JP2001087696A - Nozzle seat for developing photoresist - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a novel nozzle seat for developing a photoresist capable of sufficiently washing a nozzle body in a short time without using a dummy wafer. SOLUTION: A novel nozzle seat 80 for developing a photoresist adapted to a photoresist coating and developing machine and used for stationarily arranging a developing nozzle body is equipped with a nozzle seat body 81 attached to the photoresist coating and developing machine and stationarily arranging the nozzle body 10, a conduit 82 connected to the nozzle seat body 81 at one end thereof and connected to a water source at the other end thereof to introduce water for washing the nozzle seat body 81 into the nozzle seat body 81, and overflow pipe 83 connected to the nozzle seat body 81 at one end thereof to discharge the liquid in the nozzle seat body 81 and an O-ring 84 arranged on the surface of the nozzle seat body 81 for stationarily arranging the nozzle body 10.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a nozzle base (nozzle base) for developing a photoresist, and more particularly to a nozzle base (E square nozzle) capable of directly removing a developing solution on a nozzle body. And a nozzle seat for developing a photoresist.

[0002]

2. Description of the Related Art When a wafer coated with a photoresist is exposed, the positive resist becomes an acid (carboxylic acid). Since the developing solution is an alkaline solution, when the developing solution is discharged onto the photoresist after exposure, the acid is neutralized to alkali and dissolved in the developing solution of the alkaline solution. The process of removing the excess photoresist using the neutralization reaction and exposing the pattern is called development.

FIG. 1 is a schematic diagram of a photoresist developing nozzle. As shown in the figure, the nozzle body 10 has an elongated shape, and has a plurality of injection holes 1 along the longitudinal direction.
00 is provided. One end of the nozzle body 10 is
It is connected to a developer source (not shown), and is used to introduce a developer into the nozzle body 10 to perform development (FIG. 2).
a, 2b, 2c).

As shown in FIGS. 2A, 2B and 2C, when developing a photoresist 30 coated on the wafer 3, first, the nozzle body 10 is moved to the wafer 3 position.
So that the surface of the nozzle body 10 having the injection hole 100 faces the photoresist 30, and at the same time, the wafer 3 is moved to the position shown in FIGS. 2a, 2b, and 2c.
In the direction indicated by the arrow. Next, the developer 20 is discharged onto the photoresist 30 from the injection holes 100 of the nozzle body 10. At this time, FIGS.
As shown in FIGS. 2B and 2C, the wafer 3 rotates in the direction of the arrow in FIG.

FIG. 3 is a structural view of a known photoresist coating / developing machine. The developing machine includes a nozzle body 10, a nozzle seat 40, a moving arm seat 50, a moving arm 60,
And a developing machine main body 70. The moving arm 60
Has one end connected to the nozzle body 10 and the other end installed on the movable arm seat 50 and connected to a driving device (not shown). The moving arm 60 is
It is driven by a driving device and can move on the moving arm seat 50. By moving the moving arm 60, the nozzle main body 10 can be moved between the nozzle seat 40 and the upper part of the developing machine main body 70.

[0006] The nozzle seat 40 is used for stationary the nozzle body 10 in an unused state, and when the nozzle body 10 is stationary on the nozzle seat 40 (hereinafter, this nozzle seat 10 will be referred to as a nozzle seat 40). This state is called a start position), so that the nozzle body 10 can perform dummy dispensing. Therefore, after the nozzle body 10 has finished distributing the developer on the wafer,
Returning to the start position, the dummy distribution is performed on the nozzle seat 40. However, there is a possibility that the developer may remain between the nozzle body 10 and the nozzle seat 40, and there is a possibility that the developer may adhere to the nozzle body 10. Then, the next time you distribute the developer,
The remaining developing solution is distributed on the wafer together with the new developing solution, which causes contamination and defects of the wafer, a reduction in yield, and an impact on production volume.

As can be seen from the above reasons, it is necessary to periodically clean the nozzle body 10 and the nozzle seat 40 to completely remove the developer remaining on the nozzle body 10 and the nozzle seat 40. is there.

In a known cleaning method, a dummy wafer is sent to the developing machine main body 70, and the nozzle main body 10 is moved above the center of the dummy wafer (at this time, the distance between the nozzle main body and the dummy wafer is about 1. 0mm ± 0.2m
m), the dummy wafer is rotated (rotation speed is about 30 to 50 rpm), and at the same time, cleaning water is sprayed on the dummy wafer.

Generally, it takes 10 to 15 minutes for one set of nozzle bodies to complete the above-described cleaning process, and one photoresist coating and developing machine has three sets of nozzle bodies. Thus, a single wash takes 45 minutes or more, which is very inefficient.

[0010] As can be seen from the above, it is possible to improve the production volume and shorten the operation time, and to reduce the incidence of defects.
In order to improve yield and reduce costs,
There is a need to improve the method of cleaning the nozzle body.

[0011]

Accordingly, the present invention provides
In order to solve the above-mentioned problems, an object of the present invention is to provide a novel nozzle seat for developing a photoresist, which can be used to improve a method of cleaning a nozzle body.

[0012]

SUMMARY OF THE INVENTION The novel nozzle seat provided by the present invention is applied to a photoresist coating and developing machine, and is used for resting a nozzle body for development. A nozzle seat body attached to the photoresist coating and developing machine for resting the nozzle body, one end of which is connected to the nozzle seat body, and the other end of which is connected to a water source. A conduit for introducing water for cleaning the body to the nozzle seat body,
One end is connected to the nozzle seat main body, an overflow pipe for discharging liquid in the nozzle seat main body, and an O disposed on the surface of the nozzle seat main body for resting the nozzle main body.
And a mold ring. Further, the novel nozzle seat provided by the present invention includes a discharge tank connected to the other end of the overflow pipe, a discharge pipe having one end connected to the discharge tank, and a switch installed in the discharge pipe. More prepared. In the novel nozzle seat provided by the present invention, a deionized water source can be used as the water source.

[0013]

The above and other objects of the present invention,
In order to further clarify the features and advantages, preferred embodiments will be described below with reference to the drawings.

FIG. 4 is a schematic view of a nozzle seat for developing a novel photoresist according to the present invention. As shown in the figure, the new nozzle seat includes a nozzle seat body 81, a conduit 82, an overflow pipe 83, an O-ring 84, and a discharge tank 85.
, A discharge pipe 86, and a switch 87. Of these, the nozzle seat body 81 and the discharge tank 85 have a basic configuration in a known nozzle seat. The nozzle seat body 81 is provided with the nozzle seat in order to allow the nozzle body to stand still. Each is used to collect liquid flowing out of the main body 81.

The conduit 82 has one end connected to the nozzle seat body 81 and the other end connected to a water source (not shown).
It is used to supply cleaning water to the nozzle seat body. One end of the overflow pipe 83 has the nozzle seat body 81.
The other end is connected to the discharge tank 85, respectively, and is used to discharge the liquid in the nozzle seat body 81. The O-ring 84 is provided on a surface of the nozzle seat body 81 for resting the nozzle body, and is made of an alkali-resistant material. It is used to prevent the liquid from flowing out of the gap between the nozzle body 81 and the nozzle body. The discharge pipe 86
Is connected at one end to the discharge tank 85, and is used to discharge the liquid flowing into the discharge tank 85. The switch 87 is provided on the discharge pipe 86,
The flow rate of the liquid discharged from the discharge tank 85 can be controlled. Further, a water source of deionized water can be used as the water source for washing.

FIG. 5 is a structural view of a photoresist coating and developing machine to which a novel photoresist developing nozzle seat according to the present invention is applied. As shown in the figure, all other parts other than the nozzle seat 80 are the same as those in the apparatus of FIG. 3, and the detailed description is omitted here.

Next, a method for cleaning the nozzle body using the novel nozzle seat according to the present invention will be described. First, when the nozzle body 10 is settled on the nozzle seat 80, the water for cleaning is supplied to the nozzle seat body 81 using the conduit 82.
To be introduced. As described above, by directly immersing the nozzle body in the washing water, the developer adhering to the nozzle body can be washed away.

Although the preferred embodiment has been disclosed above,
These in no way limit the scope of the invention,
Anyone skilled in the art should be able to add various fluctuations and colors without departing from the spirit and scope of the present invention, and accordingly, the protection scope of the present invention is specified by the appended claims. Based on content.

[0019]

As can be seen from the above, when the nozzle body is cleaned using the nozzle seat according to the present invention, a dummy wafer is not required, and the cleaning time can be saved, and the operation time of the developing machine can be increased. Thus, the cost can be significantly reduced. In the above-described cleaning method, the nozzle body can be sufficiently cleaned by controlling the flow rate of the liquid using the switch 87. In addition, it is also possible to newly incorporate an ultrasonic vibration cleaning system, and to clean the nozzle body using ultrasonic waves.

[Brief description of the drawings]

FIG. 1 is a plan view of a portion of a nozzle body having an injection hole.

FIG. 2 is a schematic view at each stage when developing is performed by discharging a developing solution onto a photoresist.

FIG. 3 is a structural view of a known photoresist coating and developing machine.

FIG. 4 is a schematic view of a nozzle seat for developing a novel photoresist according to the present invention.

FIG. 5 is a structural view of a photoresist coating and developing machine to which a novel photoresist developing nozzle seat according to the present invention is applied.

[Explanation of symbols]

 Reference Signs List 3 wafer 10 nozzle body 20 developing solution 30 photoresist 40 nozzle seat 50 moving arm seat 60 moving arm 70 developing machine main body 80 nozzle seat 81 nozzle seat main body 82 conduit 83 overflow tube 84 O-type ring 85 discharge tank 86 discharge tube 87 switch 100 injection holes

 ──────────────────────────────────────────────────の Continued on the front page (71) Applicant 599002397 Mosel Vitalic Inc.Shinchu, Taiwan, Science-Based Industrial Park, Ricin Road No. 19 80333, München, Wittelsbacher Platts 2 (72) Inventor Chen Yong-Yu 53 No.8, No. 53, Rinsan-ro, 9 Shuangxi Village, Baoshan Township, Hsinchu County, Taiwan F-term (Reference) 2H096 AA25 AA27 GA31 HA30 4D073 AA09 CA20 CB03 CB16 CC05 4F041 AA06 BA13 BA60 5F046 LA19

Claims (2)

[Claims] 1. A nozzle seat for photoresist development which is applied to a photoresist coating and developing machine and is used for standing a nozzle body for development, wherein said nozzle seat is attached to said photoresist coating and developing machine. A nozzle seat body for resting the nozzle body, and a conduit connected at one end to the nozzle seat body and the other end to a water source for introducing water for cleaning the nozzle body into the nozzle seat body. An overflow pipe connected at one end to the nozzle seat main body for discharging liquid in the nozzle seat main body, and an O disposed on a surface of the nozzle seat main body for allowing the nozzle main body to stand still. A nozzle ring for photoresist development, comprising a mold ring. 2. A discharge tank connected to the other end of the overflow pipe, a discharge pipe having one end connected to the discharge tank, and a switch installed on the discharge pipe. The nozzle seat for developing a photoresist according to claim 1.