JP2001076886A - Organic el device with transparent touch switch and its manufacture - Google Patents

Organic el device with transparent touch switch and its manufacture

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Publication number
JP2001076886A
JP2001076886A JP25018199A JP25018199A JP2001076886A JP 2001076886 A JP2001076886 A JP 2001076886A JP 25018199 A JP25018199 A JP 25018199A JP 25018199 A JP25018199 A JP 25018199A JP 2001076886 A JP2001076886 A JP 2001076886A
Authority
JP
Japan
Prior art keywords
electrode
organic
substrate
transparent
base material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP25018199A
Other languages
Japanese (ja)
Inventor
Yukio Ogawa
行雄 小川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Futaba Corp
Original Assignee
Futaba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Futaba Corp filed Critical Futaba Corp
Priority to JP25018199A priority Critical patent/JP2001076886A/en
Publication of JP2001076886A publication Critical patent/JP2001076886A/en
Pending legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To offer simpler construction than conventional, permitting inexpensive manufacture, and restrict the lowering of brightness due to interference light. SOLUTION: After a cathode 3 formed with a metal electrode is formed on an insulating substrate 2 and then an organic insulating layer 4 is formed on the cathode 3 so as to partition a luminescent portion 7. Followingly, an organic layer 5 is formed on the insulating layer 4 and a transparent anode 6 is formed on the organic layer 5. On the other hand, a switching electrode 12 is formed on a transparent base material 11 to electrically form a matrix with the anode 6 and a elastic spacer 14 is formed between the base material 11 and the switching electrode 12. The substrate 2 is sealed to the base material 11 to form a transparent touch switch 13 with the anode 6 and the switching electrode 12. An organic EL device 1 is thus manufactured.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、電子と正孔の注入
および再結合により発光する有機化合物材料のエレクト
ロルミネッセンス(以下、ELと略称する)デバイスに
タッチ式のスイッチの機能を付加した透明タッチスイッ
チ付き有機ELデバイスとその製造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electroluminescent (hereinafter abbreviated as "EL") device made of an organic compound material which emits light by injection and recombination of electrons and holes. The present invention relates to an organic EL device with a switch and a method of manufacturing the same.

【0002】[0002]

【従来の技術】有機EL素子は、少なくとも一方が透明
電極からなる一対の電極の間に蛍光性有機化合物を含む
薄膜を挟んだ構造を有し、この薄膜に電子と正孔を注入
して再結合させることにより励起子(エキシトン)を生
成させ、この励起子が失活する際の光の放出(蛍光・燐
光)を利用して表示を行う素子である。
2. Description of the Related Art An organic EL device has a structure in which a thin film containing a fluorescent organic compound is sandwiched between a pair of electrodes at least one of which is a transparent electrode. An element in which exciton (exciton) is generated by coupling, and display is performed using light emission (fluorescence / phosphorescence) when the exciton is deactivated.

【0003】ところで、この種の有機EL素子にタッチ
式のスイッチを設けた有機ELデバイスとしては、図6
に示すような構造のものが知られている(特開平10−
91342号公報)。
[0003] By the way, as an organic EL device in which a touch-type switch is provided for this kind of organic EL element, FIG.
The structure shown in FIG.
No. 91342).

【0004】この有機ELデバイス31は、第1の透明
基板32と、第1の透明基板32の上に形成された陰極
33と、陰極33の上に形成された有機材料からなる発
光体34と、発光体34の上に形成された透明性を有す
る陽極35と、第1の透明基板32に対向配置された第
2の透明基板36と、少なくとも発光体34を封止する
ように第1の透明基板32と第2の透明基板36とを固
着する第1のシール材37とからなる有機ELディスプ
レイ31aを表示部とし、第2の透明基板36の上に形
成された第1の透明電極38と、第1の透明電極38と
対向配置され、表面に第2の透明電極39が形成されて
なる第3の透明基板40と、第2の透明基板36と第3
の透明基板40との間に空隙を設けつつ、これらを固着
する第2のシール材41とからなるタッチスイッチ31
bを入力部として備えたものである。
The organic EL device 31 includes a first transparent substrate 32, a cathode 33 formed on the first transparent substrate 32, and a luminous body 34 formed on the cathode 33 and made of an organic material. A transparent anode 35 formed on the luminous body 34, a second transparent substrate 36 disposed facing the first transparent substrate 32, and a first transparent substrate 36 sealing at least the luminous body 34. An organic EL display 31a including a transparent substrate 32 and a first sealing material 37 for fixing the second transparent substrate 36 is used as a display unit, and a first transparent electrode 38 formed on the second transparent substrate 36 is used. A third transparent substrate 40 having a second transparent electrode 39 formed on the surface thereof and a second transparent substrate 36,
A touch switch 31 comprising a second sealing material 41 for fixing the gaps while providing a gap between the touch switch 31 and the transparent substrate 40.
b as an input unit.

【0005】[0005]

【発明が解決しようとする課題】しかしながら、上述し
た従来の有機ELデバイス31は、表示部をなす有機E
Lディスプレイ31aと、入力部をなすタッチスイッチ
31bとが第2の透明基板36を境にして別々に構成さ
れるので、部品点数が増して構造が複雑になるという欠
点があった。
However, the above-described conventional organic EL device 31 has an organic EL device which forms a display section.
Since the L display 31a and the touch switch 31b serving as an input unit are separately configured with the second transparent substrate 36 as a boundary, there is a disadvantage that the number of components increases and the structure becomes complicated.

【0006】しかも、厚さ方向に3枚の透明基板32,
36,40による基材が重ね合わされた構成なので、デ
バイス全体の厚さが増すだけでなく、基材の重ね合わせ
により干渉光が発生し、タッチスイッチ31bの下部に
位置する有機ELディスプレイ31aの表示の輝度が低
下するという問題があった。
In addition, three transparent substrates 32,
Since the base materials 36 and 40 are superimposed, not only the thickness of the entire device is increased, but also the superposition of the base materials generates interference light, and the display on the organic EL display 31a located below the touch switch 31b. There is a problem that the brightness of the image is reduced.

【0007】そこで、本発明は、上記問題点に鑑みてな
されたものであり、従来に比べ簡単な構造で安価に製造
でき、干渉光による輝度の低下も低減することができる
透明タッチスイッチ付き有機ELデバイスとその製造方
法を提供することを目的としている。
Accordingly, the present invention has been made in view of the above-mentioned problems, and has an organic structure with a transparent touch switch that can be manufactured at a low cost with a simple structure as compared with the related art, and that can reduce a decrease in luminance due to interference light. An object is to provide an EL device and a manufacturing method thereof.

【0008】[0008]

【課題を解決するための手段】上記目的を達成するた
め、請求項1の発明は、絶縁性を有する基板と、該基板
の上に形成された第一電極と、該第一電極の上に形成さ
れた少なくとも発光層を含む有機層と、該有機層の上に
形成された透明性を有する第二電極と、前記基板と所定
ギャップをおいて封止される透明性を有する基材と、前
記第二電極と電気的にマトリクスを形成するように前記
基材の上に形成された第三電極と、前記基板と前記基材
との間が所定ギャップで挟持されるように前記基材の上
に形成された弾性を有するスペーサーとを備え、前記第
二電極と前記第三電極により透明タッチスイッチが構成
されることを特徴とする。
In order to achieve the above object, the invention according to claim 1 comprises a substrate having an insulating property, a first electrode formed on the substrate, and a first electrode formed on the first electrode. An organic layer including at least the light-emitting layer formed, a second electrode having transparency formed on the organic layer, and a substrate having transparency sealed at a predetermined gap with the substrate, A third electrode formed on the base material so as to electrically form a matrix with the second electrode, and the base material such that the substrate and the base material are sandwiched by a predetermined gap. And a spacer having elasticity formed thereon, wherein the second electrode and the third electrode constitute a transparent touch switch.

【0009】請求項2の発明は、請求項1の透明タッチ
スイッチ付き有機ELデバイスにおいて、前記基材本体
の表面には防湿のためのコート膜が形成されていること
を特徴とする。
According to a second aspect of the present invention, in the organic EL device with the transparent touch switch according to the first aspect, a coat film for moisture proof is formed on a surface of the base body.

【0010】請求項3の発明は、請求項1の透明タッチ
スイッチ付き有機ELデバイスにおいて、前記第一電極
と前記第二電極とで挟まれた前記有機層の部分が発光部
をなし、該発光部の発光領域を区画するように前記第一
電極と前記有機層の界面に有機絶縁層が形成されている
ことを特徴とする。
According to a third aspect of the present invention, in the organic EL device with the transparent touch switch according to the first aspect, a portion of the organic layer sandwiched between the first electrode and the second electrode forms a light emitting portion, and An organic insulating layer is formed at an interface between the first electrode and the organic layer so as to define a light emitting region of the portion.

【0011】請求項4の発明は、絶縁性を有する基板の
上に第一電極を形成する工程と、前記第一電極の上に有
機層を形成する工程と、前記有機層の上に透明性を有す
る第二電極を形成する工程と、前記第二電極と電気的に
マトリクスを形成するように透明性を有する基材の上に
第三電極を形成する工程と、前記基材の上に弾性を有す
るスペーサーを形成する工程と、前記第二電極と前記第
三電極により透明タッチスイッチが構成され、前記基板
と前記基材との間が前記スペーサーにより所定ギャップ
で挟持されるように前記基板と前記基材との間を封止す
る工程とを含むことを特徴とする。
[0011] The invention according to claim 4 is a step of forming a first electrode on an insulating substrate, a step of forming an organic layer on the first electrode, and a step of forming a transparent layer on the organic layer. Forming a second electrode having, and forming a third electrode on a transparent substrate so as to electrically form a matrix with the second electrode, and elastic on the substrate Forming a spacer having, a transparent touch switch is configured by the second electrode and the third electrode, the substrate and the substrate so that the substrate and the substrate are sandwiched by a predetermined gap by the spacer. Sealing the space between the base material and the base material.

【0012】請求項5の発明は、請求項4の透明タッチ
スイッチ付き有機ELデバイスの製造方法において、前
記第一電極を形成した後、前記第一電極と前記第二電極
とで挟まれた前記有機層の部分の発光部の発光領域を区
画するように前記第一電極と前記有機層の界面に有機絶
縁層を形成する工程を含むことを特徴とする。
According to a fifth aspect of the present invention, in the method of manufacturing an organic EL device with a transparent touch switch according to the fourth aspect, after forming the first electrode, the first electrode is sandwiched between the first electrode and the second electrode. The method includes a step of forming an organic insulating layer at an interface between the first electrode and the organic layer so as to partition a light emitting region of a light emitting portion in an organic layer portion.

【0013】[0013]

【発明の実施の形態】図1は本発明による透明タッチス
イッチ付き有機ELデバイスの実施の形態を示す分解斜
視図、図2(a)〜(h)は図1の有機ELデバイスの
製造工程を示す断面図、図3(a),(b)は図1の有
機ELデバイスにおけるタッチスイッチの動作図、図4
は図1のタッチスイッチ部分の電極構造の概略図、図5
は図4のタッチスイッチの機能図である。なお、図3で
は絶縁層を省略している。
FIG. 1 is an exploded perspective view showing an embodiment of an organic EL device with a transparent touch switch according to the present invention, and FIGS. 2 (a) to 2 (h) show manufacturing steps of the organic EL device of FIG. 3 (a) and 3 (b) are operation diagrams of a touch switch in the organic EL device of FIG. 1, and FIG.
FIG. 5 is a schematic view of an electrode structure of a touch switch portion of FIG.
5 is a functional diagram of the touch switch of FIG. In FIG. 3, the insulating layer is omitted.

【0014】本例の有機ELデバイスは、一対の電極の
間に蛍光性有機化合物を含む薄膜を挟んで基板に積層形
成してEL表示部を構成し、このEL表示部の一方の電
極を透明タッチスイッチの一方のスイッチ用電極として
兼用し、透明タッチスイッチの他方のスイッチ用電極を
封止用の基材の内面に形成して基板と基材とを積層貼り
合わせることにより、従来に比べて簡単な構造で安価な
有機ELデバイスの製造を実現している。
In the organic EL device of this embodiment, an EL display section is formed by laminating a thin film containing a fluorescent organic compound between a pair of electrodes to form an EL display section, and one electrode of the EL display section is transparent. Compared to the conventional one, the switch switch electrode of the transparent touch switch is also used as one switch electrode of the touch switch, and the other switch electrode of the transparent touch switch is formed on the inner surface of the sealing base material and the substrate and the base material are laminated and bonded. The production of an inexpensive organic EL device with a simple structure is realized.

【0015】以下、本例の有機ELデバイスの具体的な
構成を図1〜図5を参照しながら製作工程の手順に沿っ
て説明する。
Hereinafter, a specific configuration of the organic EL device according to the present embodiment will be described along a procedure of a manufacturing process with reference to FIGS.

【0016】図1〜図3に示すように、有機ELデバイ
ス1は、ガラス等の絶縁性を有する基板2を基部として
いる。なお、基板2は、光学的に透明でも不透明でもか
まわない。まず、図2(a),(b)に示すように、基
板2の上に第一電極となる陰極3(陰極配線を含む)を
抵抗加熱蒸着法、分子線蒸着法、スパッタ法等のPVD
(Physical Vapor Deposition )法により形成した後、
フォトリソ法を用いて所定パターン形状に形成する。本
例における陰極3は、図1に示すように、基板2の左右
に平行に並んで形成された複数本のストライプ状のパタ
ーンからなり、一端が基板2の端部まで引き出されて不
図示の駆動回路に接続される。
As shown in FIGS. 1 to 3, the organic EL device 1 is based on an insulating substrate 2 such as glass. Note that the substrate 2 may be optically transparent or opaque. First, as shown in FIGS. 2A and 2B, a cathode 3 (including a cathode wiring) serving as a first electrode is formed on a substrate 2 by PVD such as resistance heating evaporation, molecular beam evaporation, or sputtering.
(Physical Vapor Deposition) method,
It is formed in a predetermined pattern shape using a photolithography method. As shown in FIG. 1, the cathode 3 in this example is composed of a plurality of stripe-shaped patterns formed in parallel on the left and right sides of the substrate 2, one end of which is pulled out to the end of the substrate 2 and not shown. Connected to drive circuit.

【0017】陰極3の材料としては、後述する第二電極
としての陽極6の材料よりも抵抗率の低い材料(仕事関
数の小さい材料)が用いられる。具体的には、Al、L
i、Na、Mg、Ca等の金属単体、及びその化合物、
或いはMg−Ag、Al−Li、Mg−In等の各種合
金を用いることができる。
As a material of the cathode 3, a material having a lower resistivity (a material having a small work function) than a material of the anode 6 as a second electrode described later is used. Specifically, Al, L
i, a simple metal such as Na, Mg, Ca and the like, and a compound thereof;
Alternatively, various alloys such as Mg-Ag, Al-Li, and Mg-In can be used.

【0018】次に、図2(c)に示すように、陰極3の
上に有機材料からなる絶縁層4を成膜する。絶縁層4
は、発光部以外を覆うように陰極3と後述する有機層5
の界面に形成する。絶縁層4は、例えばネガ型感光性ポ
リイミドの他、薄膜で蒸着可能な絶縁物材料であるSi
N、SiO2 等で形成することができる。
Next, as shown in FIG. 2C, an insulating layer 4 made of an organic material is formed on the cathode 3. Insulating layer 4
Is a cathode 3 and an organic layer 5 described later so as to cover portions other than the light emitting portion.
Formed at the interface. The insulating layer 4 is made of, for example, a negative photosensitive polyimide or a thin-film insulating material Si
It can be formed of N, SiO 2 or the like.

【0019】本例では、ネガ型感光性ポリイミドを用い
て絶縁層4を形成している。さらに説明すると、陰極3
の上にスピンコート法やロールコート法により所定の塗
膜厚となるようにネガ型感光性ポリイミド膜を成膜し、
陰極3上の発光部以外を覆うように製作された露光マス
クを用いて露光処理を行う。そして、現像完了後、例え
ば窒素雰囲気中で350℃の温度でベーク処理し、所定
のイミド化処理を行う。これにより、発光部7のパター
ン(発光領域)形状に区画されて陰極3が露出した絶縁
層4が形成され、発光部7のパターン精度が向上し、再
現性を確保することができる。
In this embodiment, the insulating layer 4 is formed using negative photosensitive polyimide. More specifically, the cathode 3
A negative photosensitive polyimide film is formed on the substrate so as to have a predetermined coating thickness by a spin coating method or a roll coating method,
An exposure process is performed using an exposure mask manufactured so as to cover a portion other than the light emitting portion on the cathode 3. After completion of the development, a baking treatment is performed at a temperature of 350 ° C. in a nitrogen atmosphere, for example, to perform a predetermined imidization treatment. As a result, the insulating layer 4 in which the cathode 3 is exposed is formed in a pattern (light emitting region) shape of the light emitting unit 7, and the pattern accuracy of the light emitting unit 7 is improved, and reproducibility can be secured.

【0020】次に、上記のようにして絶縁層4が形成さ
れた基板2を通常の基板洗浄処理した後、絶縁層4の上
から有機層5を形成する。
Next, after the substrate 2 on which the insulating layer 4 is formed as described above is subjected to a normal substrate cleaning treatment, an organic layer 5 is formed on the insulating layer 4.

【0021】有機層5を形成するにあたって、低分子タ
イプの有機層を用いる場合には、抵抗加熱蒸着法によ
り、まず、図2(d)に示すように、発光層兼電子輸送
層としてのAlq3 (トリス(8−キノリノラト)アル
ミニウム(III) )有機膜5aを絶縁層4の上から例えば
膜厚50nmで成膜する。続いて、図2(e)に示すよ
うに、正孔輸送層としてのα−NPD(N,N’−ビス
−(1−ナフチル)−N,N’−ジフェニルベンジジ
ン)有機膜5bをAlq3 有機膜5aの上に例えば膜厚
20nmで成膜する。さらに、図2(f)に示すよう
に、正孔注入層としてのCuPc(銅フタロシアニン)
有機膜5cをα−NPD有機膜5bの上に例えば膜厚7
0nmで成膜する。
When an organic layer of a low molecular weight type is used to form the organic layer 5, first, as shown in FIG. 2D, Alq as a light emitting layer and an electron transporting layer is formed by a resistance heating evaporation method. 3 (Tris (8-quinolinolato) aluminum (III)) An organic film 5a is formed on the insulating layer 4 to a thickness of, for example, 50 nm. Subsequently, as shown in FIG. 2E, the α-NPD (N, N′-bis- (1-naphthyl) -N, N′-diphenylbenzidine) organic film 5b as a hole transport layer is made of Alq 3. A film having a thickness of, for example, 20 nm is formed on the organic film 5a. Further, as shown in FIG. 2F, CuPc (copper phthalocyanine) as a hole injection layer
The organic film 5c is formed on the α-NPD organic film 5b by, for example,
Film is formed at 0 nm.

【0022】なお、高分子タイプの有機層を用いる場合
には、蒸着法の代わりにスピンコート法、アプリケータ
ーコート法、グラビアオフセット印刷法等の手法を採用
することができる。また、有機層5は、上述した3層構
造に限らず、表示素子として機能する層構造であればよ
い。
When a polymer type organic layer is used, a method such as a spin coating method, an applicator coating method, a gravure offset printing method or the like can be employed instead of the vapor deposition method. Further, the organic layer 5 is not limited to the three-layer structure described above, and may be any layer structure that functions as a display element.

【0023】次に、図2(g)に示すように、マスク蒸
着法等のPVD法により有機層5の上から第二電極とな
る陽極(図4のColumn電極群)6を成膜する。本
例における陽極6は、図1に示すように、陰極3と直交
するように基板2の上下に平行に並んで形成された複数
本のストライプ状のパターンからなり、一端が基板2の
端部まで引き出されて不図示の駆動回路に接続される。
Next, as shown in FIG. 2G, an anode (Column electrode group in FIG. 4) 6 serving as a second electrode is formed from above the organic layer 5 by a PVD method such as a mask evaporation method. As shown in FIG. 1, the anode 6 in the present example is composed of a plurality of stripe-shaped patterns formed in parallel with the substrate 2 so as to be perpendicular to the cathode 3, and one end is formed at the end of the substrate 2. And is connected to a drive circuit (not shown).

【0024】陽極6の材料としては、前述した第一電極
としての陰極3の材料よりも抵抗率の高い材料(仕事関
数の大きい材料)が用いられる。具体的には、ITO
(Indium Tin Oxide)からなる透明導電膜、非晶質透明
導電膜であるIDIXO(商品名:出光透明導電材料Id
emitsu Indium X-Metal Oxide 、出光興産株式会社製)
等が用いられる。
As the material of the anode 6, a material having a higher resistivity (a material having a large work function) than the material of the cathode 3 as the above-mentioned first electrode is used. Specifically, ITO
(Indium Tin Oxide), IDIXO (trade name: Idemitsu transparent conductive material Id) which is an amorphous transparent conductive film
emitsu Indium X-Metal Oxide, manufactured by Idemitsu Kosan Co., Ltd.)
Are used.

【0025】以上の工程により、有機ELデバイス1の
表示部としての機能が完成する。すなわち、陰極3と陽
極6との間に挟まれて絶縁層4によって区画された有機
層5の部分が発光部7をなし、ドットマトリクス状のE
L表示部8が形成される。
Through the above steps, the function of the organic EL device 1 as a display unit is completed. That is, a portion of the organic layer 5 sandwiched between the cathode 3 and the anode 6 and partitioned by the insulating layer 4 constitutes the light emitting section 7 and has a dot matrix E shape.
An L display section 8 is formed.

【0026】次に、図1に示すように、第三電極をなす
スイッチ用電極(図4のRow電極群)12を透明性を
有する基材11の上にストライプ状のパターンで形成す
る。スイッチ用電極12は、後述する封止処理により基
板2と基材11との外周部分が封止されたとき、図4及
び図5に示すように、陽極(Column電極群)6と
マトリクスを組んで透明タッチスイッチ13を構成する
ように基材11の上に形成される。
Next, as shown in FIG. 1, a switch electrode (Row electrode group in FIG. 4) 12 as a third electrode is formed on a transparent base material 11 in a stripe pattern. When the outer peripheral portion between the substrate 2 and the base material 11 is sealed by a sealing process described later, the switch electrode 12 forms a matrix with the anode (Column electrode group) 6 as shown in FIGS. Is formed on the base material 11 so as to constitute the transparent touch switch 13.

【0027】基材11の本体としては、ポリエステルま
たはポリエーテルサルホンなどのプラスチックフィルム
やガラス板が用いられる。本例では、厚さ100μmの
ポリエステルフィルム11aを基材11の本体として用
い、このポリエステルフィルム11aの全面にコート膜
11bとしてSiO2 −Al2 3 膜を形成して防湿処
理を施している。
As the main body of the substrate 11, a plastic film such as polyester or polyether sulfone or a glass plate is used. In this example, a polyester film 11a having a thickness of 100 μm is used as the main body of the base material 11, and an SiO 2 —Al 2 O 3 film is formed as a coating film 11b on the entire surface of the polyester film 11a, and is subjected to a moisture proof treatment.

【0028】そして、SiO2 −Al2 3 コート膜1
1bの上にITO透明導電膜をスパッタ成膜する。その
後、前記ITO透明導電膜を通常のフォトリソ法やスク
リーン印刷法等の手法によりエッチングレジスト形成
し、ITOのエッチャントでエッチングする。これによ
り、基材11の上に透明電極をなすスイッチ用電極12
が形成される。
Then, the SiO 2 —Al 2 O 3 coat film 1
1b, an ITO transparent conductive film is formed by sputtering. Thereafter, an etching resist is formed on the ITO transparent conductive film by a method such as a normal photolithography method or a screen printing method, and etching is performed with an etchant of ITO. As a result, the switch electrode 12 serving as a transparent electrode is formed on the substrate 11.
Is formed.

【0029】なお、前記SiO2 −Al2 3 コート膜
11bの膜厚は、数10nm〜数μmの膜厚範囲で形成
される。また、スイッチ用電極12をなすITO透明導
電膜は、そのシート抵抗が数10Ω/□〜数100Ω/
□の範囲になるように成膜される。
The thickness of the SiO 2 —Al 2 O 3 coating film 11b is in the range of several tens nm to several μm. The ITO transparent conductive film forming the switch electrode 12 has a sheet resistance of several tens Ω / □ to several hundred Ω /
The film is formed so as to be in the range of □.

【0030】次に、図1に示すように、基材11の所定
箇所にスペーサー14を形成する。スペーサー14は、
後述する封止処理により基板2と基材11との外周部分
が封止されたとき、図2(h)に示すように、基板2と
基材11との間が所定のギャップで挟持されるように、
スイッチ用電極12が形成された基材11の面側で所定
ピッチ(例えば数100μm)をおいての複数箇所(例
えば隣接するスイッチ用電極12の間)に形成される。
Next, as shown in FIG. 1, a spacer 14 is formed at a predetermined position on the base material 11. The spacer 14
When the outer peripheral portion between the substrate 2 and the base material 11 is sealed by a sealing process described later, the substrate 2 and the base material 11 are sandwiched by a predetermined gap as shown in FIG. like,
The switch electrodes 12 are formed at a plurality of places (for example, between adjacent switch electrodes 12) at a predetermined pitch (for example, several 100 μm) on the surface side of the substrate 11 on which the switch electrodes 12 are formed.

【0031】なお、基板2と基材11との間のギャップ
は、図3(a)に示す状態から図3(b)に示す状態ま
で基材11が撓んで陽極6とスイッチ用電極12が接触
導通してスイッチとして機能する程度の寸法(例えば5
μm以下)を有していればよい。
The gap between the substrate 2 and the substrate 11 is such that the substrate 11 bends from the state shown in FIG. 3A to the state shown in FIG. A dimension sufficient to function as a switch through contact conduction (for example, 5
μm or less).

【0032】また、スペーサー14は、表示セグメント
上に形成されたとき、又は表示セグメント面積に対し大
面積のとき、EL表示部8の発光部7が発光した際の表
示の観察の妨げにならないように透明性を有しているこ
とが望ましい。さらに、スペーサー14は、図3(a)
に示すスイッチ動作前の状態から図3(b)に示すスイ
ッチ動作状態まで基材11が撓み、スイッチ動作を解除
したときに図3(a)の状態に復元できるように所定の
弾性を有している。
When the spacer 14 is formed on the display segment or has a large area with respect to the display segment area, the spacer 14 does not hinder the display observation when the light emitting section 7 of the EL display section 8 emits light. It is desirable to have transparency. Further, the spacer 14 is formed as shown in FIG.
The base material 11 bends from the state before the switch operation shown in FIG. 3 to the switch operation state shown in FIG. 3B, and has a predetermined elasticity so that the state shown in FIG. ing.

【0033】上記のように作用するスペーサー14の材
料としては、シリコーン樹脂、ポリエステルまたはアク
リルなどの合成樹脂が用いられる。また、スペーサー1
4の形成方法としては、スクリーン印刷法、グラビア印
刷法、オフセット印刷法などの各種印刷法やフォトレジ
スト法の手法が採用される。
As a material of the spacer 14 acting as described above, a synthetic resin such as silicone resin, polyester or acrylic is used. Spacer 1
As a forming method of 4, a printing method such as a screen printing method, a gravure printing method, an offset printing method, or a photoresist method is employed.

【0034】なお、スペーサー14はその形状を問わな
いが、円形の場合、大きさがφ数10μm〜数100μ
m(好ましくは10μm〜100μm)の範囲で、高さ
が0.01μm〜数100μm(好ましくは0.1μm
〜数10μm)の範囲で形成される。
The shape of the spacer 14 is not limited. In the case of a circular shape, the size of the spacer 14 is several tens μm to several hundred μm.
m (preferably 10 μm to 100 μm) and a height of 0.01 μm to several 100 μm (preferably 0.1 μm
To several tens of μm).

【0035】次に、図1及び図2(h)に示すように、
スイッチ用電極12とスペーサー14を形成した基材1
1の面を内側にし、スイッチ用電極12とEL表示部8
の陽極6とにより透明タッチスイッチ13が構成される
ように、基板2に対して基材11を位置合わせし、基板
2と基材11との間の外周部分をエポキシ系接着剤や熱
溶着により封止処理する。以上の工程により、本例の有
機ELデバイス1が完成する。
Next, as shown in FIGS. 1 and 2 (h),
Substrate 1 on which switch electrode 12 and spacer 14 are formed
1, the switch electrode 12 and the EL display 8
The substrate 11 is aligned with the substrate 2 so that the transparent touch switch 13 is constituted by the anode 6 and the outer peripheral portion between the substrate 2 and the substrate 11 is formed by an epoxy-based adhesive or heat welding. Sealing is performed. Through the above steps, the organic EL device 1 of this example is completed.

【0036】なお、封止処理は、有機EL素子が水分を
嫌うため、Ar、He、N2 ガス等のドライ雰囲気に置
換したグローブボックスの中で行うことが好ましい。
The sealing treatment is preferably performed in a glove box replaced with a dry atmosphere of Ar, He, N 2 gas or the like since the organic EL element dislikes moisture.

【0037】このように、本例の有機ELデバイス1
は、基板2上に第一電極(陰極)3を形成し、この第一
電極3のパターン上に絶縁層4のパターンを形成し、さ
らに絶縁層4のパターン上に有機層5を積層形成し、し
かる後、透明電極である第二電極(陽極)6を形成し、
基板2上の有機ELデバイス層を封止する透明基材11
の第二電極6側に第二電極6と電気的にマトリクスが形
成されるようにスイッチ用電極12を形成し、基板2と
基材11との間をスペーサー14で所望のギャップを保
ちつつ挟持した状態で基板2と基材11との外周部分が
封止された構成となっている。
As described above, the organic EL device 1 of this embodiment
Comprises forming a first electrode (cathode) 3 on a substrate 2, forming a pattern of an insulating layer 4 on the pattern of the first electrode 3, and further forming an organic layer 5 on the pattern of the insulating layer 4. Thereafter, a second electrode (anode) 6 which is a transparent electrode is formed,
Transparent substrate 11 for sealing the organic EL device layer on substrate 2
A switching electrode 12 is formed on the second electrode 6 side such that a matrix is formed electrically with the second electrode 6, and the substrate 2 and the base material 11 are sandwiched between spacers 14 while maintaining a desired gap. In this state, the outer peripheral portions of the substrate 2 and the base material 11 are sealed.

【0038】したがって、本例の有機ELデバイス1で
は、EL表示部8における第二電極(陽極)6を透明タ
ッチスイッチ13の一方の電極として兼用し、第二電極
と対面する透明タッチスイッチのスイッチ用電極が封止
部材である基材の内面に形成されるので、図6に示す従
来の構造と比較して、構成部品(電極、基材)を減らし
てデバイス全体の厚さを薄くでき、基材の重ね合わせに
よって生じる干渉光の影響を抑え、輝度の低下を軽減す
ることができる。その結果、透明タッチスイッチ付き有
機ELデバイスが簡単な構造で安価に製造することがで
きる。
Therefore, in the organic EL device 1 of the present embodiment, the second electrode (anode) 6 in the EL display section 8 is also used as one electrode of the transparent touch switch 13, and the switch of the transparent touch switch facing the second electrode is used. Since the electrodes for use are formed on the inner surface of the base material as the sealing member, the number of components (electrodes and base materials) can be reduced and the thickness of the entire device can be reduced as compared with the conventional structure shown in FIG. The effect of interference light generated by the superposition of the base materials can be suppressed, and a decrease in luminance can be reduced. As a result, an organic EL device with a transparent touch switch can be manufactured at a low cost with a simple structure.

【0039】ところで、上述した実施の形態では、第一
電極を陰極3とし、第二電極を陽極6としており、陽極
6が透明タッチスイッチ13の一方の電極を兼ねる構成
について説明したが、陰極3と陽極6を逆転させた構成
としてもよい。その場合、陰極3が透明電極で形成さ
れ、有機層5の層構造も逆転した構成となる。すなわ
ち、EL表示部8の一対の電極をなす第一電極と第二電
極は、基材11の内面に形成されるスイッチ用電極と対
面して透明タッチスイッチ13を構成する電極が透明電
極で形成されていればよい。
In the above-described embodiment, the first electrode is used as the cathode 3 and the second electrode is used as the anode 6, and the anode 6 is also used as one electrode of the transparent touch switch 13. And the anode 6 may be reversed. In that case, the cathode 3 is formed of a transparent electrode, and the layer structure of the organic layer 5 is reversed. That is, the first electrode and the second electrode forming a pair of electrodes of the EL display unit 8 face the switch electrodes formed on the inner surface of the base material 11 and the electrodes constituting the transparent touch switch 13 are formed of transparent electrodes. It should just be done.

【0040】また、上述した実施の形態におけるEL表
示部8は、陰極(第一電極3)と陽極(第二電極)6と
が互いに直交するストライプ状をなし、これら電極3,
6間に有機層5を挟んだ構造としてドットマトリクスタ
イプのグラフィックパターンを表示するものであるが、
ドットマトリクスに限らず、日文字、アルファーニュー
メリック文字、固定表示パターン等で構成してもよい。
The EL display unit 8 in the above-described embodiment has a stripe shape in which a cathode (first electrode 3) and an anode (second electrode) 6 are orthogonal to each other.
Although a dot matrix type graphic pattern is displayed as a structure in which the organic layer 5 is sandwiched between 6,
The present invention is not limited to the dot matrix, but may be composed of a Japanese character, an alphanumeric character, a fixed display pattern, or the like.

【0041】[0041]

【発明の効果】以上の説明で明らかなように、本発明に
よれば、従来の構造と比較して、構成部品(電極、基
材)を減らしてデバイス全体の厚さを薄くでき、基材の
重ね合わせによって生じる干渉光の影響を抑え、輝度の
低下を軽減することができる。その結果、透明タッチス
イッチ付き有機ELデバイスが簡単な構造で安価に製造
することができる。
As is apparent from the above description, according to the present invention, compared with the conventional structure, the number of components (electrodes and base materials) can be reduced, and the thickness of the entire device can be reduced. , The influence of the interference light generated by the superimposition can be suppressed, and the decrease in luminance can be reduced. As a result, an organic EL device with a transparent touch switch can be manufactured at a low cost with a simple structure.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明による透明タッチスイッチ付き有機EL
デバイスの実施の形態を示す分解斜視図
FIG. 1 shows an organic EL with a transparent touch switch according to the present invention.
Exploded perspective view showing an embodiment of a device

【図2】(a)〜(h)図1の有機ELデバイスの製造
工程を示す断面図
FIGS. 2A to 2H are cross-sectional views illustrating manufacturing steps of the organic EL device of FIG.

【図3】(a),(b)図1の有機ELデバイスにおけ
るタッチスイッチの動作図
FIGS. 3A and 3B are operation diagrams of a touch switch in the organic EL device of FIG. 1;

【図4】図1のタッチスイッチ部分の電極構造の概略図FIG. 4 is a schematic diagram of an electrode structure of a touch switch portion of FIG. 1;

【図5】図4のタッチスイッチの機能図FIG. 5 is a functional diagram of the touch switch of FIG. 4;

【図6】従来の有機ELデバイスの断面図FIG. 6 is a cross-sectional view of a conventional organic EL device.

【符号の説明】[Explanation of symbols]

1…有機ELデバイス、2…基板、3…第一電極(陽
極)、4…絶縁層、5…有機層、6…第二電極(陰
極)、7…発光部、8…EL表示部、11…基材、12
…第三電極(スイッチ用電極)、13…透明タッチスイ
ッチ、14…スペーサー。
DESCRIPTION OF SYMBOLS 1 ... Organic EL device, 2 ... Substrate, 3 ... First electrode (anode), 4 ... Insulating layer, 5 ... Organic layer, 6 ... Second electrode (cathode), 7 ... Light emitting part, 8 ... EL display part, 11 ... Base material, 12
... third electrode (switch electrode), 13 ... transparent touch switch, 14 ... spacer.

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) H05B 33/14 H05B 33/14 A ──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 7 Identification symbol FI Theme coat ゛ (Reference) H05B 33/14 H05B 33/14 A

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 絶縁性を有する基板と、 該基板の上に形成された第一電極と、 該第一電極の上に形成された少なくとも発光層を含む有
機層と、 該有機層の上に形成された透明性を有する第二電極と、 前記基板と所定ギャップをおいて封止される透明性を有
する基材と、 前記第二電極と電気的にマトリクスを形成するように前
記基材の上に形成された第三電極と、 前記基板と前記基材との間が所定ギャップで挟持される
ように前記基材の上に形成された弾性を有するスペーサ
ーとを備え、 前記第二電極と前記第三電極により透明タッチスイッチ
が構成されることを特徴とする透明タッチスイッチ付き
有機ELデバイス。
A substrate having an insulating property; a first electrode formed on the substrate; an organic layer including at least a light emitting layer formed on the first electrode; The formed transparent second electrode, a transparent base material sealed at a predetermined gap from the substrate, and the base material so as to form a matrix electrically with the second electrode. A third electrode formed thereon, comprising a spacer having elasticity formed on the base material so that the substrate and the base material are sandwiched by a predetermined gap, the second electrode and An organic EL device with a transparent touch switch, wherein the third electrode forms a transparent touch switch.
【請求項2】 前記基材本体の表面には防湿のためのコ
ート膜が形成されていることを特徴とする請求項1記載
の透明タッチスイッチ付き有機ELデバイス。
2. The organic EL device with a transparent touch switch according to claim 1, wherein a coating film for moisture proof is formed on a surface of said base body.
【請求項3】 前記第一電極と前記第二電極とで挟まれ
た前記有機層の部分が発光部をなし、該発光部の発光領
域を区画するように前記第一電極と前記有機層の界面に
有機絶縁層が形成されていることを特徴とする請求項1
記載の透明タッチスイッチ付き有機ELデバイス。
3. A portion of the organic layer sandwiched between the first electrode and the second electrode forms a light emitting portion, and the first electrode and the organic layer are separated from each other so as to define a light emitting region of the light emitting portion. 2. An organic insulating layer is formed at an interface.
An organic EL device with a transparent touch switch according to the above.
【請求項4】 絶縁性を有する基板の上に第一電極を形
成する工程と、 前記第一電極の上に有機層を形成する工程と、 前記有機層の上に透明性を有する第二電極を形成する工
程と、 前記第二電極と電気的にマトリクスを形成するように透
明性を有する基材の上に第三電極を形成する工程と、 前記基材の上に弾性を有するスペーサーを形成する工程
と、 前記第二電極と前記第三電極により透明タッチスイッチ
が構成され、前記基板と前記基材との間が前記スペーサ
ーにより所定ギャップで挟持されるように前記基板と前
記基材との間を封止する工程とを含むことを特徴とする
透明タッチスイッチ付き有機ELデバイスの製造方法。
4. A step of forming a first electrode on an insulating substrate; a step of forming an organic layer on the first electrode; and a second electrode having transparency on the organic layer. Forming a third electrode on a transparent base material so as to electrically form a matrix with the second electrode; and forming an elastic spacer on the base material. And a transparent touch switch is configured by the second electrode and the third electrode, the substrate and the base material such that the space between the substrate and the base material is sandwiched by a predetermined gap by the spacer A method of manufacturing an organic EL device with a transparent touch switch.
【請求項5】 前記第一電極を形成した後、前記第一電
極と前記第二電極とで挟まれた前記有機層の部分の発光
部の発光領域を区画するように前記第一電極と前記有機
層の界面に有機絶縁層を形成する工程を含むことを特徴
とする請求項4記載の透明タッチスイッチ付き有機EL
デバイスの製造方法。
5. The method according to claim 1, wherein after forming the first electrode, the first electrode and the second electrode are separated from each other so as to define a light emitting region of a light emitting unit in a portion of the organic layer sandwiched between the first electrode and the second electrode. 5. The organic EL with a transparent touch switch according to claim 4, further comprising a step of forming an organic insulating layer at an interface of the organic layer.
Device manufacturing method.
JP25018199A 1999-09-03 1999-09-03 Organic el device with transparent touch switch and its manufacture Pending JP2001076886A (en)

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Application Number Priority Date Filing Date Title
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Publication Number Publication Date
JP2001076886A true JP2001076886A (en) 2001-03-23

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ID=17204030

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Country Status (1)

Country Link
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