JP2001105763A - 平版印刷マスターの消去方法 - Google Patents
平版印刷マスターの消去方法Info
- Publication number
- JP2001105763A JP2001105763A JP2000258756A JP2000258756A JP2001105763A JP 2001105763 A JP2001105763 A JP 2001105763A JP 2000258756 A JP2000258756 A JP 2000258756A JP 2000258756 A JP2000258756 A JP 2000258756A JP 2001105763 A JP2001105763 A JP 2001105763A
- Authority
- JP
- Japan
- Prior art keywords
- printing
- support
- image
- master
- recording layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000007639 printing Methods 0.000 title claims abstract description 119
- 238000000034 method Methods 0.000 title claims abstract description 75
- 239000000463 material Substances 0.000 claims abstract description 57
- 230000008569 process Effects 0.000 claims abstract description 12
- 239000010410 layer Substances 0.000 claims description 83
- 150000001875 compounds Chemical class 0.000 claims description 56
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 14
- 239000004071 soot Substances 0.000 claims description 13
- 229910052799 carbon Inorganic materials 0.000 claims description 8
- 229910002804 graphite Inorganic materials 0.000 claims description 6
- 239000010439 graphite Substances 0.000 claims description 6
- 238000002360 preparation method Methods 0.000 claims description 2
- 239000000853 adhesive Substances 0.000 claims 1
- 239000012790 adhesive layer Substances 0.000 claims 1
- 230000015572 biosynthetic process Effects 0.000 abstract description 2
- 238000003384 imaging method Methods 0.000 description 24
- 238000000576 coating method Methods 0.000 description 20
- 238000004140 cleaning Methods 0.000 description 19
- 239000011248 coating agent Substances 0.000 description 14
- 239000000203 mixture Substances 0.000 description 14
- 229910052782 aluminium Inorganic materials 0.000 description 10
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 10
- 238000010017 direct printing Methods 0.000 description 10
- 238000012546 transfer Methods 0.000 description 9
- 239000002243 precursor Substances 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- 239000000975 dye Substances 0.000 description 6
- 239000007789 gas Substances 0.000 description 6
- 238000012545 processing Methods 0.000 description 6
- 239000011230 binding agent Substances 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- 238000009832 plasma treatment Methods 0.000 description 5
- 229920000642 polymer Polymers 0.000 description 5
- 229920001296 polysiloxane Polymers 0.000 description 5
- 239000000843 powder Substances 0.000 description 5
- 230000008901 benefit Effects 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 239000004744 fabric Substances 0.000 description 4
- 239000013505 freshwater Substances 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- 229920000742 Cotton Polymers 0.000 description 3
- 238000002679 ablation Methods 0.000 description 3
- 239000007799 cork Substances 0.000 description 3
- 238000011161 development Methods 0.000 description 3
- 239000011368 organic material Substances 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 239000004447 silicone coating Substances 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- GQPLMRYTRLFLPF-UHFFFAOYSA-N Nitrous Oxide Chemical compound [O-][N+]#N GQPLMRYTRLFLPF-UHFFFAOYSA-N 0.000 description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- 238000002485 combustion reaction Methods 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- 230000001419 dependent effect Effects 0.000 description 2
- 238000000635 electron micrograph Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 239000003345 natural gas Substances 0.000 description 2
- 229910052754 neon Inorganic materials 0.000 description 2
- 239000000049 pigment Substances 0.000 description 2
- 239000005871 repellent Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 229920001169 thermoplastic Polymers 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- 239000002023 wood Substances 0.000 description 2
- 229920002818 (Hydroxyethyl)methacrylate Polymers 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 1
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 1
- 229910000906 Bronze Inorganic materials 0.000 description 1
- 229920000049 Carbon (fiber) Polymers 0.000 description 1
- 229920002134 Carboxymethyl cellulose Polymers 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- IMROMDMJAWUWLK-UHFFFAOYSA-N Ethenol Chemical compound OC=C IMROMDMJAWUWLK-UHFFFAOYSA-N 0.000 description 1
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- CNCOEDDPFOAUMB-UHFFFAOYSA-N N-Methylolacrylamide Chemical compound OCNC(=O)C=C CNCOEDDPFOAUMB-UHFFFAOYSA-N 0.000 description 1
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 description 1
- GXCLVBGFBYZDAG-UHFFFAOYSA-N N-[2-(1H-indol-3-yl)ethyl]-N-methylprop-2-en-1-amine Chemical compound CN(CCC1=CNC2=C1C=CC=C2)CC=C GXCLVBGFBYZDAG-UHFFFAOYSA-N 0.000 description 1
- 229920001609 Poly(3,4-ethylenedioxythiophene) Polymers 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 238000013006 addition curing Methods 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- 239000002956 ash Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000003738 black carbon Substances 0.000 description 1
- -1 borides Chemical class 0.000 description 1
- 239000010974 bronze Substances 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 239000004917 carbon fiber Substances 0.000 description 1
- 235000010948 carboxy methyl cellulose Nutrition 0.000 description 1
- 239000001768 carboxy methyl cellulose Substances 0.000 description 1
- 239000008112 carboxymethyl-cellulose Substances 0.000 description 1
- 239000003610 charcoal Substances 0.000 description 1
- 238000001311 chemical methods and process Methods 0.000 description 1
- 238000005345 coagulation Methods 0.000 description 1
- 230000015271 coagulation Effects 0.000 description 1
- 239000003245 coal Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000013005 condensation curing Methods 0.000 description 1
- 239000002826 coolant Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical compound [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 238000010891 electric arc Methods 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000004446 fluoropolymer coating Substances 0.000 description 1
- 239000000383 hazardous chemical Substances 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 229920001519 homopolymer Polymers 0.000 description 1
- 230000005660 hydrophilic surface Effects 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000004816 latex Substances 0.000 description 1
- 229920000126 latex Polymers 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 239000006224 matting agent Substances 0.000 description 1
- 150000001247 metal acetylides Chemical class 0.000 description 1
- 238000007431 microscopic evaluation Methods 0.000 description 1
- DNTMQTKDNSEIFO-UHFFFAOYSA-N n-(hydroxymethyl)-2-methylprop-2-enamide Chemical compound CC(=C)C(=O)NCO DNTMQTKDNSEIFO-UHFFFAOYSA-N 0.000 description 1
- QVEIBLDXZNGPHR-UHFFFAOYSA-N naphthalene-1,4-dione;diazide Chemical class [N-]=[N+]=[N-].[N-]=[N+]=[N-].C1=CC=C2C(=O)C=CC(=O)C2=C1 QVEIBLDXZNGPHR-UHFFFAOYSA-N 0.000 description 1
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000001272 nitrous oxide Substances 0.000 description 1
- 229910052756 noble gas Inorganic materials 0.000 description 1
- 150000002835 noble gases Chemical class 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- FOKLVOHHYNATHU-UHFFFAOYSA-N oxan-2-ylmethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC1CCCCO1 FOKLVOHHYNATHU-UHFFFAOYSA-N 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 229920000767 polyaniline Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 239000004848 polyfunctional curative Substances 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920000128 polypyrrole Polymers 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000007790 scraping Methods 0.000 description 1
- 238000012216 screening Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229920005573 silicon-containing polymer Polymers 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 230000002459 sustained effect Effects 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 238000001931 thermography Methods 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 239000001993 wax Substances 0.000 description 1
- 239000008207 working material Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N3/00—Preparing for use and conserving printing surfaces
- B41N3/006—Cleaning, washing, rinsing or reclaiming of printing formes other than intaglio formes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
Landscapes
- Printing Plates And Materials Therefor (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
- Printing Methods (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP99202799.5 | 1999-08-31 | ||
| EP99202799A EP1080942B2 (en) | 1999-08-31 | 1999-08-31 | Method for erasing a lithographic printing master |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2001105763A true JP2001105763A (ja) | 2001-04-17 |
| JP2001105763A5 JP2001105763A5 (https=) | 2007-09-27 |
Family
ID=8240584
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000258756A Pending JP2001105763A (ja) | 1999-08-31 | 2000-08-29 | 平版印刷マスターの消去方法 |
Country Status (3)
| Country | Link |
|---|---|
| EP (1) | EP1080942B2 (https=) |
| JP (1) | JP2001105763A (https=) |
| DE (1) | DE69913518T2 (https=) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10206946A1 (de) * | 2002-02-19 | 2003-09-04 | Oce Printing Systems Gmbh | Verfahren und Einrichtung zum Drucken, wobei eine Hydrophilisierung des Druckträgers durch freie Ionen erfolgt |
| DE102005028817A1 (de) * | 2005-06-22 | 2007-01-11 | Man Roland Druckmaschinen Ag | Verfahren zur Herstellung von Druckformen |
| CN112630288B (zh) * | 2020-11-17 | 2021-10-12 | 燕山大学 | 一种基于放电的二次电子发射系数测量装置及方法 |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5654440A (en) * | 1979-10-11 | 1981-05-14 | Dainippon Printing Co Ltd | Photosensitive lithographic material and plate making method |
| US4777109A (en) * | 1987-05-11 | 1988-10-11 | Robert Gumbinner | RF plasma treated photosensitive lithographic printing plates |
| JPH05504519A (ja) * | 1990-09-28 | 1993-07-15 | プレステク,インコーポレイテッド | プラズマジェット画像形成装置及び方法 |
| JPH05193086A (ja) * | 1991-07-19 | 1993-08-03 | Man Roland Druckmas Ag | オフセット印刷に適する印刷版を繰返し可逆的に再生する方法 |
| JPH07508855A (ja) * | 1991-05-24 | 1995-09-28 | オーピーエー(オーバーシーズ パブリッシャーズ アソシエーション)アムステルダム ベー・ヴェー | 固体加工装置 |
| JPH08230344A (ja) * | 1995-02-07 | 1996-09-10 | Man Roland Druckmas Ag | グラビア印刷を行なうための方法および装置 |
| JPH0942273A (ja) * | 1995-08-01 | 1997-02-10 | Canon Inc | 電子写真プロセス用円筒部品の再生方法 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5062364A (en) † | 1989-03-29 | 1991-11-05 | Presstek, Inc. | Plasma-jet imaging method |
| DE19532412C2 (de) † | 1995-09-01 | 1999-09-30 | Agrodyn Hochspannungstechnik G | Vorrichtung zur Oberflächen-Vorbehandlung von Werkstücken |
| US5789145A (en) * | 1996-07-23 | 1998-08-04 | Eastman Kodak Company | Atmospheric pressure glow discharge treatment of base material for photographic applications |
-
1999
- 1999-08-31 DE DE69913518T patent/DE69913518T2/de not_active Expired - Lifetime
- 1999-08-31 EP EP99202799A patent/EP1080942B2/en not_active Expired - Lifetime
-
2000
- 2000-08-29 JP JP2000258756A patent/JP2001105763A/ja active Pending
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5654440A (en) * | 1979-10-11 | 1981-05-14 | Dainippon Printing Co Ltd | Photosensitive lithographic material and plate making method |
| US4777109A (en) * | 1987-05-11 | 1988-10-11 | Robert Gumbinner | RF plasma treated photosensitive lithographic printing plates |
| JPH05504519A (ja) * | 1990-09-28 | 1993-07-15 | プレステク,インコーポレイテッド | プラズマジェット画像形成装置及び方法 |
| JPH07508855A (ja) * | 1991-05-24 | 1995-09-28 | オーピーエー(オーバーシーズ パブリッシャーズ アソシエーション)アムステルダム ベー・ヴェー | 固体加工装置 |
| JPH05193086A (ja) * | 1991-07-19 | 1993-08-03 | Man Roland Druckmas Ag | オフセット印刷に適する印刷版を繰返し可逆的に再生する方法 |
| JPH08230344A (ja) * | 1995-02-07 | 1996-09-10 | Man Roland Druckmas Ag | グラビア印刷を行なうための方法および装置 |
| JPH0942273A (ja) * | 1995-08-01 | 1997-02-10 | Canon Inc | 電子写真プロセス用円筒部品の再生方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| EP1080942B1 (en) | 2003-12-10 |
| DE69913518D1 (de) | 2004-01-22 |
| DE69913518T2 (de) | 2004-11-11 |
| EP1080942B2 (en) | 2009-10-14 |
| EP1080942A1 (en) | 2001-03-07 |
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