001-05-08
JP3441685B2 JP3441685B2 (en) 2003-09-02

Family

ID=17999430

Family Applications (1)

Application Number Title Priority Date Filing Date
JP30995999A Expired - Fee Related JP3441685B2 (en) 1999-10-29 1999-10-29 Rotating disk cutter

Country Status (1)

Country Link
JP (1) JP3441685B2 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007061943A (en) * 2005-08-30 2007-03-15 Asahi Diamond Industrial Co Ltd Brazed tool
KR100968930B1 (en) 2008-05-29 2010-07-14 가부시키 가이샤 미야나가 Diamond Core Drill
CN104592938A (en) * 2015-01-13 2015-05-06 广东工业大学 Gradient alloying granulation method of diamond abrasive grain surface binding agent
CN110977796A (en) * 2019-12-04 2020-04-10 上海新山田精密刀具有限公司 Peripheral grinding wheel for coarse and fine grinding of PCBN blade

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107363554B (en) * 2017-08-10 2019-06-25 安徽沃德气门制造有限公司 A kind of valve stem truncation arrangement for grinding

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007061943A (en) * 2005-08-30 2007-03-15 Asahi Diamond Industrial Co Ltd Brazed tool
KR100968930B1 (en) 2008-05-29 2010-07-14 가부시키 가이샤 미야나가 Diamond Core Drill
CN104592938A (en) * 2015-01-13 2015-05-06 广东工业大学 Gradient alloying granulation method of diamond abrasive grain surface binding agent
CN110977796A (en) * 2019-12-04 2020-04-10 上海新山田精密刀具有限公司 Peripheral grinding wheel for coarse and fine grinding of PCBN blade
CN110977796B (en) * 2019-12-04 2021-08-17 上海新山田精密刀具有限公司 Peripheral grinding wheel for coarse and fine grinding of PCBN blade

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