JP2001074423A5 - - Google Patents

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Publication number
JP2001074423A5
JP2001074423A5 JP1999248301A JP24830199A JP2001074423A5 JP 2001074423 A5 JP2001074423 A5 JP 2001074423A5 JP 1999248301 A JP1999248301 A JP 1999248301A JP 24830199 A JP24830199 A JP 24830199A JP 2001074423 A5 JP2001074423 A5 JP 2001074423A5
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JP
Japan
Prior art keywords
scanning
width
microprojection
optical
detection signals
Prior art date
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Pending
Application number
JP1999248301A
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English (en)
Japanese (ja)
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JP2001074423A (ja
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Publication date
Application filed filed Critical
Priority to JP24830199A priority Critical patent/JP2001074423A/ja
Priority claimed from JP24830199A external-priority patent/JP2001074423A/ja
Publication of JP2001074423A publication Critical patent/JP2001074423A/ja
Publication of JP2001074423A5 publication Critical patent/JP2001074423A5/ja
Pending legal-status Critical Current

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JP24830199A 1999-09-02 1999-09-02 微少突起物の高さ検出方法、高さ検出装置および欠陥検出装置 Pending JP2001074423A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP24830199A JP2001074423A (ja) 1999-09-02 1999-09-02 微少突起物の高さ検出方法、高さ検出装置および欠陥検出装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24830199A JP2001074423A (ja) 1999-09-02 1999-09-02 微少突起物の高さ検出方法、高さ検出装置および欠陥検出装置

Publications (2)

Publication Number Publication Date
JP2001074423A JP2001074423A (ja) 2001-03-23
JP2001074423A5 true JP2001074423A5 (enrdf_load_stackoverflow) 2006-10-19

Family

ID=17176050

Family Applications (1)

Application Number Title Priority Date Filing Date
JP24830199A Pending JP2001074423A (ja) 1999-09-02 1999-09-02 微少突起物の高さ検出方法、高さ検出装置および欠陥検出装置

Country Status (1)

Country Link
JP (1) JP2001074423A (enrdf_load_stackoverflow)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007225481A (ja) * 2006-02-24 2007-09-06 Hitachi High-Technologies Corp ボールバンプウエハ検査装置
JP2008032669A (ja) * 2006-07-27 2008-02-14 Oputouea Kk 光走査式平面外観検査装置
JP2017015692A (ja) * 2015-06-26 2017-01-19 信越化学工業株式会社 フォトマスクブランクの欠陥検査方法、選別方法及び製造方法
EP3109700B1 (en) * 2015-06-26 2020-07-01 Shin-Etsu Chemical Co., Ltd. Defect inspecting method, sorting method, and producing method for photomask blank

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