JP2001052862A - Manufacture of organic el element and device therefor - Google Patents

Manufacture of organic el element and device therefor

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Publication number
JP2001052862A
JP2001052862A JP11221186A JP22118699A JP2001052862A JP 2001052862 A JP2001052862 A JP 2001052862A JP 11221186 A JP11221186 A JP 11221186A JP 22118699 A JP22118699 A JP 22118699A JP 2001052862 A JP2001052862 A JP 2001052862A
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Prior art keywords
mask
organic el
opening
substrate
transparent electrode
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JP11221186A
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Japanese (ja)
Inventor
Shigeru Fukumoto
Nobuyuki Miyama
Morimitsu Wakabayashi
Hajime Yamamoto
肇 山本
信幸 深山
滋 福本
守光 若林
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Hokuriku Electric Ind Co Ltd
北陸電気工業株式会社
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Priority to JP11221186A priority Critical patent/JP2001052862A/en
Publication of JP2001052862A publication Critical patent/JP2001052862A/en
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Abstract

PROBLEM TO BE SOLVED: To provide a manufacturing method of an organic EL element enabling minute patterns to be formed accurately and easily in the event of mask evaporation, and to provide a device therefor. SOLUTION: A transparent electrode 12 with a prescribed shape is formed of a transparent electrode material, such as ITO, on a surface of a transparent substrate 10 made of glass, resin, or the like, a luminescence layer made of organic EL materials is layered on the transparent electrode 12 by a vacuum thin-film forming technique, and a back plate made of Al-Li, etc., having a prescribed shape and confronting the transparent electrode 12 is formed on a surface of the luminescence layer. In forming the luminescence layer, a mask 20 with a stripe-shaped opening 22 (22a, 22b) is provided, and as to the opening 22 in the mask 20, the opening part 22a on the substrate 10 side is formed larger in width than the opening part 22b on the side of evaporation sources for the organic EL materials. The mask 20 and the substrate 10 are inclined with the mask 20 aligned with the substrate 10, the evaporating direction of the organic EL materials is successively changed for evaporation, and a plurality of organic EL materials are evaporated onto different positions on a surface of the substrate 10 by using the single opening 22 in the mask 20.

Description

【発明の詳細な説明】 DETAILED DESCRIPTION OF THE INVENTION

【0001】 [0001]

【発明の属する技術分野】この発明は、平面光源やディスプレイ、その他所定のパターン等の発光表示に用いられる有機EL素子の製造方法と装置に関する。 TECHNICAL FIELD The present invention is flat light source or display, a method and an apparatus of manufacturing an organic EL element used in the light emitting display, etc. and a predetermined pattern.

【0002】 [0002]

【従来の技術】従来、有機EL(エレクトルミネッセンス)素子は、ガラス等からなる透明な基板に、透光性のITO膜を一面に形成し、所定のストライプ状にエッチングして透明電極を形成していた。 Conventionally, organic EL (elect luminescent) element, a transparent substrate made of glass or the like, a light-transmitting ITO film is formed on one surface, it is etched to form a transparent electrode in a predetermined stripe which was. 透明電極には発光層が積層され、発光層は、有機EL材料が通常2〜3層にわたって、500Å〜1500Å程度の厚さに形成されていた。 The transparent electrode luminescent layer is laminated, the light emitting layer, the organic EL material is usually over 2-3 layers, it was formed to a thickness of about 500A~1500A. さらに発光層の表面には、蒸着等により背面電極材料を設けて、背面電極を形成していた。 Further on the surface of the light-emitting layer, a back electrode material provided by deposition or the like, was to form a back electrode.

【0003】ここで、発光層を構成する有機EL材料は、トリフェニルアミン誘導体(TPD)等のホール輸送材料と、発光材料であるアルミキレート錯体(Alq [0003] Here, the organic EL material forming a light emitting layer, a hole transport material such as a triphenylamine derivative (TPD), an aluminum chelate complex (Alq which is a light-emitting material
)等の電子輸送材料からなる。 3) an electron-transporting material or the like. 発光層は、ホール輸送材料の上に電子輸送材料を積層したものや、これらの混合層からなる。 The light-emitting layer, and a laminate of an electron transporting material on the hole-transporting material, consisting of the mixed layer.

【0004】 [0004]

【発明が解決しようとする課題】上記従来の技術の場合、有機EL材料は化学的に不安定なことからエッチング等による処理は不可能であり、大気に曝すだけでも劣化の原因となっていた。 For THE INVENTION It is an object of the prior art described above, the organic EL material is processed by etching or the like from chemical it unstable is impossible, thus causing deterioration just exposed to the air . 従って、有機EL材料のパターンニングは、マスク蒸着に限られていた。 Accordingly, patterning of the organic EL materials have been limited to a mask vapor deposition. そして、複色表示やフルカラー表示のために発光層が複数併設される場合、発光層は所定パターンのマスクを用いて有機EL When the light-emitting layer for the multi-color display or full color display is more features, the light-emitting layer of the organic EL by using a mask having a predetermined pattern
材料を蒸着しなければならず、各色毎にそのマスクを真空蒸着装置中で交換していた。 Materials must be deposition, the mask was replaced with a vacuum vapor deposition apparatus for each color.

【0005】しかしながら、このマスク蒸着は、マスクの性能上ファインパターンの形成が難しいものであった。 However, this mask evaporation were those formed of performance fine pattern of the mask is difficult. たとえば、1mm当たり3画素程度のピッチとすると、これをカラー化するにはさらに1画素当たり3ドット必要となり、90μmの幅の開口部が要求され、マスク交換による位置合わせにはかなりの精度が要求され、 For example, if the pitch of about 3 pixels per 1 mm, which 3 will dots required more per pixel for color reduction, is required opening width of 90 [mu] m, the request is considerable precision in positioning by the mask exchange It is,
交換作業が極めて困難でああった。 Replacement work was extremely difficult der. さらに、熱によるマスクのたるみ等も大きな問題となっていた。 In addition, sagging of the mask due to heat or the like has also become a major problem. また、マスク交換に際して、すでに蒸着した有機EL材料の表面にマスク等が触れて傷つけてしまうおそれもあった。 Further, when the mask exchange was also concern that the mask or the like will hurt by touching the surface of the organic EL material already deposited.

【0006】この発明は、上記従来の技術の問題点に鑑みてなされたものであり、マスク蒸着においても微細なパターンを正確に且つ容易に形成することができる有機EL素子の製造方法と装置を提供することを目的とする。 [0006] The present invention has been made in view of the problems of the prior art, a method of manufacturing an organic EL element that can be accurately and easily formed even a fine pattern in the mask deposition apparatus an object of the present invention is to provide.

【0007】 [0007]

【課題を解決するための手段】この発明の有機EL素子の製造方法は、ガラスや樹脂等の透明な基板表面にIT Means for Solving the Problems The method of manufacturing the organic EL device of the invention, IT a transparent substrate surface such as glass or a resin
O等の透明な電極材料により所定の形状となるように透明電極を形成し、この透明電極に有機EL材料からなる発光層を真空薄膜形成技術により積層し、上記発光層の表面に、上記透明電極に対向した所定形状のAl−Li A transparent electrode material O, etc. to form a transparent electrode to have a predetermined shape, a light emitting layer made of an organic EL material on the transparent electrode is laminated by a vacuum thin film forming technique, on the surface of the light-emitting layer, the transparent Al-Li with a predetermined shape facing the electrode
等の背面電極を形成する。 Forming a back electrode and the like. そして、上記発光層を形成するストライプ状の開口部を有したマスクを設け、このマスクの上記開口部は、上記基板側の開口部の幅が上記有機EL材料の蒸着源側の開口部よりも広く形成され、上記基板に上記マスクを位置決めして上記基板とマスクを傾斜させ、上記有機EL材料の蒸着方向を順次変えて各々蒸着するものである。 Then, a mask having a stripe-shaped opening forming the light-emitting layer provided above the opening portion of the mask, than the opening of the deposition source side of the width of the organic EL material of the opening of the substrate side widely formed, by positioning the mask on the substrate is inclined the substrate and the mask is for each deposited sequentially changing the deposition direction of the organic EL material. これにより、上記マスクの一つの開口部に対して上記基板表面の異なる位置に複数の有機EL材料を蒸着させる有機EL素子の製造方法である。 Accordingly, a method of manufacturing an organic EL element of depositing a plurality of organic EL materials to different locations above the substrate surface for one of the openings of the mask.

【0008】また、上記発光層は、複数の発光色毎に上記マスクの角度を変えて順次蒸着させるものである。 Further, the light emitting layer is intended to sequentially deposited by changing the angle of the mask for each of a plurality of light emitting colors. 上記蒸着源は、上記基板に対して平行に移動しながら順次蒸着する。 The vapor deposition source is sequentially deposited while moving parallel to the substrate.

【0009】またこの発明は、透明な基板表面に透明な電極材料により所定の形状となるように透明電極を形成し、この透明電極に有機EL材料からなる発光層を真空薄膜形成技術により積層し、上記発光層の表面に、上記透明電極に対向した所定形状の背面電極を形成する有機EL素子の製造装置であって、上記発光層を形成するストライプ状の開口部を有したマスクを備え、このマスクの上記開口部は、上記基板側の上記開口部の幅が上記有機EL材料の蒸着源側の開口部よりも広く形成され、上記基板と上記マスクを上記蒸着源に対して傾斜可能に設け、上記有機EL材料の蒸着方向により上記基板面の蒸着位置を設定可能である有機EL素子の製造装置である。 [0009] The present invention, by a transparent electrode material on a transparent substrate surface to form a transparent electrode to have a predetermined shape, a light emitting layer made of an organic EL material is laminated by a vacuum thin film forming technique on the transparent electrode , the surface of the light-emitting layer, a manufacturing apparatus of an organic EL element forming the back electrode of a predetermined shape which is opposed to the transparent electrode, provided with a mask having a stripe-shaped opening forming the luminescent layer, the opening of the mask, the width of the opening of the substrate side is wider than the opening of the deposition source side of the organic EL material, tiltably of the substrate and the mask relative to the deposition source provided, by vapor deposition direction of the organic EL material is a manufacturing apparatus of an organic EL element can be set deposition position of the substrate surface.

【0010】また、上記マスクの開口部は、上記基板側の開口部幅が上記蒸着源側の開口部幅の3倍以上に設定され、上記蒸着源に対する上記マスクの傾斜角度を設定する角度設定手段を備えたものである。 [0010] The opening of the mask, the angle setting of the opening width of the substrate side is set to more than 3 times the opening width of the deposition source side, to set the inclination angle of the mask relative to the deposition source it is those with the means. また、上記蒸着源は、上記基板及びマスクに対して平行に且つ直線的に移動させる移動装置を備えている。 Further, the vapor deposition source is provided with a moving device for moving parallel and linearly with respect to the substrate and the mask.

【0011】 [0011]

【発明の実施の形態】以下、この発明の実施形態について図面に基づいて説明する。 BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, will be explained with reference to the accompanying drawings embodiments of the present invention. この実施形態の有機EL素子は、ガラスや石英、樹脂等の透明な基板10の一方の表面に、ITOやSnO 等の透明な電極材料による透明電極12がストライプ状に等ピッチで形成されている。 The organic EL device of this embodiment, glass or quartz, on one surface of a transparent substrate 10 such as a resin, the transparent electrode 12 by a transparent electrode material such as ITO or SnO 2 is formed at a constant pitch in the stripe there. この透明電極12の表面側または基板10側に、透明電極12の両側縁部に沿って細いストライプ状のクロムやアルミ等の導体パターン14が形成されている。 On the surface side or the substrate 10 side of the transparent electrode 12, the conductor pattern 14 such as chromium or aluminum thin stripe along the side edges of the transparent electrode 12 is formed. 透明電極12の表面全面には、100〜500Å程度の厚さにCuPc(銅フタロシアン)のバッファ層16が形成され、さらにその表面に300〜1000Å程度のホール輸送材料18が形成されている。 The transparent electrode on the entire surface of the 12, the buffer layer 16 is formed of CuPc to a thickness of about 100 Å to 500 Å (copper phthalocyanine), are further formed hole transport material 18 of about 300~1000Å is on the surface.

【0012】さらに、ホール輸送材料18の表面には、 [0012] In addition, on the surface of the hole transport material 18,
光の3原色の赤(R)、緑(G)、青(B)の発光色を有する発光材料を有した図示しない電子輸送材料が、透明電極12に対応して各々ストライプ状に形成されている。 3 primary colors of red light (R), green (G), and an electron-transporting material (not shown) having a luminescent material with luminescent color of blue (B), are formed in each stripe corresponds to the transparent electrode 12 there. 電子輸送材料は、この3本を一組として順に形成され、有機EL材料からなる発光層を形成している。 Electron-transporting material, the three formed in this order as a pair, to form a light emitting layer made of an organic EL material. そして電子輸送材料の表面には、Liを0.01〜0.05 And on the surface of the electron transport material, 0.01-0.05 and Li
%程度含む純度99%程度のAl−Li合金、その他A Al-Li alloy having a purity of about 99%, including% of other A
l−Mg等の陰極材料による背面電極が、適宜の300 Back electrode by cathodic material such as l-Mg is appropriate 300
Å〜1000Å程度の厚みで積層される。 It is laminated in a thickness of about A~1000A. この背面電極は、透明電極12と直交して対向し、ストライプ状に形成されている。 The back electrode is opposed perpendicular to the transparent electrode 12, it is formed in a stripe shape. 背面電極は上記以外に、Al,Li,A Back electrode in addition to the above, Al, Li, A
g,Mg,In,Cs等を含む金属薄膜でもよい。 g, Mg, In, or a metal thin film containing Cs, and the like.

【0013】ここで発光層は、ホール輸送材料18としては、α−NPD、トリフェニルジアミン誘導体(TP [0013] Here, the light-emitting layer, as the hole transport material 18, alpha-NPD, triphenyl diamine derivative (TP
D)、ヒドラゾン誘導体、アリールアミン誘導体等がある。 D), hydrazone derivatives, arylamine derivatives. また、赤色発光電子輸送材料のEL材料としてはD As the EL material of the red light emitting electron transport material D
CM、青色発光電子輸送材料のEL材料としては、ジスチリルビフェニル誘導体(DPVBi)、緑色発光電子輸送材料のEL材料としてはアルミキノリール錯体(A CM, as the EL material of the blue light-emitting electron transport material, a distyryl biphenyl derivative (DPVBi), aluminum quinolinol reel complexes as EL material for a green light emitting electron transporting material (A
lq )等の有機EL発光材料を使用する。 Using the organic EL light-emitting material of lq 3) or the like. さらに適宜の発光材料を混合しても良い。 Further it may be mixed as appropriate luminescent material.

【0014】この有機EL素子の発光画素は、例えば、 [0014] emitting pixels of the organic EL element, for example,
330μm角を一画素として、30μmの間隔をおいて並べられ、この1画素の中に3本の光の3原色の赤(R)、緑(G)、青(B)の光を発光する電子輸送材料のパターンが各々位置する。 The 330μm angle as one pixel, are arranged at intervals of 30 [mu] m, to emit light of three primary colors of red three light in one pixel (R), green (G), and blue (B) electron pattern of transport material respectively positioned. 従って、各電子輸送材料は各々90μm幅で約10μm間隔で配置されている。 Accordingly, the electron transport material is disposed at each of about 10μm spacing 90μm width.
これにより、1mm角の中にカラー表示可能な9画素が配置されることになる。 As a result, the color displayable 9 pixels are arranged in a 1mm square.

【0015】この有機EL素子の各電子輸送材料を形成するマスク20は、図1〜図3に示すように、例えば3 [0015] Mask 20 forming each electron-transporting material of the organic EL device, as shown in FIGS. 1 to 3, for example 3
00〜500μm厚のステンレス板等の材料からなり、 00~500μm of a material of stainless steel plate or the like having a thickness,
図示しないマスクフレームに磁石で固定可能な材料である。 A mask frame (not shown) is fixable material in magnets. このマスク20は、330μmピッチの画素を形成するもので、図1に示すように、ストライプ状のスリット22を有し、スリット22の基板10側に位置した開口部22aが幅広に形成され、たとえば、300μmの開口幅で30μmの間隔を開けて開口部22aが形成されている。 The mask 20 is for forming a pixel of 330μm pitch, as shown in FIG. 1 has a stripe-shaped slit 22, opening 22a located on the substrate 10 side of the slit 22 is formed wide, e.g. an opening 22a is formed at intervals of 30μm in opening width of 300 [mu] m. また、マスク20の蒸着源側の開口部22b Further, the evaporation source side of the mask 20 openings 22b
は、開口部22aの中央に位置するようにして、開口部22aよりも幅狭に形成され、例えば90μmの開口が240μmの間隔を開けて形成されている。 Is so as to be positioned at the center of the opening 22a, is formed narrower than the opening 22a, for example, 90μm openings are formed at intervals of 240 .mu.m. 従って、開口部22bは開口部22aの3倍以上の開口幅を有する。 Accordingly, the opening 22b has three or more times the width of the opening 22a. スリット22は、図2,図3に示すように、その長手方向の途中に例えば90μm間隔で、20μm程度の連結部24を有する。 Slit 22, FIG. 2, as shown in FIG. 3, in the middle, for example, 90μm intervals in the longitudinal direction, has a coupling portion 24 of the order of 20 [mu] m.

【0016】このマスク20の製造方法は、300〜5 [0016] The method of manufacturing the mask 20, 300-5
00μm程度の厚さのステンレス板等の一方の面に開口部22aを形成するためのエッチングレジストを印刷し、他方の面には開口部22bを形成するためのエッチングレジストを印刷し、先ず、開口部22a側からエッチングを行う。 An etching resist for forming the opening 22a is printed on one surface of the stainless steel plate or the like having a thickness of about 00Myuemu, on the other surface by printing an etching resist for forming the opening portion 22b, first, the opening performing etching from the parts 22a side. そして、マスク20の厚さの90%程度のエッチングが終了した後、開口部22b側からエッチングを行う。 After the etching of about 90% of the thickness of the mask 20 is completed, etching is performed from the opening 22b side. これにより、略断面台形状にスリット22 Thus, the slit 22 in a substantially trapezoidal cross section
が形成される。 There is formed.

【0017】この発明の有機EL素子の一実施形態の製造方法は、ガラスや石英、樹脂等の透明な基板10の表面全面に、ITO等の透明な電極材料を蒸着等により設ける。 The process of the manufacturing one embodiment of the organic EL device of the present invention, glass or quartz, the entire surface of the transparent substrate 10 such as a resin, a transparent electrode material such as ITO is provided by vapor deposition or the like. このとき、所定ピッチのストライプ状の開口部が形成されたワイヤマスク等を用いて透明電極12を基板10上に真空蒸着する。 At this time, vacuum deposition of transparent electrodes 12 on the substrate 10 by using a striped wire mask opening is formed in a predetermined pitch and the like.

【0018】次に透明電極12の表面に、バッファ層1 [0018] Then the transparent electrode 12 surface, the buffer layer 1
6を全面に真空蒸着し、さらにホール輸送材料18を全面に真空蒸着する。 Was vacuum-deposited 6 on the entire surface, further vacuum deposition of the hole transport material 18 on the entire surface. この後、マスク20を用いて、光の3原色の発光を行う3種類の電子輸送材料やその他発光材料からなる層を、真空蒸着やスパッタリング、その他真空薄膜形成技術により順次積層する。 Then, using the mask 20, a layer composed of three kinds of electron transporting materials or other luminescent material for emitting light of three primary colors of light, vacuum deposition or sputtering, sequentially laminated by other vacuum thin film forming technique.

【0019】電子輸送材料の蒸着に際して、図1,図4 [0019] In the deposition of the electron transport material, 1, 4
(A),(B),(C)に示すように、発光層12の所定の色、例えば赤色発光電子輸送材料Rが入れられた蒸着源である蒸着るつぼ30を真空蒸着槽に設け、基板1 (A), (B), (C), the provided predetermined color light-emitting layer 12, for example a red light emitting electron transporting material deposition crucible 30 R is an evaporation source which is placed in a vacuum deposition chamber, the substrate 1
0及びマスク20を蒸着方向に対して所定角度傾斜させて配置し、マスク20と平行に蒸着るつぼ30を移動させながら蒸着する。 0 and arranged inclined at a predetermined angle of the mask 20 relative to the deposition direction, deposited while moving parallel to the deposition crucible 30 and mask 20. このときの基板10及びマスク20 Substrate in this case 10 and the mask 20
の傾斜角度は、図1に示すように、蒸着材料の飛散方向に対して、マスク20の開口部22bから進入した蒸着材料が、開口部22aの一側方に蒸着されるようにする。 The inclination angle of, as shown in FIG. 1, with respect to the scattering direction of the vapor deposition material, the deposition material which enters through the opening 22b of the mask 20, to be deposited on one side of the opening 22a. このとき蒸着範囲は、1画素中の3本の透明電極1 In this case the deposition range is 1 three transparent electrodes in the pixel 1
2のうちの1本の透明電極12に対応した位置である。 Is one position corresponding to the transparent electrode 12 of one of the 2.

【0020】また、蒸着るつぼ30には、蒸着方向が直線状に略平行になるように、蒸着材料からさらに基板1 Further, the vapor deposition crucible 30, such that the deposition direction are substantially parallel to the straight line, further the substrate from the deposition material 1
0側に伸びたガイド板32が設けられている。 Guide plate 32 is provided that extends in the 0 side. ガイド板32は、その基板10側の開口34が所定の細い幅、例えば5mmで長さ100mm程度に形成されている。 Guide plate 32, the opening 34 of the substrate 10 side is formed into substantially a same length of 100mm at a predetermined narrow width, for example, 5 mm. この場合、蒸着は100mm幅で行うので、基板10が1 In this case, the deposition is performed at 100mm width, substrate 10 is 1
00mm以上の場合、その大きさに合わせて往復移動する。 For more than 300 mm, it reciprocates in accordance with the size thereof. また、蒸着るつぼ30及びガイド板32の長さが、 The length of the vapor deposition crucible 30 and the guide plate 32,
基板10の幅と等しく形成されて場合、蒸着は一回の移動でよい。 If it is formed equal to the width of the substrate 10, the deposition may be a one movement.

【0021】次に、基板10及びマスク20の面を蒸着方向に対して垂直にして固定し、緑色発光電子輸送材料Gが設けられた蒸着るつぼ30を、上記と同様に基板1 Next, fixed and perpendicular to the deposition direction of the surface of the substrate 10 and the mask 20, the vapor deposition crucible 30 green emitting electron transport material G is provided, similarly to the above substrate 1
0及びマスク20に対して平行に移動させる。 Moving parallel to 0 and the mask 20. これにより、図1に示すように、緑色発光電子輸送材料Gは、マスク20の開口部22bを通過し、開口部22aの中央部に対応し赤色発光電子輸送材料Rの蒸着位置の隣の透明電極12上に蒸着される。 Thus, as shown in FIG. 1, the green light emitting electron transporting material G passes through the opening 22b of the mask 20, the transparent next deposition position of corresponding to the central red light-emitting electron transport material R openings 22a It is deposited on the electrode 12. ここで、各電子輸送材料が重なる部分が生じでも、その重なった部分は導体パターン14や透明電極12間の部分である非発光部であり、 Here, even cause the electron-transporting material overlap partially, the overlapped portion is a non-light emitting portion that is a portion between the conductor pattern 14 and the transparent electrode 12,
表示上問題はない。 There is no display on the problem. さらに、基板10及びマスク20の面を蒸着方向に対して上記赤色発光電子輸送材料Rの場合とは対称の角度にして固定し、青色発光電子輸送材料Bが設けられた蒸着るつぼ30を、上記と同様に基板1 Further, in the angle of symmetry is fixed to the case the surface of the substrate 10 and the mask 20 relative to the deposition direction of the red light emitting electron transport material R, the blue light emitting electron transporting material deposition crucible 30 B is provided, the in the same manner as the substrate 1
0及びマスク20に対して平行に移動させる。 Moving parallel to 0 and the mask 20. これにより、図1に示すように、青色発光電子輸送材料Bは、マスク20の開口部22bを通過し、開口部22aの他方の側方に対応し緑色発光電子輸送材料Gの蒸着位置の隣の透明電極12上に蒸着される。 Thus, as shown in FIG. 1, the blue emitting electron transport material B, passes through the opening 22b of the mask 20, next to the deposition position of corresponding to the other side of the opening 22a green emitting electron transport material G It is deposited on the transparent electrode 12. これにより、光の3原色の各発光材料がストライプ状に、基板10上に形成される。 Thus, each luminescent material of the three primary colors of light in a stripe shape, is formed on the substrate 10.

【0022】次に、背面電極材料を、発光層の電子輸送材料表面に真空蒸着等の真空薄膜形成技術により設ける。 Next, the back electrode material, provided by a vacuum thin film forming technique such as vacuum deposition electron transporting material surface of the light emitting layer. このときも、ワイヤマスク等を利用して、透明電極12と直交する方向に背面電極を形成する。 In this case, by using a wire mask or the like, to form a back electrode in the direction perpendicular to the transparent electrode 12. 背面電極は、適宜約500Å〜1000Å程度の厚みで積層する。 Back electrode are laminated in an appropriate about 500Å~1000Å thickness of about.

【0023】この実施形態のEL素子の製造方法と装置によれば、カラー表示のための複数の有機EL材料を蒸着させる場合も、マスクの交換を行うことなく蒸着することが出来、各色の有機EL材料を正確に蒸着することができる。 According to the manufacturing method and apparatus of the EL device of this embodiment, even when depositing a plurality of organic EL materials for color display, it can be deposited without performing the replacement of the mask, organic colors the EL material can be accurately deposited.

【0024】なお、この発明のEL素子の製造方法と装置は、マスクの開口部の幅の違いを利用して一つのスリットから複数の位置に蒸着を行わせるものであり、マスクの開口部の断面形状は問わないものである。 [0024] Incidentally, the device manufacturing method of an EL device of the present invention is intended to perform a deposition from one slit into a plurality of positions by utilizing the difference of the width of the opening of the mask, the aperture of the mask sectional shape is one that does not matter. 従って、 Therefore,
断面円形のワイヤマスクにおいても、そのスリットの最小間隔と、基板側の開口部の間隔との差により、上記と同様の蒸着が可能である。 Even in circular cross-section of the wire mask, and the minimum spacing of the slit, the difference between the distance of the opening of the substrate side, it is possible to the same deposition as described above.

【0025】 [0025]

【発明の効果】この発明のEL素子の製造方法と装置は、マスクの開口部の幅の違いを利用して各スリットから複数の位置に蒸着を行わせるものであり、マスクの交換をすることなく正確に複数ヶ所への蒸着が可能となるものである。 [Effect of the Invention The method and apparatus of the EL element of the present invention is intended to perform the deposition by utilizing a difference in width of the opening of the mask from the slits in a plurality of positions, making the replacement of the mask rather than one in which precisely it is possible to deposition to multiple locations.

【図面の簡単な説明】 BRIEF DESCRIPTION OF THE DRAWINGS

【図1】この発明の一実施形態の有機EL素子の製造方法を示す概略縦断面図である。 1 is a schematic longitudinal sectional view showing a manufacturing method of an organic EL element of one embodiment of the present invention.

【図2】この実施形態に用いるマスクの平面図である。 2 is a plan view of a mask used in this embodiment.

【図3】この実施形態に用いるマスクの底面図である。 3 is a bottom view of a mask used in this embodiment.

【図4】この実施形態の有機EL素子の製造工程を示す概略正面図である。 4 is a schematic front view showing a manufacturing process of the organic EL device of this embodiment.

【符号の説明】 DESCRIPTION OF SYMBOLS

10 透明基板 12 透明電極 14 導体パターン 16 バッファ層 18 ホール輸送材料 20 マスク 22 スリット 22a,22b 開口部 10 transparent substrate 12 transparent electrode 14 conductor pattern 16 buffer layer 18 hole-transporting material 20 mask 22 slits 22a, 22b opening

フロントページの続き (72)発明者 深山 信幸 富山県上新川郡大沢野町下大久保3158番地 北陸電気工業株式会社内 (72)発明者 山本 肇 富山県上新川郡大沢野町下大久保3158番地 北陸電気工業株式会社内 Fターム(参考) 3K007 AB18 CA01 CA02 CA05 CB01 DA00 DB03 EB00 FA00 FA01 4K029 AA09 AA11 AA24 BA62 BB03 BC07 BD00 HA03 Of the front page Continued (72) inventor Nobuyuki Miyama Toyama Prefecture Kaminiikawa District, Toyama Osawano Shimookubo 3158 address Hokuriku Electric Industry Co., Ltd. in the (72) inventor Hajime Yamamoto Toyama Prefecture Kaminiikawa District, Toyama Osawano Shimookubo 3158 address Hokuriku Electric Industry Co., Ltd. in F-term (reference) 3K007 AB18 CA01 CA02 CA05 CB01 DA00 DB03 EB00 FA00 FA01 4K029 AA09 AA11 AA24 BA62 BB03 BC07 BD00 HA03

Claims (6)

    【特許請求の範囲】 [The claims]
  1. 【請求項1】 透明な基板表面に透明な電極材料により所定の形状となるように透明電極を形成し、この透明電極に有機EL材料からなる発光層を真空薄膜形成技術により積層し、上記発光層の表面に、上記透明電極に対向した所定形状の背面電極を形成する有機EL素子の製造方法において、上記発光層を形成するストライプ状の開口部を有したマスクを設け、このマスクの上記開口部は、上記基板側の開口部の幅が上記有機EL材料の蒸着源側の開口部よりも広く形成され、上記基板に上記マスクを位置決めして上記基板とマスクを傾斜させ、上記有機EL材料の蒸着方向を順次変えて、上記マスクの一つの開口部に対して上記基板表面の異なる位置に複数の有機EL材料を蒸着させることを特徴とする有機EL素子の製造方法。 1. A forming the transparent electrode so as to have a predetermined shape by a transparent electrode material on a transparent substrate surface, a light-emitting layer made of an organic EL material is laminated by a vacuum thin film forming technique on the transparent electrode, the light emitting the surface of the layer, in the manufacturing method of the organic EL device forming a back electrode of a predetermined shape which is opposed to the transparent electrode, providing a mask having a stripe-shaped opening forming the luminescent layer, the opening of the mask parts, the width of the opening of the substrate side is wider than the opening of the deposition source side of the organic EL material, it is inclined the substrate and the mask and positioning the mask to the substrate, the organic EL material by changing the deposition direction successively, the manufacturing method of the organic EL element characterized by depositing a plurality of organic EL materials with respect to one opening of the mask at different positions above the substrate surface.
  2. 【請求項2】 上記発光層は、複数の発光色毎に上記マスクの角度を変えて順次蒸着させることを特徴とする請求項1記載の有機EL素子の製造方法。 Wherein said light emitting layer, the method of manufacturing an organic EL element according to claim 1, characterized in that sequentially deposited by changing the angle of the mask for each of a plurality of light emitting colors.
  3. 【請求項3】 上記蒸着源は、上記基板に対して平行に移動しながら順次蒸着することを特徴とする請求項2記載の有機EL素子の製造方法。 Wherein said evaporation source, method of manufacturing an organic EL element according to claim 2, wherein the sequentially deposited while moving parallel to the substrate.
  4. 【請求項4】 透明な基板表面に透明な電極材料により所定の形状となるように透明電極を形成し、この透明電極に有機EL材料からなる発光層を真空薄膜形成技術により積層し、上記発光層の表面に、上記透明電極に対向した所定形状の背面電極を形成する有機EL素子の製造装置において、上記発光層を形成するストライプ状の開口部を有したマスクを備え、このマスクの上記開口部は、上記基板側の上記開口部の幅が上記有機EL材料の蒸着源側の開口部よりも広く形成され、上記蒸着源は、 4. a transparent electrode to have a predetermined shape by a transparent electrode material on a transparent substrate surface, a light-emitting layer made of an organic EL material is laminated by a vacuum thin film forming technique on the transparent electrode, the light emitting the surface of the layer, in the manufacturing apparatus of an organic EL element forming the back electrode of a predetermined shape which is opposed to the transparent electrode, provided with a mask having a stripe-shaped opening forming the luminescent layer, the opening of the mask parts, the width of the opening of the substrate side is wider than the opening of the deposition source side of the organic EL material, the vapor deposition source,
    線状に形成されているとともに蒸着方向を略平行に規制するガイド板を備え、上記基板と上記マスクを上記蒸着源に対して傾斜可能に設け、上記有機EL材料の蒸着方向により上記基板面の蒸着位置を設定可能であることを特徴とする有機EL素子の製造装置。 A generally parallel regulating guide plate deposition direction with being formed into a linear shape, the substrate and the mask is provided so as to be inclined with respect to the vapor deposition source, the deposition direction of the organic EL material of the substrate surface manufacturing apparatus of an organic EL element characterized in that it is possible to set the deposition position.
  5. 【請求項5】 上記マスクの開口部は、上記基板側の開口部幅が上記蒸着源側の開口部幅の3倍以上に設定され、上記蒸着源に対する上記マスクの傾斜角度を設定する角度設定手段を備えたことを特徴とする請求項3記載の有機EL素子の製造装置。 5. The opening of the mask, the angle setting of the opening width of the substrate side is set to more than 3 times the opening width of the deposition source side, to set the inclination angle of the mask relative to the deposition source apparatus for producing an organic EL device according to claim 3, further comprising a means.
  6. 【請求項6】 上記蒸着源は、上記基板及びマスクに対して平行に且つ直線的に移動させる移動装置を備えたことを特徴とする請求項5記載の有機EL素子の製造装置。 Wherein said evaporation source apparatus for producing an organic EL device according to claim 5, further comprising a moving device for moving parallel and linearly with respect to the substrate and the mask.
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